WO2015081746A1 - 封装结构的形成方法 - Google Patents
封装结构的形成方法 Download PDFInfo
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- WO2015081746A1 WO2015081746A1 PCT/CN2014/086737 CN2014086737W WO2015081746A1 WO 2015081746 A1 WO2015081746 A1 WO 2015081746A1 CN 2014086737 W CN2014086737 W CN 2014086737W WO 2015081746 A1 WO2015081746 A1 WO 2015081746A1
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- layer
- carrier
- pad
- line carrier
- forming
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Definitions
- the present invention relates to the field of semiconductor packaging, and in particular to a method of forming a package structure.
- the volume and package thickness of the entire package structure are reduced by stacking the semiconductor chips on the line carrier.
- the existing POP packaging technology has a low packaging efficiency when forming a package structure.
- the problem solved by the present invention is how to improve the packaging efficiency of the package structure.
- the present invention provides a method for forming a package structure, comprising: providing a pre-cover panel, the pre-cover panel comprising a first plastic seal layer, and the first plastic seal layer has a plurality of integrated units arranged in a matrix, each Having at least one semiconductor chip in the integrated unit, the semiconductor chip having a plurality of pads on its surface, the first plastic sealing layer exposing a pad on the semiconductor chip, the pad having a first metal bump; providing a line carrier
- the line carrier includes a first surface and a second surface opposite to the first surface, the line carrier has a plurality of carrier units arranged in a matrix, and the first surface of the carrying unit has a plurality of losses Into the pad, the second surface of the carrying unit has a plurality of output pads, and the input pad and the output pad are connected by an interconnection structure in the carrying unit; the pre-covering plate is flipped on the first surface of the line carrier
- the integrated unit in the package panel is corresponding to the carrying unit on the line carrier board,
- a packaging unit forming a filling layer filling a space between the first surface of the carrying unit and the pre-covering plate; forming a second metal bump on the output pad of the second surface of the carrying unit; cutting along the packaging unit to form a plurality of Discrete package structure.
- the pre-covering plate is formed by: providing a carrier board, the carrier board has a glue layer, the glue layer comprises a plurality of bonding areas arranged in a matrix; and providing a plurality of semiconductor chips, the semiconductor a surface of the chip having a pad; a side of the at least one semiconductor chip having a pad is attached to each bonding region of the bonding layer; forming a first molding layer to mold a plurality of semiconductor chips together; removing the carrier A plate and a glue layer exposing the pads on the semiconductor chip; forming a first metal bump on the pad to form a plurality of integrated cells arranged in a matrix.
- the circuit integration layer includes an input end, an output end, and a multi-layer circuit connecting the input end and the output end.
- the input end is connected to a pad of the semiconductor chip; a first metal bump is formed on the output end.
- the integrated unit of the pre-cover board further has a plurality of passive components, the surface of the passive device has a pad, and one side of the passive device having the pad is attached to the glue layer.
- the input end of the line integration layer is further connected to the pad of the passive device.
- the line carrier board is one of a printed circuit board, a BT resin substrate or a silicon substrate.
- a plurality of discrete first slots extending through the thickness of the first plastic seal layer are formed in a portion of the first plastic seal layer between adjacent integrated units of the pre-cover sheet.
- a plurality of discrete second slots extending through the thickness of the line carrier are formed in a portion of the area between adjacent carrier units of the line carrier.
- the first metal bump is a solder ball or a solder pillar, or the first metal bump comprises a metal pillar and a solder ball on the metal pillar.
- the method further includes forming a second plastic sealing layer that encapsulates the pre-covering board, the wiring carrier board, and the filling layer, the second plastic sealing layer exposing the second metal bump on the output pad of the line carrier board.
- the present invention also provides a package structure comprising: a line carrier, the line carrier comprising a first surface and a second surface opposite the first surface, the line carrier having a plurality of carriers arranged in a matrix a first surface of the carrying unit having a plurality of input pads, the second surface of the carrying unit having a plurality of output pads, the input pads and the output pads being connected by an interconnection structure in the carrying unit; a pre-covering plate, the pre- The cover panel comprises a first plastic sealing layer, the first plastic sealing layer has a plurality of integrated units arranged in a matrix, each integrated unit has at least one semiconductor chip therein, the semiconductor chip has a plurality of pads on the surface thereof, and the first plastic sealing layer is exposed a pad on the semiconductor chip, the pad having a first metal bump; the pre-covering plate is flipped on the first surface of the line carrier, so that the integrated unit in the package panel and the carrying unit on the line carrier Correspondingly, the first metal bump on the pre-covering plate is soldered to the
- the first metal bump is a solder ball or a solder pillar, or the first metal bump comprises a metal pillar and a solder ball on the metal pillar.
- each integrated unit further has a plurality of passive devices, the surface of the passive device has a pad, the passive device is located at one side of the semiconductor chip, and the first plastic sealing layer exposes the pad on the passive device.
- the method further includes: a first rewiring metal layer on the first plastic sealing layer connecting the pads of the semiconductor chip in each integrated unit and the pads of the adjacent passive devices, The first metal bump is located on the first rewiring metal layer.
- a second re-wiring metal layer connecting the pads of adjacent semiconductor chips in the integrated unit is further disposed on the first plastic sealing layer.
- the types of the semiconductor chips are the same or different.
- the line carrier board is one of a printed circuit board, a BT resin substrate or a silicon substrate.
- a portion of the first molding layer between the adjacent integrated units of the pre-covering plate is formed with a plurality of discrete first slots extending through the thickness of the first molding layer, and the filling layer further fills the first slot. Slot.
- a plurality of discrete second slots extending through the thickness of the line carrier are formed in a portion of the area between adjacent carrier units of the line carrier, the fill layer also filling the first slot.
- the method further includes molding a second plastic sealing layer of the pre-covering board, the wiring carrier board and the filling layer, the second plastic sealing layer exposing the second metal bump on the output pad of the line carrier board.
- the method for forming a package structure of the present invention after forming a pre-cover board having a plurality of semiconductor chips, flipping the pre-cover sheet onto the first surface of the line carrier, and the first on the semiconductor chip in the pre-cover board A metal bump is soldered to the input pad on the first surface of the line carrier, and then a space between the first surface of the line carrier and the pre-cover is filled with a fill layer and then on the second surface of the line carrier Forming a second metal bump on the upper output pad, thereby implementing packaging of the plurality of semiconductor chips together with the line carrier, and removing the first plastic layer, the insulating layer, the filling layer and the line between the adjacent semiconductor chips by cutting
- the peripheral region between adjacent line regions of the carrier board may form a plurality of independent package structures, the present invention compared to existing single semiconductor chips and corresponding line carrier packages The method of forming the package structure improves the efficiency of the package.
- the pads of the semiconductor chip are connected to the pads of the passive device through a metal layer, thereby realizing a plurality of semiconductor chips and passive devices and line carriers.
- the integrated package improves package efficiency and meets system-level packaging requirements.
- first through holes of the thickness of the first plastic sealing layer are formed in a portion of the first plastic sealing layer between adjacent integrated units of the pre-covering plate.
- the first slot can release the accumulation in the pre-covering plate.
- the input pads on the first surface of the carrier unit are soldered together and then form a fill layer filling the space between the first surface of the line carrier and the pre-cover panel, due to the first slot and the line in the pre-cover panel
- the space between the first surface of the plate and the pre-covering plate is in communication, which facilitates the exhausting of the filling material, enhances the fluidity of the filling material, thereby preventing void defects in the filling layer;
- the first slot is located in the first plastic layer between adjacent integrated units and does not occupy additional space; on the other hand, when the filling layer is subsequently formed, the filling layer can fill the first slot, the filling layer and the first layer groove Configuration similar to the "latch" structure, so that the cover panel and the two parts of the pre-wiring board carrier lock, preventing deformation of
- a partial region (cutting region) between adjacent carrier units of the line carrier forms a plurality of discrete second through holes of the thickness of the line carrier, on the one hand, the presence of the second slot, the pre-cover The board is flip-chip mounted on the line carrier board, and the first metal bump on the semiconductor chip in the integrated unit of the pre-cover board is soldered to the input pad on the first surface of the carrier unit of the line carrier board, the second slot
- the hole is in communication with the space between the first surface of the line carrier and the pre-cover plate.
- the position of the second slot and the adjacent load bearing area is fixed (or with input on the load bearing area)
- the position of the pad is fixed, and the second slot can be used as an alignment mark when the pre-covering board is flipped on the line carrier board.
- the pre-covering board can be flipped accurately Accurate soldering of the first metal bump on the pre-cover board to the input pad on the line carrier board on the line carrier; and on the other hand, the second slot is a line between adjacent load-bearing areas Inside the carrier (cutting area), it does not occupy an extra area.
- FIG. 1 to 11 are schematic structural views showing a process of forming a package structure according to an embodiment of the present invention.
- the existing POP packaging technology is to stack a single semiconductor chip on a line carrier board, and the packaging efficiency is low.
- the present invention provides a method of forming a package structure, forming a pre-cover board in which a plurality of semiconductor chips are packaged, and the input of the semiconductor chip and the line carrier on the pre-cover board is soldered through the metal bumps.
- the disks are connected together to realize integrated packaging of a plurality of semiconductor chips and a line carrier, thereby improving packaging efficiency.
- FIG. 1 to 11 are schematic structural views showing a process of forming a package structure according to an embodiment of the present invention.
- a wafer 21 is provided on which a plurality of semiconductor chips 200 are formed; the wafers 21 are cut to form a plurality of discrete semiconductor chips 200.
- An integrated circuit (not shown) is disposed in the semiconductor chip 200.
- the surface of the semiconductor chip 200 has a plurality of pads 201.
- the pads 201 on the surface of the semiconductor chip 200 are electrically connected to integrated circuits in the semiconductor chip.
- Pad 201 as a semiconductor chip The integrated circuit in 200 is electrically connected to the external port.
- a plurality of discrete semiconductor chips 200 are subsequently packaged together to form a pre-cover board.
- the pad 201 may be a pad that is drawn through a rewiring metal layer formed on the semiconductor chip 200.
- a plurality of semiconductor chips 200 are packaged together by a first molding layer 205, and the first molding layer 205 exposes the pads 201 on the semiconductor chip 200.
- the passive device 204 and the semiconductor chip 200 may also be packaged together through the first plastic seal layer 205, and the surface of the passive device 204 has a pad.
- the passive device 204 can be one or more of an inductor, a capacitor, or a resistor.
- the specific process of encapsulating a plurality of semiconductor chips 200 and passive devices 204 is: providing a carrier 300 having a glue layer 301 thereon, the glue layer 301 comprising a plurality of bonding regions arranged in a matrix; A side of the semiconductor chip 200 having the pad 201 is attached to each bonding region of the bonding layer 301, and a padded side of the passive device 204 is attached to the bonding region of the bonding layer 301.
- the passive device 204 is located on one side of the semiconductor chip 200; the first plastic sealing layer 205 is formed, and the plurality of semiconductor chips 200 and the passive device 204 are molded together; after the first plastic sealing layer 205 is formed, the carrier 300 is removed (stripped) And the glue layer 301 exposes the pads 201 on the semiconductor chip 200 and the pads on the passive device 204.
- a plurality of semiconductor chips 200 are packaged together by a first plastic seal layer 205 to form a pre-cover board, each pre-cover board having a plurality of matrix-arranged integrated units (not shown), the position and adhesive layer of each integrated unit
- the position of the bonding area on 301 corresponds to that the semiconductor chip pasted on each bonding area on the bonding layer 301 is an integrated semiconductor chip in each integrated unit in the pre-covering board.
- the area between adjacent integrated units of the pre-cover board is a divided area.
- Each of the bonding regions of the bonding layer 301 has at least one semiconductor chip 200.
- the types of the semiconductor chips 200 may be the same or different.
- the types of the semiconductor chips 200 may be the same or different.
- the carrier 300 may be a glass substrate, a silicon substrate or a metal substrate.
- the glue layer 301 can be selected from a variety of materials.
- the glue layer 301 is made of UV glue.
- UV glue is a glue that reacts to ultraviolet light of a particular wavelength. UV glue can be divided into two kinds according to the change of viscosity after ultraviolet light irradiation.
- UV curing glue that is, the photoinitiator or photosensitizer in the material absorbs ultraviolet light under ultraviolet light to generate active radicals or cations, which leads to Monomer polymerization, cross-linking and grafting chemical reaction, so that the UV-curable adhesive is converted from a liquid state to a solid state in a few seconds to bond the surface of the object in contact with it; the other is that the UV glue is not exposed to ultraviolet light.
- the viscosity is very high, and the cross-linking chemical bond in the material after being irradiated by ultraviolet light is broken to cause the viscosity to drop or disappear greatly.
- the UV glue used in the glue layer 301 here is the latter.
- the adhesive layer 301 may also be made of other tape materials, such as thermal degradation adhesives.
- the method of forming the glue layer 301 on the carrier 300 may be, for example, coating the glue layer 301 on the carrier 300 by spin coating or printing. Such methods are well known to those skilled in the art in the field of semiconductor fabrication and will not be described herein.
- the material of the first plastic sealing layer 205 is a resin, and the resin may be an epoxy resin, a polyimide resin, a benzocyclobutene resin or a polybenzoxazole resin; the resin may also be a polyparaphenylene Butane dicarboxylate, polycarbonate, polyethylene terephthalate, polyethylene, polypropylene, polyolefin, polyurethane, polyolefin, polyethersulfone, polyamide, polyurethane, ethylene vinyl acetate Copolymer or polyvinyl alcohol; the first plastic sealing layer 205 may also be other suitable molding materials.
- the resin may be an epoxy resin, a polyimide resin, a benzocyclobutene resin or a polybenzoxazole resin
- the resin may also be a polyparaphenylene Butane dicarboxylate, polycarbonate, polyethylene terephthalate, polyethylene, polypropylene, polyolefin, polyurethane, polyolefin,
- the forming process of the first plastic sealing layer 205 is an injection molding process, a transfer molding process, or a printing process.
- the first molding layer 205 can also adopt other processes.
- the semiconductor chip in each integrated unit of the pre-cover board A first metal bump 203 is formed on the pad 201 of 200, the first metal bump 203 being part of an integrated unit.
- a circuit integration layer is formed on the first plastic sealing layer, the circuit integration layer including an input end, an output end, and a multi-layer line connecting the input end and the output end, the input end Connected to a pad of the semiconductor chip; a first metal bump is formed on the output end.
- the integrated unit has a passive device 204.
- a circuit integration layer 207 is formed on the first plastic seal layer 205, and the circuit integration layer 207 solders the semiconductor chip 200.
- the disk 201 is connected to the pads of adjacent passive devices 204, and then a first metal bump 203 is formed on the line integration layer 207.
- the circuit integration layer 207 in this embodiment is a single-layer metal layer.
- the circuit integration layer may be in other forms.
- the first metal bump 203 may be a solder ball or a solder pillar.
- the first metal bump includes a metal post and a solder ball on the metal post.
- the material of the metal column is aluminum, nickel, tungsten, platinum, copper, titanium, chromium, bismuth, tin alloy, gold or silver
- the material of the solder ball is tin or tin alloy
- the tin alloy may be tin silver or tin.
- the first metal bump 203 is formed by forming an insulating layer 208 covering the first molding layer 205, the semiconductor chip 200, the pad 201, and the first rewiring metal layer 207. a first opening in the insulating layer 208 having a portion of the surface exposing the portion of the pad 201 and the first rewiring metal layer 207; forming a conductive metal layer on the insulating layer 208 and sidewalls and bottom of the first opening; Forming a photoresist mask on the conductive metal layer, the photoresist mask having a second opening exposing a conductive metal layer on the first opening; filling a solder layer in the second opening by an electroplating process; A photoresist mask is etched to remove the conductive metal layer on both sides of the solder layer, and a under bump metal layer 202 is formed on the bottom of the solder layer; the solder layer is reflowed to form the first metal bump 203.
- pads and metal on the insulating layer.
- the layer is connected to the rewiring metal layer, and then metal bumps are formed on the rewiring metal layer, and by forming the rewiring metal layer, the connection points from which the pads are taken out can be redistributed.
- the pre-covering plate After the first metal bumps 203 are formed on the pads 201, the entire pre-covering plate is formed, the pre-covering plate includes a first molding layer 205, and the first molding layer 205 has integrated units arranged in a matrix, each integrated There are at least one semiconductor chip 200 in the cell.
- the semiconductor chip 200 has a plurality of pads 201 on its surface.
- the first plastic sealing layer exposes the pads 201 on the semiconductor chip, and the pads 201 have first metal bumps 203 thereon.
- Passive devices 204 may also be integrated into the pre-covering board to implement a system-in-package of the semiconductor chip 200 and the passive device 204.
- the pre-cover board By pre-packaging a plurality of semiconductor chips 200 and passive devices 204 to form a pre-cover board, the pre-cover board can be flipped on the line carrier board, so that the integrated unit in the package panel and the carrying unit on the line carrier board Correspondingly, the pad 201 of the semiconductor chip 200 and the first metal bump 203 on the first rewiring metal layer 207 are soldered together with the input pad on the line carrier board, and the method for forming the package structure of the present invention realizes multiple The integrated package of the semiconductor chip 200 and the passive device and the line carrier board improves the efficiency of the package.
- a plurality of discrete first grooves extending through the thickness of the first plastic sealing layer may be formed in a portion of the first molding layer between adjacent integrated units of the pre-covering plate.
- the first slot further penetrates the insulating layer between the corresponding adjacent first metal bumps.
- the first slot can release the stress accumulated in the pre-covering plate, reducing the warping effect of the pre-covering plate; on the other hand, the flip-chip is flipped on the line On the carrier board, soldering the first metal bump on the semiconductor chip in the integrated unit to the input pad on the first surface of the carrier unit of the line carrier, and then forming a first surface filled with the line carrier and pre-filling
- the first slot in the pre-cover panel is in communication with the space between the first surface of the line carrier and the pre-cover panel, it is advantageous for exhausting the filling material when filled.
- the fluidity of the filling material is enhanced to prevent void defects from being generated in the filling layer; on the other hand, the first slot is located in the first plastic layer between adjacent integrated units without occupying extra space; Aspect, when the filling layer is subsequently formed, the filling layer can be filled first
- the slot, the filling layer and the first slot form a structure similar to a "pin", thereby locking the two parts of the pre-cover board and the line carrier board to prevent welding when the pre-cover board and the line carrier board are deformed in opposite directions.
- the first slot may be formed by a punching or drilling process or a stamping process.
- the first molding layer when the first molding layer is formed by the screen printing or injection molding process, a part of the structure of the printing screen or the injection molding template covers the place where the first slot is required to be formed, and the first plastic layer is formed.
- a plurality of discrete first through holes of the thickness of the first plastic sealing layer may be directly formed in a portion of the first plastic sealing layer between adjacent integrated units of the pre-covering plate, and subsequently passed through Etching or exposure removes the insulating layer covered on the first slot.
- a line carrier 100 is provided, the line carrier including a first surface 11 and a second surface 12 opposite the first surface 11, the line carrier 100 having a plurality of carrier units arranged in a matrix ( Not shown in the figure), the first surface 11 of the carrier unit has a number of input pads 101, the second surface 12 of the carrier unit has a number of output pads 102, and the input pads 101 and the output pads 102 pass through interconnections in the carrier unit
- the structures 103 are connected, and the area between adjacent carrier units of the line carrier 100 is a cutting area.
- the circuit carrier 100 has a plurality of matrix-arranged carrying units, and the carrying unit corresponds to an integrated unit arranged in a matrix on the pre-covering board.
- the pre-covering board is flipped on the line carrier board. So that each integrated unit of the pre-covering board is above each carrying unit of the line carrier board, and the metal bumps on each integrated unit are soldered together with the input pads on the corresponding carrying unit, thereby realizing
- the first metal bumps 203 on the semiconductor chip 200 in each integrated unit on the cover board are soldered to the alignment of the input pads 101 in the carrier unit of the line carrier 100.
- the line carrier 100 may be one of a printed wiring board, a BT (Bismaleimide Triazine) resin substrate, or a silicon substrate.
- the line carrier 100 may be a single layer or a multi-layer stack structure, and the corresponding interconnect structure 103 may also be a single layer or a multi-layer stack structure.
- the interconnect structure 103 is a multi-layer stacked structure, the interconnect structure 103 includes a plurality of metal layers and metal plugs interconnecting metal layers of adjacent layers.
- It also includes forming, in a partial region (cutting region) between adjacent carrier units of the line carrier 100, a plurality of discrete second slots (not shown) extending through the thickness of the line carrier.
- a partial region cutting region
- the presence of the second slot subsequent flipping the pre-covering plate on the line carrier, the first metal bump on the semiconductor chip in the integrated unit of the pre-cover board and the carrying unit of the line carrier
- the space between the plates is in communication, which facilitates the exhaust of the filling material, enhances the fluidity of the filling material, thereby preventing void defects in the filling layer
- the second slot and adjacent The position of the load-bearing area is fixed (or fixed with the position of the input pad on the load-bearing area), and the second slot can serve as an alignment mark when the pre-
- the second slot is In the circuit board between the bearing carrier region (dicing region) adjacent to, it does not take up additional area.
- the formation of the second slot may be formed by a punching or drilling process or a stamping process.
- the second slot can also be formed by an etching process.
- the pre-covering board is flipped on the first surface 11 of the line carrier board 100, so that the integrated unit in the package panel corresponds to the carrying unit on the line carrier board, and
- the first metal bumps 203 on the semiconductor chip 200 in the integrated unit of the cover board are soldered together with the input pads 101 on the first surface 11 of the carrier unit 100 of the line carrier 100 to form a plurality of matrix-arranged package units, packaged
- the unit includes an integrated unit and a carrying unit corresponding to the integrated unit.
- the pre-front cover plate is flip-chip mounted on the first surface 11 of the line carrier 100 such that the pad 201 of the semiconductor chip 200 and the first metal bump 203 on the first rewiring metal layer 207 After contact with the input pad 101 on the first surface 11 of the line carrier 100, the first metal bump 203 is soldered to the input pad 101 on the first surface 11 of the line carrier 100 by a reflow process. .
- a first surface 11 filled with the full line carrier 100 is formed and A fill layer 209 of space between the pre-cover sheets.
- the material of the filling layer 209 may be a resin having higher fluidity, smaller particles, and lower viscosity, such as an epoxy resin, a polyimide resin, a benzocyclobutene resin or a polybenzoxazole resin.
- the fill layer 209 can also be other suitable materials.
- the formation process of the filling layer 209 is an injection molding process or a transfer molding process or other suitable process. Due to the padding action of the first metal bump 203, the distance between the pre-front panel and the first surface 11 of the pin 103 is increased, thereby improving the fluidity of the molding material and preventing the formation of the formed filling layer 209. Defects such as voids.
- the first slot and the line carrier 100 are The space between the first surface and the pre-covering plate is in communication, which is more favorable for the flow of the filling material and prevents void defects from being formed in the filling layer.
- a second metal bump 210 is formed on the output pad 102 of the second surface 12 of the carrier unit of the line carrier 100.
- the second metal bump 210 is a solder ball.
- the forming process of the second metal bump 210 is a screen printing and reflow process.
- the forming process of the second metal bump 210 may also employ an electroplating and reflow process.
- the metal bumps comprise a metal post and solder balls on a top surface of the metal post.
- redistribution of pad output points on the semiconductor chip is achieved by the line carrier 100, reducing the density of pad output points on the semiconductor chip.
- the size of the second metal bump 210 is larger than the size of the first metal bump 203.
- the method further includes: forming a second plastic seal layer that encapsulates the pre-cover sheet, the wiring carrier, and the filling layer, the second plastic sealing layer exposing the second surface of the carrying unit A second metal bump on the output pad.
- the pre-cover sheet is flip-chip mounted on the first surface 11 of the line carrier 100
- the first metal bumps 203 on the semiconductor chip 200 are soldered to the input pads 101 on the first surface 11 of the line carrier 100, and then on the first surface 11 of the line carrier 100 and the pre-cover board.
- the space is filled with the filling layer 209, and then the second metal bump 210 is formed on the output pad 102 on the second surface 12 of the line carrier 100, thereby enabling the package of the plurality of semiconductor chips 200 together with the line carrier, which may be subsequently
- a plurality of independent package structures can be formed, compared to In the prior art package of a single semiconductor chip and a corresponding line carrier, the method of forming the package structure of the present invention improves the efficiency of the package.
- a portion of the first plastic encapsulation layer 205 and the insulating layer 208 between adjacent integrated units of the pre-covering plate are formed with a plurality of discrete first grooves extending through the thickness of the first plastic sealing layer.
- the hole 211, on the circuit board 100 is flipped over, the first metal bump 203 on the semiconductor chip 100 in the integrated unit and the input pad 101 on the first surface of the carrier unit of the line carrier 100 Soldering together and then forming a fill layer 209 filling the space between the first surface 11 of the line carrier 100 and the pre-cover panel, due to the first slot 211 in the pre-cover panel and the first surface of the line carrier 100
- the space between the 11 and the pre-covering plate is in communication, which facilitates the exhausting of the filling material and enhances the fluidity of the filling material, thereby preventing void defects in the filling layer.
- the filling layer 209 is also filled with the first slot 211 when the filling layer 209 is formed. In other embodiments of the invention, the fill layer may not fill or partially fill the first slot.
- a second metal bump 210 is formed on the output pad 102 of the line carrier 100.
- a partial region (cutting region) between adjacent carrier units of the line carrier forms a plurality of discrete second slots through the thickness of the line carrier, due to the second slot It is in communication with the space between the first surface of the line carrier and the pre-covering plate, which is more favorable for the flow of the filling material and prevents void defects from being formed in the formed filling layer.
- a second metal bump is formed on the output pad of the line carrier.
- a plurality of discrete package structures 13 are formed by cutting the first plastic encapsulation layer 205 between the adjacent integrated units, the fill layer 209, and the line carrier 100 between adjacent carrier units.
- the insulating layer 208 is simultaneously cut.
- Each of the discrete package structures 13 includes a semiconductor chip 200 having a plurality of pads 201 thereon.
- the first molding layer 205 seals the semiconductor chip 200, and the first molding layer 205 exposes the surface of the pads 201 of the semiconductor chip.
- the semiconductor chip 200 is flip-chip mounted on the line carrier 100.
- the line carrier 100 includes a first surface 11 and a second surface 12 opposite the first surface 11, and the first surface 11 of the line carrier 100 has an input solder.
- the disk 101 has an output pad 102 on the second surface 12, and the pad 201 on the semiconductor chip 200 is connected to the input pad 101 on the line carrier 100 through the first metal bump 203; the first of the line carrier 100 The space between the surface 11 and the pad 201 of the semiconductor chip 200 is filled with a filling layer; the output pad 102 of the line carrier 100 has a second metal bump 210 thereon.
- the discrete package structure 13 may further include a passive device 204.
- the passive device 204 is sealed in the first molding layer 205, and the pad of the passive device 204 and the pad 201 of the semiconductor chip 200 pass the first rewiring metal.
- Layers 207 are connected. There may also be an insulating layer 208 between the first plastic sealing layer 205 and the filling layer 209.
- the insulating layer 208 has an opening exposing the surface of the first rewiring metal layer 207, and the underlying and partially insulating layer has a protruding underlying metal layer 202 thereon.
- the under bump metal layer 202 is connected to the first metal bump 203.
- the invention further provides a package structure.
- the invention includes a line carrier 100 including a first surface 11 and a second surface 12 opposite to the first surface 11 .
- the line carrier 100 has a plurality of carrier units arranged in a matrix.
- the first surface 11 of the carrier unit has a plurality of input pads 101.
- the second surface 12 of the carrier unit has a plurality of output pads 102, input pads 101 and output soldering.
- the disk 102 is connected by an interconnection structure 103 in the carrying unit;
- the pre-covering plate includes a first plastic sealing layer 205, and the first plastic sealing layer 205 has a plurality of integrated units arranged in a matrix, each integrated unit Having at least one semiconductor chip 200, the semiconductor chip 200
- the pads 201 have the first metal bumps 203 thereon, and the pre-front panel is flipped on the line carrier 100.
- the integrated unit in the package panel corresponds to the carrying unit on the line carrier 100, and the first metal bump 203 on the pre-covering board is soldered to the input pad 101 on the carrying unit of the line carrier 100.
- the integrated unit and the corresponding carrying unit constitute a packaging unit, and the plurality of packaging units are arranged in a matrix; the filling layer 209 filling the space between the first surface 11 of the line carrier 100 and the pre-covering board; the bearing on the line carrier 100 A second metal bump 210 on the output pad 102 of the second surface 12 of the cell.
- a circuit integration layer is formed on the first plastic seal layer 205, and the circuit integration layer includes an input end, an output end, and a multi-layer line connecting the input end and the output end, the input end and the pad of the semiconductor chip.
- the first metal bump 203 is located on the output end.
- the integrated unit has a passive device 204.
- a circuit integration layer 207 is formed on the first plastic seal layer 205, and the circuit integration layer 207 solders the semiconductor chip 200.
- the disk 201 is connected to the pads of adjacent passive devices 204, and then a first metal bump 203 is formed on the line integration layer 207.
- the circuit integration layer 207 in this embodiment is a single-layer metal layer.
- the circuit integration layer may be in other forms.
- a second rewiring metal connecting the pads of adjacent semiconductor chips in the integrated unit is further provided on the first plastic sealing layer.
- the layer, the first metal bump is located on the second rewiring metal layer.
- the types of the semiconductor chips are the same or different.
- the first metal bump 203 is a solder ball or a solder pillar, or the first metal bump includes a metal pillar and a solder ball on the metal pillar.
- the line carrier 100 is one of a printed circuit board, a BT resin substrate or a silicon substrate. kind.
- the line carrier 100 is a single layer or a multilayer stack structure
- the interconnect structure 103 is a single layer or a multilayer stack structure.
- the second metal bump 210 is a solder ball, or the second metal bump 210 includes a metal pillar and a solder ball on the metal pillar.
- the size of the second metal bump 210 is larger than the size of the first metal bump 203.
- the method further includes an insulating layer 208 covering the first plastic encapsulation layer 205, the insulating layer 208 having an opening exposing the first rewiring metal layer 207, a sub-underlying metal layer 202 located in the opening and on the portion of the insulating layer 208,
- the under bump metal layer 202 connects the first metal bump 203 with the first rewiring metal layer 207.
- a plurality of discrete first slots 210 extending through the thickness of the first plastic seal layer are formed in the first plastic seal layer between adjacent semiconductor chips of the pre-cover sheet (refer to FIG. 10).
- the fill layer may also fill the first slot.
- a plurality of discrete second slots through the thickness of the line carrier are formed in a portion of the area between adjacent carrier units of the line carrier.
- the fill layer can also fill the second slot.
- the method further includes: molding a second plastic sealing layer of the pre-covering board, the wiring carrier board, and the filling layer, the second plastic sealing layer exposing a second on the output pad of the line carrier board Metal bumps.
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Abstract
一种封装结构的形成方法,包括:提供预封面板,预封面板包括第一塑封层(205),其内具有若干呈矩阵排布的集成单元,集成单元内具有至少一个半导体芯片(200),所述芯片(200)表面上具有若干焊盘(201),所述焊盘(201)上具有第一金属凸块(203);提供线路载板(100),线路载板(100)上具有若干呈矩阵排布的承载单元,承载单元的第一表面(11)具有若干输入焊盘(101),承载单元的第二表面(12)具有若干输出焊盘(102),输入焊盘(101)和输出焊盘(102)通过互连结构(103)相连;将所述预封面板倒装在线路载板(100)的第一表面(11)上,将第一金属凸块(203)与输入焊盘(101)焊接在一起,提高了封装的效率。
Description
本申请要求2013年12月5日提交中国专利局、申请号为201310653445.5、发明名称为“封装结构的形成方法”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。
本发明涉及半导体封装领域,特别涉及一种封装结构的形成方法。
随着电子产品如手机、笔记本电脑等朝着小型化,便携式,超薄化,多媒体化以及满足大众需求的低成本方向发展,传统的单一芯片的封装技术已无法满足日渐新颖化的市场需求,具备轻、薄、短、小的产品特性和高密度以及低成本的封装技术已成为市场研究的主流。在目前各式各样的封装技术中,其中以POP(package on package)和PIP(package in package)封装技术为典型的代表。
以POP封装技术为例,通过将半导体芯片堆叠在线路载板上,从而减小整个封装结构的体积和封装厚度。
现有的POP封装技术形成封装结构时封装效率较低。
发明内容
本发明解决的问题是怎样提高封装结构的封装效率。
为解决上述问题,本发明提供一种封装结构的形成方法,包括:提供预封面板,所述预封面板包括第一塑封层,第一塑封层内具有若干呈矩阵排布的集成单元,每个集成单元内具有至少一个半导体芯片,所述半导体芯片表面上具有若干焊盘,第一塑封层暴露出半导体芯片上的焊盘,所述焊盘上具有第一金属凸块;提供线路载板,所述线路载板包括第一表面和与第一表面相对的第二表面,所述线路载板上具有若干呈矩阵排布的承载单元,承载单元的第一表面具有若干输
入焊盘,承载单元的第二表面具有若干输出焊盘,输入焊盘和输出焊盘通过承载单元中的互连结构相连;将所述预封面板倒装在线路载板的第一表面上,使封装面板内的集成单元与线路载板上的承载单元对应,将预封面板上的第一金属凸块与承载单元第一表面上的输入焊盘焊接在一起,形成若干矩阵排布的封装单元;形成填充满承载单元的第一表面和预封面板之间空间的填充层;在承载单元的第二表面的输出焊盘上形成第二金属凸块;沿封装单元进行切割,形成若干分立的封装结构。
可选的,所述预封面板的形成过程为:提供载板,所述载板上具有胶合层,所述胶合层包括若干呈矩阵排布的粘合区;提供若干半导体芯片,所述半导体芯片的表面上具有焊盘;将至少一个半导体芯片的具有焊盘的一面贴于所述胶合层的每个粘合区上;形成第一塑封层将若干半导体芯片塑封在一起;去除所述载板和胶合层,暴露出半导体芯片上的焊盘;在所述焊盘上形成第一金属凸块,形成若干呈矩阵排布的集成单元。
可选的,在去除所述载板和胶合层后,在第一塑封层上形成线路整合层,所述线路整合层包括输入端、输出端和将输入端和输出端相连的多层线路,所述输入端与半导体芯片的焊盘相连接;在所述输出端上形成第一金属凸块。
可选的,所述预封面板的集成单元中还具有若干无源器件,所述无源器件的表面具有焊盘,将无源器件具有焊盘的一面贴于胶合层上。
可选的,所述线路整合层的输入端还与无源器件的焊盘相连接。
可选的,所述线路载板为印刷线路板、BT树脂基板或硅基板中的一种。
可选的,在所述预封面板的相邻集成单元之间的部分第一塑封层内形成若干分立的贯穿第一塑封层厚度的第一槽孔。
可选的,在线路载板的相邻的承载单元之间的部分区域形成若干分立的贯穿线路载板厚度的第二槽孔。
可选的,所述第一金属凸块为焊球或焊料柱,或者所述第一金属凸块包括金属柱和位于金属柱上的焊球。
可选的,还包括,形成塑封所述预封面板、线路载板和填充层的第二塑封层,所述第二塑封层暴露线路载板的输出焊盘上的第二金属凸块。
本发明还提供了一种封装结构,包括:线路载板,所述线路载板包括第一表面和与第一表面相对的第二表面,所述线路载板上具有若干呈矩阵排布的承载单元,承载单元的第一表面具有若干输入焊盘,承载单元的第二表面具有若干输出焊盘,输入焊盘和输出焊盘通过承载单元中的互连结构相连;预封面板,所述预封面板包括第一塑封层,第一塑封层内具有若干呈矩阵排布的集成单元,每个集成单元内具有至少一个半导体芯片,所述半导体芯片表面上具有若干焊盘,第一塑封层暴露出半导体芯片上的焊盘,所述焊盘上具有第一金属凸块;预封面板倒装在线路载板的第一表面上,使封装面板内的集成单元与线路载板上的承载单元对应,预封面板上的第一金属凸块与承载单元第一表面上的输入焊盘焊接在一起,构成若干矩阵排布的封装单元;填充承载单元的第一表面和预封面板之间空间的填充层;位于承载单元的第二表面的输出焊盘上的第二金属凸块。
可选的,所述第一金属凸块为焊球或焊料柱,或者所述第一金属凸块包括金属柱和位于金属柱上的焊球。
可选的,每个集成单元中还具有若干无源器件,所述无源器件的表面具有焊盘,无源器件位于半导体芯片一侧,第一塑封层暴露出无源器件上的焊盘。
可选的,还包括:位于第一塑封层上将每个集成单元中的半导体芯片的焊盘和相邻的无源器件的焊盘相连接的第一再布线金属层,所
述第一金属凸块位于第一再布线金属层上。
可选的,每个集成单元中的半导体芯片的数量大于一个时,在第一塑封层上还具有将集成单元中的相邻半导体芯片的焊盘连接的第二再布线金属层。
可选的,每个集成单元中的半导体芯片的数量大于一个时,所述半导体芯片的种类相同或不相同。
可选的,所述线路载板为印刷线路板、BT树脂基板或硅基板中的一种。
可选的,所述预封面板的相邻集成单元之间的部分第一塑封层内形成有若干分立的贯穿第一塑封层厚度的第一槽孔,所述填充层还填充所述第一槽孔。
可选的,在线路载板的相邻的承载单元之间的部分区域形成若干分立的贯穿线路载板厚度的第二槽孔,所述填充层还填充所述第一槽孔。
可选的,还包括,塑封所述预封面板、线路载板和填充层的第二塑封层,所述第二塑封层暴露线路载板的输出焊盘上的第二金属凸块。
与现有技术相比,本发明的技术方案具有以下优点:
本发明的封装结构的形成方法,在形成具有若干半导体芯片的预封面板后,将所述预封面板倒装在线路载板的第一表面上,将预封面板中的半导体芯片上的第一金属凸块与线路载板的第一表面上的输入焊盘焊接在一起,然后在线路载板的第一表面和预封面板之间空间填充填充层,然后在线路载板的第二表面上的输出焊盘上形成第二金属凸块,从而实现多个半导体芯片与线路载板的一起封装,可以通过切割去除相邻半导体芯片之间的第一塑封层、绝缘层、填充层和线路载板的相邻线路区域之间的***区域,可以形成若干独立的封装结构,相比于现有的单个半导体芯片与相应的线路载板的封装,本发明
的封装结构的形成方法提高了封装的效率。
进一步,通过将多个半导体芯片和无源器件封装在一起,通过金属层将半导体芯片的焊盘与无源器件的焊盘连接在一起,实现多个半导体芯片和无源器件与线路载板的一体封装,提高了封装的效率,并满足***级的封装需求。
进一步,在预封面板的相邻集成单元之间的部分第一塑封层内形成若干分立的贯穿第一塑封层厚度的第一槽孔,一方面,第一槽孔能释放预封面板中积聚的应力,减小预封面板的翘曲效应;另一方面,后续在将预封面板倒装在线路载板上,将集成单元中的半导体芯片上的第一金属凸块与线路载板的承载单元第一表面上的输入焊盘焊接在一起,然后形成填充满线路载板的第一表面和预封面板之间空间的填充层时,由于预封面板中的第一槽孔与线路载板的第一表面和预封面板之间的空间是相通的,有利于填充材料填充时的排气,增强了填充材料的流动性,从而防止在填充层中产生空隙缺陷;再一方面,所述第一槽孔位于相邻集成单元之间的第一塑封层内不会占据额外的空间;再一方面,后续形成填充层时,填充层可以填充满第一槽孔,填充层与第一槽孔构成类似“插销”的结构,从而将预封面板和线路载板两部分进行锁定,防止预封面板和线路载板向相反的方向发生形变时,造成焊接处不良的问题。
进一步,在线路载板的相邻的承载单元之间的部分区域(切割区域)形成若干分立的贯穿线路载板厚度的第二槽孔,一方面,第二槽孔的存在,在将预封面板倒装在线路载板上,将预封面板的集成单元中的半导体芯片上的第一金属凸块与线路载板的承载单元第一表面上的输入焊盘焊接在一起时,第二槽孔与线路载板的第一表面和预封面板之间的空间是相通的,当在线路载板的第一表面和预封面板之间的空间填充填充层时,有利于填充材料填充时的排气,增强了填充材料的流动性,从而防止在填充层中产生空隙缺陷;另一方面,所述第二槽孔与相邻的承载区域的位置是固定的(或者与承载区域上的输入
焊盘的位置是固定的,所述第二槽孔可以作为将预封面板倒装在线路载板上时的对准标记,通过检测该对准标记,可以很精确的将预封面板倒装在线路载板上,实现预封面板上的第一金属凸块与线路载板上的输入焊盘的准确焊接;再一方面,所述第二槽孔是位于相邻承载区域之间的线路载板内(切割区域),不会占据额外的面积。
图1~图11为本发明实施例封装结构的形成过程的结构示意图。
现有的POP封装技术是将单个半导体芯片堆叠在线路载板上,封装效率较低。
为此,本发明提供了一种封装结构的形成方法,形成预封面板,预封面板中封装有多个半导体芯片,通过金属凸块将预封面板上的半导体芯片和线路载板的输入焊盘连接在一起,实现多个半导体芯片与线路载板的一体封装,提高了封装效率。
为使本发明的上述目的、特征和优点能够更为明显易懂,下面结合附图对本发明的具体实施例做详细的说明。在详述本发明实施例时,为便于说明,示意图会不依一般比例作局部放大,而且所述示意图只是示例,其在此不应限制本发明的保护范围。此外,在实际制作中应包含长度、宽度及深度的三维空间尺寸。
图1~图11为本发明实施例封装结构的形成过程的结构示意图。
首先,请参考图1和图2,提供晶圆21,所述晶圆21上形成有若干半导体芯片200;切割所述晶圆21,形成若干分立的半导体芯片200。
所述半导体芯片200内具有集成电路(图中未示出),所述半导体芯片200的表面具有若干焊盘201,半导体芯片200表面的焊盘201与半导体芯片内的集成电路电连接,所述焊盘201作为半导体芯片
200内的集成电路与外部电连接的端口。后续将若干分立的半导体芯片200封装在一起,形成预封面板。
需要说明是,所述焊盘201可以为通过半导体芯片200上形成的再布线金属层引出的焊盘。
接着,请参考图3,通过第一塑封层205将若干半导体芯片200封装在一起,第一塑封层205暴露出半导体芯片200上的焊盘201。
本实施例中,还可以将无源器件204与半导体芯片200通过第一塑封层205封装在一起,所述无源器件204的表面具有焊盘。所述无源器件204可以为电感、电容或电阻的一种或几种。
将若干半导体芯片200和无源器件204封装的具体过程为:提供载板300,所述载板300上具有胶合层301,所述胶合层301包括若干呈矩阵排布的粘合区;将至少一个半导体芯片200的具有焊盘201的一面贴于所述胶合层301的每个粘合区上,将无源器件204的具有焊盘的一面贴于所述胶合层301的粘合区上,无源器件204位于半导体芯片200一侧;形成第一塑封层205,将若干半导体芯片200和无源器件204塑封在一起;在形成第一塑封层205后,去除(剥离)所述载板300和胶合层301,暴露出半导体芯片200上的焊盘201以及无源器件204上的焊盘。
通过第一塑封层205将若干半导体芯片200封装在一起,形成预封面板,每个预封面板具有若干矩阵排布的集成单元(图中未标示),每个集成单元的位置与粘合层301上的粘合区的位置对应,所述胶合层301上的每个粘合区上粘贴的半导体芯片为预封面板中的每个集成单元中的集成的半导体芯片。所述预封面板的相邻集成单元之间区域为分割区域。
胶合层301的每个粘合区上具有至少一个半导体芯片200,半导体芯片200的数量大于1个时,半导体芯片200的种类可以相同或不相同。相应的预封面板中的每个集成单元中具有至少一个半导体芯片
200,半导体芯片200的数量大于1个时,半导体芯片200的种类可以相同或不相同。
所述载板300可以为玻璃基板、硅基板或金属基板。
所述胶合层301可选用的材质有多种,在本发明一个优选的实施例中,胶合层301采用UV胶。UV胶是一种能对特殊波长的紫外光照射产生反应的胶合材料。UV胶根据紫外光照射后粘性的变化可分为两种,一种是UV固化胶,即材料中的光引发剂或光敏剂在紫外线的照射下吸收紫外光后产生活性自由基或阳离子,引发单体聚合、交联和接支化学反应,使紫外光固化胶在数秒钟内由液态转化为固态,从而将与其接触的物体表面粘合;另一种是UV胶是在未经过紫外线照射时粘性很高,而经过紫外光照射后材料内的交联化学键被打断导致粘性大幅下降或消失。这里的胶合层301所采用的UV胶即是后者。在本发明的其他实施例中,所述胶合层301还可以采用其他的胶带材料,比如热降解胶。
在载板300上形成胶合层301的方法可以例如是通过旋涂或印刷等方法将胶合层301涂覆在载板300上。这样的方法在半导体制造领域中已为本领域技术人员所熟知,在此不再赘述。
所述第一塑封层205的材料为树脂,所述树脂可以为环氧树脂、聚酰亚胺树脂、苯并环丁烯树脂或聚苯并恶唑树脂;所述树脂也可以为聚对苯二甲酸丁二酯、聚碳酸酯、聚对苯二甲酸乙二醇酯、聚乙烯、聚丙烯、聚烯烃、聚氨酯、聚烯烃、聚醚砜、聚酰胺、聚亚氨酯、乙烯-醋酸乙烯共聚物或聚乙烯醇;所述第一塑封层205还可以为其他合适的塑封材料。
所述第一塑封层205的形成工艺为注塑工艺(injection molding)、转塑工艺(transfer molding)或印刷工艺。所述第一塑封层205还可以采用其他的工艺。
接着,请参考图4,在预封面板的每个集成单元中的半导体芯片
200的焊盘201上形成第一金属凸块203,所述第一金属凸块203作为集成单元的一部分。
在去除所述载板和胶合层后,在第一塑封层上形成线路整合层,所述线路整合层包括输入端、输出端和将输入端和输出端相连的多层线路,所述输入端与半导体芯片的焊盘相连接;在所述输出端上形成第一金属凸块。
本实施例中,集成单元中具有无源器件204,在形成第一金属凸块203之前,在第一塑封层205上形成线路整合层207,所述线路整合层207将半导体芯片200的部分焊盘201与相邻的无源器件204的焊盘连接在一起,然后在线路整合层207上形成第一金属凸块203。本实施例中所述线路整合层207为单层金属层仅作为示例,在本发明的其他实施例中,可以线路整合层采用其他形式的线路形式。
所述第一金属凸块203可以为焊球或焊料柱。在本发明的其他实施例中,所述第一金属凸块包括金属柱和位于金属柱上的焊球。所述金属柱的材料为铝、镍、钨、铂、铜、钛、铬、钽、锡合金、金或银,所述焊球的材料为锡或锡合金,锡合金可以为锡银、锡铅、锡银铜、锡银锌、锡锌、锡铋铟、锡铟、锡金、锡铜、锡锌铟或者锡银锑中的一种或者多种。
本实施例中,所述第一金属凸块203的形成过程为:形成覆盖所述第一塑封层205、半导体芯片200、焊盘201和第一再布线金属层207的绝缘层208,所述绝缘层208中具有暴露部分焊盘201和第一再布线金属层207的部分表面的第一开口;在所述绝缘层208上以及第一开口的侧壁和底部形成导电金属层;在所述导电金属层上形成光刻胶掩膜,所述光刻胶掩膜中具有暴露第一开口上的导电金属层的第二开口;采用电镀工艺在所述第二开口中填充焊料层;去除所述光刻胶掩膜;刻蚀去除焊料层两侧的导电金属层,在焊料层的底部形成凸下金属层202;对焊料层进行回流,形成第一金属凸块203。
在本发明的其他实施例中,还可以在绝缘层上形成与焊盘和金属
层相连的再布线金属层,然后在再布线金属层上形成金属凸块,通过形成再布线金属层,可以使得焊盘引出的连接点再分布。
在焊盘201上形成第一金属凸块203后,整个预封面板形成,所述预封面板包括第一塑封层205,第一塑封层205内具有呈矩阵排布的集成单元,每个集成单元内具有至少一个半导体芯片200,半导体芯片200表面上具有若干焊盘201,第一塑封层暴露出半导体芯片上的焊盘201,所述焊盘201上具有第一金属凸块203。所述预封面板中还可以集成无源器件204,实现半导体芯片200与无源器件204的***级封装。
通过将多个半导体芯片200和无源器件204封装在一起,形成预封面板,后续可以将预封面板倒装在线路载板上,使封装面板内的集成单元与线路载板上的承载单元对应,将半导体芯片200的焊盘201和第一再布线金属层207上的第一金属凸块203与线路载板上的输入焊盘焊接在一起,本发明的封装结构的形成方法实现多个半导体芯片200和无源器件与线路载板的一体封装,提高了封装的效率。
在本发明的其他实施例中,在形成预封面板后,还可以在预封面板的相邻集成单元之间的部分第一塑封层内形成若干分立的贯穿第一塑封层厚度的第一槽孔,本实施例中,所述第一槽孔还贯穿对应的相邻第一金属凸块之间的绝缘层。第一槽孔的存在,一方面,所述第一槽孔能释放预封面板中积聚的应力,减小预封面板的翘曲效应;另一方面,后续在将预封面板倒装在线路载板上,将集成单元中的半导体芯片上的第一金属凸块与线路载板的承载单元第一表面上的输入焊盘焊接在一起,然后形成填充满线路载板的第一表面和预封面板之间空间的填充层时,由于预封面板中的第一槽孔与线路载板的第一表面和预封面板之间的空间是相通的,有利于填充材料填充时的排气,增强了填充材料的流动性,从而防止在填充层中产生空隙缺陷;再一方面,所述第一槽孔位于相邻集成单元之间的第一塑封层内不会占据额外的空间;再一方面,后续形成填充层时,填充层可以填充满第一
槽孔,填充层与第一槽孔构成类似“插销”的结构,从而将预封面板和线路载板两部分进行锁定,防止预封面板和线路载板向相反的方向发生形变时,造成焊接处不良的问题。所述第一槽孔可以通过冲孔或钻孔工艺或冲压工艺形成。在本发明的其他实施例中,当前述采用网板印刷或注塑工艺形成第一塑封层时,将印刷网板或注塑模板的部分结构覆盖需要形成第一槽孔的地方,第一塑封层形成后,在移除印刷网板或注塑模板,可以直接在预封面板的相邻集成单元之间的部分第一塑封层内形成若干分立的贯穿第一塑封层厚度的第一槽孔,后续通过刻蚀或者曝光去除第一槽孔上覆盖的绝缘层。
参考图5,提供线路载板100,所述线路载板包括第一表面11和与第一表面11相对的第二表面12,所述线路载板100上具有若干呈矩阵排布的承载单元(图中未标示),承载单元的第一表面11具有若干输入焊盘101,承载单元的第二表面12具有若干输出焊盘102,输入焊盘101和输出焊盘102通过承载单元中的互连结构103相连,线路载板100的相邻承载单元之间的区域为切割区域。
所述线路载板100上具有若干矩阵排布的承载单元,所述承载单元与预封面板上矩阵排布的集成单元相对应,后续进行封装时,将预封面板倒装在线路载板上,使得预封面板的每个集成单元为与线路载板的每个承载单元的上方,将每个集成单元上的金属凸块与对应的承载单元上的输入焊盘焊接在一起,从而实现预封面板上的每个集成单元中的半导体芯片200上的第一金属凸块203与线路载板100的承载单元中的输入焊盘101的对准焊接。
所述线路载板100可以为印刷线路板、BT(Bismaleimide Triazine)树脂基板或硅基板中的一种。
所述线路载板100可以为单层或多层堆叠结构,相应的所述互连结构103也可以为单层或多层堆叠结构。所述互连结构103为多层堆叠结构时,所述互连结构103包括多层金属层和将相邻层的金属层互连的金属插塞。
还包括:在线路载板100的相邻的承载单元之间的部分区域(切割区域)形成若干分立的贯穿线路载板厚度的第二槽孔(图中未示出)。一方面,第二槽孔的存在,后续在将预封面板倒装在线路载板上,将预封面板的集成单元中的半导体芯片上的第一金属凸块与线路载板的承载单元第一表面上的输入焊盘焊接在一起后,当在线路载板的第一表面和预封面板之间的空间填充填充层时,由于第二槽孔与线路载板的第一表面和预封面板之间的空间是相通的,有利于填充材料填充时的排气,增强了填充材料的流动性,从而防止在填充层中产生空隙缺陷;另一方面,所述第二槽孔与相邻的承载区域的位置是固定的(或者与承载区域上的输入焊盘的位置是固定的),所述第二槽孔可以作为将预封面板倒装在线路载板上时的对准标记,通过检测该对准标记,可以很精确的将预封面板倒装在线路载板上,实现预封面板上的第一金属凸块与线路载板上的输入焊盘的准确焊接;再一方面,所述第二槽孔是位于相邻承载区域之间的线路载板内(切割区域),不会占据额外的面积。所述第二槽孔的形成可以通过冲孔或钻孔工艺或冲压工艺形成。所述第二槽孔也可以通过刻蚀工艺形成。
接着,请参考图6和图7,将所述预封面板倒装在线路载板100的第一表面11上,使封装面板内的集成单元与线路载板上的承载单元对应,将与预封面板的集成单元中的半导体芯片200上的第一金属凸块203与线路载板100的承载单元第一表面11上的输入焊盘101焊接在一起,形成若干矩阵排布的封装单元,封装单元包括一个集成单元和与该集成单元对应的承载单元。
本发明实施例中,将所述预封面板倒装在线路载板100的第一表面11上,使得半导体芯片200的焊盘201和第一再布线金属层207上的第一金属凸块203与线路载板100的第一表面11上的输入焊盘101相接触后,通过回流工艺,将第一金属凸块203与线路载板100的第一表面11上的输入焊盘101焊接在一起。
接着,请参考图8,形成填充满线路载板100的第一表面11和
预封面板之间空间的填充层209。
所述填充层209的材料可以为流动性较高、颗粒较小、黏度较低的树脂,比如环氧树脂、聚酰亚胺树脂、苯并环丁烯树脂或聚苯并恶唑树脂。所述填充层209还可以为其他合适的材料。
所述填充层209的形成工艺为注塑工艺(injection molding)或转塑工艺(transfer molding)或其他合适的工艺。由于第一金属凸块203的垫高作用,使得预封面板与引脚103的第一表面11之间空间的距离增大,从而提高了塑封材料的流动性,防止形成的填充层209中产生空隙等缺陷。
在本发明的其他实施例中,所述预封面板中形成有贯穿相邻集成单元之间的第一塑封层和绝缘层厚度的第一槽孔时,由于第一槽孔与线路载板100的第一表面和预封面板之间空间是相通的,更有利于填充材料的流动,防止形成的填充层中产生空隙缺陷。
接着,请参考图9,在线路载板100的承载单元的第二表面12的输出焊盘102上形成第二金属凸块210。
所述第二金属凸块210为焊球。所述第二金属凸块210的形成工艺为网板印刷和回流工艺。所述第二金属凸块210的形成工艺也可以采用电镀和回流工艺。在本发明的其他实施例中,所述金属凸块包括金属柱和位于金属柱顶部表面的焊球。
本发明的实施例中,通过线路载板100实现了半导体芯片上的焊盘输出点的再分布,减小了半导体芯片上的焊盘输出点的密度。所述第二金属凸块210的尺寸大于第一金属凸块203的尺寸。
在本发明的其他实施例中,还包括:还包括,形成塑封所述预封面板、线路载板和填充层的第二塑封层,所述第二塑封层暴露出承载单元的第二表面的输出焊盘上的第二金属凸块。
本发明的封装结构的形成方法,在形成具有若干半导体芯片200的预封面板后,将所述预封面板倒装在线路载板100的第一表面11
上,将半导体芯片200上的第一金属凸块203与线路载板100的第一表面11上的输入焊盘101焊接在一起,然后在线路载板100的第一表面11和预封面板之间空间填充填充层209,然后在线路载板100的第二表面12上的输出焊盘102上形成第二金属凸块210,从而实现多个半导体芯片200与线路载板的一起封装,后续可以通过切割去除相邻半导体芯片200之间的第一塑封层205、绝缘层208、填充层209和线路载板的相邻线路区域之间的***区域,可以形成若干独立的封装结构,相比于现有的单个半导体芯片与相应的线路载板的封装,本发明的封装结构的形成方法提高了封装的效率。
在本发明的另一实施例中,请参考10,预封面板的相邻集成单元之间的部分第一塑封层205和绝缘层208内形成若干分立的贯穿第一塑封层厚度的第一槽孔211,在将预封面板倒装在线路载板100上,将集成单元中的半导体芯片100上的第一金属凸块203与线路载板100的承载单元第一表面上的输入焊盘101焊接在一起,然后形成填充满线路载板100的第一表面11和预封面板之间空间的填充层209时,由于预封面板中的第一槽孔211与线路载板100的第一表面11和预封面板之间的空间是相通的,有利于填充材料填充时的排气,增强了填充材料的流动性,从而防止在填充层中产生空隙缺陷。本实施例中,在形成填充层209时,所述填充层209还填充满所述第一槽孔211。在本发明的其他实施例中,填充层可以不填充或部分填充所述第一槽孔。在形成填充层后,在线路载板100的输出焊盘102上形成第二金属凸块210。
在本发明的另一实施例中,在线路载板的相邻的承载单元之间的部分区域(切割区域)形成若干分立的贯穿线路载板厚度的第二槽孔时,由于第二槽孔与线路载板的第一表面和预封面板之间空间是相通的,更有利于填充材料的流动,防止形成的填充层中产生空隙缺陷。在形成填充层后,在线路载板的输出焊盘上形成第二金属凸块。
