DE69927476T2 - Halbleiteranordnung - Google Patents

Halbleiteranordnung Download PDF

Info

Publication number
DE69927476T2
DE69927476T2 DE69927476T DE69927476T DE69927476T2 DE 69927476 T2 DE69927476 T2 DE 69927476T2 DE 69927476 T DE69927476 T DE 69927476T DE 69927476 T DE69927476 T DE 69927476T DE 69927476 T2 DE69927476 T2 DE 69927476T2
Authority
DE
Germany
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69927476T
Other languages
English (en)
Other versions
DE69927476D1 (de
Inventor
Lieverloo A Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Application granted granted Critical
Publication of DE69927476D1 publication Critical patent/DE69927476D1/de
Publication of DE69927476T2 publication Critical patent/DE69927476T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0255Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0259Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0727Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
DE69927476T 1998-06-09 1999-06-03 Halbleiteranordnung Expired - Fee Related DE69927476T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98201921 1998-06-09
PCT/IB1999/001006 WO1999065078A2 (en) 1998-06-09 1999-06-03 Semiconductor device

Publications (2)

Publication Number Publication Date
DE69927476D1 DE69927476D1 (de) 2005-11-03
DE69927476T2 true DE69927476T2 (de) 2006-06-14

Family

ID=8233791

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69927476T Expired - Fee Related DE69927476T2 (de) 1998-06-09 1999-06-03 Halbleiteranordnung

Country Status (7)

Country Link
US (1) US6229182B1 (de)
EP (1) EP1042807B1 (de)
JP (1) JP2002518831A (de)
KR (1) KR100626635B1 (de)
DE (1) DE69927476T2 (de)
TW (1) TW399337B (de)
WO (1) WO1999065078A2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3421005B2 (ja) * 2000-08-11 2003-06-30 シャープ株式会社 半導体装置の製造方法
US7186610B1 (en) * 2004-08-13 2007-03-06 Altera Corporation ESD protection device for high performance IC
US6858900B2 (en) * 2001-10-08 2005-02-22 Winbond Electronics Corp ESD protection devices and methods to reduce trigger voltage
US6952039B1 (en) * 2002-03-12 2005-10-04 National Semiconductor Corporation ESD protection snapback structure for overvoltage self-protecting I/O cells
JP4127007B2 (ja) * 2002-09-30 2008-07-30 ミツミ電機株式会社 半導体装置
JP2004296883A (ja) * 2003-03-27 2004-10-21 Sharp Corp 半導体装置とその製造方法
US7482657B1 (en) 2003-06-13 2009-01-27 National Semiconductor Corporation Balanced cells with fabrication mismatches that produce a unique number generator
USRE43922E1 (en) * 2003-06-13 2013-01-15 National Semiconductor Corporation Balanced cells with fabrication mismatches that produce a unique number generator
JP4611066B2 (ja) * 2004-04-13 2011-01-12 三菱電機株式会社 アバランシェフォトダイオード
JP4845410B2 (ja) * 2005-03-31 2011-12-28 株式会社リコー 半導体装置
JP4926468B2 (ja) * 2005-12-07 2012-05-09 ローム株式会社 静電破壊保護回路及びこれを備えた半導体集積回路装置
JP5849670B2 (ja) 2011-12-09 2016-02-03 セイコーエプソン株式会社 半導体装置
KR20200145955A (ko) 2019-06-21 2020-12-31 삼성디스플레이 주식회사 디스플레이 장치

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4100561A (en) * 1976-05-24 1978-07-11 Rca Corp. Protective circuit for MOS devices
JPS5489586A (en) * 1977-12-27 1979-07-16 Nec Corp Mos type semiconductor device
JPS63244874A (ja) * 1987-03-31 1988-10-12 Toshiba Corp 入力保護回路
US4990976A (en) * 1987-11-24 1991-02-05 Nec Corporation Semiconductor device including a field effect transistor having a protective diode between source and drain thereof
FR2649830B1 (fr) * 1989-07-13 1994-05-27 Sgs Thomson Microelectronics Structure de circuit integre cmos protege contre les decharges electrostatiques
US5281841A (en) * 1990-04-06 1994-01-25 U.S. Philips Corporation ESD protection element for CMOS integrated circuit
EP0598146A1 (de) * 1992-11-16 1994-05-25 ALCATEL BELL Naamloze Vennootschap Schutzanordnung gegen elektrostatische Entladungen
US5430595A (en) * 1993-10-15 1995-07-04 Intel Corporation Electrostatic discharge protection circuit
EP0739542B1 (de) * 1994-01-12 2002-05-02 Atmel Corporation Eingangs-/ausgangs-transistor mit optimierten schutz gegen esd
US5455436A (en) * 1994-05-19 1995-10-03 Industrial Technology Research Institute Protection circuit against electrostatic discharge using SCR structure
US5440162A (en) * 1994-07-26 1995-08-08 Rockwell International Corporation ESD protection for submicron CMOS circuits
US5623156A (en) * 1995-09-28 1997-04-22 Cypress Semiconductor Corporation Electrostatic discharge (ESD) protection circuit and structure for output drivers
JPH09181267A (ja) * 1995-10-31 1997-07-11 Texas Instr Inc <Ti> Esd保護回路
KR100200352B1 (ko) * 1995-12-30 1999-06-15 윤종용 반도체 장치의 보호 소자
TW299495B (en) * 1996-05-03 1997-03-01 Winbond Electronics Corp Electrostatic discharge protection circuit
JPH11233641A (ja) * 1998-02-10 1999-08-27 Seiko Epson Corp 半導体装置及び半導体装置の製造方法

Also Published As

Publication number Publication date
KR100626635B1 (ko) 2006-09-22
TW399337B (en) 2000-07-21
KR20010022662A (ko) 2001-03-26
WO1999065078A2 (en) 1999-12-16
DE69927476D1 (de) 2005-11-03
US6229182B1 (en) 2001-05-08
EP1042807A2 (de) 2000-10-11
JP2002518831A (ja) 2002-06-25
EP1042807B1 (de) 2005-09-28
WO1999065078A3 (en) 2000-06-29

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Representative=s name: VOLMER, G., DIPL.-ING., PAT.-ANW., 52066 AACHEN

8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: EISENFUEHR, SPEISER & PARTNER, 10178 BERLIN

8327 Change in the person/name/address of the patent owner

Owner name: NXP B.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee