DE69835988D1 - Doppelseitenreinigungsmaschine für ein Substrat - Google Patents
Doppelseitenreinigungsmaschine für ein SubstratInfo
- Publication number
- DE69835988D1 DE69835988D1 DE69835988T DE69835988T DE69835988D1 DE 69835988 D1 DE69835988 D1 DE 69835988D1 DE 69835988 T DE69835988 T DE 69835988T DE 69835988 T DE69835988 T DE 69835988T DE 69835988 D1 DE69835988 D1 DE 69835988D1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- cleaning machine
- double side
- side cleaning
- double
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23653197 | 1997-08-18 | ||
JP23653197A JP3377414B2 (ja) | 1997-08-18 | 1997-08-18 | 処理装置 |
JP8491998 | 1998-03-16 | ||
JP08491998A JP3401428B2 (ja) | 1998-03-16 | 1998-03-16 | 処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69835988D1 true DE69835988D1 (de) | 2006-11-09 |
DE69835988T2 DE69835988T2 (de) | 2007-06-21 |
Family
ID=26425881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69835988T Expired - Lifetime DE69835988T2 (de) | 1997-08-18 | 1998-08-17 | Doppelseitenreinigungsmaschine für ein Substrat |
Country Status (4)
Country | Link |
---|---|
US (2) | US6115867A (de) |
EP (1) | EP0898301B1 (de) |
KR (2) | KR100530700B1 (de) |
DE (1) | DE69835988T2 (de) |
Families Citing this family (66)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6115867A (en) | 1997-08-18 | 2000-09-12 | Tokyo Electron Limited | Apparatus for cleaning both sides of substrate |
JP3563605B2 (ja) * | 1998-03-16 | 2004-09-08 | 東京エレクトロン株式会社 | 処理装置 |
JP3111979B2 (ja) * | 1998-05-20 | 2000-11-27 | 日本電気株式会社 | ウエハの洗浄方法 |
US6269510B1 (en) * | 1999-01-04 | 2001-08-07 | International Business Machines Corporation | Post CMP clean brush with torque monitor |
US6543461B2 (en) * | 1999-02-11 | 2003-04-08 | Nova Measuring Instruments Ltd. | Buffer system for a wafer handling system field of the invention |
JP3395696B2 (ja) * | 1999-03-15 | 2003-04-14 | 日本電気株式会社 | ウェハ処理装置およびウェハ処理方法 |
JP4327304B2 (ja) * | 1999-07-27 | 2009-09-09 | 芝浦メカトロニクス株式会社 | スピン処理装置 |
US6295683B1 (en) * | 1999-12-09 | 2001-10-02 | United Microelectronics Corp. | Equipment for brushing the underside of a semiconductor wafer |
US6497241B1 (en) * | 1999-12-23 | 2002-12-24 | Lam Research Corporation | Hollow core spindle and spin, rinse, and dry module including the same |
FR2808120B1 (fr) * | 2000-04-20 | 2002-07-26 | Karl Suss France | Procede et dispositif pour le traitement du substrat d'un circuit integre ou d'un produit analogue en cours de fabrication |
US6634370B2 (en) * | 2000-05-08 | 2003-10-21 | Tokyo Electron Limited | Liquid treatment system and liquid treatment method |
JP2004515053A (ja) * | 2000-06-26 | 2004-05-20 | アプライド マテリアルズ インコーポレイテッド | ウェーハ洗浄方法及び装置 |
US7451774B2 (en) * | 2000-06-26 | 2008-11-18 | Applied Materials, Inc. | Method and apparatus for wafer cleaning |
US6536454B2 (en) * | 2000-07-07 | 2003-03-25 | Sez Ag | Device for treating a disc-shaped object |
JP4172567B2 (ja) * | 2000-09-22 | 2008-10-29 | 東京エレクトロン株式会社 | 基板洗浄具及び基板洗浄装置 |
KR100877044B1 (ko) | 2000-10-02 | 2008-12-31 | 도쿄엘렉트론가부시키가이샤 | 세정처리장치 |
JP2002233829A (ja) * | 2001-02-06 | 2002-08-20 | Tokyo Ohka Kogyo Co Ltd | 基板洗浄装置および洗浄方法 |
US7601112B2 (en) * | 2001-03-13 | 2009-10-13 | Jackson David P | Dense fluid cleaning centrifugal phase shifting separation process and apparatus |
US6823880B2 (en) * | 2001-04-25 | 2004-11-30 | Kabushiki Kaisha Kobe Seiko Sho | High pressure processing apparatus and high pressure processing method |
WO2002095809A2 (en) * | 2001-05-18 | 2002-11-28 | Lam Research Corporation | Apparatus and method for substrate preparation implementing a surface tension reducing process |
US20020170574A1 (en) * | 2001-05-21 | 2002-11-21 | Speedfam-Ipec Corporation | Differential Cleaning for semiconductor wafers with copper circuitry |
JP2002353181A (ja) * | 2001-05-30 | 2002-12-06 | Ses Co Ltd | 枚葉式基板洗浄方法および枚葉式基板洗浄装置 |
JP2003007664A (ja) * | 2001-06-22 | 2003-01-10 | Ses Co Ltd | 枚葉式基板洗浄方法および枚葉式基板洗浄装置 |
JP3849921B2 (ja) * | 2001-09-26 | 2006-11-22 | 大日本スクリーン製造株式会社 | 基板処理装置 |
DE10154885A1 (de) * | 2001-11-05 | 2003-05-15 | Schmid Gmbh & Co Geb | Verfahren zur Behandlung von Gegenständen mittels einer Flüssigkeit |
KR100445259B1 (ko) * | 2001-11-27 | 2004-08-21 | 삼성전자주식회사 | 세정방법 및 이를 수행하기 위한 세정 장치 |
US6455330B1 (en) * | 2002-01-28 | 2002-09-24 | Taiwan Semiconductor Manufacturing Company | Methods to create high-k dielectric gate electrodes with backside cleaning |
JP2003273064A (ja) * | 2002-03-15 | 2003-09-26 | Fujitsu Ltd | 堆積物の除去装置及び除去方法 |
US20040045578A1 (en) * | 2002-05-03 | 2004-03-11 | Jackson David P. | Method and apparatus for selective treatment of a precision substrate surface |
JP3980941B2 (ja) * | 2002-06-04 | 2007-09-26 | 東京エレクトロン株式会社 | 基板処理装置 |
US6824622B2 (en) * | 2002-06-27 | 2004-11-30 | Taiwan Semiconductor Manufacturing Co., Ltd | Cleaner and method for removing fluid from an object |
KR20040003714A (ko) * | 2002-07-03 | 2004-01-13 | (주)케이.씨.텍 | 웨이퍼 세정 장치 |
CH696188A5 (de) * | 2002-07-29 | 2007-02-15 | Brooks Pri Automation Switzerl | Detektions- und Reinigungsvorrichtung in einer Handhabungsvorrichtung für Photomasken. |
KR100457053B1 (ko) * | 2002-07-30 | 2004-11-10 | 삼성전자주식회사 | 웨이퍼 세정 장치 |
JP3890025B2 (ja) * | 2003-03-10 | 2007-03-07 | 東京エレクトロン株式会社 | 塗布処理装置及び塗布処理方法 |
EP1737025A4 (de) * | 2004-04-06 | 2009-03-11 | Tokyo Electron Ltd | Board-reinigungsvorrichtung, board-reinigungsverfahren und medium mit aufgezeichnetem programm zur verwendung für das verfahren |
JP2005327807A (ja) * | 2004-05-12 | 2005-11-24 | Sony Corp | 枚葉式洗浄装置及びその洗浄方法 |
US8201567B2 (en) * | 2004-10-28 | 2012-06-19 | Tokyo Electron Limited | Liquid treating apparatus |
JP2006128458A (ja) * | 2004-10-29 | 2006-05-18 | Toshiba Corp | 半導体基板洗浄装置及びその方法 |
US8392021B2 (en) * | 2005-02-18 | 2013-03-05 | Irobot Corporation | Autonomous surface cleaning robot for wet cleaning |
EP1708249A2 (de) * | 2005-03-31 | 2006-10-04 | Kaijo Corporation | Reinigungsgerät und Reinigungsverfahren |
KR100691212B1 (ko) * | 2006-11-17 | 2007-03-12 | 애플티(주) | 반도체 웨이퍼 세정장치 및 이를 이용한 반도체 웨이퍼제조 장치 |
US8578953B2 (en) * | 2006-12-20 | 2013-11-12 | Tokyo Electron Limited | Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium |
JP2008183532A (ja) * | 2007-01-31 | 2008-08-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
KR100871476B1 (ko) * | 2007-03-12 | 2008-12-05 | 송종호 | 기판 세정장치 |
CN103824757B (zh) * | 2007-05-23 | 2018-11-23 | 细美事有限公司 | 基板干燥的装置与方法 |
JP4939376B2 (ja) * | 2007-11-13 | 2012-05-23 | 株式会社Sokudo | 基板処理装置 |
JP5091687B2 (ja) * | 2008-01-08 | 2012-12-05 | 株式会社Sokudo | 基板処理装置 |
KR101140376B1 (ko) | 2011-05-23 | 2012-05-03 | 주식회사 쓰리디플러스 | 기판 제조용 공정 챔버 |
US9421617B2 (en) | 2011-06-22 | 2016-08-23 | Tel Nexx, Inc. | Substrate holder |
US8613474B2 (en) | 2011-07-06 | 2013-12-24 | Tel Nexx, Inc. | Substrate loader and unloader having a Bernoulli support |
US9176173B2 (en) * | 2011-11-28 | 2015-11-03 | Texas Instruments Incorporated | Method for detecting imperfect mounting of a rod-shaped metallic object in a metallic hollow shaft and a device |
US9483055B2 (en) | 2012-12-28 | 2016-11-01 | Irobot Corporation | Autonomous coverage robot |
US9282867B2 (en) | 2012-12-28 | 2016-03-15 | Irobot Corporation | Autonomous coverage robot |
US9460944B2 (en) * | 2014-07-02 | 2016-10-04 | SCREEN Holdings Co., Ltd. | Substrate treating apparatus and method of treating substrate |
US10250097B2 (en) * | 2015-04-17 | 2019-04-02 | Harmonic Drive Systems Inc. | Static pressure seal-equipped motor |
WO2018003718A1 (ja) * | 2016-06-27 | 2018-01-04 | 株式会社荏原製作所 | 基板洗浄装置及び基板洗浄方法 |
JP6684191B2 (ja) * | 2016-09-05 | 2020-04-22 | 株式会社Screenホールディングス | 基板洗浄装置およびそれを備える基板処理装置 |
KR102415678B1 (ko) * | 2017-03-30 | 2022-07-04 | 에이씨엠 리서치 (상하이) 인코포레이티드 | 기판 세정 장치 |
JP7041011B2 (ja) * | 2018-06-22 | 2022-03-23 | 株式会社スギノマシン | 乾燥機 |
KR102085941B1 (ko) * | 2018-08-14 | 2020-03-06 | (주)아이케이텍 | 반도체 웨이퍼용 에칭 장치 |
KR102245294B1 (ko) * | 2019-06-21 | 2021-04-28 | 세메스 주식회사 | 기판 지지 유닛 및 이를 갖는 기판 처리 장치 |
CN111958493B (zh) * | 2020-07-28 | 2022-06-21 | 天津市通洁高压泵制造有限公司 | 一种高稳定性水射流清洗盘 |
TWI789842B (zh) * | 2020-09-11 | 2023-01-11 | 日商芝浦機械電子裝置股份有限公司 | 基板處理裝置 |
KR102535766B1 (ko) * | 2021-08-24 | 2023-05-26 | (주)디바이스이엔지 | 백 노즐 어셈블리를 포함하는 기판 처리장치 |
WO2024130624A1 (zh) * | 2022-12-22 | 2024-06-27 | 深圳华大生命科学研究院 | 一种清洗设备、清洗***及清洗方法 |
Family Cites Families (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5861632A (ja) * | 1981-10-07 | 1983-04-12 | Matsushita Electric Ind Co Ltd | 洗浄槽 |
JPS5866333A (ja) * | 1981-10-14 | 1983-04-20 | Matsushita Electric Ind Co Ltd | 洗浄槽 |
JPS6148258A (ja) * | 1984-08-15 | 1986-03-08 | Toshiba Corp | シリアルデ−タ伝送装置 |
JPS6116528A (ja) * | 1985-06-14 | 1986-01-24 | Hitachi Ltd | ウエハ洗浄装置 |
US4795497A (en) * | 1985-08-13 | 1989-01-03 | Mcconnell Christopher F | Method and system for fluid treatment of semiconductor wafers |
JPS6247153A (ja) * | 1985-08-27 | 1987-02-28 | Ibiden Co Ltd | 半導体装置 |
JPS62252147A (ja) * | 1986-04-25 | 1987-11-02 | Hitachi Ltd | 半導体ウエハ移し替え装置 |
JPS63185029A (ja) * | 1987-01-28 | 1988-07-30 | Hitachi Ltd | ウエハ処理装置 |
JPS6438721A (en) * | 1987-08-04 | 1989-02-09 | Fujikura Ltd | Branching ratio variable type optical fiber coupler |
JPS6457624A (en) | 1987-08-28 | 1989-03-03 | Kurita Water Ind Ltd | Cleaning equipment |
JPS6481230A (en) | 1987-09-24 | 1989-03-27 | Hitachi Ltd | Treatment device |
JPH01120828A (ja) * | 1987-11-04 | 1989-05-12 | Oki Electric Ind Co Ltd | 半導体ウエハの自動洗浄装置 |
JPH01184926A (ja) * | 1988-01-20 | 1989-07-24 | Matsushita Electric Ind Co Ltd | 洗浄装置および洗浄方法 |
KR970003907B1 (ko) * | 1988-02-12 | 1997-03-22 | 도오교오 에레구토론 가부시끼 가이샤 | 기판처리 장치 및 기판처리 방법 |
JPH02130827A (ja) * | 1988-11-10 | 1990-05-18 | Mitsubishi Electric Corp | 半導体基板の洗浄方法およびそれに用いる洗浄装置 |
US5061144A (en) * | 1988-11-30 | 1991-10-29 | Tokyo Electron Limited | Resist process apparatus |
KR0134962B1 (ko) * | 1989-07-13 | 1998-04-22 | 나까다 구스오 | 디스크 세척장치 |
JP2746669B2 (ja) * | 1989-07-20 | 1998-05-06 | 東京エレクトロン株式会社 | 洗浄装置及び洗浄方法 |
JP2746670B2 (ja) * | 1989-07-20 | 1998-05-06 | 東京エレクトロン株式会社 | 洗浄装置 |
JP2683940B2 (ja) * | 1989-08-09 | 1997-12-03 | 信越半導体 株式会社 | ワークの自動洗浄装置 |
JPH03116731A (ja) * | 1989-09-28 | 1991-05-17 | Dan Kagaku:Kk | 半導体ウエハ用移送装置 |
JPH0414494A (ja) * | 1990-05-07 | 1992-01-20 | Toppan Printing Co Ltd | 印刷物 |
JPH0415920A (ja) * | 1990-05-09 | 1992-01-21 | Mitsubishi Electric Corp | ウエハの洗浄用保持装置およびその洗浄方法 |
JPH0456321A (ja) * | 1990-06-26 | 1992-02-24 | Fujitsu Ltd | 半導体ウエハの洗浄装置 |
JP2926944B2 (ja) * | 1990-09-18 | 1999-07-28 | 松下電器産業株式会社 | 光ディスク装置用クリーナー |
JPH04130724A (ja) * | 1990-09-21 | 1992-05-01 | Hitachi Ltd | 洗浄装置 |
JP3165435B2 (ja) * | 1990-11-17 | 2001-05-14 | 東京エレクトロン株式会社 | 洗浄装置 |
JP3162704B2 (ja) * | 1990-11-28 | 2001-05-08 | 東京エレクトロン株式会社 | 処理装置 |
JP3214503B2 (ja) * | 1990-11-28 | 2001-10-02 | 東京エレクトロン株式会社 | 洗浄装置 |
US5226437A (en) * | 1990-11-28 | 1993-07-13 | Tokyo Electron Limited | Washing apparatus |
US5297910A (en) * | 1991-02-15 | 1994-03-29 | Tokyo Electron Limited | Transportation-transfer device for an object of treatment |
US5144711A (en) * | 1991-03-25 | 1992-09-08 | Westech Systems, Inc. | Cleaning brush for semiconductor wafer |
JPH04304652A (ja) * | 1991-04-01 | 1992-10-28 | Hitachi Ltd | 熱処理装置用ボート |
JP2901098B2 (ja) * | 1991-04-02 | 1999-06-02 | 東京エレクトロン株式会社 | 洗浄装置および洗浄方法 |
JP2913119B2 (ja) * | 1991-05-07 | 1999-06-28 | 東京エレクトロン株式会社 | 被洗浄体の移載方法及びその装置並びに被移載体の位置決め装置 |
JPH0553241A (ja) * | 1991-06-10 | 1993-03-05 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
JPH0536815A (ja) * | 1991-07-25 | 1993-02-12 | Canon Inc | ウエハ搬送装置 |
JPH0536814A (ja) * | 1991-07-31 | 1993-02-12 | Sony Corp | ウエハ移載装置 |
JPH05121361A (ja) * | 1991-10-28 | 1993-05-18 | Mitsubishi Electric Corp | 半導体ウエハ冷却装置 |
JPH05182946A (ja) * | 1991-12-27 | 1993-07-23 | Shimada Phys & Chem Ind Co Ltd | 洗浄装置 |
JP2571487B2 (ja) * | 1991-12-27 | 1997-01-16 | 信越半導体株式会社 | 薄円板状ワークのスクラバー洗浄装置 |
US5327921A (en) * | 1992-03-05 | 1994-07-12 | Tokyo Electron Limited | Processing vessel for a wafer washing system |
JP3113411B2 (ja) * | 1992-03-18 | 2000-11-27 | 東京エレクトロン株式会社 | 洗浄装置 |
US5339539A (en) * | 1992-04-16 | 1994-08-23 | Tokyo Electron Limited | Spindrier |
US5345639A (en) * | 1992-05-28 | 1994-09-13 | Tokyo Electron Limited | Device and method for scrubbing and cleaning substrate |
JP2739419B2 (ja) * | 1992-09-25 | 1998-04-15 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP3194209B2 (ja) * | 1992-11-10 | 2001-07-30 | 東京エレクトロン株式会社 | 洗浄処理装置 |
JP3052105B2 (ja) * | 1992-11-20 | 2000-06-12 | 東京エレクトロン株式会社 | 洗浄処理装置 |
US5503171A (en) * | 1992-12-26 | 1996-04-02 | Tokyo Electron Limited | Substrates-washing apparatus |
US5485644A (en) * | 1993-03-18 | 1996-01-23 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating apparatus |
JP3347814B2 (ja) * | 1993-05-17 | 2002-11-20 | 大日本スクリーン製造株式会社 | 基板の洗浄・乾燥処理方法並びにその処理装置 |
US5509464A (en) * | 1993-07-30 | 1996-04-23 | Applied Materials, Inc. | Method and apparatus for cooling rectangular substrates |
US5518542A (en) * | 1993-11-05 | 1996-05-21 | Tokyo Electron Limited | Double-sided substrate cleaning apparatus |
US5626675A (en) * | 1993-11-18 | 1997-05-06 | Tokyo Electron Limited | Resist processing apparatus, substrate processing apparatus and method of transferring a processed article |
JPH07169732A (ja) * | 1993-12-13 | 1995-07-04 | Ebara Corp | ウエハ洗浄装置 |
US5730162A (en) * | 1995-01-12 | 1998-03-24 | Tokyo Electron Limited | Apparatus and method for washing substrates |
JP3625331B2 (ja) * | 1995-01-19 | 2005-03-02 | 東京エレクトロン株式会社 | 洗浄装置および洗浄方法 |
TW316995B (de) * | 1995-01-19 | 1997-10-01 | Tokyo Electron Co Ltd | |
JPH09148295A (ja) * | 1995-11-27 | 1997-06-06 | Dainippon Screen Mfg Co Ltd | 回転式基板処理装置 |
US5927305A (en) * | 1996-02-20 | 1999-07-27 | Pre-Tech Co., Ltd. | Cleaning apparatus |
JP3071398B2 (ja) * | 1996-02-20 | 2000-07-31 | 株式会社プレテック | 洗浄装置 |
US6115867A (en) | 1997-08-18 | 2000-09-12 | Tokyo Electron Limited | Apparatus for cleaning both sides of substrate |
-
1998
- 1998-08-17 US US09/135,478 patent/US6115867A/en not_active Expired - Lifetime
- 1998-08-17 EP EP98115398A patent/EP0898301B1/de not_active Expired - Lifetime
- 1998-08-17 DE DE69835988T patent/DE69835988T2/de not_active Expired - Lifetime
- 1998-08-18 KR KR1019980033458A patent/KR100530700B1/ko not_active IP Right Cessation
-
2000
- 2000-08-11 US US09/638,511 patent/US6276378B1/en not_active Expired - Lifetime
-
2005
- 2005-05-26 KR KR10-2005-0044528A patent/KR100513438B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69835988T2 (de) | 2007-06-21 |
KR20050054493A (ko) | 2005-06-10 |
KR100513438B1 (ko) | 2005-09-07 |
EP0898301A3 (de) | 2000-11-22 |
US6276378B1 (en) | 2001-08-21 |
KR19990023678A (ko) | 1999-03-25 |
EP0898301B1 (de) | 2006-09-27 |
EP0898301A2 (de) | 1999-02-24 |
KR100530700B1 (ko) | 2006-04-06 |
US6115867A (en) | 2000-09-12 |
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