WO2009072492A1 - 感光性接着剤 - Google Patents
感光性接着剤 Download PDFInfo
- Publication number
- WO2009072492A1 WO2009072492A1 PCT/JP2008/071882 JP2008071882W WO2009072492A1 WO 2009072492 A1 WO2009072492 A1 WO 2009072492A1 JP 2008071882 W JP2008071882 W JP 2008071882W WO 2009072492 A1 WO2009072492 A1 WO 2009072492A1
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- WO
- WIPO (PCT)
- Prior art keywords
- photosensitive adhesive
- patterned
- adhesive
- exposure
- development
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
- C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
- C08G65/3322—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof acyclic
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
- C08G65/33303—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group
- C08G65/33306—Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group acyclic
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- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
- C09J171/02—Polyalkylene oxides
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- H—ELECTRICITY
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2924/351—Thermal stress
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Materials For Photolithography (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Die Bonding (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08856532A EP2224483A1 (en) | 2007-12-04 | 2008-12-02 | Photosensitive adhesive |
US12/745,592 US8258017B2 (en) | 2007-12-04 | 2008-12-02 | Photosensitive adhesive |
CN200880119113.6A CN101884104B (zh) | 2007-12-04 | 2008-12-02 | 感光性粘接剂 |
JP2009544676A JPWO2009072492A1 (ja) | 2007-12-04 | 2008-12-02 | 感光性接着剤 |
US13/551,816 US8507323B2 (en) | 2007-12-04 | 2012-07-18 | Method of producing semiconductor device with patterned photosensitive adhesive |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007313886 | 2007-12-04 | ||
JP2007-313886 | 2007-12-04 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/745,592 A-371-Of-International US8258017B2 (en) | 2007-12-04 | 2008-12-02 | Photosensitive adhesive |
US13/551,816 Division US8507323B2 (en) | 2007-12-04 | 2012-07-18 | Method of producing semiconductor device with patterned photosensitive adhesive |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009072492A1 true WO2009072492A1 (ja) | 2009-06-11 |
Family
ID=40717670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/071882 WO2009072492A1 (ja) | 2007-12-04 | 2008-12-02 | 感光性接着剤 |
Country Status (7)
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US (2) | US8258017B2 (ja) |
EP (1) | EP2224483A1 (ja) |
JP (3) | JPWO2009072492A1 (ja) |
KR (1) | KR20100074296A (ja) |
CN (2) | CN101884104B (ja) |
TW (1) | TW200938606A (ja) |
WO (1) | WO2009072492A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2011001942A1 (ja) * | 2009-06-30 | 2011-01-06 | 日立化成工業株式会社 | 感光性接着剤、並びにそれを用いたフィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置 |
JP2011116968A (ja) * | 2009-10-30 | 2011-06-16 | Hitachi Chem Co Ltd | 感光性接着剤組成物、並びにそれを用いたフィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、接着剤層付透明基板、及び半導体装置。 |
CN102687256A (zh) * | 2009-11-13 | 2012-09-19 | 日立化成工业株式会社 | 膜状粘接剂的制造方法、粘接片和半导体装置及其制造方法 |
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KR20110002500A (ko) | 2005-07-05 | 2011-01-07 | 히다치 가세고교 가부시끼가이샤 | 감광성 접착제, 및 이것을 이용하여 얻어지는 접착 필름, 접착 시트, 접착제층 부착 반도체 웨이퍼, 반도체장치 및 전자부품 |
US8074714B2 (en) * | 2009-06-17 | 2011-12-13 | Baker Hughes Incorporated | System, method and apparatus for downhole orientation probe sensor |
WO2011132647A1 (ja) * | 2010-04-19 | 2011-10-27 | 日東電工株式会社 | フリップチップ型半導体裏面用フィルム |
KR20120082714A (ko) * | 2011-01-14 | 2012-07-24 | 삼성엘이디 주식회사 | 발광소자용 접착필름 및 이를 이용한 발광다이오드 패키지 제조방법 |
DE102011085038A1 (de) * | 2011-10-21 | 2013-04-25 | Tesa Se | Verfahren zur Kapselung einer elektronischen Anordnung |
AU2013329253B2 (en) * | 2012-10-09 | 2017-02-23 | Avery Dennison Corporation | Adhesives and related methods |
US9176089B2 (en) | 2013-03-29 | 2015-11-03 | Stmicroelectronics Pte Ltd. | Integrated multi-sensor module |
US9082681B2 (en) * | 2013-03-29 | 2015-07-14 | Stmicroelectronics Pte Ltd. | Adhesive bonding technique for use with capacitive micro-sensors |
US9618653B2 (en) | 2013-03-29 | 2017-04-11 | Stmicroelectronics Pte Ltd. | Microelectronic environmental sensing module |
US9000542B2 (en) | 2013-05-31 | 2015-04-07 | Stmicroelectronics Pte Ltd. | Suspended membrane device |
US10428253B2 (en) * | 2013-07-16 | 2019-10-01 | Hitachi Chemical Company, Ltd | Photosensitive resin composition, film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, and semiconductor device |
JP6270024B2 (ja) * | 2013-10-04 | 2018-01-31 | 日立化成株式会社 | 感光性接着剤組成物、それを用いる半導体装置の製造方法、及び半導体装置 |
JP6314416B2 (ja) * | 2013-10-17 | 2018-04-25 | 富士電機株式会社 | 半導体装置 |
US10429330B2 (en) | 2016-07-18 | 2019-10-01 | Stmicroelectronics Pte Ltd | Gas analyzer that detects gases, humidity, and temperature |
US10254261B2 (en) | 2016-07-18 | 2019-04-09 | Stmicroelectronics Pte Ltd | Integrated air quality sensor that detects multiple gas species |
KR102576813B1 (ko) * | 2016-10-07 | 2023-09-11 | 삼성전자주식회사 | 터치스크린 디스플레이 및 이를 포함하는 전자 장치 |
US10557812B2 (en) | 2016-12-01 | 2020-02-11 | Stmicroelectronics Pte Ltd | Gas sensors |
JP6811664B2 (ja) * | 2017-03-24 | 2021-01-13 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
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JPH1124257A (ja) | 1997-07-04 | 1999-01-29 | Hitachi Chem Co Ltd | 感光性ポリイミド前駆体組成物及びそれを用いたパターン製造法 |
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2008
- 2008-12-02 EP EP08856532A patent/EP2224483A1/en not_active Withdrawn
- 2008-12-02 US US12/745,592 patent/US8258017B2/en not_active Expired - Fee Related
- 2008-12-02 WO PCT/JP2008/071882 patent/WO2009072492A1/ja active Application Filing
- 2008-12-02 CN CN200880119113.6A patent/CN101884104B/zh not_active Expired - Fee Related
- 2008-12-02 KR KR1020107011104A patent/KR20100074296A/ko not_active Application Discontinuation
- 2008-12-02 CN CN2012102808678A patent/CN102915932A/zh active Pending
- 2008-12-02 JP JP2009544676A patent/JPWO2009072492A1/ja active Pending
- 2008-12-04 TW TW097147133A patent/TW200938606A/zh unknown
-
2012
- 2012-07-18 US US13/551,816 patent/US8507323B2/en not_active Expired - Fee Related
- 2012-09-06 JP JP2012196277A patent/JP5758362B2/ja not_active Expired - Fee Related
-
2014
- 2014-06-26 JP JP2014131514A patent/JP2014220509A/ja active Pending
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2011001942A1 (ja) * | 2009-06-30 | 2011-01-06 | 日立化成工業株式会社 | 感光性接着剤、並びにそれを用いたフィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置 |
CN102471664A (zh) * | 2009-06-30 | 2012-05-23 | 日立化成工业株式会社 | 感光性粘接剂、以及使用该粘接剂的膜状粘接剂、粘接片、粘接剂图形、带有粘接剂层的半导体晶片和半导体装置 |
JP5549671B2 (ja) * | 2009-06-30 | 2014-07-16 | 日立化成株式会社 | 感光性接着剤、並びにそれを用いたフィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ及び半導体装置 |
JP2011116968A (ja) * | 2009-10-30 | 2011-06-16 | Hitachi Chem Co Ltd | 感光性接着剤組成物、並びにそれを用いたフィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、接着剤層付透明基板、及び半導体装置。 |
US9309446B2 (en) | 2009-10-30 | 2016-04-12 | Hitachi Chemical Company, Ltd. | Photosensitive adhesive composition, film-like adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device |
CN102687256A (zh) * | 2009-11-13 | 2012-09-19 | 日立化成工业株式会社 | 膜状粘接剂的制造方法、粘接片和半导体装置及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20100074296A (ko) | 2010-07-01 |
JP5758362B2 (ja) | 2015-08-05 |
CN101884104A (zh) | 2010-11-10 |
US8507323B2 (en) | 2013-08-13 |
CN101884104B (zh) | 2014-05-28 |
TW200938606A (en) | 2009-09-16 |
JPWO2009072492A1 (ja) | 2011-04-21 |
US20110045639A1 (en) | 2011-02-24 |
JP2013033972A (ja) | 2013-02-14 |
US8258017B2 (en) | 2012-09-04 |
EP2224483A1 (en) | 2010-09-01 |
CN102915932A (zh) | 2013-02-06 |
US20120282547A1 (en) | 2012-11-08 |
JP2014220509A (ja) | 2014-11-20 |
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