WO2022255219A1 - フッ化物蛍光体、その製造方法及び発光装置 - Google Patents
フッ化物蛍光体、その製造方法及び発光装置 Download PDFInfo
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- WO2022255219A1 WO2022255219A1 PCT/JP2022/021552 JP2022021552W WO2022255219A1 WO 2022255219 A1 WO2022255219 A1 WO 2022255219A1 JP 2022021552 W JP2022021552 W JP 2022021552W WO 2022255219 A1 WO2022255219 A1 WO 2022255219A1
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- Prior art keywords
- fluoride
- group
- less
- phosphor
- moles
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- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 title claims abstract description 273
- 238000004519 manufacturing process Methods 0.000 title claims description 77
- 239000002245 particle Substances 0.000 claims abstract description 279
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 46
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 44
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 38
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 30
- 229910052800 carbon group element Inorganic materials 0.000 claims abstract description 23
- 229910021480 group 4 element Inorganic materials 0.000 claims abstract description 21
- 229910052795 boron group element Inorganic materials 0.000 claims abstract description 16
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 16
- 229910052718 tin Inorganic materials 0.000 claims abstract description 15
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 13
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 12
- XPIIDKFHGDPTIY-UHFFFAOYSA-N F.F.F.P Chemical compound F.F.F.P XPIIDKFHGDPTIY-UHFFFAOYSA-N 0.000 claims description 226
- 239000000203 mixture Substances 0.000 claims description 109
- -1 rare earth phosphate Chemical class 0.000 claims description 92
- 239000007788 liquid Substances 0.000 claims description 73
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 72
- 229910019142 PO4 Inorganic materials 0.000 claims description 41
- 239000010452 phosphate Substances 0.000 claims description 39
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 37
- 150000004703 alkoxides Chemical class 0.000 claims description 35
- 229920005989 resin Polymers 0.000 claims description 34
- 239000011347 resin Substances 0.000 claims description 34
- 150000002500 ions Chemical class 0.000 claims description 32
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 23
- 229910052748 manganese Inorganic materials 0.000 claims description 18
- 229910052731 fluorine Inorganic materials 0.000 claims description 17
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 16
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 14
- 230000008878 coupling Effects 0.000 claims description 14
- 238000010168 coupling process Methods 0.000 claims description 14
- 238000005859 coupling reaction Methods 0.000 claims description 14
- 229910052746 lanthanum Inorganic materials 0.000 claims description 14
- 229910000077 silane Inorganic materials 0.000 claims description 14
- 229910052732 germanium Inorganic materials 0.000 claims description 13
- 229910052792 caesium Inorganic materials 0.000 claims description 11
- 229910052744 lithium Inorganic materials 0.000 claims description 11
- 229910052701 rubidium Inorganic materials 0.000 claims description 11
- 229910052708 sodium Inorganic materials 0.000 claims description 11
- 229910052700 potassium Inorganic materials 0.000 claims description 9
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 8
- 229910052684 Cerium Inorganic materials 0.000 claims description 7
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 7
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 7
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- 238000000921 elemental analysis Methods 0.000 claims description 4
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 3
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 claims description 3
- 150000002222 fluorine compounds Chemical class 0.000 abstract description 19
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 60
- 239000011572 manganese Substances 0.000 description 50
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- 239000011342 resin composition Substances 0.000 description 30
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- 230000014759 maintenance of location Effects 0.000 description 25
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- LQFNMFDUAPEJRY-UHFFFAOYSA-K lanthanum(3+);phosphate Chemical compound [La+3].[O-]P([O-])([O-])=O LQFNMFDUAPEJRY-UHFFFAOYSA-K 0.000 description 22
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- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 9
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- 238000000926 separation method Methods 0.000 description 9
- 239000011734 sodium Substances 0.000 description 9
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- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 8
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- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
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- 238000000576 coating method Methods 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
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- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 238000000295 emission spectrum Methods 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 229940085991 phosphate ion Drugs 0.000 description 5
- 239000011591 potassium Substances 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 5
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- 238000004381 surface treatment Methods 0.000 description 5
- 239000002335 surface treatment layer Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 4
- 229920000388 Polyphosphate Polymers 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
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- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000004645 aluminates Chemical class 0.000 description 4
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- 229940005740 hexametaphosphate Drugs 0.000 description 2
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- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
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- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
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- 229910000318 alkali metal phosphate Inorganic materials 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical class [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
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- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- FCHQAKNQGRFZDC-UHFFFAOYSA-N decyl(triethyl)silane Chemical compound CCCCCCCCCC[Si](CC)(CC)CC FCHQAKNQGRFZDC-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 1
- UARGAUQGVANXCB-UHFFFAOYSA-N ethanol;zirconium Chemical compound [Zr].CCO.CCO.CCO.CCO UARGAUQGVANXCB-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- UQNMKSXNBQAKLM-UHFFFAOYSA-N lanthanum(3+) trinitrate dihydrate Chemical compound O.O.[La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O UQNMKSXNBQAKLM-UHFFFAOYSA-N 0.000 description 1
- FYDKNKUEBJQCCN-UHFFFAOYSA-N lanthanum(3+);trinitrate Chemical compound [La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FYDKNKUEBJQCCN-UHFFFAOYSA-N 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000005341 metaphosphate group Chemical group 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- XONPDZSGENTBNJ-UHFFFAOYSA-N molecular hydrogen;sodium Chemical compound [Na].[H][H] XONPDZSGENTBNJ-UHFFFAOYSA-N 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Substances ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 1
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- RLJWTAURUFQFJP-UHFFFAOYSA-N propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)O.CC(C)O.CC(C)O RLJWTAURUFQFJP-UHFFFAOYSA-N 0.000 description 1
- BCWYYHBWCZYDNB-UHFFFAOYSA-N propan-2-ol;zirconium Chemical compound [Zr].CC(C)O.CC(C)O.CC(C)O.CC(C)O BCWYYHBWCZYDNB-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229940048084 pyrophosphate Drugs 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- JRSJRHKJPOJTMS-MDZDMXLPSA-N trimethoxy-[(e)-2-phenylethenyl]silane Chemical compound CO[Si](OC)(OC)\C=C\C1=CC=CC=C1 JRSJRHKJPOJTMS-MDZDMXLPSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- WXKZSTUKHWTJCF-UHFFFAOYSA-N zinc;ethanolate Chemical compound [Zn+2].CC[O-].CC[O-] WXKZSTUKHWTJCF-UHFFFAOYSA-N 0.000 description 1
- JXNCWJJAQLTWKR-UHFFFAOYSA-N zinc;methanolate Chemical compound [Zn+2].[O-]C.[O-]C JXNCWJJAQLTWKR-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
- C09K11/77348—Silicon Aluminium Nitrides or Silicon Aluminium Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
- C09K11/025—Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/61—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing fluorine, chlorine, bromine, iodine or unspecified halogen elements
- C09K11/617—Silicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/64—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing aluminium
- C09K11/646—Silicates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
Definitions
- the present disclosure relates to a fluoride phosphor, its manufacturing method, and a light-emitting device.
- Light-emitting devices that combine light-emitting elements and phosphors are used in a wide range of fields such as lighting, automotive lighting, displays, and backlights for liquid crystals.
- phosphors used in light-emitting devices for backlighting liquid crystals are required to have high color purity, that is, to have a narrow half width of the emission peak.
- Fluoride phosphors to which Mn is added are known as red-emitting phosphors having a narrow half-value width of an emission peak.
- Japanese Patent Application Publication No. 2019-525974 1 describes coating the manganese-doped red phosphor with aluminum oxide or the like in order to reduce the problem of instability due to deterioration of the manganese-doped red phosphor.
- a light-emitting device comprising a fluorescent member containing the coated manganese-doped red phosphor and resin is also described.
- a light-emitting device that includes a fluorescent member containing a fluoride phosphor and a resin may lose reliability as a light-emitting device depending on the environment in which the light-emitting device is used.
- An object of one aspect of the present disclosure is to provide a fluoride phosphor, a method for manufacturing the same, and a light-emitting device that can further improve the reliability of the light-emitting device.
- a first aspect is a fluoride phosphor containing fluoride particles and an oxide covering at least part of the surface of the fluoride particles.
- the oxide contains at least one selected from the group consisting of Si, Al, Ti, Zr, Sn and Zn, and its content is 2% by mass or more and 30% by mass or less relative to the fluoride phosphor.
- the fluoride particles contain an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- the number of moles of is 2
- the number of moles of Mn is more than 0 and less than 0.2
- the number of moles of element M is more than 0.8 and less than 1
- the number of moles of F is 5 It has a composition that is greater than and less than 7.
- a second aspect is a method for producing a fluoride phosphor, comprising preparing fluoride particles, the prepared fluoride particles, and selected from the group consisting of Si, Al, Ti, Zr, Sn and Zn
- a metal alkoxide containing at least one species in a liquid medium the oxide derived from the metal alkoxide is 2% by mass or more and 30% by mass or less with respect to the fluoride phosphor, and at least one surface of the fluoride particles. and covering the part.
- the fluoride particles contain an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- the number of moles of is 2
- the number of moles of Mn is more than 0 and less than 0.2
- the number of moles of element M is more than 0.8 and less than 1
- the number of moles of F is 5 It has a composition that is greater than and less than 7.
- a third aspect is a method for producing a fluoride phosphor, comprising preparing fluoride particles, and selecting from the group consisting of La, Ce, Dy and Gd, the prepared fluoride particles in a liquid medium. contacting rare earth ions containing at least one of the above with phosphate ions to obtain fluoride particles to which a rare earth phosphate is attached, the fluoride particles to which the rare earth phosphate is attached, Si, Al, By contacting a metal alkoxide containing at least one selected from the group consisting of Ti, Zr, Sn and Zn in a liquid medium, the oxide derived from the metal alkoxide is 2% by mass with respect to the fluoride phosphor.
- the fluoride particles contain an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- the number of moles of is 2
- the number of moles of Mn is more than 0 and less than 0.2
- the number of moles of element M is more than 0.8 and less than 1
- the number of moles of F is 5 It has a composition that is greater than and less than 7.
- a fourth aspect is a light-emitting device comprising a fluorescent member containing the fluoride phosphor of the first aspect and a resin, and a light-emitting element having an emission peak wavelength in a wavelength range of 380 nm or more and 485 nm or less.
- a fluoride phosphor it is possible to provide a fluoride phosphor, a method for manufacturing the same, and a light emitting device that can further improve the reliability of the light emitting device.
- FIG. 1 is a schematic cross-sectional view showing an example of a light-emitting device containing a fluoride phosphor;
- FIG. It is an example of a backscattered electron image obtained by a scanning electron microscope (SEM) of a fluoride phosphor.
- 10 is an example of a cross-sectional SEM image of a fluoride phosphor according to Example 6.
- FIG. 10 is an example of an SEM image of a fluoride phosphor according to Example 6.
- FIG. It is an example of a cross-sectional SEM image of a fluoride phosphor according to Example 8.
- 10 is an example of an SEM image of a fluoride phosphor according to Example 8.
- the term "process” is not only an independent process, but even if it cannot be clearly distinguished from other processes, it is included in this term as long as the intended purpose of the process is achieved.
- the content of each component in the composition means the total amount of the plurality of substances present in the composition unless otherwise specified when there are multiple substances corresponding to each component in the composition.
- the upper and lower limits of the numerical ranges described herein can be combined by arbitrarily selecting the numerical values exemplified as the numerical ranges.
- the relationship between color names and chromaticity coordinates, the relationship between wavelength ranges of light and color names of monochromatic light, and the like conform to JIS Z8110.
- the half width of the phosphor means the wavelength width (full width at half maximum; FWHM) of the emission spectrum at which the emission intensity is 50% of the maximum emission intensity in the emission spectrum of the phosphor.
- the median diameter of the phosphor is the volume-based median diameter, and refers to the particle size corresponding to 50% of the cumulative volume from the small diameter side in the volume-based particle size distribution.
- the particle size distribution of the phosphor is measured by a laser diffraction method using a laser diffraction particle size distribution analyzer.
- the embodiments shown below exemplify a fluoride phosphor, a method for producing the same, and a light-emitting device for embodying the technical idea of the present invention. It is not limited to the body, its manufacturing method and light emitting device.
- the fluoride phosphor may comprise fluoride particles and an oxide covering at least part of the surface of the fluoride particles.
- the oxide contains at least one selected from the group consisting of silicon (Si), aluminum (Al), titanium (Ti), zirconium (Zr), tin (Sn) and zinc (Zn), and its content is , 2% by mass or more and 30% by mass or less with respect to the fluoride phosphor.
- the fluoride particles contain an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, and F, and an alkali metal
- the number of moles of is 2
- the number of moles of Mn is more than 0 and less than 0.2
- the number of moles of element M is more than 0.8 and less than 1
- the number of moles of F is 5 It has a composition that is greater than and less than 7.
- At least part of the surface of the fluoride particles having a specific composition is covered with a predetermined amount of specific oxide, for example, improving moisture resistance.
- a predetermined amount of specific oxide for example, improving moisture resistance.
- the reliability of the light-emitting device provided with the fluorescent member containing the fluoride phosphor and the resin can be improved.
- reduction in mass of the fluorescent member is suppressed in a high-temperature environment or a high-humidity environment.
- the decrease in the mass of the fluorescent member is considered to be mainly due to the decrease in the amount of resin.
- Direct contact between the fluoride particles and the resin in a high-temperature environment or a high-humidity environment is thought to cause some kind of reaction, resulting in scattering of decomposition products in which some of the interatomic bonds of the resin are broken.
- the resin also functions as a protective member for the phosphor, it is conceivable that a reduction in the amount of the resin makes the phosphor more susceptible to the effects of the external environment including moisture, accelerating deterioration of the phosphor. Also, due to the decrease in the amount of resin, for example, the shape of the light emitting surface of the fluorescent member in the light emitting device shown in FIG. For this reason, less light is extracted to the outside of the light emitting device, and the luminous flux of the light emitting device may decrease.
- the fluoride particles that constitute the fluoride phosphor need only contain at least a Mn-activated fluorescent substance, and may consist of only the Mn-activated fluorescent substance.
- the number of moles of the alkali metal when the number of moles of the alkali metal is 2, the number of moles of Mn may be more than 0 and less than 0.2, preferably 0.01 or more and 0.12 or less. good.
- the number of moles of the element M may be more than 0.8 and less than 1, preferably 0.88 or more and 0.99 or less. It's okay.
- the composition of the fluoride particles may be such that the number of moles of F is more than 5 and less than 7, preferably 5.9 or more and 6.1 or less.
- the composition of fluoride particles can be measured, for example, by inductively coupled plasma (ICP) optical emission spectroscopy.
- the alkali metal in the composition of the fluoride particles may contain at least one selected from the group consisting of lithium (Li), sodium (Na), potassium (K), rubidium (Rb) and cesium (Cs).
- the alkali metal contains at least potassium (K) and may contain at least one selected from the group consisting of lithium (Li), sodium (Na), rubidium (Rb) and cesium (Cs).
- the ratio of the number of moles of K to the total number of moles of alkali metals in the composition may be, for example, 0.90 or more, preferably 0.95 or more, or 0.97 or more.
- the upper limit of the molar ratio of K may be, for example, 1 or 0.995 or less.
- part of the alkali metals may be replaced with ammonium ions (NH 4 + ).
- the ratio of the number of moles of ammonium ions to the total number of moles of alkali metal in the composition may be, for example, 0.10 or less, preferably 0.05 or less, or 0.03 or less.
- the lower limit of the ratio of the number of moles of ammonium ions may be, for example, greater than 0, preferably 0.005 or more.
- the element M in the composition of the fluoride particles contains at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements.
- Group 4 elements include titanium (Ti), zirconium (Zr), hafnium (Hf), and the like, and may contain at least one selected from the group consisting of these.
- Group 13 elements include boron (B), aluminum (Al), gallium (Ga), indium (In), thallium (Tl) and the like, including at least one selected from the group consisting of these you can stay
- Group 14 elements include carbon (C), silicon (Si), germanium (Ge), tin (Sn), etc., and may contain at least one selected from the group consisting of these.
- the element M may contain at least one Group 14 element, preferably at least one of Si and Ge, more preferably at least Si.
- the element M may contain at least one Group 13 element and at least one Group 14 element, preferably at least Al and at least one of Si and Ge.
- at least Al and Si may be included.
- the first composition which is one aspect of the composition of the fluoride particles, may contain at least one selected from the group consisting of Group 4 elements and Group 14 elements as the element M, preferably from Group 14 elements It may contain at least one selected from the group consisting of, more preferably at least one of Si and Ge, still more preferably at least Si.
- the total number of moles of Si, Ge, and Mn may be 0.9 or more and 1.1 or less, preferably 0.95 or more, with respect to the number of moles of the alkali metal of 2. It may be 1.05 or less, or 0.97 or more and 1.03 or less.
- the first composition of the fluoride particles may be a composition represented by the following formula (1).
- A1 may contain at least one selected from the group consisting of Li, Na, K, Rb and Cs.
- M1 contains at least one of Si and Ge, and may further contain at least one element selected from the group consisting of Group 4 elements and Group 14 elements.
- Mn may be a tetravalent Mn ion.
- b satisfies 0 ⁇ b ⁇ 0.2
- c is the absolute value of the charge of the [M 2 1 ⁇ b Mn b F d ] ion
- d satisfies 5 ⁇ d ⁇ 7.
- a 1 in formula (1) contains at least K and may further contain at least one selected from the group consisting of Li, Na, Rb and Cs. Also, A 1 may be partially substituted with an ammonium ion (NH 4 + ). When part of A 1 is replaced with ammonium ions, the ratio of the number of moles of ammonium ions to the total number of moles of A 1 in the composition may be, for example, 0.10 or less, preferably 0.05 or less, or 0.03 or less. The lower limit of the ratio of the number of moles of ammonium ions may be, for example, greater than 0, preferably 0.005 or more.
- b in formula (1) is preferably 0.005 or more and 0.15 or less, 0.01 or more and 0.12 or less, or 0.015 or more and 0.1 or less.
- c may be, for example, 1.8 or more and 2.2 or less, preferably 1.9 or more and 2.1 or less, or 1.95 or more and 2.05 or less.
- d may preferably be 5.5 or more and 6.5 or less, 5.9 or more and 6.1 or less, 5.92 or more and 6.05 or less, or 5.95 or more and 6.025 or less.
- the fluoride particles of the first composition may have a first theoretical composition represented by the following formula (1a).
- A1 may contain at least one selected from the group consisting of Li, Na, K, Rb and Cs.
- M1 contains at least one of Si and Ge, and may further contain at least one element selected from the group consisting of Group 4 elements and Group 14 elements.
- Mn may be a tetravalent Mn ion.
- the second composition which is one aspect of the composition of the fluoride particles, contains at least one selected from the group consisting of Group 4 elements and Group 14 elements as the element M, and at least one Group 13 element. preferably at least one selected from the group consisting of Group 14 elements and at least one Group 13 element, more preferably at least Si and Al.
- the total number of moles of Si, Al, and Mn may be 0.9 or more and 1.1 or less, preferably 0.95, with respect to the number of moles of the alkali metal of 2. It may be greater than or equal to 1.05 or less, or greater than or equal to 0.97 and less than or equal to 1.03.
- the number of moles of Al may be more than 0 and 0.1 or less, preferably more than 0 and 0.03 or less, and 0 0.002 or more and 0.02 or less, or 0.003 or more and 0.015 or less.
- the second composition of the fluoride particles may be a composition represented by the following formula (2).
- A2 contains at least K and may further contain at least one selected from the group consisting of Li, Na, Rb and Cs.
- M2 contains at least Si and Al, and may further contain at least one element selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements.
- Mn may be a tetravalent Mn ion. e satisfies 0 ⁇ e ⁇ 0.2, f is the absolute value of the charge of the [M 2 1 ⁇ e Mn e F g ] ion, and g satisfies 5 ⁇ g ⁇ 7.
- a 2 in Formula (2) may be partially substituted with an ammonium ion (NH 4 + ).
- ammonium ion NH 4 +
- the ratio of the number of moles of ammonium ions to the total number of moles of A2 in the composition may be, for example, 0.10 or less, preferably 0.05 or less, or 0.03 or less.
- the lower limit of the ratio of the number of moles of ammonium ions may be, for example, greater than 0, preferably 0.005 or more.
- e in formula (2) is preferably 0.005 or more and 0.15 or less, 0.01 or more and 0.12 or less, or 0.015 or more and 0.1 or less.
- f may be, for example, 1.8 or more and 2.2 or less, preferably 1.9 or more and 2.1 or less, or 1.95 or more and 2.05 or less.
- g may preferably be 5.5 or more and 6.5 or less, 5.9 or more and 6.1 or less, 5.92 or more and 6.05 or less, or 5.95 or more and 6.025 or less.
- the fluoride particles of the second composition may have a second theoretical composition represented by the following formula (2a).
- A2 contains at least K and may further contain at least one selected from the group consisting of Li, Na, Rb and Cs. p satisfies 0 ⁇ p ⁇ 1. Mn may be a tetravalent Mn ion.
- the fluoride particles having the second composition may have unevenness, grooves, etc. on the particle surface.
- the state of the particle surface can be evaluated, for example, by measuring the angle of repose of powder composed of fluoride particles.
- the angle of repose of the powder of fluoride particles having the second composition may be, for example, 70° or less, preferably 65° or less, or 60° or less.
- the lower limit of the angle of repose is, for example, 30° or more.
- the angle of repose is measured, for example, by an injection method.
- the fluoride particles having the second composition have unevenness, grooves, etc. on the surface, for example, when the fluoride particles are covered with a predetermined amount of a specific oxide, the contact area between the fluoride particles and the oxide is large. Therefore, a strong bond can be obtained between the fluoride particles and the oxide, and the fluoride particles can be coated with an oxide film that is difficult to peel off due to an external force.
- the step of covering the fluoride particles with a predetermined amount of a specific oxide it is possible to cover the fluoride particles with a predetermined amount of oxide even when using a relatively small amount of the oxide raw material. Become.
- the fluoride phosphor has unevenness, grooves, etc. on the surface.
- the Fluoride particles can be coated with a rare earth phosphate film that is more strongly bound to the acid salt and is not easily peeled off by an external force during manufacture of the light emitting device.
- the fluoride particles can be coated with a predetermined amount of the rare earth phosphate. can be covered.
- the volume-based median diameter of the fluoride particles may be, for example, 5 ⁇ m or more and 90 ⁇ m or less, preferably 10 ⁇ m or more and 70 ⁇ m or less, or 15 ⁇ m or more and 50 ⁇ m or less, from the viewpoint of improving luminance.
- the particle size distribution of the fluoride particles may, for example, exhibit a single-peak particle size distribution, preferably a single-peak particle size distribution with a narrow distribution width, from the viewpoint of improving luminance.
- the fluoride phosphor may have an oxide that covers at least part of the surface of the fluoride particles.
- the oxide may cover the surface of the fluoride particles in the form of a film, or may be arranged on the surfaces of the fluoride particles as an oxide layer.
- the oxide film covering the surface of the fluoride particles is not limited to a state in which no cracks are present at all. Cracks may be present.
- the oxide film covering the surface of the fluoride particles may completely cover the entire surface, a part of the oxide film may be partially missing, and the fluoride particles may be partially coated with the fluoride particles to the extent that the effect can be obtained. Part of the particle surface may be exposed.
- the oxide coverage of fluoride particles in the fluoride phosphor may be, for example, 50% or more, preferably 80% or more, or 90% or more.
- the oxide coverage of the fluoride particles is calculated as the ratio of the area covered by the oxide to the surface area of the fluoride particles.
- the oxide may contain at least one selected from the group consisting of Si, Al, Ti, Zr, Sn and Zn. That is, oxides include silicon oxide (e.g., SiOx, where x may be 1 or more and 2 or less, preferably 1.5 or more and 2 or less, or about 2 ), aluminum oxide (e.g., Al2O3 ), oxide containing at least one selected from the group consisting of titanium (e.g. TiO 2 ), zirconium oxide (e.g. ZrO 2 ), tin oxide (e.g. SnO, SnO 2 etc.) and zinc oxide (e.g. ZnO) It may well contain at least silicon oxide.
- the oxide may consist of only one kind, or may contain two or more kinds.
- the content of the oxide in the fluoride phosphor may be from 2% by mass to 30% by mass, preferably from 5% by mass to 20% by mass, or from 8% by mass to 15% by mass. % or less.
- the oxide content in the fluoride phosphor can be determined, for example, when the oxide is silicon oxide, by inductively coupled plasma (ICP) emission spectroscopy to determine oxide-covered fluoride particles and oxide-free fluoride particles. The amount of each constituent element contained in the oxide particles is analyzed, and the molar ratio of each constituent element is calculated so that the number of moles of the alkali metal is two.
- ICP inductively coupled plasma
- the difference in the molar ratio of silicon before and after covering with oxide is converted to the mass of silicon oxide (e.g., SiO 2 ), and the mass of fluoride particles (fluoride phosphor) covered with oxide is 100% by mass.
- a content of silicon (eg, SiO 2 ) is calculated. When the oxide content is within the above range, the reliability of the light-emitting device can be further improved.
- the fluoride particles may be covered with an oxide layer.
- the average thickness of the oxide layer covering the fluoride particles may be, for example, 0.1 ⁇ m or more and 1.8 ⁇ m or less, preferably 0.15 ⁇ m or more and 1.0 ⁇ m or less, or 0.20 ⁇ m or more and 0.8 ⁇ m or less. good.
- the average thickness of the oxide layer in the fluoride phosphor is, for example, a cross-sectional image of the fluoride phosphor, in which the thickness of the layer identified as the oxide layer is actually measured at several locations, and the arithmetic mean is the measured average thickness. It's okay.
- the average thickness of the oxide layer in the fluoride phosphor may be a theoretical thickness calculated from the K ⁇ ray intensity ratio of the F element, which will be described later.
- the theoretical thickness is obtained from the ratio of the peak intensity of the K ⁇ ray of the F element in the fluoride phosphor covered with the oxide to the peak intensity of the K ⁇ ray of the F element in the fluoride particles not covered with the oxide layer, CXRO (The Center for X-Ray Optics) database can be used for calculation.
- the theoretical thickness is calculated as a value obtained by averaging the existence of defects such as cracks and chips in the oxide layer.
- the peak intensity of the characteristic X-rays derived from the fluoride particles decreases according to the amount of oxide covering the fluoride particles. Therefore, by evaluating the peak intensity of the characteristic X-rays derived from the fluoride particles in the fluoride phosphor, it is possible to evaluate the oxide coating state.
- the ratio of the peak intensity of the K ⁇ ray of the F element in the fluoride phosphor to the peak intensity of the K ⁇ ray of the F element in the fluoride particles is, for example, 80%. or less, preferably 70% or less, or 60% or less.
- the lower limit of the peak intensity ratio may be, for example, 20% or more.
- the rare earth phosphate may be arranged on the surface of the fluoride particles, and the oxide may cover the fluoride particles via the rare earth phosphate. This tends to further improve the moist heat resistance of the fluoride phosphor. In addition, the adhesion of the oxide to the fluoride particles tends to be improved, and the coatability with the oxide tends to be further improved.
- the rare earth phosphate placed on the surface of the fluoride particles may adhere to the surfaces of the fluoride particles as particles, or may coat the surfaces of the fluoride particles as a film or layer. It may preferably adhere to the surface of the fluoride particles as particles.
- the rare earth phosphate may contain at least one rare earth element selected from the group consisting of lanthanum (La), cerium (Ce), dysprosium (Dy) and gadolinium (Gd), and preferably contains at least lanthanum.
- La lanthanum
- Ce cerium
- Dy dysprosium
- Gd gadolinium
- the content of the rare earth phosphate in the fluoride phosphor may be, for example, 0.1% by mass or more and 20% by mass or less, preferably 0.2% by mass or more and 15% by mass or less, as the content of the rare earth element. Alternatively, it may be 0.3% by mass or more and 10% by mass or less.
- the surface of the fluoride phosphor may be treated with a coupling agent. That is, a surface treatment layer containing functional groups derived from a coupling agent may be arranged on the surface of the fluoride phosphor. By arranging the surface treatment layer on the surface of the fluoride phosphor, for example, the moisture resistance of the fluoride phosphor is further improved.
- the functional group derived from the coupling agent includes, for example, a silyl group having an aliphatic group having 1 to 20 carbon atoms, preferably a silyl group having an aliphatic group having 6 to 12 carbon atoms. .
- the functional groups derived from the coupling agent may be used singly or in combination of two or more.
- Examples of coupling agents include silane coupling agents, titanium coupling agents, and aluminum coupling agents.
- Examples of silane coupling agents include alkyltrialkoxysilanes such as methyltrimethoxysilane, ethyltrimethoxysilane, propyltrimethoxysilane, hexyltrimethoxysilane, octyltrimethoxysilane, decyltrimethoxysilane, and decyltriethylsilane; aryltrialkoxysilanes such as trimethoxysilane and styryltrimethoxysilane; vinyltrialkoxysilanes such as vinyltrimethoxysilane; aminoalkyltrialkoxysilanes such as 3-aminopropyltriethoxysilane; and glycidoxyalkyltrialkoxysilanes, etc., and may be at least one selected from the group consisting of these.
- the fluoride phosphor may contain fluoride particles and a rare earth phosphate arranged on at least part of the surface of the fluoride particles.
- a fluoride phosphor in which a rare earth phosphate is arranged on at least a part of the surface of fluoride particles is further arranged with a surface treatment layer containing a functional group derived from a coupling agent on the surface. good too.
- the fluoride phosphor in which the rare earth phosphate is arranged on at least a part of the surface of the fluoride particles has a surface treatment layer containing a functional group derived from a coupling agent on the surface, so that the surface treatment Since the interfacial energy between the fluoride phosphor and the encapsulating resin such as silicone resin is reduced, the fluoride phosphor is easily mixed and dispersed uniformly in the encapsulating resin.
- the fluoride phosphor can be deposited uniformly and densely on the light-emitting element (eg, LED chip). Therefore, the temperature of the fluoride phosphor can be kept low when the light-emitting device is driven, and as a result, a light-emitting device with high luminous efficiency and high reliability can be obtained.
- the light-emitting element eg, LED chip
- the volume-based median diameter of the fluoride phosphor may be, for example, 10 ⁇ m or more and 90 ⁇ m or less, preferably 15 ⁇ m or more and 70 ⁇ m or less, or 20 ⁇ m or more and 50 ⁇ m or less, from the viewpoint of improving luminance.
- the particle size distribution of the fluoride phosphor may exhibit, for example, a single-peak particle size distribution, preferably a single-peak particle size distribution with a narrow distribution width, from the viewpoint of improving luminance.
- a fluoride phosphor is, for example, a phosphor activated by tetravalent manganese ions, which absorbs light in the short wavelength region of visible light and emits red light.
- the excitation light may be mainly light in the blue region, and the peak wavelength of the excitation light may be within the wavelength range of 380 nm or more and 485 nm or less, for example.
- the emission peak wavelength in the emission spectrum of the fluoride phosphor may be, for example, within the wavelength range of 610 nm or more and 650 nm or less.
- the half width of the emission spectrum of the fluoride phosphor may be, for example, 10 nm or less.
- the fluoride phosphor may have unevenness, grooves, etc. on the particle surface.
- the angle of repose of the powder made of a fluoride phosphor containing fluoride particles having the second composition may be, for example, 70° or less, preferably 65° or less, or 60° or less.
- the lower limit of the angle of repose is, for example, 30° or more.
- the angle of repose is measured, for example, by an injection method.
- the fluoride phosphor obtained by coating the fluoride particles having the second composition with at least one of the oxide and the rare earth phosphate is coated with at least one of the oxide and the rare earth phosphate, and the It has unevenness, grooves, etc. on its surface.
- the contact area between the powders of the fluoride phosphor is reduced due to the irregularities and grooves on the surface of the fluoride phosphor, and aggregation of the powder is suppressed. Therefore, the fluoride phosphor particles can be more uniformly dispersed in the resin composition when manufacturing the light-emitting device.
- a dispenser when a dispenser is used in manufacturing a light-emitting device, problems such as clogging of the needle of the dispenser with the fluoride phosphor are less likely to occur.
- a light-emitting device with little aggregation of fluoride phosphor particles and little variation in chromaticity can be obtained.
- a first aspect of the method for producing a fluoride phosphor includes a preparation step of preparing fluoride particles, the prepared fluoride particles, Si, a synthesis step of contacting a metal alkoxide containing at least one selected from the group consisting of Al, Ti, Zr, Sn and Zn in a liquid medium to cover the fluoride particles with an oxide derived from the metal alkoxide; including.
- the coating amount of the oxide may be 2% by mass or more and 30% by mass or less with respect to the fluoride phosphor.
- the prepared fluoride particles include an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, F,
- an alkali metal Mn, F
- the number of moles of the alkali metal is 2
- the number of moles of Mn is more than 0 and less than 0.2
- the number of moles of the element M is more than 0.8 and less than 1
- a fluoride phosphor in which at least a portion of the surface of the fluoride particles is covered with an oxide derived from the metal alkoxide is efficiently produced.
- a light-emitting device provided with a fluorescent member containing the obtained fluoride phosphor and resin for example, the reliability in a high-temperature environment is improved.
- fluoride particles having a predetermined composition are prepared.
- fluoride particles may be purchased and prepared, or desired fluoride particles may be manufactured and prepared. The details of the prepared fluoride particles are as described above.
- Fluoride particles can be produced, for example, as follows.
- the fluoride particles have the first composition, for example, at least one selected from the group consisting of a first complex ion containing tetravalent manganese, a group 4 element and a group 14 element, and a second compound containing fluorine ions It can be produced by a production method including a step of mixing a solution a containing at least a complex ion and hydrogen fluoride with a solution b containing at least an alkali metal containing at least potassium and hydrogen fluoride.
- a first solution containing at least a first complex ion containing tetravalent manganese and hydrogen fluoride, a second solution containing at least an alkali metal containing at least potassium and hydrogen fluoride, a Group 4 element and a It can also be produced by a production method including a step of mixing at least one selected from the group consisting of Group 14 elements and a third solution containing at least a second complex ion containing a fluorine ion.
- the method for producing the fluoride particles having the second composition includes, for example, preparing fluoride particles having the first composition, Al, an alkali metal, and F. Preparing fluoride particles, and subjecting a mixture containing the fluoride particles and the fluoride particles having the first composition to a first heat treatment at a first heat treatment temperature of 600° C. or higher and 780° C. or lower in an inert gas atmosphere. It can be manufactured by a manufacturing method including one heat treatment step.
- the composition of the fluoride particles containing Al, an alkali metal, and F is such that the ratio of the total number of moles of the alkali metal to the number of moles of Al is 1 or more and 3 or less, and the ratio of the number of moles of F is It may be 4 or more and 6 or less.
- the ratio of the total number of moles of alkali metals to 1 mole of Al may be 2 or more and 3 or less, and the ratio of the number of moles of F may be 5 or more and 6 or less.
- the method for producing a fluoride phosphor further includes a second heat treatment step of subjecting the first heat-treated product after the first heat treatment to a second heat treatment at a second heat treatment temperature of 400° C. or higher to obtain a second heat-treated product.
- the second heat treatment step may be performed with only the fluoride particles, or the second heat treatment step may be performed with the fluoride particles together with the fluorine-containing substance.
- This fluorine-containing substance may be in a solid state, a liquid state, or a gaseous state at room temperature.
- solid or liquid fluorine-containing substances include NH 4 F and the like.
- gaseous fluorine-containing substances include F 2 , CHF 3 , CF 4 , NH 4 HF 2 , HF, SiF 4 , KrF 4 , XeF 2 , XeF 4 , and NF 3 . It may be at least one selected from the group consisting of, preferably at least one selected from the group consisting of F2 and HF.
- the second heat treatment temperature may preferably be higher than 400°C, 425°C or higher, 450°C or higher or 480°C or higher.
- the upper limit of the second heat treatment temperature may be, for example, less than 600°C, preferably 580°C or less, 550°C or less, or 520°C or less.
- the second heat treatment temperature may be lower than the first heat treatment temperature.
- the fluoride particles of the second composition synthesized by the solid phase reaction method in the first heat treatment step have tetravalent Si ions, trivalent Al ions, and tetravalent Mn ions at the same positions in the crystal of the fluoride particles. It is believed that the presence of such a compound is such that it contains a compound having mixed valences. As a result, in proportion to the existence ratio of tetravalent Si ions, trivalent Al ions, and tetravalent Mn ions, there is a shortage of cations having mixed valences at positions in the crystal where fluorine ions should be present. It is believed that vacancies are present to compensate for the charge that is applied.
- fluoride particles synthesized by a liquid phase reaction method as disclosed in Japanese Patent Application Laid-Open No. 2010-254933 contain water present in the solution at positions where fluorine ions should exist in the crystals.
- a large number of hydroxide ions introduced into the crystal from the oxide ions are mixed together with the fluoride ions, and it is considered that these hydroxide ions impair the stability of the fluoride particles.
- the fluoride particles of the second composition synthesized by the solid-phase reaction method by heat treatment do not use a solution in which hydroxide ions may exist. Oxide ions are not mixed.
- Mn ions with different valences may be mixed in the crystals of the fluoride particles or on the crystal surfaces.
- the valence of the Mn ions can be adjusted to a tetravalent state by further heat-treating while in contact with the fluorine-containing material. This can also increase the luminous efficiency of the fluoride particles.
- the prepared fluoride particles and a metal alkoxide containing at least one selected from the group consisting of Si, Al, Ti, Zr, Sn and Zn are contacted in a liquid medium to obtain A fluoride phosphor is obtained by covering the fluoride particles with an oxide that dissolves.
- solvolyzing the metal alkoxide an oxide derived from the metal alkoxide can be produced, and a fluoride phosphor containing fluoride particles covered with the produced oxide can be obtained.
- the aliphatic group of the alkoxide constituting the metal alkoxide may have, for example, 1 to 6 carbon atoms, preferably 1 to 4 carbon atoms, or 1 to 3 carbon atoms.
- the metal alkoxide contains at least one selected from the group consisting of Si, Al, Ti, Zr, Sn and Zn, and may contain at least Si.
- the metal and aliphatic group contained in the metal alkoxide may each be of only one type, or may be contained in combination of two or more types.
- metal alkoxides include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, trimethoxyaluminum, triethoxyaluminum, triisopropoxyaluminum, tetramethoxytitanium, tetraethoxytitanium, tetraisopropoxytitanium, and tetramethoxyzirconium.
- tetraethoxyzirconium, tetraisopropoxyzirconium, tetraethoxytin, dimethoxyzinc, diethoxyzinc and the like preferably at least one selected from the group consisting of tetramethoxysilane, tetraethoxysilane and More preferably, it is at least one selected from the group consisting of tetraisopropoxysilane.
- the metal alkoxide in the synthesis step may be used singly or in combination of two or more.
- the addition amount of the metal alkoxide used in the synthesis step may be, for example, 2% by mass or more and 30% by mass or less, preferably 5% by mass or more, with respect to the total mass of the fluoride particles, as an addition amount in terms of oxide. , or 8% by mass or more, and preferably 25% by mass or less, or 20% by mass or less.
- the amount of metal alkoxide added in the synthesis step may be, for example, 5% by mass or more and 110% by mass or less, preferably 15% by mass or more, relative to the total mass of the fluoride particles as the amount of metal alkoxide added. , or 25% by mass or more, and preferably 90% by mass or less, or 75% by mass or less.
- the contact between the fluoride particles and the metal alkoxide is carried out in a liquid medium.
- the liquid medium include water; alcohol solvents such as methanol, ethanol and isopropyl alcohol; nitrile solvents such as acetonitrile; and hydrocarbon solvents such as hexane.
- the liquid medium may contain at least water and an alcoholic solvent.
- the content of the alcohol-based solvent in the liquid medium may be, for example, 60% by mass or more, preferably 70% by mass or more.
- the content of water in the liquid medium may be, for example, 4% by mass or more and 40% by mass or less.
- the liquid medium may further contain a pH adjuster.
- pH adjusters that can be used include alkaline substances such as ammonia, sodium hydroxide and potassium hydroxide, and acidic substances such as hydrochloric acid, nitric acid, sulfuric acid and acetic acid.
- the pH of the liquid medium may be, for example, 1 or more and 6 or less, preferably 2 or more and 5 or less, under acidic conditions. Under alkaline conditions, it may be 8 or more and 12 or less, preferably 8 or more and 11 or less.
- the mass ratio of the liquid medium to the fluoride particles may be, for example, 100% by mass or more and 1000% by mass or less, preferably 150% by mass or more, or 180% by mass or more, and preferably 600% by mass or less, Or it may be 300% by mass or less.
