DE69736022D1 - Belichtungsapparat - Google Patents
BelichtungsapparatInfo
- Publication number
- DE69736022D1 DE69736022D1 DE69736022T DE69736022T DE69736022D1 DE 69736022 D1 DE69736022 D1 DE 69736022D1 DE 69736022 T DE69736022 T DE 69736022T DE 69736022 T DE69736022 T DE 69736022T DE 69736022 D1 DE69736022 D1 DE 69736022D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure apparatus
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Projection-Type Copiers In General (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6052596 | 1996-03-18 | ||
JP6052596 | 1996-03-18 | ||
JP26148896 | 1996-10-02 | ||
JP26148896 | 1996-10-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69736022D1 true DE69736022D1 (de) | 2006-07-06 |
DE69736022T2 DE69736022T2 (de) | 2006-10-26 |
Family
ID=26401603
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69722694T Expired - Fee Related DE69722694T2 (de) | 1996-03-18 | 1997-03-17 | Belichtungsapparat |
DE69736022T Expired - Fee Related DE69736022T2 (de) | 1996-03-18 | 1997-03-17 | Belichtungsapparat |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69722694T Expired - Fee Related DE69722694T2 (de) | 1996-03-18 | 1997-03-17 | Belichtungsapparat |
Country Status (3)
Country | Link |
---|---|
US (1) | US5745221A (de) |
EP (2) | EP0797121B1 (de) |
DE (2) | DE69722694T2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3142821B2 (ja) * | 1998-08-27 | 2001-03-07 | 株式会社エヌ・ティ・ティ・ドコモ | 情報通信ネットワークの課金方法 |
US6391528B1 (en) | 2000-04-03 | 2002-05-21 | 3M Innovative Properties Company | Methods of making wire grid optical elements by preferential deposition of material on a substrate |
FI118165B (fi) * | 2002-12-23 | 2007-07-31 | Avantone Oy | Mikro-optiseen hilarakenteeseen perustuva visuaalinen efekti |
KR101270408B1 (ko) * | 2005-01-14 | 2013-06-07 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 및 전자 장치 제조 방법 |
JP2009253209A (ja) * | 2008-04-10 | 2009-10-29 | Canon Inc | 露光装置及びデバイス製造方法 |
WO2012066489A2 (en) * | 2010-11-16 | 2012-05-24 | Eulitha A.G. | Method and apparatus for printing high-resolution two-dimensional periodic patterns |
CN103235489B (zh) * | 2013-05-15 | 2015-01-07 | 中国科学院光电技术研究所 | 可变周期多光束干涉光刻的方法 |
CN103616803B (zh) * | 2013-11-25 | 2015-09-09 | 中国科学院长春光学精密机械与物理研究所 | 光栅尺真空复制曝光设备 |
CN106597471B (zh) * | 2016-11-08 | 2019-05-24 | 上海禾赛光电科技有限公司 | 具有透明障碍物自动检测功能的车辆及方法 |
US11036145B2 (en) * | 2018-12-21 | 2021-06-15 | Applied Materials, Inc. | Large area self imaging lithography based on broadband light source |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5638211A (en) * | 1990-08-21 | 1997-06-10 | Nikon Corporation | Method and apparatus for increasing the resolution power of projection lithography exposure system |
US5367588A (en) * | 1992-10-29 | 1994-11-22 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications | Method of fabricating Bragg gratings using a silica glass phase grating mask and mask used by same |
JPH0536586A (ja) * | 1991-08-02 | 1993-02-12 | Canon Inc | 像投影方法及び該方法を用いた半導体デバイスの製造方法 |
JP3194155B2 (ja) * | 1992-01-31 | 2001-07-30 | キヤノン株式会社 | 半導体デバイスの製造方法及びそれを用いた投影露光装置 |
KR970003593B1 (en) * | 1992-09-03 | 1997-03-20 | Samsung Electronics Co Ltd | Projection exposure method and device using mask |
US5642183A (en) * | 1993-08-27 | 1997-06-24 | Sharp Kabushiki Kaisha | Spatial filter used in a reduction-type projection printing apparatus |
GB2289771B (en) * | 1994-05-26 | 1997-07-30 | Northern Telecom Ltd | Forming Bragg gratings in photosensitive waveguides |
-
1997
- 1997-03-17 DE DE69722694T patent/DE69722694T2/de not_active Expired - Fee Related
- 1997-03-17 EP EP97104531A patent/EP0797121B1/de not_active Expired - Lifetime
- 1997-03-17 EP EP03012895A patent/EP1347338B1/de not_active Expired - Lifetime
- 1997-03-17 DE DE69736022T patent/DE69736022T2/de not_active Expired - Fee Related
- 1997-03-18 US US08/816,831 patent/US5745221A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0797121B1 (de) | 2003-06-11 |
EP1347338B1 (de) | 2006-05-31 |
US5745221A (en) | 1998-04-28 |
DE69736022T2 (de) | 2006-10-26 |
EP1347338A1 (de) | 2003-09-24 |
EP0797121A3 (de) | 1998-06-03 |
EP0797121A2 (de) | 1997-09-24 |
DE69722694D1 (de) | 2003-07-17 |
DE69722694T2 (de) | 2003-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PANASONIC CORP., KADOMA, OSAKA, JP |
|
8339 | Ceased/non-payment of the annual fee |