CN113078318B - 一种三维多孔硅碳复合材料、其制备方法及其应用 - Google Patents
一种三维多孔硅碳复合材料、其制备方法及其应用 Download PDFInfo
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- CN113078318B CN113078318B CN202110324659.2A CN202110324659A CN113078318B CN 113078318 B CN113078318 B CN 113078318B CN 202110324659 A CN202110324659 A CN 202110324659A CN 113078318 B CN113078318 B CN 113078318B
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- carbon
- silicon
- dimensional porous
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- carbon composite
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- 239000002153 silicon-carbon composite material Substances 0.000 title claims abstract description 69
- 238000002360 preparation method Methods 0.000 title claims abstract description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 117
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 83
- 239000011856 silicon-based particle Substances 0.000 claims abstract description 23
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 239000010410 layer Substances 0.000 claims abstract description 19
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 239000011247 coating layer Substances 0.000 claims abstract description 16
- 238000011049 filling Methods 0.000 claims abstract description 14
- 239000013354 porous framework Substances 0.000 claims abstract description 12
- 239000005543 nano-size silicon particle Substances 0.000 claims description 40
- 238000007740 vapor deposition Methods 0.000 claims description 37
- 239000007789 gas Substances 0.000 claims description 29
- 230000001681 protective effect Effects 0.000 claims description 26
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 24
- 238000010438 heat treatment Methods 0.000 claims description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 20
- 239000010703 silicon Substances 0.000 claims description 20
- 238000002156 mixing Methods 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 18
- 239000002243 precursor Substances 0.000 claims description 17
- 238000005245 sintering Methods 0.000 claims description 11
- 230000001360 synchronised effect Effects 0.000 claims description 11
- 238000009423 ventilation Methods 0.000 claims description 10
- 230000004913 activation Effects 0.000 claims description 8
- 229920005610 lignin Polymers 0.000 claims description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 6
- 239000011148 porous material Substances 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000012071 phase Substances 0.000 claims description 5
- 238000000197 pyrolysis Methods 0.000 claims description 5
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- 239000007791 liquid phase Substances 0.000 claims description 4
- 229910001416 lithium ion Inorganic materials 0.000 claims description 4
- 238000004321 preservation Methods 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- 230000003213 activating effect Effects 0.000 claims description 3
- 239000003575 carbonaceous material Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000002296 pyrolytic carbon Substances 0.000 claims description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 2
- 229920002101 Chitin Polymers 0.000 claims description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 claims description 2
- 229920001007 Nylon 4 Polymers 0.000 claims description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 2
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 claims description 2
- 229930006000 Sucrose Natural products 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 239000010426 asphalt Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
- 239000008103 glucose Substances 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229920001568 phenolic resin Polymers 0.000 claims description 2
- 239000005011 phenolic resin Substances 0.000 claims description 2
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 2
- 229920000767 polyaniline Polymers 0.000 claims description 2
- 229920001690 polydopamine Polymers 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 229920000128 polypyrrole Polymers 0.000 claims description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 2
- 239000005720 sucrose Substances 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 abstract description 5
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract description 4
- 239000010406 cathode material Substances 0.000 abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 36
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 26
- 238000001816 cooling Methods 0.000 description 18
- 229910052757 nitrogen Inorganic materials 0.000 description 18
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 239000007833 carbon precursor Substances 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 5
- 239000002210 silicon-based material Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910021426 porous silicon Inorganic materials 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- -1 lithium transition metal Chemical class 0.000 description 3
- 239000007773 negative electrode material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000007770 graphite material Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical compound CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 description 1
- WFLOTYSKFUPZQB-UHFFFAOYSA-N 1,2-difluoroethene Chemical group FC=CF WFLOTYSKFUPZQB-UHFFFAOYSA-N 0.000 description 1
- MAYUMUDTQDNZBD-UHFFFAOYSA-N 2-chloroethylsilane Chemical compound [SiH3]CCCl MAYUMUDTQDNZBD-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 239000006245 Carbon black Super-P Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001290 LiPF6 Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 239000006258 conductive agent Substances 0.000 description 1
- JDTCYQUMKGXSMX-UHFFFAOYSA-N dimethyl(methylsilyl)silane Chemical compound C[SiH2][SiH](C)C JDTCYQUMKGXSMX-UHFFFAOYSA-N 0.000 description 1
- UCMVNBCLTOOHMN-UHFFFAOYSA-N dimethyl(silyl)silane Chemical compound C[SiH](C)[SiH3] UCMVNBCLTOOHMN-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- UHCBBWUQDAVSMS-UHFFFAOYSA-N fluoroethane Chemical compound CCF UHCBBWUQDAVSMS-UHFFFAOYSA-N 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- IQCYANORSDPPDT-UHFFFAOYSA-N methyl(silyl)silane Chemical compound C[SiH2][SiH3] IQCYANORSDPPDT-UHFFFAOYSA-N 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000012982 microporous membrane Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 102220043159 rs587780996 Human genes 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- VIPCDVWYAADTGR-UHFFFAOYSA-N trimethyl(methylsilyl)silane Chemical compound C[SiH2][Si](C)(C)C VIPCDVWYAADTGR-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
- H01M4/386—Silicon or alloys based on silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/139—Processes of manufacture
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract
本发明涉及锂电池负极材料领域,特别是涉及一种三维多孔硅碳复合材料,所述三维多孔硅碳复合材料包括三维多孔骨架、填充层及包覆层;所述三维多孔骨架为三维多孔碳骨架;所述填充层包括硅颗粒和导电碳;所述填充层由所述硅颗粒均匀弥散地分散在所述导电碳中形成;所述包覆层为碳包覆层。本发明提供一种长循环、低膨胀的三维多孔硅碳复合材料、其制备方法及其应用。
Description
技术领域
本发明涉及锂电池负极材料领域,特别是涉及一种三维多孔硅碳复合材料、其制备方法及其应用。
背景技术
二次电池已广泛应用于便携式电子产品中,随着便携式电子产品小型化发展及二次电池在航空、军事及汽车产业中的需求日益增大,电池的容量和能量密度均亟待大幅度提高。目前商业化负极材料主要为石墨类材料,但因其理论容量较低(372mAh/g),无法满足于市场的需求。近年来,人们的目光瞄准新型高比容量负极材料:储锂金属及其氧化物(如Sn,Si)和锂过渡金属磷化物,Si因具有高的理论比容量(4200mAh/g)而成为最具潜力的可替代石墨类材料之一,但是Si基在充放电过程中存在巨大的体积效应(~300%),易发生破裂和粉化,从而丧失与集流体的接触,造成循环性能急剧下降。
现有的硅碳负极材料采用纳米硅、石墨和碳造粒得到复合材料。由于纳米硅分散均匀困难,势必导致纳米硅局部团聚,纳米硅团聚地方的碳含量相对较低,相对较低的碳含量无法很好的吸收纳米硅循环过程中的体积膨胀,在纳米硅团聚的地方会引起局部的膨胀过大,导致局部结构破坏,影响材料整体性能。因此,如何提高硅碳复合材料中纳米硅均匀分散,降低体积膨胀效应和改善循环性能对硅基材料在锂离子电池中的应用有重大意义。
发明内容
为解决上述技术问题,本发明提供一种长循环、低膨胀的三维多孔硅碳复合材料、其制备方法及其应用。
本发明采用如下技术方案:
一种三维多孔硅碳复合材料,所述三维多孔硅碳复合材料包括三维多孔骨架、填充层及包覆层;所述三维多孔骨架为三维多孔碳骨架;所述填充层包括硅颗粒和导电碳;所述填充层由所述硅颗粒均匀弥散地分散在所述导电碳中形成;所述包覆层为碳包覆层。
对上述技术方案的进一步改进为,所述三维多孔硅碳复合材料的粒径D50为2~40μm;所述三维多孔硅碳复合材料的比表为0.5~10m2/g;所述三维多孔硅碳复合材料的孔隙率为1~30%;所述三维多孔硅碳复合材料的孔径为0~50nm。
对上述技术方案的进一步改进为,所述三维多孔骨架的孔隙率为10~90%,其孔径为10~500nm。
对上述技术方案的进一步改进为,所述硅颗粒包括纳米硅或纳米氧化硅中的一种或两种;所述纳米硅的粒度D50为1~100nm;所述纳米硅的晶粒大小为1~40nm;所述纳米硅为多晶纳米硅或非晶纳米硅中的一种或两种;所述纳米氧化硅SiOx中X为0~0.8。
对上述技术方案的进一步改进为,所述碳包覆层至少为一层,单层厚度为0.2~1.0μm;所述碳包覆层为高温裂解碳包覆或气相碳包覆或液相碳包覆中的一种。
一种三维多孔硅碳复合材料的制备方法,包括如下步骤:
制备三维多孔碳骨架M;
将三维多孔碳骨架M置于反应器中,在保护气氛以0.5~20L/min速率,同步气相沉积或交替气相沉积硅颗粒和导电碳,得到硅碳复合材料前驱体A;所述同步气相沉积或交替气相沉积的温度为400~1000℃,所述同步气相沉积或交替气相沉积的时间为0.5~20h;
将硅碳复合材料前驱体A进行碳包覆,得到硅碳复合材料前驱体B;
将硅碳复合材料前驱体B进行高温烧结,得到所述三维多孔硅碳复合材料。
对上述技术方案的进一步改进为,在所述制备三维多孔碳骨架M步骤中,所述三维多孔碳骨架M的制备方法为热解可产生多孔结构的有机碳源得到三维多孔碳骨架M或有机碳源经过热解碳和化学活化处理所得到三维多孔碳骨架M;所述化学活化处理为采用活化造孔剂对碳材料进行活化造孔。
对上述技术方案的进一步改进为,所述同步气相沉积的步骤为将有机碳源和硅源按比例A与保护气氛一起混合后通入反应器中进行气相沉积;所述比例A为有机碳源与硅源的流量比10:1~1:1。
对上述技术方案的进一步改进为,所述交替气相沉积的步骤为先按比例B将硅源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积超细纳米硅,再按比例C将有机碳源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积导电碳,通过电磁阀实现不间断交替通入;或先按比例C将有机碳源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积导电碳,再按比例B将硅源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积超细纳米硅,通过电磁阀实现不间断交替通入;所述比例B为硅颗粒与保护气氛的流量比1:1~1:20;所述比例C为有机碳源与保护气氛的流量比1:1~1:20。
一种三维多孔硅碳复合材料的应用,使用上述三维多孔硅碳复合材料的制备方法制得的三维多孔硅碳复合材料,其在锂离子电池的应用。
本发明的有益效果为:
本发明的三维多孔骨架形成的导电网络不仅能有效地提高硅基材料的导电性,同时三维多孔骨架中的多孔结构能有效地缓解硅颗粒在充放电过程中的体积膨胀,可有效的避免材料在循环过程中的粉化;填充层中的导电碳不仅能提高材料的导电性和缓解纳米硅材料的体积膨胀,而且能进一步避免循环过程中硅颗粒与电解液直接接触减少副反应;最外层的碳包覆层可避免硅颗粒与电解液直接接触减少副反应,同时能进一步有效的提高硅基材料的导电性和缓解充放电过程中的体积效应。
附图说明
图1为本发明的三维多孔硅碳复合材料的实施例2的FIB-SEM图;
图2为本发明的三维多孔硅碳复合材料的实施例2的首次充放电曲线图;
图3为本发明的三维多孔硅碳复合材料的实施例3的XRD图谱。
具体实施方式
下面将结合本发明的附图,对本发明实施例中的技术方案进行清楚、完整地描述。
一种三维多孔硅碳复合材料,所述三维多孔硅碳复合材料包括三维多孔骨架、填充层及包覆层;所述三维多孔骨架为三维多孔碳骨架;所述填充层包括硅颗粒和导电碳;所述填充层由所述硅颗粒均匀弥散地分散在所述导电碳中形成;所述包覆层为碳包覆层;其中硅颗粒由硅源高温裂解形成,所述的导电碳由有机碳源高温裂解形成。
所述三维多孔硅碳复合材料的粒径D50为2~40μm,进一步优选为2~20μm,特别优选为2~10μm。
所述三维多孔硅碳复合材料的比表为0.5~10m2/g,进一步优选为0.5~5m2/g,特别优选为0.5~3m2/g。
所述三维多孔硅碳复合材料的孔隙率为1~30%,进一步优选为1~20%,特别优选为1~10%。
所述三维多孔硅碳复合材料的孔径为0~50nm,进一步优选为0~30nm,特别优选为0~20nm。
所述三维多孔硅碳复合材料中的氧含量为0~20%;进一步优选为0~10%,特别优选为0~5%。
所述三维多孔硅碳复合材料中的碳含量为20~90%;进一步优选为20~60%,特别优选为30~50%。
所述三维多孔硅碳复合材料中的硅含量为5~90%;进一步优选为20~70%,特别优选为30~60%。
所述三维多孔骨架的孔隙率为10~90%,进一步优选20~90%,特别优选40~90%;其孔径为10~500nm。
所述硅颗粒包括纳米硅或纳米氧化硅中的一种或两种;所述纳米硅的粒度D50为1~100nm;所述纳米硅的晶粒大小为1~40nm;所述纳米硅为多晶纳米硅或非晶纳米硅中的一种或两种;所述纳米氧化硅SiOx中X为0~0.8。
所述碳包覆层至少为一层,单层厚度为0.2~1.0μm;所述碳包覆层为高温裂解碳包覆或气相碳包覆或液相碳包覆中的一种。
气相碳包覆的过程包括:将待包覆物置于反应器中,通入保护性气体,以1~5℃/min升温至400~1000℃,以0.5~20.0L/min通入速率通入有机碳源气体,保温0.5~20h,自然冷却至室温,得到气相包覆产物。
液相碳包覆的过程包括:将有机物碳源、待包覆物与溶剂高速混合分散均匀后形成浆料,对浆料进行喷雾干燥,再进行热处理。
一种三维多孔硅碳复合材料的制备方法,包括如下步骤:
制备三维多孔碳骨架M;
将三维多孔碳骨架M置于反应器中,在保护气氛以0.5~20L/min速率,同步气相沉积或交替气相沉积硅颗粒和导电碳,得到硅碳复合材料前驱体A;所述同步气相沉积或交替气相沉积的温度为400~1000℃,所述同步气相沉积或交替气相沉积的时间为0.5~20h;
保护气氛为氮气、氩气、氦气、氢气、氩氢混合气中的一种或几种;反应器为回转炉、CVD炉、PECVD炉、流化床中的一种或多种;
将硅碳复合材料前驱体A进行碳包覆,得到硅碳复合材料前驱体B;
将硅碳复合材料前驱体B进行高温烧结,得到所述三维多孔硅碳复合材料;高温烧结升温速率为1~10℃/min,保温温度为700~1200℃,保温时间为1~10h。
在所述制备三维多孔碳骨架M步骤中,所述三维多孔碳骨架M的制备方法为热解可产生多孔结构的有机碳源得到三维多孔碳骨架M或有机碳源经过热解碳和化学活化处理所得到三维多孔碳骨架M;所述化学活化处理为采用活化造孔剂对碳材料进行活化造孔;制备三维多孔碳骨架M中的有机碳源为蔗糖、葡萄糖、柠檬酸、酚醛树脂、环氧树脂、沥青、聚乙烯醇、聚吡咯、聚吡咯烷酮、聚苯胺、聚丙烯腈、聚多巴胺、木质素、甲壳素中的一种或几种;活化造孔剂为氢氧化钠、氢氧化钾、氯化锌、磷酸一种或多种。
所述同步气相沉积的步骤为将有机碳源和硅源按比例A与保护气氛一起混合后通入反应器中进行气相沉积;所述比例A为有机碳源与硅源的流量比10:1~1:1。
所述交替气相沉积的步骤为先按比例B将硅源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积超细纳米硅,再按比例C将有机碳源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积导电碳,通过电磁阀实现不间断交替通入;或先按比例C将有机碳源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积导电碳,再按比例B将硅源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积超细纳米硅,通过电磁阀实现不间断交替通入;所述比例B为硅源与保护气氛的流量比1:1~1:20;所述比例C为有机碳源与保护气氛的流量比1:1~1:20。
同步气相沉积或交替气相沉积的步骤中的硅源为硅烷、三氯硅烷、四氯化硅、甲基三氯硅烷、甲基氯硅烷、氯乙基硅烷、二氯二甲基硅烷、二氯二乙基硅烷、甲基硅烷、二甲基硅烷、三甲基硅烷、四甲基硅烷、甲基二硅烷、二甲基二硅烷、三甲基二硅烷、四甲基二硅烷、六甲基硅烷中的一种或几种。
同步气相沉积或交替气相沉积步骤中的有机碳源为甲烷、乙烷、丙烷、异丙烷,丁烷、异丁烷、乙烯、丙烯、乙炔、丁烯、氯乙烯、氟乙烯,二氟乙烯、氯乙烷,氟乙烷、二氟乙烷、氯甲烷、氟甲烷、二氟甲烷、三氟甲烷、甲胺、甲醛、苯、甲苯、二甲苯、苯乙烯、苯酚中的一种或几种。
一种三维多孔硅碳复合材料的应用,使用上述三维多孔硅碳复合材料的制备方法制得的三维多孔硅碳复合材料,其在锂离子电池的应用。
实施例1
1、将1000g木质素与200gKOH混合均匀后,在氮气保护气氛条件下进行烧结处理,升温速率为1℃/min,热处理温度为1150℃,保温5h,冷却后水洗去除杂质,烘干得到三维多孔碳骨架;
