DE69400042T2 - Oberflächenemittierender Laser und dessen Herstellungsverfahren - Google Patents

Oberflächenemittierender Laser und dessen Herstellungsverfahren

Info

Publication number
DE69400042T2
DE69400042T2 DE69400042T DE69400042T DE69400042T2 DE 69400042 T2 DE69400042 T2 DE 69400042T2 DE 69400042 T DE69400042 T DE 69400042T DE 69400042 T DE69400042 T DE 69400042T DE 69400042 T2 DE69400042 T2 DE 69400042T2
Authority
DE
Germany
Prior art keywords
manufacturing process
emitting laser
surface emitting
laser
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69400042T
Other languages
English (en)
Other versions
DE69400042D1 (de
Inventor
Kaori Kurihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of DE69400042D1 publication Critical patent/DE69400042D1/de
Application granted granted Critical
Publication of DE69400042T2 publication Critical patent/DE69400042T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18305—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18341—Intra-cavity contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
    • H01S5/18352—Mesa with inclined sidewall
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • H01S5/2063—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion obtained by particle bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2081—Methods of obtaining the confinement using special etching techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2081—Methods of obtaining the confinement using special etching techniques
    • H01S5/2086—Methods of obtaining the confinement using special etching techniques lateral etch control, e.g. mask induced

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
DE69400042T 1993-02-01 1994-02-01 Oberflächenemittierender Laser und dessen Herstellungsverfahren Expired - Fee Related DE69400042T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5014548A JPH07118570B2 (ja) 1993-02-01 1993-02-01 面発光素子およびその製造方法

Publications (2)

Publication Number Publication Date
DE69400042D1 DE69400042D1 (de) 1996-02-01
DE69400042T2 true DE69400042T2 (de) 1996-11-14

Family

ID=11864210

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69400042T Expired - Fee Related DE69400042T2 (de) 1993-02-01 1994-02-01 Oberflächenemittierender Laser und dessen Herstellungsverfahren

Country Status (4)

Country Link
US (2) US5500868A (de)
EP (1) EP0609836B1 (de)
JP (1) JPH07118570B2 (de)
DE (1) DE69400042T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112014001948B4 (de) 2013-04-10 2021-10-21 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements

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JPH08181384A (ja) * 1994-12-21 1996-07-12 Nec Corp 面発光レーザ及びその作製方法
AU7730296A (en) * 1995-11-13 1997-06-05 Board Of Regents, The University Of Texas System Low threshold microcavity light emitter
US6370179B1 (en) 1996-11-12 2002-04-09 Board Of Regents, The University Of Texas System Low threshold microcavity light emitter
DE19813727C2 (de) * 1998-03-27 2000-04-13 Siemens Ag Vertikalresonator-Laserdiode und Verfahren zu deren Herstellung
JP2000012963A (ja) * 1998-06-23 2000-01-14 Nec Corp 光半導体装置の製造方法
KR100275532B1 (ko) * 1998-09-21 2001-01-15 이계철 자동정렬 이온주입 공정을 이용한 고출력 반도체 레이저 제조방법
US6331873B1 (en) 1998-12-03 2001-12-18 Massachusetts Institute Of Technology High-precision blooming control structure formation for an image sensor
DE19900816C2 (de) * 1999-01-12 2001-04-26 Siemens Ag Vertikalresonator-Laserdiode mit optimierter aktiver Fläche, sowie Laserzeiger oder Laserpointer
DE19908426C2 (de) 1999-02-26 2001-03-22 Siemens Ag Vertikalresonator-Laserdiode mit einer lichtabsorbierenden Schicht und Verfahren zu ihrer Herstellung
WO2001035506A1 (en) * 1999-11-12 2001-05-17 Princeton Lightwave, Inc. Control of current spreading in semiconductor laser diodes
DE10012869C2 (de) * 2000-03-16 2002-05-29 Infineon Technologies Ag Vertikalresonator-Laserdiode mit koplanaren elektrischen Anschlußkontakten und Verfahren zu ihrer Herstellung
US7457340B2 (en) * 2002-01-18 2008-11-25 Wisconsin Alumni Research Foundation High coherent power, two-dimensional surface-emitting semiconductor diode array laser
KR100499128B1 (ko) * 2002-07-19 2005-07-04 삼성전기주식회사 전류제한층이 형성된 반도체 레이저 다이오드 및 그제조방법
US7157730B2 (en) * 2002-12-20 2007-01-02 Finisar Corporation Angled wafer rotating ion implantation
JP2005109102A (ja) * 2003-09-30 2005-04-21 Mitsubishi Electric Corp モノリシック半導体レーザおよびその製造方法
US20050194584A1 (en) * 2003-11-12 2005-09-08 Slater David B.Jr. LED fabrication via ion implant isolation
US7558305B2 (en) * 2003-12-31 2009-07-07 Wisconsin Alumni Research Foundation Intersubband mid-infrared electroluminescent semiconductor devices
US7592634B2 (en) * 2004-05-06 2009-09-22 Cree, Inc. LED fabrication via ion implant isolation
US7403552B2 (en) * 2006-03-10 2008-07-22 Wisconsin Alumni Research Foundation High efficiency intersubband semiconductor lasers
JP5004072B2 (ja) * 2006-05-17 2012-08-22 学校法人慶應義塾 イオン照射効果評価方法、プロセスシミュレータ及びデバイスシミュレータ
US7754590B2 (en) * 2006-08-30 2010-07-13 Infineon Technologies Austria Ag Method of manufacturing a semiconductor device comprising a field stop zone at a specific depth
JP2008159627A (ja) * 2006-12-20 2008-07-10 Rohm Co Ltd 半導体発光素子
JP4947778B2 (ja) * 2006-12-27 2012-06-06 富士通株式会社 光半導体素子及びその製造方法
US7505503B2 (en) * 2007-02-23 2009-03-17 Cosemi Technologies, Inc. Vertical cavity surface emitting laser (VCSEL) and related method
KR101103963B1 (ko) * 2009-12-01 2012-01-13 엘지이노텍 주식회사 발광소자 및 그 제조방법
JP2011192816A (ja) * 2010-03-15 2011-09-29 Panasonic Corp 半導体発光素子
JP2015119143A (ja) * 2013-12-20 2015-06-25 セイコーエプソン株式会社 面発光レーザーおよび原子発振器
CN109088310A (zh) * 2018-10-16 2018-12-25 厦门乾照半导体科技有限公司 一种极小发散角的垂直腔面发射激光器芯片及其制备方法
JP2021009896A (ja) * 2019-06-28 2021-01-28 住友電気工業株式会社 面発光レーザ
WO2024014140A1 (ja) * 2022-07-14 2024-01-18 ソニーセミコンダクタソリューションズ株式会社 面発光レーザ及び面発光レーザの製造方法

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JPS5635487A (en) * 1979-08-30 1981-04-08 Sony Corp Manufacture of semiconductor device
JPS6140077A (ja) * 1984-07-31 1986-02-26 Res Dev Corp Of Japan ＧａＡｓ／ＧａＡｌＡｓ埋め込み型面発光レーザ発振装置の製造方法
JPS61171136A (ja) * 1985-01-25 1986-08-01 Toshiba Corp 半導体結晶のメサエツチング方法
JPH02237088A (ja) * 1989-03-09 1990-09-19 Mitsubishi Electric Corp 半導体レーザの製造方法
US5160492A (en) * 1989-04-24 1992-11-03 Hewlett-Packard Company Buried isolation using ion implantation and subsequent epitaxial growth
JPH03190181A (ja) * 1989-12-19 1991-08-20 Nec Corp 面発光レーザとその製造方法
US5115442A (en) * 1990-04-13 1992-05-19 At&T Bell Laboratories Top-emitting surface emitting laser structures
JPH0417382A (ja) * 1990-05-11 1992-01-22 Hitachi Ltd 半導体レーザ
US5114877A (en) * 1991-01-08 1992-05-19 Xerox Corporation Method of fabricating quantum wire semiconductor laser via photo induced evaporation enhancement during in situ epitaxial growth
US5274655A (en) * 1992-03-26 1993-12-28 Motorola, Inc. Temperature insensitive vertical cavity surface emitting laser
US5349210A (en) * 1993-02-02 1994-09-20 Motorola, Inc. Optical reading head with angled array

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112014001948B4 (de) 2013-04-10 2021-10-21 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements

Also Published As

Publication number Publication date
EP0609836B1 (de) 1995-12-20
DE69400042D1 (de) 1996-02-01
JPH06232494A (ja) 1994-08-19
US5500868A (en) 1996-03-19
EP0609836A1 (de) 1994-08-10
US5637511A (en) 1997-06-10
JPH07118570B2 (ja) 1995-12-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee