CN107878983B - 物品搬运设备 - Google Patents
物品搬运设备 Download PDFInfo
- Publication number
- CN107878983B CN107878983B CN201710907212.1A CN201710907212A CN107878983B CN 107878983 B CN107878983 B CN 107878983B CN 201710907212 A CN201710907212 A CN 201710907212A CN 107878983 B CN107878983 B CN 107878983B
- Authority
- CN
- China
- Prior art keywords
- port
- washing
- container
- article
- washing machine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/0407—Storage devices mechanical using stacker cranes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/0478—Storage devices mechanical for matrix-arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67727—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Mathematical Physics (AREA)
- Warehouses Or Storage Devices (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016-193915 | 2016-09-30 | ||
JP2016193915A JP6601360B2 (ja) | 2016-09-30 | 2016-09-30 | 物品搬送設備 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107878983A CN107878983A (zh) | 2018-04-06 |
CN107878983B true CN107878983B (zh) | 2021-05-14 |
Family
ID=61781035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710907212.1A Active CN107878983B (zh) | 2016-09-30 | 2017-09-29 | 物品搬运设备 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6601360B2 (ja) |
KR (1) | KR102419509B1 (ja) |
CN (1) | CN107878983B (ja) |
TW (1) | TWI741028B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6835031B2 (ja) * | 2018-04-27 | 2021-02-24 | 株式会社ダイフク | 物品搬送設備 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5525106A (en) * | 1993-04-12 | 1996-06-11 | Daifuku Co., Ltd. | Load storing equipment with cleaning device |
CN1351758A (zh) * | 1999-05-19 | 2002-05-29 | 因芬尼昂技术股份公司 | 处理晶片的装置 |
CN1426087A (zh) * | 2001-11-30 | 2003-06-25 | 东京毅力科创株式会社 | 衬底处理*** |
CN1672068A (zh) * | 2002-07-22 | 2005-09-21 | 大日本印刷株式会社 | 生产线***和在该***中使用的自动仓库 |
CN1717796A (zh) * | 2003-09-01 | 2006-01-04 | 东京毅力科创株式会社 | 基板处理装置 |
CN1819135A (zh) * | 2005-01-28 | 2006-08-16 | 大日本网目版制造株式会社 | 基板处理装置 |
CN101211757A (zh) * | 2006-12-27 | 2008-07-02 | 大日本网目版制造株式会社 | 基板处理装置以及基板处理方法 |
JP2009057117A (ja) * | 2007-08-29 | 2009-03-19 | Sharp Corp | 搬送制御システム、搬送制御方法、及び搬送制御プログラム |
CN103171842A (zh) * | 2011-12-21 | 2013-06-26 | 株式会社大福 | 物品保管设备以及物品保管设备中的维修方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07122531A (ja) * | 1993-10-22 | 1995-05-12 | Dainippon Screen Mfg Co Ltd | 基板処理液収容装置およびそれを備えた基板処理装置 |
JP3143700B2 (ja) * | 1995-06-27 | 2001-03-07 | 東京エレクトロン株式会社 | 位置合せ装置 |
JP3682170B2 (ja) * | 1998-09-09 | 2005-08-10 | 株式会社東芝 | カセット搬送システム、半導体露光装置、及びレチクル運搬方法 |
JP2004303835A (ja) * | 2003-03-28 | 2004-10-28 | Fasl Japan 株式会社 | 基板保管装置 |
JP5610009B2 (ja) * | 2013-02-26 | 2014-10-22 | 東京エレクトロン株式会社 | 基板処理装置 |
-
2016
- 2016-09-30 JP JP2016193915A patent/JP6601360B2/ja active Active
-
2017
- 2017-09-13 TW TW106131409A patent/TWI741028B/zh active
- 2017-09-27 KR KR1020170124957A patent/KR102419509B1/ko active IP Right Grant
- 2017-09-29 CN CN201710907212.1A patent/CN107878983B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5525106A (en) * | 1993-04-12 | 1996-06-11 | Daifuku Co., Ltd. | Load storing equipment with cleaning device |
CN1351758A (zh) * | 1999-05-19 | 2002-05-29 | 因芬尼昂技术股份公司 | 处理晶片的装置 |
CN1426087A (zh) * | 2001-11-30 | 2003-06-25 | 东京毅力科创株式会社 | 衬底处理*** |
CN1672068A (zh) * | 2002-07-22 | 2005-09-21 | 大日本印刷株式会社 | 生产线***和在该***中使用的自动仓库 |
CN1717796A (zh) * | 2003-09-01 | 2006-01-04 | 东京毅力科创株式会社 | 基板处理装置 |
CN1819135A (zh) * | 2005-01-28 | 2006-08-16 | 大日本网目版制造株式会社 | 基板处理装置 |
CN101211757A (zh) * | 2006-12-27 | 2008-07-02 | 大日本网目版制造株式会社 | 基板处理装置以及基板处理方法 |
JP2009057117A (ja) * | 2007-08-29 | 2009-03-19 | Sharp Corp | 搬送制御システム、搬送制御方法、及び搬送制御プログラム |
CN103171842A (zh) * | 2011-12-21 | 2013-06-26 | 株式会社大福 | 物品保管设备以及物品保管设备中的维修方法 |
Also Published As
Publication number | Publication date |
---|---|
CN107878983A (zh) | 2018-04-06 |
JP2018052724A (ja) | 2018-04-05 |
KR102419509B1 (ko) | 2022-07-08 |
TWI741028B (zh) | 2021-10-01 |
KR20180036576A (ko) | 2018-04-09 |
TW201814815A (zh) | 2018-04-16 |
JP6601360B2 (ja) | 2019-11-06 |
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PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
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