- the mass ratio of the liquid medium is within the above range, there is a tendency that the fluoride particles can be more uniformly covered with the oxide.
- the contact between the fluoride particles and the metal alkoxide can be carried out, for example, by adding the metal alkoxide to the suspension containing the fluoride particles. At this time, stirring or the like may be performed as necessary. Further, the contact temperature between the fluoride particles and the metal alkoxide may be, for example, 0° C. or higher and 70° C. or lower, preferably 10° C. or higher and 40° C. or lower. The contact time may be, for example, from 1 hour to 12 hours. The contact time includes the time required for adding the metal alkoxide.
- a second aspect of the method for producing a fluoride phosphor (hereinafter also referred to as a second production method) consists of a preparation step of preparing fluoride particles, the prepared fluoride particles, and La, Ce, Dy and Gd. an attachment step of contacting rare earth ions containing at least one lanthanoid selected from the group with phosphate ions in a liquid medium to obtain fluoride particles to which rare earth phosphates are attached; and a solution containing a metal alkoxide containing at least one selected from the group consisting of Si, Al, Ti, Zr, Sn and Zn are brought into contact with an oxide derived from the metal alkoxide, coating the fluoride particles with rare earth phosphates attached thereto.
- the coating amount of the oxide may be 2% by mass or more and 30% by mass or less with respect to the fluoride phosphor.
- the prepared fluoride particles include an element M containing at least one selected from the group consisting of Group 4 elements, Group 13 elements and Group 14 elements, an alkali metal, Mn, F, When the number of moles of the alkali metal is 2, the number of moles of Mn is more than 0 and less than 0.2, the number of moles of element M is more than 0.8 and less than 1, and F may have a composition in which the number of moles of is greater than 5 and less than 7.
- the fluoride particles to which the rare earth phosphate is attached are covered with an oxide derived from a metal alkoxide. There is a tendency for the moist heat resistance of the fluoride phosphor to be further improved.
- the preparation process in the second manufacturing method is the same as the preparation process in the first manufacturing method.
- the synthesis step in the second production method is the same as the synthesis step in the first production method, except that the rare earth phosphate is attached to the fluoride particles used in the synthesis step.
- the prepared fluoride particles, rare earth ions, and phosphate ions are brought into contact in a liquid medium.
- the rare earth phosphate adheres to the surface of the fluoride particles to obtain the fluoride particles having the rare earth phosphate adhered thereto. It is believed that by attaching the rare earth phosphate to the fluoride particles in the liquid medium, the rare earth phosphate is more uniformly attached to, for example, the surfaces of the fluoride particles.
- the liquid medium should be capable of dissolving phosphate ions and rare earth ions, and preferably contains at least water in order to facilitate dissolution of these ions.
- the liquid medium may further contain a reducing agent such as hydrogen peroxide, an organic solvent, a pH adjuster, and the like.
- organic solvents that the liquid medium may contain include alcohols such as ethanol and isopropanol.
- pH adjusters include basic compounds such as ammonia, sodium hydroxide and potassium hydroxide; and acidic compounds such as hydrochloric acid, nitric acid, sulfuric acid and acetic acid.
- the pH of the liquid medium is, for example, 1 to 6, preferably 1.5 to 4.
- the liquid medium contains water
- the content of water in the liquid medium is, for example, 70% by mass or more, preferably 80% by mass or more, and more preferably 90% by mass or more.
- the mass ratio of the liquid medium to the fluoride particles is, for example, 100% by mass or more or 200% by mass or more, and is, for example, 1000% by mass or less or 800% by mass or less.
- the mass ratio of the liquid medium is equal to or higher than the above lower limit, the rare earth phosphate can be easily adhered to the surface of the fluoride particles more uniformly. There is a tendency for the adhesion rate of the salt to the fluoride particles to be further improved.
- the liquid medium preferably contains phosphate ions, more preferably water and phosphate ions.
- the prepared fluoride particles and the liquid medium are mixed, and further mixed with a solution containing rare earth ions to obtain phosphate ions and rare earth ions in the liquid medium containing the fluoride particles.
- the phosphate ion concentration in the liquid medium is, for example, 0.05% by mass or more, preferably 0.1% by mass or more, and for example, 5% by mass or less, preferably 3% by mass. % or less.
- the phosphate ion concentration in the liquid medium is at least the above lower limit, the amount of the liquid medium does not become too large, the elution of the constituent components from the fluoride particles is suppressed, and the properties of the fluoride phosphor are maintained satisfactorily. Tend. Further, when the content is equal to or less than the above upper limit, there is a tendency that the uniformity of deposits on the fluoride particles is improved.
- Phosphate ions include orthophosphate ions, polyphosphate (metaphosphate) ions, phosphite ions, and hypophosphite ions.
- Polyphosphate ions include linear polyphosphate ions such as pyrophosphate ions and tripolyphosphate ions, and cyclic polyphosphate ions such as hexametaphosphate ions.
- the liquid medium When the liquid medium contains phosphate ions, it may be prepared by dissolving a compound serving as a phosphate ion source in the liquid medium, or by mixing a solution containing the phosphate ion source with the liquid medium.
- Phosphate ion sources include, for example, phosphoric acid; metaphosphoric acid; alkali metal phosphates such as sodium phosphate and potassium phosphate; alkali metal hydrogen phosphates such as sodium hydrogen phosphate and potassium hydrogen phosphate; Alkali metal dihydrogen phosphates such as sodium hydrogen and potassium dihydrogen phosphate; alkali metal hexametaphosphates such as sodium hexametaphosphate and potassium hexametaphosphate; alkali metal pyrophosphates such as sodium pyrophosphate and potassium pyrophosphate; phosphoric acid and ammonium phosphate salts such as ammonium.
- the liquid medium preferably contains a reducing agent, more preferably contains water and a reducing agent, and still more preferably contains water, phosphate ions and a reducing agent.
- a reducing agent preferably contains water and a reducing agent, and still more preferably contains water, phosphate ions and a reducing agent.
- the reducing agent contained in the liquid medium should be capable of reducing, for example, tetravalent manganese ions eluted from fluoride into the liquid medium, and examples thereof include hydrogen peroxide, oxalic acid, and hydroxylamine hydrochloride. .
- hydrogen peroxide is preferable because it decomposes into water and does not adversely affect fluoride.
- the liquid medium contains a reducing agent
- it may be prepared by dissolving a compound that serves as the reducing agent in the liquid medium, or by mixing a solution containing the reducing agent with the liquid medium.
- the content of the reducing agent in the liquid medium is not particularly limited, it is, for example, 0.1% by mass or more, preferably 0.3% by mass or more, for the reason described above.
- rare earth elements that become rare earth ions to be brought into contact with phosphate ions include La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and A lanthanoid composed of Lu can be mentioned, and at least one selected from the lanthanoids is preferable, and at least one selected from the group consisting of La, Ce, Dy and Gd is more preferable.
- the contact between the phosphate ions and the rare earth ions in the liquid medium may be carried out, for example, by dissolving a compound serving as a rare earth ion source in the liquid medium containing the phosphate ions. It may be performed by mixing with a solution containing ions.
- a solution containing rare earth ions can be prepared, for example, by dissolving a compound serving as a rare earth ion source in a solvent such as water.
- a compound that serves as a rare earth ion source is, for example, a metal salt containing a rare earth element, and examples of anions constituting the metal salt include nitrate ion, sulfate ion, acetate ion, chloride ion, and the like.
- Contacting phosphate ions and rare earth ions in a liquid medium includes, for example, mixing a liquid medium containing phosphate ions and preferably further containing a reducing agent and fluoride particles to obtain a phosphor slurry; mixing with a body slurry and a solution containing rare earth ions.
- the content of rare earth ions in the liquid medium in which phosphate ions and rare earth ions are brought into contact is, for example, 0.05% by mass or more or 0.1% by mass or more, and for example, 3% by mass or less or 2% by mass or less. be.
- the content of rare earth ions relative to the amount of fluoride particles in the liquid medium is, for example, 0.2% by mass or more, or 0.5% by mass or more, and is, for example, 30% by mass or less, or 20% by mass or less.
- the contact temperature between the phosphate ions forming the rare earth phosphate and the rare earth ions is, for example, 10°C to 50°C, preferably 20°C to 35°C.
- the contact time is, for example, 1 minute to 1 hour, preferably 3 minutes to 30 minutes. Contact may be performed while stirring the liquid medium
- a separation step may be provided to separate the fluoride particles to which the rare earth phosphate is adhered from the liquid medium. Separation can be performed by solid-liquid separation means such as filtration and centrifugation. The phosphor obtained by solid-liquid separation may be subjected to washing treatment, drying treatment, or the like, if necessary.
- the method for producing a fluoride phosphor further includes, after the synthesis step, a step of recovering the fluoride phosphor obtained in the synthesis step by solid-liquid separation, a step of drying the solid-liquid separated fluoride phosphor, and the like.
- the method for producing a fluoride phosphor may include a surface treatment step of treating the fluoride phosphor obtained in the synthesis step with a coupling agent. After covering the fluoride particles with an oxide derived from a metal alkoxide, it may further include performing a silane coupling treatment.
- a surface treatment layer containing functional groups derived from the coupling agent can be provided on the surface of the fluoride phosphor by bringing the fluoride phosphor and the coupling agent into contact with each other. This improves, for example, the moisture resistance of the fluoride phosphor.
- the amount of the coupling agent used in the surface treatment step may be, for example, 0.5% by mass or more and 10% by mass or less, preferably 1% by mass or more and 5% by mass, relative to the mass of the fluoride phosphor.
- the contact temperature between the fluoride phosphor and the coupling agent may be, for example, 0° C. or higher and 70° C. or lower, preferably 10° C. or higher and 40° C. or lower.
- the contact time between the fluoride phosphor and the coupling agent may be, for example, 1 minute or more and 10 hours or less, preferably 10 minutes or more and 1 hour or less.
- the light-emitting device includes a first phosphor containing the fluoride phosphor, a fluorescent member containing a resin, and a light-emitting element having an emission peak wavelength in a wavelength range of 380 nm or more and 485 nm or less.
- the light-emitting device may further include other components as necessary.
- FIG. 1 is a schematic cross-sectional view showing an example of a light emitting device according to this embodiment.
- This light emitting device is an example of a surface mount type light emitting device.
- the light-emitting device 100 includes a light-emitting element 10 that emits light having an emission peak wavelength on the short wavelength side of visible light (for example, in the range of 380 nm to 485 nm), and a molded body 40 on which the light-emitting element 10 is mounted.
- a body 40 has a first lead 20 and a second lead 30, and is integrally molded of thermoplastic resin or thermosetting resin.
- a light emitting element 10 is mounted on the bottom surface of the recess, and the light emitting element 10 has a pair of positive and negative electrodes, and the pair of positive and negative electrodes are a first lead 20 and a second lead 30 . They are electrically connected via a wire 60.
- the light emitting element 10 is sealed with a fluorescent member 50.
- the fluorescent member 50 is a fluorescent material including a fluoride fluorescent material that converts the wavelength of the light from the light emitting element 10. 70.
- the phosphor 70 emits light having an emission peak wavelength in a wavelength range different from that of the fluoride phosphor by excitation light from the first phosphor containing the fluoride phosphor and the light emitting element 10.
- a second phosphor that emits light may be included.
- the fluorescent member may contain resin and fluorescent material.
- resins constituting the fluorescent member include silicone resins, epoxy resins, modified silicone resins, modified epoxy resins, and acrylic resins.
- the refractive index of the silicone resin may range from 1.35 to 1.55, more preferably from 1.38 to 1.43. If the refractive index of the silicone resin is within these ranges, it is excellent in translucency, and can be suitably used as the resin constituting the fluorescent member.
- the refractive index of the silicone resin is the refractive index after curing and is measured according to JIS K7142:2008.
- the fluorescent member may further contain a light diffusing material in addition to the resin and the fluorescent material. By containing the light diffusing material, the directivity from the light emitting element can be relaxed and the viewing angle can be increased. Examples of light diffusing materials include silicon oxide, titanium oxide, zinc oxide, zirconium oxide, and aluminum oxide.
- the light emitting element emits light having an emission peak wavelength in the wavelength range of 380 nm or more and 485 nm or less, which is the short wavelength region of visible light.
- the light emitting element may be an excitation light source that excites the fluoride phosphor.
- the light-emitting element preferably has an emission peak wavelength in the range of 380 nm or more and 480 nm or less, more preferably 410 nm or more and 480 nm or less, and more preferably 430 nm or more and 480 nm or less. It is further preferred to have A semiconductor light-emitting element is preferably used as the light-emitting element as the excitation light source.
- a semiconductor light-emitting element As an excitation light source, it is possible to obtain a stable light-emitting device with high efficiency, high output linearity with respect to input, and resistance to mechanical impact.
- the semiconductor light emitting device for example, a semiconductor light emitting device using a nitride semiconductor can be used.
- the half width of the emission peak in the emission spectrum of the light emitting element is preferably, for example, 30 nm or less.
- the light-emitting device includes a first phosphor containing a fluoride phosphor.
- the details of the fluoride phosphor contained in the light emitting device are as described above.
- a fluoride phosphor is contained, for example, in a fluorescent member that covers the excitation light source. In a light-emitting device whose excitation light source is covered with a fluorescent member containing a fluoride phosphor, part of the light emitted from the excitation light source is absorbed by the fluoride phosphor and emitted as red light.
- the radiated light can be used more effectively, and the loss of light emitted from the light emitting device can be reduced. and a highly efficient light emitting device can be provided.
- the light-emitting device further includes, in addition to the first phosphor containing the fluoride phosphor, a second phosphor containing a phosphor other than the fluoride phosphor.
- a second phosphor containing a phosphor other than the fluoride phosphor.
- Any phosphor other than the fluoride phosphor may be used as long as it absorbs light from the light source and converts the wavelength into light of a wavelength different from that of the fluoride phosphor.
- the second phosphor can be contained in the fluorescent member, for example, in the same manner as the first phosphor.
- the second phosphor may have an emission peak wavelength in a wavelength range of 495 nm or more and 590 nm or less, and is preferably a ⁇ -sialon phosphor, a halosilicate phosphor, a silicate phosphor, a rare earth aluminate phosphor, or a perovskite-based luminescence. It may be at least one selected from the group consisting of materials and nitride phosphors.
- the ⁇ -sialon phosphor may have, for example, a composition represented by the following formula (IIa).
- the halosilicate phosphor may have, for example, a composition represented by formula (IIb) below.
- the silicate phosphor may have, for example, a composition represented by formula (IIc) below.
- the rare earth aluminate phosphor may have a composition represented by the following formula (IId).
- the perovskite-based light-emitting material may have, for example, a composition represented by the following formula (IIe).
- the nitride phosphor may have a composition represented by, for example, formula (IIf), (IIg) or (IIh) below.
- the fluorescent member contains a ⁇ -sialon fluorescent substance or a perovskite-based light-emitting material as a second fluorescent substance other than a fluoride fluorescent substance, when the light-emitting device is used as, for example, a light source for a backlight, the range of color reproducibility is reduced. It can be a wider light-emitting device.
- the fluorescent member contains a halosilicate fluorescent substance, a silicate fluorescent substance, a rare earth aluminate fluorescent substance or a nitride fluorescent substance as a second fluorescent substance other than the fluoride fluorescent substance, so that the light emitting device can be used as a light source for illumination, for example. In that case, the light-emitting device can have higher color rendering properties or higher emission efficiency.
- t is a number that satisfies 0 ⁇ t ⁇ 4.2.) (Ca,Sr,Ba)8MgSi4O16 ( F ,Cl,Br) 2 :Eu (IIb) (Ba, Sr, Ca, Mg) 2 SiO 4 :Eu (IIc) (Y, Lu, Gd, Tb) 3 (Al, Ga) 5 O 12 :Ce (IId) CsPb(F,Cl,Br,I) 3 (IIe) (La, Y, Gd) 3 Si 6 N 11 :Ce (IIf) (Sr, Ca) LiAl 3 N 4 :Eu (IIg) (Ca,Sr) AlSiN3 :Eu(IIh)
- the plurality of elements described separated by commas (,) means that at least one of these elements is included in the composition. means to contain Further, in the formulas representing the composition of the phosphor, before the colon (:) represents the host crystal, and after the colon (:) represents the activating element.
- the average particle size of the second phosphor may be, for example, 0.1 ⁇ m or more and 7 ⁇ m or less, preferably 0.2 ⁇ m or more, or 0.5 ⁇ m or more. Also, the average particle size may preferably be 5 ⁇ m or less, or 3 ⁇ m or less. The average particle size of the second phosphor is measured by the FSSS method.
- the fluorescent member may contain the second phosphor singly or in combination of two or more.
- the fluorescent member may further contain at least one kind of quantum dots in addition to the first fluorescent material.
- the quantum dot may absorb light from the light source and convert the wavelength into light with a wavelength different from that of the first phosphor, or may convert the wavelength into light with a similar wavelength.
- quantum dots perovskite having a composition such as (Cs, FA, MA) (Pb, Sn) (Cl, Br, I) 3 (wherein FA means formamidinium and MA means methylammonium)
- Quantum dots having a structure quantum dots having a chalcopyrite structure having a composition such as (Ag, Cu, Au) (In, Ga) (S, Se, Te) 2 , (Cd, Zn) (Se, S), etc.
- the multiple elements or cations described separated by commas (,) contain at least one of these multiple elements or cations in the composition.
- the present disclosure further includes the following aspects.
- Use of said fluoride phosphor in the manufacture of said light emitting device The said fluoride phosphor used for manufacture of the said light-emitting device.
- Production example 1 A phosphor having a Mn content of 1.5% by mass and a first theoretical composition represented by K 2 SiF 6 :Mn (hereinafter sometimes abbreviated as “KSF”) by the above-described method Fluoride particles A1 were obtained.
- the Mn content is 1.5% by mass
- the second theoretical composition represented by K 2 Si 0.99 Al 0.01 F 5.99 :Mn (hereinafter abbreviated as “KSAF” Fluoride particles A2, which are phosphors having
- Production example 3 To 150.0 g of an aqueous sodium salt solution of phosphoric acid (phosphoric acid concentration: 2.4% by mass), 15.0 g of 35% by mass hydrogen peroxide solution and 735.0 g of pure water were added, and 300 g of the fluoride particles A1 produced in Production Example 1 were added while stirring at several 400 rpm and then at room temperature to prepare a phosphor slurry.
- phosphoric acid concentration: 2.4% by mass 15.0 g of 35% by mass hydrogen peroxide solution and 735.0 g of pure water were added, and 300 g of the fluoride particles A1 produced in Production Example 1 were added while stirring at several 400 rpm and then at room temperature to prepare a phosphor slurry.
- a lanthanum nitrate aqueous solution prepared by dissolving 23.4 g of lanthanum nitrate dihydrate in 156.6 g of pure water was added dropwise to the phosphor slurry over about 1 minute. After about 30 minutes from the completion of dropping, stirring was stopped and the mixture was allowed to stand. The obtained precipitate was subjected to solid-liquid separation, washed with ethanol, and dried at 90° C. for 10 hours to prepare fluoride particles A3 of Production Example 3 having lanthanum phosphate arranged on the surface.
- Production example 4 Fluoride particles A4 of Production Example 4 having lanthanum phosphate arranged on the surface thereof were produced in the same manner as in Production Example 3, except that the fluoride particles A2 produced in Production Example 2 were used.
- Fluoride which is a phosphor having a Mn content of 1.0% by mass and a second theoretical composition represented by K 2 Si 0.99 Al 0.01 F 5.99 :Mn by the above method Particles A5 were obtained.
- Production example 6 Fluoride particles A6 of Production Example 6 having lanthanum phosphate arranged on the surface thereof were produced in the same manner as in Production Example 3 except that the fluoride particles A5 produced in Production Example 5 were used.
- Production example 7 After obtaining a phosphor having a Mn content of 1.2% by mass and a second theoretical composition represented by K 2 Si 0.99 Al 0.01 F 5.99 :Mn by the above method Fluoride particles A7 of Production Example 7 having lanthanum phosphate arranged on the surface thereof were produced in the same manner as in Production Example 3.
- Example 1 300 g of the fluoride particles A1 produced in Production Example 1 were weighed, added to a mixed solution of 540 ml of ethanol, 130.2 ml of ammonia water containing 16.5% by mass of ammonia, and 60 ml of pure water, and stirred. While stirring at a rotation speed of 400 rpm using a blade, the liquid temperature was kept at room temperature to obtain a reaction mother liquid. 32.1 g of tetraethoxysilane (TEOS: Si(OC 2 H 5 ) 4 ) was weighed and added dropwise to the stirring reaction mother liquor over about 3 hours. After that, stirring was continued for 1 hour, and after adding 10 g of 35% by mass hydrogen peroxide (H 2 O 2 ), the stirring was stopped.
- TEOS tetraethoxysilane
- the resulting precipitate was subjected to solid-liquid separation, washed with ethanol, and dried at 105° C. for 10 hours to prepare the fluoride phosphor E1 of Example 1 covered with silicon dioxide (SiO 2 ).
- the amount of tetraethoxysilane dropped was about 3% by mass in terms of silicon dioxide with respect to the fluoride particles.
- Example 2 A fluoride phosphor E2 of Example 2 was produced in the same manner as in Example 1, except that the amount of tetraethoxysilane added was 107.1 g. The amount of tetraethoxysilane dropped was about 10% by mass in terms of silicon dioxide with respect to the fluoride particles.
- FIG. 2 A backscattered electron image of the fluoride phosphor obtained in Example 2 observed with a scanning electron microscope is shown in FIG.
- the relatively many gray areas observed in FIG. 2 correspond to the silicon dioxide films, and the slightly darker gray areas seen in the mesh between them indicate that part of the surface of the fluoride particles is exposed. handle.
- FIG. 2 in the fluoride phosphor, most of the surfaces of the fluoride particles are covered with silicon dioxide. It can be seen that the form of silicon dioxide covering the fluoride particles is not particles but a continuous film. It is believed that direct contact between the fluoride particles and the resin is effectively suppressed by the film-like covering of the fluoride particles by the silicon dioxide. Also, cracks (slightly darker gray areas) are present in part of the silicon dioxide film. It is considered that the fewer these cracks, the more effectively the direct contact between the fluoride particles and the resin can be suppressed.
- Example 3 A fluoride phosphor E3 of Example 3 was produced in the same manner as in Example 1, except that the amount of tetraethoxysilane dropped was 214.2 g. The amount of tetraethoxysilane dropped was about 20% by mass in terms of silicon dioxide with respect to the fluoride particles.
- Example 4 The fluoride phosphor of Example 4 was produced in the same manner as in Example 1 except that the fluoride particles A2 produced in Production Example 2 were used, the stirring speed was 500 rpm, and the amount of tetraethoxysilane dropped was 107.1 g. E4 was made.
- Example 5 100 g of fluoride particles A3 produced in Production Example 3 were weighed, 180 ml of ethanol, 43.4 ml of ammonia water containing 16.5% by mass of ammonia, 20 ml of pure water, and a rotation speed using a stirring blade of 300 rpm.
- a fluoride phosphor E5 of Example 5 was produced in the same manner as in Example 1, except that 35.7 g of tetraethoxysilane was added dropwise in 6 hours.
- Example 6 100 g of the fluoride particles A3 produced in Production Example 3 were weighed, added to a mixed solution of 139 ml of ethanol and 35.7 ml of pure water, and stirred at a rotation speed of 300 rpm using a stirring blade. was kept at room temperature and used as the reaction mother liquor. 35.7 g of tetraethoxysilane was weighed as A solution, and 42.9 g of ammonia water containing 16.5% by mass of ammonia was weighed as B solution. After the liquids A and B were added dropwise to the stirring reaction mother liquor over about 3 hours, the mixture was stirred for 1 hour, and 10 g of 35% by mass hydrogen peroxide (H 2 O 2 ) was further added, and then the stirring was stopped. The obtained precipitate was subjected to solid-liquid separation, washed with ethanol, and dried at 105° C. for 10 hours to prepare a fluoride phosphor E6 of Example 6.
- Example 7 First, 50 g of the fluoride phosphor E6 produced in Example 6 was weighed. Next, 84.9 ml of ethanol, 5.8 ml of pure water, and decyltrimethoxysilane ((CH 3 O) 3 Si(CH 2 ) 9 CH 3 )) as a silane coupling agent were mixed. After stirring for 20 minutes, the mixture was allowed to stand for 20 hours or more. The fluoride phosphor E6 produced in Example 6 was added to this solution, and after stirring at 200 rpm for 1 hour, the stirring was stopped. After solid-liquid separation of the resulting precipitate, the precipitate was dried at 105° C. for 10 hours for silane coupling treatment to obtain a fluoride phosphor E7.
- Example 8 A fluoride phosphor E8 of Example 8 was produced in the same manner as in Example 4, except that the fluoride particles A4 produced in Production Example 4 were used.
- Example 9 Fluoride phosphor E9 of Example 9 was produced in the same manner as in Example 7 except that the fluoride phosphor E8 produced in Example 8 was used.
- Example 10 Fluoride phosphor E10 of Example 10 was produced in the same manner as in Example 2 except that the fluoride particles A5 produced in Production Example 5 were used, the stirring speed was 350 rpm, and the dropping time of tetraethoxysilane was 6 hours. was made.
- Example 11 A fluoride phosphor E11 of Example 11 was produced in the same manner as in Example 10 except that the fluoride particles A6 produced in Production Example 6 were used.
- Example 12 A fluoride phosphor E12 of Example 12 was produced in the same manner as in Example 7 except that the fluoride phosphor E11 produced in Example 11 was used.
- Example 13 A fluoride phosphor E13 of Example 13 was obtained in the same manner as in Example 10, except that the amount of tetraethoxysilane dropped was 64.3 g.
- Example 14 A fluoride phosphor E14 of Example 14 was obtained in the same manner as in Example 10, except that the amount of tetraethoxysilane added was 32.2 g.
- Example 15 A fluoride phosphor was obtained in the same manner as in Example 13, except that the fluoride particles A7 produced in Production Example 7 were used. The obtained phosphor was subjected to silane coupling treatment in the same manner as in Example 7 except that hexyltrimethoxysilane was used as the silane coupling agent, to obtain fluoride phosphor E15 of Example 15. .
- Example 16 A fluoride phosphor E16 of Example 16 was obtained in the same manner as in Example 15 except that vinyltrimethoxysilane was used as the silane coupling agent.
- Example 17 A fluoride phosphor E17 of Example 17 was obtained in the same manner as in Example 15 except that 3-aminopropyltriethoxysilane was used as the silane coupling agent.
- Example 18 A fluoride phosphor E18 of Example 18 was obtained in the same manner as in Example 15 except that 3-glycidoxypropyltrimethoxysilane was used as the silane coupling agent.
- Fluorescent X-ray elemental analysis XRF evaluation
- an XRF device product name: ZSX Primus II, manufactured by Rigaku Co., Ltd.
- XRF The peak intensity of the K ⁇ line of the F element was measured by X-Ray Fluorescence spectrometry.
- the peak intensity ratios of the fluoride phosphors of Examples 1 to 3 were calculated as relative values with the peak intensity of the fluoride phosphor of Reference Example 1 being 100.
- the peak intensity ratio of the fluoride phosphor of Example 4 was calculated as a relative value with the peak intensity of the fluoride particles of Reference Example 2 being 100. From the obtained peak intensity ratio, the average thickness of the silicon dioxide film in the fluoride phosphor of each example was calculated using the CXRO (The Center for X-Ray Optics) database. Table 1 shows the results.
- the thickness of the silicon dioxide film was measured at 5 locations per fluoride phosphor particle, and the measured average thickness was calculated as the arithmetic average of the thicknesses at a total of 25 locations for 5 particles.
- the thickness of the silicon dioxide film here means the thickness of the film that can be seen on the SEM image, including the portion where the film is cut obliquely to the thickness direction. Table 2 shows the results.
- silicone resins selected from commercially available silicone resins were used. Specifically, for Examples 1 to 9 and Reference Examples 1 to 4, Shin-Etsu Chemical Co., Ltd. dimethyl silicone resin (product name KER-2936; refractive index 1.41, hereinafter referred to as "dimethyl silicone resin 1" ) was used for evaluation. Further, for Examples 10 and 11 and Reference Example 1, Dow Corning Toray Co., Ltd.
- dimethyl silicone resin (trade name OE-6351; refractive index 1.41, hereinafter referred to as "dimethyl silicone resin 2”), Toray ⁇ Phenyl silicone resin manufactured by Dow Corning Co., Ltd. (trade name OE-6630; refractive index 1.53, hereinafter referred to as “phenyl silicone resin 1”) and a phenyl silicone resin having a different refractive index from the above phenyl silicone resin 1 (refractive ratio 1.50, hereinafter referred to as "phenyl silicone resin 2").
- Production Example 1 of Light Emitting Device The fluoride phosphors of Examples 1 to 9 and Reference Examples 1 to 4 were used as first phosphors.
- a phosphor 70 containing a first phosphor 71 and a second phosphor 72 is mixed with a silicone resin such that x is 0.280 and y is around 0.270 in the CIE 1931 color system. A resin composition was obtained.
- a molded body 40 having a concave portion is prepared, and a light emitting element 10 made of a gallium nitride-based compound semiconductor having an emission peak wavelength of 451 nm is placed on the first lead 20 on the bottom surface of the concave portion.
- the ten electrodes, the first lead 20 and the second lead 30 were connected with wires 60, respectively.
- a resin composition was injected into the concave portion of the molded body 40 using a syringe so as to cover the light emitting element 10 , and the resin composition was cured to form a fluorescent member, thereby manufacturing the light emitting device 1 .
- a phosphor 70 containing a first phosphor 71 and a second phosphor 72 is mixed with a silicone resin such that x is 0.459 and y is around 0.411 in the CIE 1931 color system.
- a light-emitting device 2 was manufactured in the same manner as in Light-Emitting Device Manufacturing Example 1, except that the resin composition was obtained.
- Durability evaluation 1 For the light emitting device 1 or 2 using each fluoride phosphor obtained in Examples 1 to 9 and 15 to 18 and Reference Examples 1 to 4 and 6, in an environmental tester at a temperature of 85 ° C. and a relative humidity of 85% Durability test 1 was performed after storing for 500 hours.
- the luminous flux maintenance factor 1 (%) of the light-emitting device 1 or 2 after the durability test 1 was obtained when the luminous flux of the light-emitting device 1 or 2 before the durability test 1 was taken as 100%.
- the results are shown in Tables 1, 2 and 5.
- Durability evaluation 2 For the light-emitting device 2 using each fluoride phosphor obtained in Examples 10 to 18 and Reference Examples 3, 5 and 6, in an unhumidified environmental tester at a temperature of 85 ° C., a current value of 150 mA and 1000 A durability test 2 was performed by time-driving.
- the luminous flux maintenance factor 2 (%) of the light-emitting device 2 after the durability test 2 was obtained when the luminous flux of the light-emitting device 2 before the durability test 2 was taken as 100%.
- the higher the luminous flux maintenance factor 2 the better the durability against high heat. The results are shown in Tables 4 and 5.
- the SiO 2 analysis values of the fluoride phosphors of Examples 1 to 4 increased with increasing SiO 2 loading.
- the peak intensity ratios of the K ⁇ rays of the F element by XRF in the fluoride phosphors of Examples were all reduced to 80% or less of the peak intensity of the fluoride phosphors of Reference Examples 1 and 2. From this, it is considered that the K ⁇ ray of the F element is absorbed by the SiO 2 film, and the SiO 2 is considered to cover the surface of the fluoride particles as a film.
- the film thickness was calculated to be 0.13 ⁇ m or more from each absorptance.
- the fluoride phosphors of Examples 1 to 3 had higher quantum efficiency retention rates than the fluoride phosphor of Reference Example 1. Further, compared to the resin composition containing the fluoride phosphor of Reference Example 1, the resin compositions containing the fluoride phosphors of Examples 1 to 3 have a higher mass retention rate, and the durability of the resin composition is excellent. was Regarding the durability of the resin composition, in comparison with Example 1, in which the average thickness of the SiO film is thin, in Examples 2 and 3, in which the average thickness is thick, the mass retention rate of the resin composition after 500 hours is further improved. It can be seen that the durability of the resin composition is further improved.
- the fluoride phosphor of Example 4 coated with a SiO2 film with the same composition had a high quantum efficiency maintenance rate in the durability evaluation, and the resin composition Mass retention rate is also high. That is, similar effects were obtained with fluoride particles having KSAF in their composition.
- the light-emitting devices 1 using the fluoride phosphors of Examples 1 to 3 had a higher luminous flux maintenance factor 1 and were excellent in durability. From this, it can be seen that even in the light emitting device 1, the use of the fluoride phosphor coated with the SiO 2 film exhibits higher durability. Compared to the light-emitting device 1 using the fluoride phosphor of Reference Example 2, the light-emitting device 1 using the fluoride phosphor of Example 4 exhibited improved durability. A similar effect was obtained.
- Luminous flux maintenance factor 1 of the light emitting device 1 using the fluoride phosphor was 1% higher than that of the light emitting device 1 using the fluoride phosphor of Example 2 using the fluoride phosphor having KSF in its composition. .
- FIG. 6 shows an SEM image of the fluoride phosphor obtained in Example 8 observed with a scanning electron microscope. From FIG. 6, it can be seen that the form of silicon dioxide covering the fluoride particles is not particles, but a continuous film even in the case of fluoride particles having KSAF in the composition.
- FIG. 3 An image of the cross section of the fluoride phosphor obtained in Example 6 observed with a scanning electron microscope is shown in FIG.
- the gray portion corresponds to fluoride particles 2
- the white portion corresponds to lanthanum phosphate 4
- the dark gray portion corresponds to silicon dioxide 6 . From this, it can be seen that in the fluoride phosphor, lanthanum phosphate 4 adheres to fluoride particles 2 and is further covered with silicon dioxide 6 .
- FIG. 5 shows an image of a cross section of the fluoride phosphor obtained in Example 8 observed with a scanning electron microscope. In FIG.
- the gray portion corresponds to fluoride particles 2
- the white portion corresponds to lanthanum phosphate 4
- the dark gray portion corresponds to silicon dioxide 6 . From this, it can be seen that lanthanum phosphate 4 adheres to fluoride particles 2 and is further covered with silicon dioxide 6 .
- the SiO 2 analysis values of the fluoride phosphors of Examples 5 to 11 were comparable to those of Examples 2 and 4.
- the TC analysis values of the fluoride phosphors of Examples 7 and 9 were higher than those of the fluoride phosphors of Reference Examples 3 and 4, confirming the presence of carbon. Since this carbon is considered to be derived from the silane coupling agent, by subjecting the fluoride phosphor covered with SiO 2 to the silane coupling treatment, a component derived from the silane coupling agent is formed on the surface of the fluoride phosphor. It is considered to adhere.
- the fluoride phosphors of Examples 5 to 7 had higher quantum efficiency retention rates than the fluoride phosphor of Reference Example 3. Further, in the fluoride phosphors of Examples 5 to 7, the mass retention rate of the resin composition was higher than that of the fluoride phosphor of Reference Example 3, and the durability of the resin composition was excellent. As for durability, compared with Example 6, Example 7, in which the silane coupling treatment was performed, has a higher quantum efficiency retention rate, indicating that the durability is further improved. This is probably because the surface of the SiO 2 film was made hydrophobic by the silane coupling treatment.
- the light-emitting devices 1 using the fluoride phosphors of Examples 5 to 7 had a high luminous flux maintenance factor 1 and excellent durability. It can be seen that the luminous flux maintenance factor 1 of the light emitting device 1 using the fluoride phosphor of Example 7, which was subjected to silane coupling treatment, was further improved, and the durability was further improved. There is a correlation between the quantum efficiency maintenance factor of the fluoride phosphor and the luminous flux maintenance factor 1 of the light emitting device 1, and the durability is improved by covering the fluoride phosphor with a SiO2 film, and the durability is further enhanced by the silane coupling treatment. improvement effect was obtained.
- the light-emitting device 1 using the fluoride particles of Examples 8 and 9 also showed improved durability, and the lanthanum phosphate was attached to the light-emitting device 1. Even with fluoride particles having a composition of 2 (KSAF), the effect of improving durability was obtained by covering with a SiO 2 film.
- KSAF fluoride particles having a composition of 2
- the phosphor was most sedimented in the light-emitting device of Example 7 in which the silane coupling treatment was performed. It is believed that the silane coupling treatment improved the affinity with the resin, making it easier for the phosphor to settle.
- the fluoride phosphors of Examples 10 and 11 had higher quantum efficiency retention rates than the fluoride particles of Reference Example 1. Further, compared with the fluoride particles of Reference Example 1, the fluoride phosphors of Examples 10 and 11 had a higher mass retention rate of the resin composition, and the durability of the resin composition was superior. In the phenyl silicone resins 1 and 2, even the fluoride particles of Reference Example 1 had a high mass retention rate, but Examples 10 and 11 had a higher mass retention rate. When the dimethyl silicone resins 1 and 2 were used, the mass retention rate of the fluoride particles of Reference Example 1 was greatly reduced, but in Examples 10 and 11, the mass retention rate was high.
- Example 11 the mass retention rate of Example 11 was high, and a higher effect was obtained by covering the surface of the phosphor to which lanthanum phosphate was attached with a SiO 2 film.
- Example 10 in which the fluoride particles having KSAF in the composition were covered with a SiO film, and the phosphor to which lanthanum phosphate was attached The durability of the resin composition was superior in Example 11, in which the surface was covered with a SiO 2 film.
- the fluoride phosphors of Examples 11 to 14 had higher quantum efficiency retention rates than the fluoride phosphor of Reference Example 5. The mass retention rate of the resin composition was also increased, and the durability of the resin composition was excellent.
- the light-emitting devices 2 using the fluoride phosphors of Examples 10 to 14 had a higher luminous flux maintenance factor 2 than the light-emitting device 2 using the fluoride phosphor of Reference Example 5, and were superior in durability.
- the light-emitting devices 2 using fluoride phosphors of Examples 11 and 12 use fluoride phosphors in which the surface of the phosphor to which lanthanum phosphate is attached is covered with SiO 2 . It was superior in durability to the light emitting device 2 using a fluoride phosphor.
- the affinity with the resin is improved by the silane coupling treatment, so that the phosphor easily settles and the adhesion with the resin is also improved. Therefore, it is considered that a higher effect can be obtained.
- the light-emitting devices 2 using the fluoride phosphors of Examples 13 and 14 with a reduced SiO 2 concentration were superior in durability to the light-emitting device 2 using the fluoride phosphor of Example 10.
- the reason for this is thought to be that by reducing the SiO 2 concentration, cracking of the SiO 2 film was suppressed, and contact with the external environment at the location of the crack was suppressed.
- the fluoride particles having the second composition (KSAF) of Examples 13 and 14 were covered with a SiO film rather than the light-emitting device 2 using the fluoride particles having the KSF composition to which lanthanum phosphate was attached in Reference Example 3.
- Light emitting device 2 using a fluoride phosphor, and light emission using a fluoride phosphor in which fluoride particles having a second composition (KSAF) with lanthanum phosphate attached in Examples 11 and 12 were covered with a SiO 2 film Apparatus 2 was superior in durability.
- the fluoride phosphors of Examples 15 to 18 had higher quantum efficiency retention rates than the fluoride phosphor of Reference Example 6.
- the mass retention rate of the resin composition is also increased, the durability as a powder is excellent, and it is considered that the affinity with the resin is improved by the silane coupling treatment.
- the light-emitting device 2 using the fluoride phosphors of Examples 15, 16 and 18 had a higher luminous flux maintenance factor 1 than the light-emitting device 2 using the fluoride phosphor of Reference Example 6. rice field.
- the light emitting device 2 using the fluoride phosphor of Examples 15 to 18 had a higher luminous flux maintenance factor 2 than the light emitting device 2 using the fluoride phosphor of Reference Example 6. rice field.
- This factor can be considered, for example, as follows.
- the silane coupling agent the methoxy group or ethoxy group hydrolyzes to form a hydrogen bond with the —OH group on the surface of the phosphor, which is then chemically bonded by heating. Therefore, the silane coupling agent is difficult to bond to the fluoride particles of the first composition (KSF) and the second composition (KSAF), which have few —OH groups on the surface.
- KSF first composition
- KSAF second composition
- the fluoride phosphors of Examples 15 to 18 have a second composition in which the surface of the phosphor to which lanthanum phosphate is attached is covered with SiO 2 . It is believed that this lanthanum phosphate improves the adhesion of the SiO2 film and suppresses cracking and peeling of the coating layer, which facilitates uniform bonding of the silane coupling agent and improves affinity with the resin. be done.
- the fluoride phosphor according to the present disclosure is particularly used in a light emitting device using a light emitting diode as an excitation light source, for example, a light source for illumination, a light source for LED display or liquid crystal backlight application, a traffic light, an illuminated switch, various sensors, It can be suitably used for various indicators, small stroboscopes, and the like.
- a light emitting diode for example, a light source for illumination, a light source for LED display or liquid crystal backlight application, a traffic light, an illuminated switch, various sensors, It can be suitably used for various indicators, small stroboscopes, and the like.
- Japanese Patent Application No. 2021-091754 (filing date: May 31, 2021), Japanese Patent Application No. 2021-130074 (filing date: August 6, 2021)), Japanese Patent Application No. 2021-141629 ( Filed date: August 31, 2021)), and the disclosure of Japanese Patent Application No. 2022-083514 (filed date: May 23, 2022) is incorporated herein by reference in its entirety. All publications, patent applications and technical standards mentioned herein are to the same extent as if each individual publication, patent application and technical standard were specifically and individually noted to be incorporated by reference. incorporated herein by reference.
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Abstract
Description
フッ化物蛍光体は、フッ化物粒子と、フッ化物粒子の表面の少なくとも一部を覆う酸化物と、を有していてよい。酸化物は、ケイ素(Si)、アルミニウム(Al)、チタン(Ti)、ジルコニウム(Zr)、スズ(Sn)及び亜鉛(Zn)からなる群から選択される少なくとも1種を含み、その含有率が、フッ化物蛍光体に対して2質量%以上30質量%以下である。フッ化物粒子は、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種を含む元素Mと、アルカリ金属と、Mnと、Fと、を含み、アルカリ金属のモル数を2とする場合に、Mnのモル数が0を超えて0.2未満であり、元素Mのモル数が0.8を超えて1未満であり、Fのモル数が5を超えて7未満である組成を有する。
A1 c[M1 1-bMnbFd] (1)
A1 2M1F6:Mn (1a)
A2 f[M2 1-eMneFg] (2)
A2 2Si1-pAlpF6-p:Mn (2a)
フッ化物蛍光体の製造方法の第1態様(以下、第1の製造方法ともいう)は、フッ化物粒子を準備する準備工程と、準備したフッ化物粒子と、Si、Al、Ti、Zr、Sn及びZnからなる群から選択される少なくとも1種を含む金属アルコキシドとを液媒体中で接触させて、金属アルコキシドに由来する酸化物でフッ化物粒子を覆う合成工程と、を含む。第1の製造方法では、酸化物の被覆量が、フッ化物蛍光体に対して2質量%以上30質量%以下であってよい。また、準備されるフッ化物粒子は、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種を含む元素Mと、アルカリ金属と、Mnと、Fと、を含み、前記アルカリ金属の総モル数を2とする場合に、Mnのモル数が0を超えて0.2未満であり、元素Mのモル数が0.8を超えて1未満であり、Fのモル数が5を超えて7未満である組成を有する。
第二熱処理温度は、好ましくは400℃より高い温度、425℃以上、450℃以上又は480℃以上であってよい。第二熱処理温度の上限は、例えば600℃未満であってよく、好ましくは580℃以下、550℃以下又は520℃以下であってよい。第二熱処理温度は、第一熱処理温度よりも低い温度であってよい。
発光装置は、前記フッ化物蛍光体を含む第一蛍光体及び樹脂を含む蛍光部材と、380nm以上485nm以下の波長範囲に発光ピーク波長を有する発光素子とを含む。発光装置は、必要に応じてその他の構成部材をさらに含んでいてもよい。
(式(IIa)中、tは、0<t≦4.2を満たす数である。)
(Ca,Sr,Ba)8MgSi4O16(F,Cl,Br)2:Eu (IIb)
(Ba,Sr,Ca,Mg)2SiO4:Eu (IIc)
(Y,Lu,Gd,Tb)3(Al,Ga)5O12:Ce (IId)
CsPb(F,Cl,Br,I)3 (IIe)
(La,Y,Gd)3Si6N11:Ce (IIf)
(Sr,Ca)LiAl3N4:Eu (IIg)
(Ca,Sr)AlSiN3:Eu (IIh)
上述の方法により、Mn含有率が1.5質量%であり、K2SiF6:Mnで表される第1の理論組成(以下、「KSF」と略記することがある。)を有する蛍光体であるフッ化物粒子A1を得た。
上述の方法により、Mn含有率が1.5質量%であり、K2Si0.99Al0.01F5.99:Mnで表される第2の理論組成(以下、「KSAF」と略記することがある。)を有する蛍光体であるフッ化物粒子A2を得た。
リン酸のナトリウム塩水溶液(リン酸濃度:2.4質量%)150.0gに、35質量%の過酸化水素水15.0gと、純水735.0gを加え、(攪拌羽を用いて回転数400rpmで攪拌し、)室温で撹拌しながら、製造例1で製造したフッ化物粒子A1を300g投入して蛍光体スラリーを作製した。
製造例2で製造したフッ化物粒子A2を用いたこと以外は製造例3と同様の方法で、表面にリン酸ランタンが配置された製造例4のフッ化物粒子A4を作製した。
上述の方法により、Mn含有率が1.0質量%であり、K2Si0.99Al0.01F5.99:Mnで表される第2の理論組成を有する蛍光体であるフッ化物粒子A5を得た。
製造例5で製造したフッ化物粒子A5を用いたこと以外は製造例3と同様の方法で、表面にリン酸ランタンが配置された製造例6のフッ化物粒子A6を作製した。
上述の方法により、Mn含有率が1.2質量%であり、K2Si0.99Al0.01F5.99:Mnで表される第2の理論組成を有する蛍光体を得た後、製造例3と同様の方法で表面にリン酸ランタンが配置された製造例7のフッ化物粒子A7を作製した。
製造例1で製造したフッ化物粒子A1を300g秤量し、エタノールを540mlと、16.5質量%のアンモニアを含むアンモニア水を130.2mlと、純水60mlとを混合した溶液に投入し、攪拌羽を用いて回転数400rpmで攪拌しながら、液温を常温に保ち反応母液とした。テトラエトキシシラン(TEOS:Si(OC2H5)4)を32.1g秤量し、攪拌中の反応母液に約3時間で滴下した。その後、1時間攪拌を継続し、さらに35質量%の過酸化水素(H2O2)を10g投入した後に攪拌を停止した。得られた沈殿物を固液分離後、エタノール洗浄を行い、105℃で10時間乾燥することで、二酸化ケイ素(SiO2)で覆われた実施例1のフッ化物蛍光体E1を作製した。なお、テトラエトキシシランの滴下量は、フッ化物粒子に対して二酸化ケイ素換算で約3質量%であった。
テトラエトキシシランの滴下量を107.1gとした以外は実施例1と同様の方法で実施例2のフッ化物蛍光体E2を作製した。テトラエトキシシランの滴下量は、フッ化物粒子に対して二酸化ケイ素換算で約10質量%であった。
テトラエトキシシランの滴下量を214.2gとした以外は実施例1と同様の方法で実施例3のフッ化物蛍光体E3を作製した。テトラエトキシシランの滴下量は、フッ化物粒子に対して二酸化ケイ素換算で約20質量%であった。
製造例2で製造したフッ化物粒子A2を用い、攪拌数を500rpmとし、テトラエトキシシランの滴下量を107.1gとしたこと以外は実施例1と同様の方法で実施例4のフッ化物蛍光体E4を作製した。
製造例3で製造したフッ化物粒子A3を100g秤量し、エタノールを180ml、16.5質量%のアンモニアを含むアンモニア水を43.4ml、純水を20ml、攪拌羽を用いた回転数を300rpm、テトラエトキシシランを35.7gとし、6時間で滴下した以外は、実施例1と同様の方法で実施例5のフッ化物蛍光体E5を作製した。
製造例3で製造したフッ化物粒子A3を100g秤量し、エタノール139mlと、純水を35.7mlと、を混合した溶液に投入し、攪拌羽を用いて回転数300rpmで攪拌しながら、液温を常温に保ち反応母液とした。テトラエトキシシランを35.7g秤量しA液とし、16.5質量%のアンモニアを含むアンモニア水を42.9g秤量しB液とした。攪拌中の反応母液にA液及びB液を約3時間で滴下後、1時間攪拌し、さらに35質量%の過酸化水素(H2O2)を10g投入した後に攪拌を停止した。得られた沈殿物を固液分離後、エタノール洗浄を行い、105℃で10時間乾燥することで実施例6のフッ化物蛍光体E6を作製した。
まず、実施例6で作製したフッ化物蛍光体E6を50g秤量した。次に、エタノール84.9mlと、純水を5.8mlと、シランカップリング剤としてデシルトリメトキシシラン((CH3O)3Si(CH2)9CH3))と、を混合し、30分間攪拌後、20時間以上静置した。この溶液に実施例6で作製したフッ化物蛍光体E6を投入し、200rpmで1時間攪拌後、攪拌を停止した。得られた沈殿物を固液分離後、105℃で10時間乾燥することでシランカップリング処理を行って、フッ化物蛍光体E7を得た。
製造例4で製造したフッ化物粒子A4を用いたこと以外は実施例4と同様の方法で実施例8のフッ化物蛍光体E8を作製した。
実施例8で作製したフッ化物蛍光体E8を用いたこと以外は実施例7と同様の方法で実施例9のフッ化物蛍光体E9を作製した。
製造例5で製造したフッ化物粒子A5を用い、攪拌数を350rpmとし、テトラエトキシシランの滴下時間を6時間としたこと以外は実施例2と同様の方法で実施例10のフッ化物蛍光体E10を作製した。
製造例6で製造したフッ化物粒子A6を用いたこと以外は実施例10と同様の方法で実施例11のフッ化物蛍光体E11を作製した。
実施例11で作製したフッ化物蛍光体E11を用いたこと以外は実施例7と同様の方法で実施例12のフッ化物蛍光体E12を作製した。
テトラエトキシシランの滴下量を64.3gとした以外は実施例10と同様の方法で実施例13のフッ化物蛍光体E13を得た。
テトラエトキシシランの滴下量を32.2gとした以外は実施例10と同様の方法で実施例14のフッ化物蛍光体E14を得た。
製造例7で製造したフッ化物粒子A7を用いたこと以外は実施例13と同様の方法でフッ化物蛍光体を得た。得られた蛍光体に、シランカップリング剤としてヘキシルトリメトキシシランを用いたこと以外は実施例7と同様の方法でシランカップリング処理を行って、実施例15のフッ化物蛍光体E15を得た。
シランカップリング剤としてビニルトリメトキシシランを用いた以外は実施例15と同様の方法で実施例16のフッ化物蛍光体E16を得た。
シランカップリング剤として3-アミノプロピルトリエトキシシランを用いた以外は実施例15と同様の方法で実施例17のフッ化物蛍光体E17を得た。
シランカップリング剤として3-グリシドキシプロピルトリメトキシシランを用いた以外は実施例15と同様の方法で実施例18のフッ化物蛍光体E18を得た。
製造例1で得られたフッ化物粒子A1を参考例1のフッ化物蛍光体C1とした。
製造例2で得られたフッ化物粒子A2を参考例2のフッ化物蛍光体C2とした。
製造例3で得られたフッ化物粒子A3を参考例3のフッ化物蛍光体C3とした
製造例4で得られたフッ化物粒子A4を参考例4のフッ化物蛍光体C4とした
製造例6で得られたフッ化物粒子A6を参考例5のフッ化物蛍光体C5とした。
製造例7で得られたフッ化物粒子A7を参考例6のフッ化物蛍光体C6とした。
(1)二酸化ケイ素量
得られた各フッ化物蛍光体について、ICP発光分光分析による組成分析を行い、実施例で得られた二酸化ケイ素で覆われたフッ化物蛍光体の分析Si濃度と、参考例のフッ化物蛍光体の分析Si濃度の差分から、フッ化物粒子を覆っている二酸化ケイ素量を算出し、フッ化物蛍光体に対する二酸化ケイ素の含有率(SiO2分析値)を求めた。結果を表1、表2、表3及び表4に示す。
上記で得られた各フッ化物蛍光体について、XRF装置(製品名:ZSX PrimusII、株式会社リガク製)を用いて、蛍光X線元素分析法(XRF:X-Ray Fluorescence spectrometry)によりF元素のKα線のピーク強度を測定した。実施例1から3のフッ化物蛍光体のピーク強度比を、参考例1のフッ化物蛍光体のピーク強度を100として相対値として算出した。同様に実施例4のフッ化物蛍光体のピーク強度比を参考例2のフッ化物粒子のピーク強度100とした相対値として算出した。得られたピーク強度比から各実施例のフッ化物蛍光体における二酸化ケイ素膜の平均厚みを、CXRO(The Center for X-Ray Optics)のデータベースを利用して算出した。結果を表1に示す。
得られた実施例6及び8のフッ化物蛍光体について、走査電子顕微鏡(SEM)を用いて画像観察を行った。SEM画像を図4及び6に示す。さらに実施例6及び8のフッ化物蛍光体について、走査電子顕微鏡(SEM)を用いて、任意断面を観察し、画像解析することで二酸化ケイ素膜の平均厚みを計測した。具体的には、複数のフッ化物蛍光体粒子を樹脂に埋め込み、イオンミリング加工により断面試料を作製し、走査電子顕微鏡によるフッ化物蛍光体粒子の断面観察が可能な状態とした。断面SEM画像を図3及び5に示す。
得られた実施例7、9、12及び15から18並びに参考例3及び4のフッ化物蛍光体について、全有機体炭素計(製品名:TOC-L、株式会社島津製作所製)を用いてトータルカーボン(TC)の分析を行った。結果を表2、表4及び表5に示す。
得られた実施例5から9及び11から18並びに参考例3から6のフッ化物蛍光体について、誘導結合プラズマ発光分光分析法(ICP-AES)によるランタン含有率の分析を行い、フッ化物粒子に対する含有率(La分析値)を求めた。結果を表2及び表4に示す。
得られた実施例10から18並びに参考例1、3、5及び6のフッ化物蛍光体について、誘導結合プラズマ発光分光分析法(ICP-AES)によるマンガン含有率の分析を行い、フッ化物蛍光体に対する含有率(Mn分析値)を求めた。結果を表3及び表4に示す。
樹脂とフッ化物蛍光体を含む樹脂組成物の質量変化に対するフッ化物蛍光体の影響について次の様にして評価した。シリコーン樹脂に、シリコーン樹脂に対して33質量%のフッ化物蛍光体を混合して樹脂組成物を調製した。得られた樹脂組成物の約1gをアルミ箔上に秤量し、硬化させた後、硬化後の樹脂組成物の質量とアルミ箔の質量との差分を算出し、初期値とした。アルミ箔上で硬化させた樹脂組成物を200℃に維持した小型オーブン(製品名:恒温恒湿器LH-114、エスペック社製)に静置し、100時間後、300時間後、500時間後、1000時間後における質量をそれぞれ測定した。初期値を100%とした時の各時間経過後の樹脂組成物の質量維持率(%)を算出した。質量維持率が高いほど、フッ化物蛍光体と樹脂との反応が抑制されていることを示しており、樹脂組成物の耐久性に優れることを意味する。なお、評価には購入可能なシリコーン樹脂から選択したシリコーン樹脂を用いた。具体的には、実施例1から9及び参考例1から4については、信越化学工業株式会社製ジメチルシリコーン樹脂(製品名KER-2936;屈折率1.41、以下「ジメチルシリコーン樹脂1」と呼ぶ。)を用いて評価を行った。また、実施例10、11及び参考例1については、東レ・ダウコーニング株式会社製ジメチルシリコーン樹脂(商品名OE-6351;屈折率1.41、以下「ジメチルシリコーン樹脂2」と呼ぶ。)、東レ・ダウコーニング株式会社製フェニルシリコーン樹脂(商品名OE-6630;屈折率1.53、以下「フェニルシリコーン樹脂1」と呼ぶ。)及び上記フェニルシリコーン樹脂1とは屈折率が異なるフェニルシリコーン樹脂(屈折率1.50、以下「フェニルシリコーン樹脂2」と呼ぶ。)を用いた評価も併せて実施した。
上記で得られた各フッ化物蛍光体の耐久性について次の様にして評価した。各フッ化物蛍光体について、量子効率測定装置(製品名:QE-2000、大塚電子株式会社製)を用いて、450nmの励起光に対する内部量子効率を測定し、初期特性とした。次に、フッ化物粒子あるいはフッ化物蛍光体をガラスシャーレに入れ、温度85℃、相対湿度85%に維持した小型高温高湿槽(エスペック社製)中で100時間静置した。その後、同様の方法で各フッ化物蛍光体の内部量子効率を測定し、初期特性を100%とした時の量子効率維持率(%)を算出した。量子効率維持率が高いほど、耐久性に優れていることを意味する。結果を表1から表5に示す。
実施例1から9及び参考例1から4のフッ化物蛍光体を第一蛍光体として使用した。第二蛍光体としてSi5.81Al0.19O0.19N7.81:Euで表される組成を有し、540nm付近に発光ピーク波長を有するβサイアロン蛍光体を使用した。CIE1931表色系における色度座標でxが0.280、yが0.270付近となるように第一蛍光体71及び第二蛍光体72を配合した蛍光体70とシリコーン樹脂とを混合して樹脂組成物を得た。次に、凹部を有する成形体40を準備し、凹部の底面に発光ピーク波長が451nmである、窒化ガリウム系化合物半導体を材料とする発光素子10を第一のリード20に配置した後、発光素子10の電極と第一のリード20、第二のリード30とをそれぞれワイヤ60で接続した。さらに成形体40の凹部に発光素子10を覆うようにシリンジを用いて樹脂組成物を注入し、樹脂組成物を硬化させて蛍光部材を形成して、発光装置1を製造した。
実施例10から18並びに参考例3、5及び6のフッ化物蛍光体を第一蛍光体として使用した。第二蛍光体としてLu3Al5O11:Ceで表される組成を有し、530nm付近に発光ピークを有する希土類アルミン酸塩蛍光体と、Y3Al5O11:Ceで表される組成を有し、535nm付近に発光ピークを有する希土類アルミン酸塩蛍光体と、(Ca,Sr)AlSiN3:Euで表される組成を有し、630nm付近に発光ピーク波長を有する窒化物蛍光体を組み合わせて使用した。CIE1931表色系における色度座標でxが0.459、yが0.411付近となるように第一蛍光体71及び第二蛍光体72を配合した蛍光体70とシリコーン樹脂とを混合して樹脂組成物を得たこと以外は発光装置の製造例1と同様にして発光装置2を製造した。
実施例1から9及び15から18並びに参考例1から4及び6にて得られた各フッ化物蛍光体を用いた発光装置1又は2について、温度85℃、相対湿度85%の環境試験機内で500時間保管して耐久性試験1を行った。耐久性試験1前の発光装置1又は2の光束を100%とした時の、耐久性試験1後の発光装置1又は2の光束維持率1(%)を求めた。光束維持率1が高いほど高熱高湿に対する耐久性に優れていることを示す。結果を表1、表2及び表5に示す。
実施例10から18並びに参考例3、5及び6にて得られた各フッ化物蛍光体を用いた発光装置2について、加湿していない温度85℃の環境試験機内にて、電流値150mAで1000時間駆動して耐久性試験2を行った。耐久性試験2前の発光装置2の光束を100%とした時の、耐久性試験2後の発光装置2の光束維持率2(%)を求めた。光束維持率2が高いほど高熱に対する耐久性に優れていることを示す。結果を表4及び表5に示す。
Claims (20)
- フッ化物粒子と、前記フッ化物粒子の表面の少なくとも一部を覆う酸化物と、を含むフッ化物蛍光体であり、
前記酸化物は、Si、Al、Ti、Zr、Sn及びZnからなる群から選択される少なくとも1種を含み、前記酸化物の含有率が、前記フッ化物蛍光体に対して2質量%以上30質量%以下であり、
前記フッ化物粒子は、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種を含む元素Mと、アルカリ金属と、Mnと、Fと、を含み、前記アルカリ金属のモル数を2とする場合に、Mnのモル数が0を超えて0.2未満であり、元素Mのモル数が0.8を超えて1未満であり、Fのモル数が5を超えて7未満である組成を有するフッ化物蛍光体。 - 前記フッ化物粒子は、その組成に元素MとしてSi及びGeの少なくとも一方を含み、前記アルカリ金属のモル数を2とする場合に、SiとGeとMnの総モル数が0.9以上1.1以下である請求項1に記載のフッ化物蛍光体。
- 前記フッ化物粒子は、下記式(1)で表される組成を有する請求項1又は2に記載のフッ化物蛍光体。
A1 c[M1 1-bMnbFd] (1)
(式(1)中、A1は、Li、Na、K、Rb及びCsからなる群から選択される少なくとも1種を含む。M1は、少なくともSi及びGeの少なくとも一方を含み、第4族元素及び第14族元素からなる群から選択される少なくとも1種の元素を更に含んでもよい。bは0<b<0.2を満たし、cは[M2 1-bMnbFd]イオンの電荷の絶対値であり、dは5<d<7を満たす。) - 前記フッ化物粒子は、その組成に元素MとしてSi及びAlを含み、前記アルカリ金属のモル数を2とする場合に、SiとAlとMnの総モル数が0.9以上1.1以下であり、Alのモル数が0を超えて0.1以下である請求項1に記載のフッ化物蛍光体。
- 前記フッ化物粒子は、下記式(2)で表される組成を有する請求項1又は4に記載のフッ化物蛍光体。
A2 f[M2 1-eMneFg] (2)
(式(2)中、A2は、Li、Na、K、Rb及びCsからなる群から選択される少なくとも1種を含む。M2は、少なくともSi及びAlを含み、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種の元素を更に含んでもよい。eは0<e<0.2を満たし、fは[M2 1-eMneFg]イオンの電荷の絶対値であり、gは5<g<7を満たす。) - 前記酸化物は、ケイ素を含む請求項1から5のいずれか1項に記載のフッ化物蛍光体。
- 前記酸化物の平均厚みが、0.1μm以上1.8μm以下である請求項1から6のいずれか1項に記載のフッ化物蛍光体。
- 蛍光X線元素分析法において、前記フッ化物粒子におけるF元素のKα線のピーク強度に対する、前記フッ化物蛍光体におけるF元素のKα線のピーク強度の比率が80%以下である請求項1から7のいずれか1項に記載のフッ化物蛍光体。
- 前記フッ化物粒子は、その表面に、La、Ce、Dy及びGdからなる群から選択される少なくとも1種の希土類元素を含む希土類リン酸塩が配置され、前記酸化物は前記希土類リン酸塩を介して前記フッ化物粒子を被覆する請求項1から8のいずれか1項に記載のフッ化物蛍光体。
- 前記希土類リン酸塩は、ランタンを含む請求項9に記載のフッ化物蛍光体。
- 前記希土類リン酸塩の含有率は、前記希土類元素の含有率として0.1質量%以上20質量%以下である請求項9又は10に記載のフッ化物蛍光体。
- フッ化物蛍光体の製造方法であって、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種を含む元素Mと、アルカリ金属と、Mnと、Fと、を含み、前記アルカリ金属のモル数を2とする場合に、Mnのモル数が0を超えて0.2未満であり、元素Mのモル数が0.8を超えて1未満であり、Fのモル数が5を超えて7未満である組成を有するフッ化物粒子を準備することと、
準備した前記フッ化物粒子と、Si、Al、Ti、Zr、Sn及びZnからなる群から選択される少なくとも1種を含む金属アルコキシドとを液媒体中で接触させることで、前記金属アルコキシドに由来する酸化物が前記フッ化物蛍光体に対して2質量%以上30質量%以下の量で、前記フッ化物粒子の表面の少なくとも一部を覆うことと、を含む製造方法。 - フッ化物蛍光体の製造方法であって、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種を含む元素Mと、アルカリ金属と、Mnと、Fと、を含み、前記アルカリ金属のモル数を2とする場合に、Mnのモル数が0を超えて0.2未満であり、元素Mのモル数が0.8を超えて1未満であり、Fのモル数が5を超えて7未満である組成を有するフッ化物粒子を準備することと、
液媒体中で、準備した前記フッ化物粒子と、La、Ce、Dy及びGdからなる群から選択される少なくとも1種を含む希土類イオンと、リン酸イオンと、を接触させて希土類リン酸塩が付着したフッ化物粒子を得ることと、
前記希土類リン酸塩が付着したフッ化物粒子と、Si、Al、Ti、Zr、Sn及びZnからなる群から選択される少なくとも1種を含む金属アルコキシドとを液媒体中で接触させることで、前記金属アルコキシドに由来する酸化物が前記フッ化物蛍光体に対して2質量%以上30質量%以下の量で、前記希土類リン酸塩が付着したフッ化物粒子の表面の少なくとも一部を覆うことと、を含む製造方法。 - 準備した前記フッ化物粒子は、その組成に元素MとしてSi及びGeの少なくとも一方を含み、前記アルカリ金属のモル数を2とする場合に、SiとGeとMnの総モル数が0.9以上1.1以下である請求項12又は13に記載の製造方法。
- 準備した前記フッ化物粒子は、下記式(1)で表される組成を有する請求項14に記載の製造方法。
A1 c[M1 1-bMnbFd] (1)
(式(1)中、A1は、Li、Na、K、Rb及びCsからなる群から選択される少なくとも1種を含む。M1は、少なくともSi及びGeの少なくとも一方を含み、第4族元素及び第14族元素からなる群から選択される少なくとも1種の元素を更に含んでもよい。bは0<b<0.2を満たし、cは[M2 1-bMnbFd]イオンの電荷の絶対値であり、dは5<d<7を満たす。) - 準備した前記フッ化物粒子は、その組成に元素MとしてSi及びAlを含み、前記アルカリ金属のモル数を2とする場合に、SiとAlとMnの総モル数が0.9以上1.1以下であり、Alのモル数が0を超えて0.1以下である請求項12又は13に記載の製造方法。
- 準備した前記フッ化物粒子は、下記式(2)で表される組成を有する請求項16に記載の製造方法。
A2 f[M2 1-eMneFg] (2)
(式(2)中、A2は、Li、Na、K、Rb及びCsからなる群から選択される少なくとも1種を含む。M2は、少なくともSi及びAlを含み、第4族元素、第13族元素及び第14族元素からなる群から選択される少なくとも1種の元素を更に含んでもよい。eは0<e<0.2を満たし、fは[M2 1-eMneFg]イオンの電荷の絶対値であり、gは5<g<7を満たす。) - 前記金属アルコキシドに由来する酸化物でフッ化物粒子の表面の少なくとも一部を覆った後、シランカップリング処理を行うことを更に含む請求項12から17のいずれか1項に記載の製造方法。
- 前記液媒体中で接触させる前記金属アルコキシドは、テトラメトキシシラン、テトラエトキシシラン及びテトライソプロポキシシランからなる群から選択される少なくとも1種を含む請求項12から18のいずれか1項に記載の製造方法。
- 請求項1から11のいずれか1項に記載のフッ化物蛍光体と樹脂とを含む蛍光部材と、380nm以上485nm以下の波長範囲に発光ピーク波長を有する発光素子と、を備える発光装置。
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DE112022002894T5 (de) | 2024-03-14 |
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