CN106444305A - UV ink-resistant UV-CTP plate developer - Google Patents
UV ink-resistant UV-CTP plate developer Download PDFInfo
- Publication number
- CN106444305A CN106444305A CN201610881208.8A CN201610881208A CN106444305A CN 106444305 A CN106444305 A CN 106444305A CN 201610881208 A CN201610881208 A CN 201610881208A CN 106444305 A CN106444305 A CN 106444305A
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- Prior art keywords
- ink
- ctp plate
- resistance
- alkaline
- developing liquid
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The invention relates to a UV ink-resistant UV-CTP plate developer. The UV ink-resistant UV-CTP plate developer is characterized by comprising the following raw materials in percentage by mass: 3%-35% of an alkaline main agent, 0.3%-10% of a solubilizer, 0.2%-8% of a penetrating agent, 0.5%-15% of an alkaline regulator, 0.001%-3% of a coating protective agent and 30%-95% of water. By adopting the technical scheme, according to the UV ink-resistant UV-CTP plate developer provided by the invention, the declination is slow, the UV ink-resistant UV-CTP plate developer is not easy to scale, and crystal is not easily generated in a low-temperature environment.
Description
Technical field
The present invention relates to a kind of developer solution, particularly to a kind of ink of resistance to UV UV-CTP plate developing liquid.
Background technology
The ink of resistance to UV UV-CTP plate is a kind of offset plate material being imaged using 405nm laser, due to its producer
Just, moderate cost, easy to use, can be used for the printing of UV ink, can remove baking from and directly use in packaging UV printing.Resistance to UV
Ink UV-CTP plate developing liquid is requisite consumptive material during the ink of resistance to UV UV-CTP version uses, but most on the market
It is the developer solution of traditional PS version.Its shortcoming is：
1st, decay soon, when traditional PS version uses, less demanding due to reducing to site, with improving developer temperatur or prolongation
Developing time is making up, but the ink of the resistance to UV UV-CTP version for fine definition, and the parameter of change is brought inconsistent result, is
Cannot accept, if increasing the frequency changing developer solution, the labour intensity of operating personnel can be increased and waste time；
2nd, easily fouling on developing apparatus, the fouling of circulation line causes flow to diminish, the scale effect space of a whole page liquid of hairbrush
Update, fouling when serious also can scratch the space of a whole page, and the space of a whole page is damaged in the fouling coming off by pressure；
3rd, easily crystallize during winter, when pouring out from bucket, partially crystallizable is stayed in bucket, cause developer solution composition to change.
Content of the invention
The purpose of the present invention：In order to overcome the defect of prior art, the invention provides a kind of ink of resistance to UV UV-CTP version
Developer solution, its decline is slow, less scaling, is not easy to produce crystallization under low temperature environment.
Technical scheme：A kind of ink of resistance to UV UV-CTP plate developing liquid it is characterised in that：By mass percentage
Meter, includes alkaline host 3-35%, solubilizer 0.3-10%, bleeding agent 0.2-8%, alkaline conditioner 0.5-15%, coating protection
Agent 0.001-3%, water 30-95%.
Arrange further：Alkaline host adopts alkali silicate, can be sodium metasilicate.
Arrange further：Solubilizer adopts hydroxy compounds, can be pentanediol.
Arrange further：Bleeding agent adopts hydroxy compounds, can be hydroxyethyl cellulose.
Arrange further：Alkaline conditioner adopts butynediols alkalescence compound, wherein butynediols and potassium hydroxide
Weight is than for 1：10.
Arrange further：Coating protective agent adopts polyethylene polyamine surfactant blend, by weight, three second
Alkene tetramine：OP-10=2：8.
Using technique scheme, wherein, alkaline host is used for dissolving in coating by the part of laser induced breakdown；Solubilizer,
Bleeding agent is used for increasing coating development dissolubility；Alkaline conditioner is used for adjusting the alkalescence of whole system, controls developing process film
Within loss 10%；Coating protective agent can form stronger buffer system, makes in developing process, and liquid medicine is molten to coating part
Solution ability keeps relative stability；Water is used for adjusting the concentration of developer solution.
Alkaline matter in developer solution plays dissolution, and coating protective agent rise protective coating will not undue dissolving work
With both reasonably combined can make the local of this dissolving of coating thoroughly dissolve, and the place of this reservation more fully retains, and starts
When, alkaline matter and coating protection agent concentration all higher, due to there being the protectant protection of coating, whole system did not show
The situation of degree development；When development consumes alkaline matter, during alkaline matter concentration step-down, coating protective agent is also due to consume concentration
Step-down, protective effect weakens, and when the dissolution of alkaline matter and the protectant protective effect of coating reach balance, develop energy
Trying hard to keep, it is constant to hold.Due to the presence of butynediols alkalescence compound and polyethylene polyamine surfactant blend, reactant
Fouling crystal formation is destroyed, fouling difficult to form.As a same reason, developer solution itself crystallization also difficult to form under low temperature.
Therefore, the ink of the resistance to UV UV-CTP plate developing liquid of this structure, its decline is slow, less scaling, under low temperature environment
It is not likely to produce crystallization.
Specific embodiment
Embodiment 1：Alkaline host：3.0kg, solubilizer：0.3kg, bleeding agent：0.2kg, alkaline conditioner：15kg, coating
Protective agent：0.001kg, water：81.499kg is obtained the ink of the resistance to UV UV-CTP plate developing liquid of 100kg.
Embodiment 2：Alkaline host：35kg, solubilizer：10.0kg, bleeding agent：8.0kg, alkaline conditioner：0.5kg, applies
Layer protective agent：3.0kg, water：43.5kg is obtained the ink of the resistance to UV UV-CTP plate developing liquid of 100kg.
Embodiment 3：Alkaline host：19kg, solubilizer：5.1kg, bleeding agent：4.1kg, alkaline conditioner：7.8kg, coating
Protective agent：1.5kg, water：62.5kg is obtained the ink of the resistance to UV UV-CTP plate developing liquid of 100kg.
Above-mentioned material stirring dissolution filter, by embodiment 1,2,3 respectively filled with Hu.q PT-90 developing machine cell body（33.8
Rise）, circulation constant temperature, to 25 DEG C, developing time is set to 25 seconds.The UV-CTP version of the ink of resistance to UV that embodiment 1,2,3 is obtained
Coating centrifugal coating is 0.38-0.4 μm in roughness Ra, and quality of oxide layer is 2.0-3.0 gram/m, through sealing of hole
On 1050 aluminum substrates, after 137 DEG C dry 2 point half, take 465mm × 380mm breadth, in section's thunder UVP-3324GX+ laser platemaker
On be imaged, get in developer solution 25 DEG C ready and develop 25 seconds above-mentioned, test site with iCPlate, exposed with acetone test is complete
The coating residual in area determine which rank of energy laser just can bottom clearly, and compareed with the developer solution of traditional PS version, such as table
One：
| 10% site | Clear bottom energy（mW） | Precipitum after developer solution discharge | ||
| Embodiment 1： | 9.31 | 40 | - | |
| Embodiment 2： | 9.72 | 40 | - | |
| Embodiment 3： | 9.32 | 40 | - | |
| The developer solution of traditional PS version | 8.90 | 40 | - | |
| Embodiment 1： | After development 100 | 9.32 | 40 | - |
| Embodiment 2： | After development 100 | 9.73 | 40 | - |
| Embodiment 3： | After development 100 | 9.33 | 40 | - |
| The developer solution of traditional PS version | After development 100 | 8.91 | 45 | - |
| Embodiment 1： | After development 500 | - | - | No |
| Embodiment 2： | After development 500 | - | - | No |
| Embodiment 3： | After development 500 | - | - | No |
| The developer solution of traditional PS version | After development 500 | - | - | Have |
As shown in Table 1：The developer solution decline being obtained in embodiment 1,2,3 is slow, no fouling after development 500；And traditional PS version
Developing liquid developing 500 after have fouling.
The developer solution of embodiment 1,2,3 and traditional PS version is respectively charged into Plastic Drum, tests under cold storage environment, knot
Fruit such as table two：
| - 6 DEG C, 72 hours | - 18 DEG C, 72 hours | |
| Embodiment 1 | Nodeless mesh | Nodeless mesh |
| Embodiment 2 | Nodeless mesh | Nodeless mesh |
| Embodiment 3 | Nodeless mesh | Nodeless mesh |
| The developer solution of traditional PS version | Bucket wall has crystallization | Mass crystallization |
As shown in Table 2, the developer solution that embodiment 1,2,3 is obtained, will not produce crystallization at low temperature；And the development of traditional PS version
Liquid can produce crystallization at low temperature, and the lower crystallization of temperature is more serious.
Claims (6)
1. a kind of ink of resistance to UV UV-CTP plate developing liquid it is characterised in that：By mass percentage, include alkaline host 3-
35%th, solubilizer 0.3-10%, bleeding agent 0.2-8%, alkaline conditioner 0.5-15%, coating protective agent 0.001-3%, water 30-95%.
2. the ink of resistance to UV UV-CTP plate developing liquid according to claim 1 it is characterised in that：Alkaline host adopts alkali metal
Silicate.
3. the ink of resistance to UV UV-CTP plate developing liquid according to claim 1 and 2 it is characterised in that：Solubilizer adopts hydroxyl
Compound.
4. the ink of resistance to UV UV-CTP plate developing liquid according to claim 3 it is characterised in that：Bleeding agent adopts hydroxy compound
Thing.
5. the ink of the resistance to UV UV-CTP plate developing liquid according to claim 1 or 2 or 4 it is characterised in that：Alkaline conditioner is adopted
With butynediols alkalescence compound.
6. the ink of resistance to UV UV-CTP plate developing liquid according to claim 5 it is characterised in that：Coating protective agent adopts many second
Alkene polyamine surfactant compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610881208.8A CN106444305A (en) | 2016-10-09 | 2016-10-09 | UV ink-resistant UV-CTP plate developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610881208.8A CN106444305A (en) | 2016-10-09 | 2016-10-09 | UV ink-resistant UV-CTP plate developer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106444305A true CN106444305A (en) | 2017-02-22 |
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ID=58172022
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610881208.8A Pending CN106444305A (en) | 2016-10-09 | 2016-10-09 | UV ink-resistant UV-CTP plate developer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108363274A (en) * | 2018-01-25 | 2018-08-03 | 上海宝士嘉印刷器材有限公司 | The ink of resistance to UV heat-sensitive CTP plate developer solution |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101441422A (en) * | 2007-11-22 | 2009-05-27 | 乐凯集团第二胶片厂 | Developing solution for heat-sensitive positive picture CTP plate |
| CN101762992A (en) * | 2009-12-25 | 2010-06-30 | 平易印刷技术有限公司 | Positive thermosensitive CTP version developer solution |
| CN104136995A (en) * | 2012-02-27 | 2014-11-05 | 富士胶片株式会社 | Lithographic printing plate precursor, and production method for lithographic printing plate |
-
2016
- 2016-10-09 CN CN201610881208.8A patent/CN106444305A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101441422A (en) * | 2007-11-22 | 2009-05-27 | 乐凯集团第二胶片厂 | Developing solution for heat-sensitive positive picture CTP plate |
| CN101762992A (en) * | 2009-12-25 | 2010-06-30 | 平易印刷技术有限公司 | Positive thermosensitive CTP version developer solution |
| CN104136995A (en) * | 2012-02-27 | 2014-11-05 | 富士胶片株式会社 | Lithographic printing plate precursor, and production method for lithographic printing plate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108363274A (en) * | 2018-01-25 | 2018-08-03 | 上海宝士嘉印刷器材有限公司 | The ink of resistance to UV heat-sensitive CTP plate developer solution |
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Application publication date: 20170222 |