ATE524413T1 - Verfahren zur herstellung von mikromechanischen teilen aus kristallinischem material - Google Patents
Verfahren zur herstellung von mikromechanischen teilen aus kristallinischem materialInfo
- Publication number
- ATE524413T1 ATE524413T1 AT07111580T AT07111580T ATE524413T1 AT E524413 T1 ATE524413 T1 AT E524413T1 AT 07111580 T AT07111580 T AT 07111580T AT 07111580 T AT07111580 T AT 07111580T AT E524413 T1 ATE524413 T1 AT E524413T1
- Authority
- AT
- Austria
- Prior art keywords
- oxide
- superficial
- layer
- crystalline material
- mask
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00214—Processes for the simultaneaous manufacturing of a network or an array of similar microstructural devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/008—Manufacture of substrate-free structures separating the processed structure from a mother substrate
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Drying Of Semiconductors (AREA)
- Micromachines (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07111580A EP2011763B1 (de) | 2007-07-03 | 2007-07-03 | Verfahren zur Herstellung von mikromechanischen Teilen aus kristallinischem Material |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE524413T1 true ATE524413T1 (de) | 2011-09-15 |
Family
ID=38692089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT07111580T ATE524413T1 (de) | 2007-07-03 | 2007-07-03 | Verfahren zur herstellung von mikromechanischen teilen aus kristallinischem material |
Country Status (4)
Country | Link |
---|---|
US (1) | US8137902B2 (de) |
EP (1) | EP2011763B1 (de) |
JP (1) | JP5294733B2 (de) |
AT (1) | ATE524413T1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101476063B1 (ko) * | 2010-06-21 | 2014-12-30 | 샤프 가부시키가이샤 | 전방면판 부착 표시 패널, 표시 장치 및 수지 조성물 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1041502A (ja) * | 1996-07-22 | 1998-02-13 | Toshiba Corp | 半導体装置 |
TW364204B (en) * | 1997-12-19 | 1999-07-11 | Nanya Technology Corp | Method for producing semiconductor capacitor of the semiconductor and its eletrode plate |
US6159385A (en) * | 1998-05-08 | 2000-12-12 | Rockwell Technologies, Llc | Process for manufacture of micro electromechanical devices having high electrical isolation |
JP2001267555A (ja) * | 2000-03-22 | 2001-09-28 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP3941348B2 (ja) * | 2000-07-11 | 2007-07-04 | 富士ゼロックス株式会社 | 微小構造体の製造方法 |
FR2861501B1 (fr) * | 2003-10-22 | 2006-01-13 | Commissariat Energie Atomique | Dispositif microelectronique a effet de champ apte a former un ou plusiseurs canaux de transistors |
JP4630019B2 (ja) * | 2004-08-25 | 2011-02-09 | パナソニック株式会社 | 半導体装置の製造方法 |
US7518195B2 (en) * | 2004-10-21 | 2009-04-14 | Commissariat A L'energie Atomique | Field-effect microelectronic device, capable of forming one or several transistor channels |
US7074710B2 (en) * | 2004-11-03 | 2006-07-11 | Lsi Logic Corporation | Method of wafer patterning for reducing edge exclusion zone |
CH696475A5 (fr) * | 2005-05-12 | 2007-06-29 | Eta Sa Mft Horlogere Suisse | Organe d'affichage analogique en matériau cristallin, pièce d'horlogerie pourvue d'un tel organe d'affichage et procédé pour sa fabrication. |
JP4745038B2 (ja) * | 2005-11-30 | 2011-08-10 | 株式会社東芝 | 周縁部処理方法及び半導体装置の製造方法 |
-
2007
- 2007-07-03 EP EP07111580A patent/EP2011763B1/de active Active
- 2007-07-03 AT AT07111580T patent/ATE524413T1/de not_active IP Right Cessation
-
2008
- 2008-07-01 JP JP2008171982A patent/JP5294733B2/ja active Active
- 2008-07-03 US US12/167,691 patent/US8137902B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20090011373A1 (en) | 2009-01-08 |
EP2011763A1 (de) | 2009-01-07 |
EP2011763B1 (de) | 2011-09-14 |
JP5294733B2 (ja) | 2013-09-18 |
JP2009012172A (ja) | 2009-01-22 |
US8137902B2 (en) | 2012-03-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |