CN102314098A - Thermo-sensitive CTP (cytidine triphosphate) version developing solution and preparation method thereof - Google Patents
Thermo-sensitive CTP (cytidine triphosphate) version developing solution and preparation method thereof Download PDFInfo
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- CN102314098A CN102314098A CN 201110125430 CN201110125430A CN102314098A CN 102314098 A CN102314098 A CN 102314098A CN 201110125430 CN201110125430 CN 201110125430 CN 201110125430 A CN201110125430 A CN 201110125430A CN 102314098 A CN102314098 A CN 102314098A
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Abstract
The invention discloses a thermo-sensitive CTP (cytidine triphosphate) version developing solution, which comprises the following components: deionized water, metol, anhydrous sodium sulphite, sodium metaborate, potassium thiocyanate, potassium bromide, phenidone and fluorinated alkyl. The invention also discloses a preparation method of the thermo-sensitive CTP version developing solution, which comprises the following steps: firstly, adding the anhydrous sodium sulphite into the deionized water to stir for the first time to prepare a mixing solution I; then, adding the metol into the mixing solution I to stir for the second time to prepare a mixing solution II; subsequently adding the sodium metaborate, the phenidone and the potassium bromide into the mixing solution II to stir for the third time to prepare a mixing solution III; then, adding the potassium thiocyanate into the mixing solution III to stir for the fourth time to prepare a mixing solution IV; and finally, adding the fluorinated alkyl into the mixing solution IV to stir for the fifth time to obtain the thermo-sensitive CTP version developing solution. The developing solution disclosed by the invention has the advantages of wide allowable operating temperature range, good density stability of an image-text part, great tolerance level and the like and does not damage an aluminum sheet base.
Description
Technical field
The present invention relates to a kind of heat-sensitive CTP plate developer solution and preparation method thereof.
Background technology
The huge change that the CTP technology is brought to press, with regard to CI, P Developing Trend in Technology, the thermosensitive CTP plate-making technology is day by day ripe and universal, and the novel thermosensitive C11P plate of exploitation function admirable becomes one of focus of printing plate manufacturing enterprise concern.Positive-printing heat-sensitive CTP plate material is the main flow in market in the commercial thermal CTP plate material at present.This type of plate is after the process laser scanning; See that light part sees that with non-the difference of solubleness takes place light coating partly in developer solution; See that the light partial coating is dissolved in and expose aluminum substrate in the developer solution to form the non-graphic part hydrophilic; Non-ly see that the light coating is not dissolved and stay that to form the picture and text part ink-receptive that the quality of developer solution directly influences the performance of plate.When carrying out development treatment, generally use the organic or inorganic alkaline aqueous solution, such developer solution rapid permeability in development step and obtains dissolving and disperses in photosensitive composite.But this alkaline-based developer can not be eliminated unwanted filming fully, produces scum silica frost in the pixel that not only obtains, and is difficult to form the pixel with excellent image border.In addition, at present commercially available developer solution specificity is strong, supporting with specific plate basically, has problems such as versatility is poor, fatigue resistence is poor, tolerance is little.
Summary of the invention
The invention provides a kind of heat-sensitive CTP plate developer solution and preparation method thereof, but that operating temperature range extensively, does not damage aluminum plate foundation, picture and text partial density good stability, tolerance is big.
The present invention has adopted following technical scheme: a kind of heat-sensitive CTP plate developer solution, it comprises following component: deionized water, Mitouer, anhydrous sodium sulfite, kodalk, potassium rhodanide, potassium bromide, phenidone and perfluoroalkyl.
The weight of each component of the present invention is: deionized water 100 weight portions, Mitouer 2 weight portions, anhydrous sodium sulfite 100 weight portions, kodalk 2 weight portions, potassium rhodanide 1 weight portion, potassium bromide 1 weight portion, phenidone 0.2 weight portion, perfluoroalkyl 1 weight portion.
The present invention is a kind of preparation method of heat-sensitive CTP plate developer solution, and it may further comprise the steps: step 1, and anhydrous sodium sulfite joined carry out the first time in the deionized water and stir, form mixed solution I; Step 2 joins in the mixed solution I with Mitouer and carries out the second time and stir, and forms mixed solution I I; Step 3 joins kodalk, phenidone, potassium bromide successively among the mixed solution I I and to stir for the third time, forms mixed solution I II; Step 4 joins potassium rhodanide and carries out the 4th time among the mixed solution I II and stir, and forms mixed solution I V; Step 5 joins perfluoroalkyl among the mixed solution I V, carries out the 5th time and stirs, and forms the heat-sensitive CTP plate developer solution.
Mixing time is 2 hours for the first time; Mixing time is 0.5 hour for the second time; Mixing time is 1.5 hours for the third time; The 4th time mixing time is 0.5 hour; The 5th time mixing time is 0.1 hour.
The present invention has following beneficial effect: the present invention has permissible operating temperature range and extensively, does not damage advantages such as aluminum plate foundation, picture and text partial density good stability, tolerance be big.
Embodiment
The invention discloses a kind of heat-sensitive CTP plate developer solution, it comprises following component: deionized water, Mitouer, anhydrous sodium sulfite, kodalk, potassium rhodanide, potassium bromide, phenidone and perfluoroalkyl.The weight of each component is: deionized water 100 weight portions, Mitouer 2 weight portions, anhydrous sodium sulfite 100 weight portions, kodalk 2 weight portions, potassium rhodanide 1 weight portion, potassium bromide 1 weight portion, phenidone 0.2 weight portion, perfluoroalkyl 1 weight portion.
The invention also discloses a kind of preparation method of heat-sensitive CTP plate developer solution, it may further comprise the steps: step 1, and anhydrous sodium sulfite joined carried out in the deionized water stirring the first time 2 hours, form mixed solution I; Step 2 joins Mitouer that I carried out stirring the second time 0.5 hour in the mixed solution, forms mixed solution I I; Step 3 joins kodalk, phenidone, potassium bromide successively and to stir for the third time among the mixed solution I I 1.5 hours, forms mixed solution I II; Step 4 joins potassium rhodanide and carries out among the mixed solution I II stirring for the 4th time 0.5 hour, forms mixed solution I V; Step 5 joins perfluoroalkyl among the mixed solution I V, carries out the 5th time and stirs 0.1 hour, forms the heat-sensitive CTP plate developer solution.
Claims (8)
1. a heat-sensitive CTP plate developer solution is characterized in that it comprises following component: deionized water, Mitouer, anhydrous sodium sulfite, kodalk, potassium rhodanide, potassium bromide, phenidone and perfluoroalkyl.
2. a kind of heat-sensitive CTP plate developer solution according to claim 1 is characterized in that the weight of each component is: deionized water 100 weight portions, Mitouer 2 weight portions, anhydrous sodium sulfite 100 weight portions, kodalk 2 weight portions, potassium rhodanide 1 weight portion, potassium bromide 1 weight portion, phenidone 0.2 weight portion, perfluoroalkyl 1 weight portion.
3. the preparation method of a kind of heat-sensitive CTP plate developer solution according to claim 1 is characterized in that it may further comprise the steps: step 1, and anhydrous sodium sulfite joined carry out the first time in the deionized water and stir, form mixed solution I; Step 2 joins in the mixed solution I with Mitouer and carries out the second time and stir, and forms mixed solution I I; Step 3 joins kodalk, phenidone, potassium bromide successively among the mixed solution I I and to stir for the third time, forms mixed solution I II; Step 4 joins potassium rhodanide and carries out the 4th time among the mixed solution I II and stir, and forms mixed solution I V; Step 5 joins perfluoroalkyl among the mixed solution I V, carries out the 5th time and stirs, and forms the heat-sensitive CTP plate developer solution.
4. according to the preparation method of the said a kind of heat-sensitive CTP plate developer solution of claim 3, it is characterized in that mixing time is 2 hours for the first time.
5. according to the preparation method of the said a kind of heat-sensitive CTP plate developer solution of claim 3, it is characterized in that mixing time is 0.5 hour for the second time.
6. according to the preparation method of the said a kind of heat-sensitive CTP plate developer solution of claim 3, it is characterized in that mixing time is 1.5 hours for the third time.
7. according to the preparation method of the said a kind of heat-sensitive CTP plate developer solution of claim 3, it is characterized in that the 4th mixing time is 0.5 hour.
8. according to the preparation method of the said a kind of heat-sensitive CTP plate developer solution of claim 3, it is characterized in that the 5th mixing time is 0.1 hour.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110125430 CN102314098A (en) | 2011-05-10 | 2011-05-10 | Thermo-sensitive CTP (cytidine triphosphate) version developing solution and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110125430 CN102314098A (en) | 2011-05-10 | 2011-05-10 | Thermo-sensitive CTP (cytidine triphosphate) version developing solution and preparation method thereof |
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| CN102314098A true CN102314098A (en) | 2012-01-11 |
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| CN 201110125430 Pending CN102314098A (en) | 2011-05-10 | 2011-05-10 | Thermo-sensitive CTP (cytidine triphosphate) version developing solution and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104281016A (en) * | 2014-09-24 | 2015-01-14 | 安徽省中彩印务有限公司 | Easy-to-prepare PS plate developing liquid and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1170888A (en) * | 1996-07-11 | 1998-01-21 | 中国科学院大连化学物理研究所 | Black-and-white development liquid for negative film reversal developing technique and developing technique |
| CN1332392A (en) * | 2000-06-26 | 2002-01-23 | 中国科学院感光化学研究所 | Concentrated black-and-white developer solution and its prepn |
| CN1618042A (en) * | 2001-12-14 | 2005-05-18 | 罗姆和哈斯电子材料有限责任公司 | Developing solution for photoresist |
| WO2008111513A1 (en) * | 2007-03-09 | 2008-09-18 | Konica Minolta Holdings, Inc. | Physical developer, method of preparing conductive pattern, electromagnetic wave shielding material, fitter for plasma display and panel for plasma display |
| CN101762992A (en) * | 2009-12-25 | 2010-06-30 | 平易印刷技术有限公司 | Positive thermosensitive CTP version developer solution |
-
2011
- 2011-05-10 CN CN 201110125430 patent/CN102314098A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1170888A (en) * | 1996-07-11 | 1998-01-21 | 中国科学院大连化学物理研究所 | Black-and-white development liquid for negative film reversal developing technique and developing technique |
| CN1332392A (en) * | 2000-06-26 | 2002-01-23 | 中国科学院感光化学研究所 | Concentrated black-and-white developer solution and its prepn |
| CN1618042A (en) * | 2001-12-14 | 2005-05-18 | 罗姆和哈斯电子材料有限责任公司 | Developing solution for photoresist |
| WO2008111513A1 (en) * | 2007-03-09 | 2008-09-18 | Konica Minolta Holdings, Inc. | Physical developer, method of preparing conductive pattern, electromagnetic wave shielding material, fitter for plasma display and panel for plasma display |
| CN101762992A (en) * | 2009-12-25 | 2010-06-30 | 平易印刷技术有限公司 | Positive thermosensitive CTP version developer solution |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104281016A (en) * | 2014-09-24 | 2015-01-14 | 安徽省中彩印务有限公司 | Easy-to-prepare PS plate developing liquid and preparation method thereof |
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Application publication date: 20120111 |