DE69724333D1 - Beleuchtungssystem und Belichtungsapparat - Google Patents

Beleuchtungssystem und Belichtungsapparat

Info

Publication number
DE69724333D1
DE69724333D1 DE69724333T DE69724333T DE69724333D1 DE 69724333 D1 DE69724333 D1 DE 69724333D1 DE 69724333 T DE69724333 T DE 69724333T DE 69724333 T DE69724333 T DE 69724333T DE 69724333 D1 DE69724333 D1 DE 69724333D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
lighting system
lighting
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69724333T
Other languages
English (en)
Other versions
DE69724333T2 (de
Inventor
Satoru Mizouchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69724333D1 publication Critical patent/DE69724333D1/de
Publication of DE69724333T2 publication Critical patent/DE69724333T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/04—Refractors for light sources of lens shape
    • F21V5/048—Refractors for light sources of lens shape the lens being a simple lens adapted to cooperate with a point-like source for emitting mainly in one direction and having an axis coincident with the main light transmission direction, e.g. convergent or divergent lenses, plano-concave or plano-convex lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69724333T 1996-06-04 1997-06-02 Beleuchtungssystem und Belichtungsapparat Expired - Fee Related DE69724333T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16389196 1996-06-04
JP8163891A JPH09325275A (ja) 1996-06-04 1996-06-04 照明装置及びそれを用いた投影露光装置

Publications (2)

Publication Number Publication Date
DE69724333D1 true DE69724333D1 (de) 2003-10-02
DE69724333T2 DE69724333T2 (de) 2004-06-09

Family

ID=15782774

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69724333T Expired - Fee Related DE69724333T2 (de) 1996-06-04 1997-06-02 Beleuchtungssystem und Belichtungsapparat

Country Status (6)

Country Link
US (1) US5991088A (de)
EP (1) EP0811865B1 (de)
JP (1) JPH09325275A (de)
KR (1) KR100276797B1 (de)
DE (1) DE69724333T2 (de)
TW (1) TW417189B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US6680803B2 (en) 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
DE19809395A1 (de) 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
JP3459773B2 (ja) * 1998-06-24 2003-10-27 キヤノン株式会社 投影露光装置及びデバイスの製造方法
DE19901391A1 (de) * 1999-01-15 2000-09-14 Weigert Dedo Film Gmbh Scheinwerfer mit veränderlichem Abstrahlwinkel und mit asphärischer Frontlinse
DE10016176A1 (de) * 2000-03-31 2001-10-04 Zeiss Carl Mikrolithographisches Beleuchtungssystem und Mikrolithographische Projektionsbelichtungsanlage damit
US6868223B2 (en) * 2001-05-11 2005-03-15 Canon Kabushiki Kaisha Illumination apparatus, exposure apparatus using the same and device fabrication method
US20070285644A1 (en) * 2004-09-13 2007-12-13 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
JP4765314B2 (ja) * 2004-12-27 2011-09-07 株式会社ニコン 照明光学装置
JP4511502B2 (ja) * 2006-09-30 2010-07-28 日立ビアメカニクス株式会社 基板露光装置
TWI438471B (zh) 2011-08-24 2014-05-21 Largan Precision Co Ltd 光學影像擷取鏡頭
US20150049488A1 (en) * 2013-08-13 2015-02-19 Baoliang Wang Illumination assembly
TWI477806B (zh) 2014-01-08 2015-03-21 Largan Precision Co Ltd 光學攝像鏡頭、取像裝置及可攜裝置
TWI588526B (zh) 2016-01-22 2017-06-21 大立光電股份有限公司 成像用光學鏡頭組、取像裝置及電子裝置
TWI616700B (zh) 2017-04-17 2018-03-01 大立光電股份有限公司 光學影像擷取鏡頭組、取像裝置及電子裝置
KR102470449B1 (ko) * 2017-12-28 2022-11-24 에스엘 주식회사 차량용 램프

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3552832A (en) * 1969-10-27 1971-01-05 Rank Organisation Ltd Optical profile projection systems
US4027944A (en) * 1976-02-09 1977-06-07 American Optical Corporation Illuminated system for vertical fluorescent microscopy
GB2143963A (en) * 1983-07-25 1985-02-20 Philips Electronic Associated Projection lens system
NL8500454A (nl) * 1985-02-18 1986-09-16 Philips Nv Projektielenzenstelsel.
NL8500453A (nl) * 1985-02-18 1986-09-16 Philips Nv Projektielenzenstelsel.
US4947030A (en) * 1985-05-22 1990-08-07 Canon Kabushiki Kaisha Illuminating optical device
JPS62266513A (ja) * 1986-05-14 1987-11-19 Canon Inc 投影露光光学系
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JPH04367213A (ja) * 1991-06-13 1992-12-18 Orc Mfg Co Ltd 投影型露光装置
JPH06331941A (ja) * 1993-05-19 1994-12-02 Olympus Optical Co Ltd 投影レンズ系
JP3429525B2 (ja) * 1993-05-19 2003-07-22 オリンパス光学工業株式会社 投影レンズ系
JPH07128590A (ja) * 1993-10-29 1995-05-19 Olympus Optical Co Ltd 縮小投影レンズ
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3466002B2 (ja) * 1995-07-13 2003-11-10 三菱電機株式会社 レトロフォーカス型レンズ
JPH0936026A (ja) * 1995-07-14 1997-02-07 Canon Inc 投影露光装置及びそれを用いた半導体デバイスの製造方法

Also Published As

Publication number Publication date
US5991088A (en) 1999-11-23
EP0811865B1 (de) 2003-08-27
TW417189B (en) 2001-01-01
EP0811865A3 (de) 1998-09-02
KR980005336A (ko) 1998-03-30
JPH09325275A (ja) 1997-12-16
KR100276797B1 (ko) 2001-01-15
DE69724333T2 (de) 2004-06-09
EP0811865A2 (de) 1997-12-10

Similar Documents

Publication Publication Date Title
DE69837358D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69730903D1 (de) Belichtungsverfahren und -apparat
DE69725914D1 (de) Bilderzeugungsverfahren und System
NO990531D0 (no) Partikkel-siktanordning
DE69530273D1 (de) Beleuchtungssystem und Anzeigevorrichtung
DE69725505D1 (de) Bildkombinationsgerät und -verfahren
DE69626712D1 (de) Catadioptrisches System und dieses verwendender Belichtungsapparat
DE69731441D1 (de) Bildverteilungsverfahren und -vorrichtung
DE69730066D1 (de) Röntgenstrahlapparat
DE69728948D1 (de) Projektionsbelichtungsapparat
DE69711157D1 (de) Belichtungsapparat
DE69736161D1 (de) Bilderzeugungsverfahren und Bilderzeugungsgerät
DE69724333D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69517913D1 (de) Fixiervorrichtung und Fixierverfahren
DE69727016D1 (de) Belichtungsapparat
DE69725663D1 (de) Abrechnungsverfahren und System
PT883718E (pt) Aparelho de dragagem
DE69738440D1 (de) Projektionsvorrichtung und optisches Beleuchtungssystem dafür
DE69730380D1 (de) Druckverfahren und Drucksystem
DE69536034D1 (de) Belichtungsapparat und Belichtungsverfahren
DE69720408D1 (de) Beleuchtungsapparat
DE69834119D1 (de) Bildanalysesysteme und dafür geeignete vorrichtungen
DE69733999D1 (de) Beleuchtungssystem und damit versehene abbildevorrichtung
DE69736022D1 (de) Belichtungsapparat
DE69727739D1 (de) Belichtungsgerät

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee