ATE484774T1 - Fotoresist-entfernungszusammensetzung für die halbleiterherstellung - Google Patents
Fotoresist-entfernungszusammensetzung für die halbleiterherstellungInfo
- Publication number
- ATE484774T1 ATE484774T1 AT06783522T AT06783522T ATE484774T1 AT E484774 T1 ATE484774 T1 AT E484774T1 AT 06783522 T AT06783522 T AT 06783522T AT 06783522 T AT06783522 T AT 06783522T AT E484774 T1 ATE484774 T1 AT E484774T1
- Authority
- AT
- Austria
- Prior art keywords
- photoresist
- stripper composition
- derivative
- compound
- semiconductor manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050074550A KR100718532B1 (ko) | 2005-08-13 | 2005-08-13 | 반도체 제조용 감광성수지 제거제 조성물 |
KR1020060073209A KR100893280B1 (ko) | 2006-08-03 | 2006-08-03 | 반도체 제조용 감광성수지 제거제 조성물 |
KR1020060073202A KR100893279B1 (ko) | 2006-08-03 | 2006-08-03 | 반도체 제조용 감광성수지 제거제 조성물 |
PCT/KR2006/003085 WO2007021085A1 (en) | 2005-08-13 | 2006-08-05 | Photoresist stripper composition for semiconductor manufacturing |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE484774T1 true ATE484774T1 (de) | 2010-10-15 |
Family
ID=37757723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06783522T ATE484774T1 (de) | 2005-08-13 | 2006-08-05 | Fotoresist-entfernungszusammensetzung für die halbleiterherstellung |
Country Status (7)
Country | Link |
---|---|
US (1) | US7951765B2 (de) |
EP (1) | EP1913448B1 (de) |
JP (1) | JP4782200B2 (de) |
AT (1) | ATE484774T1 (de) |
DE (1) | DE602006017559D1 (de) |
TW (1) | TWI344065B (de) |
WO (1) | WO2007021085A1 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI466093B (zh) | 2007-06-26 | 2014-12-21 | Apple Inc | 用於視訊播放的管理技術 |
TWI479891B (zh) | 2007-06-26 | 2015-04-01 | Apple Inc | 動態背光調適 |
US8766902B2 (en) | 2007-12-21 | 2014-07-01 | Apple Inc. | Management techniques for video playback |
CN101787335A (zh) * | 2009-01-22 | 2010-07-28 | 巴斯夫公司 | 用于化学机械抛光后清洗的组合物 |
KR20110106880A (ko) * | 2009-01-22 | 2011-09-29 | 바스프 에스이 | 화학적 기계적 연마 후 세정을 위한 조성물 |
KR101829399B1 (ko) | 2010-03-04 | 2018-03-30 | 삼성전자주식회사 | 감광성 수지 제거제 조성물 및 이를 이용하는 반도체 제조 공정 |
US10332740B2 (en) | 2016-12-14 | 2019-06-25 | Samsung Electronics Co., Ltd. | Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer |
KR20210093496A (ko) * | 2020-01-20 | 2021-07-28 | 주식회사 엘지화학 | 포토레지스트 제거용 스트리퍼 조성물 및 이를 이용한 포토레지스트의 박리방법 |
CN113394081A (zh) * | 2021-05-31 | 2021-09-14 | 上海华力集成电路制造有限公司 | 光阻去除方法 |
CN117659421A (zh) * | 2022-08-29 | 2024-03-08 | 清华大学 | 一种Zn基有机配位纳米颗粒及其制备方法、光刻胶组合物及其应用 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5279771A (en) | 1990-11-05 | 1994-01-18 | Ekc Technology, Inc. | Stripping compositions comprising hydroxylamine and alkanolamine |
JP3048207B2 (ja) | 1992-07-09 | 2000-06-05 | イー.ケー.シー.テクノロジー.インコーポレイテッド | 還元及び酸化電位を有する求核アミン化合物を含む洗浄剤組成物およびこれを使用した基板の洗浄方法 |
US6326130B1 (en) * | 1993-10-07 | 2001-12-04 | Mallinckrodt Baker, Inc. | Photoresist strippers containing reducing agents to reduce metal corrosion |
JPH085664B2 (ja) | 1994-02-07 | 1996-01-24 | 住友特殊金属株式会社 | 希土類・鉄・ボロン系正方晶化合物 |
JP3406055B2 (ja) * | 1994-03-31 | 2003-05-12 | 東京応化工業株式会社 | ポジ型レジスト用剥離液 |
US5472830A (en) | 1994-04-18 | 1995-12-05 | Ocg Microelectronic Materials, Inc. | Non-corrosion photoresist stripping composition |
JPH08262746A (ja) | 1995-03-28 | 1996-10-11 | Mitsubishi Gas Chem Co Inc | フォトレジスト剥離剤組成物および剥離方法 |
JP2911792B2 (ja) | 1995-09-29 | 1999-06-23 | 東京応化工業株式会社 | レジスト用剥離液組成物 |
JP3929518B2 (ja) | 1995-11-30 | 2007-06-13 | 東京応化工業株式会社 | レジスト用剥離液組成物 |
US6268323B1 (en) * | 1997-05-05 | 2001-07-31 | Arch Specialty Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
US5798323A (en) * | 1997-05-05 | 1998-08-25 | Olin Microelectronic Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
JP4224651B2 (ja) * | 1999-02-25 | 2009-02-18 | 三菱瓦斯化学株式会社 | レジスト剥離剤およびそれを用いた半導体素子の製造方法 |
KR100360985B1 (ko) * | 2000-04-26 | 2002-11-18 | 주식회사 동진쎄미켐 | 레지스트 스트리퍼 조성물 |
JP2001350276A (ja) * | 2000-06-05 | 2001-12-21 | Nagase Kasei Kogyo Kk | フォトレジスト剥離剤組成物及びその使用方法 |
JP2002196509A (ja) | 2000-12-25 | 2002-07-12 | Nagase Kasei Kogyo Kk | フォトレジスト剥離剤組成物及びその使用方法 |
JP4810764B2 (ja) * | 2001-06-29 | 2011-11-09 | 三菱瓦斯化学株式会社 | レジスト剥離剤組成物 |
KR100546169B1 (ko) | 2001-09-21 | 2006-01-24 | 주식회사 하이닉스반도체 | 포토레지스트 제거용 용액 조성물 |
KR100569533B1 (ko) * | 2001-10-25 | 2006-04-07 | 주식회사 하이닉스반도체 | 포토레지스트 세정용 조성물 |
JP3738992B2 (ja) * | 2001-12-27 | 2006-01-25 | 東京応化工業株式会社 | ホトレジスト用剥離液 |
KR100862988B1 (ko) * | 2002-09-30 | 2008-10-13 | 주식회사 동진쎄미켐 | 포토레지스트 리무버 조성물 |
JP4289866B2 (ja) | 2002-10-29 | 2009-07-01 | コクヨ株式会社 | 卓上整理棚 |
US6951710B2 (en) * | 2003-05-23 | 2005-10-04 | Air Products And Chemicals, Inc. | Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
KR100964801B1 (ko) * | 2003-06-26 | 2010-06-22 | 동우 화인켐 주식회사 | 포토레지스트 박리액 조성물 및 이를 이용한 포토레지스트박리방법 |
JP4202859B2 (ja) * | 2003-08-05 | 2008-12-24 | 花王株式会社 | レジスト用剥離剤組成物 |
-
2006
- 2006-08-05 DE DE602006017559T patent/DE602006017559D1/de active Active
- 2006-08-05 WO PCT/KR2006/003085 patent/WO2007021085A1/en active Application Filing
- 2006-08-05 EP EP06783522A patent/EP1913448B1/de active Active
- 2006-08-05 AT AT06783522T patent/ATE484774T1/de not_active IP Right Cessation
- 2006-08-05 JP JP2008525930A patent/JP4782200B2/ja active Active
- 2006-08-05 US US12/063,745 patent/US7951765B2/en active Active
- 2006-08-11 TW TW095129490A patent/TWI344065B/zh active
Also Published As
Publication number | Publication date |
---|---|
US7951765B2 (en) | 2011-05-31 |
DE602006017559D1 (de) | 2010-11-25 |
US20090312216A1 (en) | 2009-12-17 |
TWI344065B (en) | 2011-06-21 |
TW200719099A (en) | 2007-05-16 |
EP1913448A1 (de) | 2008-04-23 |
WO2007021085A1 (en) | 2007-02-22 |
JP4782200B2 (ja) | 2011-09-28 |
JP2009505132A (ja) | 2009-02-05 |
EP1913448A4 (de) | 2008-11-05 |
EP1913448B1 (de) | 2010-10-13 |
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Legal Events
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |