CN102053508B - Developer for positive thermosensitive CTP (Computer to Plate) - Google Patents
Developer for positive thermosensitive CTP (Computer to Plate) Download PDFInfo
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- CN102053508B CN102053508B CN201010539457A CN201010539457A CN102053508B CN 102053508 B CN102053508 B CN 102053508B CN 201010539457 A CN201010539457 A CN 201010539457A CN 201010539457 A CN201010539457 A CN 201010539457A CN 102053508 B CN102053508 B CN 102053508B
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Abstract
The invention discloses a developer for positive thermosensitive CTP (Computer to Plate), belonging to the technical field of preparation of developers for CTP. The developer comprises the following compositions in parts by weight: 75-85 parts of water, 10-15 parts of alkali metal metasilicate, 1-5 parts of surfactant, 1-5 parts of alkali resistant penetrating agent and 3-5 parts of auxiliary additive. The developer has the characteristics of high developing speed, good screen dot reduction, no damage to an aluminum substrate, difficulty in scaling, environmental protection, fatigue resistance, excellent developing latitude and the like.
Description
Technical field
The invention belongs to the preparation technique field of CTP, be specifically related to a kind of developer that is used for positive thermosensitive CTP version with developer.
Background technology
CTP technology (CTP technology) is with the high light of directionality such as laser, scans according to digital image information, thereby does not directly make the technology of galley through the slabstone lithographic film.CTP (computer to plate) plate generally is divided into three kinds on silver salt type, photo-polymerization type, thermal imaging type (temperature-sensitive).Positive thermosensitive CTP version is made up of heat sensing layer and support, and support is an aluminium sheet, and heat sensing layer contains film-forming resin, resistance solvent, IR dyes, background dye, product acid source and adjuvant etc. to be made; Support is the aluminium sheet that passes through electrolysis, washing, reaches sealing of hole.The image-forming principle of CTP version is that computing machine adopts the digitizing workflow directly to change literal, image into digital information to use laser scanning imaging.During exposure; IR dyes is converted into heat energy with the laser energy that absorbs in moment; Heat energy makes photo-thermal produce acid source and produces a large amount of Bronsted acids, and Bronsted acid makes the blocking group fracture of resistance solvent, discharges phenolic hydroxyl group and is dissolved in alkaline developer and has exposed the aluminum plate foundation of having handled; Be the non-image areas of forme, hydrophilicly in printing process scold China ink.Unexposed area does not dissolve in alkaline developer, is the image-region of forme, ink-receptively in printing process scolds water.
The developing process of CTP version is the process of seeing the light-sensitive surface dissolving in light zone on actually, and developer alkalescence is strong, the high then developing powder of temperature is fast; The development required time is short, otherwise then required time is long.Development time and development temperature have much relations to the development quality, and temperature is high, the time is long, and tiny site is prone to lose; Temperature is low, the time is short, and the light-sensitive surface dissolving is prone to go up dirty when thoroughly then not printing.
The reagent solution that comprises alkali silicate is for example at US 4,606,995A1, US4,500; 625A, US4,945,030A, EP0732628A1, US4,259; 434A, US5,851,735B, US4,469; 776A, EP0836120A, US4,452, retouch the limit among 880A, CN1930525A and the CN101762992A to some extent.Compare with the high pH developer that contains as the alkali metal hydroxide of basic component, the developer that contains alkali silicate has its lower advantage of etching action on the aluminium surface; Therefore they are through being usually used in the development of lithographic printing-plate.The effectiveness of developer can be through changing the SiO of alkali silicate
2/ M
2The control of O ratio.
United States Patent (USP) 4,711,836 have described the reagent solution that contains as the quaternary ammonium hydroxide of basic component.Owing to from ambient air, absorb CO
2, this type of developer is unsettled relatively; In common developing apparatus, for example immerse the type developing apparatus, because by CO
2Cause that pH reduces, and observes the reduction of developing and rendeing a service.
Summary of the invention
For solving the problem that above-mentioned prior art exists, the present invention provides a kind of developer composition of positive thermosensitive CTP version, and said composition is used to dissolve the positive-printing heat-sensitive CTP plate material exposed portion, makes it obtain the eurymeric image.The characteristics that the present invention gives prominence to are to have added alkali-resistant penetrant efficiently.
Positive thermosensitive CTP version developer of the present invention comprises the composition of following weight formulated component:
1) 75-85 part water;
2) alkali metal silicate of 10-15 part;
3) 1-5 part surfactant;
4) 1-5 part alkali-resistant penetrant;
5) 3-5 part auxiliary additive.
PH value>=12.5 of described alkali metal silicate, modulus are 0.8-2.2, and modulus is SiO
2With M
2The mol ratio of O, M is an alkaline metal, is specially sodium and potassium.
Described alkali metal silicate is specially one or more in sodium metasilicate, potassium metasilicate, sodium silicate and the KP1, preferred potassium metasilicate or sodium metasilicate.
The clean property agent of described surface is one or more in anionic surfactant, non-ionic surfactant and the amphoteric surfactant.
Described anionic surfactant is soap, sulphonate, sulfuric acid and phosphate ester salt; Be specially sodium butylnaphthalenesulfonate, nekal, draw back powder, in the isopropyl naphthalene sodium sulfonate, neopelex one or more.Described non-ionic surfactant is specially ethylene oxide adduct, cocinic acid, fatty acid, lauric acid, monoethanolamine, monoethanolamine, the non-ion fluorin carbon surface active agent of polyoxyethylene carboxylate, polyoxyethylene amine, polyoxyethylate amide, polypropylene glycol.
Described alkali-resistant penetrant is a turkey red oil, OP-10, OEP-70, OEP-98, AEP, OE-35; JFC, JFC-1, JFC-2, JFC-3, JFC-4; JFC-5, JFC-6, JFC-S, one or more among the JFC-M, one or more among preferred turkey red oil, OP-10, AEP, OEP-70, the JFC.
Described auxiliary additive is one or more in gluconic acid sodium salt, tetrasodium ethylenediamine tetraacetate, disodium ethylene diamine tetraacetate, glycerine, propylene glycol, monoethylene glycol, monoethylene glycol amine, the silicone defoaming agent.
Beneficial effect of the present invention: characteristics such as this developer has that developing powder is fast, the site is Well-recovered, do not damage aluminum plate foundation, less scaling, environmental protection, endurance and development tolerance are good.
Below in conjunction with embodiment, the present invention is done further description, rather than limit scope of the present invention.
Embodiment
Embodiment 1:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.75 part tap water;
2.14 the potassium metasilicate of part, modulus 2.0, pH value 13;
3.1 part sodium butylnaphthalenesulfonate, 1 part of polyoxyethylene amine, 1 part of non-ion fluorin carbon surface active agent;
4.1 part turkey red oil, 1 part of OP-10,1 part of AEP, 1 part of OEP-70,1 part of JFC;
5.1 part gluconic acid sodium salt.
Embodiment 2:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.78 part tap water;
2.12 the potassium metasilicate of part, modulus 1.8, pH value 14;
3.1 the ethylene oxide adduct of part isopropyl naphthalene sodium sulfonate, 1 part of neopelex, 1 part of polypropylene glycol;
4.1 part turkey red oil;
5.2 part disodium ethylene diamine tetraacetate, 2 parts of propylene glycol.
Embodiment 3:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.80 part deionized water;
2.14 the sodium metasilicate of part, modulus 1.0, pH value 13.5;
3.2 part is drawn back powder;
4.2 part OP-10;
5.3 part glycerine, 1 part of silicone defoaming agent.
Embodiment 4:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.82 part deionized water;
2.15 the potassium metasilicate of part, modulus 1.5, pH value 12.5;
3.3 part polyoxyethylene carboxylate;
4.4 part AEP;
5.4 part tetrasodium ethylenediamine tetraacetate.
Embodiment 5:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.84 part deionized water;
2.12 the sodium silicate of part, modulus 1.8, pH value 13;
3.4 part sodium butylnaphthalenesulfonate;
4.3 part JFC;
5.1 part gluconic acid sodium salt, 1 part of tetrasodium ethylenediamine tetraacetate, 1 part of monoethylene glycol, 1 part of monoethylene glycol amine, 1 part have
The machine silicon defoaming agent.
Embodiment 6:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.85 part distilled water;
2.14 the KP1 of part, modulus 1.0, pH value 12.5;
3.1 part neopelex;
4.2 part turkey red oil, 1 part of OEP-98,1 part of JFC-3;
5.1 part tetrasodium ethylenediamine tetraacetate, 1 part of disodium ethylene diamine tetraacetate, 1 part of monoethylene glycol amine.
Embodiment 7:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.83 part distilled water;
2.6 the sodium metasilicate of part modulus 2.1, pH value 14, the sodium silicate of 8 parts of moduluses 1.6, pH value 13;
3.5 part polyoxyethylene amine;
4.1 part AEP, 1 part of OE-35,1 part of JFC, 1 part of JFC-M;
5.2 part gluconic acid sodium salt, 1 part of silicone defoaming agent.
Embodiment 8:
Become assignment system positive thermosensitive CTP version developer by following weight proportion:
1.80 part distilled water;
2.7 the sodium metasilicate of part modulus 2.0, pH value 13.5, the potassium metasilicate of 7 parts of moduluses 1.8, pH value 13;
3.3 part non-ion fluorin carbon surface active agent;
4.1 part OP-10,1 part of AEP, 1 part of OE-35,1 part of JFC-3,1 part of JFC-S;
5.2 part disodium ethylene diamine tetraacetate, 3 parts of silicone defoaming agents.
Comparative Examples 1:
The positive thermosensitive CTP version of Taixing City Orient Industrial Company, with screen 8600S platemaking machine built in imaging 600 rev/mins of drums, laser power 85% time system 1%-100% halftone dot image; Increase progressively from 30% to 100% system sensitivity figure with 10% in 600 rev/mins of drums of imaging, laser power.In a kind of high-quality positive heat-sensitive CTP developer comparison under identical exposure and the development conditions and on the present market, the result is following with the foregoing description:
| Sensitivity | 1％ | 2％ | 9％ | 10％ | 25％ | 50％ | 90％ | |
| Embodiment 1 | 65% does not have blue circle | 0.6 | 1.3 | 7.7 | 8.9 | 22.1 | 47.2 | 89.0 |
| Embodiment 2 | 60% does not have blue circle | 0.5 | 1.2 | 7.6 | 8.7 | 22.0 | 47.1 | 88.9 |
| Embodiment 3 | 50% does not have blue circle | 0.5 | 1.3 | 7.5 | 8.6 | 22.1 | 47.1 | 88.8 |
| Embodiment 4 | 55% does not have blue circle | 0.5 | 1.2 | 7.6 | 8.6 | 22. | 47.0 | 88.9 |
| Embodiment 5 | 60% does not have blue circle | 0.5 | 1.2 | 7.6 | 8.5 | 21.9 | 47.2 | 89.1 |
| Embodiment 6 | 60% does not have blue circle | 0.5 | 1.3 | 7.5 | 8.6 | 21.922 | 47.1 | 89.0 |
| Embodiment 7 | 50% does not have blue circle | 0.5 | 1.3 | 7.6 | 8.6 | 21.8 | 47.2 | 88.9 |
| Embodiment 8 | 60% does not have blue circle | 0.5 | 1.2 | 7.7 | 8.5 | 21.9 | 47.2 | 88.8 |
| Comparative Examples 1 | 65% does not have blue circle | 0.6 | 1.3 | 7.7 | 8.8 | 22.0 | 47.3 | 88.9 |
Claims (5)
1. a positive thermosensitive CTP version developer is characterized in that, this developer is the composition that comprises the following weight formulated component:
1) 75 parts of tap water;
2) 14 parts potassium metasilicate, modulus 2.0, pH value 13;
3) 1 part of sodium butylnaphthalenesulfonate, 1 part of polyoxyethylene amine, 1 part of non-ion fluorin carbon surface active agent;
4) 1 part of turkey red oil, 1 part of OP-10,1 part of AEP, 1 part of OEP-70,1 part of JFC;
5) 1 part of gluconic acid sodium salt.
2. a positive thermosensitive CTP version developer is characterized in that, this developer is the composition that comprises the following weight formulated component:
1) 78 parts of tap water;
2) 12 parts potassium metasilicate, modulus 1.8, pH value 14;
3) ethylene oxide adduct of 1 part of isopropyl naphthalene sodium sulfonate, 1 part of neopelex, 1 part of polypropylene glycol;
4) 1 part of turkey red oil;
5) 2 parts of disodium ethylene diamine tetraacetates, 2 parts of propylene glycol.
3. a positive thermosensitive CTP version developer is characterized in that, this developer is the composition that comprises the following weight formulated component:
1) 85 parts of distilled water;
2) 14 parts KP1, modulus 1.0, pH value 12.5;
3) 1 part of neopelex;
4) 2 parts of turkey red oils, 1 part of OEP-98,1 part of JFC-3;
5) 1 part of tetrasodium ethylenediamine tetraacetate, 1 part of disodium ethylene diamine tetraacetate, 1 part of monoethylene glycol amine.
4. a positive thermosensitive CTP version developer is characterized in that, this developer is the composition that comprises the following weight formulated component:
1) 83 parts of distilled water;
2) sodium metasilicate of 6 parts of moduluses 2.1, pH value 14, the sodium silicate of 8 parts of moduluses 1.6, pH value 13;
3) 5 parts of polyoxyethylene amine;
4) 1 part of AEP, 1 part of OE-35,1 part of JFC, 1 part of JFC-M;
5) 2 parts of gluconic acid sodium salts, 1 part of silicone defoaming agent.
5. a positive thermosensitive CTP version developer is characterized in that, this developer is the composition that comprises the following weight formulated component:
1) 80 parts of distilled water;
2) sodium metasilicate of 7 parts of moduluses 2.0, pH value 13.5, the potassium metasilicate of 7 parts of moduluses 1.8, pH value 13;
3) 3 parts of non-ion fluorin carbon surface active agents;
4) 1 part of OP-10,1 part of AEP, 1 part of OE-35,1 part of JFC-3,1 part of JFC-S;
5) 2 parts of disodium ethylene diamine tetraacetates, 3 parts of silicone defoaming agents.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010539457A CN102053508B (en) | 2010-11-09 | 2010-11-09 | Developer for positive thermosensitive CTP (Computer to Plate) |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010539457A CN102053508B (en) | 2010-11-09 | 2010-11-09 | Developer for positive thermosensitive CTP (Computer to Plate) |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102053508A CN102053508A (en) | 2011-05-11 |
| CN102053508B true CN102053508B (en) | 2012-09-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010539457A Expired - Fee Related CN102053508B (en) | 2010-11-09 | 2010-11-09 | Developer for positive thermosensitive CTP (Computer to Plate) |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102722092A (en) * | 2012-06-06 | 2012-10-10 | 乐凯华光印刷科技有限公司 | Developing solution applicable to photo-polymerization type lithographic printing plate |
| CN103728845B (en) * | 2013-12-30 | 2016-07-13 | 清华大学 | Developer composition for flat panel display |
| CN106842834B (en) * | 2017-04-12 | 2020-01-03 | 安徽强邦印刷材料有限公司 | Developing solution for heat-sensitive positive image CTP plate |
| CN106842833B (en) * | 2017-04-12 | 2020-06-26 | 安徽强邦印刷材料有限公司 | Preparation method of developing solution |
| CN107728438B (en) * | 2017-10-30 | 2021-02-05 | 江门市奔力达电路有限公司 | Novel solder resist developing solution and preparation method thereof |
| CN108363274A (en) * | 2018-01-25 | 2018-08-03 | 上海宝士嘉印刷器材有限公司 | The ink of resistance to UV heat-sensitive CTP plate developer solution |
| CN112394622A (en) * | 2020-09-26 | 2021-02-23 | 芯越微电子材料(嘉兴)有限公司 | Low-etching-rate developer composition and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1273972A1 (en) * | 2001-07-04 | 2003-01-08 | Fuji Photo Film Co., Ltd. | Developer for photopolymerizable presensitized plate for use in making lithographic printing plate and method for preparing lithographic printing plate |
| CN101762992A (en) * | 2009-12-25 | 2010-06-30 | 平易印刷技术有限公司 | Positive thermosensitive CTP version developer solution |
| CN101825848A (en) * | 2010-04-19 | 2010-09-08 | 张万诚 | Developing solution of thermosensitive positive-type photosensitive plate for printing and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4166167B2 (en) * | 2004-02-05 | 2008-10-15 | 富士フイルム株式会社 | Photosensitive lithographic printing plate developer and lithographic printing plate making method |
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2010
- 2010-11-09 CN CN201010539457A patent/CN102053508B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1273972A1 (en) * | 2001-07-04 | 2003-01-08 | Fuji Photo Film Co., Ltd. | Developer for photopolymerizable presensitized plate for use in making lithographic printing plate and method for preparing lithographic printing plate |
| CN101762992A (en) * | 2009-12-25 | 2010-06-30 | 平易印刷技术有限公司 | Positive thermosensitive CTP version developer solution |
| CN101825848A (en) * | 2010-04-19 | 2010-09-08 | 张万诚 | Developing solution of thermosensitive positive-type photosensitive plate for printing and preparation method thereof |
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