DE69626712D1 - Catadioptrisches System und dieses verwendender Belichtungsapparat - Google Patents

Catadioptrisches System und dieses verwendender Belichtungsapparat

Info

Publication number
DE69626712D1
DE69626712D1 DE69626712T DE69626712T DE69626712D1 DE 69626712 D1 DE69626712 D1 DE 69626712D1 DE 69626712 T DE69626712 T DE 69626712T DE 69626712 T DE69626712 T DE 69626712T DE 69626712 D1 DE69626712 D1 DE 69626712D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
catadioptric system
catadioptric
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69626712T
Other languages
English (en)
Other versions
DE69626712T2 (de
Inventor
Tomowaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26369432&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69626712(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE69626712D1 publication Critical patent/DE69626712D1/de
Publication of DE69626712T2 publication Critical patent/DE69626712T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69626712T 1995-04-07 1996-04-04 Catadioptrisches System und dieses verwendender Belichtungsapparat Revoked DE69626712T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8238095 1995-04-07
JP03097896A JP3747958B2 (ja) 1995-04-07 1996-02-19 反射屈折光学系

Publications (2)

Publication Number Publication Date
DE69626712D1 true DE69626712D1 (de) 2003-04-24
DE69626712T2 DE69626712T2 (de) 2003-12-04

Family

ID=26369432

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69626712T Revoked DE69626712T2 (de) 1995-04-07 1996-04-04 Catadioptrisches System und dieses verwendender Belichtungsapparat

Country Status (5)

Country Link
US (1) US5689377A (de)
EP (1) EP0736789B1 (de)
JP (1) JP3747958B2 (de)
KR (1) KR960038439A (de)
DE (1) DE69626712T2 (de)

Families Citing this family (109)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09311278A (ja) * 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
JPH1020195A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5969882A (en) * 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
WO1999052004A1 (fr) 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
US6097537A (en) * 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
EP1293832A1 (de) 1998-06-08 2003-03-19 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
EP0989434B1 (de) 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptrisches System und dieses verwendender Belichtungsapparat
DE19851749A1 (de) * 1998-11-10 2000-05-11 Zeiss Carl Fa Polarisationsoptisch kompensiertes Objektiv
WO2001023933A1 (fr) * 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
US6271606B1 (en) * 1999-12-23 2001-08-07 Nikon Corporation Driving motors attached to a stage that are magnetically coupled through a chamber
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
WO2002044786A2 (en) * 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2001257143A (ja) 2000-03-09 2001-09-21 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
JP2001267226A (ja) 2000-03-21 2001-09-28 Nikon Corp 駆動装置及び露光装置、並びにデバイス及びその製造方法
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2002217095A (ja) 2000-11-14 2002-08-02 Canon Inc 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
US6490105B2 (en) * 2001-03-27 2002-12-03 Nikon Precision Inc. Stage mirror retention system
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US20040218271A1 (en) * 2001-07-18 2004-11-04 Carl Zeiss Smt Ag Retardation element made from cubic crystal and an optical system therewith
US6678038B2 (en) 2001-08-03 2004-01-13 Nikon Corporation Apparatus and methods for detecting tool-induced shift in microlithography apparatus
US6648509B2 (en) 2001-08-15 2003-11-18 Nikon Corporation Friction-drive stage
US6842226B2 (en) * 2001-09-21 2005-01-11 Nikon Corporation Flexure supported wafer table
US6600547B2 (en) 2001-09-24 2003-07-29 Nikon Corporation Sliding seal
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
US6879127B2 (en) 2002-02-12 2005-04-12 Nikon Corporation 3-ring magnetic anti-gravity support
US20030155882A1 (en) 2002-02-19 2003-08-21 Nikon Corporation Anti-gravity mount with air and magnets
DE10220324A1 (de) 2002-04-29 2003-11-13 Zeiss Carl Smt Ag Projektionsverfahren mit Pupillenfilterung und Projektionsobjektiv hierfür
US6898025B2 (en) * 2002-06-04 2005-05-24 Pentax Corporation Projection aligner and optical system therefor
US20050190446A1 (en) * 2002-06-25 2005-09-01 Carl Zeiss Amt Ag Catadioptric reduction objective
TWI251127B (en) 2002-11-12 2006-03-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20040119436A1 (en) * 2002-12-23 2004-06-24 Michael Binnard Method and apparatus for reducing countermass stroke with initial velocity
US6870600B2 (en) * 2003-01-13 2005-03-22 Nikon Corporation Vibration-attenuation devices and methods using pressurized bellows exhibiting substantially zero lateral stiffness
WO2004090952A1 (ja) 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
KR101745223B1 (ko) 2003-04-10 2017-06-08 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
EP2950148B1 (de) 2003-04-10 2016-09-21 Nikon Corporation System zur umgebungskontrolle mittels vakuum-rückförderung für eine immersionslithographievorrichtung
KR101498405B1 (ko) 2003-04-11 2015-03-04 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101830565B1 (ko) 2003-06-19 2018-02-20 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
EP2843472B1 (de) 2003-07-08 2016-12-07 Nikon Corporation Waferplatte für die Immersionslithografie
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
TWI573175B (zh) 2003-10-28 2017-03-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US20050162802A1 (en) * 2004-01-22 2005-07-28 Nikon Research Corporation Of America Offset gap control for electromagnetic devices
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US8027813B2 (en) 2004-02-20 2011-09-27 Nikon Precision, Inc. Method and system for reconstructing aberrated image profiles through simulation
TWI402893B (zh) 2004-03-25 2013-07-21 尼康股份有限公司 曝光方法
KR101391470B1 (ko) 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102004058467A1 (de) * 2004-11-25 2006-06-01 Carl Zeiss Smt Ag Wafer-Scanner und Projektionsobjektiv für die Mikrolithographie
JP2006222222A (ja) * 2005-02-09 2006-08-24 Canon Inc 投影光学系及びそれを有する露光装置
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101452145B1 (ko) 2005-05-12 2014-10-16 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR101653514B1 (ko) * 2005-06-02 2016-09-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
US7580112B2 (en) * 2005-08-25 2009-08-25 Nikon Corporation Containment system for immersion fluid in an immersion lithography apparatus
US7751026B2 (en) * 2005-08-25 2010-07-06 Nikon Corporation Apparatus and method for recovering fluid for immersion lithography
US7929109B2 (en) * 2005-10-20 2011-04-19 Nikon Corporation Apparatus and method for recovering liquid droplets in immersion lithography
US20070126999A1 (en) * 2005-12-07 2007-06-07 Nikon Corporation Apparatus and method for containing immersion liquid in immersion lithography
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070273856A1 (en) * 2006-05-25 2007-11-29 Nikon Corporation Apparatus and methods for inhibiting immersion liquid from flowing below a substrate
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
US20080043211A1 (en) * 2006-08-21 2008-02-21 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US20080198348A1 (en) * 2007-02-20 2008-08-21 Nikon Corporation Apparatus and methods for minimizing force variation from immersion liquid in lithography systems
US20080225248A1 (en) * 2007-03-15 2008-09-18 Nikon Corporation Apparatus, systems and methods for removing liquid from workpiece during workpiece processing
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US7830046B2 (en) * 2007-03-16 2010-11-09 Nikon Corporation Damper for a stage assembly
US20080231823A1 (en) * 2007-03-23 2008-09-25 Nikon Corporation Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8634055B2 (en) * 2008-10-22 2014-01-21 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
US8477284B2 (en) 2008-10-22 2013-07-02 Nikon Corporation Apparatus and method to control vacuum at porous material using multiple porous materials
US20100222898A1 (en) * 2009-01-27 2010-09-02 Nikon Corporation Stage-control systems and methods including inverse closed loop with adaptive controller
US8451431B2 (en) * 2009-01-27 2013-05-28 Nikon Corporation Control systems and methods applying iterative feedback tuning for feed-forward and synchronization control of microlithography stages and the like
US8767174B2 (en) * 2010-02-18 2014-07-01 Nikon Corporation Temperature-controlled holding devices for planar articles
EP2381310B1 (de) 2010-04-22 2015-05-06 ASML Netherlands BV Flüssigkeitshandhabungsstruktur und lithographischer Apparat
WO2012033933A1 (en) 2010-09-09 2012-03-15 Nikon Corporation Parallel linkage and actuator motor coil designs for a tube carrier
US8572518B2 (en) 2011-06-23 2013-10-29 Nikon Precision Inc. Predicting pattern critical dimensions in a lithographic exposure process
US9030057B2 (en) 2011-06-24 2015-05-12 Nikon Corporation Method and apparatus to allow a plurality of stages to operate in close proximity
US9977343B2 (en) 2013-09-10 2018-05-22 Nikon Corporation Correction of errors caused by ambient non-uniformities in a fringe-projection autofocus system in absence of a reference mirror
US10295911B2 (en) 2016-05-19 2019-05-21 Nikon Corporation Extreme ultraviolet lithography system that utilizes pattern stitching
US10712671B2 (en) 2016-05-19 2020-07-14 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US11067900B2 (en) 2016-05-19 2021-07-20 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US11099483B2 (en) 2016-05-19 2021-08-24 Nikon Corporation Euv lithography system for dense line patterning
US11934105B2 (en) 2017-04-19 2024-03-19 Nikon Corporation Optical objective for operation in EUV spectral region
US11054745B2 (en) 2017-04-26 2021-07-06 Nikon Corporation Illumination system with flat 1D-patterned mask for use in EUV-exposure tool
US11300884B2 (en) 2017-05-11 2022-04-12 Nikon Corporation Illumination system with curved 1d-patterned mask for use in EUV-exposure tool
CN111366338B (zh) * 2020-04-24 2021-11-19 华中科技大学 一种成虚像光学***的成像质量检测装置及方法
CN111419172B (zh) * 2020-04-29 2021-05-18 华中科技大学 一种用于视力检测***的成像质量检测方法及检测装置
CN114019653B (zh) * 2021-11-04 2023-03-31 中国科学院光电技术研究所 一种用于衍射光学元件测量的傅里叶变换物镜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US4779966A (en) * 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
US5220454A (en) * 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US5402267A (en) * 1991-02-08 1995-03-28 Carl-Zeiss-Stiftung Catadioptric reduction objective
JP3085481B2 (ja) * 1991-09-28 2000-09-11 株式会社ニコン 反射屈折縮小投影光学系、及び該光学系を備えた露光装置
EP0604093B1 (de) * 1992-12-24 1997-11-19 Nikon Corporation Verkleinerndes katadioptrisches Projektionssystem
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
US5559629A (en) * 1994-08-19 1996-09-24 Tamarack Scientific Co., Inc. Unit magnification projection system and method

Also Published As

Publication number Publication date
EP0736789B1 (de) 2003-03-19
JP3747958B2 (ja) 2006-02-22
DE69626712T2 (de) 2003-12-04
KR960038439A (ko) 1996-11-21
EP0736789A3 (de) 1997-02-05
JPH08334695A (ja) 1996-12-17
EP0736789A2 (de) 1996-10-09
US5689377A (en) 1997-11-18

Similar Documents

Publication Publication Date Title
DE69626712D1 (de) Catadioptrisches System und dieses verwendender Belichtungsapparat
DE69933973D1 (de) Catadioptrisches System und dieses verwendender Belichtungsapparat
DE69837358D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69627607D1 (de) Prozesskassette und elektrophotographisches Bilderzeugungsgerät
DE69624634D1 (de) Arbeitseinheit und elektrophotographisches Bilderzeugungsgerät
DE69612892D1 (de) Bildherstellungsverfahren, Bildherstellungsgerät und Tonerelemente
DE69719251D1 (de) Prozesskassette und elektrografisches Bilderzeugungsgerät
DE69615735D1 (de) Prozesskassette und Bilderzeugungsgerät
DE69721448D1 (de) Prozesskassette und elektrophotographisches Bilderzeugungsgerät
DE69721392D1 (de) Prozesskassette und elektrofotografisches Bilderzeugungsgerät
DE69614436D1 (de) Prozesskassette und Bilderzeugungsgerät
DE69630996D1 (de) Prozesskartusche, Teil davon, Entwicklungsgerät, und Bilderzeugungsgerät
DE69729623D1 (de) Prozesskassette und elektrofotografisches Bilderzeugungsgerät
DE69717884D1 (de) Prozesskassette und elektrophotographisches Bilderzeugungsgerät
DE69631928D1 (de) Bilderzeugungsgerät und -verfahren
DE69721427D1 (de) Entwicklungseinheit und elektrophotographisches Bilderzeugungsgerät
DE69624873D1 (de) Bilderzeugungsgerät und -verfahren
DE69721937D1 (de) Entwicklungseinheit und elektrophotographisches Bilderzeugungsgerät
DE69628968D1 (de) Prozesskassette und Bilderzeugungsgerät
DE69623096D1 (de) Belichtungsapparat und -verfahren
DE69512575D1 (de) Elektrografisches Gerät und Bilderzeugungsverfahren
DE69616137D1 (de) Führungsmittel und elektrophotographisches Bilderzeugungsgerät
DE69702641D1 (de) Belichtungssystem und belichtungsgerät für uv-lithographie
DE69734544D1 (de) Prozesskassette und elektrografisches Bilderzeugungsgerät
DE69717388D1 (de) Entwicklungsanordnung und elektrofotografischer Bilderzeugungsapparat

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8331 Complete revocation
8363 Opposition against the patent
8380 Miscellaneous part iii

Free format text: DIE ERTEILUNG VOM 15.04.2004 UND DIE ZURUECKNAHME VOM 18.02.2010 WURDEN GELOESCHT WEGEN EINGANG DES EINSPRUCHS.