WO2011136106A1 - ガラスハードディスク基板用研磨液組成物 - Google Patents
ガラスハードディスク基板用研磨液組成物 Download PDFInfo
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- WO2011136106A1 WO2011136106A1 PCT/JP2011/059740 JP2011059740W WO2011136106A1 WO 2011136106 A1 WO2011136106 A1 WO 2011136106A1 JP 2011059740 W JP2011059740 W JP 2011059740W WO 2011136106 A1 WO2011136106 A1 WO 2011136106A1
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- polishing
- hard disk
- acid
- disk substrate
- glass hard
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Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Definitions
- the present invention relates to a polishing liquid composition for a glass hard disk substrate, a method for producing a glass hard disk substrate, and a method for polishing a glass hard disk substrate.
- hard disk drives rotate at high speeds, they consume a lot of power. In recent years, they have become a major problem in consideration of the environment, and low power consumption is demanded.
- power consumption there is a method of increasing the recording capacity per hard disk, reducing the number of hard disks installed in the drive, and reducing the weight.
- the magnetic signal becomes weak. Therefore, in order to improve the detection sensitivity of the magnetic signal, technological development for lowering the flying height of the magnetic head has been advanced.
- the present invention is capable of polishing while maintaining a polishing rate for a long time in cyclic polishing, that is, polishing for a glass hard disk substrate capable of cyclic polishing with suppressed reduction in polishing rate and realizing high cleanliness and high polishing rate.
- a liquid composition a method for producing a glass hard disk substrate using the polishing liquid composition, and a method for polishing a glass hard disk substrate.
- the present invention is a polishing liquid composition for a glass hard disk substrate containing an amine compound, an acid, silica particles, and water, wherein the amine compound is selected from the group consisting of amino alcohol, piperazine and derivatives thereof. Further, the present invention relates to a polishing composition for glass hard disk substrates, which has 2 or 3 nitrogen atoms in the molecule, at least one of which is a primary amine or a secondary amine.
- the present invention relates to a method for manufacturing a glass hard disk substrate and a method for polishing a glass hard disk substrate, including a step of circulating polishing the glass hard disk substrate using the polishing liquid composition for a glass hard disk substrate of the present invention.
- a polishing composition for a glass hard disk substrate that achieves high cleanliness of the substrate surface after polishing, can be polished at a high polishing rate, and can maintain a high polishing rate in cyclic polishing,
- substrate can be provided.
- one of the causes of the decrease in the polishing rate in the cyclic polishing of the glass hard disk substrate using the conventional polishing liquid composition is that the pH of the polishing liquid composition recovered for reuse after polishing is increased.
- the present invention provides a polishing liquid composition in which a predetermined amine compound such as aminoalcohol and piperazine and derivatives thereof, and an acid and silica particles are combined to change the pH of the polishing liquid composition recovered after polishing. It is based on the knowledge that both excellent cleanliness and polishing rate can be achieved in polishing.
- the present invention is a polishing composition for a glass hard disk substrate (hereinafter also referred to as “the polishing composition of the present invention”), which contains an amine compound, an acid, silica particles, and water,
- the amine compound is selected from the group consisting of amino alcohol, piperazine and derivatives thereof, and has 2 or 3 nitrogen atoms in the molecule, at least one of which is a primary amine or a secondary amine.
- the present invention relates to a polishing liquid composition. According to the polishing composition of the present invention, high cleanliness of the substrate surface after polishing can be realized, polishing can be performed at a high polishing rate, and the polishing rate can be maintained in cyclic polishing.
- cleanliness refers to the ability to remove substances remaining on the substrate surface in a polishing process.
- the substance remaining on the substrate surface after polishing include abrasive grains, polishing scraps generated during polishing, polishing pad debris, and members used in polishing machines such as stainless steel. Polishing with the polishing composition of the present invention improves the cleanliness of the substrate surface after polishing, reduces the flying height of the magnetic head, and increases the recording capacity of the glass hard disk substrate.
- durability in cyclic polishing refers to the performance of a polishing composition that is reused in cyclic polishing, and in particular, a reduction in the polishing rate of polishing using a polishing composition that is reused in cyclic polishing.
- the degree of suppression In the conventional cyclic polishing of the glass hard disk substrate, a decrease in the polishing rate, that is, low durability in the cyclic polishing has been a problem.
- the durability of the polishing composition in cyclic polishing can also be evaluated by the amount of change in pH before and after polishing as shown in the Examples.
- the polishing composition of the present invention contains silica particles.
- examples of the silica particles used in the polishing liquid composition of the present invention include colloidal silica particles, fumed silica particles, and surface-modified silica particles. From the viewpoint of improving the cleanliness of the substrate surface after polishing, colloidal silica is used. Particles are preferred. Moreover, as a usage form of a silica particle, it is preferable that it is a slurry form.
- the colloidal silica particles can be obtained by a water glass method in which alkali metal silicate such as sodium silicate is used as a raw material and subjected to a condensation reaction in an aqueous solution to grow the particles.
- colloidal silica particles can be obtained by an alkoxysilane method in which an alkoxysilane such as tetraethoxysilane is used as a raw material and grown by condensation reaction in water containing a water-soluble organic solvent such as alcohol.
- the fumed silica particles can be obtained by a vapor phase method in which a volatile silicon compound such as silicon tetrachloride is used as a raw material and is hydrolyzed and grown at a high temperature of 1000 ° C. or higher with an oxygen hydrogen burner.
- the average particle diameter of the silica particles is preferably 5 to 200 nm, more preferably 7 to 100 nm, and still more preferably 9 from the viewpoints of improving the polishing rate, improving the cleanliness of the substrate surface after polishing, and reducing the surface roughness. It is ⁇ 80 nm, still more preferably 10 to 50 nm.
- the average particle diameter of the silica particles was observed with a transmission electron microscope (TEM) trade name “JEM-2000FX” (80 kV, 1 to 50,000 times, manufactured by JEOL Ltd.) according to the instructions attached by the manufacturer. Then, take a TEM image, import this photograph as image data into a personal computer with a scanner, and use the analysis software “WinROOF ver. 3.6” (distributor: Mitani Corp.) to determine the equivalent circle diameter of each silica particle. It can be determined by calculating the average value after obtaining the particle diameter of 1,000 or more silica particles.
- TEM transmission electron microscope
- the silica particles used in the present invention are divided by 100 by dividing the area of a circle whose diameter is the maximum diameter of the silica particles obtained by observation with a transmission electron microscope (TEM) by the projected area of the silica particles.
- the average value of the multiplied values (see Japanese Patent No. 3253228, hereinafter referred to as “SF1”) is preferably in the range of 100 to 140, more preferably in the range of 100 to 135, and more preferably in the range of 100 to 130. More preferably, it is in the range.
- SF1 indicates that the closer to 100, the closer to a spherical shape.
- the silica particles used in the present invention are obtained by dividing the area of a circle having the circumference of the silica particles obtained by measurement by transmission electron microscope (TEM) observation as the circumference by the projected area of the silica particles.
- SF2 is preferably in the range of 100 to 130, more preferably in the range of 100 to 125, and more preferably in the range of 100 to 120. Is more preferably in the range of 100 to 115, still more preferably in the range of 100 to 110.
- SF2 represents that the surface is a smooth shape, so that it is close to 100.
- SF1 and SF2 As a measuring method of SF1 and SF2, for example, a transmission electron microscope “JEM-2000FX” (80 kV, 1 to 50,000 times) manufactured by JEOL Ltd. is used to observe a sample according to the instructions attached by the manufacturer of the microscope. Take a picture of the image, import the photograph as image data with a scanner, and measure the maximum diameter and projected area of each particle using analysis software "WinROOF ver. 3.6" (distributor: Mitani). SF1 can be obtained. In addition, SF2 can be obtained by measuring the circumference and projected area of one particle by the same method.
- JEM-2000FX 80 kV, 1 to 50,000 times
- the content of the silica particles in the polishing liquid composition of the present invention is preferably 1 to 20% by weight, more preferably 2 to 19% by weight in the polishing liquid composition from the viewpoint of improving the polishing rate and reducing the surface roughness. More preferably, it is 3 to 18% by weight, and still more preferably 5 to 16% by weight.
- the amine compound used in the present invention is an amine compound selected from the group consisting of amino alcohol, piperazine and derivatives thereof, from the viewpoint of achieving both improvement in polishing speed and cleanliness and from the viewpoint of improving durability in cyclic polishing.
- the nitrogen atom may be in any state of primary amine, secondary amine, and tertiary amine, but from the viewpoint of improving cleanliness and improving durability in cyclic polishing, at least one of them is a primary amine or Secondary amine.
- the amine compound contained in the polishing liquid composition of the present invention may be one type or two or more types.
- the amine compound may be in the form of a salt, and examples thereof include salts with inorganic acids such as hydrochloric acid, sulfuric acid and phosphoric acid, and organic acids.
- the reason why the cleaning property is improved by the polishing composition of the present invention is estimated as follows.
- the amine compound is adsorbed on the glass hard disk substrate, and the substrate surface is positively charged.
- amine compounds are also adsorbed to substances (silica particles, polishing debris, etc.) remaining on the substrate after polishing, and are positively charged.
- a repulsive force is generated between the glass hard disk substrate and the residue, and an effect of suppressing the adsorption of the residue appears. Therefore, it is thought that as the number of amines contained in the compound contained in the polishing composition increases, it becomes easier to be positively charged, and thus the cleanliness is improved. Tend to.
- the amine compound is strongly adsorbed on the glass hard disk substrate, so that the protective film effect is exhibited and the polishing rate is lowered. That is, in order to achieve both improvement in cleanliness and improvement in polishing rate, it is necessary to add a compound containing an optimal number of amines. Furthermore, the presence of the amine compound can suppress changes in pH due to the elution of alkali metal ions (especially sodium ions) from the glass hard disk substrate during polishing, so that the polishing rate can be maintained during cyclic polishing, that is, polishing. The durability of the liquid composition in cyclic polishing can be improved. However, these assumptions do not limit the present invention.
- Examples of the amine compound used in the present invention include 2-[(2-aminoethyl) amino] ethanol, 2,2 '-(ethylenebisimino) bisethanol, N- (2-hydroxyethyl) -N'. -(2-aminoethyl) ethylenediamine, 2,2 '-(2-aminoethylimino) diethanol, N1, N4-bis (hydroxyethyl) diethylenetriamine, N1, N7-bis (hydroxyethyl) diethylenetriamine, 1,3-diamino Amino alcohols such as -2-propanol; piperazine, 1-methylpiperazine, 3- (1-piperazinyl) -1-propanamine, 1- (2-aminoethyl) piperazine, 4-methylpiperazine-1-amine, 1- Piperazine methanamine, 4-ethyl-1-piperazineamine, 1-methyl-4 (2-Aminoethyl) piperazine, piperazine derivatives such as 1- (2-hydroxy
- the amine compound preferably has a vapor pressure at 25 ° C. of 0.2 mmHg or less, more preferably 0.1 mmHg or less, from the viewpoint of preventing off-flavor generation due to amine volatilization and the like and improving worker safety. is there.
- an amine compound for example, 2-[(2-aminoethyl) amino] ethanol, 1- (2-hydroxyethyl) piperazine, and 1- (2-aminoethyl) piperazine are preferable.
- the vapor pressure at 25 ° C. refers to the pressure of the vapor phase that is in equilibrium with the liquid phase or the solid phase at a constant temperature.
- the Handbook of Chemical Compound for Process Safety Author: Carl L Yaws, publishing: Gulf Publishing Company, or CRC Handbook of Chemistry and Physics 88th Edition (Author: Lide, DR, (ed)).
- the content of the amine compound in the polishing composition is preferably 0.001% by weight or more, more preferably 0.01% by weight or more, from the viewpoint of improving the cleanliness and improving the durability of the circulating polishing. More preferred is 0.05% by weight or more. From the viewpoint of improving the polishing rate, it is preferably 5% by weight or less, more preferably 4% by weight or less, further preferably 3% by weight or less, still more preferably 0.5% by weight or less, and further preferably 0.2% by weight or less. More preferred.
- the content of the amine compound in the polishing composition is preferably 0.001 to 5% by weight, more preferably 0.01 to 4% by weight, still more preferably 0.05 to 3% by weight, Is more preferably 0.5% by weight, even more preferably 0.05-0.2% by weight.
- content of the above-mentioned amine compound shows content of each amine compound, when the amine compound in polishing liquid composition has multiple types.
- the polishing composition of the present invention contains an acid.
- the acid may be in the form of a salt.
- the acid used in the polishing liquid composition of the present invention include nitric acid, sulfuric acid, sulfurous acid, persulfuric acid, hydrochloric acid, perchloric acid, phosphoric acid, phosphonic acid, phosphinic acid, pyrophosphoric acid, tripolyphosphoric acid, and amidosulfuric acid.
- Acids sulfur-containing organic acids such as methanedisulfonic acid, ethanedisulfonic acid, phenoldisulfonic acid, naphthalenedisulfonic acid; 2-aminoethylphosphonic acid, 1-hydroxyethylidene-1,1-diphosphonic acid, aminotri (methylenephosphonic acid), Ethylenediaminetetra (methylenephosphonic acid), diethylenetriaminepenta (methylenephosphonic acid), ethane-1,1, -diphosphonic acid, ethane-1,1,2-triphosphonic acid, ethane-1-hydroxy-1,1,2-triphosphonic Acid, ethane-1,2-dicarboxy-1,2-diphosphonic acid, methanehydride Phosphorus-containing organic acids such as xyphosphonic acid, 2-phosphonobutane-1,2-dicarboxylic acid, 1-phosphonobutane-2,3,4-tricarboxylic acid, ⁇ -methylphosphonosuccinic acid; mal
- sulfur-containing organic acids polyvalent carboxylic acids, monovalent carboxylic acids, and phosphorus-containing organic acids are used from the viewpoint of improving durability in cyclic polishing, as well as improving polishing speed, improving cleanliness, and reducing contamination of polishing waste liquid.
- phosphorus-containing inorganic acids are preferred. Specific examples include sulfur-containing organic acids such as methanedisulfonic acid, ethanedisulfonic acid, phenoldisulfonic acid, and naphthalenedisulfonic acid, malonic acid, oxalic acid, succinic acid, glutaric acid, adipic acid, maleic acid, fumaric acid, and itacone.
- Polycarboxylic acids such as acid, malic acid, tartaric acid, citric acid, isocitric acid, phthalic acid, nitrotriacetic acid, ethylenediaminetetraacetic acid, monovalent carboxylic acids such as acetic acid, propionic acid, benzoic acid, lactic acid, glycolic acid, hydroxy
- Examples include phosphorus-containing organic acids such as ethylidene-1,1-diphosphonic acid, phosphonobutanetricarboxylic acid, and ethylenediaminetetramethylenephosphonic acid, and phosphorus-containing inorganic acids such as phosphoric acid, phosphonic acid, phosphinic acid, pyrophosphoric acid, and tripolyphosphoric acid. It is done.
- an acid selected from the group consisting of a polyvalent carboxylic acid, a monovalent carboxylic acid, a phosphorus-containing organic acid, and a phosphorus-containing inorganic acid is preferable, more preferably a polyvalent carboxylic acid
- inorganic acids are preferable, phosphorus-containing inorganic acids are more preferable, and phosphoric acid is more preferable.
- These compounds may be used alone or in combination, and from the viewpoint of improving cleanliness, it is preferable to use a mixture of citric acid and phosphoric acid.
- a preferable mixing ratio (weight ratio) of citric acid and phosphoric acid is 0.05: 1 to 2.5: 1, more preferably 0.2: 1 to 2: 1.
- salts with metals, ammonium, alkylammonium and the like include metals belonging to the periodic table (long-period type) 1A, 1B, 2A, 2B, 3A, 3B, 4A, 6A, 7A, or Group 8.
- a salt with a metal belonging to Group 1A or ammonium is preferable from the viewpoint of improving the polishing rate and reducing the roughness.
- the content of the acid in the polishing composition of the present invention is preferably 0.05% by weight or more, more preferably 0.1% by weight or more, from the viewpoint of improving the polishing rate and from the viewpoint of improving durability in the circular polishing. More preferably, it is 0.15 weight% or more.
- the acid content is preferably 10% by weight or less, more preferably 7.5% by weight or less, and still more preferably 5% by weight or less because corrosion of the polishing apparatus can be further suppressed. Accordingly, the acid content is preferably 0.05 to 10% by weight, more preferably 0.1 to 7.5% by weight, and still more preferably 0.15 to 5% by weight.
- content of the above-mentioned acid shows content of each acid, when there are two or more types of acids in polishing liquid composition.
- the weight ratio of the amine compound to the acid (weight of amine compound / weight of acid) in the polishing composition of the present invention is from the viewpoint of improving the polishing rate and cleanliness, and from the viewpoint of improving durability in cyclic polishing. 0.001 to 1.0 is preferable, 0.005 to 0.5 is more preferable, and 0.01 to 0.1 is still more preferable.
- the water in the polishing composition is used as a medium, and distilled water, ion exchange water, pure water, ultrapure water, or the like can be used.
- the water content in the polishing composition of the present invention is preferably 55% by weight or more, more preferably 70% by weight or more, and even more preferably 80% by weight or more because the handling of the polishing composition becomes easier. Particularly preferred is 85% by weight or more.
- the water content is preferably 99% by weight or less, more preferably 98% by weight or less, and still more preferably 97% by weight or less, from the viewpoint of improving the polishing rate. Accordingly, the content of the medium is preferably 55 to 99% by weight, more preferably 70 to 98% by weight, still more preferably 80 to 97% by weight, and even more preferably 85 to 97% by weight.
- the pH of the polishing composition of the present invention can be appropriately adjusted by adjusting the contents of the amine compound and the acid.
- the pH of the polishing composition of the present invention is preferably 0.5 or more, more preferably 1.0 or more, still more preferably 1.5 or more, from the viewpoint of preventing corrosion of the polishing machine and improving worker safety. Even more preferably, it is 2.0 or more.
- 4.0 or less is preferable from a viewpoint of a polishing rate improvement, More preferably, it is 3.5 or less. Accordingly, the pH of the polishing composition is preferably from 0.5 to 4.0, more preferably from 1.0 to 3.5, still more preferably from 1.5 to 3.5, and even more preferably from 2.0 to 3.5.
- the polishing composition of the present invention may further contain a bactericidal agent, an antibacterial agent, a thickener, a dispersant, a rust inhibitor, and the like.
- the content of these components in the polishing liquid composition is preferably 5% by weight or less, more preferably 3% by weight or less, and still more preferably 1% by weight or less from the viewpoint of polishing characteristics.
- the polishing liquid composition of this invention can be prepared by mixing each component by a well-known method.
- the polishing composition is usually produced as a concentrated solution from the viewpoint of economy, and it is often diluted at the time of use.
- the polishing composition may be used as it is, or diluted if it is a concentrated solution.
- the dilution ratio is not particularly limited, and can be appropriately determined according to the concentration of each component in the concentrate (abrasive content, etc.), polishing conditions, and the like.
- the pH of the polishing composition may be adjusted to a predetermined pH after mixing the components, or may be adjusted before mixing.
- the pH can be adjusted with a pH adjusting agent.
- the manufacturing method of the glass hard disk substrate of the present invention includes a step of polishing the glass hard disk substrate using the polishing composition of the present invention.
- aluminosilicate glass, borosilicate glass, aluminoborosilicate glass, and sodium are replaced with potassium in the chemical strengthening step.
- an aluminosilicate glass substrate and an aluminosilicate glass in which sodium is substituted with potassium in the chemical strengthening step are preferable, and an aluminosilicate glass substrate is more preferable.
- the aluminosilicate glass substrate contains the most Si (silicon) as a constituent element other than O (oxygen), and then contains a large amount of Al.
- the Si content is 20 to 40% by weight
- the Al content is 3 to 25% by weight, and may contain other elements such as Na.
- the polishing rate is low.
- the Al content is more preferably 5 to 20% by weight, and even more preferably 7 to 15% by weight.
- the detail of the measurement conditions of content of Al contained in an aluminosilicate glass substrate is as showing in an Example.
- the glass hard disk substrate is, for example, from a process of obtaining a glass substrate by a mold press of molten glass or a method of cutting out from a sheet glass, a shape processing process, an end surface polishing process, a rough grinding process, a fine grinding process, a rough polishing process, and a finish polishing. It is manufactured through a process and a chemical strengthening process. The chemical strengthening step may be performed before the finish polishing step. In addition, a cleaning process may be included between the processes. And a glass hard disk substrate turns into a magnetic hard disk through a recording part formation process in a manufacturing method.
- the recording part forming step includes, for example, forming an adhesion layer, a soft magnetic layer, an underlayer, an intermediate layer, a magnetic layer, a protective layer, and a lubricating layer.
- the production method of the present invention may include these steps.
- alumina abrasive grains in the rough grinding step for example, about # 400 alumina abrasive grains in the rough grinding step, cylindrical grindstones in the shape processing step, brushes in the end surface polishing step, and # 1000 alumina in the fine grinding step.
- Abrasive grains are each used.
- the present invention is not limited to these.
- cerium oxide particles are suitably used as abrasive grains
- silica particles are suitably used as abrasive grains.
- the polishing composition of the present invention is preferably used in a final polishing step and / or a final (finish) polishing step.
- ultrasonic cleaning is performed in a cleaning tank containing an alkaline cleaner, a neutral cleaner, an acidic cleaner, or ultrapure water. Thereafter, there may be included a step of washing with ultrapure water, IPA (isopropyl alcohol), etc., drying while pulling up the substrate from ultrapure water or IPA, or drying by spin drying or the like.
- a scrub treatment may be included during the cleaning process.
- ⁇ Glass hard disk substrates are required to have a smooth surface that does not cause magnetic head read / write errors. That is, it is required that the substrate surface has good flatness (roughness, waviness, etc.) and that there are few defects (convex defects such as residues, concave defects such as scratches and pits) and is polished during the substrate manufacturing process. The process plays a role of improving the flatness of the substrate surface and removing defects. Therefore, the finish polishing step is particularly important in the polishing step.
- the polishing liquid composition of the present invention is supplied to the surface to be polished of the substrate to be polished, the polishing pad is brought into contact with the surface to be polished, and a predetermined pressure (load) is applied to the polishing pad or the substrate to be polished. This can be done by moving.
- a glass hard disk substrate polishing method described later can be referred to.
- polishing can be performed with a conventionally well-known grinding
- the substrate to be polished in the polishing step include a glass hard disk substrate immediately after the fine grinding step.
- the production method of the present invention preferably includes a step of circulating and polishing a glass hard disk substrate using the polishing composition of the present invention.
- the cyclic polishing is a method in which, in the polishing process of the glass hard disk substrate, the used polishing liquid is again put into the polishing machine, and the polishing liquid is circulated in the polishing machine and reused.
- the entire amount of the waste liquid after polishing may be recovered once and then re-entered into the polishing machine, or may be continuously re-introduced into the polishing machine while returning the waste liquid to the recovery tank.
- alkali metal ions contained in the glass hard disk substrate may be eluted.
- the present inventor Since the pH of the polishing liquid is increased when alkali ions are eluted, the present inventor has found that the polishing rate decreases when polishing is performed for a long time. At that time, when the acid and the amine compound are used in combination, the buffer capacity is increased, the decrease in the polishing rate is suppressed, and the cyclic polishing can be performed for a longer time.
- the number of times of reuse is not particularly limited, but the polishing composition of the present invention preferably uses the glass hard disk substrate 10 to 30 times, more preferably 20 times. Suitable for use when polishing up to 30 times.
- One polishing means one batch of polishing.
- the polishing apparatus used in the method for polishing a glass hard disk substrate using the polishing liquid composition of the present invention is not particularly limited, and a jig for holding the substrate to be polished.
- a polishing apparatus including a carrier (made of aramid or the like) and a polishing cloth (polishing pad) can be used. Among these, a double-side polishing apparatus is preferably used.
- the material of the polishing pad includes organic polymers, and examples of the organic polymer include polyurethane.
- the shape of the polishing pad is preferably a nonwoven fabric.
- a suede-like urethane hard pad is suitably used in the rough polishing process
- a suede-like urethane soft pad is suitably used in the final polishing process.
- the substrate to be polished is held by a carrier and sandwiched between a pair of polishing surface plates attached with a polishing pad, and the polishing liquid composition of the present invention is applied to the polishing pad and the substrate to be polished.
- polishing the polishing substrate by bringing the polishing composition of the present invention into contact with the substrate to be polished by moving the polishing platen and / or the substrate to be polished under a predetermined pressure.
- the polishing method of the present invention includes a step of polishing with a predetermined polishing load by causing the polishing composition to exist between a polishing pad and a substrate to be polished.
- the “polishing load” means a pressure applied to a surface to be polished of a substrate to be polished from a surface plate that sandwiches the substrate to be polished during polishing.
- the polishing load can be easily adjusted with a normal polishing apparatus.
- the polishing load can be adjusted by air pressure or weight load on a surface plate or a substrate to be polished.
- the polishing load is preferably 3 kPa or more, more preferably 4 kPa or more, further preferably 5 kPa or more, and further preferably 6 kPa or more. From the viewpoint that stable polishing can be performed so that vibration does not occur in the polishing machine during polishing, it is preferably 40 kPa or less, more preferably 30 kPa or less, still more preferably 20 kPa or less, and even more preferably 15 kPa or less.
- polishing load can be adjusted by the air pressure on the surface plate or the substrate or the load of the weight.
- the polishing method of the present invention is more preferably used in the final polishing step.
- the polishing method of the present invention preferably includes a step of circulating and polishing a glass hard disk substrate using the polishing composition of the present invention.
- the method of supplying the polishing liquid composition is a method of supplying the polishing liquid composition between the polishing pad and the glass hard disk substrate with a pump or the like in a state where the constituents of the polishing liquid composition are sufficiently mixed in advance, in a supply line immediately before polishing, etc.
- a method in which constituent components are mixed and supplied a method in which a slurry of silica particles and an aqueous solution containing an amine compound are separately supplied to a polishing apparatus can be used.
- the supply rate of the polishing composition is preferably 1.0 mL / min or less per 1 cm 2 of the substrate to be polished, more preferably 0.6 mL / min or less, and even more preferably 0.4 mL / min or less from the viewpoint of cost reduction. is there. Moreover, since the said supply rate can further improve a grinding
- the supply rate is preferably 0.01 to 1.0 mL / min per 1 cm 2 of the glass hard disk substrate, more preferably 0.025 to 0.6 mL / min, and still more preferably 0.05 to 0.4 mL / min. It is.
- the polishing composition can be reused in the case of cyclic polishing, the supply flow rate may be higher than the flow rate described above.
- Examples 1 to 10 and Comparative Examples 1 to 17 Preparation of Glass Hard Disk Substrate to be Polished An aluminosilicate glass substrate coarsely polished in advance with a polishing composition containing ceria abrasive grains was prepared as a glass hard disk substrate to be polished. The content of Si contained in the substrate was 27.1% by weight, and the content of Al was 8.6% by weight. The measurement was performed using the ESCA method under the following measurement conditions.
- Measurement equipment PHI Quantera SXM manufactured by ULVAC-PHI X-ray source: Monochromatic AlK ⁇ ray, 1486.6 eV, 25 W, 15 kV Beam diameter: 100 ⁇ m X-ray incident angle: 45 ° Measurement range: 500 ⁇ 500 ( ⁇ m 2 ) Pass energy: 280.0 (survey), 140.0 eV (narrow) Step size: 1.00 (survey), 0.250 eV (narrow) Measurement elements: C, N, O, Na, Mg, Al, Si, S, K, Ti, Zr, Nb Charging correction: Neutralizer and Ar + irradiation
- polishing liquid composition After adding acid (citric acid, phosphoric acid, glycolic acid, sulfuric acid or citric acid and phosphoric acid) to ion-exchanged water, the following amine compound was added to 0.1% by weight of the total weight of the polishing liquid. Further, colloidal silica particles (average particle size: 25 nm, SF1: 123, SF2: 109) were added so as to be 8% by weight of the total weight of the polishing liquid, and the pH was adjusted to 3.0. Polishing liquid compositions of Examples 1 to 10 and Comparative Examples 1 to 17 were obtained.
- acid citric acid, phosphoric acid, glycolic acid, sulfuric acid or citric acid and phosphoric acid
- the addition amount of a citric acid, phosphoric acid, a sulfuric acid, and glycolic acid was suitably adjusted so that pH after a mixing might be set to 3.0.
- the citric acid content in Examples 1 to 4, Example 10, Comparative Examples 1 to 11, and Comparative Example 16 was 0.5 to 2.5% by weight.
- the phosphoric acid contents of Examples 5 to 7 and Comparative Examples 12 to 14 were 0.1 to 1.0% by weight.
- the amount of citric acid in Example 8 and Comparative Example 15 was 0.1 to 1.0% by weight, and the content of phosphoric acid was 0.1 to 1.0% by weight.
- the content of sulfuric acid in Comparative Example 17 was 0.1 to 0.3% by weight.
- the glycolic acid content of Example 9 was 0.2 to 1.0% by weight.
- Example 8 and Comparative Example 15 was 1.7: 1.0.
- the amine compounds in the polishing liquid compositions of Examples 1 to 10 and Comparative Examples 1 to 17 are as shown below.
- Examples 1 and 5 2-[(2-aminoethyl) amino] ethanol (manufactured by Nippon Emulsifier Co., Ltd.)
- Examples 2, 6, 8, 9, 10 1- (2-hydroxyethyl) piperazine (manufactured by Nippon Emulsifier Co., Ltd.)
- Examples 3 and 7 1- (2-aminoethyl) piperazine (manufactured by Tosoh Corporation)
- Example 4 Piperazine (Wako Pure Chemical Industries, Ltd.) Comparative Examples 1, 12, 15 to 17: None Comparative Example 2, 13: Acrylic acid / acrylamido-2-methylpropanesulfonic acid copolymer sodium salt (copolymerization molar ratio 89/11, weight average molecular weight 2,000,
- Polishing Method Polishing using the polishing liquid compositions of Examples 1 to 9 and Comparative Examples 1 to 15 was performed under the conditions of the following standard polishing test.
- Polishing tester "Fast double-sided 9B polishing machine” manufactured by Speedfam Polishing pad: Suede type (thickness 0.9mm, average hole diameter 30 ⁇ m)
- Polishing liquid composition supply amount 100 mL / min (supply rate per 1 cm 2 of substrate to be polished: about 0.3 mL / min)
- Carrier Aramid, thickness 0.45mm Polishing time: 20 minutes
- Polished substrate aluminosilicate glass substrate (outer diameter 65 mm, inner diameter 20 mm, thickness 0.635 mm)
- Example 10 and Comparative Examples 16 and 17 the following cyclic polishing test was performed to evaluate the circulation durability of the polishing composition.
- [Circulating polishing test] While supplying the polishing liquid from the polishing liquid supply container charged with 500 mL of polishing liquid to the polishing machine, the polishing waste liquid discharged after polishing is returned to the polishing liquid supply container so that the polishing liquid is supplied to the polishing machine again. Polishing was performed.
- the polishing conditions in the cyclic polishing test are the same as the above-mentioned [Polishing conditions].
- the first batch is polished for 20 minutes using 500 ml of the prepared polishing liquid. During polishing, the polishing liquid that has been polished once returns to the container. It was mixed with the liquid and used for polishing.
- the second and third batches were also subjected to cyclic polishing using the polishing liquid used in the previous batch without newly preparing a polishing liquid.
- the polishing liquid compositions of Examples 1 to 9 exhibited an excellent polishing rate and cleanliness as compared with Comparative Examples 1 to 15, and further exhibited excellent circulation durability. Moreover, as shown in the said Table 2, the polishing liquid composition of Example 10 suppressed the fall of the grinding
- polishing composition of the present invention both high polishing speed and high cleanliness can be realized in the polishing process of the glass hard disk substrate, and high polishing speed can be maintained for a long time in cyclic polishing. Therefore, the polishing composition of the present invention is useful in the production of a glass hard disk substrate.
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Abstract
Description
本明細書において清浄性とは研磨工程において基板表面に残留する物質を除去する性能を指す。研磨後に基板表面に残留する物質には、例えば砥粒、研磨中に発生する研磨クズ、研磨パッドのカス、ステンレスなどの研磨機に使用される部材などが挙げられる。本発明の研磨液組成物を用いて研磨すれば研磨後の基板表面の清浄性が向上し、磁気ヘッドの浮上高さが低減でき、ガラスハードディスク基板の記録容量増大が可能となる。
本明細書において循環研磨における耐久性とは、循環研磨において再利用される研磨液組成物の性能をいい、とりわけ、循環研磨において再利用される研磨液組成物を用いた研磨の研磨速度の低下の抑制の程度をいう。従来のガラスハードディスク基板の循環研磨においては、研磨速度の低下、すなわち、循環研磨における耐久性の低さが問題となっていた。研磨液組成物の循環研磨における耐久性は、実施例に示す通り、研磨前後のpHの変化量で評価することもできる。
本発明の研磨液組成物はシリカ粒子を含有する。本発明の研磨液組成物で使用されるシリカ粒子は、コロイダルシリカ粒子、ヒュームドシリカ粒子、表面修飾したシリカ粒子等が挙げられるが、研磨後の基板表面の清浄性向上の観点から、コロイダルシリカ粒子が好ましい。また、シリカ粒子の使用形態としては、スラリー状であるのが好ましい。
本発明で使用されるアミン化合物は、研磨速度及び清浄性の向上の両立の観点、並びに循環研磨における耐久性向上の観点から、アミノアルコール並びにピペラジン及びその誘導体からなる群から選択されるアミン化合物であり、その分子内に窒素原子を2又は3個有する。窒素原子は、1級アミン、2級アミン及び3級アミンのいずれの状態でも構わないが、清浄性の向上の観点、循環研磨における耐久性向上の観点から、そのうち少なくとも1個は1級アミンもしくは2級アミンである。本発明の研磨液組成物に含有されるアミン化合物は、一種類でもよく、二種類以上でもよい。また、本発明において、アミン化合物は、塩の形態であってもよく、例えば、塩酸、硫酸、リン酸等の無機酸、有機酸等との塩が挙げられる。
本発明の研磨液組成物は酸を含有する。本発明において、酸は塩の形態であってもよい。本発明の研磨液組成物に使用される酸としては、硝酸、硫酸、亜硫酸、過硫酸、塩酸、過塩素酸、リン酸、ホスホン酸、ホスフィン酸、ピロリン酸、トリポリリン酸、アミド硫酸等の無機酸; メタンジスルホン酸、エタンジスルホン酸、フェノールジスルホン酸、ナフタレンジスルホン酸等の含硫黄有機酸; 2-アミノエチルホスホン酸、1-ヒドロキシエチリデン-1,1-ジホスホン酸、アミノトリ(メチレンホスホン酸)、エチレンジアミンテトラ(メチレンホスホン酸)、ジエチレントリアミンペンタ(メチレンホスホン酸)、エタン-1,1,-ジホスホン酸、エタン-1,1,2-トリホスホン酸、エタン-1-ヒドロキシ-1,1,2-トリホスホン酸、エタン-1,2-ジカルボキシ-1,2-ジホスホン酸、メタンヒドロキシホスホン酸、2-ホスホノブタン-1,2-ジカルボン酸、1-ホスホノブタン-2,3,4-トリカルボン酸、α-メチルホスホノコハク酸等の含リン有機酸; マロン酸、シュウ酸、コハク酸、グルタル酸、アジピン酸、マレイン酸、フマル酸、イタコン酸、リンゴ酸、酒石酸、クエン酸、イソクエン酸、フタル酸、ニトロトリ酢酸、ニトロ酢酸、エチレンジアミンテトラ酢酸、オキサロ酢酸等の多価カルボン酸; 酢酸、プロピオン酸、安息香酸、乳酸、グリコール酸、等の1価カルボン酸; グルタミン酸、ピコリン酸、アスパラギン酸等のアミノカルボン酸等が挙げられる。これらの化合物は単独で用いてもよいし、混合して用いてもよい。中でも、循環研磨における耐久性向上の観点、並びに、研磨速度向上、清浄性向上、及び研磨廃液の汚染低減の観点から、含硫黄有機酸、多価カルボン酸、1価カルボン酸、含リン有機酸、及び含リン無機酸が好ましい。その具体例としては、メタンジスルホン酸、エタンジスルホン酸、フェノールジスルホン酸、ナフタレンジスルホン酸等の含硫黄有機酸、マロン酸、シュウ酸、コハク酸、グルタル酸、アジピン酸、マレイン酸、フマル酸、イタコン酸、リンゴ酸、酒石酸、クエン酸、イソクエン酸、フタル酸、ニトロトリ酢酸、エチレンジアミンテトラ酢酸等の多価カルボン酸、酢酸、プロピオン酸、安息香酸、乳酸、グリコール酸、等の1価カルボン酸、ヒドロキシエチリデン-1,1-ジホスホン酸、ホスホノブタントリカルボン酸、エチレンジアミンテトラメチレンホスホン酸等の含リン有機酸、リン酸、ホスホン酸、ホスフィン酸、ピロリン酸、トリポリリン酸等の含リン無機酸等が挙げられる。これらの中でも循環研磨における耐久性向上の観点から多価カルボン酸、1価カルボン酸、含リン有機酸及び含リン無機酸からなる群から選択される酸が好ましく、より好ましくは多価カルボン酸、1価カルボン酸、及び含リン無機酸からなる群から選択される酸であり、さらにより好ましくは多価カルボン酸、及び1価カルボン酸からなる群から選択される酸であり、さらにより好ましくはコハク酸、リンゴ酸、酒石酸、クエン酸、グリコール酸、含リン無機酸であり、クエン酸、リン酸、グリコール酸、ホスホン酸、ホスフィン酸、ピロリン酸、トリポリリン酸がさらにより好ましく、クエン酸、グリコール酸がさらにより好ましい。また、研磨速度向上、清浄性向上、及び研磨廃液の汚染低減の観点から、無機酸が好ましく、含リン無機酸がより好ましく、リン酸がさらに好ましい。これらの化合物は単独で用いてもよいし、混合して用いてもよく、清浄性向上の観点から、クエン酸とリン酸を混合して用いることが好ましい。クエン酸とリン酸の好ましい混合比(重量比)としては0.05:1~2.5:1、より好ましくは0.2:1~2:1である。
研磨液組成物中の水は、媒体として使用されるものであり、蒸留水、イオン交換水、純水及び超純水等が使用され得る。本発明の研磨液組成物中の水の含有量は、研磨液組成物の取扱いがさらに容易になるため、55重量%以上が好ましく、より好ましくは70重量%以上、さらに好ましくは80重量%以上、特に好ましくは85重量%以上である。また、前記水の含有量は、研磨速度向上の観点から、99重量%以下が好ましく、より好ましくは98重量%以下、さらに好ましくは97重量%以下である。したがって、前記媒体の含有量は、55~99重量%が好ましく、より好ましくは70~98重量%、さらに好ましくは80~97重量%、さらにより好ましくは85~97重量%である。
本発明の研磨液組成物のpHは、前記アミン化合物及び前記酸の含有量を調整することにより適宜調整することができる。本発明の研磨液組成物のpHは、研磨機の腐食防止及び作業者の安全性向上の観点から、0.5以上が好ましく、より好ましくは1.0以上、さらに好ましくは1.5以上、さらにより好ましくは2.0以上である。また、研磨速度向上の観点から、4.0以下が好ましく、より好ましくは3.5以下である。したがって、研磨液組成物のpHは、0.5~4.0が好ましく、より好ましくは1.0~3.5、さらに好ましくは1.5~3.5、さらにより好ましくは2.0~3.5である。
本発明の研磨液組成物は、さらに、殺菌剤、抗菌剤、増粘剤、分散剤、防錆剤等を含んでもよい。これらの成分の研磨液組成物中の含有量は、研磨特性の観点から、5重量%以下が好ましく、より好ましくは3重量%以下、さらに好ましくは1重量%以下である。
本発明の研磨液組成物は、各成分を公知の方法で混合することにより、調製することができる。研磨液組成物は、経済性の観点から、通常、濃縮液として製造され、これを使用時に希釈する場合が多い。前記研磨液組成物は、そのまま使用してもよいし、濃縮液であれば希釈して使用すればよい。濃縮液を希釈する場合、その希釈倍率は、特に制限されず、前記濃縮液における各成分の濃度(研磨材の含有量等)や研磨条件等に応じて適宜決定できる。
本発明のガラスハードディスク基板の製造方法(以下、「本発明の製造方法」ともいう。)は、本発明の研磨液組成物を用いてガラスハードディスク基板を研磨する工程を含む。
本明細書において循環研磨とは、ガラスハードディスク基板の研磨工程において、使用した研磨液を再度研磨機に投入し、研磨液を研磨機内で循環させて再利用する手法である。研磨後の廃液を一度全量回収してから研磨機に再投入しても良いし、廃液を回収タンクに戻しながら連続的に研磨機に再投入しても良い。ガラスハードディスク基板を酸性の研磨液を用いて研磨する際には、ガラスハードディスク基板に含有されているアルカリ金属イオンが溶出することがある。アルカリイオンが溶出すると研磨液のpHが上昇してしまうため、長時間研磨をしていると研磨速度が低下してくることを本発明者は見出した。その際、前述の酸とアミン化合物を併用すると、緩衝能が増大して、研磨速度の低下を抑制し、より長時間の循環研磨が可能となる。
本発明の研磨液組成物を用いてガラスハードディスク基板を研磨する方法(以下、「本発明の研磨方法」ともいう。)で用いる研磨装置としては、特に制限はなく、被研磨基板を保持する冶具(キャリア:アラミド製等)と研磨布(研磨パッド)とを備える研磨装置を用いることができる。中でも、両面研磨装置が好適に用いられる。
1.被研磨ガラスハードディスク基板の調製
セリア砥粒を含有する研磨液組成物であらかじめ粗研磨したアルミノ珪酸ガラス基板を被研磨ガラスハードディスク基板として用意した。基板中に含まれるSiの含有量は27.1重量%、Alの含有量は8.6重量%であり、ESCA法を用い以下の測定条件で測定した。
・試料作製
アルミノ珪酸ガラス基板を1cm×1cmに切断し、カーボン製両面テープ上に乗せ固定した。表面のゴミ等を除くためにArスパッタを加速電圧2kVで6分間かけ、ESCA測定を実施した。
・測定
機器:アルバックファイ製 PHI Quantera SXM
X線源:単色化AlKα線、1486.6eV、25W、15kV
ビーム径:100μm
X線入射角:45°
測定範囲:500×500(μm2)
Pass energy:280.0(survey)、140.0eV(narrow)
Step size:1.00(survey)、0.250eV(narrow)
測定元素:C,N,O,Na,Mg,Al,Si,S,K,Ti,Zr,Nb
帯電補正:Neutralizer及びAr+照射
イオン交換水に酸(クエン酸、リン酸、グリコール酸、硫酸又はクエン酸及びリン酸)を添加した後、下記のアミン化合物を研磨液総重量の0.1重量%になるようにそれぞれ添加し、さらにコロイダルシリカ粒子(平均粒子径:25nm、SF1:123、SF2:109)を研磨液総重量の8重量%になるよう添加し、pHを3.0に調整して実施例1~10及び比較例1~17の研磨液組成物を得た。なお、クエン酸、リン酸、硫酸、及びグリコール酸の添加量は、配合後のpHが3.0になるように適宜調整した。実施例1~4、実施例10、比較例1~11、比較例16のクエン酸の含有量は0.5~2.5重量%であった。実施例5~7、比較例12~14のリン酸の含有量は0.1~1.0重量%であった。実施例8、比較例15のクエン酸の配合量は0.1~1.0重量%、リン酸の含有量は0.1~1.0重量%であった。比較例17の硫酸の含有量は0.1~0.3重量%であった。実施例9のグリコール酸の含有量は0.2~1.0重量%であった。また、実施例8及び比較例15における、クエン酸とリン酸との混合比(重量比)は、1.7:1.0であった。実施例1~10及び比較例1~17の研磨液組成物におけるアミン化合物は以下に示すとおりである。
実施例1,5 :2‐[(2‐アミノエチル)アミノ]エタノール(日本乳化剤社製)
実施例2,6,8,9,10:1‐(2‐ヒドロキシエチル)ピペラジン(日本乳化剤社製)
実施例3,7 :1‐(2‐アミノエチル)ピペラジン(東ソー社製)
実施例4 :ピペラジン(和光純薬工業社製)
比較例1,12,15~17:なし
比較例2,13 :アクリル酸/アクリルアミド-2-メチルプロパンスルホン酸共重合体ナトリウム塩(共重合モル比89/11、重量平均分子量2,000、東亞合成社製)
比較例3 :エチルアミン(和光純薬工業社製)
比較例4 :ジエチルアミン(和光純薬工業社製)
比較例5 :トリエチルアミン(和光純薬工業社製)
比較例6 :トリエチレンテトラアミン(東ソー社製)
比較例7 :テトラエチレンペンタアミン(東ソー社製)
比較例8,14 :モノエタノールアミン(シグマアルドリッチ社製)
比較例9 :ピペリジン(和光純薬工業社製)
比較例10 :ポリエチレンイミン(SP-003、分子量300、日本触媒社製)
比較例11 :エチレンジアミン四酢酸塩(シグマアルドリッチ社製)
シリカ粒子の平均粒子径、シリカ粒子のSF1及びSF2の測定は、以下のように行った。
コロイダルシリカを含む試料を、透過型電子顕微鏡「JEM-2000FX」(80kV、1~5万倍、日本電子社製)により当該製造業者が添付した説明書に従って試料を観察し、TEM(Transmission Electron Microscope)像を写真撮影した。この写真をスキャナで画像データとしてパソコンに取り込み、解析ソフト「WinROOF ver.3.6」(販売元:三谷商事)を用いて、個々のシリカ粒子の円相当径を計測し、粒子径を求めた。このようにして、1000個のシリカ粒子の粒子径を求めた後、これらの平均値を算出し、この平均値を平均粒子径とした。
コロイダルシリカを含む試料を、上記平均粒子径の測定方法と同様の方法によりTEM像を写真撮影し、この写真をスキャナで画像データとしてパソコンに取り込み、上記と同様の解析ソフトを用いて、粒子一個の最大径と投影面積を計測し、SF1を算出した。このようにして、100個のシリカ粒子のSF1を求めた後、これらの平均値を算出し、この平均値をSF1とした。SF2の場合は、上記と同様の解析ソフトを用いて、粒子一個の周長と投影面積を計測し、SF2を算出した。このようにして、100個のシリカ粒子のSF2を求めた後、これらの平均値を算出し、この平均値をSF2とした。
実施例1~9、比較例1~15の研磨液組成物を用いた研磨は、下記の標準研磨試験の条件で行った。
〔研磨条件〕
研磨試験機:スピードファム社製「両面9B研磨機」
研磨パッド:スウェードタイプ(厚さ0.9mm、平均開孔径30μm)
研磨液組成物供給量:100mL/分(被研磨基板1cm2あたりの供給速度:約0.3mL/分)
下定盤回転数:32.5rpm
研磨荷重:8.4kPa
キャリア:アラミド製、厚さ0.45mm
研磨時間:20分
被研磨基板:アルミノ珪酸ガラス基板(外径65mm、内径20mm、厚さ0.635mm)
投入基板枚数:10枚
リンス条件:荷重=2.0kPa、時間=2分、イオン交換水供給量=約2L/分
〔循環研磨試験〕
研磨液500mLを仕込んだ研磨液供給容器から研磨機へ研磨液を供給し、研磨した後に排出される研磨廃液を前記研磨液供給容器に戻し、研磨液が研磨機に再度供給されるようにしながら研磨を行った。循環研磨試験における研磨条件は前述の〔研磨条件〕と同様である。1バッチ目は仕込み研磨液量500mlを用いて20分研磨するが、研磨中には一度研磨された研磨液も容器に戻るため、1バッチ目の研磨中も、戻った研磨液が仕込みの研磨液と混合され、研磨に使用された。2バッチ目、3バッチ目も研磨液を新しく調製することなく、前のバッチで使用した研磨液を使用して循環研磨を行った。
研磨速度、循環耐久性、基板清浄性、及びアミン臭の評価は、以下のように行った。
研磨前後の基板の重量差(g)を該基板の密度(2.46g/cm3)、基板の表面積(30.04cm2)、及び研磨時間(分)で除した単位時間当たりの研磨量を計算し、研磨速度(μm/分)を算出した。その結果を、下記表1に、比較例1を100とした相対値として示す。
上記の研磨方法でガラスハードディスク基板を研磨する際の、研磨前の研磨液組成物のpH及び研磨後の廃液のpHをpHメーター(東亜電波工業(株)製、ガラス式水素イオン濃度指数計「HM-30G」を用いて測定し、研磨前後のpHの差を研磨中のpH変化値として算出し、循環研磨における耐久性の評価とした。なお、pH変化値が正の数である場合、pHが増加したことを示す。その結果を、下記表1に示す。
前述の循環研磨試験により得られた1~3バッチの各基板における研磨速度を算出した。結果を下記表2に、比較例16の1バッチ目の研磨速度を100とした相対値として示す。なお、研磨速度の測定方法は、前述の測定方法と同様であり、相対研磨速度100は、0.63mg/分であった。また、研磨(バッチ)前後のpH変化を上述の〔循環耐久の評価1〕と同様に算出した。その結果を下記表2に示す。
ガラスハードディスク基板を研磨・洗浄・乾燥した後、下記に示す方法で基板上に残留したパーティクル数を測定した。
測定機器:KLA Tencor社製、OSA6100
評価:前述の研磨方法により研磨した基板10枚のうち、無作為に4枚を選択し、各々の基板を10000rpmにてレーザーを照射して突起欠陥を測定した。その4枚の基板の各々両面にある突起欠陥数(個)の合計を8で除して、基板面当たりのパーティクル数として算出した。その結果を、下記表1に、比較例1を100とした相対値として示す。
表1に示す各研磨液組成物について、室温条件において、3名のパネラーによる官能評価により以下の評価基準に従ってアミン臭を評価した。
〔評価基準〕
N:アミン臭ほとんど無し
D:アミン臭有り
Claims (19)
- アミン化合物と、酸と、シリカ粒子と、水とを含有するガラスハードディスク基板用研磨液組成物であって、前記アミン化合物は、アミノアルコール並びにピペラジン及びその誘導体からなる群から選択され、分子内に窒素原子を2個又は3個有し、そのうち少なくとも1個は1級アミンもしくは2級アミンである、ガラスハードディスク基板用研磨液組成物。
- 前記アミン化合物が、2‐[(2‐アミノエチル)アミノ]エタノール、2,2′‐(エチレンビスイミノ)ビスエタノール、N‐(2‐ヒドロキシエチル)‐N′‐(2‐アミノエチル)エチレンジアミン、2,2′‐(2‐アミノエチルイミノ)ジエタノール、N1,N4‐ビス(ヒドロキシエチル)ジエチレントリアミン、N1,N7‐ビス(ヒドロキシエチル)ジエチレントリアミン、1,3‐ジアミノ‐2‐プロパノール、ピペラジン、1‐メチルピペラジン、3‐(1‐ピペラジニル)‐1‐プロパンアミン、1‐(2‐アミノエチル)ピペラジン、4‐メチルピペラジン‐1‐アミン、1‐ピペラジンメタンアミン、4‐エチル‐1‐ピペラジンアミン、1‐メチル‐4‐(2‐アミノエチル)ピペラジン、及び1‐(2‐ヒドロキシエチル)ピペラジンからなる群から選択される、請求項1記載のガラスハードディスク基板用研磨液組成物。
- 前記アミン化合物が、2‐[(2‐アミノエチル)アミノ]エタノール、1‐(2‐アミノエチル)ピペラジン、及び1‐(2‐ヒドロキシエチル)ピペラジンからなる群から選択される、請求項1又は2に記載のガラスハードディスク基板用研磨液組成物。
- 前記酸が、多価カルボン酸、一価カルボン酸、含リン有機酸、及び含リン無機酸からなる群から選択される酸である、請求項1から3のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記酸が、多価カルボン酸、及び一価カルボン酸からなる群から選択される酸である、請求項1から4のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記アミン化合物の25℃における蒸気圧が、0.2mmHg以下である、請求項1から5のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記研磨液組成物のpHが、0.5~4.0である、請求項1から6のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記シリカ粒子が、コロイダルシリカ粒子である、請求項1から7のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記シリカ粒子の平均粒子径が、5~200nmである、請求項1から8のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記研磨液組成物中における前記アミン化合物の含有量が、0.001~5重量%である、請求項1から9のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記研磨液組成物中における前記酸の含有量が、0.05~10重量%である、請求項1から10のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記研磨液組成物中における前記シリカ粒子の含有量が、1~20重量%である、請求項1から11のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記研磨液組成物中における前記アミン化合物と前記酸の重量比(アミン化合物の重量/酸の重量)が、0.001~1.0である、請求項1から12のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 前記ガラスハードディスク基板が、アルミノ珪酸ガラス基板である、請求項1から13のいずれかに記載のガラスハードディスク基板用研磨液組成物。
- 請求項1から14のいずれかに記載の研磨液組成物を用いてガラスハードディスク基板を循環研磨する工程を含む、ガラスハードディスク基板の製造方法。
- 前記研磨液組成物の供給速度が、ガラスハードディスク基板1cm2あたり0.01~1.0mL/分である、請求項15記載のガラスハードディスク基板の製造方法。
- 前記循環研磨における研磨荷重が、3~40kPaである、請求項15又は16に記載のガラスハードディスク基板の製造方法。
- 前記ガラスハードディスク基板が、アルミノ珪酸ガラス基板である、請求項15から17のいずれかに記載のガラスハードディスク基板の製造方法。
- 請求項1から14のいずれかに記載の研磨液組成物を用いてガラスハードディスク基板を循環研磨する工程を含む、ガラスハードディスク基板の研磨方法。
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