DE3483498D1 - Halbleiteranordnung des harzverkapselungstyps. - Google Patents

Halbleiteranordnung des harzverkapselungstyps.

Info

Publication number
DE3483498D1
DE3483498D1 DE8484107525T DE3483498T DE3483498D1 DE 3483498 D1 DE3483498 D1 DE 3483498D1 DE 8484107525 T DE8484107525 T DE 8484107525T DE 3483498 T DE3483498 T DE 3483498T DE 3483498 D1 DE3483498 D1 DE 3483498D1
Authority
DE
Germany
Prior art keywords
resin enclosure
semiconductor resin
enclosure type
semiconductor
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8484107525T
Other languages
English (en)
Inventor
Toshiharu Sakurai
Seiichi Hirata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3483498D1 publication Critical patent/DE3483498D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Geometry or layout of the interconnection structure
    • H01L23/5286Arrangements of power or ground buses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • H01L23/3171Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Geometry or layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Geometry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Formation Of Insulating Films (AREA)
DE8484107525T 1983-06-30 1984-06-29 Halbleiteranordnung des harzverkapselungstyps. Expired - Lifetime DE3483498D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58118519A JPS6010645A (ja) 1983-06-30 1983-06-30 樹脂封止型半導体装置

Publications (1)

Publication Number Publication Date
DE3483498D1 true DE3483498D1 (de) 1990-12-06

Family

ID=14738627

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484107525T Expired - Lifetime DE3483498D1 (de) 1983-06-30 1984-06-29 Halbleiteranordnung des harzverkapselungstyps.

Country Status (4)

Country Link
US (1) US4654692A (de)
EP (1) EP0130591B1 (de)
JP (1) JPS6010645A (de)
DE (1) DE3483498D1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61129014U (de) * 1985-01-30 1986-08-13
JPS6457732A (en) * 1987-08-28 1989-03-06 Matsushita Electronics Corp Semiconductor device
US4835591A (en) * 1987-12-29 1989-05-30 Mitsubishi Denki Kabushiki Kaisha Wiring arrangement for semiconductor devices
EP0327336B1 (de) * 1988-02-01 1997-12-10 Semiconductor Energy Laboratory Co., Ltd. Elektronische Anordnungen mit Kohlenstoffschichten
JPH0274039A (ja) * 1988-09-09 1990-03-14 Texas Instr Japan Ltd 電子回路装置
JPH02192146A (ja) * 1989-01-20 1990-07-27 Toshiba Corp 半導体装置
JPH03129738A (ja) * 1989-07-10 1991-06-03 Nec Corp 半導体装置
NL8901822A (nl) * 1989-07-14 1991-02-01 Philips Nv Geintegreerde schakeling met stroomdetectie.
US5317194A (en) * 1989-10-17 1994-05-31 Kabushiki Kaisha Toshiba Resin-sealed semiconductor device having intermediate silicon thermal dissipation means and embedded heat sink
EP0499063B1 (de) * 1991-01-22 2005-09-28 Nec Corporation Plastikumhüllte integrierte Halbleiterschaltung mit einer Verdrahtungschicht
US5686356A (en) 1994-09-30 1997-11-11 Texas Instruments Incorporated Conductor reticulation for improved device planarity
KR0170316B1 (ko) * 1995-07-13 1999-02-01 김광호 반도체 장치의 패드 설계 방법
JP3500308B2 (ja) 1997-08-13 2004-02-23 インターナショナル・ビジネス・マシーンズ・コーポレーション 集積回路
JP3826022B2 (ja) 2000-12-15 2006-09-27 キヤノン株式会社 配線を有する基板及び電子源及び画像表示装置
US20030122258A1 (en) * 2001-12-28 2003-07-03 Sudhakar Bobba Current crowding reduction technique using slots
US6818996B2 (en) * 2002-12-20 2004-11-16 Lsi Logic Corporation Multi-level redistribution layer traces for reducing current crowding in flipchip solder bumps
WO2005048314A2 (en) * 2003-11-12 2005-05-26 Silicon Pipe, Inc. Tapered dielectric and conductor structures and applications thereof
US7466021B2 (en) * 2003-11-17 2008-12-16 Interconnect Portfolio, Llp Memory packages having stair step interconnection layers
US7253528B2 (en) * 2005-02-01 2007-08-07 Avago Technologies General Ip Pte. Ltd. Trace design to minimize electromigration damage to solder bumps
US9177914B2 (en) * 2012-11-15 2015-11-03 Taiwan Semiconductor Manufacturing Company, Ltd. Metal pad structure over TSV to reduce shorting of upper metal layer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3766448A (en) * 1972-02-04 1973-10-16 Gen Instrument Corp Integrated igfet circuits with increased inversion voltage under metallization runs
US4438450A (en) * 1979-11-30 1984-03-20 Bell Telephone Laboratories, Incorporated Solid state device with conductors having chain-shaped grain structure
JPS56150830A (en) * 1980-04-25 1981-11-21 Hitachi Ltd Semiconductor device
JPS5772349A (en) * 1980-10-23 1982-05-06 Nec Corp Semiconductor integrated circuit device
DE3115406A1 (de) * 1981-04-16 1982-11-25 Robert Bosch Gmbh, 7000 Stuttgart Anordnung zur erhoehung des ausgangsstroms von verstaerkern

Also Published As

Publication number Publication date
EP0130591A2 (de) 1985-01-09
JPH0228894B2 (de) 1990-06-27
JPS6010645A (ja) 1985-01-19
US4654692A (en) 1987-03-31
EP0130591B1 (de) 1990-10-31
EP0130591A3 (en) 1986-09-17

Similar Documents

Publication Publication Date Title
DE3484313D1 (de) Integrierte halbleiterschaltung.
DE3485409D1 (de) Halbleiterschaltvorrichtung.
NL191912C (nl) Geïntegreerd circuit.
DE3382212D1 (de) Halbleiterspeicher.
DE3381545D1 (de) Halbleiterspeicheranordnung.
DE3481880D1 (de) Schaltkreis.
FI841727A0 (fi) Vattenloeslig modifierad polyuretan.
DE3483769D1 (de) Halbleiterdiode.
DE3485174D1 (de) Halbleiterspeicheranordnung.
DE3483498D1 (de) Halbleiteranordnung des harzverkapselungstyps.
DE3485625D1 (de) Halbleiterspeicheranordnung.
DE3484180D1 (de) Halbleiterspeicheranordnung.
DE3483959D1 (de) Hohlleiterschalter.
DE3481355D1 (de) Halbleiterspeicheranordnung.
DE3485592D1 (de) Integrierte halbleiterschaltungsanordnung.
DE3486077D1 (de) Integrierte halbleiterschaltungsanordnung.
DE3486094D1 (de) Halbleiterspeicheranordnung.
DE3484630D1 (de) Halbleiterspeicheranordnung.
DE3481958D1 (de) Integrierte halbleiterschaltungsanordnung.
DE3486082D1 (de) Halbleiterspeicheranordnung.
DE3484817D1 (de) Halbleiteranordnung.
DE3481395D1 (de) Halbleiterspeicheranordnung.
DE3381665D1 (de) Halbleiteranordnung in harz-verkapselung.
DE3381723D1 (de) Halbleiterspeicheranordnung.
DE3483576D1 (de) Tor-schaltungsanordnung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee