WO2012117509A1 - Thin plate-shaped workpiece adhesion and retention method, thin plate-shaped workpiece adhesion and retention device, and manufacturing system - Google Patents
Thin plate-shaped workpiece adhesion and retention method, thin plate-shaped workpiece adhesion and retention device, and manufacturing system Download PDFInfo
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- WO2012117509A1 WO2012117509A1 PCT/JP2011/054552 JP2011054552W WO2012117509A1 WO 2012117509 A1 WO2012117509 A1 WO 2012117509A1 JP 2011054552 W JP2011054552 W JP 2011054552W WO 2012117509 A1 WO2012117509 A1 WO 2012117509A1
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- WIPO (PCT)
- Prior art keywords
- thin plate
- work
- adhesive
- adhesive surface
- adhesion
- Prior art date
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- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 14
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/066—Transporting devices for sheet glass being suspended; Suspending devices, e.g. clamps, supporting tongs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a thin plate used for detachably holding a thin plate-like work such as a glass substrate in the process of manufacturing a flat panel display (FPD) such as an organic EL display (OLED) or a liquid crystal display (LCD).
- a flat panel display such as an organic EL display (OLED) or a liquid crystal display (LCD).
- FPD flat panel display
- OLED organic EL display
- LCD liquid crystal display
- an organic EL display (OLED) or the like provided with a method for adhesively holding a workpiece, an adhesive holder for a thin plate work used to carry out the method, and an adhesive holder for the thin plate Manufacturing system used in
- an organic film for forming an organic EL element is formed on the film formation region of the film formation substrate by superposing the film formation mask having an opening corresponding to the film formation region and the film formation substrate.
- a manufacturing apparatus of an EL device a chamber, a deposition source provided at a bottom of the chamber to evaporate a film forming material, and a substrate holding unit which holds the film formation substrate in a substantially horizontal state so as to face the deposition source.
- the substrate holding unit includes a support having a holding unit in a clamp shape on the outer edge side, and the magnets, the film-forming substrate, and the magnetic flux of the magnet sequentially stacked by the holding unit.
- the film formation substrate is magnetically interposed between the magnet and the film forming mask. Hold by suction force Some (for example, see Patent Document 1).
- a magnet unit provided with a substrate supporting surface and a magnet on which a surface on the opposite side to a film forming surface of a substrate to be processed is overlapped; And a deposition mask made of a magnetic material adsorbed by the magnet unit so as to sandwich the substrate to be processed between the substrate supporting surface and the substrate by the magnetic attraction force of the magnet.
- each layer is formed on a large substrate (substrate to be processed) where a large number of element substrates can be taken (substrate to be processed) using a semiconductor process such as mask evaporation. It is cut into element substrates of the size.
- a substrate used for an organic EL display or the like becomes larger, and one having a side exceeding 2000 mm has begun to be manufactured.
- Such a large substrate is formed into a thin plate from a fragile material such as glass, and when supported using a grid-like support member, the central portion (non-supporting portion) of the large substrate surrounded by the support member is The substrate may be further deformed and broken if it is bent due to its own weight and sags, and if an external load is applied to the deformed unsupported portion. That is, it has been difficult to hold the large substrate flat without entirely supporting the large substrate from the lower side.
- Patent Document 1 and Patent Document 2 described above it is conceivable to horizontally hold the large substrate without bending it partially.
- the film formation mask is also increased with the increase in substrate size. Since one side is increased to 2000 mm or more, even if the magnet, the large substrate, and the peripheral portion of the film formation mask are held by the holding portion of the clamp form, the central portion (unsupported portion) of these laminates is bent by its own weight, Once hanging down to a position lower than the magnetic attraction area of the magnet, the unsupported portion can not be magnetically attracted by the magnet and returned to a planar shape.
- the present invention has an object to address such a problem, and is an adhesive of a thin plate-like work which can be adhesively held without damaging the thin plate-like work to correct the self-weight deflection of the thin plate-like work.
- To provide a holding method to provide an adhesive holding device for a thin plate-like work capable of holding the thin plate-like work in an adhesive manner without damaging the thin-plate-like work and correcting the self weight deflection of the thin plate-like work It is an object of the present invention to provide a manufacturing system which can be held in a flat state between a magnet surface and a processing mask by holding the adhesive without adhesion.
- the adhesive holding method for a thin plate-like work comprises adhesion means for a non-supporting portion not supported by the support member in the thin plate-like work partially supported by the support member.
- the adhesive surface is moved close to a direction crossing the thin plate-like work until a part of the adhesive surface contacts, and the contact area between the adhesive surface and the non-supporting area gradually increases with respect to the non-supporting area.
- Move the adhesive means in the direction opposite to the approaching movement to a position where the adhesive surface is flush with the support portion supported by the support member in the thin plate-like work It is characterized by
- the adhesive holding device for a thin plate-like work is provided so as to abut on a part of the thin plate-like work to support the thin plate-like work, and the support member does not abut on the thin plate-like work
- An adhesive means having an adhesive surface opposed to the non-supporting part, which is provided reciprocably in the direction intersecting the thin plate-like work, and a reciprocation control means for controlling operation of the reciprocation of the adhesive surface with respect to the non-supporting part.
- adhesion area increasing means for controlling operation of the adhesion means so that the adhesive face moves relative to the non-supporting part, and the reciprocation control means approaches the adhesive face toward the non-supporting part It is moved, and when a part of the adhesive surface comes in contact with the non-supporting part, the approaching movement of the adhesive surface is stopped, and the adhesive area increasing means stops the non-supporting part after stopping the approaching movement of the adhesive part.
- the adhesive surface is moved so that the contact area between the adhesive surface and the non-supporting part gradually increases and the entire surface comes into contact, and the reciprocation control means comprises the entire adhesive surface and the non-supporting area. After the contact, the adhesive surface is moved in the direction opposite to the approaching movement to a position flush with the supporting portion supported by the supporting member in the thin plate-like work.
- the adhesive holding device for the thin plate-like work has a processing mask made of a magnetic material provided so as to be capable of reciprocating in the direction intersecting the thin plate-like work, and a mask movement control means for controlling operation of the reciprocating movement of the processing mask relative to the working surface of the thin plate-like work.
- the mask movement control means moves the processing mask to a magnetic attraction force area of the magnet surface after the contact between the substantially entire adhesive surface and the unsupported portion in conjunction with the reciprocation control means. It is characterized by
- the adhesive holding method of a thin plate-like work having the above-mentioned features is an adhesive means for a thin plate-like work partially supported by a grid-like support member against an unsupported portion which is deformed downward by its own weight. Is moved in the direction intersecting the thin plate-like work to bring the non-supporting part into contact with a part of the adhesive surface of the adhesive means, and then the adhesive surface is made to the non-supporting area As the contact area gradually increases and moves so as to contact almost the entire surface, the adhesive surface gradually contacts with time lag according to the self weight deflection of the non-supporting part, and accordingly the external to the thin plate-like work Almost the entire adhesive surface is in contact with the unsupported area and held adhesively while holding the load very small, and then the adhesive means is coplanar with the support area supported by the support member in the thin plate work By moving the adhesive means in the direction opposite to the approach movement, the self-weight deflection of the non-supporting part is reduced, and the entire thin plate-like work is
- the large-sized substrate is partially supported by the grid-like support member from the lower side, and the self-weight deflection of the unsupported portion is within a certain range. It can be suppressed internally and can be held flat.
- the adhesive holding device for a thin plate-like work reciprocates, with a thin plate-like work partially supported by a grid-like support member, against a non-supporting portion deformed downward by its own weight.
- the movement control means moves the adhesion means in the direction intersecting with the thin plate-like work to bring the non-supporting part into contact with a part of the adhesive surface of the adhesion means.
- the large-sized substrate is partially supported by the grid-like support member from the lower side, and the self-weight deflection of the unsupported portion is within a certain range. It can be suppressed internally and can be held flat.
- the magnet for moving the processing mask to the magnetic attraction force area of the magnet surface is moved by the mask movement control means after approximately the entire adhesive surface contacts the unsupported portion.
- the thin plate workpiece is drawn to the magnet surface together with the processing mask by the magnetic attraction force of the surface, and the entire thin plate workpiece is held between the magnetic surface and the processing mask, so the thin plate workpiece is not damaged. It can be adhesively held and sandwiched between the magnet surface and the processing mask in a planar manner.
- the substrate size of the thin plate-like work is enlarged to 2000 mm or more on a side
- the large-sized substrate is partially supported by the grid-like support member from the lower side, and the self-weight deflection of the unsupported portion is within a certain range. It can be suppressed internally and can be held flat.
- deformation or distortion does not occur in the mask pattern in the processing mask, so that accurate pattern formation can be performed by vapor deposition or the like, precision can be improved, and yield can be improved.
- the substrate size is increased to 2000 mm or more compared to the conventional apparatus in which the substrate is sandwiched between the substrate support surface of the magnet unit and the vapor deposition mask by the magnetic attraction force of the magnet and then the whole is turned upside down. Since the entire large substrate can be held flat without being turned upside down, it is excellent in the feasibility.
- BRIEF DESCRIPTION OF THE DRAWINGS It is a longitudinal cross-sectional front view which shows the outline of the adhesion holding apparatus of the thin-plate shaped workpiece which concerns on embodiment of this invention, (a) shows before adhesion, (b) shows the time of contact of an adhesion surface, (c) is adhesion It shows the holding time.
- BRIEF DESCRIPTION OF THE DRAWINGS It is a longitudinal front view which shows the outline of the manufacturing system which concerns on embodiment of this invention, (a) shows before adhesion, (b) shows the time of contact of an adhesive surface, (c) shows the time of adhesion holding, (D) shows the approach movement of the processing mask, and (e) shows the magnetic attraction of the processing mask.
- An adhesive holding apparatus A of a thin plate-like work used to carry out an adhesive holding method of a thin plate-like work according to an embodiment of the present invention is a part and part of a thin plate-like work W, as shown in FIGS.
- a thin plate-like work provided with a support member 1 provided so as to abut on and supporting the thin plate-like work W, and an adhesive surface 2a facing the non-supporting portion W1 on the thin plate-like work W not contacting the support member 1;
- An adhesive means 2 provided for reciprocating movement in a direction intersecting W, a reciprocation control means 3 for operationally controlling reciprocation of the adhesive surface 2a with respect to the surface of the unsupported portion W1, and a surface of the unsupported portion W1.
- An adhesive area increasing means 4 for controlling the operation of the adhesive means 2 so as to move the adhesive surface 2a is provided as a main component.
- the thin plate-like work W is, for example, a glass substrate used for an organic EL display, a liquid crystal display, etc., and has a drawback that it is easily broken by deformation since its thickness is relatively thin with respect to its surface area ing. Further, in the thin plate-like work W, for example, a film surface having a functional part (not shown) such as an organic EL element is formed on one surface to be bonded to each other in the manufacturing process of the organic EL display or liquid crystal display. .
- the supporting member 1 is formed, for example, in a lattice shape or other similar shape so as to support only a part of the film surface (bonding surface) of the thin plate-like work W.
- a lattice shape or other similar shape so as to support only a part of the film surface (bonding surface) of the thin plate-like work W.
- FIGS. 1 and 2 as a specific example, when the support member 1 is formed in a lattice, two or more vertical frames 1a extending in the Y direction and two or more horizontal lines extending in the X direction
- the frame 1 b is configured by framing in the same plane, and is disposed substantially horizontally.
- the thin plate-like work W By placing the thin plate-like work W on the upper surface of the support member 1 so as not to contact the area requiring the post-processing (post-processing) such as the functional part on the film surface, only the area where the post-processing is unnecessary Partially abuts on the upper surface of the support member 1 and the entire thin plate-like work W is held.
- post-processing post-processing
- an area where post-processing is unnecessary after removing the functional part and the like is the support portion W2 supported by the support member 1, and an area where post-processing such as the functional part is necessary
- the non-supporting portion W1 which is not supported by the support member 1 without being abutted, is bent downward by its own weight, and the central portion of the non-supporting portion W1 hangs down most.
- the substrate is further deformed when an external load is applied to the unsupported portion W1 at a stretch, for example, by bringing the adhesive surface 2a of the adhesive means 2 into surface contact with the unsupported portion W1 bent and deformed by its own weight. May be damaged.
- the pressure-sensitive adhesive material to be the pressure-sensitive adhesive surface 2a of the pressure-sensitive adhesive unit 2 described later contacts the surface of the thin plate-like work W
- the pressure-sensitive adhesive material is deformed first, and the pressure is applied to the elastic material. And some adhesion develops.
- the pressure-sensitive adhesive material is further pressed, the thin plate-like work W is deformed, and the repulsive force increases the adhesion.
- this deformation exceeds a certain limit, the tension on the surface of the thin plate-like work W does not endure it and is broken. Therefore, if the pressure by the adhesive is stopped within this limit, the thin plate-like work W can be adhered without being broken.
- the entire adhesive surface 2a which is not so large can be adhered. If the thin plate-like work W and the adhesive surface 2a are completely parallel and they can be in contact while keeping them completely parallel, it will not be necessary to stack the local contacts described above. That is, it should be possible to obtain the cohesion at once.
- the adhesion surface 2a is brought into contact with the surface of the thin plate-like work W only at a local portion, and adhesion is first realized at the local contact portion, and this adhesion portion is used as a basis. Therefore, it is necessary to devise a method of gradually increasing the adhesive area of the adhesive surface 2a to the surface of the thin plate-like work W.
- the lattice pitch of the support member 1 be configured to be adjustable to correspond to the size of the thin plate-like work W, and to adjust the distance between the vertical frames 1a and the distance between the horizontal frames 1b.
- the thin plate-like work W when taking a large number of single-sized substrates (not shown) from one large substrate (not shown), three or more vertical frames 1a and three or more horizontal frames
- the border portions of the respective substrates become support portions W2 supported by the support member 1
- the film surface of each substrate is not in contact with the support member 1 and becomes an unsupported portion W 1 which is not supported by the support member 1.
- FIGS. 1 (a) to 1 (c) the case where a large number of single-sized substrates are taken from a single large-sized substrate as the thin plate-like work W is shown partially enlarged.
- the adhesive means 2 described later is disposed one by one so as to face the central portion of the unsupported portion W1. That is, the adhesive means 2 described later is disposed one by one so as to face the central portion of each unsupported portion W1 even for substrates of other single-piece sizes which are not shown.
- a plurality of adhesive means 2 described later are disposed so as to face the unsupported portion W1 in one single-piece sized substrate, or a single single-piece sized substrate as a thin plate work W
- the adhesive means described later is supported by the support member 1 in which the two vertical frames 1a and the two horizontal frames 1b are framed in a grid shape and the outer peripheral edge of the substrate is opposed to the nonsupporting portion W1 of the substrate. It is also possible to arrange two or more of two.
- the supporting member 1 has a vertical frame 1a and a horizontal frame 1b, and a pressing vertical frame 1c and a horizontal frame 1d disposed so as to sandwich the thin plate-like work W. It is preferable to provide 1c and the horizontal frame 1d so as to be movable up and down with respect to the supporting vertical frame 1a and the horizontal frame 1b.
- a magnetic attraction means such as a magnet or a magnetic body is provided, and the thin plate-like work W is vertically held by the magnetic attraction means and held immovably.
- the adhesive means 2 comprises an adhesive chuck or the like provided with an adhesive surface 2a which is detachably attached to the unsupported portion W1 of the thin plate-like work W, the adhesive surface 2a is movably attached to the main body 2b, and the main body 2b is
- the adhesive surface 2 a is provided so as to reciprocate in the Z direction intersecting (orthogonal) with the supporting direction of the thin plate-like work W by the support member 1 so that the adhesive surface 2 a faces the non-supporting portion W 1 of the thin plate-like work W.
- the attachment structure of the adhesive surface 2a to the main body 2b is supported such that the adhesive surface 2a can perform a predetermined mechanical movement such as tiltable, swingable or vibrationable along the surface of the thin plate-like work W .
- the adhesive surface 2a be supported so as to orbit or turn while being pressed against the surface of the thin plate-like work W.
- the pressure-sensitive adhesive surface 2a is a pressure-sensitive adhesive sheet made of, for example, a pressure-sensitive adhesive material such as fluororubber, elastomer, butyl rubber, photosensitive resin, acrylic resin or silicone, and the surface is formed in an elastic surface.
- the surface of the adhesive surface 2a may be configured to easily stick to the surface of the unsupported portion W1 by, for example, forming emboss processing, concave grooves or the like to facilitate elastic deformation as a whole. preferable.
- the reciprocation of the adhesive surface 2a with respect to the surface of the unsupported portion W1 of the thin plate-like work W is operationally controlled by the reciprocation control means 3 to be described later. Furthermore, with respect to the main body 2b of the adhesive means 2, the adhesive surface 2a is applied to the surface of the non-supporting portion W1 of the thin plate-like work W by the adhesive area increasing means 4 described later. It is controlled so as to move, such as turning (turning) while hitting with a whistle.
- the reciprocation control means 3 and the adhesion area increasing means 4 are, for example, means for operation control to change the grid pitch of the support member 1 and means for controlling the vertical movement of the pressing vertical frame 1c and horizontal frame 1d. And other operation control means are provided in a controller (not shown) described later.
- the controller is electrically connected to a drive source (not shown) for reciprocating the main body 2b of the adhesive means 2, a drive source (not shown) for moving the adhesive surface 2a to the main body 2b of the adhesive means 2, etc.
- the reciprocation control means 3 controls operation of the reciprocation drive source according to a program input and set in advance
- the adhesion area increasing means 4 controls operation of the adhesion drive unit.
- An example of the operation control of the reciprocation drive source by the reciprocation control means 3 includes, in its initial state, the support portion of the thin plate-like work W whose adhesive surface 2a is supported by the support member 1 It is waiting to be separated from or flush with the surface of W2.
- the thin plate work W is moved closer to the unsupported portion W1, and when a part of the adhesive surface 2a contacts the unsupported portion W1, the main body 2b Stop the approaching movement of Thereafter, based on the movement completion signal output from the adhesion area increasing means 4, the main body 2b is moved to the position where the adhesion surface 2a is flush with the surface of the support portion W2 of the thin plate-like work W It is set to move in the reverse direction.
- the reciprocating movement distance of the main body 2b by the driving source for reciprocating movement places the target thin plate-like work W on the supporting member 1 in advance, and the actual weight deflection amount of the non-supporting part W1 is actual side.
- the approach movement distance of the main body 2b from the standby position of the adhesive surface 2a to the partial contact with the unsupported portion W1, and the adhesive surface 2a from the stop movement stop position of the adhesive surface 2a The reverse movement distance of the main body 2b to a position on the same plane as the surface is calculated, and these calculated values are set and input to the controller.
- the adhesion surface 2a of the adhesion means 2 is opposed to the unsupported portion W1 of the thin plate-like work W at a predetermined angle. Let me wait. After that, when a part of the adhesive surface 2a comes into contact with the unsupported portion W1 by the approach movement of the main body 2b, the contact area with the surface of the unsupported portion W1 gradually increases with respect to the main body 2b. The movement of the adhesive surface 2a relative to the main body 2b is stopped when substantially the entire adhesive surface 2a comes in contact with the surface of the unsupported portion W1 while moving (turning) while being hit against the surface of the thin plate-like work W.
- the movement of the adhesive surface 2a with respect to the surface of the non-supporting part W1 causes the adhesive surface 2a to make “rotational movement” only once or a plurality of times, or “rocks” several times depending on the operation content. It is possible to repeat “oscillation” continuously for a predetermined time.
- the adhesion holding method of the thin plate-like work W is, as in the flow chart shown in FIG. 3, an approaching movement process of the adhesion means 2, an adhesion process of the adhesion surface 2 a and a reverse of the adhesion means 2. It includes a moving step and a peeling step of the adhesive surface 2a.
- the approaching and moving process of the adhesive unit 2 is performed by the reciprocating control unit 3 from the standby position of the adhesive unit 2 separated from the thin plate-like work W supported by the support member 1.
- the main body 2b of 2 is moved toward the non-supporting part W1 of the thin plate-like work W.
- the adhesion surface 2a adhered to the surface of the unsupported portion W1 in contact with the surface is moved by the reciprocation control means 3 in the opposite direction to the approaching movement.
- the reverse movement of the adhesive means 2 is stopped at a position where the adhesive surface 2a is on the same plane as the surface of the support portion W2 supported by the support member 1 in the thin plate-like work W.
- the peeling process of the adhesive surface 2a forcibly pushes or peels off the adhesive surface 2a from the surface of the unsupported portion W1. Thereafter, the adhesive means 2 is returned to the standby position, and thereafter, it is programmed to repeat the above-described steps.
- the adhesion holding method of the thin plate-like work W and the adhesion holding apparatus A of the thin plate-like work W according to the embodiment of the present invention, first, in the approaching and moving step of the adhesion means 2
- the main body 2b of the adhesive unit 2 approaches and moves from the standby position toward the non-supporting portion W1 which is bent and deformed downward by its own weight in the work W.
- the approaching movement of the adhesive means 2 is stopped.
- the manufacturing system according to the embodiment of the present invention becomes the surface along the thin plate-like work adhesive holding device A and the thin plate-like work W described above.
- a magnetic surface 5 provided to face the non-processed surface W3 a processing mask 6 made of a magnetic material provided to face the processed surface W4 to be the film surface along the thin plate-like work W, and a thin plate
- a mask movement control means 7 is provided which controls the reciprocating movement of the processing mask 6 with respect to the processing surface (film surface) W4 of the workpiece W.
- the magnet surface 5 is formed by embedding a permanent magnet or the like in a plate material having substantially the same size as the thin plate-like work W, or forming the whole plate material with a permanent magnet or the like, and the smooth magnetic surface portion 5a is a support member
- the thin plate-like work W supported by 1 is arranged on the same plane as the non-processed surface W3 of the support portion W2. That is, the magnetic surface portion 5a of the magnet surface 5 is disposed on the same plane as the lower surfaces of the pressing vertical frame 1c and the horizontal frame 1d.
- the processing mask 6 is, for example, a vapor deposition mask in which one or more openings (not shown) corresponding to vapor deposition patterns are formed on the film surface of the thin plate-like work W, and reciprocates in the Z direction It is freely provided, and the reciprocation of the thin plate-like work W with respect to the processing surface W4 is operated and controlled by the mask movement control means 7.
- the mask movement control means 7 is provided in the controller together with the reciprocation control means 3 etc. and is also electrically connected to a drive source (not shown) for making the processing mask 6 reciprocate. According to the above, the operation control of the mask reciprocating drive source is performed.
- the non-supporting portion W1 of the thin plate-like work W not supported by the support member 1 It is preferable to make the processing mask 6 stand by so as to be separated from the processing surface W4. As shown in FIGS. 2 (a) to 2 (c), the processed surface W4 of the unsupported portion W1 also in the approaching and moving process of the adhesive means 2 and the adhesive process of the adhesive surface 2a and the reverse moving process of the adhesive means 2 described above. It is preferable to make the processing mask 6 stand by so as to be separated from the As shown in FIG.
- the processing mask 6 is moved in conjunction with the reciprocation control means 3 at the same time as the reverse movement process of the adhesion means 2 or after the reverse movement process of the adhesion means 2 is completed.
- the processing mask 6 is set to move toward the processing surface W 4 of the thin plate-like work W so that the processing mask 6 enters the magnetic attraction force area of the magnet surface 5.
- the adhesive surface 2a is moved back to a position on the thin plate-like work W on the same plane as the surface of the support portion W2 in the reverse movement step of the adhesive means 2.
- the mask movement control means 7 makes the processing mask 6 a magnet surface after the contact of substantially the entire adhesion surface 2a of the adhesion means 2 with the surface of the unsupported portion W1.
- the thin plate-like work W is attracted to the magnetic surface 5 together with the processing mask 6 by the magnetic attraction force of the magnetic surface 5, and the support site W2 on the smooth magnetic surface portion 5a of the magnetic surface 5
- the non-machined surface W3 is in pressure contact
- the surface of the processing mask 6 is in pressure contact with the processing surface W4 of the thin plate-like work W, and the entire thin plate-like work W is held between the magnet surface 5 and the processing mask 6 Ru.
- the thin plate work W is held adhesively so that the non-supporting portion W1 is substantially flush with the supporting portion W2 without breakage, and is held in a planar shape between the magnetic surface portion 5a of the magnet surface 5 and the processing mask 6 can do.
- deformation or distortion does not occur in the mask pattern in the processing mask 6, so that accurate pattern formation can be performed by vapor deposition or the like, precision can be improved, and yield can be improved.
- the adhesive surface 2a is tiltably supported with respect to the main body 2b of the adhesive unit 2 as a specific example of the adhesive unit 2, and the adhesive area increasing unit 4
- the adhesive surface 2a is moved while being pressed against the non-supporting portion W1 of the thin plate-like work W, and the adhesive surface 2a is peeled off from the non-supporting portion W1 of the thin plate-like work W in the main body 2b of the adhesive means 2
- the peeling means 8 is integrally incorporated.
- the main body 2b of the adhesion means 2 is formed in a disk shape or a rectangular plate shape, and the cylindrical body 2c is reciprocably inserted in the Z direction through a through hole opened at the center thereof.
- a biasing member 2d such as a coil spring
- An idler 2e is provided loosely at one end of the cylindrical body 2c, and an adhesive sheet to be the adhesive surface 2a is fixed to the tip of the idler 2e.
- rubber may be inserted between the cylindrical body 2c and the idler 2e.
- the supporting direction of the floating body 2e and the adhesive surface 2a with respect to the cylindrical body 2c is controlled by the adhesive area increasing means 4, and one of the adhesive surface 2a is inclined at a predetermined angle with respect to the non-supporting portion W1 of the thin plate work W
- the adhesive material to be the adhesive surface 2a and the elastically deformable portion of the unsupported portion W1 are reciprocated while being pressed against the unsupported portion W1 with the adhesive surface 2a.
- the contact area with the surface of the unsupported portion W1 is gradually increased.
- a rod 4a is rotatably inserted as an adhesion driving portion into the inner peripheral hole of the cylindrical body 2c, and the inclined surface 4b formed at the tip of the rod 4a is an idler 2e.
- the adhesive surface 2a is inclined at a predetermined angle ⁇ by contacting the base end of the rod with a predetermined pressure, and the adhesive surface 2a is rotated at a predetermined angle by rotating the inclined surface 4b of the rod 4a while maintaining the contact state. It is configured to rotate and move while being inclined at ⁇ .
- the reciprocating motion control means 3 contacts the surface of the unsupported portion W1 of the thin plate-like work W without tilting the adhesive surface 2a of the adhesive means 2
- the inclined surface 4b of the rod 4a is brought into contact with the proximal end of the floating body 2e by the adhesive area increasing means 4 so that a part of the adhesive surface 2a contacts the surface of the unsupported portion W1.
- the pressure-sensitive adhesive surface 2a is wrinkled at the non-supporting region W1 within the range in which the pressure-sensitive adhesive material serving as the adhesive surface 2a and the non-supporting region W1 are elastically deformable. Operation control is performed to turn (turn) while inclining to hit.
- the adhesive surface 2a is made to stand by in a state in which the adhesive surface 2a is inclined in advance, or the adhesive surface 2a is inclined during approaching movement, and a part of the adhesive surface 2a is on the surface of the unsupported portion W1. It is also possible to stop the approaching movement at the time of contact.
- the peeling means 8 separates the adhesive surface 2a adhered to each other and the surface of the non-supporting portion W1 in the Z direction with a larger force than the adhesive force of the adhesive surface 2a.
- a pusher 8a is provided so as to be movable toward the surface of the unsupported portion W1 or in the plane of the adhesive surface 2a or around the adhesive surface 2a, and is not supported by the protruding movement of the pusher 8a. It is preferable to forcibly push off the adhesive surface 2a from the surface of the part W1. In the example shown in FIG.
- the pusher 8a is inserted into the through hole 2g opened at the center of the floating body 2e, and the operation is controlled so that the tip 8b protrudes from the adhesive surface 2a.
- the tip 8b protrudes from the adhesive surface 2a.
- the adhesive holding method of the thin plate-like work W and the adhesive holding apparatus A of the thin plate-like work W and the manufacturing system according to the embodiment of the present invention, a part of the adhesive surface 2a is pressed against the surface of the unsupported portion W1.
- the adhesive surface increasing means 4 sets the adhesive surface 2a to the non-supporting region W1 within the elastically deformable range of the adhesive material to be the adhesive surface 2a and the non-supporting region W1. Since the cushioning action by the elastic member 2f causes the adhesive surface 2a to copy according to the reaction force of the posture of the unsupported portion W1 and the like, the adhesive surface 2a is partially not circumferentially moved in order to move around while turning with a brow.
- the contact area between the adhesive surface 2a and the surface of the non-supporting portion W1 is gradually expanded as the surface of the support portion W1 approaches sequentially.
- the adhesive surface 2a of the adhesive means 2 can be softly partially contacted with the elastically deformed unsupported portion W1 of the thin plate-like work W, and the entire adhesive surface 2a can be reliably in surface contact.
- adhesion can be held flatly while preventing the thin plate-like work W from being completely cracked, and the operability is excellent.
- the adhesive surface 2a is tiltably supported with respect to the main body 2b of the adhesive unit 2, and the adhesive surface increasing unit 4 applies the adhesive surface 2a to the unsupported portion W1 of the thin plate-like work W It is not limited to this, so that the inclination angle to the unsupported portion W1 gradually decreases from one end of the adhesive surface 2a to the other end instead of the rotational (rotation) movement of the adhesive surface 2a. Operation control may be performed to overturn.
- the peeling means 8 for peeling off the adhesive surface 2a from the unsupported portion W1 of the thin plate-like work W is integrally incorporated into the main body 2b of the adhesive means 2, but the invention is not limited thereto. You may provide eight.
- a Adhesive holding apparatus for thin plate-like workpiece 1 Support member 2 Adhesive means 2a Adhesive surface 2b Main body 3 Reciprocation control means 4 Adhesive area increasing means 5 Magnet surface 6 Processing mask 7 Mask movement control means W Thin plate W1 Unsupported part W2 Support area W3 Non-machined surface W4 Machined surface
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Abstract
Description
また、その他の有機EL装置の製造方法及び装置として、被処理基板の被成膜面とは反対側の面が重ねて配置された基板支持面および磁石を備えた磁石ユニットと、前記被処理基板の被成膜面に重ねて配置され、前記磁石による磁気吸引力によって前記基板支持面との間に前記被処理基板を挟持するように前記磁石ユニットに吸着された磁性材料製の蒸着マスクとを有し、前記磁石ユニットを上下反転させた状態で、前記基板支持面に対して前記被処理基板と前記蒸着マスクを重ねて配置することにより、前記磁石ユニットに備えられた前記磁石の磁気吸引力によって前記蒸着マスクとの間に前記被処理基板が挟持され、次に全体を上下反転させ、前記蒸着マスクが下方に向くようにマスク蒸着装置の回転機構にセットし、この状態で蒸着を行なうものがある(例えば、特許文献2参照)。
さらに、特許文献2において有機EL装置の素子基板を形成するにあたっては、素子基板が多数取りできる大型基板(被処理基板)に対し、マスク蒸着などの半導体プロセスを利用して各層が形成され後に単品サイズの素子基板に切断している。 Conventionally, an organic film for forming an organic EL element is formed on the film formation region of the film formation substrate by superposing the film formation mask having an opening corresponding to the film formation region and the film formation substrate. As a manufacturing apparatus of an EL device, a chamber, a deposition source provided at a bottom of the chamber to evaporate a film forming material, and a substrate holding unit which holds the film formation substrate in a substantially horizontal state so as to face the deposition source. And the substrate holding unit includes a support having a holding unit in a clamp shape on the outer edge side, and the magnets, the film-forming substrate, and the magnetic flux of the magnet sequentially stacked by the holding unit. By holding the peripheral portion of the laminated body including the film forming mask having a coercive force reaching saturation magnetization with respect to density, the film formation substrate is magnetically interposed between the magnet and the film forming mask. Hold by suction force Some (for example, see Patent Document 1).
In addition, as another method and apparatus for manufacturing an organic EL device, a magnet unit provided with a substrate supporting surface and a magnet on which a surface on the opposite side to a film forming surface of a substrate to be processed is overlapped; And a deposition mask made of a magnetic material adsorbed by the magnet unit so as to sandwich the substrate to be processed between the substrate supporting surface and the substrate by the magnetic attraction force of the magnet. And the magnetic attraction force of the magnet provided to the magnet unit by overlapping the substrate to be processed and the vapor deposition mask with respect to the substrate support surface in a state where the magnet unit is turned upside down The substrate to be treated is held between the substrate and the deposition mask, and then the whole is turned upside down, and the deposition mask is set on the rotating mechanism of the mask deposition apparatus so that the deposition mask faces downward, There is Nau (e.g., see Patent Document 2).
Furthermore, in forming an element substrate of the organic EL device in
つまり、大型基板をその下側から全面的に支えることなく、平面状に保持することが困難であった。
そこで、前述した特許文献1や特許文献2に記載されるように、大型基板を部分的に撓むことなく水平保持することが考えられる。
しかし乍ら、前述した特許文献1のように、磁石と成膜用マスクとの間に基板を該磁石の磁気吸引力により挟持する装置では、基板サイズの大型化に伴って成膜用マスクも一辺が2000mm以上に大きくなるため、磁石と大型基板と成膜用マスクの周辺部をクランプ状形態の保持部で保持しても、これら積層体の中央部(不支持部位)が自重で撓み、磁石の磁気吸引領域よりも低い位置まで一度垂れ下がってしまうと、不支持部位を磁石により磁気吸引して平面状に戻すことができない。
それにより、成膜用マスクにおけるマスクパターンに変形や歪みが生じて正確なパターン形成ができず、歩留りが低下するという問題があった。
また、前述した特許文献2のように、磁石ユニットの基板支持面と蒸着マスクとの間に基板を磁石の磁気吸引力により挟持した後に、これら全体を上下反転させる方法及び装置では、基板サイズの大型化に伴って蒸着マスクや磁石ユニットも一辺が2000mm以上に大きくなって重くなるため、ロボットなどの搬送機構を用いても簡単に上下反転させることは困難で、実現性に乏しいという問題があった。 By the way, in recent years, there is a tendency that the size of a substrate used for an organic EL display or the like becomes larger, and one having a side exceeding 2000 mm has begun to be manufactured. Such a large substrate is formed into a thin plate from a fragile material such as glass, and when supported using a grid-like support member, the central portion (non-supporting portion) of the large substrate surrounded by the support member is The substrate may be further deformed and broken if it is bent due to its own weight and sags, and if an external load is applied to the deformed unsupported portion.
That is, it has been difficult to hold the large substrate flat without entirely supporting the large substrate from the lower side.
Therefore, as described in
However, as in the case of
As a result, deformation or distortion occurs in the mask pattern in the mask for film formation, so that accurate pattern formation can not be performed, and there is a problem that the yield is lowered.
Further, as in
その結果、薄板状ワークの基板サイズが一辺2000mm以上に大型化しても、大型基板をその下側から格子状の支持部材で部分的に支持することで、不支持部位の自重撓みを一定の範囲内で抑制することができ、平面状に保持することができる。 The adhesive holding method of a thin plate-like work according to the present invention having the above-mentioned features is an adhesive means for a thin plate-like work partially supported by a grid-like support member against an unsupported portion which is deformed downward by its own weight. Is moved in the direction intersecting the thin plate-like work to bring the non-supporting part into contact with a part of the adhesive surface of the adhesive means, and then the adhesive surface is made to the non-supporting area As the contact area gradually increases and moves so as to contact almost the entire surface, the adhesive surface gradually contacts with time lag according to the self weight deflection of the non-supporting part, and accordingly the external to the thin plate-like work Almost the entire adhesive surface is in contact with the unsupported area and held adhesively while holding the load very small, and then the adhesive means is coplanar with the support area supported by the support member in the thin plate work By moving the adhesive means in the direction opposite to the approach movement, the self-weight deflection of the non-supporting part is reduced, and the entire thin plate-like work is adhesively held flat, so the thin plate-like work is broken It is possible to correct the self-weight deflection of the thin plate-like work by holding the adhesive without adhesion.
As a result, even if the substrate size of the thin plate-like work is enlarged to 2000 mm or more on a side, the large-sized substrate is partially supported by the grid-like support member from the lower side, and the self-weight deflection of the unsupported portion is within a certain range. It can be suppressed internally and can be held flat.
その結果、薄板状ワークの基板サイズが一辺2000mm以上に大型化しても、大型基板をその下側から格子状の支持部材で部分的に支持することで、不支持部位の自重撓みを一定の範囲内で抑制することができ、平面状に保持することができる。 Further, the adhesive holding device for a thin plate-like work according to the present invention having the characteristics described above reciprocates, with a thin plate-like work partially supported by a grid-like support member, against a non-supporting portion deformed downward by its own weight. The movement control means moves the adhesion means in the direction intersecting with the thin plate-like work to bring the non-supporting part into contact with a part of the adhesive surface of the adhesion means. By moving the adhesive surface so that the contact area between the adhesive surface and the non-supporting part gradually increases and the entire surface comes into contact with each other, the adhesive surface is partially delayed while following the self-weight deflection of the non-supporting part. Gradually contact, and while keeping the external load on the thin-plate-like work very small accordingly, almost the entire adhesive surface comes into contact with the unsupported area to be adhesively held, and then the adhesive means is adhered by the reciprocation control means surface By moving the adhesive means in the direction opposite to the approaching movement to a position flush with the supporting portion supported by the supporting member in the thin plate-like work, the self-weight deflection of the non-supporting portion is reduced, Since the whole is adhesively held in a flat shape, adhesive holding can be performed without damaging the thin plate-like work, and the self-weight deflection of the thin plate-like work can be corrected.
As a result, even if the substrate size of the thin plate-like work is enlarged to 2000 mm or more on a side, the large-sized substrate is partially supported by the grid-like support member from the lower side, and the self-weight deflection of the unsupported portion is within a certain range. It can be suppressed internally and can be held flat.
その結果、薄板状ワークの基板サイズが一辺2000mm以上に大型化しても、大型基板をその下側から格子状の支持部材で部分的に支持することで、不支持部位の自重撓みを一定の範囲内で抑制することができ、平面状に保持することができる。
それにより、加工用マスクにおけるマスクパターンに変形や歪みが発生しないので、蒸着などで正確なパターン形成ができ、精密度が向上して歩留りを向上させることができる。
さらに、磁石ユニットの基板支持面と蒸着マスクとの間に基板を磁石の磁気吸引力により挟持した後に、これら全体を上下反転させる従来の装置に比べ、基板サイズが一辺2000mm以上に大型化しても、大型基板全体を上下反転させずに、平面状に保持することができて、実現性に優れている。 In the manufacturing system according to the present invention having the above-mentioned characteristics, the magnet for moving the processing mask to the magnetic attraction force area of the magnet surface is moved by the mask movement control means after approximately the entire adhesive surface contacts the unsupported portion. The thin plate workpiece is drawn to the magnet surface together with the processing mask by the magnetic attraction force of the surface, and the entire thin plate workpiece is held between the magnetic surface and the processing mask, so the thin plate workpiece is not damaged. It can be adhesively held and sandwiched between the magnet surface and the processing mask in a planar manner.
As a result, even if the substrate size of the thin plate-like work is enlarged to 2000 mm or more on a side, the large-sized substrate is partially supported by the grid-like support member from the lower side, and the self-weight deflection of the unsupported portion is within a certain range. It can be suppressed internally and can be held flat.
As a result, deformation or distortion does not occur in the mask pattern in the processing mask, so that accurate pattern formation can be performed by vapor deposition or the like, precision can be improved, and yield can be improved.
Furthermore, even if the substrate size is increased to 2000 mm or more compared to the conventional apparatus in which the substrate is sandwiched between the substrate support surface of the magnet unit and the vapor deposition mask by the magnetic attraction force of the magnet and then the whole is turned upside down. Since the entire large substrate can be held flat without being turned upside down, it is excellent in the feasibility.
本発明の実施形態に係る薄板状ワークの粘着保持方法を実施するために使用する薄板状ワークの粘着保持装置Aは、図1~図4に示すように、薄板状ワークWの一部と部分的に当接するように設けられて薄板状ワークWを支持する支持部材1と、薄板状ワークWにおいて支持部材1が当接しない不支持部位W1と対向する粘着面2aを有し、薄板状ワークWと交差する方向へ往復動自在に設けられる粘着手段2と、不支持部位W1の表面に対する粘着面2aの往復動を作動制御する往復動制御手段3と、不支持部位W1の表面に対して粘着面2aが動くように粘着手段2を作動制御する粘着面積増大手段4を、主要な構成要素として備えている。
さらに図示しないが、薄板状ワークWの不支持部位W1に粘着した粘着面2aを不支持部位W1の表面から剥がすための後述する剥離手段を備えることが好ましい。 Hereinafter, embodiments of the present invention will be described in detail based on the drawings.
An adhesive holding apparatus A of a thin plate-like work used to carry out an adhesive holding method of a thin plate-like work according to an embodiment of the present invention is a part and part of a thin plate-like work W, as shown in FIGS. A thin plate-like work provided with a
Furthermore, although not shown in the drawings, it is preferable to include a peeling means described later for peeling the
さらに、薄板状ワークWは、例えば有機ELディスプレイや液晶ディスプレイなどの製造過程において、互いに貼り合わされる一方の面に、例えば有機EL素子などの機能部(図示しない)を有する膜面が形成される。 The thin plate-like work W is, for example, a glass substrate used for an organic EL display, a liquid crystal display, etc., and has a drawback that it is easily broken by deformation since its thickness is relatively thin with respect to its surface area ing.
Further, in the thin plate-like work W, for example, a film surface having a functional part (not shown) such as an organic EL element is formed on one surface to be bonded to each other in the manufacturing process of the organic EL display or liquid crystal display. .
その具体例として図1及び図2に示すように、支持部材1が格子状に形成される場合には、Y方向へ延びる2本以上の縦フレーム1aと、X方向へ延びる2本以上の横フレーム1bとを同一平面において枠組みすることで構成され、略水平に配置している。支持部材1の上面に対して薄板状ワークWをその膜面において機能部などの後加工(後処理)が必要な領域と接触しないように載置することにより、後加工が不必要な領域のみが支持部材1の上面と部分的に当接して、薄板状ワークWの全体が保持される。 The supporting
As shown in FIGS. 1 and 2 as a specific example, when the
このように自重で撓み変形した不支持部位W1に対し、例えば粘着手段2の粘着面2aを面接触させるなどして、不支持部位W1に外的負荷が一気に掛けられると、基板が更に変形して破損するおそれがある。 That is, in the thin plate-like work W, an area where post-processing is unnecessary after removing the functional part and the like is the support portion W2 supported by the
The substrate is further deformed when an external load is applied to the unsupported portion W1 at a stretch, for example, by bringing the
そのため、この限界以内のところで、粘着材による押圧を止めておけば、薄板状ワークWを割れることなく粘着できることになる。粘着材による押圧を限界以内の力に止めるには、接触する面積をごく局部的なものに小さくし、なおかつ、薄板状ワークWに必要以上の変位を与えない程度の押圧力に限ることが肝要である。
一旦、薄板状ワークWの表面に対して粘着面2aが局部的に粘着されたとすれば、その隣の局部についても、同程度の押圧を加えることにより同様のことが実現できる。この場合、既に隣の局部が粘着されているとすれば、その近傍は薄板状ワークWの表面張力は以前よりは緩み、割れ難い状態になっており、かつ、薄板状ワークWの自重による垂れ下りも緩和されているので粘着が容易になる。
このような薄板状ワークWの表面に対する粘着面2aの局部的な粘着を次々と隣接した局部に拡げて行くことにより、あまり大きくない粘着面2aの全体を粘着することができる。
もし、薄板状ワークWと粘着面2aが完全に平行であり、完全に平行を保ったまま接触できるとするならば、上述した局部的な接触を積み重ねる必要はないだろう。すなわち、一気に粘着力を得ることができるはずである。しかし実際には、薄板状ワークWの表面はその自重により上方へ向け凹状に撓んでいるため、平面状の拡がりを持った粘着面2aの全体で一気に粘着力を発現させようとして近づけ過ぎると、特に粘着面2aの端部で片当たりに近い状態が生じ、その部分で割れてしまう。
そのため、実際の装置としては、薄板状ワークWの表面に対して粘着面2aが局部に限って接触するようにして、先ずその局所的な接触部分で粘着を実現させ、この粘着部分を基にして薄板状ワークWの表面に対する粘着面2aの粘着面積を徐々に増やして行く工夫が必要になる。 That is, when the pressure-sensitive adhesive material to be the pressure-sensitive
Therefore, if the pressure by the adhesive is stopped within this limit, the thin plate-like work W can be adhered without being broken. In order to stop the pressure by the adhesive material within the limit, it is important to reduce the contact area to a very local one and to limit the pressing force to the extent that the thin plate work W is not displaced more than necessary. It is.
Once the
By spreading the local adhesion of the
If the thin plate-like work W and the
Therefore, as an actual device, the
さら、薄板状ワークWの一例として、一枚の大型基板(図示しない)から単品サイズの基板(図示しない)を多数取りする場合には、3本以上の縦フレーム1aと3本以上の横フレーム1bを格子状に枠組みした支持部材1上に、各基板の境界部分のみと部分的に接するように載置することで、各基板の境界部分が支持部材1で支持される支持部位W2となり、各基板の膜面が支持部材1と当接せずに支持部材1で支持されない不支持部位W1となる。 Further, it is preferable that the lattice pitch of the
Furthermore, as an example of the thin plate-like work W, when taking a large number of single-sized substrates (not shown) from one large substrate (not shown), three or more
また、その他の例として図示しないが、一つの単品サイズの基板において不支持部位W1と対向するように、後述する粘着手段2を複数個配置したり、薄板状ワークWとして一つの単品サイズの基板の外周縁を、2本の縦フレーム1aと2本の横フレーム1bが格子状に枠組みされた支持部材1で支持するとともに、該基板の不支持部位W1と対向するように、後述する粘着手段2を単数又は複数個配置することも可能である。 In the example shown in FIGS. 1 (a) to 1 (c), the case where a large number of single-sized substrates are taken from a single large-sized substrate as the thin plate-like work W is shown partially enlarged. The adhesive means 2 described later is disposed one by one so as to face the central portion of the unsupported portion W1. That is, the adhesive means 2 described later is disposed one by one so as to face the central portion of each unsupported portion W1 even for substrates of other single-piece sizes which are not shown.
In addition, although not illustrated as another example, a plurality of adhesive means 2 described later are disposed so as to face the unsupported portion W1 in one single-piece sized substrate, or a single single-piece sized substrate as a thin plate work W The adhesive means described later is supported by the
支持用の縦フレーム1a及び横フレーム1b又は押さえ用の縦フレーム1c及び横フレーム1dのいずれか一方、若しくは支持用の縦フレーム1a及び横フレーム1bと押さえ用の縦フレーム1c及び横フレーム1dの両方には、例えば磁石や磁性体などの磁気吸引手段(図示しない)が設けられ、この磁気吸引手段により、薄板状ワークWを上下方向に挟み込んで移動不能に保持することが好ましい。 Furthermore, according to need, the supporting
Either the supporting
本体2bに対する粘着面2aの取り付け構造は、薄板状ワークWの表面に沿って粘着面2aが例えば傾動自在や揺動自在や振動自在など、所定の機械的な動きが行えるように支持されている。さらに詳しく説明すれば、粘着面2aを薄板状ワークWの表面に撫で当てながら周回又は旋回するように支持することが好ましい。
粘着面2aは、例えばフッ素ゴムやエラストマー、ブチルゴム、感光性樹脂、アクリル系やシリコン系などの粘着材料からなる粘着シートであり、その表面が弾性のある面状に形成されている。さらに、粘着面2aの表面は、例えばエンボス処理や凹溝などを形成して全体的に弾性変形し易くすることにより、不支持部位W1の表面に対して容易に粘り付くように構成することが好ましい。
粘着手段2の本体2bは、後述する往復動制御手段3により、薄板状ワークWの不支持部位W1の表面に対する粘着面2aの往復動が作動制御されている。
さらに、粘着手段2の本体2bに対し粘着面2aは、後述する粘着面積増大手段4により、薄板状ワークWの不支持部位W1の表面に対して粘着面2aを、薄板状ワークWの表面に撫で当てながら周回(旋回)させるなど動くように作動制御されている。 The adhesive means 2 comprises an adhesive chuck or the like provided with an
The attachment structure of the
The pressure-sensitive
The reciprocation of the
Furthermore, with respect to the
コントローラは、粘着手段2の本体2bを往復動させるための駆動源(図示しない)、粘着手段2の本体2bに対し粘着面2aを動かすための駆動源(図示しない)などと電気的に接続しており、予め入力設定されたプログラムに従って、往復動制御手段3により往復動用駆動源を作動制御するとともに、粘着面積増大手段4により粘着用駆動部を作動制御している。 The reciprocation control means 3 and the adhesion area increasing means 4 are, for example, means for operation control to change the grid pitch of the
The controller is electrically connected to a drive source (not shown) for reciprocating the
不支持部位W1の表面に対する粘着面2aの動きは、その動作内容に応じて、粘着面2aを1回だけ又は複数回の「周回(旋回)移動」をさせたり、何回か「揺動」を繰り返したり、所定時間に亘って「振動」を連続させることが可能である。 As an example of the operation control of the adhesion drive unit by the adhesion
The movement of the
粘着手段2の接近移動工程は、図1(a)に示されるように、支持部材1で支持される薄板状ワークWから離れた粘着手段2の待機位置から、往復動制御手段3により粘着手段2の本体2bを、薄板状ワークWの不支持部位W1に向けて接近移動させる。これに続いて、不支持部位W1の表面に対し、粘着手段2の粘着面2aの一部が接触したところで、粘着手段2の接近移動を停止させる。
粘着面2aの粘着工程は、図1(b)に示されるように、不支持部位W1の表面に一部が接触した粘着面2aを、粘着面積増大手段4により不支持部位W1の表面との接触面積が徐々に増えるように動かす。これに続いて、粘着面2aの動きにより粘着面2aの略全体が不支持部位W1の表面に接触してから、粘着面2aの動きを停止させる。
粘着手段2の逆移動工程は、図1(c)に示されるように、不支持部位W1の表面に接触して粘着された粘着面2aを、往復動制御手段3により前記接近移動と逆方向へ逆移動して、粘着面2aが薄板状ワークWにおいて支持部材1で支持される支持部位W2の表面と同一平面上となる位置で、粘着手段2の逆移動を停止させる。 The adhesion holding method of the thin plate-like work W according to the embodiment of the present invention is, as in the flow chart shown in FIG. 3, an approaching movement process of the adhesion means 2, an adhesion process of the
As shown in FIG. 1 (a), the approaching and moving process of the
In the adhesive process of the
In the reverse movement step of the adhesion means 2, as shown in FIG. 1 (c), the
それにより、粘着面2aの一部を不支持部位W1の表面に撫で当て接触させて、局部的な粘着が行われる。
その後、粘着面2aの粘着工程で粘着面積増大手段4により、粘着面2aが薄板状ワークWの表面に撫で当てながら周回(旋回)させるなど動いて、これら粘着面2aと不支持部位W1の表面との接触領域が徐々に拡大する。(図1(b)参照)
それにより、不支持部位W1の自重撓みに倣って粘着面2aが部分的に時間差をかけつつ徐々に接触し、それに伴い薄板状ワークWに対する外的負荷を非常に小さく押さえつつ、粘着面2aの略全体が不支持部位W1の表面に接触して粘着保持される。
その後、粘着手段2の逆移動工程で往復動制御手段3により、粘着手段2の粘着面2aが、薄板状ワークWにおいて支持部材1で支持される支持部位W2の表面と同一平面上となる位置まで逆移動される。(図1(c)参照)
それにより、不支持部位W1の自重撓みが減少して、薄板状ワークWの全体が平面状に粘着保持される。
したがって、薄板状ワークWを破損することなく不支持部位W1が支持部位W2と略面一となるように粘着保持して薄板状ワークWの自重撓みを補正することができる。 According to the adhesion holding method of the thin plate-like work W and the adhesion holding apparatus A of the thin plate-like work W according to the embodiment of the present invention, first, in the approaching and moving step of the adhesion means 2 The
As a result, a part of the
Thereafter, the adhesive surface increasing means 4 moves the
As a result, the
Thereafter, in the reverse movement step of the adhesion means 2, the position where the
As a result, the self-weight deflection of the unsupported portion W1 is reduced, and the entire thin plate-like work W is adhesively held in a planar manner.
Therefore, the self-weight deflection of the thin plate-like work W can be corrected by adhesively holding the non-supporting portion W1 substantially flush with the support portion W2 without damaging the thin plate-like work W.
つまり、磁石面5の磁気面部5aは、押さえ用の縦フレーム1c及び横フレーム1dの下面と同一平面上に配置されている。 The
That is, the
マスク移動制御手段7は、往復動制御手段3などと共にコントローラに備えられ、加工用マスク6を往復動させるための駆動源(図示しない)とも電気的に接続しており、予め入力設定されたプログラムに従って、マスク往復動用駆動源を作動制御している。 The
The mask movement control means 7 is provided in the controller together with the reciprocation control means 3 etc. and is also electrically connected to a drive source (not shown) for making the
図2(c)(d)に示される例では、粘着手段2の逆移動工程において粘着面2aを薄板状ワークWにおいて支持部位W2の表面と同一平面上となる位置まで逆移動させている。その他の例として図示しないが、粘着面2aを磁石面5の磁気吸引力領域に入るまで逆移動させることも可能である。 As an example of operation control of the
In the example shown in FIGS. 2C and 2D, the
したがって、薄板状ワークWを破損することなく不支持部位W1が支持部位W2と略面一となるように粘着保持して磁石面5の磁気面部5aと加工用マスク6の間に平面状に挟持することができる。
それにより、加工用マスク6におけるマスクパターンに変形や歪みが発生しないので、蒸着などで正確なパターン形成ができ、精密度が向上して歩留りを向上させることができる。
次に、本発明の一実施例を図面に基づいて説明する。 According to the manufacturing system according to the embodiment of the present invention, the mask movement control means 7 makes the processing mask 6 a magnet surface after the contact of substantially the
Therefore, the thin plate work W is held adhesively so that the non-supporting portion W1 is substantially flush with the supporting portion W2 without breakage, and is held in a planar shape between the
As a result, deformation or distortion does not occur in the mask pattern in the
Next, an embodiment of the present invention will be described based on the drawings.
円筒体2cの一端には、遊動体2eが遊嵌状に設けられ、遊動体2eの先端に粘着面2aとなる粘着シートを固定し、これら円筒体2cと遊動体2eとの間に例えばゴムシートなどの弾性変形可能な弾性部材2fを介装することにより、遊動体2e及び粘着面2aが円筒体2cに対して傾動自在に支持されている。 The
An idler 2e is provided loosely at one end of the
さらに、図4(b)(c)に示される例では、往復動制御手段3により、粘着手段2の粘着面2aを傾斜させずに、薄板状ワークWの不支持部位W1の表面に接触する直前位置まで接近移動させ、その後、粘着面積増大手段4により、ロッド4aの傾斜面4bを遊動体2eの基端に当接させて、粘着面2aの一部が不支持部位W1の表面に接触するように傾斜し、その後、ロッド4aの傾斜面4bを回転させることで、粘着面2aとなる粘着材及び不支持部位W1相互の弾性変形可能な範囲において粘着面2aが不支持部位W1に撫で当たるように傾斜したまま周回(旋回)するように作動制御している。
また、その他の例として図示しないが、予め粘着面2aを傾斜させた状態で待機させるか、接近移動中に粘着面2aを傾斜させ、この粘着面2aの一部が不支持部位W1の表面に接触した時点で接近移動を停止させることも可能である。 In the example shown in FIG. 4 (c), a
Furthermore, in the example shown in FIGS. 4B and 4C, the reciprocating motion control means 3 contacts the surface of the unsupported portion W1 of the thin plate-like work W without tilting the
Further, although not shown as another example, the
剥離手段5の具体例としては、粘着面2aの面内か又は粘着面2aの周囲にプッシャ8aを、不支持部位W1の表面に向けて突出動自在に設け、プッシャ8aの突出動によって不支持部位W1の表面から粘着面2aを強制的に押し剥がすことが好ましい。
図4(d)に示される例では、遊動体2eの中央に開穿される貫通孔2gに対し、プッシャ8aを挿通してその先端部8bが粘着面2aから突出するように作動制御している。
また、その他の例として図示しないが、粘着手段2の逆移動によって不支持部位W1の表面から粘着面2aを強制的に引き剥がすことも可能である。 Further, the peeling means 8 separates the
As a specific example of the peeling means 5, a
In the example shown in FIG. 4D, the
Moreover, although not illustrated as another example, it is also possible to forcibly peel off the
それにより、薄板状ワークWの撓み変形した不支持部位W1に粘着手段2の粘着面2aをソフトに部分接触させ且つ粘着面2aの全体を確実に面接触させることができる。
その結果、薄板状ワークWの割れを完全に防止しながら平面状に粘着保持できて、作動性に優れるという利点がある。 According to the adhesive holding method of the thin plate-like work W and the adhesive holding apparatus A of the thin plate-like work W and the manufacturing system according to the embodiment of the present invention, a part of the
As a result, the
As a result, there is an advantage that adhesion can be held flatly while preventing the thin plate-like work W from being completely cracked, and the operability is excellent.
さらに粘着手段2の本体2bに、薄板状ワークWの不支持部位W1から粘着面2aを剥がすための剥離手段8を一体的に組み込んだが、これに限定されず、粘着手段2と別個に剥離手段8を設けても良い。 In the above-described embodiment, the
Furthermore, the peeling means 8 for peeling off the
2 粘着手段 2a 粘着面
2b 本体 3 往復動制御手段
4 粘着面積増大手段 5 磁石面
6 加工用マスク 7 マスク移動制御手段
W 薄板状ワーク W1 不支持部位
W2 支持部位 W3 非加工面
W4 加工面 A Adhesive holding apparatus for thin plate-
Claims (4)
- 支持部材によりその一部が支持される薄板状ワークにおいて該支持部材で支持されない不支持部位に対し、粘着手段をその粘着面の一部が接触するまで、前記薄板状ワークと交差する方向へ接近移動させ、
前記不支持部位に対し前記粘着面を、該粘着面と該不支持部位との接触面積が徐々に増えて略全体が接触するように動かし、
前記粘着手段を、前記粘着面が前記薄板状ワークにおいて前記支持部材で支持される支持部位と同一平面となる位置まで、前記接近移動と逆方向へ移動させることを特徴とする薄板状ワークの粘着保持方法。 With respect to a non-supporting portion of the thin plate-like work which is partially supported by the supporting member and not supported by the supporting member, the adhesion means is approached in a direction intersecting with the thin plate-like work until a part of the adhesive surface contacts. Let go
Moving the adhesive surface relative to the non-supporting part such that the contact area between the adhesive surface and the non-supporting part is gradually increased and substantially the entire surface comes into contact;
The adhesion of a thin plate-like work characterized in that the adhesion means is moved in a direction opposite to the approaching movement to a position where the adhesive face is flush with the support portion supported by the support member in the thin plate-like work How to hold. - 薄板状ワークの一部と当接するように設けられて該薄板状ワークを支持する支持部材と、
前記薄板状ワークにおいて前記支持部材が当接しない不支持部位と対向する粘着面を有し、前記薄板状ワークと交差する方向へ往復動自在に設けられる粘着手段と、
前記不支持部位に対する前記粘着面の往復動を作動制御する往復動制御手段と、
前記不支持部位に対して前記粘着面が動くように前記粘着手段を作動制御する粘着面積増大手段とを備え、
前記往復動制御手段が、前記不支持部位に向けて前記粘着面を接近移動させ、該粘着面の一部が前記不支持部位に接触した時に、前記粘着面の接近移動を停止させ、
前記粘着面積増大手段が、前記粘着手段の接近移動停止後に、前記不支持部位に対し前記粘着面を、該粘着面と該不支持部位との接触面積が徐々に増えて略全体が接触するように動かし、
前記往復動制御手段が、前記粘着面の略全体と前記不支持部位の接触後に、前記薄板状ワークにおいて前記支持部材で支持される支持部位と同一平面となる位置まで前記粘着面を前記接近移動と逆方向へ移動させることを特徴とする薄板状ワークの粘着保持装置。 A support member provided to abut a portion of the thin plate-like work to support the thin plate-like work;
An adhesive means having an adhesive surface facing the non-supporting portion where the support member does not abut on the thin plate-like work, and provided reciprocally in a direction crossing the thin plate-like work;
A reciprocation control means operable to control reciprocation of the adhesive surface with respect to the non-supporting portion;
Adhesive area increasing means for controlling the operation of the adhesive means so that the adhesive surface moves relative to the unsupported portion;
The reciprocation control means moves the adhesive surface closer to the non-supporting part, and stops a parting movement of the adhesive surface when a part of the adhesive surface contacts the non-supporting part,
The adhesion area increasing means is configured such that the contact area between the adhesive surface and the non-supporting part gradually increases to substantially contact the non-supporting part with respect to the non-supporting part after stopping the approach movement of the adhesive means. Move to
The reciprocation movement of the adhesive surface to a position where the reciprocation control means is in the same plane as the support region supported by the support member in the thin plate-like work after contact between the substantially entire adhesive surface and the unsupported region An adhesive holding device for a thin plate-like work, characterized in that it is moved in the opposite direction. - 前記粘着手段の本体に対して前記粘着面を傾動自在に支持し、前記粘着面積増大手段が、前記粘着面を前記薄板状ワークに撫で当てながら周回移動させることを特徴とする請求項2記載の薄板状ワークの粘着保持装置。 3. The pressure-sensitive adhesive surface is supported so as to be freely tiltable with respect to the main body of the pressure-sensitive adhesive means, and the pressure-sensitive adhesive area increasing means causes the pressure-sensitive adhesive surface to move circumferentially while touching the thin plate-like work. Adhesive holding device for thin plate-like work.
- 請求項2又は3記載の薄板状ワークの粘着保持装置を備えた製造システムであって、
前記薄板状ワークの非加工面と対向して設けられる平滑な磁石面と、前記薄板状ワークの加工面と対向して前記薄板状ワークと交差する方向へ往復動自在に設けられる磁性体からなる加工用マスクと、
前記薄板状ワークの前記加工面に対する前記加工用マスクの往復動を作動制御するマスク移動制御手段とを備え、
前記マスク移動制御手段が、前記往復動制御手段と連動して、前記粘着面の略全体と前記不支持部位の接触後に、前記加工用マスクを前記磁石面の磁気吸引力領域まで移動させることを特徴とする製造システム。 A manufacturing system comprising the adhesive holding device for a thin plate-like work according to claim 2 or 3,
It is composed of a smooth magnetic surface provided facing the non-machined surface of the thin plate-like work, and a magnetic material provided reciprocally in the direction intersecting the thin plate-like work opposite the processed surface of the thin plate-like work Processing mask,
Mask movement control means for controlling the reciprocating movement of the processing mask relative to the processing surface of the thin plate-like workpiece;
The mask movement control means moves the processing mask to the magnetic attraction force area of the magnet surface after the contact between the substantially entire adhesive surface and the unsupported portion in conjunction with the reciprocation control means. Characteristic manufacturing system.
Priority Applications (5)
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CN201180053944.XA CN103201201B (en) | 2011-02-28 | 2011-02-28 | Thin plate-shaped workpiece adhesion and retention method, thin plate-shaped workpiece adhesion and retention device, and manufacturing system |
PCT/JP2011/054552 WO2012117509A1 (en) | 2011-02-28 | 2011-02-28 | Thin plate-shaped workpiece adhesion and retention method, thin plate-shaped workpiece adhesion and retention device, and manufacturing system |
JP2011536229A JP4857407B1 (en) | 2011-02-28 | 2011-02-28 | Adhesion holding method for thin plate workpiece, adhesion holding device for thin plate workpiece, and manufacturing system |
KR1020127023721A KR101791280B1 (en) | 2011-02-28 | 2011-02-28 | Thin plate-shaped workpiece adhesion and retention method, thin plate-shaped workpiece adhesion and retention device, and manufacturing system |
TW101105906A TWI466811B (en) | 2011-02-28 | 2012-02-22 | Adhesive and holding method for sheet-like workpieces and adhesive holding device for sheet-like workpieces and manufacturing system |
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PCT/JP2011/054552 WO2012117509A1 (en) | 2011-02-28 | 2011-02-28 | Thin plate-shaped workpiece adhesion and retention method, thin plate-shaped workpiece adhesion and retention device, and manufacturing system |
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KR (1) | KR101791280B1 (en) |
CN (1) | CN103201201B (en) |
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WO2018086698A1 (en) * | 2016-11-10 | 2018-05-17 | Applied Materials, Inc. | Holding arrangement for holding a substrate, carrier including the holding arrangement, processing system employing the carrier, and method for releasing a substrate from a holding arrangement |
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JP2021072319A (en) * | 2019-10-29 | 2021-05-06 | キヤノントッキ株式会社 | Manufacturing method of substrate holding unit, substrate holding member, substrate holding device, substrate processing device, and electronic device |
JP2021075781A (en) * | 2019-11-04 | 2021-05-20 | キヤノントッキ株式会社 | Film deposition apparatus and film deposition method |
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Also Published As
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CN103201201A (en) | 2013-07-10 |
TWI466811B (en) | 2015-01-01 |
JP4857407B1 (en) | 2012-01-18 |
KR101791280B1 (en) | 2017-10-27 |
TW201302585A (en) | 2013-01-16 |
JPWO2012117509A1 (en) | 2014-07-07 |
CN103201201B (en) | 2015-06-03 |
KR20130138652A (en) | 2013-12-19 |
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