WO2013128673A1 - 表面被覆切削工具およびその製造方法 - Google Patents
表面被覆切削工具およびその製造方法 Download PDFInfo
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- WO2013128673A1 WO2013128673A1 PCT/JP2012/070501 JP2012070501W WO2013128673A1 WO 2013128673 A1 WO2013128673 A1 WO 2013128673A1 JP 2012070501 W JP2012070501 W JP 2012070501W WO 2013128673 A1 WO2013128673 A1 WO 2013128673A1
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- layer
- tib
- cutting
- cutting tool
- substrate
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/38—Borides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
Definitions
- the present invention relates to a surface-coated cutting tool including a base material and a film formed on the base material, and a method for manufacturing the surface-coated cutting tool.
- a surface-coated cutting tool including a substrate and a coating formed on the substrate includes a TiB 2 layer as the coating.
- Patent Document 1 Japanese Patent Application Laid-Open No. 51-148713 is composed of a cemented carbide substrate and a surface layer, and this surface layer is composed of two overlapping partial layers, of which the outer partial layer is oxidized.
- a wear-resistant molded part made of aluminum and / or zirconium oxide, the inner partial layer being made of one or more borides, in particular diboride of elements such as titanium, zirconium, hafnium (ie TiB 2 layers).
- the inner partial layer is formed under the conditions of 1000 ° C., high temperature of 50 torr, high vacuum, 1900 l / hour of hydrogen as a reaction source gas, 20 ml / hour of TiCl 4 and 4 g / hour of BCl 3.
- a 3 ⁇ m TiB 2 layer is formed by charging and depositing for 1 hour.
- As the outer partial layer a 5 ⁇ m aluminum oxide layer is formed.
- a strong ⁇ layer and / or a boron-containing brittle layer is formed by diffusion of boron in the bonding layer in the cemented carbide substrate and the TiB 2 layer under the conditions of high temperature and high vacuum at the time of film formation.
- the life of the wearable molded member was significantly reduced.
- the diffusion inhibition and TiB coated article has been proposed to improve the wear resistance by atomization of TiB 2 in the second layer (Kohyo 2011-505261 (Patent boron Reference 2)).
- a surface of a cemented carbide substrate is coated with a layer consisting of 0.1 to 3 ⁇ m of titanium nitride, titanium carbonitride and boron carbonitride, and then a 1 to 5 ⁇ m TiB 2 layer is formed. Yes.
- the TiB 2 layer is formed with a raw material gas composition comprising 10% by volume hydrogen, 0.4% by volume TiCl 4 , 0.7% by volume BCl 3 and 88.9% by volume argon gas.
- a TiB 2 layer having a thickness of 2.5 ⁇ m is formed by thermal CVD at a standard pressure and a temperature of 800 ° C. for 1 hour.
- a boron-containing brittle layer due to diffusion of boron is not formed in the cemented carbide substrate, the particle size of TiB 2 in the TiB 2 layer is controlled to 50 nm or less, and a certain tool life is obtained. Improvements were made.
- the cutting edge of the tool has a unique shape (saw blade type) and processing that tends to increase the temperature of the cutting edge.
- processing where stress concentration and vibration are likely to occur, further improvement in performance such as improvement in chipping resistance has been required due to welding and chipping of the cutting edge.
- the present invention has been made in view of the above-described situation, and the object of the present invention is to provide a surface-coated cutting that includes a TiB 2 layer as a coating and has highly improved wear resistance and chipping resistance. To provide a tool.
- the present inventor has made extensive studies in order to solve the above problems, and obtained the knowledge that it is important to control the crystal structure of the TiB 2 layer. By further studying based on this knowledge, The present invention has been completed.
- the surface-coated cutting tool of the present invention includes a substrate and a coating formed on the substrate, and the coating includes at least one TiB 2 layer, and the TiB 2 layer has an orientation index TC.
- TC (100) becomes maximum at (hkl), or the ratio I (100) / (100) plane X-ray diffraction intensity I (100) to (101) plane X-ray diffraction intensity I (101) I (101) is 1.2 or more.
- the TC (100) is preferably 3 or more.
- the present invention also relates to a method of manufacturing a surface-coated cutting tool including a substrate and a coating formed on the substrate, and the coating includes at least one TiB 2 layer. Including a step of forming a TiB 2 layer, wherein the step is characterized in that the TiB 2 layer is formed by chemical vapor deposition at a deposition rate of 1 ⁇ m / hr or less.
- the surface-coated cutting tool of the present invention exhibits an excellent effect of highly improving wear resistance and chipping resistance.
- the surface-coated cutting tool of the present invention has a configuration including a base material and a coating film formed on the base material. Such a coating preferably covers the entire surface of the substrate. However, even if a part of the substrate is not coated with this coating or the configuration of the coating is partially different, the scope of the present invention is not exceeded. It does not deviate.
- Such a surface-coated cutting tool of the present invention includes a drill, an end mill, a cutting edge replacement cutting tip for a drill, a cutting edge replacement cutting tip for an end mill, a cutting edge replacement cutting tip for milling, a cutting edge replacement cutting tip for turning, It can be suitably used as a cutting tool such as a metal saw, gear cutting tool, reamer, and tap.
- any substrate can be used as the substrate used in the surface-coated cutting tool of the present invention as long as it is conventionally known as this type of substrate.
- cemented carbide for example, WC-based cemented carbide, including WC, including Co, or including carbonitrides such as Ti, Ta, Nb), cermet (TiC, TiN, TiCN, etc.) Component
- high-speed steel ceramics (titanium carbide, silicon carbide, silicon nitride, aluminum nitride, aluminum oxide, etc.), cubic boron nitride sintered body, or diamond sintered body preferable.
- a WC-based cemented carbide or cermet particularly TiCN-based cermet. This is because these substrates are particularly excellent in the balance between hardness and strength at high temperatures, and have excellent characteristics as substrates for surface-coated cutting tools for the above applications.
- such a substrate includes those having a chip breaker and those having no chip breaker, and the cutting edge ridge line portion has a sharp shape. Included are any of edges (edges where the rake face and flank face intersect), honing (sharp edges are added), negative lands (chamfered), and combinations of honing and negative lands. .
- the coating of the present invention may contain other layers as long as it contains at least one TiB 2 layer.
- the other layer include an Al 2 O 3 layer, a TiN layer, a TiCN layer, a TiBNO layer, a TiCNO layer, a TiAlN layer, a TiAlCN layer, a TiAlON layer, and a TiAlONC layer.
- those having no particular atomic ratio in the chemical formulas such as “TiN” and “TiCN” do not indicate that the atomic ratio of each element is only “1”, and are conventionally known. All atomic ratios are included.
- Such a coating of the present invention has an effect of improving various properties such as wear resistance and chipping resistance by coating the base material.
- Such a coating of the present invention preferably has a thickness of 3 to 30 ⁇ m, more preferably 5 to 20 ⁇ m. If the thickness is less than 3 ⁇ m, the wear resistance may be insufficient. If it exceeds 30 ⁇ m, peeling or breaking of the coating is frequently caused when a large stress is applied between the coating and the substrate in intermittent processing. May occur.
- TiB 2 layer included in the coating of the present invention has a maximum TC (100) in the orientation index TC (hkl), or the X-ray diffraction intensities I (100) and (101) of the (100) plane.
- the ratio I (100) / I (101) with the X-ray diffraction intensity I (101) is 1.2 or more. Since the TiB 2 layer of the present invention has such a specific crystal structure, it exhibits an excellent effect that wear resistance and chipping resistance are highly improved.
- the crystal structure of the TiB 2 layer has the maximum TC (100) in the orientation index TC (hkl), or the (100) plane X-ray diffraction intensity I (100) and the (101) plane X-ray.
- the TiB 2 crystal is oriented in the (100) direction with respect to the substrate surface. This is presumably because the hardness and Young's modulus become superior and exhibit excellent wear resistance and chipping resistance against impacts and vibrations associated with severe cutting conditions.
- the TiB 2 layer refers to a layer composed of titanium diboride (TiB 2 ). Note that even if inevitable impurities are contained in the TiB 2 layer, it does not depart from the scope of the present invention.
- orientation index TC (hkl) is defined by the following formula (1).
- I (hkl) represents the X-ray diffraction intensity of the (hkl) plane
- I 0 (hkl) is JCPDS35-0741 (JCPDS is Joint Committee on Powder Difference Standards (powder X-ray diffraction standard)).
- JCPDS Joint Committee on Powder Difference Standards (powder X-ray diffraction standard)
- n in Formula (1) shows the number of reflection used for calculation, and is 8 in this invention.
- the reflections (hkl) used are (001), (100), (101), (110), ((102) + (111)), (201), (112), and ((103) + (210)), and the curly bracket portion on the right side of Equation (1) indicates the average value of these eight surfaces. Note that “((102) + (111))” treats the total intensity of these two reflections as one reflection because the reflections of the (102) plane and the (111) plane are very close to each other. Means. The same applies to “((103) + (210))”.
- TC (100) is maximum in the orientation index TC (hkl) means that when the orientation index TC (hkl) is obtained by the equation (1) for all the eight surfaces, TC (100) is maximum.
- TC (100) is maximum.
- the TiB 2 crystal is strongly oriented in the (100) plane, and thus the (100) plane becomes the oriented plane, so that the hardness and Young's modulus are Since it is superior to the impact and vibration accompanying severe cutting conditions, it contributes to improvement of wear resistance and chipping resistance.
- the TC (100) is preferably 3 or more, more preferably 4 or more. This is because when TC (100) is 3 or more, the characteristic that the chipping resistance is particularly improved is shown.
- the upper limit is not particularly limited. However, it takes time to deposit TiB 2 in the above direction, so that the cost merit is reduced.
- the upper limit is preferably 7 or less.
- (101) is defined because when the other layer such as TiN or TiCN is formed as the coating of the present invention, the diffraction peak of TiB 2 may overlap with the diffraction peak of the other layer. This is because the orientation index TC (hkl) may not be evaluated.
- the ratio I (100) / I (101) is 1.2 or more, more preferably 2 or more, and further preferably 3 or more.
- the ratio I (100) / I (101 ) since preferably as becomes the greater from the viewpoint described above, particularly the upper limit is not limited, it takes time to TiB 2 to be deposited in the direction Therefore, the upper limit is preferably 6 or less from the viewpoint that the cost merit is lowered.
- the above-described characteristics relating to the X-ray diffraction intensity can be measured under the following conditions using, for example, an X-ray measuring apparatus (trade name: “X part”, manufactured by PANalytical).
- Characteristic X-ray Cu-K ⁇ Tube voltage: 45kV Tube current: 40 mA
- Filter Multi-layer mirror
- Optical system Parallel beam method
- X-ray diffraction method ⁇ -2 ⁇ method
- the TiB 2 layer of the present invention preferably has a thickness of 1 to 10 ⁇ m, more preferably 1.5 to 8 ⁇ m. is there. If the thickness is less than 1 ⁇ m, sufficient wear resistance may not be exhibited in continuous machining, and if it exceeds 10 ⁇ m, chipping resistance may not be stable in intermittent cutting.
- the grain size of the TiB 2 crystal grains constituting the TiB 2 layer is not particularly limited, but is preferably about 0.01 to 1 ⁇ m.
- the coating film of the present invention can contain other layers in addition to the TiB 2 layer.
- Such other layers include, for example, a base layer made of TiN, TiC, TiBN, or the like formed immediately above the base material in order to further improve the adhesion between the base material and the coating, or such a base layer and TiB. to increase the adhesion between the two layers TiCN layer and formed between these both layers, Al 2 O 3 layer and formed TiB 2 layer on to enhance the oxidation resistance, such Al 2
- an intermediate layer formed between these layers such as TiCNO, TiBNO, etc.
- the outermost layer etc. which consist of TiN, TiCN, TiC etc. which are formed in the outermost surface can be mentioned, it is not limited only to these.
- the present invention also relates to a method for manufacturing a surface-coated cutting tool including a substrate and a coating formed on the substrate, and the coating includes at least one TiB 2 layer, and the manufacturing method includes the TiB 2.
- the TiB 2 layer is formed at a film formation rate of 1 ⁇ m or less per hour (that is, 1 ⁇ m / hr or less), thereby providing the characteristic TiB as described above. It has become possible to form a two- layer structure. By adopting such conditions, the detailed mechanism of why the structure of the TiB 2 layer becomes a characteristic structure as described above has not yet been elucidated, but perhaps when the crystal of the TiB 2 layer grows In addition, it is presumed that the (100) orientation is preferentially performed so as to minimize the influence of the lattice distortion of the base material as a base and other layers such as TiN or TiCN.
- TiCl 4 , BCl 3 , H 2, and Ar can be used as a source gas (also referred to as a reaction gas). It is preferable that the TiCl 4 and BCl 3 as the volume ratio TiCl 4 / BCl 3 of 2.0 or more, and more preferably to 3.0 or more. This is because if the volume ratio is less than 2.0, the orientation index TC (100) may decrease. Further, H 2 in the raw material gas is preferably about 50 to 80% by volume, and Ar is preferably about 15 to 50% by volume. That is, H 2 and Ar occupy most of the source gas in terms of volume ratio.
- the reaction temperature is 800 to 950 ° C., more preferably 850 to 900 ° C. If it is less than 800 ° C., it becomes difficult to form a TiB 2 layer having the characteristics of the present invention, and if it exceeds 950 ° C., if TiB 2 is coarsened or the substrate is a cemented carbide, the ⁇ layer or boron-containing brittleness There is a risk of creating a layer. In this respect, according to the production method of the present invention, an excellent effect is shown in which the formation of a strong ⁇ layer or a boron-containing brittle layer can be prevented.
- the film formation speed can be adjusted by controlling the amount of raw material gas input.
- the chemical vapor deposition apparatus used in this manufacturing method there are a plurality of installation stages for setting the base material for forming the coating film in the upper and lower stages, and a plurality of input ports for introducing the source gas are formed in each stage.
- the input amount of the source gas can be controlled by controlling the number of the input ports.
- the film formation speed as described above can be achieved by reducing the number of input ports and reducing the input amount of the source gas (in each stage, the number of input ports is For the stages that do not decrease, the input amount of the raw material gas may increase conversely, but the base material is set on such a stage mounting base so that a film is also formed on the base material. Therefore, it is preferable to prevent the diffusion of the raw material gas to other stages, in which case the substrate on which such a film is formed is not an object of the present invention).
- the film formation rate exceeds 1 ⁇ m / hr, a TiB 2 layer having the desired characteristics is not formed, and chipping resistance is lowered.
- the film formation rate is low, but if it is less than 0.1 ⁇ m / hr, a film may not be sufficiently formed depending on the shape of the substrate, and the production efficiency is lowered, which is not economically preferable.
- the TiB 2 layer of the present invention can adopt other conditions such as pressure without particularly limiting conventionally known conditions.
- these layers can be formed by a conventionally known chemical vapor deposition method or physical vapor deposition method, and the formation method is not particularly limited, From the viewpoint that the TiB 2 layer can be continuously formed in one chemical vapor deposition apparatus, these layers are preferably formed by chemical vapor deposition.
- Both of the above two shapes are based on ISO, CNMG120408NUJ is the shape of a cutting edge replacement type cutting tip for turning, and SEET13T3AGSN-G is the shape of a cutting edge replacement type cutting tip for turning (milling). .
- a coating film was formed on the surface of the substrate obtained above.
- the base material was set in a chemical vapor deposition apparatus to form a film on the base material by chemical vapor deposition.
- the film formation conditions are as described in Table 2 and Table 3 below.
- Table 2 shows the conditions for forming each layer other than the TiB 2 layer
- Table 3 shows the conditions for forming the TiB 2 layer. Note that TiBNO and TiCNO in Table 2 are intermediate layers in Table 4 described later, and that other layers correspond to the respective layers except the TiB 2 layer in Table 4.
- the TiB 2 layer is formed in 13 different conditions: a to i and w to z, of which a to i are the conditions according to the method of the present invention, and w to z are comparative examples. (Conventional technology).
- the formation condition a is a raw material gas (reaction of 1.0 vol% TiCl 4 , 0.4 vol% BCl 3 , 64.5 vol% H 2 , and 34.1 vol% Ar). Gas) is supplied to the chemical vapor deposition apparatus by adjusting the input amount by the method as described above, and TiB is formed at a film forming rate of 0.50 ⁇ m / hr under conditions of a pressure of 80.0 kPa and a temperature of 850 ° C. It shows that two layers were formed by chemical vapor deposition.
- each layer other than the TiB 2 layer described in Table 2 was formed in the same manner except that the deposition rate was not particularly precisely controlled.
- “Remaining” in Table 2 indicates that H 2 occupies the remainder of the source gas (reactive gas).