2、取1000g得到的三维多孔碳骨架至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,0.5L/min速率通入硅烷气体,通混合气体时间为8h,自然冷却至室温,得到前驱体2。
3、取1000g得到的硅碳前驱体2至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,通甲烷气体时间为4h,自然冷却至室温,得到硅碳复合材料。
实施例2
1、将1000g木质素与200gKOH混合均匀后,在氮气保护气氛条件下进行烧结处理,升温速率为1℃/min,热处理温度为1150℃,保温5h,冷却后水洗去除杂质,烘干得到三维多孔碳骨架;
2、取1000g得到的三维多孔碳骨架至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,1.0L/min速率通入甲烷气体,0.2L/min速率通入硅烷气体,通混合气体时间为8h,自然冷却至室温,得到前驱体3。
3、取1000g得到的硅碳前驱体3至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,通甲烷气体时间为4h,自然冷却至室温,得到硅碳复合材料。
实施例3
1、将1000g木质素与200gKOH混合均匀后,在氮气保护气氛条件下进行烧结处理,升温速率为1℃/min,热处理温度为1150℃,保温5h,冷却后水洗去除杂质,烘干得到三维多孔碳骨架;
2、取1000g得到的三维多孔碳骨架至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,2.0L/min速率通入甲烷气体,0.2L/min速率通入硅烷气体,通混合气体时间为8h,自然冷却至室温,得到前驱体3。
3、取1000g得到的硅碳前驱体3至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,通甲烷气体时间为4h,自然冷却至室温,得到硅碳复合材料。
实施例4
1、将1000g木质素与200gKOH混合均匀后,在氮气保护气氛条件下进行烧结处理,升温速率为1℃/min,热处理温度为1150℃,保温5h,冷却后水洗去除杂质,烘干得到三维多孔碳骨架;
2、取1000g得到的三维多孔碳骨架至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,3.0L/min速率通入甲烷气体,0.5L/min速率通入硅烷气体,通混合气体时间为8h,自然冷却至室温,得到前驱体3。
3、取1000g得到的硅碳前驱体3至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,通甲烷气体时间为4h,自然冷却至室温,得到硅碳复合材料。
实施例5
1、将1000g木质素与200gKOH混合均匀后,在氮气保护气氛条件下进行烧结处理,升温速率为1℃/min,热处理温度为1150℃,保温5h,冷却后水洗去除杂质,烘干得到三维多孔碳骨架;
2、取1000g得到的三维多孔碳骨架至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,4.0L/min速率通入甲烷气体,0.2L/min速率通入硅烷气体,通混合气体时间为8h,自然冷却至室温,得到前驱体3。
3、取1000g得到的硅碳前驱体3至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,通甲烷气体时间为4h,自然冷却至室温,得到硅碳复合材料。
对比例
1、将粒度D50为3~10μm的微米硅与无水乙醇按质量比1:10混合均匀,利用球磨法得到的粒度D50=100nm纳米硅浆料;
2、将1000g木质素与200gKOH混合均匀后,在氮气保护气氛条件下进行烧结处理,升温速率为1℃/min,热处理温度为1150℃,保温5h,冷却后水洗去除杂质,烘干得到三维多孔碳骨架;
3、将纳米硅浆料与三维多孔碳骨架按质量比10:1混合均匀后,进行喷雾造粒得到硅碳前驱体1;
4、取1000g得到的硅碳前驱体1至于CVD炉中,以5℃/min升温至1000℃,分别以4.0L/min速率通入高纯氮,0.5L/min速率通入甲烷气体,通甲烷气体时间为4h,自然冷却至室温,得到硅碳复合材料。
下面将对上述实施例及对比例进行测试。
测试条件:取比较例及实施例制备的材料作为负极材料,与粘结剂聚偏二氟乙烯(PVDF)、导电剂(Super~P)按照70:15:15的质量比混合,加入适量的N~甲基吡咯烷酮(NMP)作为溶剂调成浆料,涂覆在铜箔上,并经真空干燥、辊压,制备成负极片;采用金属锂片作为对电极,使用1mol/L的LiPF6三组分混合溶剂按EC:DMC:EMC=1:1:1(v/v)混合的电解液,采用聚丙烯微孔膜为隔膜,在充满惰性气体手套箱中组装成CR2032型扣式电池。扣式电池的充放电测试在武汉市蓝电电子股份有限公司电池测试***上,在常温条件,0.1C恒流充放电,充放电电压限制在0.005~1.5V。
采用如下方法测试和计算材料体积膨胀率:将制备的硅碳复合材料与石墨复合制备容量500mAh/g的复合材料测试其循环性能,膨胀率=(50周循环后极片厚度~循环前极片厚度)/(循环前极片厚度~铜箔厚度)*100%。
表1为对比例与实施例的首周测试结果。
表1
表2为循环膨胀测试结果。
表2
图1为实施例2中样品的FIB~SEM,从图1可知,材料内部有微小的纳米孔洞,能缓解充放电过程中的体积膨胀,导电网络能改善材料的导电性,提高材料的循环和倍率性能。
图2为实施例2中样品的首次充放电曲线;从图2可知,样品的容量为1888.6mAh/g,效率为88.1%,从表1~2可知,本发明合成的复合材料的首次可逆容量不低于1600mAh/g,循环50周后膨胀率小于45%,容量保持率大于90%。
图3为实施例3中样品的XRD图谱;样品中的硅为无定型态,弥散分布在导电网络和导电碳中。
本发明的三维多孔骨架形成的导电网络不仅能有效地提高硅基材料的导电性,同时三维多孔骨架中的多孔结构能有效地缓解硅颗粒在充放电过程中的体积膨胀,可有效的避免材料在循环过程中的粉化;填充层中的导电碳不仅能提高材料的导电性和缓解纳米硅材料的体积膨胀,而且能进一步避免循环过程中硅颗粒与电解液直接接触减少副反应;最外层的碳包覆层可避免硅颗粒与电解液直接接触减少副反应,同时能进一步有效的提高硅基材料的导电性和缓解充放电过程中的体积效应。
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对本发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。
Claims (6)
1.一种三维多孔硅碳复合材料,其特征在于,所述三维多孔硅碳复合材料包括三维多孔骨架、填充层及包覆层;所述三维多孔骨架为三维多孔碳骨架;所述填充层包括硅颗粒和导电碳;所述填充层由所述硅颗粒均匀弥散地分散在所述导电碳中形成;所述包覆层为碳包覆层;
所述三维多孔骨架的孔隙率为10~90%,其孔径为10~500nm;
所述三维多孔硅碳复合材料中的氧含量为0~20%;所述三维多孔硅碳复合材料中的碳含量为20~90%;所述三维多孔硅碳复合材料中的硅含量为5~90%;
所述三维多孔硅碳复合材料的粒径D50为2~40μm;所述三维多孔硅碳复合材料的比表为0.5~10m2/g;所述三维多孔硅碳复合材料的孔隙率为1~30%;所述三维多孔硅碳复合材料的孔径为0~50nm;
所述三维多孔硅碳复合材料的制备方法,包括如下步骤:
制备三维多孔碳骨架M;在所述制备三维多孔碳骨架M步骤中,所述三维多孔碳骨架M的制备方法为热解产生多孔结构的有机碳源得到三维多孔碳骨架M或有机碳源经过热解碳和化学活化处理所得到三维多孔碳骨架M;所述化学活化处理为采用活化造孔剂对碳材料进行活化造孔;制备三维多孔碳骨架M中的有机碳源为蔗糖、葡萄糖、柠檬酸、酚醛树脂、环氧树脂、沥青、聚乙烯醇、聚吡咯、聚吡咯烷酮、聚苯胺、聚丙烯腈、聚多巴胺、木质素、甲壳素中的一种或几种;活化造孔剂为氢氧化钠、氢氧化钾、氯化锌、磷酸中的一种或多种;
将三维多孔碳骨架M置于反应器中,在保护气氛以0.5~20L/min速率,同步气相沉积或交替气相沉积硅颗粒和导电碳,得到硅碳复合材料前驱体A;所述同步气相沉积或交替气相沉积的温度为400~1000℃,所述同步气相沉积或交替气相沉积的时间为0.5~20h;
将硅碳复合材料前驱体A进行碳包覆,得到硅碳复合材料前驱体B;
将硅碳复合材料前驱体B进行高温烧结,高温烧结的升温速率为1~10℃/min,保温温度为700~1200℃,保温时间为1~10h,得到所述三维多孔硅碳复合材料。
2.根据权利要求1所述的三维多孔硅碳复合材料,其特征在于,所述硅颗粒包括纳米硅或纳米氧化硅中的一种或两种;所述纳米硅的粒度D50为1~100nm;所述纳米硅的晶粒大小为1~40nm;所述纳米硅为多晶纳米硅或非晶纳米硅中的一种或两种;所述纳米氧化硅SiOx中X为0~0.8。
3.根据权利要求1所述的三维多孔硅碳复合材料,其特征在于,所述碳包覆层至少为一层,单层厚度为0.2~1.0μm;所述碳包覆层为高温裂解碳包覆或气相碳包覆或液相碳包覆中的一种。
4.根据权利要求1所述的三维多孔硅碳复合材料,其特征在于,所述同步气相沉积的步骤为将有机碳源和硅源按比例A与保护气氛一起混合后通入反应器中进行气相沉积;所述比例A为有机碳源与硅源的流量比10:1~1:1。
5.根据权利要求1所述的三维多孔硅碳复合材料,其特征在于,所述交替气相沉积的步骤为先按比例B将硅源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积超细纳米硅,再按比例C将有机碳源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积导电碳,通过电磁阀实现不间断交替通入;或先按比例C将有机碳源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积导电碳,再按比例B将硅源和保护气氛一起混合后通入反应器中通气5~600s进行气相沉积超细纳米硅,通过电磁阀实现不间断交替通入;所述比例B为硅颗粒与保护气氛的流量比1:1~1:20;所述比例C为有机碳源与保护气氛的流量比1:1~1:20。
6.一种三维多孔硅碳复合材料的应用,其特征在于,使用如权利要求1所述的三维多孔硅碳复合材料的制备方法制得的三维多孔硅碳复合材料,其在锂离子电池的应用。
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CN116581282A (zh) * | 2023-07-13 | 2023-08-11 | 北京壹金新能源科技有限公司 | 合金化负极材料及其制备方法和应用 |
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