CN101441422B - Developing solution for heat-sensitive positive picture CTP plate - Google Patents
Developing solution for heat-sensitive positive picture CTP plate Download PDFInfo
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- CN101441422B CN101441422B CN200710180521XA CN200710180521A CN101441422B CN 101441422 B CN101441422 B CN 101441422B CN 200710180521X A CN200710180521X A CN 200710180521XA CN 200710180521 A CN200710180521 A CN 200710180521A CN 101441422 B CN101441422 B CN 101441422B
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Links
- 239000004094 surface-active agent Substances 0.000 claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims abstract description 17
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000011737 fluorine Substances 0.000 claims abstract description 13
- 239000001488 sodium phosphate Substances 0.000 claims abstract description 12
- 229910000162 sodium phosphate Inorganic materials 0.000 claims abstract description 12
- 235000011008 sodium phosphates Nutrition 0.000 claims abstract description 12
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- 235000019982 sodium hexametaphosphate Nutrition 0.000 claims abstract description 9
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 claims abstract description 9
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 8
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims abstract description 8
- 229940048086 sodium pyrophosphate Drugs 0.000 claims abstract description 8
- 235000019818 tetrasodium diphosphate Nutrition 0.000 claims abstract description 8
- 239000003513 alkali Substances 0.000 claims abstract description 7
- 239000006185 dispersion Substances 0.000 claims abstract description 7
- 235000019832 sodium triphosphate Nutrition 0.000 claims abstract description 7
- 239000002562 thickening agent Substances 0.000 claims abstract description 7
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000318 alkali metal phosphate Inorganic materials 0.000 claims abstract description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical group OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 20
- 235000011187 glycerol Nutrition 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 7
- 229920001451 polypropylene glycol Polymers 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 5
- 229920000151 polyglycol Polymers 0.000 claims description 5
- 239000010695 polyglycol Substances 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 241000047703 Nonion Species 0.000 claims description 2
- 125000000129 anionic group Chemical group 0.000 claims description 2
- 150000001768 cations Chemical class 0.000 claims description 2
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
- 229910052905 tridymite Inorganic materials 0.000 claims description 2
- 238000007639 printing Methods 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 abstract 1
- 230000004927 fusion Effects 0.000 abstract 1
- 229960004418 trolamine Drugs 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 98
- 238000011156 evaluation Methods 0.000 description 47
- 238000011161 development Methods 0.000 description 40
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 30
- 230000000694 effects Effects 0.000 description 17
- 229910004298 SiO 2 Inorganic materials 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 238000002360 preparation method Methods 0.000 description 12
- 241001274660 Modulus Species 0.000 description 11
- 239000011734 sodium Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052914 metal silicate Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- -1 sucrose fatty acid ester Chemical class 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- PRPAGESBURMWTI-UHFFFAOYSA-N [C].[F] Chemical group [C].[F] PRPAGESBURMWTI-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 230000007115 recruitment Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The invention discloses a developer for a thermal sensitive positive printing CTP plate. The developer comprises: (A) 10 to 40 weight portions of at least one alkali compound of diethanolameine, triethylamine, trolamine, alkali metal hydroxides, alkali metal silicates, and alkali metal phosphates; (B) 1 to 2 weight portions of at least one substance of sodium phosphate, sodium pyrophosphate, sodium tripolyphosphate and sodium hexametaphosphate; (C) 6 to 30 weight portions of aqueous fusion or aqueous dispersion thickener; (D) 2 to 8 weight portions of fluorine surfactant; and (E) water. The weight portions are determined based on 100 weight portions after the water is added. The developer has the advantages of a wide permissible operating temperature range, good graphic text partial density stability, good versatility, high fatigue resistance, high tolerance level, and the like.
Description
Technical field
The present invention relates to a kind of developer solution, be specifically related to a kind of positive light sensitivity composition developer solution.
Background technology
The huge change that the CTP technology is brought to press, with regard to the CTP Developing Trend in Technology, the thermosensitive CTP plate-making technology is day by day ripe and universal, and the novel thermosensitive CTP plate of exploitation function admirable becomes one of focus of printing plate manufacturing enterprise concern.Positive-printing heat-sensitive CTP plate material is the main flow in market in the commercial thermal CTP plate material at present.This type of plate is after the process laser scanning, see light part and non-ly see that the difference of solubleness takes place light coating partly in developer solution, see that the light partial coating is dissolved in and expose aluminum substrate in the developer solution to form the non-graphic part hydrophilic, non-ly see that the light coating is not dissolved and stay that to form the picture and text part ink-receptive that the quality of developer solution directly influences the performance of plate.
When carrying out development treatment, generally use the organic or inorganic alkaline aqueous solution, such developer solution rapid permeability in development step and obtains dissolving and disperses in photosensitive composite.But this alkaline-based developer can not be eliminated unwanted filming fully, not only produces scum silica frost in the pixel of Huo Deing, and is difficult to form the pixel with excellent image border.In order to address this problem, proposed to add in the alkalitropism aqueous solution method of surfactant.
Patent of invention 200580025577.7 discloses a kind of alkaline-based developer that contains surfactant, and used surfactant comprises alkyl sulfonate, sucrose fatty acid ester, polyxyethylated fat etc.Japanese kokai publication hei 10-10749 patent of invention discloses with water, alkali compounds, teepol and has made developer solution.Effects such as though this allotment has the developer solution of surfactant not have residue in use, and development is good, the easy generation steam bubble of developer solution, the little and picture and text partial density poor stability of the scope of operating temperature, result of use is also undesirable.
In addition, at present commercially available developer solution specificity is strong, supporting with specific plate basically, has problems such as versatility is poor, fatigue resistence is poor, tolerance is little.
Summary of the invention
The objective of the invention is in order to overcome existing developer solution defoaming, to allow the shortcomings such as dispersion stabilization difference of operating temperature and chromatic photoresist, remedy the existing deficiency that the developer solution versatility is poor, fatigue resistence is poor, tolerance is little, a kind of low foam is provided, and permissible operating temperature range is wide, picture and text partial density good stability, versatility is good, fatigue resistence is high, tolerance is big developing solution for heat-sensitive positive picture CTP plate developer solution.
The objective of the invention is to be achieved through the following technical solutions:
Developing solution for heat-sensitive positive picture CTP plate of the present invention, this developer solution contains:
(A) at least a alkali compounds in the diethanolamine of 10-40 weight portion, triethylamine, triethanolamine, alkali-metal oxyhydroxide, alkali silicate, the alkali metal phosphate;
(B) at least a material in the sodium phosphate of 1-2 weight portion, sodium pyrophosphate, sodium tripolyphosphate, the sodium hexametaphosphate;
(C) thickening agent of the water-soluble or aqueous dispersion of 6-30 weight portion;
(D) fluorine surfactant of 2-8 weight portion;
(E) water adds and amounts to 100 weight portions behind the water; All total amount is that 100 weight portions are benchmark to above weight portion behind the water to add.
Fluorine surfactant is one or more materials in anionic fluorinated surfactant, cation fluorine surfactant, the non-ion fluorin surfactant in the developer solution of the present invention.
Thickening agent is glycerine or polyglycol or polypropylene glycol in the developer solution of the present invention.The modulus of described alkali silicate is 2.0～3.0.The pH value of described developer solution is 12～14.
Below each component among the present invention is specified.
(A) alkali compounds
The effect of alkali compounds of the present invention is to dissolve the coating of seeing the light part, is fit to alkali compounds of the present invention and comprises organic basic compound and inorganic alkaline compound two classes, and wherein organic basic compound has diethanolamine, triethylamine, triethanolamine; Inorganic alkaline compound comprises alkali-metal oxyhydroxide, alkali silicate, alkali metal phosphate.
Wherein the proportioning of alkali silicate is of crucial importance in developer solution, and it directly influences the developing performance of plate.Have in the existing document indivedual with silicate as alkaline matter, its metal silicate SiO
2/ M
2The modulus of O is very high, greatly between 3.5～4.0, and SiO
2Concentration is 20～30%, it active relatively low.In the time of necessity, the resin dissolves of heat-sensitive layer exposed portion is slow or development is incomplete in commercial operation, and residue is stayed on the plate, influences the picture and text effect.Therefore we will select metal silicate SiO
2/ M
2The modulus of O is moderate, between 2.0～3.0, and SiO
2Concentration is 5～10%, and developing liquid developing at this moment is good, and the picture and text part and the blank parts contrast of plate are big.
(B) at least a material in sodium phosphate, sodium pyrophosphate, sodium tripolyphosphate, the sodium hexametaphosphate.
Usually, during development temperature-sensitive version, use the automatic processing machine of the supplementary device with the developer solution activity that keeps constant as possible, this supplementary device is in order to prevent by light sensitive plate development treatment or CO
2Absorption causes that developer solution pH descends, development capability descends and adds high activity and replenish liquid.Particularly, be conductance in common important index of temperature-sensitive version disposal system, add additional liquid and make conductance keep constant, the additional liquid of regular adding ormal weight after the temperature-sensitive version development treatment of some or after the process certain time interval.
But, when using conductance, have following problem as an important control index.The version quantity of development treatment increases and also dissolved many of photographic layer constituent, although the conductance of this moment is identical with initial value, pH value is different, and development capability also can be different.
Also has a kind of method that adds the additional liquid of ormal weight in the time interval of determining.Owing to stipulated the magnitude of recruitment of light sensitive plate unit area, therefore also different with the different photographic layer constituent amounts of dissolving in developer solution of portrait area, person more is provided with environment (temperature, humidity, CO according to automatic processing machine
2Concentration etc.) through CO in the certain hour
2The uptake difference, thus condition also can change to some extent.Therefore, when controlling with constant value, it is very difficult to continue to obtain even development capability.
The present invention has adopted one or more in the sodium phosphate with slow releasing function that prevents the pH value and reduce, sodium pyrophosphate, sodium tripolyphosphate, the sodium hexametaphosphate, makes the pH value stabilization between 12～14, keeps the activity of developer solution, realizes good development capability.
(C) thickening agent of the water-soluble or aqueous dispersion of 6-30wt%;
The thickening agent that the present invention adopts is water-soluble or the polyhydroxy component of aqueous dispersion.Representational component comprises, but not only is confined to these.There are glycerine, polyglycol, polypropylene glycol and other to have the similar substance of multi-hydroxy.
(D) 2-8wt% fluorine surfactant.
The surfactant that the present invention adopts is a fluorine surfactant, and so-called fluorine surfactant is meant that the hydrogen atom in the hydrocarbon chain is all or part of and is replaced formed surfactant with carbon fluorine chain Rf hydrophobic group by fluorine atom.Compare with traditional surfactant, fluorine surfactant has (1) outstanding especially levelling and wettability, (2) make coating and printing ink can well cover surface contamination, (3) to water-based and all effectively (4) stable performances of oiliness system, can not influence the use of other adjuvants, (5) have excellent thermal stability, and (6) addition is little, when (7) being used for the figure layer, can not influence the clinging power of figure layer.
Fluorine surfactant of the present invention is Zonyl
TMFSN, Zonyl
TMFS300, Zonyl
TMFSE (from U.S. Du Pont company) Fluorad
TMFC-430, Fluorad
TMFC-4430, Fluorad
TMFC-109 (from Minnesota Mining and Manufacturing Company).
Because the present invention adopts above-mentioned technical scheme, the versatility that the present invention has, can reach compatible to the various brands forme, not only cost is low, and that stable performance, reliable in quality, development index are more widened, the site is Well-recovered, valency is transferred is clear, stereovision strong, inking is good.Especially after adopting fluorine surfactant to replace traditional surfactant, developer solution provided by the invention need not to add defoamer can obtain excellent comprehensive performances, and promptly defoaming is strong, operating temperature is wide, development and dispersion stabilization are good.The developer solution that obtains among the embodiment is carried out developing performance and development capability evaluation result such as table 1.
Table 1
| Embodiment | 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | ?11 | 12 |
| Dmax Dmin site (%) netting twine development time (second) development capability/m 2 | 1.20 0.27 2-98 better 40 150 | 1.22 0.27 1-99 better 30 150 | 1.16 0.27 2-98 can accept 20 100 | 1.16 0.27 3-98 better 20 115 | 1.19 0.27 2-98 better 20 100 | 1.20 0.27 2-99 better 30 150 | 1.22 0.27 1-99 better 30 150 | 1.16 0.27 2-98 can accept 20 100 | 1.19 0.27 2-98 better 20 100 | 1.14 0.27 3-98 better 20 120 | 1.16 0.27 3-98 better 20125 | 1.00 0.27 4-98 can accept 20 130 |
Embodiment
Below in conjunction with embodiment the present invention is described in further detail.
Embodiment 1
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Na
2O 11.1 weight portions, modulus 3
KOH 4 weight portions
(B): sodium phosphate 1 weight portion
(C): glycerine 8 weight portions
(D): Zonyl
TMFSN 4 weight portions
(E): water 71.9 weight portions
At first the water with 80 weight portions adds in the plastic containers, add the glycerine of 8 weight portions and the ZonylTM FSN of 4 weight portions then, slowly be mixed into the thick liquid dissolving of bottom, the adding modulus is 3 SiO2/Na2O 11.1 weight portions, add KOH 1 weight portion and sodium phosphate 1 weight portion then, be stirred to dissolving fast, add entry to 100 weight portions.Testing conductivity by adjusting the consumption of KOH, is reconciled conductivity to 91-92mS/cm, and the total consumption of KOH is 4 weight portions.Continue to be stirred to potassium hydroxide and sodium phosphate dissolves fully, filter with the polypropylene filter of 2-5 micron, promptly obtain developing solution for heat-sensitive positive picture CTP plate, the pH value is 12.
(2) evaluation method of developer solution
The heat-sensitive positive-working version is exposed on the direct platemaking machine of LOTM400v, and laser energy is at 180MW～240MW.The test-strips that is used to expose is the step-wedge that direct platemaking machine carries, and is used for estimating plate site reductibility and sharpness, estimates the relative sensitivity of plate with exposure energy.
The plate imaging performance is estimated with following several characteristic value, and checkout equipment is GretagMacbeth
TMD196.Figure layer field density Dmax, the basic blank Dmin of version with site, LOTM400v exposure back, netting twine, development time, have listed evaluation result in table 1.
Embodiment 2
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Na
2O 13.7 weight portion moduluses 2.8
KOH 4 weight portions
(B): sodium hexametaphosphate 1 weight portion
Sodium phosphate 0.5 weight portion
(C): glycerine 8 weight portions
(D): Zonyl
TMFS300 4 weight portions
(E): water 68.8 weight portions
Method with each component repetition embodiment 1 of above-mentioned weight portion obtains developer solution, and developer solution pH value is 12.5.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 3
(2) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Na
2O 29.8 weight portion moduluses 2.6
Diethanolamine 2.8 weight portions
KOH 4 weight portions
(B): sodium pyrophosphate 2 weight portions
(C): glycerine 8 weight portions
(D): Zonyl
TMFSE 4 weight portions
(E): water 49.4 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 14.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 4
(3) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Li
2O 18.6 weight portion moduluses 3
NaOH 1 weight portion
Potassium phosphate 1 weight portion
(B): sodium tripolyphosphate 1 weight portion
(C): polyglycol 30 weight portions
(D): Fluorad
TMFC-430 4 weight portions
Fluorad
TMFC-4430 4 weight portions
(E): water 40.4 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 1.5.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 5
(4) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ K
2O 22.5 weight portion moduluses 3
(B): sodium phosphate 2 weight portions
(C): glycerine 6 weight portions
(D): Fluorad
TMFC-4430 8 weight portions
(E): water 61.5 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution,, developer solution pH value is 14.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 6
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Li
2O 22.8 weight portion moduluses 2.8
(B): sodium phosphate 2 weight portions
(C): glycerine 6 weight portions
(D): Zonyl
TMFSN 8 weight portions
(E): water 61.2 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 13.2.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 7
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Li
2O 22.8 weight portion moduluses 2.6
Diethanolamine 5.6 weight portions
(B): sodium pyrophosphate 2 weight portions
(C): glycerine 8 weight portions
(D): Zonyl
TMFS300 8 weight portions
(E): water 53.6 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 14.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 8
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Na
2O 18 weight portion moduluses 2.5
Triethylamine 22 weight portions
(B): sodium tripolyphosphate 0.5 weight portion
Sodium pyrophosphate 0.7 weight portion
(C): polyglycol 10 weight portions
(D): Zonyl
TMFSE 8 weight portions
(E): water 40.8 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 13.4.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 9
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Li
2O 12 weight portion moduluses 2.5
Triethanolamine 8 weight portions
NaOH 6 weight portions
(B): sodium hexametaphosphate 2 weight portions
(C): polypropylene glycol 12 weight portions
(D): Fluorad
TMFC-4430 8 weight portions
(E): water 52 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 12.9.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 10
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Li
2O 16 weight portion moduluses 2.3
Triethanolamine 8 weight portions
KOH 6 weight portions
(B): sodium hexametaphosphate 2 weight portions
(C): polypropylene glycol 12 weight portions
(D): Fluorad
TMFC-4430 2 weight portions
Zonyl
TMFSN 2 weight portions
Zonyl
TMFSE 2 weight portions
(E): water 50 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 12.4.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 11
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Na
2O 12 weight portion moduluses 2.3
Triethylamine 6 weight portions
KOH 6 weight portions
(B): sodium phosphate 1.6 weight portions
(C): polypropylene glycol 12 weight portions
(D): Fluorad
TMFC-4430 8 weight portions
(E): water 42.4 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 13.2.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
Embodiment 12
(1) preparation of developer solution
The parts by weight of each component of developer solution and each component are as follows:
(A): SiO
2/ Na
2O 12 weight portion moduluses 2
Triethylamine 4 weight portions
KOH 6 weight portions
Na
3PO
42 weight portions
(B): sodium hexametaphosphate 2 weight portions
(C): polypropylene glycol 12 weight portions
(D): Fluorad
TMFC-4430 8 weight portions
(E): water 54 weight portions
Method with above-mentioned each component repetition embodiment 1 obtains developer solution, and developer solution pH value is 13.8.
(2) evaluation method of developer solution
Evaluation method among the employing embodiment 1 is carried out the development capability evaluation to the development effect of developer solution, has listed evaluation result in table 1.
More than weight portion among all embodiment can be gram, kilogram or other unit of weight.
Claims (2)
1. developing solution for heat-sensitive positive picture CTP plate, it is characterized in that: this developer solution contains:
(A) at least a alkali compounds in the diethanolamine of 10-40 weight portion, triethylamine, triethanolamine, alkali-metal oxyhydroxide, alkali silicate, the alkali metal phosphate;
(B) at least a material in the sodium phosphate of 1-2 weight portion, sodium pyrophosphate, sodium tripolyphosphate, the sodium hexametaphosphate;
(C) thickening agent of the water-soluble or aqueous dispersion of 6-30 weight portion;
(D) fluorine surfactant of 2-8 weight portion;
(E) water adds and amounts to 100 weight portions behind the water; All total amount is that 100 weight portions are benchmark to above weight portion behind the water to add;
Described thickening agent is glycerine or polyglycol or polypropylene glycol;
The modulus of described alkali silicate is 2.0～3.0, and SiO2 concentration is 5～10% in the alkali silicate;
The pH value of described developer solution is 12～14.
2. developing solution for heat-sensitive positive picture CTP plate according to claim 1 is characterized in that: described fluorine surfactant is one or more materials in anionic fluorinated surfactant, cation fluorine surfactant, the non-ion fluorin surfactant.
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| CN200710180521XA CN101441422B (en) | 2007-11-22 | 2007-11-22 | Developing solution for heat-sensitive positive picture CTP plate |
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| CN200710180521XA CN101441422B (en) | 2007-11-22 | 2007-11-22 | Developing solution for heat-sensitive positive picture CTP plate |
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| CN101441422B true CN101441422B (en) | 2011-04-27 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106444305A (en) * | 2016-10-09 | 2017-02-22 | 温州市行者新材料有限公司 | UV ink-resistant UV-CTP plate developer |
| CN113109996A (en) * | 2021-02-26 | 2021-07-13 | 上海宝士嘉印刷器材有限公司 | Developing solution for heat-sensitive positive image CTP plate |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6200736B1 (en) * | 1998-04-15 | 2001-03-13 | Etec Systems, Inc. | Photoresist developer and method |
| EP1103859A1 (en) * | 1999-11-24 | 2001-05-30 | Kodak Polychrome Graphics Company Ltd. | Developing composition for alkaline-developable lithographic printing plates with different interlayers |
| CN1334492A (en) * | 2000-07-07 | 2002-02-06 | 富士胶片株式会社 | Method for making lithographic plate |
| CN1618042A (en) * | 2001-12-14 | 2005-05-18 | 罗姆和哈斯电子材料有限责任公司 | Developing solution for photoresist |
| CN1846172A (en) * | 2003-09-01 | 2006-10-11 | 株工会社新克 | Developer for positive photosensitive composition |
| CN1993651A (en) * | 2004-10-28 | 2007-07-04 | 株式会社新克 | Developer for thermal positive type photosensitive composition |
-
2007
- 2007-11-22 CN CN200710180521XA patent/CN101441422B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6200736B1 (en) * | 1998-04-15 | 2001-03-13 | Etec Systems, Inc. | Photoresist developer and method |
| EP1103859A1 (en) * | 1999-11-24 | 2001-05-30 | Kodak Polychrome Graphics Company Ltd. | Developing composition for alkaline-developable lithographic printing plates with different interlayers |
| CN1334492A (en) * | 2000-07-07 | 2002-02-06 | 富士胶片株式会社 | Method for making lithographic plate |
| CN1618042A (en) * | 2001-12-14 | 2005-05-18 | 罗姆和哈斯电子材料有限责任公司 | Developing solution for photoresist |
| CN1846172A (en) * | 2003-09-01 | 2006-10-11 | 株工会社新克 | Developer for positive photosensitive composition |
| CN1993651A (en) * | 2004-10-28 | 2007-07-04 | 株式会社新克 | Developer for thermal positive type photosensitive composition |
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