- the “total gas amount” indicates the total volume flow rate introduced into the CVD furnace per unit time with the gas in the standard state (0 ° C., 1 atm) as an ideal gas.
- composition of each film was confirmed by SEM-EDX (scanning electron microscope-energy dispersive X-ray spectroscopy).
- Table 3 shows the characteristics of the TiB 2 layer obtained under each forming condition.
- I (100) / I (101) is the ratio I (100) between the X-ray diffraction intensity I (100) of the (100) plane and the X-ray diffraction intensity I (101) of the (101) plane.
- TC (100) indicates the value of TC (100) in the orientation index TC (hkl)
- TC (hkl) indicates the orientation index TC (hkl). It shows which crystal plane is the maximum.
- the surface-coated cutting tool of Example 4 employs the base material F shown in Table 1 as a base material, and forms a TiN layer having a thickness of 0.5 ⁇ m as a base layer on the surface of the base material F under the conditions shown in Table 2.
- a TiCN layer having a thickness of 5.0 ⁇ m is formed on the underlayer under the conditions shown in Table 2
- a TiB 2 layer having a thickness of 2.7 ⁇ m is formed on the TiCN layer under the forming conditions g shown in Table 3
- the TiB By forming a TiBNO layer having a thickness of 0.5 ⁇ m, an Al 2 O 3 layer having a thickness of 2.5 ⁇ m, and a TiN layer having a thickness of 1.0 ⁇ m as the outermost layer on the two layers in this order under the conditions shown in Table 2.
- the TiB 2 layer of the surface-coated cutting tool of Example 4 has the maximum TC (100) in the orientation index TC (hkl), and its value is 4.2, and the ratio I (100) / I (101 ) Is 3.2.
- normal wear means a damage form (having a smooth wear surface) that does not cause chipping, chipping, or the like and has only a wear surface.
- chipping means that a small chipping has occurred in the cutting edge portion, which is generated in the cutting edge portion that generates the finished surface.
- normal wear means a damage form (having a smooth wear surface) that does not cause chipping, chipping, or the like and has only a wear surface.
- the number of passes refers to a surface-coated cutting tool (blade exchange type) from one end to the other end of one side surface (300 mm ⁇ 80 mm surface) of the following work material (shape: plate shape of 300 mm ⁇ 100 mm ⁇ 80 mm)
- the operation of rolling with a cutter with one cutting tip) was repeated, and the number of repetitions was defined as the number of passes (Note that the number of passes with a numerical value less than the decimal point is on the way from one end to the other end) Indicating that the above conditions have been reached).
- the cutting distance means the total distance of the work material that has been cut by the above conditions, and corresponds to the product of the number of passes and the length of the side surface (300 mm).
- normal wear means a damage form (having a smooth wear surface) that does not cause chipping or chipping and has only wear
- defects It means a large chip generated at the blade.
- the number of passes is the same as in the cutting test 3 in that the following work material (shape: 300 mm ⁇ 100 mm ⁇ 80 mm plate shape) from one end to the other end of one side surface (300 mm ⁇ 80 mm surface) is covered with the surface.
- the operation of rolling with a cutter with one cutting tool (blade-replaceable cutting tip) was repeated, and the number of repetitions was defined as the number of passes. Shows that the above condition has been reached halfway to the other end).
- the cutting distance also means the total distance of the work material that has been cut by the cutting test 3 until reaching the above conditions, and corresponds to the product of the number of passes and the length of the side surface (300 mm). .
- normal wear means a damage form (having a smooth wear surface) that does not cause chipping or chipping and has only wear, and “defect” is cut. It means a large chip generated at the blade.
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Abstract
Description
また、本発明は、基材と該基材上に形成された被膜とを含み、該被膜は少なくとも一層のTiB2層を含む表面被覆切削工具の製造方法にも係わり、該製造方法は、該TiB2層を形成するステップを含み、該ステップは、1μm/hr以下の成膜速度で該TiB2層を化学気相蒸着法により形成することを特徴とする。
<表面被覆切削工具>
本発明の表面被覆切削工具は、基材と該基材上に形成された被膜とを含む構成を有する。このような被膜は、基材の全面を被覆することが好ましいが、基材の一部がこの被膜で被覆されていなかったり、被膜の構成が部分的に異なっていたとしても本発明の範囲を逸脱するものではない。
本発明の表面被覆切削工具に用いられる基材は、この種の基材として従来公知のものであればいずれのものも使用することができる。たとえば、超硬合金(たとえばWC基超硬合金、WCの他、Coを含み、あるいはTi、Ta、Nb等の炭窒化物を添加したものも含む)、サーメット(TiC、TiN、TiCN等を主成分とするもの)、高速度鋼、セラミックス(炭化チタン、炭化珪素、窒化珪素、窒化アルミニウム、酸化アルミニウムなど)、立方晶型窒化硼素焼結体、またはダイヤモンド焼結体のいずれかであることが好ましい。
本発明の被膜は、少なくとも一層のTiB2層を含む限り、他の層を含んでいてもよい。他の層としては、たとえばAl2O3層、TiN層、TiCN層、TiBNO層、TiCNO層、TiAlN層、TiAlCN層、TiAlON層、TiAlONC層等を挙げることができる。なお、本発明において、「TiN」や「TiCN」等の化学式において特に原子比を特定していないものは、各元素の原子比が「1」のみであることを示すものではなく、従来公知の原子比が全て含まれるものとする。
本発明の被膜に含まれるTiB2層は、配向性指数TC(hkl)においてTC(100)が最大となるか、または(100)面のX線回折強度I(100)と(101)面のX線回折強度I(101)との比I(100)/I(101)が1.2以上であることを特徴とする。本発明のTiB2層は、このような特有の結晶組織を有することにより、耐摩耗性と耐チッピング性とが高度に向上するという優れた効果を示す。これは、TiB2層の結晶組織が配向性指数TC(hkl)においてTC(100)が最大となるか、または(100)面のX線回折強度I(100)と(101)面のX線回折強度I(101)との比I(100)/I(101)が1.2以上であるという特有の特性を示すことにより、基材表面に対しTiB2結晶が(100)方向に配向し、硬度およびヤング率が優位になり、過酷な切削条件に伴う衝撃および振動に対し優れた耐摩耗性および耐チッピング性を発揮するためであると考えられる。
特性X線:Cu-Kα
管電圧:45kV
管電流:40mA
フィルター:多層ミラー
光学系:平行ビーム法
X線回折法:θ-2θ法
このような本発明のTiB2層は、1~10μm、より好ましくは1.5~8μmの厚みを有することが好適である。その厚みが1μm未満では、連続加工において十分に耐摩耗性を発揮できない場合があり、10μmを超えると、断続切削において耐チッピング性が安定しない場合がある。
本発明の被膜は、上記のTiB2層以外に他の層を含むことができる。このような他の層としては、たとえば基材と被膜との密着性をさらに高めるために基材の直上に形成されるTiN、TiC、TiBN等からなる下地層や、このような下地層とTiB2層との密着性を高めるためにこれら両層の間に形成されるTiCN層や、耐酸化性を高めるためにTiB2層上に形成されるAl2O3層や、このようなAl2O3層とTiB2層との密着性を高めるためにこれら両層の間に形成されるTiCNO、TiBNO等からなる中間層や、刃先が使用済か否かの識別性を示すために被膜の最表面に形成されるTiN、TiCN、TiC等からなる最外層等を挙げることができるが、これらのみに限定されるものではない。
<製造方法>
本発明は、基材と該基材上に形成された被膜とを含み、該被膜は少なくとも一層のTiB2層を含む表面被覆切削工具の製造方法にも係わり、該製造方法は、該TiB2層を形成するステップを含み、該ステップは、1μm/hr以下の成膜速度で該TiB2層を化学気相蒸着法により形成することを特徴とする。すなわち、上記で説明した本発明のTiB2層は、このような製造方法により形成することができる。
以下の表1に記載の基材A~基材Hの8種類の基材を準備した。具体的には、表1に記載の配合組成からなる原料粉末を均一に混合し、所定の形状に加圧成形した後、1300~1500℃で1~2時間焼結することにより、形状がCNMG120408NUJとSEET13T3AGSN-Gとの2種類の形状の超硬合金製の基材を得た。すなわち、各基材毎に2種の異なった形状のものを作製した。
上記で得られた基材に対してその表面に被膜を形成した。具体的には、基材を化学気相蒸着装置内にセットすることにより、基材上に化学気相蒸着法により被膜を形成した。被膜の形成条件は、以下の表2および表3に記載した通りである。表2はTiB2層以外の各層の形成条件を示し、表3はTiB2層の形成条件を示している。なお、表2中のTiBNOとTiCNOは後述の表4の中間層であり、それ以外のものも表4中のTiB2層を除く各層に相当することを示す。
各形成条件で得られるTiB2層の特性を表3に示した。
上記の表2および表3の条件により基材上に被膜を形成することにより、以下の表4に示した実施例1~22および比較例1~8の表面被覆切削工具(各被膜毎に2種の刃先交換型切削チップ)を作製した。
上記で得られた表面被覆切削工具を用いて、以下の4種類の切削試験を行なった。
以下の表5に記載した実施例および比較例の表面被覆切削工具(形状がCNMG120408NUJであるものを使用)について、以下の切削条件により逃げ面摩耗量(Vb)が0.25mmとなるまでの切削時間を測定するとともに刃先の最終損傷形態を観察した。その結果を表5に示す。切削時間が長いもの程、耐摩耗性に優れていることを示す。また、最終損傷形態が正常摩耗に近いもの程、耐チッピング性に優れていることを示す。
被削材:Ti6Al4V丸棒外周切削
周速:75m/min
送り速度:0.3mm/rev
切込み量:2.0mm
切削液:あり
以下の表6に記載した実施例および比較例の表面被覆切削工具(形状がCNMG120408NUJであるものを使用)について、以下の切削条件により逃げ面摩耗量(Vb)が0.25mmとなるまでの切削時間を測定するとともに刃先の最終損傷形態を観察した。その結果を表6に示す。切削時間が長いもの程、耐摩耗性に優れていることを示す。また、最終損傷形態が正常摩耗に近いもの程、耐チッピング性に優れていることを示す。
被削材:インコネル718丸棒外周切削
周速:50m/min
送り速度:0.3mm/rev
切込み量:3.0mm
切削液:あり
以下の表7に記載した実施例および比較例の表面被覆切削工具(形状がSEET13T3AGSN-Gであるものを使用)について、以下の切削条件により欠損または逃げ面摩耗量(Vb)が0.25mmになるまでのパス回数および切削距離を測定するとともに刃先の最終損傷形態を観察した。その結果を表7に示す。
被削材:Ti6Al4Vブロック材
周速:50m/min
送り速度:0.15mm/s
切込み量:2.0mm
切削液:あり
カッタ:WGC4160R(住友電工ハードメタル社製)
チップ取付け数:1枚
以下の表8に記載した実施例および比較例の表面被覆切削工具(形状がSEET13T3AGSN-Gであるものを使用)について、以下の切削条件により欠損または逃げ面摩耗量(Vb)が0.25mmになるまでのパス回数および切削距離を測定するとともに刃先の最終損傷形態を観察した。その結果を表8に示す。
被削材:SUS304ブロック材
周速:150m/min
送り速度:0.15mm/s
切込み量:2mm
切削液:あり
カッタ:WGC4160R(住友電工ハードメタル社製)
チップ取付け数:1枚
Claims (3)
- 基材と該基材上に形成された被膜とを含み、
前記被膜は、少なくとも一層のTiB2層を含み、
前記TiB2層は、配向性指数TC(hkl)においてTC(100)が最大となるか、または(100)面のX線回折強度I(100)と(101)面のX線回折強度I(101)との比I(100)/I(101)が1.2以上である、表面被覆切削工具。 - 前記TC(100)は、3以上である、請求項1記載の表面被覆切削工具。
- 基材と該基材上に形成された被膜とを含み、該被膜は少なくとも一層のTiB2層を含む表面被覆切削工具の製造方法であって、
前記TiB2層を形成するステップを含み、
前記ステップは、1μm/hr以下の成膜速度で前記TiB2層を化学気相蒸着法により形成する、表面被覆切削工具の製造方法。
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WO2021193445A1 (ja) * | 2020-03-25 | 2021-09-30 | 三菱マテリアル株式会社 | 表面被覆切削工具 |
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CN114592166B (zh) * | 2022-03-16 | 2023-09-15 | 株洲钻石切削刀具股份有限公司 | 含梯度复合结构的硬质涂层刀具及其制备方法 |
CN117921043B (zh) * | 2024-03-22 | 2024-06-11 | 赣州澳克泰工具技术有限公司 | 一种cvd涂层刀具及其制备方法 |
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