最后,请结合参考图9和图11,沿封装单元进行切割,形成若
干分立的封装结构13。
通过切割相邻集成单元之间的第一塑封层205、填充层209以及相邻承载单元之间的线路载板100,形成若干分立的封装结构13。本发明实施例中,在切割相邻集成单元之间的第一塑封层205后,同时切割绝缘层208。
每个分立的封装结构13包括:半导体芯片200,所述半导体芯片200上具有若干焊盘201,第一塑封层205将半导体芯片200密封,第一塑封层205暴露出半导体芯片的焊盘201表面,半导体芯片200倒装在线路载板100上,所述线路载板100包括第一表面11和与第一表面11相对的第二表面12,线路载板100的第一表面11上具有输入焊盘101,第二表面12上具有输出焊盘102,半导体芯片200上的焊盘201通过第一金属凸块203与线路载板100上的输入焊盘101相连接;线路载板100的第一表面11与半导体芯片200的焊盘201之间空间填充有填充层;线路载板100的输出焊盘102上具有第二金属凸块210。所述分立的封装结构13中还可以包括无源器件204,无源器件204密封在第一塑封层205中,无源器件204的焊盘与半导体芯片200的焊盘201通过第一再布线金属层207相连接。第一塑封层205和填充层209之间还可以具有绝缘层208,绝缘层208中具有暴露第一再布线金属层207表面的开口,所述开口内和部分绝缘层上具有凸下金属层202,凸下金属层202与第一金属凸块203相连接。
本发明实施例还提供了一种封装结构,请参考图9,包括:线路载板100,所述线路载板100包括第一表面11和与第一表面11相对的第二表面12,所述线路载板100上具有若干呈矩阵排布的承载单元,承载单元的第一表面11具有若干输入焊盘101,承载单元的第二表面12具有若干输出焊盘102,输入焊盘101和输出焊盘102通过承载单元中的互连结构103相连;预封面板,所述预封面板包括第一塑封层205,第一塑封层205内具有若干呈矩阵排布的集成单元,每个集成单元内具有至少一个半导体芯片200,所述半导体芯片200
表面上具有若干焊盘201,第一塑封层205暴露出半导体芯片200上的焊盘201,所述焊盘201上具有第一金属凸块203,预封面板倒装在线路载板100的第一表面上,使封装面板内的集成单元与线路载板100上的承载单元对应,预封面板上的第一金属凸块203与线路载板100的承载单元上的输入焊盘101焊接在一起,集成单元与对应的承载单元构成封装单元,若干封装单元呈矩阵排布;填充满线路载板100的第一表面11和预封面板之间空间的填充层209;位于线路载板100的承载单元的第二表面12的输出焊盘102上的第二金属凸块210。
具体的,在第一塑封层205上形成有线路整合层,所述线路整合层包括输入端、输出端和将输入端和输出端相连的多层线路,所述输入端与半导体芯片的焊盘相连接,第一金属凸块203位于输出端上。
本实施例中,集成单元中具有无源器件204,在形成第一金属凸块203之前,在第一塑封层205上形成线路整合层207,所述线路整合层207将半导体芯片200的部分焊盘201与相邻的无源器件204的焊盘连接在一起,然后在线路整合层207上形成第一金属凸块203。本实施例中所述线路整合层207为单层金属层仅作为示例,在本发明的其他实施例中,可以线路整合层采用其他形式的线路形式。
在本发明的其他实施例中,每个集成单元中的半导体芯片的数量大于一个时,在第一塑封层上还具有将集成单元中的相邻半导体芯片的焊盘连接的第二再布线金属层,第一金属凸块位于第二再布线金属层上。
每个集成单元中的半导体芯片的数量大于一个时,所述半导体芯片的种类相同或不相同。
所述第一金属凸块203为焊球或焊料柱,或者所述第一金属凸块包括金属柱和位于金属柱上的焊球。
所述线路载板100为印刷线路板、BT树脂基板或硅基板中的一
种。
所述线路载板100为单层或多层堆叠结构,所述互连结构103为单层或多层堆叠结构。
所述第二金属凸块210为焊球,或者所述第二金属凸块210包括金属柱和位于金属柱上的焊球。
所述第二金属凸块210的尺寸大于第一金属凸块203的尺寸。
还包括,覆盖所述第一塑封层205的绝缘层208,所述绝缘层208中具有暴露第一再布线金属层207的开口,位于开口内和部分绝缘层208上的凸下金属层202,凸下金属层202将第一金属凸块203与第一再布线金属层207连接。
在本发明的其他实施例中,所述预封面板的相邻半导体芯片之间的第一塑封层内形成有若干分立的贯穿第一塑封层厚度的第一槽孔210(参考图10)。所述填充层还可以填充所述第一槽孔。
在本发明的其他实施例中,在线路载板的相邻的承载单元之间的部分区域形成若干分立的贯穿线路载板厚度的第二槽孔。填充层还可以填充第二槽孔。
在本发明的其他实施例中,还包括,塑封所述预封面板、线路载板和填充层的第二塑封层,所述第二塑封层暴露出线路载板的输出焊盘上的第二金属凸块。
虽然本发明披露如上,但本发明并非限定于此。任何本领域技术人员,在不脱离本发明的精神和范围内,均可作各种更动与修改,因此本发明的保护范围应当以权利要求所限定的范围为准。
Claims (10)
- 一种封装结构的形成方法,其特征在于,包括:提供预封面板,所述预封面板包括第一塑封层,第一塑封层内具有若干呈矩阵排布的集成单元,每个集成单元内具有至少一个半导体芯片,所述半导体芯片表面上具有若干焊盘,第一塑封层暴露出半导体芯片上的焊盘,所述焊盘上具有第一金属凸块;提供线路载板,所述线路载板包括第一表面和与第一表面相对的第二表面,所述线路载板上具有若干呈矩阵排布的承载单元,承载单元的第一表面具有若干输入焊盘,承载单元的第二表面具有若干输出焊盘,输入焊盘和输出焊盘通过承载单元中的互连结构相连;将所述预封面板倒装在线路载板的第一表面上,使封装面板内的集成单元与线路载板上的承载单元对应,将预封面板上的第一金属凸块与承载单元第一表面上的输入焊盘焊接在一起,形成若干矩阵排布的封装单元;形成填充满承载单元的第一表面和预封面板之间空间的填充层;在承载单元的第二表面的输出焊盘上形成第二金属凸块;沿封装单元进行切割,形成若干分立的封装结构。
- 如权利要求1所述的封装结构的形成方法,其特征在于,所述预封面板的形成过程为:提供载板,所述载板上具有胶合层,所述胶合层包括若干呈矩阵排布的粘合区;提供若干半导体芯片,所述半导体芯片的表面上具有焊盘;将至少一个半导体芯片的具有焊盘的一面贴于所述胶合层的每个粘合区上;形成第一塑封层将若干半导体芯片塑封在一起;去除所述载板和胶合层,暴露出半导体芯片上的焊盘;在所述焊盘上形成第一金属凸块,形成若干呈矩阵排布的集成单元。
- 如权利要求2所述的封装结构的形成方法,其特征在于,在去除所述载板和胶合层后,在第一塑封层上形成线路整合层,所述线路 整合层包括输入端、输出端和将输入端和输出端相连的多层线路,所述输入端与半导体芯片的焊盘相连接;在所述输出端上形成第一金属凸块。
- 如权利要求3所述的封装结构的形成方法,其特征在于,所述预封面板的集成单元中还具有若干无源器件,所述无源器件的表面具有焊盘,将无源器件具有焊盘的一面贴于胶合层上。
- 如权利要求4所述的封装结构的形成方法,其特征在于,所述线路整合层的输入端还与无源器件的焊盘相连接。
- 如权利要求1所述的封装结构的形成方法,其特征在于,所述线路载板为印刷线路板、BT树脂基板或硅基板中的一种。
- 如权利要求1所述的封装结构的形成方法,其特征在于,在所述预封面板的相邻集成单元之间的部分第一塑封层内形成若干分立的贯穿第一塑封层厚度的第一槽孔,所述填充层还填充所述第一槽孔。
- 如权利要求1所述的封装结构的形成方法,其特征在于,在线路载板的相邻的承载单元之间的部分区域形成若干分立的贯穿线路载板厚度的第二槽孔,所述填充层还填充所述第一槽孔。
- 如权利要求1所述的封装结构的形成方法,其特征在于,所述第一金属凸块为焊球或焊料柱或焊料柱,或者所述第一金属凸块包括金属柱和位于金属柱上的焊球。
- 如权利要求1所述的封装结构的形成方法,其特征在于,还包括,形成塑封所述预封面板、线路载板和填充层的第二塑封层,所述第二塑封层暴露线路载板的输出焊盘上的第二金属凸块。
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US20160035696A1 (en) | 2016-02-04 |
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