DE3787409T2 - Transportvorrichtung für einen Retikel. - Google Patents

Transportvorrichtung für einen Retikel.

Info

Publication number
DE3787409T2
DE3787409T2 DE87108418T DE3787409T DE3787409T2 DE 3787409 T2 DE3787409 T2 DE 3787409T2 DE 87108418 T DE87108418 T DE 87108418T DE 3787409 T DE3787409 T DE 3787409T DE 3787409 T2 DE3787409 T2 DE 3787409T2
Authority
DE
Germany
Prior art keywords
reticle
transport device
transport
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE87108418T
Other languages
English (en)
Other versions
DE3787409D1 (de
Inventor
Joseph L Laganza
Orest Engelbrecht
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
SVG Lithography Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SVG Lithography Systems Inc filed Critical SVG Lithography Systems Inc
Publication of DE3787409D1 publication Critical patent/DE3787409D1/de
Application granted granted Critical
Publication of DE3787409T2 publication Critical patent/DE3787409T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/38—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members using fluid bearings or fluid cushion supports
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0662—Details of hydrostatic bearings independent of fluid supply or direction of load
    • F16C32/0666—Details of hydrostatic bearings independent of fluid supply or direction of load of bearing pads
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/0002—Arrangements for supporting, fixing or guiding the measuring instrument or the object to be measured
    • G01B5/0004—Supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2322/00—Apparatus used in shaping articles
    • F16C2322/39—General build up of machine tools, e.g. spindles, slides, actuators
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S33/00—Geometrical instruments
    • Y10S33/02—Air

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Library & Information Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Machine Tool Units (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE87108418T 1986-06-24 1987-06-11 Transportvorrichtung für einen Retikel. Expired - Lifetime DE3787409T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/877,817 US4719705A (en) 1986-06-24 1986-06-24 Reticle transporter

Publications (2)

Publication Number Publication Date
DE3787409D1 DE3787409D1 (de) 1993-10-21
DE3787409T2 true DE3787409T2 (de) 1994-01-13

Family

ID=25370785

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87108418T Expired - Lifetime DE3787409T2 (de) 1986-06-24 1987-06-11 Transportvorrichtung für einen Retikel.

Country Status (6)

Country Link
US (1) US4719705A (de)
EP (1) EP0250964B1 (de)
JP (1) JP2550075B2 (de)
KR (1) KR950001724B1 (de)
CA (1) CA1271313C (de)
DE (1) DE3787409T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5098204A (en) * 1989-11-03 1992-03-24 John H. Blanz Company, Inc. Load balanced planar bearing assembly especially for a cryogenic probe station
US5166606A (en) * 1989-11-03 1992-11-24 John H. Blanz Company, Inc. High efficiency cryogenic test station
US5077523A (en) * 1989-11-03 1991-12-31 John H. Blanz Company, Inc. Cryogenic probe station having movable chuck accomodating variable thickness probe cards
US5160883A (en) * 1989-11-03 1992-11-03 John H. Blanz Company, Inc. Test station having vibrationally stabilized X, Y and Z movable integrated circuit receiving support
WO1995011103A1 (en) * 1993-10-19 1995-04-27 Steven Edward Goostrey Electro-pneumatic machining jig
JP3247554B2 (ja) * 1994-07-19 2002-01-15 キヤノン株式会社 基板搬送装置およびこれを用いた露光装置
JPH08293459A (ja) * 1995-04-21 1996-11-05 Nikon Corp ステージ駆動制御方法及びその装置
JP3709896B2 (ja) * 1995-06-15 2005-10-26 株式会社ニコン ステージ装置
JPH0953640A (ja) * 1995-08-18 1997-02-25 Mitsutoyo Corp 静圧軸受装置
US5883703A (en) * 1996-02-08 1999-03-16 Megapanel Corporation Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
US6315450B1 (en) * 1999-02-01 2001-11-13 Etec Systems, Inc. Diaphragm preload air bearing
US6271530B1 (en) * 1999-04-19 2001-08-07 Applied Materials, Inc. Apparatus for reducing distortion in fluid bearing surfaces
US6239863B1 (en) 1999-10-08 2001-05-29 Silicon Valley Group, Inc. Removable cover for protecting a reticle, system including and method of using the same
US6847434B2 (en) * 2000-02-10 2005-01-25 Asml Holding N.V. Method and apparatus for a pellicle frame with porous filtering inserts
US6507390B1 (en) 2000-02-10 2003-01-14 Asml Us, Inc. Method and apparatus for a reticle with purged pellicle-to-reticle gap
US6307619B1 (en) 2000-03-23 2001-10-23 Silicon Valley Group, Inc. Scanning framing blade apparatus
DE60219844T2 (de) * 2001-03-01 2008-01-17 Asml Netherlands B.V. Verfahren zur Übernahme einer lithographischen Maske
US6809793B1 (en) 2002-01-16 2004-10-26 Advanced Micro Devices, Inc. System and method to monitor reticle heating
US6906783B2 (en) * 2002-02-22 2005-06-14 Asml Holding N.V. System for using a two part cover for protecting a reticle
US6822731B1 (en) * 2003-06-18 2004-11-23 Asml Holding N.V. Method and apparatus for a pellicle frame with heightened bonding surfaces
US6862817B1 (en) * 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
KR100568207B1 (ko) * 2004-02-13 2006-04-05 삼성전자주식회사 이송장치
US20060201848A1 (en) * 2005-03-14 2006-09-14 Ting-Yu Lin Method for reducing mask precipitation defects
US8029947B2 (en) 2005-09-01 2011-10-04 Micron Technology, Inc. Systems and methods for implementing and manufacturing reticles for use in photolithography tools
US8282281B2 (en) * 2007-02-14 2012-10-09 Integrated Dynamics Engineering Gmbh Air bearing with consideration of high-frequency resonances
JP4445528B2 (ja) * 2007-07-11 2010-04-07 住友重機械工業株式会社 静圧軸受
DE102022133619A1 (de) 2022-12-16 2024-06-27 Schaeffler Technologies AG & Co. KG Hydrodynamisches oder hydrostatisches Gleitlager

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1117095A (fr) * 1954-12-18 1956-05-16 Gendron Freres Sa Dispositif de graissage sous pression pour glissières ou analogues
CH415188A (de) * 1963-08-23 1966-06-15 Max Fehr C O Liberia Mining Co Magnetische Vorrichtung zum Festhalten und zum berührungslosen Verschieben zweier Teile an- bzw. relativ zueinander
GB1107721A (en) * 1963-12-18 1968-03-27 Mach Tool Industry Res Ass Improvements in or relating to fluid bearings
US3393648A (en) * 1965-12-28 1968-07-23 Optomechanisms Inc Air bearing table
US3476444A (en) * 1968-04-04 1969-11-04 James D Dunfee Hydrostatic bearing unit
US3722996A (en) * 1971-01-04 1973-03-27 Electromask Inc Optical pattern generator or repeating projector or the like
GB1393035A (en) * 1971-07-09 1975-05-07 Olivetti & Co Spa Precision measuring apparatus with aerostatic bearings
US4013280A (en) * 1976-08-09 1977-03-22 Anwar Chitayat Workpiece positioning table
DE3144120A1 (de) * 1981-11-06 1983-05-19 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Schlittenmikrotom
JPS58116735A (ja) * 1981-12-29 1983-07-12 Canon Inc 投影焼付方法
EP0121829B1 (de) * 1983-03-30 1987-05-20 Wyler AG Wasserwaagen und Messwerkzeuge Lagerkörper für Luftlagerungen
US4643590A (en) * 1985-03-15 1987-02-17 Federal Products Corporation Guide system

Also Published As

Publication number Publication date
EP0250964B1 (de) 1993-09-15
EP0250964A3 (en) 1989-03-22
KR950001724B1 (ko) 1995-02-28
DE3787409D1 (de) 1993-10-21
JPS63260020A (ja) 1988-10-27
KR880001033A (ko) 1988-03-31
US4719705A (en) 1988-01-19
EP0250964A2 (de) 1988-01-07
CA1271313A (en) 1990-07-10
JP2550075B2 (ja) 1996-10-30
CA1271313C (en) 1990-07-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition