DE60239062D1 - Verfahren für durch einen fokussierten Elektronenstrahl induziertes Ätzen - Google Patents

Verfahren für durch einen fokussierten Elektronenstrahl induziertes Ätzen

Info

Publication number
DE60239062D1
DE60239062D1 DE60239062T DE60239062T DE60239062D1 DE 60239062 D1 DE60239062 D1 DE 60239062D1 DE 60239062 T DE60239062 T DE 60239062T DE 60239062 T DE60239062 T DE 60239062T DE 60239062 D1 DE60239062 D1 DE 60239062D1
Authority
DE
Germany
Prior art keywords
electron beam
focused electron
beam induced
reaction product
induced etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60239062T
Other languages
English (en)
Inventor
Hans Wilfried Peter Dr Koops
Klaus Dr Edinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMS GmbH
Original Assignee
Carl Zeiss SMS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMS GmbH filed Critical Carl Zeiss SMS GmbH
Application granted granted Critical
Publication of DE60239062D1 publication Critical patent/DE60239062D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31742—Etching microareas for repairing masks
    • H01J2237/31744—Etching microareas for repairing masks introducing gas in vicinity of workpiece
DE60239062T 2002-10-16 2002-10-16 Verfahren für durch einen fokussierten Elektronenstrahl induziertes Ätzen Expired - Lifetime DE60239062D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02023217A EP1411538B1 (de) 2002-10-16 2002-10-16 Verfahren für durch einen fokussierten Elektronenstrahl induziertes Ätzen

Publications (1)

Publication Number Publication Date
DE60239062D1 true DE60239062D1 (de) 2011-03-10

Family

ID=32039139

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60239062T Expired - Lifetime DE60239062D1 (de) 2002-10-16 2002-10-16 Verfahren für durch einen fokussierten Elektronenstrahl induziertes Ätzen

Country Status (7)

Country Link
US (1) US7452477B2 (de)
EP (1) EP1411538B1 (de)
JP (1) JP2004140346A (de)
AT (1) ATE497250T1 (de)
DE (1) DE60239062D1 (de)
IL (1) IL157999A (de)
TW (1) TWI334155B (de)

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EP1363164B1 (de) 2002-05-16 2015-04-29 NaWoTec GmbH Verfahren zum Ätzen einer Oberfläche mittels durch fokussierten Elektronenstrahl hervorgerufenen chemischen Reaktionen auf dieser Oberfläche
DE10302794A1 (de) * 2003-01-24 2004-07-29 Nawotec Gmbh Verfahren und Vorrichtung zur Herstellung von Korpuskularstrahlsystemen
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US7674389B2 (en) * 2004-10-26 2010-03-09 The Regents Of The University Of California Precision shape modification of nanodevices with a low-energy electron beam
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US8541066B2 (en) * 2007-11-26 2013-09-24 University Of North Carolina At Charlotte Light-induced directed self-assembly of periodic sub-wavelength nanostructures
TWI479570B (zh) * 2007-12-26 2015-04-01 Nawotec Gmbh 從樣本移除材料之方法及系統
DE102008009640A1 (de) 2008-02-18 2009-08-27 Carl Zeiss Nts Gmbh Prozessierungssystem
WO2009114230A2 (en) * 2008-03-07 2009-09-17 Carl Zeiss Smt, Inc. Reducing particle implantation
US20100068408A1 (en) * 2008-09-16 2010-03-18 Omniprobe, Inc. Methods for electron-beam induced deposition of material inside energetic-beam microscopes
KR101610260B1 (ko) * 2008-12-15 2016-04-08 삼성전자주식회사 전자빔 어닐링 장치 및 이를 이용한 어닐링 방법
WO2011016208A1 (ja) * 2009-08-07 2011-02-10 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡及び試料観察方法
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US9721754B2 (en) * 2011-04-26 2017-08-01 Carl Zeiss Smt Gmbh Method and apparatus for processing a substrate with a focused particle beam
US9587632B2 (en) 2012-03-30 2017-03-07 General Electric Company Thermally-controlled component and thermal control process
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US9671030B2 (en) 2012-03-30 2017-06-06 General Electric Company Metallic seal assembly, turbine component, and method of regulating airflow in turbo-machinery
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US9123506B2 (en) * 2013-06-10 2015-09-01 Fei Company Electron beam-induced etching

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Also Published As

Publication number Publication date
ATE497250T1 (de) 2011-02-15
IL157999A (en) 2013-06-27
TWI334155B (en) 2010-12-01
US7452477B2 (en) 2008-11-18
US20050072753A1 (en) 2005-04-07
EP1411538B1 (de) 2011-01-26
EP1411538A1 (de) 2004-04-21
JP2004140346A (ja) 2004-05-13
TW200406803A (en) 2004-05-01
IL157999A0 (en) 2004-03-28

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