CN113549869A - 一种具有残古纹效果的真空镀膜方法 - Google Patents
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Abstract
本发明提出一种具有残古纹效果的真空镀膜方法，具有残古纹效果的真空镀膜方法采用中频沉积一层纯铬作为过渡层，可以有效地提高膜层与基体间结合力，使产品表面达到一致性；通过采用中频溅射沉积铬和石墨混合涂层，可有效调整基础与膜层之间粘合力，在后续震动研磨时能更好的去除膜层漏出基材原色呈现残古纹效果；通过采用中频溅射沉积石墨面色层，可有效调整膜层硬度、内应力，在后续震动研磨时不会出现片状脱落及无法脱落现象；通过采用中频溅射在最外层沉积一层二氧化硅透明膜层，能有效减少指纹印及一定防水效果能涂层及基材。
Description
技术领域
本发明涉及真空镀膜技术领域，尤其是一种具有残古纹效果的真空镀膜方法。
背景技术
众所周知，在某些材料的表面上，只要镀上一层薄膜，就能使材料具有许多新的、良好的物理和化学性能。20世纪70年代，在物体表面上镀膜的方法主要有电镀法和化学镀法。前者是通过通电，使电解液电解，被电解的离子镀到作为另一个电极的基体表面上，因此这种镀膜的条件，基体必须是电的良导体，而且薄膜厚度也难以控制。后者是采用化学还原法，必须把膜材配制成溶液，并能迅速参加还原反应，这种镀膜方法不仅薄膜的结合强度差，而且镀膜既不均匀也不易控制，同时还会产生大量的废液，造成严重的污染。因此，这两种被人们称之为湿式镀膜法的镀膜工艺受到了很大的限制。
真空镀膜则是相对于上述的湿式镀膜方法而发展起来的一种新型镀膜技术，通常称为干式镀膜技术。真空镀膜是真空应用领域的一个重要方面，它是以真空技术为基础，利用物理或化学方法，并吸收电子束、分子束、离子束、等离子束、射频和磁控等一系列新技术，为科学研究和实际生产提供薄膜制备的一种新工艺。简单地说，在真空中把金属、合金或化合物进行蒸发或溅射，使其在被涂覆的物体(称基板、基片或基体)上凝固并沉积的方法，称为真空镀膜。
真空镀膜技术一般分为两大类，即物理气相沉积(PVD)技术和化学气相沉积(CVD)技术。
物理气相沉积技术是指在真空条件下，利用各种物理方法，将镀料气化成原子、分子或使其离化为离子，直接沉积到基体表面上的方法。制备硬质反应膜大多以物理气相沉积方法制得，它利用某种物理过程，如物质的热蒸发，或受到离子轰击时物质表面原子的溅射等现象，实现物质原子从源物质到薄膜的可控转移过程。物理气相沉积技术具有膜/基结合力好、薄膜均匀致密、薄膜厚度可控性好、应用的靶材广泛、溅射范围宽、可沉积厚膜、可制取成分稳定的合金膜和重复性好等优点。
在当下流行产品，如手机中框、五金首饰、钟表、眼镜、锁具等需要在其外表面增加纹饰(如残古纹)以提升美观性，本发明提供一种技术方案通过真空镀膜方法以在其外表面具有残古纹效果。同时使得产品具有膜层颜色鲜艳、颜色多样化、膜层质量耐磨、硬度高、防腐蚀、工艺环保(无废水、废气排放) 等特点。
发明内容
为了解决上述问题，本发明提出一种具有残古纹效果的真空镀膜方法。
本发明通过以下技术方案实现的：
本发明提出一种具有残古纹效果的真空镀膜方法，依次包括以下步骤：
(1)利用合金材料加工成型出零件A；
(2)对零件A进行进行抛光或拉丝工艺处理，得到零件B；
(3)对零件B进行真空碳氢清洗，得到零件C；
(4)将零件C均匀地挂入真空镀膜机的挂具上；
(5)将携带零件C的挂具放入真空镀膜机内进行加热100-150℃，抽真空至6.0-8.0E-3Pa；
(6)向真空镀膜机内充入氩气100-200sccm，使真空达到3.0-5.0E-1Pa，打开偏压100-150V，用中频溅射沉积5-10分钟的纯铬作为底层，底层的厚度 50-80nm；
(7)充入100-200sccm氩气，使真空镀膜机内真空达到3.0-5.0E-1Pa，偏压设定50-100V，用2对中频溅射10-15分钟铬和石墨，电流设定12A，沉积一层过渡层，过渡层的厚度为80-120nm；
(8)充入200-300sccm氩气，300-400sccm乙炔，使真空镀膜机内真空达到6.0-7.0E-1Pa，偏压设定30-50V，用2对中频溅射60-80分钟石墨，电流均设定为25A，沉积一层黑色面层，黑色面层的厚度为500-800nm；
(9)从真空镀膜机内中将零件C取出，待冷却后放进装有陶瓷颗粒的震动研磨桶内进行震动20-40分钟，此时零件C的表面黑色面层将出现被去除掉 10-30％，以此出现残古纹效果。
进一步的，所述具有残古纹效果的真空镀膜方法还包括以下步骤：
(10)将步骤(9)处理后的零件进行真空碳氢清洗后再次装入挂具中；
(11)将携带零件的挂具放入真空镀膜机内进行加热100-150℃，抽真空至 6.0-8.0E-3Pa；
(12)充入50-100sccm氩气，200-300sccm氧气，使真空镀膜机内真空达到2.0-3.0E-1Pa，偏压设定100-150V，用2对中频溅射10-20分钟二氧化硅，电流均设定为20A，沉积一层透明保护面层，透明保护面层的厚度为50-80nm。
本发明的有益效果：
1、本发明的具有残古纹效果的真空镀膜方法采用中频沉积一层纯铬作为过渡层，可以有效地提高膜层与基体间结合力，使产品表面达到一致性；
2、本发明的具有残古纹效果的真空镀膜方法采用中频溅射沉积铬和石墨混合涂层，可有效调整基础与膜层之间粘合力，在后续震动研磨时能更好的去除膜层漏出基材原色呈现残古纹效果；
3、本发明的具有残古纹效果的真空镀膜方法采用中频溅射沉积石墨面色层，可有效调整膜层硬度、内应力，在后续震动研磨时不会出现片状脱落及无法脱落现象；
4、本发明的具有残古纹效果的真空镀膜方法采用中频溅射在最外层沉积一层二氧化硅透明膜层，能有效减少指纹印及一定防水效果能涂层及基材。
具体实施方式
为了更加清楚、完整的说明本发明的技术方案，下面对本发明作进一步说明。
本发明提出一种具有残古纹效果的真空镀膜方法，依次包括以下步骤：
(1)利用合金材料加工成型出零件A；
(2)对零件A进行进行抛光或拉丝工艺处理，得到零件B；
(3)对零件B进行真空碳氢清洗，得到零件C；
(4)将零件C均匀地挂入真空镀膜机的挂具上；
(5)将携带零件C的挂具放入真空镀膜机内进行加热100-150℃，抽真空至6.0-8.0E-3Pa；
(6)向真空镀膜机内充入氩气100-200sccm，使真空达到3.0-5.0E-1Pa，打开偏压100-150V，用中频溅射沉积5-10分钟的纯铬作为底层，底层的厚度 50-80nm；
(7)充入100-200sccm氩气，使真空镀膜机内真空达到3.0-5.0E-1Pa，偏压设定50-100V，用2对中频溅射10-15分钟铬和石墨，电流设定12A，沉积一层过渡层，过渡层的厚度为80-120nm；
(8)充入200-300sccm氩气，300-400sccm乙炔，使真空镀膜机内真空达到6.0-7.0E-1Pa，偏压设定30-50V，用2对中频溅射60-80分钟石墨，电流均设定为25A，沉积一层黑色面层，黑色面层的厚度为500-800nm；
(9)从真空镀膜机内中将零件C取出，待冷却后放进装有陶瓷颗粒的震动研磨桶内进行震动20-40分钟，此时零件C的表面黑色面层将出现被去除掉 10-30％，以此出现残古纹效果。
(10)将步骤(9)处理后的零件进行真空碳氢清洗后再次装入挂具中；
(11)将携带零件的挂具放入真空镀膜机内进行加热100-150℃，抽真空至 6.0-8.0E-3Pa；
(12)充入50-100sccm氩气，200-300sccm氧气，使真空镀膜机内真空达到2.0-3.0E-1Pa，偏压设定100-150V，用2对中频溅射10-20分钟二氧化硅，电流均设定为20A，沉积一层透明保护面层，透明保护面层的厚度为50-80nm。
在本实施方式中，本发明的具有残古纹效果的真空镀膜方法采用中频沉积一层纯铬作为过渡层，可以有效地提高膜层与基体间结合力，使产品表面达到一致性；
在本实施方式中，本发明的具有残古纹效果的真空镀膜方法采用中频溅射沉积铬和石墨混合涂层，可有效调整基础与膜层之间粘合力，在后续震动研磨时能更好的去除膜层漏出基材原色呈现残古纹效果；
在本实施方式中，本发明的具有残古纹效果的真空镀膜方法采用中频溅射沉积石墨面色层，可有效调整膜层硬度、内应力，在后续震动研磨时不会出现片状脱落及无法脱落现象；
在本实施方式中，本发明的具有残古纹效果的真空镀膜方法采用中频溅射在最外层沉积一层二氧化硅透明膜层，能有效减少指纹印及一定防水效果能涂层及基材。
与现有技术相比，本发明的具有残古纹效果的真空镀膜方法所生产的产品具有工艺简单，金属用量少，无废气废水排放，符合未来经济发展对节能环保的要求，同时使得产品具有膜层颜色鲜艳、颜色多样化、膜层质量耐磨、硬度高、防腐蚀等特点。
当然，本发明还可有其它多种实施方式，基于本实施方式，本领域的普通技术人员在没有做出任何创造性劳动的前提下所获得其他实施方式，都属于本发明所保护的范围。
Claims (2)
1.一种具有残古纹效果的真空镀膜方法，其特征在于，依次包括以下步骤：
(1)利用合金材料加工成型出零件A；
(2)对零件A进行进行抛光或拉丝工艺处理，得到零件B；
(3)对零件B进行真空碳氢清洗，得到零件C；
(4)将零件C均匀地挂入真空镀膜机的挂具上；
(5)将携带零件C的挂具放入真空镀膜机内进行加热100-150℃，抽真空至6.0-8.0E- 3Pa；
(6)向真空镀膜机内充入氩气100-200sccm，使真空达到3.0-5.0E-1Pa，打开偏压100-150V，用中频溅射沉积5-10分钟的纯铬作为底层，底层的厚度50-80nm；
(7)充入100-200sccm氩气，使真空镀膜机内真空达到3.0-5.0E-1Pa，偏压设定50-100V，用2对中频溅射10-15分钟铬和石墨，电流设定12A，沉积一层过渡层，过渡层的厚度为80-120nm；
(8)充入200-300sccm氩气，300-400sccm乙炔，使真空镀膜机内真空达到6.0-7.0E-1Pa，偏压设定30-50V，用2对中频溅射60-80分钟石墨，电流均设定为25A，沉积一层黑色面层，黑色面层的厚度为500-800nm；
(9)从真空镀膜机内中将零件C取出，待冷却后放进装有陶瓷颗粒的震动研磨桶内进行震动20-40分钟，此时零件C的表面黑色面层将出现被去除掉10-30％，以此出现残古纹效果。
2.根据权利要求1所述的具有残古纹效果的真空镀膜方法，其特征在于，还包括以下步骤：
(10)将步骤(9)处理后的零件进行真空碳氢清洗后再次装入挂具中；
(11)将携带零件的挂具放入真空镀膜机内进行加热100-150℃，抽真空至6.0-8.0E- 3Pa；
(12)充入50-100sccm氩气，200-300sccm氧气，使真空镀膜机内真空达到2.0-3.0E-1Pa，偏压设定100-150V，用2对中频溅射10-20分钟二氧化硅，电流均设定为20A，沉积一层透明保护面层，透明保护面层的厚度为50-80nm。
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115287587A (zh) * | 2022-07-21 | 2022-11-04 | 厦门建霖健康家居股份有限公司 | 一种在塑料基材上镀拉丝膜的方法 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001295039A (ja) * | 2000-04-13 | 2001-10-26 | Nippon Sheet Glass Co Ltd | 撥水性の物品および撥水性の薄膜の被覆方法 |
| US20040129313A1 (en) * | 2003-01-07 | 2004-07-08 | Aharonov Robert R. | Article having a hard lubricious coating |
| CN102806516A (zh) * | 2011-05-30 | 2012-12-05 | 比亚迪股份有限公司 | 一种金属壳体及其制作方法 |
| CN102899610A (zh) * | 2011-07-29 | 2013-01-30 | 鸿富锦精密工业（深圳）有限公司 | 镀膜件及其制造方法 |
| CN106086790A (zh) * | 2016-06-08 | 2016-11-09 | 宁波威霖住宅设施有限公司 | 一种锌合金仿古铜真空镀膜方法 |
| CN108799127A (zh) * | 2018-05-25 | 2018-11-13 | 广东美芝制冷设备有限公司 | 压缩机滑片、压缩机及压缩机滑片的制备方法 |
-
2021
- 2021-07-21 CN CN202110827097.3A patent/CN113549869A/zh active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001295039A (ja) * | 2000-04-13 | 2001-10-26 | Nippon Sheet Glass Co Ltd | 撥水性の物品および撥水性の薄膜の被覆方法 |
| US20040129313A1 (en) * | 2003-01-07 | 2004-07-08 | Aharonov Robert R. | Article having a hard lubricious coating |
| CN102806516A (zh) * | 2011-05-30 | 2012-12-05 | 比亚迪股份有限公司 | 一种金属壳体及其制作方法 |
| CN102899610A (zh) * | 2011-07-29 | 2013-01-30 | 鸿富锦精密工业（深圳）有限公司 | 镀膜件及其制造方法 |
| CN106086790A (zh) * | 2016-06-08 | 2016-11-09 | 宁波威霖住宅设施有限公司 | 一种锌合金仿古铜真空镀膜方法 |
| CN108799127A (zh) * | 2018-05-25 | 2018-11-13 | 广东美芝制冷设备有限公司 | 压缩机滑片、压缩机及压缩机滑片的制备方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115287587A (zh) * | 2022-07-21 | 2022-11-04 | 厦门建霖健康家居股份有限公司 | 一种在塑料基材上镀拉丝膜的方法 |
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