ATE448507T1 - Verfahren zur herstellung eines stempel für mikro/nano imprint-lithographie - Google Patents
Verfahren zur herstellung eines stempel für mikro/nano imprint-lithographieInfo
- Publication number
- ATE448507T1 ATE448507T1 AT06021860T AT06021860T ATE448507T1 AT E448507 T1 ATE448507 T1 AT E448507T1 AT 06021860 T AT06021860 T AT 06021860T AT 06021860 T AT06021860 T AT 06021860T AT E448507 T1 ATE448507 T1 AT E448507T1
- Authority
- AT
- Austria
- Prior art keywords
- micro
- imprint lithography
- stamp
- nano imprint
- resist
- Prior art date
Links
- 238000001393 microlithography Methods 0.000 title abstract 5
- 238000001127 nanoimprint lithography Methods 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 3
- 229910052799 carbon Inorganic materials 0.000 abstract 3
- 239000010409 thin film Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050098080A KR100772639B1 (ko) | 2005-10-18 | 2005-10-18 | 다이아몬드상 카본 박막을 이용한 미세 임프린트리소그래피용 스탬프 및 그 제조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE448507T1 true ATE448507T1 (de) | 2009-11-15 |
Family
ID=37814633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06021860T ATE448507T1 (de) | 2005-10-18 | 2006-10-18 | Verfahren zur herstellung eines stempel für mikro/nano imprint-lithographie |
Country Status (6)
Country | Link |
---|---|
US (1) | US7914693B2 (de) |
EP (1) | EP1785770B1 (de) |
JP (1) | JP2007116163A (de) |
KR (1) | KR100772639B1 (de) |
AT (1) | ATE448507T1 (de) |
DE (1) | DE602006010307D1 (de) |
Families Citing this family (67)
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JP2007320142A (ja) * | 2006-05-31 | 2007-12-13 | Meisho Kiko Kk | ナノインプリント用モールド |
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JP2009045817A (ja) * | 2007-08-20 | 2009-03-05 | Shineisha:Kk | 凹版および凹版の製造方法 |
CN101118378B (zh) * | 2007-08-22 | 2010-08-25 | 武汉工程大学 | 金刚石表面图形化的制备方法 |
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JP4575497B2 (ja) * | 2009-01-23 | 2010-11-04 | 株式会社東芝 | スタンパの製造方法 |
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KR101069545B1 (ko) | 2011-06-20 | 2011-10-05 | 한국기계연구원 | 임프린트 리소그래피용 유연스탬프 제조 장치 및 제조 방법 |
US20150318475A1 (en) * | 2011-09-01 | 2015-11-05 | Guobiao Zhang | Imprinted Memory |
US20130056798A1 (en) * | 2011-09-01 | 2013-03-07 | Chengdu Haicun Ip Technology Llc | Three-Dimensional Printed Memory |
US20170110463A1 (en) * | 2011-09-01 | 2017-04-20 | Chengdu Haicun Ip Technology Llc | Imprinted Memory |
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WO2013111812A1 (ja) * | 2012-01-27 | 2013-08-01 | 旭化成株式会社 | 微細凹凸構造体、ドライエッチング用熱反応型レジスト材料、モールドの製造方法及びモールド |
JP6015140B2 (ja) * | 2012-06-01 | 2016-10-26 | 大日本印刷株式会社 | ナノインプリントモールドおよびその製造方法 |
CN103436853B (zh) * | 2013-09-04 | 2016-03-16 | 苏州锦元纳米科技有限公司 | 掺氟类金刚石薄膜、其制备方法及包含该薄膜的压印模板 |
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US9570265B1 (en) | 2013-12-05 | 2017-02-14 | Sigray, Inc. | X-ray fluorescence system with high flux and high flux density |
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USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
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JP6167967B2 (ja) * | 2014-03-31 | 2017-07-26 | 株式会社島津製作所 | 紫外線照射装置及びこれを備えた分析装置 |
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US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
JP6937380B2 (ja) | 2017-03-22 | 2021-09-22 | シグレイ、インコーポレイテッド | X線分光を実施するための方法およびx線吸収分光システム |
US11261085B2 (en) * | 2017-05-03 | 2022-03-01 | Nanotech Security Corp. | Methods for micro and nano fabrication by selective template removal |
US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
WO2019231097A1 (ko) * | 2018-05-30 | 2019-12-05 | 주식회사 엘지화학 | 임프린팅용 포토마스크 및 이의 제조방법 |
JP7195341B2 (ja) | 2018-06-04 | 2022-12-23 | シグレイ、インコーポレイテッド | 波長分散型x線分光計 |
US10649119B2 (en) * | 2018-07-16 | 2020-05-12 | Facebook Technologies, Llc | Duty cycle, depth, and surface energy control in nano fabrication |
US10658145B2 (en) | 2018-07-26 | 2020-05-19 | Sigray, Inc. | High brightness x-ray reflection source |
US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
WO2020051221A2 (en) | 2018-09-07 | 2020-03-12 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
CN109683445A (zh) * | 2019-01-10 | 2019-04-26 | 京东方科技集团股份有限公司 | 一种纳米图案的拼接方法、纳米压印板、光栅及制作方法 |
US11342256B2 (en) | 2019-01-24 | 2022-05-24 | Applied Materials, Inc. | Method of fine redistribution interconnect formation for advanced packaging applications |
JP7403961B2 (ja) * | 2019-03-19 | 2023-12-25 | キオクシア株式会社 | インプリント方法および半導体装置の製造方法 |
IT201900006736A1 (it) | 2019-05-10 | 2020-11-10 | Applied Materials Inc | Procedimenti di fabbricazione di package |
IT201900006740A1 (it) | 2019-05-10 | 2020-11-10 | Applied Materials Inc | Procedimenti di strutturazione di substrati |
US11931855B2 (en) | 2019-06-17 | 2024-03-19 | Applied Materials, Inc. | Planarization methods for packaging substrates |
US11391950B2 (en) | 2019-06-26 | 2022-07-19 | Meta Platforms Technologies, Llc | Techniques for controlling effective refractive index of gratings |
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CN112951707A (zh) * | 2019-12-11 | 2021-06-11 | 株洲中车时代电气股份有限公司 | 一种薄膜及其制备方法和应用 |
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CN112011784B (zh) * | 2020-06-29 | 2022-09-20 | 南方科技大学 | 一种有序图案化多孔金刚石薄膜及其制备方法和用途 |
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JP2800274B2 (ja) | 1989-06-16 | 1998-09-21 | 日本電気株式会社 | スタンパ |
JP3189347B2 (ja) | 1991-12-24 | 2001-07-16 | 住友電気工業株式会社 | 樹脂用金型と樹脂用金型の製造方法および樹脂の成形方法 |
JPH1096808A (ja) * | 1996-09-24 | 1998-04-14 | Nippon Telegr & Teleph Corp <Ntt> | 微細パタン形成法 |
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WO2001040537A1 (en) * | 1999-11-30 | 2001-06-07 | The Regents Of The University Of California | Method for producing fluorinated diamond-like carbon films |
CN100472330C (zh) * | 2002-01-25 | 2009-03-25 | 捷时雅株式会社 | 双层层叠物及使用它的构图方法 |
JP2004130775A (ja) | 2002-08-09 | 2004-04-30 | Maxell Hi Tec Ltd | 射出成形装置およびそれに用いる構成部材ならびに表面処理方法 |
JP2004164689A (ja) * | 2002-11-08 | 2004-06-10 | Ricoh Co Ltd | ダイレクトマスタリングの基板の製造方法、ダイレクトマスタリングの基板、及びスタンパの製造方法 |
US6858909B2 (en) * | 2002-11-29 | 2005-02-22 | International Business Machines Corporation | CMP assisted liftoff micropatterning |
KR100488049B1 (ko) * | 2003-01-16 | 2005-05-06 | 엘지전자 주식회사 | 나노 임프린트 제조 방법 |
JP2004311713A (ja) | 2003-04-07 | 2004-11-04 | Mitsubishi Electric Corp | 半導体装置製造用モールド |
JP2005047080A (ja) | 2003-07-31 | 2005-02-24 | Alps Electric Co Ltd | 微細凹凸面を有する樹脂製光学部品成形用型及びこれを用いた樹脂製光学部品の製造方法 |
US20050084804A1 (en) * | 2003-10-16 | 2005-04-21 | Molecular Imprints, Inc. | Low surface energy templates |
JP4257848B2 (ja) | 2003-12-26 | 2009-04-22 | 独立行政法人産業技術総合研究所 | 金型及びその製造方法 |
US7309515B2 (en) * | 2004-02-04 | 2007-12-18 | Industrial Technology Research Institute | Method for fabricating an imprint mold structure |
JP2006032423A (ja) | 2004-07-12 | 2006-02-02 | Toshiba Corp | インプリント加工用スタンパーおよびその製造方法 |
US7186574B2 (en) * | 2004-09-30 | 2007-03-06 | Hitachi Global Storage Technologies Netherlands B.V. | CMP process metrology test structures |
-
2005
- 2005-10-18 KR KR1020050098080A patent/KR100772639B1/ko not_active IP Right Cessation
-
2006
- 2006-10-18 EP EP06021860A patent/EP1785770B1/de not_active Not-in-force
- 2006-10-18 DE DE602006010307T patent/DE602006010307D1/de active Active
- 2006-10-18 JP JP2006284320A patent/JP2007116163A/ja active Pending
- 2006-10-18 AT AT06021860T patent/ATE448507T1/de active
- 2006-10-18 US US11/582,461 patent/US7914693B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP1785770A3 (de) | 2007-07-11 |
KR20070042309A (ko) | 2007-04-23 |
US20070158872A1 (en) | 2007-07-12 |
DE602006010307D1 (de) | 2009-12-24 |
JP2007116163A (ja) | 2007-05-10 |
KR100772639B1 (ko) | 2007-11-02 |
EP1785770B1 (de) | 2009-11-11 |
EP1785770A2 (de) | 2007-05-16 |
US7914693B2 (en) | 2011-03-29 |
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