CN100381216C - 喷嘴清洗装置及基板处理装置 - Google Patents
喷嘴清洗装置及基板处理装置 Download PDFInfo
- Publication number
- CN100381216C CN100381216C CNB2005100094086A CN200510009408A CN100381216C CN 100381216 C CN100381216 C CN 100381216C CN B2005100094086 A CNB2005100094086 A CN B2005100094086A CN 200510009408 A CN200510009408 A CN 200510009408A CN 100381216 C CN100381216 C CN 100381216C
- Authority
- CN
- China
- Prior art keywords
- aforementioned
- nozzle
- cleaning
- cleaning fluid
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Coating Apparatus (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (14)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004080188A JP4451175B2 (ja) | 2004-03-19 | 2004-03-19 | ノズル洗浄装置および基板処理装置 |
JP2004080188 | 2004-03-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1669680A CN1669680A (zh) | 2005-09-21 |
CN100381216C true CN100381216C (zh) | 2008-04-16 |
Family
ID=35041240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100094086A Active CN100381216C (zh) | 2004-03-19 | 2005-02-21 | 喷嘴清洗装置及基板处理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4451175B2 (zh) |
KR (1) | KR100642666B1 (zh) |
CN (1) | CN100381216C (zh) |
TW (1) | TWI293578B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI454317B (zh) * | 2008-08-11 | 2014-10-01 | Murata Machinery Ltd | nozzle |
CN104741291A (zh) * | 2013-12-25 | 2015-07-01 | 芝浦机械电子装置株式会社 | 粘合剂涂布装置与构件清洁法及显示面板制造装置与方法 |
CN107433240A (zh) * | 2016-05-26 | 2017-12-05 | 株式会社斯库林集团 | 喷嘴清扫装置、涂覆装置及喷嘴清扫方法 |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006088033A (ja) | 2004-09-24 | 2006-04-06 | Future Vision:Kk | ウェット処理装置 |
JP4792787B2 (ja) * | 2005-03-31 | 2011-10-12 | 凸版印刷株式会社 | 洗浄装置付塗布装置 |
KR100708314B1 (ko) | 2005-11-04 | 2007-04-17 | 세메스 주식회사 | 노즐 처리 유닛 및 방법, 그리고 상기 유닛을 가지는 기판처리 장치 |
JP4493034B2 (ja) | 2005-11-21 | 2010-06-30 | 東京エレクトロン株式会社 | 塗布膜の成膜方法及びその装置 |
JP4884038B2 (ja) * | 2006-03-10 | 2012-02-22 | 東京応化工業株式会社 | スリットノズル洗浄装置 |
JP4985007B2 (ja) * | 2006-03-22 | 2012-07-25 | 東レ株式会社 | 塗布器の洗浄装置、塗布方法及び塗布装置、ならびに液晶ディスプレイ用部材の製造方法 |
JP4808147B2 (ja) | 2006-12-15 | 2011-11-02 | 中外炉工業株式会社 | 塗布用ダイの清掃装置 |
JP4857193B2 (ja) | 2007-05-28 | 2012-01-18 | 大日本スクリーン製造株式会社 | ノズル洗浄装置 |
JP5518284B2 (ja) * | 2007-07-12 | 2014-06-11 | 東京応化工業株式会社 | ノズル洗浄装置、ノズル洗浄方法、塗布装置及び塗布方法 |
KR100893670B1 (ko) * | 2007-08-10 | 2009-04-20 | 주식회사 케이씨텍 | 노즐 세정장치 및 세정방법 |
TW200911389A (en) | 2007-08-17 | 2009-03-16 | Dainippon Screen Mfg | Nozzle keeping device and coating device |
JP4972504B2 (ja) * | 2007-09-12 | 2012-07-11 | 大日本スクリーン製造株式会社 | 塗布装置 |
KR100897240B1 (ko) | 2007-09-21 | 2009-05-14 | 주식회사 디엠에스 | 세정장치를 구비한 슬릿코터 |
JP5352080B2 (ja) * | 2007-12-05 | 2013-11-27 | 東京応化工業株式会社 | ノズル洗浄装置、ノズル洗浄方法、塗布装置及び塗布方法 |
CN101271277B (zh) * | 2008-05-06 | 2010-12-22 | 友达光电股份有限公司 | 喷嘴清洁装置 |
KR100975129B1 (ko) * | 2008-06-27 | 2010-08-11 | 주식회사 디엠에스 | 노즐 립 클리너를 구비한 슬릿 코터 |
JP5036664B2 (ja) * | 2008-09-04 | 2012-09-26 | 東京エレクトロン株式会社 | 液処理におけるノズル洗浄、処理液乾燥防止方法及びその装置 |
JP2010240550A (ja) * | 2009-04-03 | 2010-10-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
DE102010022309A1 (de) * | 2010-06-01 | 2011-12-01 | Dürr Systems GmbH | Vorrichtung, Verfahren und System zur Aufnahme und/oder Abgabe von Entsorgungsmittel |
JP5226046B2 (ja) * | 2010-08-18 | 2013-07-03 | 東京エレクトロン株式会社 | 塗布装置及びノズルのメンテナンス方法 |
JP5864232B2 (ja) * | 2011-02-01 | 2016-02-17 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
CN202087472U (zh) * | 2011-05-10 | 2011-12-28 | 深圳市华星光电技术有限公司 | 狭缝涂布机喷嘴的清洗装置 |
JP5819123B2 (ja) * | 2011-07-12 | 2015-11-18 | 東レ株式会社 | 口金洗浄方法 |
KR101335219B1 (ko) * | 2011-08-04 | 2013-11-29 | 주식회사 케이씨텍 | 슬릿 노즐의 비접촉식 세정기구 및 이를 이용한 세정 방법 |
KR101383755B1 (ko) * | 2011-09-30 | 2014-04-10 | 세메스 주식회사 | 기판 처리 장치 및 헤드 유닛의 세정 방법 |
JP5841449B2 (ja) * | 2012-02-10 | 2016-01-13 | 東京エレクトロン株式会社 | 拭き取りパッド及びこのパッドを用いたノズルメンテナンス装置並びに塗布処理装置 |
TWI544291B (zh) * | 2012-05-22 | 2016-08-01 | 斯克林半導體科技有限公司 | 顯像處理裝置 |
JP5701822B2 (ja) * | 2012-06-20 | 2015-04-15 | 東レエンジニアリング株式会社 | 洗浄装置および洗浄方法 |
JP6000782B2 (ja) * | 2012-09-26 | 2016-10-05 | 株式会社Screenホールディングス | 塗布装置および液受け洗浄装置 |
CN103041943B (zh) * | 2013-01-10 | 2015-09-02 | 深圳市华星光电技术有限公司 | 喷嘴清洁装置和具有该喷嘴清洁装置的涂布机 |
JP2014184357A (ja) * | 2013-03-21 | 2014-10-02 | Toshiba Corp | ノズル洗浄ユニット、およびノズル洗浄方法 |
JP2015060932A (ja) * | 2013-09-18 | 2015-03-30 | 株式会社東芝 | スパイラル塗布装置 |
CN103846183A (zh) | 2013-12-20 | 2014-06-11 | 深圳市华星光电技术有限公司 | 一种涂布机喷嘴清洁装置 |
KR102232667B1 (ko) * | 2014-06-12 | 2021-03-30 | 세메스 주식회사 | 기판 처리 장치 |
CN104941876A (zh) * | 2015-07-15 | 2015-09-30 | 合肥鑫晟光电科技有限公司 | 一种涂胶机胶头的清洁设备 |
JP6789038B2 (ja) | 2016-08-29 | 2020-11-25 | 株式会社Screenホールディングス | 基板処理装置 |
CN106378331A (zh) * | 2016-11-28 | 2017-02-08 | 武汉华星光电技术有限公司 | 一种混合型口金非接触清洗装置及清洗方法 |
JP6812262B2 (ja) * | 2017-02-09 | 2021-01-13 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP6878077B2 (ja) * | 2017-03-24 | 2021-05-26 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
CN107694811B (zh) * | 2017-09-25 | 2019-08-20 | 武汉华星光电技术有限公司 | 清洁装置 |
CN109807027A (zh) * | 2017-11-20 | 2019-05-28 | 沈阳芯源微电子设备股份有限公司 | 一种使用电控回吸阀的胶嘴清洗***及其清洗方法 |
CN108704897B (zh) * | 2018-05-21 | 2021-04-23 | 昆山龙腾光电股份有限公司 | 涂布机喷嘴的清洁装置以及清洁方法 |
KR102620219B1 (ko) * | 2018-11-02 | 2024-01-02 | 삼성전자주식회사 | 기판 처리 방법 및 기판 처리 장치 |
CN110000036A (zh) * | 2019-03-31 | 2019-07-12 | 池州华宇电子科技有限公司 | 一种芯片点胶枪内壁除胶装置 |
CN110237971A (zh) * | 2019-05-31 | 2019-09-17 | 溧阳嘉拓智能设备有限公司 | 锂电池狭缝挤压式涂布模头在线全自动清洁装置及方法 |
JP2022138907A (ja) | 2021-03-11 | 2022-09-26 | キオクシア株式会社 | 基板洗浄装置および基板洗浄方法 |
KR102450703B1 (ko) * | 2022-06-08 | 2022-10-04 | 창녕군시설관리공단 | 약액 노즐 세척기 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5871584A (en) * | 1994-08-03 | 1999-02-16 | Tokyo Electron Limited | Processing apparatus and processing method |
JPH1174179A (ja) * | 1997-08-29 | 1999-03-16 | Dainippon Screen Mfg Co Ltd | ノズル洗浄装置 |
JP2003260423A (ja) * | 2002-03-12 | 2003-09-16 | Tatsumo Kk | ノズル先端部の洗浄装置及び洗浄方法 |
JP2004058016A (ja) * | 2002-07-31 | 2004-02-26 | Sharp Corp | 洗浄装置、切削加工装置、及びインクジェット記録ヘッドの製造方法 |
JP2004074121A (ja) * | 2002-08-22 | 2004-03-11 | Taikisha Ltd | 塗料供給装置の洗浄装置 |
-
2004
- 2004-03-19 JP JP2004080188A patent/JP4451175B2/ja not_active Expired - Lifetime
-
2005
- 2005-01-19 TW TW094101573A patent/TWI293578B/zh active
- 2005-02-11 KR KR1020050011627A patent/KR100642666B1/ko active IP Right Grant
- 2005-02-21 CN CNB2005100094086A patent/CN100381216C/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5871584A (en) * | 1994-08-03 | 1999-02-16 | Tokyo Electron Limited | Processing apparatus and processing method |
JPH1174179A (ja) * | 1997-08-29 | 1999-03-16 | Dainippon Screen Mfg Co Ltd | ノズル洗浄装置 |
JP2003260423A (ja) * | 2002-03-12 | 2003-09-16 | Tatsumo Kk | ノズル先端部の洗浄装置及び洗浄方法 |
JP2004058016A (ja) * | 2002-07-31 | 2004-02-26 | Sharp Corp | 洗浄装置、切削加工装置、及びインクジェット記録ヘッドの製造方法 |
JP2004074121A (ja) * | 2002-08-22 | 2004-03-11 | Taikisha Ltd | 塗料供給装置の洗浄装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI454317B (zh) * | 2008-08-11 | 2014-10-01 | Murata Machinery Ltd | nozzle |
CN104741291A (zh) * | 2013-12-25 | 2015-07-01 | 芝浦机械电子装置株式会社 | 粘合剂涂布装置与构件清洁法及显示面板制造装置与方法 |
CN107433240A (zh) * | 2016-05-26 | 2017-12-05 | 株式会社斯库林集团 | 喷嘴清扫装置、涂覆装置及喷嘴清扫方法 |
CN107433240B (zh) * | 2016-05-26 | 2020-04-14 | 株式会社斯库林集团 | 喷嘴清扫装置、涂覆装置及喷嘴清扫方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4451175B2 (ja) | 2010-04-14 |
KR100642666B1 (ko) | 2006-11-10 |
TWI293578B (en) | 2008-02-21 |
CN1669680A (zh) | 2005-09-21 |
TW200534925A (en) | 2005-11-01 |
KR20060041868A (ko) | 2006-05-12 |
JP2005262127A (ja) | 2005-09-29 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. |
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CP01 | Change in the name or title of a patent holder |
Address after: Kyoto City, Kyoto, Japan Patentee after: Skilling Group Address before: Kyoto City, Kyoto, Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto City, Kyoto, Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto City, Kyoto, Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |