WO2007013143A1 - Mixed fluid uniformization device and mixed fluid feeding apparatus - Google Patents

Mixed fluid uniformization device and mixed fluid feeding apparatus Download PDF

Info

Publication number
WO2007013143A1
WO2007013143A1 PCT/JP2005/013665 JP2005013665W WO2007013143A1 WO 2007013143 A1 WO2007013143 A1 WO 2007013143A1 JP 2005013665 W JP2005013665 W JP 2005013665W WO 2007013143 A1 WO2007013143 A1 WO 2007013143A1
Authority
WO
WIPO (PCT)
Prior art keywords
mixed fluid
perforated plate
flow path
gas
homogenizer
Prior art date
Application number
PCT/JP2005/013665
Other languages
French (fr)
Japanese (ja)
Inventor
Masaaki Sako
Hideaki Ota
Original Assignee
Kawasaki Plant Systems Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Plant Systems Kabushiki Kaisha filed Critical Kawasaki Plant Systems Kabushiki Kaisha
Priority to JP2007526769A priority Critical patent/JP4684295B2/en
Priority to PCT/JP2005/013665 priority patent/WO2007013143A1/en
Priority to KR1020077021473A priority patent/KR100961016B1/en
Priority to BRPI0520522A priority patent/BRPI0520522B1/en
Priority to CN2005800491106A priority patent/CN101142012B/en
Publication of WO2007013143A1 publication Critical patent/WO2007013143A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/0209Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor the valve having a particular passage, e.g. provided with a filter, throttle or safety device
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/21Mixing gases with liquids by introducing liquids into gaseous media
    • B01F23/213Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
    • B01F23/2132Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids using nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • B01F25/3132Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • B01F25/3132Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices
    • B01F25/31322Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit by using two or more injector devices used simultaneously
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • B01F25/3133Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit characterised by the specific design of the injector
    • B01F25/31331Perforated, multi-opening, with a plurality of holes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • B01F25/45Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • B01F25/45Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
    • B01F25/452Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
    • B01F25/4521Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/40Static mixers
    • B01F25/45Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads
    • B01F25/452Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces
    • B01F25/4521Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube
    • B01F25/45212Mixers in which the materials to be mixed are pressed together through orifices or interstitial spaces, e.g. between beads characterised by elements provided with orifices or interstitial spaces the components being pressed through orifices in elements, e.g. flat plates or cylinders, which obstruct the whole diameter of the tube the elements comprising means for adjusting the orifices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71Feed mechanisms
    • B01F35/717Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/71805Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings
    • B01F35/718051Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings being adjustable
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/0218Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with only one sealing face
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/30Details
    • F16K3/32Means for additional adjustment of the rate of flow
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16KVALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K2200/00Details of valves

Definitions

  • the present invention relates to a mixed fluid homogenizer and a mixed fluid supply facility. More specifically, the present invention relates to a homogenization for further homogenizing the mixing degree of a mixed fluid obtained by mixing a plurality of fluids, and a mixed fluid supply facility equipped with the mixed fluid homogenizing device.
  • the furnace top gas (Blast Furnace Gas, hereinafter referred to as BFG) has a relatively low calorific value from the blast furnace (low calorie). Is generated as a by-product gas. This BFG is used in many areas within the steelworks.
  • Low calorie by-product gas is not limited to blast furnace gas (BFG), but many other types of gas such as converter gas (LDG) and coal bed gas (Coal mine gas, referred to as CMG) These mixed gases are included.
  • the by-product gas generated (gas composition and calorie) varies depending on the operation content. Even in the same facility, it changes from moment to moment according to the characteristics of each raw material and the reaction process, and does not become constant.
  • gas turbine combustion is performed by mixing the heat reducing gas so that the fluctuating calorie value does not exceed the upper limit allowable calorie value of the gas turbine. A sudden rise in combustion temperature in the chamber must be avoided.
  • misfire in the gas turbine combustor must be avoided by mixing the heat increasing gas so as not to fall below the lower limit allowable caloric value.
  • the mixed gas after the main gas for example, BFG
  • the heat increasing / decreasing gas hereinafter also referred to as secondary gas
  • the mixed gas is non-uniform in the cross section in the pipe, there is a possibility that the non-uniform portion may remain as it is and reach the combustor of the gas turbine.
  • the combustion mode may be non-uniform in each combustor.
  • a mixer for example, refer to Patent Document 1 including a stationary blade that swirls the gas in a flow path has been used.
  • the function of the mixer is to achieve a predetermined mixing over the full range of calories and flow rates of the main gas and the main gas and the different gases to be mixed as a secondary gas.
  • the mixer is designed according to the mixing conditions. (1) Main gas flow rate, gas specific gravity, gas composition, (2) Gas specific gravity of gas to be mixed, gas composition, (3 ) There is a range of mixing ratios between the main gas and the gas to be mixed.
  • the mixing ratio of the main gas and the sub-gas that is, the mixing ratio is determined in advance based on the target heat increase value and the caloric value of the main gas and the sub-gas, it is initially planned.
  • the secondary gas is changed to another type of heat increasing gas, or when the mixing ratio of the primary gas to the secondary gas has to be greatly changed due to the change in the caloric value of the primary gas. It is extremely difficult to ensure uniformity that falls within a certain deviation of mixing in the fuel supply distribution section downstream of the mixer.
  • coke oven gas COG, calorific value is about 4000kcalZNm 3
  • converter gas marked LDG, caloric value of about 2000kcalZNm 3
  • natural gas NG, the mixing ratio of the caloric value of about 9000kcal / Nm 3 in each main gas (the product gas) is different.
  • main gas BFG is set to 1, it is mixed at a ratio of 0.05 for COG, 0.1 for LDG, and 0.022 for NG.
  • Patent Document 1 Japanese Patent Laid-Open No. 10-337458
  • the present invention has been made to solve the above-described problems, and is adapted to various mixing conditions including different flow rates and compositions to improve mixing uniformity, and a conventional mixer is installed.
  • a mixed fluid homogenizer for improving the uniformity of fluid mixing (regardless of the mixer), and a mixed fluid supply facility equipped with the mixed fluid homogenizer Speak for the purpose of providing.
  • the mixed fluid homogenizing device of the present invention comprises:
  • a plurality of perforated plates that are disposed in the fluid flow path and are in contact with each other so as to overlap each other;
  • a plurality of through holes are formed in each perforated plate, and the degree of overlap of the through holes of each perforated plate is reduced by relative displacement in the surface direction with the plurality of perforated plates overlapping.
  • the aperture ratio of all the through holes is changed to change.
  • the sub-fluid for adjusting the properties of the main fluid is mixed on the upstream side of the perforated plate, which resists fluid flow, and further mixed immediately after passing through the through hole. , Mixing is promoted. This promotes uniform mixing. Further, by changing the aperture ratio of the through-hole according to the mixing condition, it becomes possible to select the optimal aperture ratio for the mixing condition.
  • the apparatus further includes a perforated plate moving device for moving the perforated plate disposed outside the flow path,
  • the plurality of perforated plates include a fixed perforated plate fixed inside the flow path and a movable perforated plate that is movable without being fixed, and the movable perforated plate is reciprocated by the perforated plate moving device.
  • all the through holes are formed so that the opening area when the opening ratio is the maximum is equal to or larger than the cross-sectional area of the flow path. It is possible to reduce the resistance of the flow path as much as possible.
  • the perforated plate can be disposed inclined from a direction perpendicular to the central axis of the flow path. In this case, the actual area of the perforated plate is increased, and the opening area formed by the entire through hole is also increased, so that the resistance of the flow path can be reduced as much as possible.
  • a movement guide member is attached to the fixed perforated plate, and the movement guide member is configured to engage with both side portions of the movable perforated plate in a direction perpendicular to the reciprocating direction of the movable perforated plate to guide the movement. can do.
  • One movable perforated plate is disposed between two fixed perforated plates, and a spacer is disposed between the two fixed perforated plates to maintain a gap in which the movable perforated plate can slide.
  • the two fixed perforated plates and the spacer can be configured to guide the movement of the movable perforated plate.
  • the through hole can be formed in a long hole shape extending in a direction perpendicular to the moving direction of the movable perforated plate. In this way, since the area ratio of the through holes on one perforated plate can be made relatively large, the opening area when the through holes are fully opened can be increased.
  • the cleaning device further includes a cleaning device disposed in the flow path for cleaning the through hole, and the cleaning device has a plurality of nozzles for ejecting a cleaning liquid. Is preferred. This is because it is possible to clean the perforated plate by requiring a worker to enter the flow path as much as possible or by greatly reducing the frequency of entry.
  • Another mixed fluid homogenizing device of the present invention includes: A perforated plate having a plurality of through holes formed in a fluid flow path is provided, and the perforated plate is in the plane of the perforated plate and around an imaginary straight line passing through the center of the perforated plate. It can be rotated to any angular position.
  • Mixing of the mixed fluid can be further promoted by a powerful configuration. Furthermore, even if a situation occurs in which the fluid flow is interrupted urgently on the downstream side of the flow path and a sudden pressure fluctuation propagates to the upstream side, this rotatable perforated plate must be rotated in the direction to close the flow path. Therefore, the flow path resistance can be increased, so that the upstream propagation of the pressure fluctuation is suppressed.
  • the perforated plate can be configured to be able to rotate between a fully open position where the surface is in a direction along the central axis of the flow path and a fully closed position where the flow path is closed.
  • the fully closed position for closing the flow path means a position where the flow of fluid in the flow path is interrupted unless a through hole is formed in the perforated plate. Means to completely shut off! /, Don't do that! /
  • the mixed fluid supply facility of the present invention comprises:
  • This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
  • the cross-sectional area of the portion where the mixed fluid homogenizer is disposed in the flow path is made larger than the cross-sectional area on the upstream side and the cross-sectional area on the downstream side.
  • Another mixed fluid supply facility of the present invention includes:
  • This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
  • the cross-sectional area 1S on the downstream side of the portion where the mixed fluid homogenizer is disposed in the flow path is larger than the cross-sectional area on the upstream side.
  • Another mixed fluid supply facility of the present invention includes:
  • This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
  • the uniformity of mixing is improved by changing the aperture ratio of the through holes of the perforated plate according to the mixed state of the mixed gas detected by the gas property detecting device. Therefore, an appropriate aperture ratio can be selected.
  • the gas property detecting device for example, a calorie measuring device or the like can be adopted.
  • the uniformity of mixing is improved, and even if the flow rate and composition of the main fluid and the subfluid to be mixed are changed, the fluid mixing is uniform. Can be improved.
  • FIG. 1 is a piping diagram showing an outline of a mixed fluid supply facility including a mixed fluid homogenizer according to an embodiment of the present invention.
  • FIG. 2 is a longitudinal sectional view schematically showing one embodiment of a mixed fluid equalizing apparatus in the mixed fluid supply facility of FIG.
  • Fig. 3 is a front view schematically showing another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of Fig. 1, and Fig. 3 (b) is a partial cross-sectional view thereof. It is a side view.
  • FIG. 4 is a perspective view showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG.
  • FIG. 5 is a cross-sectional view taken along line V—V in FIG.
  • FIG. 6 is a longitudinal sectional view showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
  • FIG. 7 (a), FIG. 7 (b), and FIG. 7 (c) are cross-sectional views showing a part of the perforated plate of the mixed fluid homogenizer of FIG.
  • FIG. 8 is a perspective view showing a perforated plate of the mixed fluid homogenizer of FIG.
  • FIG. 9 is a cross-sectional view taken along the line IX-IX in FIG.
  • FIG. 10 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid equalizing apparatus in the mixed fluid supply facility of FIG. 1.
  • FIG. 11 is a partially cutaway perspective view of the mixed fluid homogenizer of FIG.
  • FIG. 12 is a cross-sectional view taken along line XII— of FIG.
  • FIG. 13 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
  • FIG. 14 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
  • FIG. 15 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
  • FIG. 16 is a perspective view showing an example of a perforated plate of the mixed fluid homogenizer of FIG.
  • FIG. 17 is a perspective view showing another example of the perforated plate of the mixed fluid homogenizing apparatus of FIG.
  • FIG. 1 shows a mixed fluid supply facility 1 according to an embodiment of the present invention.
  • a gas supply source S such as a blast furnace or a direct reduction iron facility
  • gas supply equipment that supplies a mixture of by-product gases, or a fuel gas that mixes an inert gas with these fuel gases as a heat-reducing gas, or mixes and supplies COG or the like as a heat-up gas
  • the gas supply source S includes a processing step such as dust removal necessary for supplying the generated gas as fuel.
  • the fluid supplied by the mixed fluid supply facility of the present invention is not limited to gas, and includes liquid, powder, slurry, and the like. In the embodiments described below, gas is exemplified.
  • the mixed fluid supply facility 1 includes a main gas pipe 2 for supplying the main gas generated from the gas supply source S, and a heat reducing gas and a heat increasing gas connected to the main gas pipe 2.
  • a mixed gas pipe 4 for supplying a mixed gas with the auxiliary gas, and a mixed fluid homogenizer (hereinafter also simply referred to as a homogenizer) 6 disposed in the mixed gas pipe 4 are provided.
  • the secondary gas pipe 3 supplies the secondary gas in order to stabilize the changing properties of the main gas (for example, calorie fluctuation).
  • the gas uniformly mixed by the homogenizer 6 is sent to a combustion device C such as a combustor of a gas turbine when it is a fuel gas.
  • a combustion device C such as a combustor of a gas turbine when it is a fuel gas.
  • Each of the pipes 2, 3, and 4 is not limited to a pipe having a circular cross section, and may be a pipe having an elliptical cross section or a polygonal cross section.
  • the secondary gas pipe 3 two or more types of secondary gas may be supplied and mixed at the same mixing point 5 or multiple different secondary gas pipes may be connected to the main gas pipe 2 at different positions. It may be connected.
  • a uniformity detecting device 7 for detecting the uniformity of the mixing of the mixed gas flowing inside may be installed downstream of the homogenizing device 6 in the mixed gas pipe 4.
  • FIG. 2 shows the homogenizer 6.
  • This homogenizer 6 has two perforated plates 8, Has nine. A large number of through holes 10 are formed in each of the perforated plates 8 and 9.
  • the arrangement pitch of the through holes 10 is not limited, but it is preferable to form the through holes 10 with the same diameter and the same pitch because the aperture ratio described later can be easily adjusted.
  • One perforated plate 8 has a shape that expands to the full flow path of the mixed gas pipe 4 (a shape that closes the flow path in the pipe if there is no through hole), and the outer periphery of the perforated plate 8 is the mixed gas pipe 4 It is fixed to the inner surface. This perforated plate 8 is called a fixed perforated plate 8.
  • the fixed perforated plate 8 is formed in a shape corresponding to the cross-sectional shape of the flow path of the mixed gas pipe 4.
  • the other perforated plate 9 is disposed in contact with the upstream surface of the fixed perforated plate 8, and is configured to be capable of reciprocating in the surface direction.
  • This perforated plate 9 is called a movable perforated plate 9.
  • a perforated plate moving device including a drive cylinder 11 such as a fluid pressure cylinder disposed outside the mixed gas pipe 4.
  • the movable perforated plate 9 is reciprocated by the drive cylinder 11.
  • the connecting rod 12 connecting the rod 11a of the drive cylinder 11 and the movable perforated plate 9 passes through the mixed gas pipe 4.
  • a seal mechanism 13 is disposed in the portion of the pipe 4 through which the connecting rod 12 passes.
  • the position of the movable perforated plate 9 is not limited to the upstream side of the fixed perforated plate 8, and may be disposed on the downstream side.
  • the perforated plate moving device may adopt an electric motor or the like that is not limited to the fluid pressure cylinder.
  • the position of the drive cylinder 11 is not limited to the lower side of the mixed gas pipe 4 as shown in the figure, and may be moved up and down with the movable perforated plate 9 suspended. Further, it may be arranged at any other position between the upper side and the lower side where the movable perforated plate 9 may be reciprocated in the horizontal direction by being arranged on the side of the mixed gas pipe 4.
  • a portion of the mixed gas pipe 4 in which the homogenizer 6 is incorporated can be configured to be detachable from the mixed gas pipe 4.
  • each of the perforated plates 8 and 9 the distance between the centers of the through holes 10 is equal to or larger than the diameter of the through holes 10. It is formed to become.
  • the movable perforated plate 8 reciprocates a predetermined distance and is stopped at an arbitrary position therebetween, so that all the through holes 10 of both the perforated plates 8 and 9 coincide with each other and the through hole 10 Arbitrary position between the fully open position where the aperture ratio is 100% and the fully closed position where all the through holes 10 are closed without overlapping at all and the aperture ratio is 0% (arbitrary aperture ratio) Can be set to This point is apparent with reference to FIGS. 7 (a) and 7 (c) showing a homogenizer 16 having three perforated plates, which will be described later.
  • the outer shape of the movable perforated plate 9 is made smaller than the outer shape of the fixed perforated plate 8, and the arrangement of the through holes 10 of both perforated plates 8 and 9 is performed.
  • the cloth is in the same position.
  • the state of the maximum aperture ratio is not particularly limited to a state where the entire area of the through hole 10 is 100%.
  • a state where the total opening area is less than 100% may be set as the maximum opening state.
  • the state of the minimum opening ratio is not particularly limited to the state of the opening ratio of 0% in which the entire area of the through hole 10 is closed.
  • the state that exceeds 0% of the total area of the through hole (slightly open or closed) may be the minimum open state!
  • the distance between the centers of the through holes 10 described above need not be greater than the diameter of the through holes 10 as described above.
  • the aperture ratio of the perforated plates 8 and 9 can be changed as described above is that the aperture ratio is changed in accordance with the mixing condition of the main gas and the sub-gas, so that This is to ensure optimal mixing.
  • a part of the mixed gas sent through the mixed gas pipe 4 is blocked by the perforated plates 8 and 9 to generate a flow component in a direction perpendicular to the central axis of the pipe.
  • the mixed gas is further mixed.
  • the mixed gas that passes through the perforated plates 8 and 9 is made more uniform by mixing due to the generation of diffusion vortices caused by the jet flow downstream from the through hole 10. By such a mechanism, the mixing of the mixed gas further proceeds and the mixing becomes uniform.
  • a calorie detection device that detects the distribution of gas calories on the cross section of the gas flow path in the mixed gas pipe 4 is adopted. Also good. For that purpose, a large number of detectors 7a of the calorie detector 7 may be arranged almost uniformly on the cross section of the flow path.
  • the detector 7a is not limited to one cross section, As such, they may be arranged on a plurality of cross sections.
  • the calorie detection device 7 a so-called calorimeter that directly measures the calorie of gas, a device that measures the content (concentration) of combustible components, and the like are used. If importance is attached to the detection speed, it is now preferable to use a combustible gas concentration detector (gas component detector). Depending on the type of combustible component contained in the low calorie gas applied and the combustible component in which the main concentration fluctuation occurs (for example, by-product gas in the direct reduction iron method, the concentration of that component is detected) A concentration detector may be used. What is used as a uniformity detector is not limited to a calorie detector. For example, various devices can be adopted as long as they are suitable devices for detecting the properties of gas, such as a density detector for detecting the distribution of the specific gravity of the gas on the cross section of the gas flow path.
  • a density detector for detecting the distribution of the specific gravity of the gas on the cross section of the gas flow path.
  • An opening suitable for improving the uniformity of the mixing by changing the opening ratio of the through holes 10 of the perforated plates 8 and 9 according to the mixed state of the mixed gas detected by the calorie detecting device 7 Rate can be selected.
  • a position detector 32 is installed to detect the expansion / contraction position of the cylinder rod 11a.
  • the control device 30 has a table that relates the mixing ratio of the secondary gas (volume ratio of the secondary gas to the primary gas) and the optimum aperture ratio of the perforated plate corresponding to the secondary gas type as a parameter. It is remembered. Further, the position of the detected portion of the cylinder rod 11a up to the fully closed position with the fully opened position of the movable perforated plate 8 as a reference is stored. In addition, the supply amount of hydraulic oil necessary for the movement of the perforated plate between the fully open position and the fully closed position is stored.
  • the control device 30 selects a heat reducing gas so that the measured caloric value of the main gas does not exceed the allowable upper limit value of the combustion device, and at the same time calculates the necessary mixing amount and displays the auxiliary gas supply device (not shown). )). In addition, the control device 30 selects the heat increasing gas so that the measured caloric value of the main gas does not fall below the allowable lower limit value, and simultaneously calculates the necessary amount of mixture and issues a command to the auxiliary gas supply device. When multiple types of gas are prepared as the heat increasing gas and the heat reducing gas, an appropriate gas is selected according to a predetermined standard, and the gas The required mixing amount is calculated.
  • the optimum aperture ratio of the perforated plate according to the mixing amount of the sub gas with respect to the amount of the main gas is read from the above table, and the movement amount of the movable perforated plate 9 is calculated based on the value, and correspondingly
  • the target opening ratio of the perforated plate is realized by controlling the amount of hydraulic oil supplied to the cylinder. For example, if the mixing ratio of the secondary gas is small, the aperture ratio is reduced. It is preferable to set the period for measuring the difference between the force loli value of the mixed gas and the target calorie value longer than the calorie value detection time.
  • this uniformity detector 7 may be used mainly as a means for monitoring uniformity.
  • a portion of the mixed gas pipe 4 in which the uniformity detecting device 7 is built can be configured to be detachable from the mixed gas pipe 4. This can be achieved by adopting a pipe joint such as a flange in the same manner as the attaching / detaching mechanism of the homogenizer 6 described above. This facilitates maintenance and calibration of the uniformity detector 7.
  • the shape of the through hole 10 is not limited to a perfect circle, and may be an ellipse, a polygon including a square, a rectangle, or the like.
  • a long through hole 20 as shown in FIG. 3 can also be employed.
  • the long through-hole 20 extends in a direction perpendicular to the moving direction of the movable perforated plate 9, and a plurality of force points are formed at intervals in the moving direction of the movable perforated plate 9.
  • the intervals between the through holes 20 are preferably equal.
  • FIG. 3 (a) only the through hole 20 of the movable perforated plate 9 can be seen.
  • the fixed perforated plate 8 is also formed with a plurality of through holes having the same size and the same shape.
  • the opening area thereof is the mixed gas pipe. It becomes smaller than the cross-sectional area of 4 channels.
  • the section of the mixed gas pipe 4 where the homogenizer 6 is installed has a larger cross-sectional area than the upstream and downstream portions. That is, since the mixed gas pipe 4 of this embodiment has a circular cross section, the pipe diameter is enlarged. As a result, the actual area of the perforated plates 8 and 9 is increased. Accordingly, the entire opening area of the perforated plates 8 and 9 when fully opened is widened, and can be equal to or larger than the flow path cross-sectional area of the mixed gas pipe 4 on the upstream side and the downstream side.
  • the diameter of the expanded mixed gas pipe 4 is the same before and after the homogenizer 6, but it is not limited to this configuration. It is also an option to make the tube diameter immediately after (downstream) the homogenizer 6 larger than the tube diameter immediately before (upstream). In this way, since the mixed gas expands and diffuses immediately after passing through the homogenizer 6, it can be expected that the mixing effect is further improved.
  • the opening area is further increased by making the perforated plates 8 and 9 into a shape that can be installed in a state of being inclined with respect to a plane perpendicular to the central axis of the mixed gas pipe 4. It can be made.
  • the shape of the mixed gas pipe 4 By making the shape of the mixed gas pipe 4 to fill the entire flow path (ellipse) with the perforated plates 8 and 9 inclined, the actual area can be increased and the number of through-holes 10 formed can be increased. Because. For example, if through holes 10 of the same size and shape are formed at the same pitch, and if the perforated plates 8 and 9 are inclined by an angle ⁇ from the surface perpendicular to the central axis of the mixed gas pipe 4, the perforations are formed. Since the actual area of the plate is lZcos ⁇ times, the number of through holes 10 is almost lZcos ⁇ times, and the overall opening area is the same.
  • the perforation direction of the through hole 10 with respect to the perforated plates 8 and 9 is the center axis direction (fluid flow direction) of the mixed gas pipe 4 as shown in FIG. This is preferable because the resistance is reduced.
  • the machining cost will increase because the holes are drilled in a direction inclined with respect to the direction perpendicular to the surface of the punch plate. Therefore, if it is important to reduce the processing cost, it may be perforated in a direction perpendicular to the surface of the perforated plates 8 and 9.
  • the fixed perforated plate 8 is provided with a guide member 14 for guiding the movement of the movable perforated plate 9.
  • This guide member 14 is a member having an L-shaped cross section installed on both side portions (both ends in the moving direction of the movable perforated plate 9) on the surface of the fixed perforated plate 8 on the movable perforated plate 9 side.
  • the movable perforated plate 9 has guide members 14 and fixed perforated plates on both sides. The sliding is guided by engaging between the two. Note that the fixed perforated plate 8 and the movable perforated plate 9 in FIG. 4 are shown in a state where their surfaces are arranged vertically, that is, in a state where they are arranged perpendicular to the center axis of the mixed gas pipe 4. RU
  • FIG. 4 shows in detail the connecting portion between the rod 11a of the drive cylinder 11 and the movable perforated plate 9 described above.
  • the connecting rod 12 is fixed to the movable perforated plate 9, and the connecting rod 12 and the cylinder rod 11a are pin-coupled. This is an example and does not exclude other coupling mechanisms.
  • the sealing mechanism 13 is not shown.
  • FIGS. 6 to 9 show a homogenizer 16 that also has three punching plate forces.
  • a single movable perforated plate 9 is slidably disposed between two fixed perforated plates 8 arranged in parallel at a distance by interposing a spacer 15. It is a thing.
  • the two fixed perforated plates 8 are spaced with the same dimension as the thickness of the movable perforated plate 9.
  • the through holes 10 of the three perforated plates 8 and 9 are formed in the same size, the same shape and the same arrangement as described above.
  • the two fixed perforated plates 8 may be arranged so that their through holes 10 face each other as shown. As a result, as shown in FIG.
  • the spacers 15 are disposed on both sides between the two fixed perforated plates 9, and the spacing between the spacers 15 is almost the same as the movable perforated plates. It is the same as the width dimension of 9. Due to the powerful configuration, the spacer 15 and the two fixed perforated plates 8 function as a guide member for the movable perforated plate 9.
  • the movable perforated plate 9 is held by the two fixed perforated plates 8 on both sides thereof, the thickness of the movable perforated plate 9 can be reduced because there is no concern about pinching. As a result, the weight of the perforated plate is reduced, the drive mechanism can be simplified, and the aperture ratio setting accuracy can be improved.
  • the arrangement of the through holes is not limited to the grid pattern (Figs. 4 and 8) or the upper and lower multi-stage arrangement (Fig. 3) as described above.
  • through holes arranged on a plurality of concentric and equally spaced virtual circles can also be employed.
  • the movable perforated plate 8 may be configured to rotate around the center of the virtual circle. Accordingly, the through holes are arranged at equal intervals on each virtual circle, but the arrangement intervals are made smaller as the through holes are on the virtual circle closer to the center.
  • FIGS. 10 to 12 in the downstream side of the perforated plates 8 and 9, a cleaning device 17 for cleaning the through holes 10 of the perforated plates 8 and 9 between the perforated plates 8 and 9 is shown.
  • a homogenizer 26 with is shown.
  • the cleaning device 17 of the present embodiment is provided with a plurality of cleaning liquid supply pipes 18 that are substantially opposed to the downstream surface of the movable perforated plate 9 and that extend in a substantially horizontal direction with an interval between the upper and lower sides.
  • Each cleaning liquid supply pipe 18 is provided with a plurality of spray nozzles 19 at intervals.
  • the cleaning liquid supply pipe 18 is split into a plurality of lines as described above.
  • Each branch pipe 18 is attached to the mixed gas pipe 4 by a flange joint 27, and its downstream end is closed by a closing plug 28.
  • An on-off valve 29 is installed in the upstream portion of the cleaning liquid supply pipe 18. The on-off valve 29 may be automatically opened and closed intermittently during the period when the supply of the mixed fluid is stopped. In FIG. 11, the guide member 14 and the drive cylinder 11 are not shown.
  • the number of the injection nozzles 19 is preferably the same as the number of the through holes 10 and correspond to the through holes 10 on a one-to-one basis.
  • the configuration is not particularly limited.
  • the cleaning liquid is sprayed from each nozzle 19 over a relatively wide range, and the nozzles are arranged so that the cleaning liquid is sprayed into many through holes including the uppermost through hole 10. That's fine.
  • the cleaning effect is also exhibited by the fact that the cleaning liquid flows down on the perforated plates 8 and 9. Further, it is easy to individually rotate a plurality of cleaning liquid supply pipes 18 around the central axis thereof, thereby making it possible to change the direction of the nozzle 19 in the vertical direction.
  • the mixed gas pipe 4 may be provided with an inspection window so that the cleaning device 17 and the perforated plates 8 and 9 can be visually confirmed. Thereby, as a result of confirming the cleaning state, the direction of the nozzle 19 can be changed by rotating the cleaning liquid supply pipe 18 so that the spraying angle of the cleaning liquid is optimized as necessary.
  • the number of the injection nozzles 19 to be installed is not limited. Spray cleaning liquid over a wide area One nozzle that can be used may be employed. In this case, only one cleaning liquid supply pipe 18 is provided. A collecting groove 33 is formed in the bottom of the mixed gas pipe 4 in the vicinity of the cleaning device 17 to collect the cleaning liquid after cleaning. It is also possible to form.
  • the installation position of the cleaning device 17 is not limited to the downstream side of the perforated plates 8, 9, and may be on the upstream side or on both the upstream and downstream sides.
  • the perforated plates 8 and 9 shown in the figure are erected in the vertical direction. However, when the perforated plates 8 and 9 are inclined as shown in FIGS. 2 and 6, the cleaning device 17 is placed on the upper surface side (FIG. 2). It is preferable to install it on the right side of the perforated plate in FIG. This is because the cleaning effect is improved by the sprayed cleaning liquid flowing down on the surface of the perforated plate as compared with the case where it is installed on the lower surface side.
  • the cleaning device 17 By providing the cleaning device 17, it is possible to prevent dust or the like from adhering to the perforated plate and its through-holes to increase the flow resistance or generate a so-called stick of the perforated plate. it can. Thereby, when the operation of the mixed fluid supply facility 1 is stopped, it is not necessary for an operator to enter the pipeline for cleaning the homogenizer 6, or the frequency can be greatly reduced.
  • the portion of the mixed gas pipe 4 in which the cleaning device 17 is built can be attached to and detached from the other mixed gas pipe 4 by adopting a pipe joint such as a flange. Can be configured. By doing so, the maintenance of the cleaning device 17 becomes easy.
  • FIG. 13 shows a mixed gas pipe 21 of another embodiment.
  • the mixed gas pipe 21 is connected by a short pipe 2 lc perpendicular to the ends 21a and 21b of two pipes 21a and 21b extending in parallel.
  • the reason for this configuration is to sufficiently expand the flow channel area of the mixed gas pipe 21c in the homogenizer 6 with a simple configuration.
  • the two pipes 21a and 21b may be arranged in parallel in the horizontal direction. However, if the pipes 21a and 21b are arranged in parallel in the vertical direction as shown in the figure, the short pipe 21c extends in the vertical direction, and the perforated plate 8 9 is preferable because the surface is arranged to be almost horizontal.
  • the mixed gas pipe 21 is a mixed fluid as shown in the figure. Is not limited to a mode in which the flow of the pressure is directed from the bottom to the top of the homogenizer 6, but the upstream pipe 21a of the homogenizer 6 is arranged above 2 lb of the downstream pipe so that the mixed fluid becomes uniform. 6 You can make it flow from top to bottom.
  • the two pipes 21a and 21b are not connected to each other by the short pipe 21c perpendicular to the two pipes 21a and 21b as described above.
  • the short pipe 21d that is, the short pipe 21d extending in an obtuse angle with respect to the central axis of the two pipes 21a and 21b may be connected.
  • the perforated plates 8 and 9 are arranged obliquely with respect to the central axis of the inclined short pipe 21d.
  • the actual area of the plates 8 and 9 increases, and the fluid resistance due to the perforated plates 8 and 9 decreases.
  • the homogenizers 6, 16 described above have an excellent function other than homogenizing the mixing of the mixed gas. This function is demonstrated by installing it in a pipe that supplies fuel gas to a combustion device such as a gas turbine. When an emergency stop of the combustion device, the emergency shut-off valve installed in the fuel gas supply pipe is closed to stop the supply of fuel gas instantaneously. Then, sudden pressure fluctuations tend to propagate toward the upstream side of the fuel gas supply piping due to sudden momentum changes in the fuel gas flow. At this time, the pressure propagation is suppressed or suppressed by reducing the aperture ratio of the homogenizers 6 and 16 rapidly or to zero in a timely manner. As a result, a force that can eliminate the need for a surge tank and an atmospheric diffusion tower, at least, can be achieved with these small capacities.
  • FIGS. 15 to 17 show another embodiment in which a perforated plate is used to suppress and prevent the propagation of sudden pressure fluctuations directed from the downstream side to the upstream side of the pipe.
  • This embodiment comprises a single rotary perforated plate 22 that can rotate about a virtual straight line passing through its center. Since the pipe 23 shown in FIG. 15 has a circular cross section, the rotary perforated plate has a circular shape as shown in FIG. Of course, the shape is not limited to a circle, and the shape may be selected in accordance with the cross-sectional shape of the pipe, for example, a quadrangular rotating perforated plate 24 shown in FIG. However, it does not have to be the same shape as the section cut by a plane perpendicular to the central axis of the pipe.
  • the surface force perpendicular to the central axis of the pipe may be the same shape as the cross-sectional shape inclined forward and backward.
  • all through holes 10 In order to increase the opening area of the pipe 23, the diameter of the pipe 23 may be enlarged at the portion where the rotary perforated plate 22 is installed.
  • the shape of the through hole 10 is not limited to a perfect circle, but may be an ellipse, a polygon including a square, a rectangle, or the like, as in the homogenizers 6 and 16 described above.
  • a rotary shaft 25 that protrudes in the lateral direction through the pipe passes through the centers of the rotary perforated plates 22 and 24.
  • the rotary shaft 25 is connected to a rotary drive machine (not shown) installed outside the pipe 23.
  • a rotary drive machine for example, an electric motor, a fluid pressure cylinder, or the like can be adopted as the rotary drive machine.
  • the position that closes the flow path which is called the fully closed position, and the position whose surface is along the central axis of the pipe (the position indicated by the two-dot chain line in FIG. Can be rotated between. And configure it to stop at the fully open position, the fully closed position, and any angular position between them.
  • the rotary perforated plates 22 and 24 are configured to rotate around a horizontal axis, but are not limited thereto. For example, it may be rotated around an arbitrary rotation axis between horizontal and vertical, which may be rotated around the vertical axis.
  • a rotation position detection device for detecting the stop position of the rotating perforated plates 22 and 24 may be installed so that the rotating perforated plate can stop at an appropriate position to check whether the force is sufficient. .
  • the rotary perforated plates 22 and 24 are fully opened when the combustion apparatus is operating normally so as not to give a large resistance to the flow of fuel gas.
  • the rotary perforated plates 22, 24 rotate rapidly and are fully closed. To the position.
  • the fluid flow path finally becomes only the through hole 10 of the rotary perforated plate, the flow resistance in the pipe 23 suddenly increases, pressure fluctuation is attenuated, and its propagation is suppressed.
  • the rotating perforated plates 22 and 24 can be used as a mixing and homogenizing device for a mixed fluid other than the above purpose.
  • a gas turbine is exemplified as the combustion equipment.
  • the application of the present invention is not particularly limited to the gas turbine.
  • a thermal boiler as a combustion facility
  • An internal combustion engine such as a diesel engine or a gas engine may be used.
  • the homogenizing device of the present invention can be applied to a combustion facility that can maintain combustion if fluctuations in heat input are within a certain range.
  • the uniformity of the fluid mixture supplied can be improved regardless of whether or not the existing mixer is installed.
  • gas is exemplified as the application target fluid of the homogenizer, it is not limited to only the gas that is generated. It can also be applied to liquid supply facilities. Furthermore, it can be applied to supply equipment for powders and slurries.

Abstract

A mixed fluid feeding apparatus (1) capable of feeding a mixed fluid in a more uniformized mixed state, comprising a mixed gas pipe (4) having an auxiliary gas pipe for feeding an auxiliary gas to a main gas pipe and mixing it therein and a mixed fluid uniformization device (6) disposed in the mixed gas pipe (4). The mixed fluid uniformization device (6) comprises a fixed holed plate (8) and a movable holed plate (9) mutually overlapped and in contact with each other and a drive cylinder (11) for moving the movable holed plate (9) relative to the fixed holed plate (8) in the in-plane direction of the movable holed plate. A plurality of through holes (10) are formed in each of the holed plates (8, 9), and the degree of the overlap of the through holes (10) formed in these both holed plates (8, 9) with each other is varied according to the movement of the movable holed plate (8) to vary the opening rate of all of the through holes (10).

Description

明 細 書  Specification
混合流体の均一化装置および混合流体供給設備  Mixing fluid homogenizer and mixed fluid supply equipment
技術分野  Technical field
[0001] 本発明は混合流体の均一化装置および混合流体供給設備に関する。さらに詳しく は、複数の流体を混合した混合流体の混合程度を一層均一化するための均一化、 および、この混合流体均一化装置を備えた混合流体供給設備に関する。  The present invention relates to a mixed fluid homogenizer and a mixed fluid supply facility. More specifically, the present invention relates to a homogenization for further homogenizing the mixing degree of a mixed fluid obtained by mixing a plurality of fluids, and a mixed fluid supply facility equipped with the mixed fluid homogenizing device.
背景技術  Background art
[0002] 製鉄分野にお!、て、たとえば高炉法で銑鉄を生産する場合、高炉から発熱量が比 較的少ない(低カロリな)炉頂ガス(Blast Furnace Gasであり、以下 BFGと記す)が副 生ガスとして発生する。この BFGは製鉄所内において多方面に利用されている。低 カロリな副生ガスとしては、高炉ガス (BFG)には限らず、転炉ガス (LDG)や石炭層 ガス(Coal mine gasであり、 CMGと表す)などの多くの他の種類のガスやそれらの混 合ガスが含まれる。一方で、近年、高炉法以外の新しい製鉄プロセス (たとえば FINE Xや COREX等の直接還元鉄法)が開発されつつあり、こうした新プロセス力 発生 する副生ガスの有効利用に対しても適用できる燃焼方式の開発が待たれて!ヽる。  [0002] In the steelmaking field! For example, when pig iron is produced by the blast furnace method, the furnace top gas (Blast Furnace Gas, hereinafter referred to as BFG) has a relatively low calorific value from the blast furnace (low calorie). Is generated as a by-product gas. This BFG is used in many areas within the steelworks. Low calorie by-product gas is not limited to blast furnace gas (BFG), but many other types of gas such as converter gas (LDG) and coal bed gas (Coal mine gas, referred to as CMG) These mixed gases are included. On the other hand, in recent years, new iron making processes other than the blast furnace method (for example, direct reduction iron methods such as FINE X and COREX) are being developed, and combustion that can be applied to the effective use of by-product gas generated by such new process power Wait for the development of the method!
[0003] V、ずれの製鉄プロセスであれ、発生する副生ガスの特性 (ガス組成やカロリ)は設 備ゃ操業内容によって異なる。同一設備であっても各原料の特性や反応過程に応じ て時々刻々変化し、一定することがない。副生ガスをたとえばガスタービンのような燃 焼設備の燃料として使用する場合、変動するカロリ値がガスタービンの上限許容カロ リ値を超えな 、ように減熱用ガスを混合してガスタービン燃焼器内での燃焼温度の急 激な上昇を回避しなければならない。逆に、下限許容カロリ値を下回らないように増 熱用ガスを混合してガスタービン燃焼器内での失火を回避しなければならな ヽ。しか も、このように主ガス (たとえば BFG)に増熱用または減熱用のガス(以下、副ガスとも いう)が混合されたあとの混合ガスは燃料供給配管内の断面において十分に均一で なければならない。すなわち、十分に混合する必要がある。  [0003] Regardless of the steelmaking process of V, the by-product gas generated (gas composition and calorie) varies depending on the operation content. Even in the same facility, it changes from moment to moment according to the characteristics of each raw material and the reaction process, and does not become constant. When the by-product gas is used as fuel for a combustion facility such as a gas turbine, gas turbine combustion is performed by mixing the heat reducing gas so that the fluctuating calorie value does not exceed the upper limit allowable calorie value of the gas turbine. A sudden rise in combustion temperature in the chamber must be avoided. On the other hand, misfire in the gas turbine combustor must be avoided by mixing the heat increasing gas so as not to fall below the lower limit allowable caloric value. However, the mixed gas after the main gas (for example, BFG) is mixed with the heat increasing / decreasing gas (hereinafter also referred to as secondary gas) is sufficiently uniform in the cross section in the fuel supply pipe. There must be. That is, it is necessary to mix well.
[0004] もし、混合ガスが配管内断面において不均一であると、不均一な部分はそのままの 状態でガスタービンの燃焼器に至る可能性があるので、燃焼室内に複数機設置され て 、る燃焼器それぞれにお 、て燃焼態様が不均一となるおそれがある。 [0004] If the mixed gas is non-uniform in the cross section in the pipe, there is a possibility that the non-uniform portion may remain as it is and reach the combustor of the gas turbine. Thus, the combustion mode may be non-uniform in each combustor.
[0005] また、増熱や減熱を目的とするのではなぐ性状の異なる複数種類の可燃ガスを一 緒にして燃料として使用する場合 (たとえば BFGに LDGや CMGを混合する)にも、 これらのガスを十分に混合する必要がある。  [0005] In addition, when multiple types of combustible gases with different properties are not used together for the purpose of increasing or decreasing heat (for example, mixing BFG with LDG or CMG) It is necessary to thoroughly mix the gas.
[0006] 従来、カロリ等の特性が異なるガスを均一に混合するために、たとえば流路中でガ スを旋回させる静翼を備えた混合器 (たとえば特許文献 1参照)が使用されている。 混合器の機能は主ガスおよび主ガスに副ガスとして混合すべき異種ガスのカロリおよ び流量の全ての範囲にわたって所定の混合を達成することにある。混合器は混合条 件に合わせて設計されるが、その条件としては、(1)主ガスの流量、ガス比重、ガス組 成、(2)混合すべきガスのガス比重、ガス組成、 (3)主ガスと混合すべきガスとの混合 比の幅、がある。  [0006] Conventionally, in order to uniformly mix gases having different characteristics such as calories, a mixer (for example, refer to Patent Document 1) including a stationary blade that swirls the gas in a flow path has been used. The function of the mixer is to achieve a predetermined mixing over the full range of calories and flow rates of the main gas and the main gas and the different gases to be mixed as a secondary gas. The mixer is designed according to the mixing conditions. (1) Main gas flow rate, gas specific gravity, gas composition, (2) Gas specific gravity of gas to be mixed, gas composition, (3 ) There is a range of mixing ratios between the main gas and the gas to be mixed.
[0007] 従来の混合器は主ガスと副ガスとの混合割合、すなわち混合比が増熱目標値、主 ガスおよび副ガスのカロリ値を基準に予め決定されるため、もし、当初予定していた 副ガスが他の種類の増熱用ガスに変わった場合、または、主ガスのカロリ値が変化し たために主ガスと副ガスとの混合比を大きく変更せざるを得なくなった場合には、混 合器の下流の燃料供給配内断面における混合の一定の偏差内に収まる均一性を確 保することはきわめて困難である。  [0007] In the conventional mixer, since the mixing ratio of the main gas and the sub-gas, that is, the mixing ratio is determined in advance based on the target heat increase value and the caloric value of the main gas and the sub-gas, it is initially planned. When the secondary gas is changed to another type of heat increasing gas, or when the mixing ratio of the primary gas to the secondary gas has to be greatly changed due to the change in the caloric value of the primary gas. It is extremely difficult to ensure uniformity that falls within a certain deviation of mixing in the fuel supply distribution section downstream of the mixer.
[0008] たとえば、 800kcal/Nm3の副生ガスを lOOOkcalZNm3に増熱する場合、増熱 用ガスとして選択されうるコークス炉ガス(COGと記し、カロリ値が約 4000kcalZNm 3 )、転炉ガス(LDGと記し、カロリ値は約 2000kcalZNm3 )、天然ガス(NGと記し、 カロリ値が約 9000kcal/Nm3 )ではそれぞれ主ガス(上記副生ガス)との混合比が 異なる。たとえば、主ガス BFGを 1とすればこれに対して、 COGでは 0. 05、 LDGで は 0. 1、 NGでは 0. 022の割合で混合することになる。したがって、増熱用ガスとして の COGの供給量が減少したときに、 LDGや NGを代用として用いる場合は主ガスへ の混合比が COGの場合に比して大きく異なるため、 COG専用に設計された従来の 混合器では十分に均一な混合効果が得られないことになる。なお、上記のように比較 的低カロリの LDGを増熱用ガスとして用いるのは、主ガスが BFG等のようにさらに低 カロリなガスの場合である。 [0009] 主ガスと副ガスとの混合比が同じであっても、主ガスの流量の変化によって混合器 内の流れのパターンが変化するため、混合する副ガスが一種類であっても、混合後 に所定の均一性を主ガスの幅広い流量変化域で確保することは困難である。 [0008] For example, when 800kcal / Nm 3 by-product gas is heated to lOOOkcalZNm 3 , coke oven gas (COG, calorific value is about 4000kcalZNm 3), converter gas ( marked LDG, caloric value of about 2000kcalZNm 3), denoted as natural gas (NG, the mixing ratio of the caloric value of about 9000kcal / Nm 3) in each main gas (the product gas) is different. For example, if the main gas BFG is set to 1, it is mixed at a ratio of 0.05 for COG, 0.1 for LDG, and 0.022 for NG. Therefore, when the supply amount of COG as a heat increasing gas decreases, when using LDG or NG as a substitute, the mixing ratio to the main gas is significantly different from that of COG. However, a sufficiently uniform mixing effect cannot be obtained with the conventional mixer. As described above, comparatively low calorie LDG is used as the heat increasing gas when the main gas is a lower calorie gas such as BFG. [0009] Even if the mixing ratio of the main gas and the sub-gas is the same, the flow pattern in the mixer changes due to the change in the flow rate of the main gas. It is difficult to ensure a predetermined uniformity after mixing in a wide flow rate change region of the main gas.
特許文献 1:特開平 10— 337458号公報  Patent Document 1: Japanese Patent Laid-Open No. 10-337458
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0010] 本発明は上記した課題を解決するためになされたものであり、異なる流量や組成を 含む種々の混合条件に適応して混合の均一性を向上させ、従来の混合器が設置さ れている力否かに拘わらず (混合器には関係なく)流体混合の均一性を向上させるた めの混合流体均一化装置、および、この混合流体均一化装置を備えた混合流体供 給設備を提供することを目的として ヽる。  [0010] The present invention has been made to solve the above-described problems, and is adapted to various mixing conditions including different flow rates and compositions to improve mixing uniformity, and a conventional mixer is installed. A mixed fluid homogenizer for improving the uniformity of fluid mixing (regardless of the mixer), and a mixed fluid supply facility equipped with the mixed fluid homogenizer Speak for the purpose of providing.
課題を解決するための手段  Means for solving the problem
[0011] 本発明の混合流体の均一化装置は、  [0011] The mixed fluid homogenizing device of the present invention comprises:
流体の流路内に配設される、互いに重なり合って接する相対変位可能な複数枚の 穿孔板を備えており、  A plurality of perforated plates that are disposed in the fluid flow path and are in contact with each other so as to overlap each other;
各穿孔板には複数個の貫通孔が形成されており、上記複数枚の穿孔板が重なり合 つた状態で互いの面方向に相対変位することにより、各穿孔板の貫通孔の重なり程 度が変化して全貫通孔の開口率が変化するように構成されて 、る。  A plurality of through holes are formed in each perforated plate, and the degree of overlap of the through holes of each perforated plate is reduced by relative displacement in the surface direction with the plurality of perforated plates overlapping. The aperture ratio of all the through holes is changed to change.
[0012] 力かる構成により、流体流れの抵抗となる穿孔板の上流側において、主流体に対し てその性状を調整するための副流体が混合され、貫通孔を通過した直後においても さらに混合され、混合が促進される。それによつて混合の均一化が促進される。また、 混合条件に応じ、貫通孔の開口率を変化させることによって当該混合条件に最適な 開口率を選択することが可能となる。  [0012] By virtue of the powerful configuration, the sub-fluid for adjusting the properties of the main fluid is mixed on the upstream side of the perforated plate, which resists fluid flow, and further mixed immediately after passing through the through hole. , Mixing is promoted. This promotes uniform mixing. Further, by changing the aperture ratio of the through-hole according to the mixing condition, it becomes possible to select the optimal aperture ratio for the mixing condition.
[0013] 上記流路の外部に配設された、穿孔板を移動させるための穿孔板移動装置をさら に含み、  [0013] The apparatus further includes a perforated plate moving device for moving the perforated plate disposed outside the flow path,
上記複数枚の穿孔板が、流路内部に固定された固定穿孔板と、固定されずに移動 可能にされた可動穿孔板とを備え、この可動穿孔板が上記穿孔板移動装置によって 往復動させられるように構成することができる。 [0014] このように構成すれば、一方の穿孔板のみ移動させればよぐまた、固定穿孔板が 可動穿孔板の移動を案内する一助となる。 The plurality of perforated plates include a fixed perforated plate fixed inside the flow path and a movable perforated plate that is movable without being fixed, and the movable perforated plate is reciprocated by the perforated plate moving device. Can be configured. With this configuration, it is only necessary to move one of the perforated plates, and the fixed perforated plate helps guide the movement of the movable perforated plate.
[0015] 上記全貫通孔を、その開口率が最大の時の開口面積が流路の断面積と同一かま たはそれ以上となるように形成するのが好ま 、。流路の抵抗をできるだけ減少させ ることがでさるカゝらである。 [0015] Preferably, all the through holes are formed so that the opening area when the opening ratio is the maximum is equal to or larger than the cross-sectional area of the flow path. It is possible to reduce the resistance of the flow path as much as possible.
[0016] 上記穿孔板を流路の中心軸に対して垂直な方向から傾斜して配置することができ る。この場合、穿孔板の実面積が増加し、貫通孔全体が形成する開口面積も増大す るので、流路の抵抗を可及的に減少させることができる。 [0016] The perforated plate can be disposed inclined from a direction perpendicular to the central axis of the flow path. In this case, the actual area of the perforated plate is increased, and the opening area formed by the entire through hole is also increased, so that the resistance of the flow path can be reduced as much as possible.
[0017] 上記固定穿孔板に移動案内部材を取り付け、この移動案内部材を、可動穿孔板の 往復動方向に垂直な方向の両側部分に係合してその移動を案内することができるよ うに構成することができる。 [0017] A movement guide member is attached to the fixed perforated plate, and the movement guide member is configured to engage with both side portions of the movable perforated plate in a direction perpendicular to the reciprocating direction of the movable perforated plate to guide the movement. can do.
[0018] 一枚の可動穿孔板を二枚の固定穿孔板の間に配置し、この二枚の固定穿孔板の 間に、可動穿孔板が摺動移動可能な隙間を保持するスぺーサを配設し、この二枚の 固定穿孔板およびスぺーサが可動穿孔板の移動を案内するように構成することがで きる。 [0018] One movable perforated plate is disposed between two fixed perforated plates, and a spacer is disposed between the two fixed perforated plates to maintain a gap in which the movable perforated plate can slide. In addition, the two fixed perforated plates and the spacer can be configured to guide the movement of the movable perforated plate.
[0019] このように構成すれば、可動穿孔板の移動がその前後の固定穿孔板と、たとえば両 側部のスぺーサによって案内されるので、可動穿孔板の厚さを薄くして重量を小さく することができ、一層迅速な操作が可能となる。  With this configuration, since the movement of the movable perforated plate is guided by the front and rear fixed perforated plates and, for example, the spacers on both sides, the thickness of the movable perforated plate is reduced and the weight is reduced. It can be made smaller and more rapid operation is possible.
[0020] 上記貫通孔を、可動穿孔板の移動方向に垂直な方向に延びる長孔状に形成する ことができる。このようにすれば、一枚の穿孔板上の貫通孔の面積割合を比較的大き くすることができるので、貫通孔の全開時の開口面積を大きくすることができる。  [0020] The through hole can be formed in a long hole shape extending in a direction perpendicular to the moving direction of the movable perforated plate. In this way, since the area ratio of the through holes on one perforated plate can be made relatively large, the opening area when the through holes are fully opened can be increased.
[0021] 上記流路内に配設された、上記貫通孔を洗浄するための洗浄装置をさらに含んで おり、この洗浄装置が洗浄用の液体を噴出する複数個のノズルを有しているのが好 ましい。この構成により、作業員が流路内に立ち入る必要なぐまたは、立ち入る頻度 を大幅に減らして穿孔板の洗浄を行うことができるからである。  [0021] The cleaning device further includes a cleaning device disposed in the flow path for cleaning the through hole, and the cleaning device has a plurality of nozzles for ejecting a cleaning liquid. Is preferred. This is because it is possible to clean the perforated plate by requiring a worker to enter the flow path as much as possible or by greatly reducing the frequency of entry.
[0022] 上記可動穿孔板を移動することによって全貫通孔が閉止されうるように構成すること ができる。  [0022] It can be configured such that all the through holes can be closed by moving the movable perforated plate.
[0023] 本発明の他の混合流体の均一化装置は、 流体の流路内に配設される、複数個の貫通孔が形成された穿孔板を備えており、 この穿孔板が、穿孔板の面内であって穿孔板の中心を通る仮想直線の回りの任意の 角度位置に回動可能に構成されている。 [0023] Another mixed fluid homogenizing device of the present invention includes: A perforated plate having a plurality of through holes formed in a fluid flow path is provided, and the perforated plate is in the plane of the perforated plate and around an imaginary straight line passing through the center of the perforated plate. It can be rotated to any angular position.
[0024] 力かる構成によっても、混合流体の混合をさらに促進することができる。さらに、流 路の下流側で流体流れが緊急に遮断されて急激な圧力変動が上流側に伝播するよ うな事態が生じても、この回転可能な穿孔板を流路を塞ぐ方向に回転させることによ つて流路抵抗を増大させうるので、上記圧力変動の上流側への伝播が抑制される。  [0024] Mixing of the mixed fluid can be further promoted by a powerful configuration. Furthermore, even if a situation occurs in which the fluid flow is interrupted urgently on the downstream side of the flow path and a sudden pressure fluctuation propagates to the upstream side, this rotatable perforated plate must be rotated in the direction to close the flow path. Therefore, the flow path resistance can be increased, so that the upstream propagation of the pressure fluctuation is suppressed.
[0025] 上記穿孔板を、その面が流路の中心軸に沿う方向になる全開位置と、流路を閉止 する全閉位置との間を回動しうるように構成することができる。なお、流路を閉止する 全閉位置とは、この穿孔板に貫通孔が形成されていないとしたら流路内の流体の流 れが遮断されてしまう位置を言うのであり、実際に流体の流れを完全に遮断すること を意味して!/、るのではな!/、。  [0025] The perforated plate can be configured to be able to rotate between a fully open position where the surface is in a direction along the central axis of the flow path and a fully closed position where the flow path is closed. The fully closed position for closing the flow path means a position where the flow of fluid in the flow path is interrupted unless a through hole is formed in the perforated plate. Means to completely shut off! /, Don't do that! /
[0026] 本発明の混合流体供給設備は、  [0026] The mixed fluid supply facility of the present invention comprises:
流体が流れる流路と、  A flow path through which fluid flows;
この流路内に配設された混合流体均一化装置とを備えており、  And a mixed fluid homogenizer disposed in the flow path,
この混合流体均一化装置が、前述したうちのいずれか一の混合流体均一化装置で あり、  This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
上記流路における混合流体均一化装置が配設されている部分の断面積が、その 上流側の断面積および下流側の断面積それぞれより大きくされて 、る。  The cross-sectional area of the portion where the mixed fluid homogenizer is disposed in the flow path is made larger than the cross-sectional area on the upstream side and the cross-sectional area on the downstream side.
[0027] この混合流体供給設備によれば、穿孔板の実面積が増加し、形成される貫通孔全 体の開口面積も増大するので、流路の抵抗を可及的に減少させることができる。 [0027] According to this mixed fluid supply facility, the actual area of the perforated plate is increased and the opening area of the entire through-hole formed is also increased, so that the resistance of the flow path can be reduced as much as possible. .
[0028] 本発明の他の混合流体供給設備は、 [0028] Another mixed fluid supply facility of the present invention includes:
流体が流れる流路と、  A flow path through which fluid flows;
この流路内に配設された混合流体均一化装置とを備えており、  And a mixed fluid homogenizer disposed in the flow path,
この混合流体均一化装置が、前述したうちのいずれか一の混合流体均一化装置で あり、  This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
上記流路における混合流体均一化装置が配設されている部分の下流側の断面積 1S その上流側の断面積より大きくされている。 [0029] こうすることにより、混合流体が均一化装置を通過した直後に膨張拡散するためにThe cross-sectional area 1S on the downstream side of the portion where the mixed fluid homogenizer is disposed in the flow path is larger than the cross-sectional area on the upstream side. [0029] By doing so, the mixed fluid expands and diffuses immediately after passing through the homogenizer.
、混合効果がさらに向上することが期待できるからである。 This is because the mixing effect can be expected to be further improved.
[0030] 本発明の他の混合流体供給設備は、 [0030] Another mixed fluid supply facility of the present invention includes:
流体が流れる流路と、  A flow path through which fluid flows;
この流路内に配設された混合流体均一化装置とを備えており、  And a mixed fluid homogenizer disposed in the flow path,
この混合流体均一化装置が、前述したうちのいずれか一の混合流体均一化装置で あり、  This mixed fluid homogenizer is any one of the aforementioned mixed fluid homogenizers,
上記流路における混合流体均一化装置の下流側に配設されたガスの性状を検出 するガス性状検出装置をさらに含んでおり、このガス性状検出装置が流路の断面上 のガス成分の分布を検出するように構成されて 、る。  It further includes a gas property detection device for detecting the property of the gas disposed on the downstream side of the mixed fluid homogenization device in the flow path, and this gas property detection device detects the distribution of gas components on the cross section of the flow channel. It is configured to detect.
[0031] この混合流体供給設備によれば、ガス性状検出装置によって検出された混合ガス の混合状態に応じて上記穿孔板の貫通孔の開口率を変化させることにより、混合の 均一化を向上させるために適切な開口率を選択することができる。ガス性状検出装 置としては、たとえばカロリ計測装置などが採用されうる。 [0031] According to this mixed fluid supply facility, the uniformity of mixing is improved by changing the aperture ratio of the through holes of the perforated plate according to the mixed state of the mixed gas detected by the gas property detecting device. Therefore, an appropriate aperture ratio can be selected. As the gas property detecting device, for example, a calorie measuring device or the like can be adopted.
発明の効果  The invention's effect
[0032] 本発明によれば、広範な混合条件にお!、ても混合の均一性を向上させ、主流体お よび混合すべき副流体の流量や組成が変化しても、流体混合の均一性を向上させる ことができる。  [0032] According to the present invention, even under a wide range of mixing conditions, the uniformity of mixing is improved, and even if the flow rate and composition of the main fluid and the subfluid to be mixed are changed, the fluid mixing is uniform. Can be improved.
図面の簡単な説明  Brief Description of Drawings
[0033] [図 1]図 1は、本発明の一実施形態である混合流体均一化装置を含んだ混合流体供 給設備の概略を示す配管図である。  FIG. 1 is a piping diagram showing an outline of a mixed fluid supply facility including a mixed fluid homogenizer according to an embodiment of the present invention.
[図 2]図 2は、図 1の混合流体供給設備における混合流体均一化装置の一実施形態 を概略的に示す縦断面図である。  FIG. 2 is a longitudinal sectional view schematically showing one embodiment of a mixed fluid equalizing apparatus in the mixed fluid supply facility of FIG.
[図 3]図 3 (a)は、図 1の混合流体供給設備における混合流体均一化装置の他の実 施形態を概略的に示す正面図であり、図 3 (b)はその一部断面側面図である。  [Fig. 3] Fig. 3 (a) is a front view schematically showing another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of Fig. 1, and Fig. 3 (b) is a partial cross-sectional view thereof. It is a side view.
[図 4]図 4は、図 1の混合流体供給設備における混合流体均一化装置のさらに他の 実施形態を示す斜視図である。  FIG. 4 is a perspective view showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG.
[図 5]図 5は、図 4の V— V線断面図である。 [図 6]図 6は、図 1の混合流体供給設備における混合流体均一化装置のさらに他の 実施形態を示す縦断面図である。 FIG. 5 is a cross-sectional view taken along line V—V in FIG. FIG. 6 is a longitudinal sectional view showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
[図 7]図 7(a)、図 7(b)、図 7(c)はそれぞれ、図 6の混合流体均一化装置の穿孔板の 一部を示す断面図である。  FIG. 7 (a), FIG. 7 (b), and FIG. 7 (c) are cross-sectional views showing a part of the perforated plate of the mixed fluid homogenizer of FIG.
[図 8]図 8は、図 6の混合流体均一化装置の穿孔板を示す斜視図である。  FIG. 8 is a perspective view showing a perforated plate of the mixed fluid homogenizer of FIG.
[図 9]図 9は図 8の IX— IX線断面図である。 FIG. 9 is a cross-sectional view taken along the line IX-IX in FIG.
[図 10]図 10は、図 1の混合流体供給設備における混合流体均一化装置のさらに他 の実施形態を概略的に示す縦断面図である。  FIG. 10 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid equalizing apparatus in the mixed fluid supply facility of FIG. 1.
[図 11]図 11は、図 10の混合流体均一化装置の一部切り欠き斜視図である。  FIG. 11 is a partially cutaway perspective view of the mixed fluid homogenizer of FIG.
[図 12]図 12は、図 10の XII— ΧΠ線断面図である。 [FIG. 12] FIG. 12 is a cross-sectional view taken along line XII— of FIG.
[図 13]図 13は、図 1の混合流体供給設備における混合流体均一化装置のさらに他 の実施形態を概略的に示す縦断面図である。  FIG. 13 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
[図 14]図 14は、図 1の混合流体供給設備における混合流体均一化装置のさらに他 の実施形態を概略的に示す縦断面図である。  FIG. 14 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
[図 15]図 15は、図 1の混合流体供給設備における混合流体均一化装置のさらに他 の実施形態を概略的に示す縦断面図である。  FIG. 15 is a longitudinal sectional view schematically showing still another embodiment of the mixed fluid homogenizer in the mixed fluid supply facility of FIG. 1.
[図 16]図 16は、図 15の混合流体均一化装置の穿孔板の一例を示す斜視図である。  FIG. 16 is a perspective view showing an example of a perforated plate of the mixed fluid homogenizer of FIG.
[図 17]図 17は、図 15の混合流体均一化装置の穿孔板の他の例を示す斜視図であ る。 FIG. 17 is a perspective view showing another example of the perforated plate of the mixed fluid homogenizing apparatus of FIG.
符号の説明 Explanation of symbols
1·· ··混合流体供給設備  1 ... Mixed fluid supply equipment
2" ··主ガス配管  2 "··· Main gas piping
3·· ··副ガス配管  3 ... Sub gas piping
4·· ··混合ガス配管  4 ... Mixed gas piping
5·· ··混合点  5 ... Mixing point
6·· ·· (混合流体の)均一化装置  6 ······ Uniformation device (for mixed fluid)
7" ··均一度検出装置  7 "··· Uniformity detector
8·· ··固定穿孔板 9· ···可動穿孔板 8 ···· Fixed perforated plate 9 ... Moveable perforated plate
lO- ···貫通孔 lO -... through hole
ll- ···駆動シリンダ ll -... Drive cylinder
12· ···連結棒  12 ... Connecting rod
13· ···シール機構  13 ... Seal mechanism
14· ···案内部材  14 ... Guide material
is■··スぺーサ is ■ ... Spacer
le- …(混合流体の)均一化装置le-… homogenizer (of mixed fluid)
17· ···洗浄装置 17 ... Cleaning equipment
18· ···洗浄液供給配管  18 ······ Cleaning solution supply piping
19· …噴射ノズル  19 ··· Injection nozzle
20· ···貫通孔  20 ... Through hole
21· …混合ガス配管  21 ... Mixed gas piping
22· ···回転穿孔板  22 ···· Rotating perforated plate
23· ··配管  23 ... Piping
24· ··回転穿孔板  24 ··· Rotating perforated plate
25· "回転軸 25 · "Rotary axis
6··· '(混合流体の)均一化装置6 ... '(Mixed fluid) homogenizer
27· ··フランジ継手 27 ... Flange fitting
28· • ·閉止プラグ  28 • Close plug
29· ··開閉弁  29 ...
30· ··制御装置  30 ... Control device
31·' ··油量調節装置  31 ···· Oil quantity adjusting device
32·' ··位置検出器  32 'Position detector
33·' ··集液溝  33 ···· Liquid collection groove
34·' ··ドレン子し  34 '
C--- •燃焼装置  C --- • Combustion equipment
S--- 'ガス供給源 発明を実施するための最良の形態 S --- 'Gas supply source BEST MODE FOR CARRYING OUT THE INVENTION
[0035] 添付の図面を参照しながら本発明の混合流体均一化装置、それを備えた混合流 体供給設備の一実施形態を説明する。  [0035] An embodiment of a mixed fluid homogenizer of the present invention and a mixed fluid supply facility including the same will be described with reference to the accompanying drawings.
[0036] 図 1は本発明の一実施形態である混合流体供給設備 1である。カゝかる供給設備とし ては、たとえば高炉や直接還元鉄設備等のガス供給源 Sで発生したカロリ変動のある 副生ガスをガスタービンに燃料として用いる場合に、たとえば、性状の異なる複数種 類の副生ガスを混合して供給する燃料ガス供給設備、または、これら燃料ガスに不 活性ガスを減熱用ガスとして混合したり、 COG等を増熱用ガスとして混合して供給す る燃料ガス供給設備が例としてあげられる。上記ガス供給源 Sは、発生ガスを燃料と して供給するために必要なたとえば除塵等の処理工程をその内部に含んだものであ る。本発明のこの混合流体供給設備によって供給される流体はガスには限定されず 、液体、粉体、スラリ等も含むが、以下に説明する実施形態ではガスを例示する。  FIG. 1 shows a mixed fluid supply facility 1 according to an embodiment of the present invention. For example, when a by-product gas with caloric fluctuations generated in a gas supply source S such as a blast furnace or a direct reduction iron facility is used as a fuel in a gas turbine, for example, a plurality of types having different properties Gas supply equipment that supplies a mixture of by-product gases, or a fuel gas that mixes an inert gas with these fuel gases as a heat-reducing gas, or mixes and supplies COG or the like as a heat-up gas An example is supply equipment. The gas supply source S includes a processing step such as dust removal necessary for supplying the generated gas as fuel. The fluid supplied by the mixed fluid supply facility of the present invention is not limited to gas, and includes liquid, powder, slurry, and the like. In the embodiments described below, gas is exemplified.
[0037] この混合流体供給設備 1は、ガス供給源 Sで発生した主ガスを供給するための主ガ ス配管 2と、この主ガス配管 2に接続された、減熱用ガスや増熱用ガスを主ガスに添 カロして混合するための副ガス配管 3と、これら両配管 2、 3の接続点(以下、混合点と も言う) 5から下流側に配設された、主ガスと副ガスとの混合ガスを供給する混合ガス 配管 4と、混合ガス配管 4内に配設された混合流体均一化装置 (以下、単に均一化 装置ともいう) 6とを備えたものである。上記副ガス配管 3は、主ガスの変動する性状( たとえばカロリ変動)を安定させるために副ガスを供給するものである。  [0037] The mixed fluid supply facility 1 includes a main gas pipe 2 for supplying the main gas generated from the gas supply source S, and a heat reducing gas and a heat increasing gas connected to the main gas pipe 2. A secondary gas pipe 3 for adding gas to the main gas and mixing it, and a connection point between these pipes 2 and 3 (hereinafter also referred to as a mixing point) 5 A mixed gas pipe 4 for supplying a mixed gas with the auxiliary gas, and a mixed fluid homogenizer (hereinafter also simply referred to as a homogenizer) 6 disposed in the mixed gas pipe 4 are provided. The secondary gas pipe 3 supplies the secondary gas in order to stabilize the changing properties of the main gas (for example, calorie fluctuation).
[0038] 均一化装置 6によって均一に混合されたガスは、それが燃料ガスの場合はガスター ビンの燃焼器等の燃焼装置 Cに送られる。上記各配管 2、 3、 4はそれぞれ円形断面 の管に限定されず、長円経断面でも多角形断面の管でもよい。上記副ガス配管 3に ついては、二種以上の副ガスが同一の混合点 5において供給 '混合されるような配管 でもよぐまた、複数本の異なる副ガス配管を異なる位置で主ガス配管 2に接続したも のでもよい。  [0038] The gas uniformly mixed by the homogenizer 6 is sent to a combustion device C such as a combustor of a gas turbine when it is a fuel gas. Each of the pipes 2, 3, and 4 is not limited to a pipe having a circular cross section, and may be a pipe having an elliptical cross section or a polygonal cross section. As for the secondary gas pipe 3, two or more types of secondary gas may be supplied and mixed at the same mixing point 5 or multiple different secondary gas pipes may be connected to the main gas pipe 2 at different positions. It may be connected.
[0039] 図示のごとぐ混合ガス配管 4における均一化装置 6の下流には、内部を流れる混 合ガスの混合の均一度を検出するための均一度検出装置 7を設置してもよい。  As shown in the figure, a uniformity detecting device 7 for detecting the uniformity of the mixing of the mixed gas flowing inside may be installed downstream of the homogenizing device 6 in the mixed gas pipe 4.
[0040] 図 2には上記均一化装置 6が示されている。この均一化装置 6は二枚の穿孔板 8、 9を備えている。各穿孔板 8、 9には多数の貫通孔 10が形成されている。この貫通孔 10の直径ゃ配設ピッチは限定しな 、が、同一直径および同一ピッチで形成するのが 、後述する開口率の調整が容易となるので好ましい。一方の穿孔板 8は混合ガス配 管 4の流路一杯に拡がる形状 (貫通孔が無いとしたら、配管内の流路を閉塞してしま う形状)を有し、その外周が混合ガス配管 4の内面に固定されている。この穿孔板 8を 固定穿孔板 8と呼ぶ。固定穿孔板 8は混合ガス配管 4の流路の断面形状に応じた形 状に形成される。他方の穿孔板 9は固定穿孔板 8の上流側の面に接して配置されて おり、その面方向に往復動可能に構成されている。この穿孔板 9を可動穿孔板 9と呼 FIG. 2 shows the homogenizer 6. This homogenizer 6 has two perforated plates 8, Has nine. A large number of through holes 10 are formed in each of the perforated plates 8 and 9. The arrangement pitch of the through holes 10 is not limited, but it is preferable to form the through holes 10 with the same diameter and the same pitch because the aperture ratio described later can be easily adjusted. One perforated plate 8 has a shape that expands to the full flow path of the mixed gas pipe 4 (a shape that closes the flow path in the pipe if there is no through hole), and the outer periphery of the perforated plate 8 is the mixed gas pipe 4 It is fixed to the inner surface. This perforated plate 8 is called a fixed perforated plate 8. The fixed perforated plate 8 is formed in a shape corresponding to the cross-sectional shape of the flow path of the mixed gas pipe 4. The other perforated plate 9 is disposed in contact with the upstream surface of the fixed perforated plate 8, and is configured to be capable of reciprocating in the surface direction. This perforated plate 9 is called a movable perforated plate 9.
[0041] 可動穿孔板 9の端部には、混合ガス配管 4の外部に配設された流体圧シリンダ等の 駆動シリンダ 11からなる穿孔板移動装置が連結されている。可動穿孔板 9はこの駆 動シリンダ 11によって往復動させられる。駆動シリンダ 11のロッド 11aと可動穿孔板 9 とを連結する連結棒 12の部分が混合ガス配管 4を貫通している。連結棒 12が貫通 する配管 4の部分にはシール機構 13が配設されている。可動穿孔板 9の位置は固定 穿孔板 8の上流側に限定されず、下流側に配置してもよい。また、穿孔板移動装置 は流体圧シリンダに限定されることはなぐ電動モータ等を採用してもよい。 [0041] Connected to the end of the movable perforated plate 9 is a perforated plate moving device including a drive cylinder 11 such as a fluid pressure cylinder disposed outside the mixed gas pipe 4. The movable perforated plate 9 is reciprocated by the drive cylinder 11. The connecting rod 12 connecting the rod 11a of the drive cylinder 11 and the movable perforated plate 9 passes through the mixed gas pipe 4. A seal mechanism 13 is disposed in the portion of the pipe 4 through which the connecting rod 12 passes. The position of the movable perforated plate 9 is not limited to the upstream side of the fixed perforated plate 8, and may be disposed on the downstream side. Further, the perforated plate moving device may adopt an electric motor or the like that is not limited to the fluid pressure cylinder.
[0042] また、駆動シリンダ 11の位置は、図示のごとく混合ガス配管 4の下方に限定されず 、上方に配置して可動穿孔板 9を吊り下げた状態で上下動させてもよい。また、混合 ガス配管 4の側方に配置して可動穿孔板 9を水平方向に往復動させてもよぐ上方と 下方との間の他のいかなる位置に配置してもよい。  [0042] The position of the drive cylinder 11 is not limited to the lower side of the mixed gas pipe 4 as shown in the figure, and may be moved up and down with the movable perforated plate 9 suspended. Further, it may be arranged at any other position between the upper side and the lower side where the movable perforated plate 9 may be reciprocated in the horizontal direction by being arranged on the side of the mixed gas pipe 4.
[0043] さらに、混合ガス配管 4のうち上記均一化装置 6が内蔵された部分を、混合ガス配 管 4に対して着脱可能に構成することもできる。たとえば、混合ガス配管 4における均 一化装置 6の前後を切断し、この部分をフランジ等の管継手によって前後の混合ガス 配管 4に接続することが可能である。そうして、このフランジの接続ボルトを取り外し、 均一化装置 6内蔵部分の管を駆動シリンダ 11等とともに外方へ移動させうるようにす るのである。こうすること〖こよって、設備の定期検査等において均一化装置 6のメンテ ナンスが容易となる。  Furthermore, a portion of the mixed gas pipe 4 in which the homogenizer 6 is incorporated can be configured to be detachable from the mixed gas pipe 4. For example, it is possible to cut the front and rear of the leveling device 6 in the mixed gas pipe 4 and connect this portion to the front and rear mixed gas pipes 4 by a pipe joint such as a flange. Then, the connecting bolt of the flange is removed so that the pipe in the uniformizing device 6 can be moved outward together with the drive cylinder 11 and the like. This makes it easy to maintain the homogenizer 6 in periodic inspections of equipment.
[0044] 各穿孔板 8、 9において、貫通孔 10の中心間距離は、ともに貫通孔 10の直径以上 となるように形成されている。こうすることにより、可動穿孔板 8が所定距離を往復動し てその間の任意の位置に停止させられることにより、両穿孔板 8、 9の全ての貫通孔 1 0同士が一致して貫通孔 10の開口率が 100%となる全開位置と、全ての貫通孔 10 同士が全く重ならずに閉止されて開口率が 0%となる全閉位置とのあいだの任意の 位置 (任意の開口率)に設定することができる。この点については、後述する三枚の 穿孔板を有する均一化装置 16を示す図 7 (a)および図 7 (c)を参照すれば明らかで ある。このように可動穿孔板 9を所定距離だけ可動とするために、可動穿孔板 9の外 形は固定穿孔板 8の外形より小さくされており、両穿孔板 8、 9の貫通孔 10の配置分 布は同位置にされている。 [0044] In each of the perforated plates 8 and 9, the distance between the centers of the through holes 10 is equal to or larger than the diameter of the through holes 10. It is formed to become. In this way, the movable perforated plate 8 reciprocates a predetermined distance and is stopped at an arbitrary position therebetween, so that all the through holes 10 of both the perforated plates 8 and 9 coincide with each other and the through hole 10 Arbitrary position between the fully open position where the aperture ratio is 100% and the fully closed position where all the through holes 10 are closed without overlapping at all and the aperture ratio is 0% (arbitrary aperture ratio) Can be set to This point is apparent with reference to FIGS. 7 (a) and 7 (c) showing a homogenizer 16 having three perforated plates, which will be described later. Thus, in order to make the movable perforated plate 9 movable by a predetermined distance, the outer shape of the movable perforated plate 9 is made smaller than the outer shape of the fixed perforated plate 8, and the arrangement of the through holes 10 of both perforated plates 8 and 9 is performed. The cloth is in the same position.
[0045] 最大開口率の状態は、とくに貫通孔 10の全面積が開口された開口率 100%の状 態に限定することはない。たとえば、貫通孔の全面積の 100%未満の状態を最大開 口状態としてもよい。また、最小開口率の状態は、とくに貫通孔 10の全面積が閉止さ れた開口率 0%の状態に限定することはない。たとえば、貫通孔の全面積の 0%を超 える状態 (少し開 、た状態)を最小開口状態としてもよ!、。このように設定するのであ れば、前述した貫通孔 10の中心間距離は、上記のように貫通孔 10の直径以上にす る必要はない。 [0045] The state of the maximum aperture ratio is not particularly limited to a state where the entire area of the through hole 10 is 100%. For example, a state where the total opening area is less than 100% may be set as the maximum opening state. Further, the state of the minimum opening ratio is not particularly limited to the state of the opening ratio of 0% in which the entire area of the through hole 10 is closed. For example, the state that exceeds 0% of the total area of the through hole (slightly open or closed) may be the minimum open state! With this setting, the distance between the centers of the through holes 10 described above need not be greater than the diameter of the through holes 10 as described above.
[0046] 以上のごとく穿孔板 8、 9の開口率を変化させうるように構成しているのは、主ガスと 副ガスとの混合条件に応じて開口率を変えることにより、当該混合条件下で最適の混 合がなされるようにするためである。混合ガス配管 4内を送られてきた混合ガスの一部 は、穿孔板 8、 9によってー且せき止められて管の中心軸に垂直な方向の流れ成分 が生じる。この作用によって混合ガスはさらに混合される。穿孔板 8、 9を通過する混 合ガスは貫通孔 10から下流側への噴流による拡散渦の発生により、混合の一層の 均一化が実現する。このようなメカニズムによって混合ガスの混合がさらに進み、混合 均一化がなされる。  [0046] The reason why the aperture ratio of the perforated plates 8 and 9 can be changed as described above is that the aperture ratio is changed in accordance with the mixing condition of the main gas and the sub-gas, so that This is to ensure optimal mixing. A part of the mixed gas sent through the mixed gas pipe 4 is blocked by the perforated plates 8 and 9 to generate a flow component in a direction perpendicular to the central axis of the pipe. By this action, the mixed gas is further mixed. The mixed gas that passes through the perforated plates 8 and 9 is made more uniform by mixing due to the generation of diffusion vortices caused by the jet flow downstream from the through hole 10. By such a mechanism, the mixing of the mixed gas further proceeds and the mixing becomes uniform.
[0047] 前述した、均一化装置 6の下流側に設置する均一度検出装置 7としては、混合ガス 配管 4内のガス流路の断面上におけるガスカロリの分布を検出するカロリ検出装置を 採用してもよい。その目的のためには、カロリ検出装置 7の多数の検出部 7aを流路の 断面上にほぼ均一に配置すればよい。検出部 7aは一断面上に限定されず、図示の ごとく複数断面上に配置してもよい。 [0047] As the above-described uniformity detection device 7 installed on the downstream side of the homogenization device 6, a calorie detection device that detects the distribution of gas calories on the cross section of the gas flow path in the mixed gas pipe 4 is adopted. Also good. For that purpose, a large number of detectors 7a of the calorie detector 7 may be arranged almost uniformly on the cross section of the flow path. The detector 7a is not limited to one cross section, As such, they may be arranged on a plurality of cross sections.
[0048] ここで、カロリ検出装置 7としては、ガスのカロリを直接計測する所謂カロリメータ、可 燃成分の含有率 (濃度)を計測する装置などが用いられる。検出速度を重視する場 合は現在では可燃性ガス濃度検出器 (ガス成分検出装置)を用いるのが好ま ヽ。 適用される低カロリガスが主に含む可燃成分の種類や主たる濃度変動が生じる可燃 成分 (たとえば、直接還元鉄法における副生ガスでは一酸ィ匕炭素)に応じて、その成 分の濃度を検出する濃度検出器を用いても良い。均一度検出装置として用いるもの はカロリ検出装置に限定されない。たとえば、ガス流路の断面上におけるガスの比重 の分布を検出するための密度検出装置等、ガスの性状を検出する好適な装置であ れば種々のものをも採用することができる。  [0048] Here, as the calorie detection device 7, a so-called calorimeter that directly measures the calorie of gas, a device that measures the content (concentration) of combustible components, and the like are used. If importance is attached to the detection speed, it is now preferable to use a combustible gas concentration detector (gas component detector). Depending on the type of combustible component contained in the low calorie gas applied and the combustible component in which the main concentration fluctuation occurs (for example, by-product gas in the direct reduction iron method, the concentration of that component is detected) A concentration detector may be used. What is used as a uniformity detector is not limited to a calorie detector. For example, various devices can be adopted as long as they are suitable devices for detecting the properties of gas, such as a density detector for detecting the distribution of the specific gravity of the gas on the cross section of the gas flow path.
[0049] このカロリ検出装置 7によって検出された混合ガスの混合状態に応じて上記穿孔板 8、 9の貫通孔 10の開口率を変化させて、混合の均一化を向上させるために適切な 開口率を選択することができる。この適切な開口率を実現させるための制御装置 30、 上記駆動シリンダ 11に供給する作動油の油量を調節することによってシリンダロッド 1 laのストロークを調整するための油量調節装置 31、および、シリンダロッド 11aの伸 縮位置を検出するための位置検出器 32が設置されている。  [0049] An opening suitable for improving the uniformity of the mixing by changing the opening ratio of the through holes 10 of the perforated plates 8 and 9 according to the mixed state of the mixed gas detected by the calorie detecting device 7 Rate can be selected. A control device 30 for realizing this appropriate opening ratio, an oil amount adjusting device 31 for adjusting the stroke of the cylinder rod 1 la by adjusting the amount of hydraulic oil supplied to the drive cylinder 11, and A position detector 32 is installed to detect the expansion / contraction position of the cylinder rod 11a.
[0050] 制御装置 30には、副ガスの種類をパラメータとして、当該副ガスの混合比(主ガス に対する副ガスの体積割合)とそれに対応した穿孔板の最適開口率とを関係付けた テーブルが記憶されている。さらに、可動穿孔板 8の全開位置を基準として全閉位置 までのシリンダロッド 11aの被検出部位の位置が記憶されている。また、穿孔板の全 開位置と全閉位置との間の移動のために必要な作動油の供給油量が記憶されてい る。  [0050] The control device 30 has a table that relates the mixing ratio of the secondary gas (volume ratio of the secondary gas to the primary gas) and the optimum aperture ratio of the perforated plate corresponding to the secondary gas type as a parameter. It is remembered. Further, the position of the detected portion of the cylinder rod 11a up to the fully closed position with the fully opened position of the movable perforated plate 8 as a reference is stored. In addition, the supply amount of hydraulic oil necessary for the movement of the perforated plate between the fully open position and the fully closed position is stored.
[0051] 制御装置 30は、主ガスの実測カロリ値が燃焼装置の許容上限値を超えないように 、減熱用ガスを選択すると同時に必要な混合量を計算して副ガス供給装置(図示せ ず)に指令を出す。また、制御装置 30は、主ガスの実測カロリ値が許容下限値を下 回らないように、増熱用ガスを選択すると同時に必要な混合量を計算して副ガス供給 装置に指令を出す。増熱用ガスおよび減熱用ガスとしてそれぞれ複数種類のガスが 用意されている場合には、所定の基準に従って適当なガスが選択され、当該ガスの 必要混合量が計算される。 [0051] The control device 30 selects a heat reducing gas so that the measured caloric value of the main gas does not exceed the allowable upper limit value of the combustion device, and at the same time calculates the necessary mixing amount and displays the auxiliary gas supply device (not shown). )). In addition, the control device 30 selects the heat increasing gas so that the measured caloric value of the main gas does not fall below the allowable lower limit value, and simultaneously calculates the necessary amount of mixture and issues a command to the auxiliary gas supply device. When multiple types of gas are prepared as the heat increasing gas and the heat reducing gas, an appropriate gas is selected according to a predetermined standard, and the gas The required mixing amount is calculated.
[0052] そして、主ガスの量に対する副ガスの混合量に応じた穿孔板の最適開口率を上記 テーブルから読みとり、その値に基づいて可動穿孔板 9の移動量を算出し、それに対 応するシリンダへの作動油供給量を制御して穿孔板の目標開口率を実現する。たと えば、副ガスの混合比が小さい場合には開口率を小さくする等である。混合ガスの力 ロリ値と目標カロリ値との乖離を測定する周期は、カロリ値検出時間より長く設定する のが好ましい。  [0052] Then, the optimum aperture ratio of the perforated plate according to the mixing amount of the sub gas with respect to the amount of the main gas is read from the above table, and the movement amount of the movable perforated plate 9 is calculated based on the value, and correspondingly The target opening ratio of the perforated plate is realized by controlling the amount of hydraulic oil supplied to the cylinder. For example, if the mixing ratio of the secondary gas is small, the aperture ratio is reduced. It is preferable to set the period for measuring the difference between the force loli value of the mixed gas and the target calorie value longer than the calorie value detection time.
[0053] 均一化装置 6の下流で均一度検出装置 7を用いて混合ガスの均一度を検出する場 合、検出値をフィードバックして制御することも可能である。この場合、頻繁に可動穿 孔板の調整を行うことによって系が不安定となるおそれがある場合には、この均一度 検出装置 7を主に均一度のモニタリング手段として用いてもょ 、。  [0053] When the uniformity of the mixed gas is detected downstream of the homogenizer 6 using the uniformity detector 7, the detected value can be fed back and controlled. In this case, if there is a risk that the system may become unstable due to frequent adjustment of the movable perforated plate, this uniformity detector 7 may be used mainly as a means for monitoring uniformity.
[0054] なお、混合ガス配管 4のうちこの均一度検出装置 7が内蔵された部分を、混合ガス 配管 4に対して着脱可能に構成することもできる。これは、前述した均一化装置 6の 着脱機構と同じようにフランジ等の管継手を採用することによって可能となる。こうす ることによって均一度検出装置 7のメンテナンスや較正が容易となる。  It should be noted that a portion of the mixed gas pipe 4 in which the uniformity detecting device 7 is built can be configured to be detachable from the mixed gas pipe 4. This can be achieved by adopting a pipe joint such as a flange in the same manner as the attaching / detaching mechanism of the homogenizer 6 described above. This facilitates maintenance and calibration of the uniformity detector 7.
[0055] 貫通孔 10の形状は真円に限らず、長円、正方形や長方形を含む多角形等であつ てもよい。図 3に示すような長い貫通孔 20を採用することもできる。この長い貫通孔 2 0は可動穿孔板 9の移動方向に対して垂直な方向に延びており、可動穿孔板 9の移 動方向に間隔をお!、て複数力所形成されて!、る。この貫通孔 20の間隔は等間隔で あるのが好ましい。図 3 (a)では可動穿孔板 9の貫通孔 20だけが見える力 もちろん 固定穿孔板 8にも同じ大きさおよび同じ形状の複数の貫通孔が同じ配置で形成され ている。この貫通孔 20は、同一面積の穿孔板に形成する場合、前述の小さい円形や 正方形の貫通孔 10を多数形成するよりも全開時の開口面積が大きくなる点で好まし い。  [0055] The shape of the through hole 10 is not limited to a perfect circle, and may be an ellipse, a polygon including a square, a rectangle, or the like. A long through hole 20 as shown in FIG. 3 can also be employed. The long through-hole 20 extends in a direction perpendicular to the moving direction of the movable perforated plate 9, and a plurality of force points are formed at intervals in the moving direction of the movable perforated plate 9. The intervals between the through holes 20 are preferably equal. In FIG. 3 (a), only the through hole 20 of the movable perforated plate 9 can be seen. Of course, the fixed perforated plate 8 is also formed with a plurality of through holes having the same size and the same shape. When the through holes 20 are formed in a perforated plate having the same area, it is preferable in that the opening area when fully opened is larger than the formation of many small circular or square through holes 10 described above.
[0056] 混合ガス配管 4がその長手方向に沿って一定の管内径を有しておれば、穿孔板 8 、 9の開口率を 100%に設定したとしても、そこの開口面積は混合ガス配管 4の流路 断面積より小さくなる。しかし、全開状態としたときの穿孔板 8、 9の開口面積をできる だけ大きくするのが圧損低減のためにも好ましい。そのために、図 2に示すように、混 合ガス配管 4の均一化装置 6が設置されている部分はその上流側および下流側の部 分より流路の断面積が大きくされている。すなわち、本実施形態の混合ガス配管 4は 円形断面であるため、その管径が拡大されている。この結果、穿孔板 8、 9の実面積 が大きくなる。それに伴って全開時の穿孔板 8、 9の全体の開口面積が広くなり、上流 側および下流側の混合ガス配管 4の流路断面積と同等またはそれ以上にすることが できる。 [0056] If the mixed gas pipe 4 has a constant pipe inner diameter along its longitudinal direction, even if the aperture ratio of the perforated plates 8 and 9 is set to 100%, the opening area thereof is the mixed gas pipe. It becomes smaller than the cross-sectional area of 4 channels. However, to reduce the pressure loss, it is preferable to increase the opening area of the perforated plates 8 and 9 as much as possible when they are fully opened. Therefore, as shown in Figure 2, The section of the mixed gas pipe 4 where the homogenizer 6 is installed has a larger cross-sectional area than the upstream and downstream portions. That is, since the mixed gas pipe 4 of this embodiment has a circular cross section, the pipe diameter is enlarged. As a result, the actual area of the perforated plates 8 and 9 is increased. Accordingly, the entire opening area of the perforated plates 8 and 9 when fully opened is widened, and can be equal to or larger than the flow path cross-sectional area of the mixed gas pipe 4 on the upstream side and the downstream side.
[0057] 以上の実施形態では拡径された混合ガス配管 4の部分が均一化装置 6の前後で同 一径となっているが、この構成に限定されない。均一化装置 6の直後(下流側)の部 分の管径を直前 (上流側)の管径より大きくすることも選択肢としてある。このようにす れば、混合ガスが均一化装置 6を通過した直後に膨張拡散するために、混合効果が さらに向上することが期待できる。  [0057] In the above embodiment, the diameter of the expanded mixed gas pipe 4 is the same before and after the homogenizer 6, but it is not limited to this configuration. It is also an option to make the tube diameter immediately after (downstream) the homogenizer 6 larger than the tube diameter immediately before (upstream). In this way, since the mixed gas expands and diffuses immediately after passing through the homogenizer 6, it can be expected that the mixing effect is further improved.
[0058] また、図 2に示すように、穿孔板 8、 9を混合ガス配管 4の中心軸に垂直な面に対し て傾斜させた状態に設置しうる形状にすることによってさらに開口面積を増大させる ことができる。穿孔板 8、 9を傾斜した状態で混合ガス配管 4の流路一杯に拡がる形 状 (楕円形)とすることによって、その実面積が増加し、形成される貫通孔 10の個数を も増大させうるからである。たとえば、同一の大きさ形状の貫通孔 10を同一ピッチで 形成する場合であって、穿孔板 8、 9を混合ガス配管 4の中心軸に垂直な面カゝら角度 Θ傾斜させれば、穿孔板の実面積が lZcos Θ倍となるので、貫通孔 10の個数もほ ぼ lZcos Θ倍となり、全体の開口面積も同様となる。  In addition, as shown in FIG. 2, the opening area is further increased by making the perforated plates 8 and 9 into a shape that can be installed in a state of being inclined with respect to a plane perpendicular to the central axis of the mixed gas pipe 4. It can be made. By making the shape of the mixed gas pipe 4 to fill the entire flow path (ellipse) with the perforated plates 8 and 9 inclined, the actual area can be increased and the number of through-holes 10 formed can be increased. Because. For example, if through holes 10 of the same size and shape are formed at the same pitch, and if the perforated plates 8 and 9 are inclined by an angle Θ from the surface perpendicular to the central axis of the mixed gas pipe 4, the perforations are formed. Since the actual area of the plate is lZcos Θ times, the number of through holes 10 is almost lZcos Θ times, and the overall opening area is the same.
[0059] この場合、穿孔板 8、 9に対する貫通孔 10の穿孔方向は、図 2に示すように、混合 ガス配管 4の中心軸方向(流体の流れ方向)とするのが穿孔板の流路抵抗が小さくな るので好ましい。しかし、この場合、穿孔板の面に垂直な方向に対して傾斜した方向 に穿孔することになるため、加工コストは上昇するであろう。したがって、加工コストの 低減を重視するなら、穿孔板 8、 9の面に対して垂直な方向に穿孔してもよい。  In this case, the perforation direction of the through hole 10 with respect to the perforated plates 8 and 9 is the center axis direction (fluid flow direction) of the mixed gas pipe 4 as shown in FIG. This is preferable because the resistance is reduced. In this case, however, the machining cost will increase because the holes are drilled in a direction inclined with respect to the direction perpendicular to the surface of the punch plate. Therefore, if it is important to reduce the processing cost, it may be perforated in a direction perpendicular to the surface of the perforated plates 8 and 9.
[0060] 図 4および図 5に示すように、固定穿孔板 8には可動穿孔板 9の移動を案内するた めの案内部材 14が取り付けられている。この案内部材 14は、固定穿孔板 8における 可動穿孔板 9側の面上の両側部(可動穿孔板 9の移動方向の両端側)に設置された L字状断面の部材である。可動穿孔板 9は、その両側部が案内部材 14と固定穿孔板 8との間に係合することによってその摺動が案内される。なお、図 4の固定穿孔板 8お よび可動穿孔板 9は、その面が鉛直状に配置された状態、つまり混合ガス配管 4の中 心軸に垂直となるように配置された状態を示して 、る。 As shown in FIGS. 4 and 5, the fixed perforated plate 8 is provided with a guide member 14 for guiding the movement of the movable perforated plate 9. This guide member 14 is a member having an L-shaped cross section installed on both side portions (both ends in the moving direction of the movable perforated plate 9) on the surface of the fixed perforated plate 8 on the movable perforated plate 9 side. The movable perforated plate 9 has guide members 14 and fixed perforated plates on both sides. The sliding is guided by engaging between the two. Note that the fixed perforated plate 8 and the movable perforated plate 9 in FIG. 4 are shown in a state where their surfaces are arranged vertically, that is, in a state where they are arranged perpendicular to the center axis of the mixed gas pipe 4. RU
[0061] さらに、図 4の均一化装置では、駆動シリンダ 11が可動穿孔板 9の上部に連結され 、可動穿孔板 9は駆動シリンダ 11に吊り下げられた状態で移動させられるように構成 されている。また、図 4には前述した駆動シリンダ 11のロッド 11aと可動穿孔板 9との 連結部分が詳細に示されている。連結棒 12は可動穿孔板 9に固定され、連結棒 12 とシリンダロッド 11aとはピン結合されている。これは例示であり、他の連結機構を排 除するものではない。図 4ではシール機構 13はその図示が省略されている。  Furthermore, in the homogenizing device of FIG. 4, the drive cylinder 11 is connected to the upper part of the movable perforated plate 9, and the movable perforated plate 9 is configured to be moved while being suspended from the drive cylinder 11. Yes. FIG. 4 shows in detail the connecting portion between the rod 11a of the drive cylinder 11 and the movable perforated plate 9 described above. The connecting rod 12 is fixed to the movable perforated plate 9, and the connecting rod 12 and the cylinder rod 11a are pin-coupled. This is an example and does not exclude other coupling mechanisms. In FIG. 4, the sealing mechanism 13 is not shown.
[0062] 図 6〜図 9には三枚の穿孔板力もなる均一化装置 16が示されている。この均一化 装置 16は、スぺーサ 15を介在させることによって間隔をおいて平行に配置された二 枚の固定穿孔板 8の間に、一枚の可動穿孔板 9が摺動可能に配置されたものである 。二枚の固定穿孔板 8は可動穿孔板 9の厚さとほぼ同じ寸法の間隔をあけている。三 枚の穿孔板 8、 9の貫通孔 10は、前述したと同様に、互いに同じ大きさ、同じ形状、 同じ配置で形成されている。二枚の固定穿孔板 8は、図示のごとくそれらの各貫通孔 10が逐一対向するように配置してもよい。それにより、図 7 (a)に示すように、可動穿 孔板 9が移動してこの均一化装置 16が全開位置となると、可動穿孔板 9の貫通孔 10 も二枚の固定穿孔板 8の貫通孔 10と一致して貫通孔の開口率が 100%となる。また 、可動穿孔板 9が全開位置から貫通孔 10の直径 dだけ移動することにより、全貫通孔 10が全閉状態となり(図 7 (c) )、開口率が 0%となる。図 7 (b)に示すのは、中間開口 率の状態である。  FIGS. 6 to 9 show a homogenizer 16 that also has three punching plate forces. In this homogenizer 16, a single movable perforated plate 9 is slidably disposed between two fixed perforated plates 8 arranged in parallel at a distance by interposing a spacer 15. It is a thing. The two fixed perforated plates 8 are spaced with the same dimension as the thickness of the movable perforated plate 9. The through holes 10 of the three perforated plates 8 and 9 are formed in the same size, the same shape and the same arrangement as described above. The two fixed perforated plates 8 may be arranged so that their through holes 10 face each other as shown. As a result, as shown in FIG. 7 (a), when the movable perforated plate 9 moves and the homogenizing device 16 reaches the fully open position, the through-hole 10 of the movable perforated plate 9 also has two fixed perforated plates 8. In agreement with the through hole 10, the opening ratio of the through hole is 100%. Further, when the movable perforated plate 9 moves from the fully open position by the diameter d of the through hole 10, the full through hole 10 is fully closed (FIG. 7 (c)), and the aperture ratio becomes 0%. Figure 7 (b) shows the state of the intermediate aperture ratio.
[0063] 図 8および図 9に示すように、上記スぺーサ 15は二枚の固定穿孔板 9間の両側部 に配設されており、スぺーサ 15同士の離間距離はほぼ可動穿孔板 9の幅寸法と同じ にされている。力かる構成により、スぺーサ 15と二枚の固定穿孔板 8とが可動穿孔板 9の案内部材としての作用を奏する。  As shown in FIGS. 8 and 9, the spacers 15 are disposed on both sides between the two fixed perforated plates 9, and the spacing between the spacers 15 is almost the same as the movable perforated plates. It is the same as the width dimension of 9. Due to the powerful configuration, the spacer 15 and the two fixed perforated plates 8 function as a guide member for the movable perforated plate 9.
[0064] また、可動穿孔板 9はその両面側を二枚の固定穿孔板 8によって保持され、橈む心 配がないのでその板厚を薄くすることができる。その結果、穿孔板の重量が軽減し、 駆動機構の簡素化が可能となり、開口率の設定精度を向上させることができる。 [0065] 貫通孔の配置は、前述したような碁盤の目状(図 4および図 8)や上下複数段配置( 図 3)に限定されない。たとえば、同心状且つ等間隔の複数の仮想円上に配置され た貫通孔をも採用することができる。この場合は、可動穿孔板 8を仮想円の中心回り に回転するように構成すればよい。したがって、各仮想円上では貫通孔は等間隔に 配置されるが、中心に近い仮想円上の貫通孔ほどその配置間隔を小さくする。 [0064] Further, since the movable perforated plate 9 is held by the two fixed perforated plates 8 on both sides thereof, the thickness of the movable perforated plate 9 can be reduced because there is no concern about pinching. As a result, the weight of the perforated plate is reduced, the drive mechanism can be simplified, and the aperture ratio setting accuracy can be improved. [0065] The arrangement of the through holes is not limited to the grid pattern (Figs. 4 and 8) or the upper and lower multi-stage arrangement (Fig. 3) as described above. For example, through holes arranged on a plurality of concentric and equally spaced virtual circles can also be employed. In this case, the movable perforated plate 8 may be configured to rotate around the center of the virtual circle. Accordingly, the through holes are arranged at equal intervals on each virtual circle, but the arrangement intervals are made smaller as the through holes are on the virtual circle closer to the center.
[0066] 図 10〜図 12には、穿孔板 8、 9の下流側に、穿孔板 8、 9同士の間の面ゃ両穿孔 板 8、 9の貫通孔 10を洗浄するための洗浄装置 17を備えた均一化装置 26が示され ている。本実施形態の洗浄装置 17は可動穿孔板 9の下流側の面にほぼ対向し、上 下に間隔をおいてほぼ水平方向に延設された複数本の洗浄液供給配管 18を備え ている。各洗浄液供給配管 18には間隔をおいて複数個の噴射ノズル 19が配設され ている。図 11に示すように、洗浄液供給配管 18は一本力 上記のごとく複数本に分 岐されたものである。各分岐管 18は混合ガス配管 4にフランジ継手 27によって取り付 けられており、その下流側先端は閉止プラグ 28によって閉塞されている。洗浄液供 給配管 18の上流側部分には開閉弁 29が設置されている。この開閉弁 29は、混合流 体の供給を停止している期間に、自動で間欠的に開閉されるようにしてもよい。図 11 では案内部材 14や駆動シリンダ 11の図示を省略して 、る。  In FIGS. 10 to 12, in the downstream side of the perforated plates 8 and 9, a cleaning device 17 for cleaning the through holes 10 of the perforated plates 8 and 9 between the perforated plates 8 and 9 is shown. A homogenizer 26 with is shown. The cleaning device 17 of the present embodiment is provided with a plurality of cleaning liquid supply pipes 18 that are substantially opposed to the downstream surface of the movable perforated plate 9 and that extend in a substantially horizontal direction with an interval between the upper and lower sides. Each cleaning liquid supply pipe 18 is provided with a plurality of spray nozzles 19 at intervals. As shown in FIG. 11, the cleaning liquid supply pipe 18 is split into a plurality of lines as described above. Each branch pipe 18 is attached to the mixed gas pipe 4 by a flange joint 27, and its downstream end is closed by a closing plug 28. An on-off valve 29 is installed in the upstream portion of the cleaning liquid supply pipe 18. The on-off valve 29 may be automatically opened and closed intermittently during the period when the supply of the mixed fluid is stopped. In FIG. 11, the guide member 14 and the drive cylinder 11 are not shown.
[0067] この噴射ノズル 19は、洗浄効果の観点からは貫通孔 10と同一個数であって貫通 孔 10と一対一に対応するように配設するのが好ましい。しかし、とくにかかる構成に 限定されない。たとえば、各ノズル 19から洗浄液が比較的広範囲に噴射されるように し、また、最上位置にある貫通孔 10も含めて多くの貫通孔に洗浄液が噴射されるよう にノズルを配置するようにすればよい。洗浄液が穿孔板 8、 9上を下方に流れ落ちる ことによつても洗浄効果が発揮される。さらに、複数本の洗浄液供給配管 18を個別 にその中心軸回りに回転可能とし、それによつてノズル 19の向きを上下方向に変更 可能とすることは容易である。そして、混合ガス配管 4には洗浄装置 17および穿孔板 8、 9を目視確認しうるように点検窓を設けてもよい。これにより、洗浄状態を確認した 結果、必要に応じて洗浄液の噴射角度が最適になるように、洗浄液供給配管 18を回 転させてノズル 19の向きを変更することができる。  [0067] From the viewpoint of the cleaning effect, the number of the injection nozzles 19 is preferably the same as the number of the through holes 10 and correspond to the through holes 10 on a one-to-one basis. However, the configuration is not particularly limited. For example, the cleaning liquid is sprayed from each nozzle 19 over a relatively wide range, and the nozzles are arranged so that the cleaning liquid is sprayed into many through holes including the uppermost through hole 10. That's fine. The cleaning effect is also exhibited by the fact that the cleaning liquid flows down on the perforated plates 8 and 9. Further, it is easy to individually rotate a plurality of cleaning liquid supply pipes 18 around the central axis thereof, thereby making it possible to change the direction of the nozzle 19 in the vertical direction. The mixed gas pipe 4 may be provided with an inspection window so that the cleaning device 17 and the perforated plates 8 and 9 can be visually confirmed. Thereby, as a result of confirming the cleaning state, the direction of the nozzle 19 can be changed by rotating the cleaning liquid supply pipe 18 so that the spraying angle of the cleaning liquid is optimized as necessary.
[0068] また、設置する噴射ノズル 19の個数は限定されな ヽ。洗浄液を広範囲に噴射する ことのできる一個のノズルを採用してもよい。この場合、洗浄液供給配管 18は一本の み配設されることになる。洗浄装置 17近傍の混合ガス配管 4の底部に、洗浄後の洗 浄液を集液するための集液溝 33を形成し、この集液溝 33の底部に排液のためのド レン孔 34を形成しておくのもよい。 [0068] The number of the injection nozzles 19 to be installed is not limited. Spray cleaning liquid over a wide area One nozzle that can be used may be employed. In this case, only one cleaning liquid supply pipe 18 is provided. A collecting groove 33 is formed in the bottom of the mixed gas pipe 4 in the vicinity of the cleaning device 17 to collect the cleaning liquid after cleaning. It is also possible to form.
[0069] 洗浄装置 17の設置位置は穿孔板 8、 9の下流側に限定されず、上流側であっても よぐ上流および下流の両側であってもよい。図示の穿孔板 8、 9は鉛直方向に立設 されているが、図 2や図 6に示すごとく穿孔板 8、 9が傾斜している場合は、洗浄装置 1 7をその上面側(図 2や図 6で言えば穿孔板の右側)に設置するのが好ましい。下面 側に設置する場合に比べて、噴射された洗浄液が穿孔板の面上を流れ落ちることに よって洗浄効果が向上するからである。  [0069] The installation position of the cleaning device 17 is not limited to the downstream side of the perforated plates 8, 9, and may be on the upstream side or on both the upstream and downstream sides. The perforated plates 8 and 9 shown in the figure are erected in the vertical direction. However, when the perforated plates 8 and 9 are inclined as shown in FIGS. 2 and 6, the cleaning device 17 is placed on the upper surface side (FIG. 2). It is preferable to install it on the right side of the perforated plate in FIG. This is because the cleaning effect is improved by the sprayed cleaning liquid flowing down on the surface of the perforated plate as compared with the case where it is installed on the lower surface side.
[0070] 上記洗浄装置 17を備えることにより、たとえば粉塵等が穿孔板やその貫通孔に付 着して流路抵抗が増大したり穿孔板のいわゆるスティックが生じたりすることを予防す ることができる。これにより、この混合流体供給設備 1の運転停止時に、均一化装置 6 の洗浄のために作業員が管路内に立ち入ることを不要とするか、または、その頻度を 大幅に減らすことができる。  [0070] By providing the cleaning device 17, it is possible to prevent dust or the like from adhering to the perforated plate and its through-holes to increase the flow resistance or generate a so-called stick of the perforated plate. it can. Thereby, when the operation of the mixed fluid supply facility 1 is stopped, it is not necessary for an operator to enter the pipeline for cleaning the homogenizer 6, or the frequency can be greatly reduced.
[0071] この洗浄装置 17が内蔵された混合ガス配管 4の部分についても、前述したと同様 に、フランジ等の管継手を採用することによって他の混合ガス配管 4部分に対して着 脱可能に構成することができる。こうすることによって洗浄装置 17のメンテナンスが容 易となる。  [0071] Similarly to the above, the portion of the mixed gas pipe 4 in which the cleaning device 17 is built can be attached to and detached from the other mixed gas pipe 4 by adopting a pipe joint such as a flange. Can be configured. By doing so, the maintenance of the cleaning device 17 becomes easy.
[0072] 図 13には、他の態様の混合ガス配管 21が示されている。この混合ガス配管 21は、 平行に延びる二本の配管 21a、 21bの端部同士力 それら 21a、 21bに直角な短管 2 lcによって接続されたものである。このように構成したのは、均一化装置 6の部分の 混合ガス配管 21cの流路面積を簡易な構成によって十分に拡大するためである。ま た、二本の配管 21a、 21bは横方向に平行に配置してもよいが、図示のごとく上下に 平行に配置した場合、上記短管 21cは上下方向に延びることになり、穿孔板 8、 9は その面がほぼ水平となるように配置されることになるので好ましい。こうすると、可動穿 孔板 9を固定穿孔板 8の上面に載置した状態に配置することができるので可動穿孔 板 9の移動が安定する力もである。また、混合ガス配管 21は、図示のごとく混合流体 の流れが均一化装置 6の下から上に向力う態様に限定されず、均一化装置 6の上流 側配管 21 aを下流側配管 2 lbより上方に配置して、混合流体が均一化装置 6の上か ら下に向かって流れるようにしてもよ 、。 FIG. 13 shows a mixed gas pipe 21 of another embodiment. The mixed gas pipe 21 is connected by a short pipe 2 lc perpendicular to the ends 21a and 21b of two pipes 21a and 21b extending in parallel. The reason for this configuration is to sufficiently expand the flow channel area of the mixed gas pipe 21c in the homogenizer 6 with a simple configuration. The two pipes 21a and 21b may be arranged in parallel in the horizontal direction. However, if the pipes 21a and 21b are arranged in parallel in the vertical direction as shown in the figure, the short pipe 21c extends in the vertical direction, and the perforated plate 8 9 is preferable because the surface is arranged to be almost horizontal. In this way, the movable perforated plate 9 can be placed in a state of being placed on the upper surface of the fixed perforated plate 8, so that the movement of the movable perforated plate 9 is also stable. The mixed gas pipe 21 is a mixed fluid as shown in the figure. Is not limited to a mode in which the flow of the pressure is directed from the bottom to the top of the homogenizer 6, but the upstream pipe 21a of the homogenizer 6 is arranged above 2 lb of the downstream pipe so that the mixed fluid becomes uniform. 6 You can make it flow from top to bottom.
[0073] また、上記のごとく二本の配管 21a、 21bを、これらに対して直角な短管 21cによつ て接続するのではなぐ図 14に示すように二本の配管 21a、 21bを傾斜短管 21d、す なわち、二本の配管 21a、 21bの中心軸に対して鈍角をなす方向に延びる短管 21d によって接続してもよい。こうすることにより、管路の圧力損失が低減されるだけでなく 、穿孔板 8、 9が傾斜短管 21dの中心軸に対して斜めに配置されることとなるので、管 路断面積に対する穿孔板 8、 9の実面積が増大し、穿孔板 8、 9による流体抵抗が低 下する。 [0073] In addition, the two pipes 21a and 21b are not connected to each other by the short pipe 21c perpendicular to the two pipes 21a and 21b as described above. The short pipe 21d, that is, the short pipe 21d extending in an obtuse angle with respect to the central axis of the two pipes 21a and 21b may be connected. In this way, not only the pressure loss of the pipe is reduced, but also the perforated plates 8 and 9 are arranged obliquely with respect to the central axis of the inclined short pipe 21d. The actual area of the plates 8 and 9 increases, and the fluid resistance due to the perforated plates 8 and 9 decreases.
[0074] 以上説明した均一化装置 6、 16には、混合ガスの混合を均一化すること以外に優 れた機能がある。その機能は、たとえばガスタービン等の燃焼装置に燃料ガスを供給 する配管に設置することによって発揮される。上記燃焼装置を緊急停止するとき、燃 料ガスの供給を瞬時に停止するために燃料ガス供給配管に設置された緊急遮断弁 を閉弁する。そうすると、燃料ガスの流れの急激な運動量変化によって燃料ガス供給 配管の上流側に向かって急激な圧力変動が伝播しょうとする。このときにタイミングよ く均一化装置 6、 16の開口率を急速に低減するかゼロにすることにより、上記圧力伝 播が抑制または抑止される。その結果、サージタンクや大気放散塔を不要とすること ができる力 少なくともこれらの少容量ィ匕を図ることができる。  [0074] The homogenizers 6, 16 described above have an excellent function other than homogenizing the mixing of the mixed gas. This function is demonstrated by installing it in a pipe that supplies fuel gas to a combustion device such as a gas turbine. When an emergency stop of the combustion device, the emergency shut-off valve installed in the fuel gas supply pipe is closed to stop the supply of fuel gas instantaneously. Then, sudden pressure fluctuations tend to propagate toward the upstream side of the fuel gas supply piping due to sudden momentum changes in the fuel gas flow. At this time, the pressure propagation is suppressed or suppressed by reducing the aperture ratio of the homogenizers 6 and 16 rapidly or to zero in a timely manner. As a result, a force that can eliminate the need for a surge tank and an atmospheric diffusion tower, at least, can be achieved with these small capacities.
[0075] 図 15〜図 17には、このように配管の下流側から上流側に向力う急激な圧力変動の 伝播を抑制防止するために穿孔板を使用した他の実施形態が示されている。この実 施形態は、その中心を通る仮想直線の回りに回転可能な一枚の回転穿孔板 22を備 えている。図 15に示す配管 23は円形断面のものが採用されているため、この回転穿 孔板は図 16に示すように円形状を呈している。もちろん、円形に限定されず、たとえ ば四角形断面の配管に対しては図 17に示す四角形状の回転穿孔板 24を採用する 等、配管の断面形状に応じて形状を選定すればよい。ただし、配管の中心軸に垂直 な面で切った断面と同一形状にする必要はない。配管の中心軸に垂直な面力も前 後に傾斜した断面形状と同一の形状にしてもよい。また、図示のごとぐ全貫通孔 10 の開口面積を大きくするために、回転穿孔板 22の設置部分について配管 23の径を 拡大してもよい。貫通孔 10の形状は前述した均一化装置 6、 16におけると同様に、 真円に限らず、長円、正方形や長方形を含む多角形等であってもよい。 FIGS. 15 to 17 show another embodiment in which a perforated plate is used to suppress and prevent the propagation of sudden pressure fluctuations directed from the downstream side to the upstream side of the pipe. Yes. This embodiment comprises a single rotary perforated plate 22 that can rotate about a virtual straight line passing through its center. Since the pipe 23 shown in FIG. 15 has a circular cross section, the rotary perforated plate has a circular shape as shown in FIG. Of course, the shape is not limited to a circle, and the shape may be selected in accordance with the cross-sectional shape of the pipe, for example, a quadrangular rotating perforated plate 24 shown in FIG. However, it does not have to be the same shape as the section cut by a plane perpendicular to the central axis of the pipe. The surface force perpendicular to the central axis of the pipe may be the same shape as the cross-sectional shape inclined forward and backward. In addition, as shown in the figure, all through holes 10 In order to increase the opening area of the pipe 23, the diameter of the pipe 23 may be enlarged at the portion where the rotary perforated plate 22 is installed. The shape of the through hole 10 is not limited to a perfect circle, but may be an ellipse, a polygon including a square, a rectangle, or the like, as in the homogenizers 6 and 16 described above.
[0076] このように形成された回転穿孔板 22の両側端には、回転穿孔板 22、 24の中心を 通り、配管を貫通して横方向に延びる回転軸 25が突設されている。この回転軸 25は 配管 23の外部に設置された図示しない回転駆動機に接続されている。回転駆動機 は、たとえば電動モータ、流体圧シリンダ等を採用することができる。この回転駆動機 によって回転軸 25を回転させることにより、回転穿孔板 22、 24が配管内の流路一杯 に拡カ ¾位置(図 15中の実線で示すように、貫通孔が無いとすれば流路を閉塞する 位置であり、これを全閉位置と呼ぶ)と、その面が配管の中心軸に沿う方向となる位 置(図 15中の二点鎖線で示す位置であり、全開位置と呼ぶ)との間を回転させられる 。そして、全開位置と全閉位置、および、それら両位置の間の任意の角度位置に停 止させるように構成してちょ 、。  [0076] On both side ends of the rotary perforated plate 22 formed in this way, a rotary shaft 25 that protrudes in the lateral direction through the pipe passes through the centers of the rotary perforated plates 22 and 24. The rotary shaft 25 is connected to a rotary drive machine (not shown) installed outside the pipe 23. For example, an electric motor, a fluid pressure cylinder, or the like can be adopted as the rotary drive machine. By rotating the rotary shaft 25 by this rotary drive machine, the rotary perforated plates 22 and 24 are expanded to the full flow path in the pipe (if there is no through hole as shown by the solid line in FIG. 15). The position that closes the flow path, which is called the fully closed position, and the position whose surface is along the central axis of the pipe (the position indicated by the two-dot chain line in FIG. Can be rotated between. And configure it to stop at the fully open position, the fully closed position, and any angular position between them.
[0077] 図 15〜図 17に示す実施形態では回転穿孔板 22、 24は水平方向の軸回りに回転 するように構成されている力 これには限定されない。たとえば、鉛直軸回りに回転さ せてもよぐ水平と鉛直との間の任意の回転軸回りに回転させてもよい。さらに、回転 穿孔板 22、 24の停止位置を検出するための回転位置検出装置を設置し、回転穿孔 板が適正な位置に停止して 、る力否かの確認ができるようにしてもょ 、。  In the embodiment shown in FIGS. 15 to 17, the rotary perforated plates 22 and 24 are configured to rotate around a horizontal axis, but are not limited thereto. For example, it may be rotated around an arbitrary rotation axis between horizontal and vertical, which may be rotated around the vertical axis. In addition, a rotation position detection device for detecting the stop position of the rotating perforated plates 22 and 24 may be installed so that the rotating perforated plate can stop at an appropriate position to check whether the force is sufficient. .
[0078] この回転穿孔板 22、 24は上記燃焼装置が通常に運転しているときには全開状態 にされ、燃料ガスの流れに大きな抵抗を与えないようにしている。しかし、前述のごと く配管 23の下流の緊急遮断弁を閉弁することによって上流に向けて急激な圧力変 動が伝播しょうとしたとき、回転穿孔板 22、 24が急速に回転して全閉位置に至る。こ れにより、流体の流路は最終的に回転穿孔板の貫通孔 10だけとなるので、配管 23 内の流路抵抗が急激に増カロして圧力変動が減衰させられ、その伝播が抑制される。  [0078] The rotary perforated plates 22 and 24 are fully opened when the combustion apparatus is operating normally so as not to give a large resistance to the flow of fuel gas. However, as described above, when the sudden pressure change is about to propagate upstream by closing the emergency shut-off valve downstream of the pipe 23, the rotary perforated plates 22, 24 rotate rapidly and are fully closed. To the position. As a result, since the fluid flow path finally becomes only the through hole 10 of the rotary perforated plate, the flow resistance in the pipe 23 suddenly increases, pressure fluctuation is attenuated, and its propagation is suppressed. The
[0079] この回転穿孔板 22、 24は、かかる目的以外にも混合流体の混合均一化装置として 使用することちできる。  [0079] The rotating perforated plates 22 and 24 can be used as a mixing and homogenizing device for a mixed fluid other than the above purpose.
[0080] 以上説明した実施形態では、燃焼設備としてガスタービンを例示して 、るが、本発 明の適用は特にガスタービンに限定されない。燃焼設備としてたとえば、火力ボイラ 、ディーゼルエンジンやガスエンジン等の内燃機関であってもよい。要するに、入熱 変動が一定範囲内にあれば燃焼を維持することができるような燃焼設備には本発明 の均一化装置を適用することができる。 [0080] In the embodiment described above, a gas turbine is exemplified as the combustion equipment. However, the application of the present invention is not particularly limited to the gas turbine. For example, a thermal boiler as a combustion facility An internal combustion engine such as a diesel engine or a gas engine may be used. In short, the homogenizing device of the present invention can be applied to a combustion facility that can maintain combustion if fluctuations in heat input are within a certain range.
産業上の利用可能性 Industrial applicability
本発明の混合流体均一化装置によれば、既設の混合器の設置の有無に関係なく 、供給される流体混合の均一性を向上させることができる。さらに、均一化装置の適 用対象流体としてガスを例示して ヽるがカゝかる気体のみに限定されな ヽ。液体の供 給設備にも適用することができる。さらに、粉体やスラリ等の供給設備にも適用するこ とがでさる。  According to the mixed fluid homogenizing apparatus of the present invention, the uniformity of the fluid mixture supplied can be improved regardless of whether or not the existing mixer is installed. Furthermore, although gas is exemplified as the application target fluid of the homogenizer, it is not limited to only the gas that is generated. It can also be applied to liquid supply facilities. Furthermore, it can be applied to supply equipment for powders and slurries.

Claims

請求の範囲 The scope of the claims
[1] 流体の流路内に配設される、互いに重なり合って接する相対変位可能な複数枚の 穿孔板を備えており、  [1] It is provided with a plurality of perforated plates that are disposed in the fluid flow path and that are in contact with each other so as to overlap each other.
各穿孔板には複数個の貫通孔が形成されており、上記複数枚の穿孔板が重なり合 つた状態で互いの面方向に相対変位することにより、各穿孔板の貫通孔の重なり程 度が変化して全貫通孔の開口率が変化するように構成されてなる混合流体の均一化 装置。  A plurality of through holes are formed in each perforated plate, and the degree of overlap of the through holes of each perforated plate is reduced by relative displacement in the surface direction with the plurality of perforated plates overlapping. An apparatus for homogenizing a mixed fluid, which is configured to change so that the aperture ratio of all through holes changes.
[2] 上記流路の外部に配設された、穿孔板を移動させるための穿孔板移動装置をさら に含んでおり、  [2] It further includes a perforated plate moving device for moving the perforated plate disposed outside the flow path,
上記複数枚の穿孔板が、流路内部に固定された固定穿孔板と、固定されずに移動 可能にされた可動穿孔板とを備えており、該可動穿孔板が上記穿孔板移動装置によ つて往復動させられるように構成されてなる請求項 1記載の混合流体の均一化装置。  The plurality of perforated plates include a fixed perforated plate fixed inside the flow path and a movable perforated plate that is movable without being fixed, and the movable perforated plate is moved by the perforated plate moving device. 2. The apparatus for homogenizing a mixed fluid according to claim 1, wherein the apparatus is configured to reciprocate.
[3] 上記全貫通孔の開口率が最大の時の開口面積が、流路の断面積と同一かまたは それ以上に形成されてなる請求項 1記載の混合流体の均一化装置。 [3] The mixed fluid homogenizing device according to claim 1, wherein an opening area when the opening ratio of all the through-holes is maximum is equal to or larger than a cross-sectional area of the flow path.
[4] 上記穿孔板が、流路の中心軸に対して垂直な方向から傾斜して配置されてなる請 求項 1記載の混合流体の均一化装置。 [4] The mixed fluid homogenizing device according to claim 1, wherein the perforated plate is disposed so as to be inclined from a direction perpendicular to the central axis of the flow path.
[5] 上記固定穿孔板に移動案内部材が取り付けられており、該移動案内部材が、可動 穿孔板の往復動方向に垂直な方向の両側部分に係合してその移動を案内するよう に構成されてなる請求項 2記載の混合流体の均一化装置。 [5] A movement guide member is attached to the fixed perforated plate, and the movement guide member is configured to engage both side portions in a direction perpendicular to the reciprocating direction of the movable perforated plate to guide the movement. The device for homogenizing a mixed fluid according to claim 2.
[6] 一枚の可動穿孔板が二枚の固定穿孔板の間に配置されており、該ニ枚の固定穿 孔板の間に、可動穿孔板が摺動移動可能な隙間を保持するスぺーサが配設されて おり、 [6] A single movable perforated plate is disposed between two fixed perforated plates, and a spacer is disposed between the two fixed perforated plates to maintain a gap in which the movable perforated plate can slide. Is installed,
該ニ枚の固定穿孔板およびスぺーサが可動穿孔板の移動を案内する機能を奏す る請求項 1記載の混合流体の均一化装置。  2. The mixed fluid homogenizing device according to claim 1, wherein the two fixed perforated plates and the spacer have a function of guiding the movement of the movable perforated plate.
[7] 上記貫通孔が、可動穿孔板の移動方向に垂直な方向に延びる長孔状に形成され てなる請求項 1記載の混合流体の均一化装置。 7. The mixed fluid homogenizing device according to claim 1, wherein the through hole is formed in a long hole shape extending in a direction perpendicular to the moving direction of the movable perforated plate.
[8] 上記流路内に配設された、上記貫通孔を洗浄するための洗浄装置をさらに含んで おり、該洗浄装置が洗浄用の液体を噴出する複数個のノズルを有してなる請求項 1 記載の混合流体の均一化装置。 [8] The apparatus further includes a cleaning device disposed in the flow path for cleaning the through hole, and the cleaning device includes a plurality of nozzles for ejecting a cleaning liquid. Term 1 The mixed fluid homogenizing apparatus as described.
[9] 上記可動穿孔板を移動することによって全貫通孔が閉止されうる請求項 1記載の混 合流体の均一化装置。  9. The mixed fluid homogenizing device according to claim 1, wherein all the through holes can be closed by moving the movable perforated plate.
[10] 流体の流路内に配設される、複数個の貫通孔が形成された穿孔板を備えており、 該穿孔板が、穿孔板の面内であって穿孔板の中心を通る仮想直線の回りの任意の 角度位置に回動可能に構成されてなる混合流体の均一化装置。  [10] A perforated plate having a plurality of through holes formed in the fluid flow path is provided, and the perforated plate is in the plane of the perforated plate and passes through the center of the perforated plate. An apparatus for homogenizing a mixed fluid configured to be rotatable to an arbitrary angular position around a straight line.
[11] 上記穿孔板が、その面が流路の中心軸に沿う方向になる全開位置と、流路を閉止 する全閉位置との間を回動しうるように構成されてなる請求項 10記載の混合流体の 均一化装置。 [11] The perforated plate is configured to be able to rotate between a fully open position whose surface is in a direction along the central axis of the flow path and a fully closed position where the flow path is closed. The mixed fluid homogenizer described.
[12] 流体が流れる流路と、 [12] a flow path through which the fluid flows;
該流路内に配設された混合流体均一化装置とを備えており、  And a mixed fluid homogenizer disposed in the flow path,
該混合流体均一化装置が、請求項 1〜11のうちのいずれか一の項に記載の混合 流体の均一化装置であり、  The mixed fluid homogenizer is the mixed fluid homogenizer according to any one of claims 1 to 11,
上記流路における混合流体均一化装置が配設されている部分の断面積が、その 上流側の断面積および下流側の断面積それぞれより大きくされてなる混合流体供給 設備。  A mixed fluid supply facility in which a cross-sectional area of a portion where the mixed fluid homogenizer is disposed in the flow path is made larger than a cross-sectional area on the upstream side and a cross-sectional area on the downstream side.
[13] 流体が流れる流路と、  [13] a flow path through which the fluid flows;
該流路内に配設された混合流体均一化装置とを備えており、  And a mixed fluid homogenizer disposed in the flow path,
該混合流体均一化装置が、請求項 1〜11のうちのいずれか一の項に記載の混合 流体の均一化装置であり、  The mixed fluid homogenizer is the mixed fluid homogenizer according to any one of claims 1 to 11,
上記流路における混合流体均一化装置が配設されている部分の下流側の断面積 力 その上流側の断面積より大きくされてなる混合流体供給設備。  A cross-sectional area on the downstream side of a portion where the mixed fluid homogenizer is disposed in the flow path.
[14] 流体が流れる流路と、 [14] a flow path through which the fluid flows;
該流路内に配設された混合流体均一化装置とを備えており、  And a mixed fluid homogenizer disposed in the flow path,
該混合流体均一化装置が、請求項 1〜11のうちのいずれか一の項に記載の混合 流体の均一化装置であり、  The mixed fluid homogenizer is the mixed fluid homogenizer according to any one of claims 1 to 11,
上記流路における混合流体均一化装置の下流側に配設されたガスの性状を検出 するガス性状検出装置をさらに含んでおり、該ガス性状検出装置が流路の断面上の ガス成分の分布を検出するように構成されてなる混合流体供給設備。 The apparatus further includes a gas property detection device that detects the property of the gas disposed on the downstream side of the mixed fluid homogenizer in the flow channel, and the gas property detection device is on the cross section of the flow channel. A mixed fluid supply facility configured to detect a distribution of gas components.
PCT/JP2005/013665 2005-07-26 2005-07-26 Mixed fluid uniformization device and mixed fluid feeding apparatus WO2007013143A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007526769A JP4684295B2 (en) 2005-07-26 2005-07-26 Mixing fluid homogenizer and mixed fluid supply equipment
PCT/JP2005/013665 WO2007013143A1 (en) 2005-07-26 2005-07-26 Mixed fluid uniformization device and mixed fluid feeding apparatus
KR1020077021473A KR100961016B1 (en) 2005-07-26 2005-07-26 Mixed Fluid Uniformization Device and Mixed Fluid Feeding Apparatus
BRPI0520522A BRPI0520522B1 (en) 2005-07-26 2005-07-26 mixed device to standardize a fluid.
CN2005800491106A CN101142012B (en) 2005-07-26 2005-07-26 Mixed fluid uniformization device and mixed fluid feeding apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2005/013665 WO2007013143A1 (en) 2005-07-26 2005-07-26 Mixed fluid uniformization device and mixed fluid feeding apparatus

Publications (1)

Publication Number Publication Date
WO2007013143A1 true WO2007013143A1 (en) 2007-02-01

Family

ID=37683051

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/013665 WO2007013143A1 (en) 2005-07-26 2005-07-26 Mixed fluid uniformization device and mixed fluid feeding apparatus

Country Status (5)

Country Link
JP (1) JP4684295B2 (en)
KR (1) KR100961016B1 (en)
CN (1) CN101142012B (en)
BR (1) BRPI0520522B1 (en)
WO (1) WO2007013143A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009018251A (en) * 2007-07-11 2009-01-29 Reika Kogyo Kk Homogenizing apparatus
EP2189212A1 (en) 2008-11-25 2010-05-26 I-Fu Yang Emulsifier system
JP2011516804A (en) * 2008-04-10 2011-05-26 インペリアル イノベーションズ リミテッド Fluid flow modification device
JP2011258795A (en) * 2010-06-10 2011-12-22 Mitsubishi Electric Corp Transformer
JP2014051939A (en) * 2012-09-07 2014-03-20 Ihi Corp Supercharger
CN113368716A (en) * 2021-04-29 2021-09-10 中冶长天国际工程有限责任公司 Air-oxygen mixer for oxygen-enriched ignition and control method thereof

Families Citing this family (239)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
CN104211144B (en) * 2009-05-29 2016-04-13 H·布卢姆 A kind of feedway of the main ballasting waterline supply aqueous acrylamide aldehyde solution to ship
US20130023129A1 (en) 2011-07-20 2013-01-24 Asm America, Inc. Pressure transmitter for a semiconductor processing environment
CN102653129A (en) * 2012-05-21 2012-09-05 贵州大学 Pressure adjusting method and device of handpiece of screw extruder
US10714315B2 (en) 2012-10-12 2020-07-14 Asm Ip Holdings B.V. Semiconductor reaction chamber showerhead
US20160376700A1 (en) 2013-02-01 2016-12-29 Asm Ip Holding B.V. System for treatment of deposition reactor
US11015245B2 (en) 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
US10858737B2 (en) 2014-07-28 2020-12-08 Asm Ip Holding B.V. Showerhead assembly and components thereof
US10941490B2 (en) 2014-10-07 2021-03-09 Asm Ip Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US10276355B2 (en) 2015-03-12 2019-04-30 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
US10458018B2 (en) 2015-06-26 2019-10-29 Asm Ip Holding B.V. Structures including metal carbide material, devices including the structures, and methods of forming same
CN105195053B (en) * 2015-09-22 2018-06-19 北京工业大学 A kind of concussion jetting type micro-mixer based on microbubble driving
US10211308B2 (en) 2015-10-21 2019-02-19 Asm Ip Holding B.V. NbMC layers
US10322384B2 (en) * 2015-11-09 2019-06-18 Asm Ip Holding B.V. Counter flow mixer for process chamber
US11139308B2 (en) 2015-12-29 2021-10-05 Asm Ip Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
US10529554B2 (en) 2016-02-19 2020-01-07 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
US10190213B2 (en) 2016-04-21 2019-01-29 Asm Ip Holding B.V. Deposition of metal borides
US10367080B2 (en) 2016-05-02 2019-07-30 Asm Ip Holding B.V. Method of forming a germanium oxynitride film
US11453943B2 (en) 2016-05-25 2022-09-27 Asm Ip Holding B.V. Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
US9859151B1 (en) 2016-07-08 2018-01-02 Asm Ip Holding B.V. Selective film deposition method to form air gaps
US10612137B2 (en) 2016-07-08 2020-04-07 Asm Ip Holdings B.V. Organic reactants for atomic layer deposition
US9887082B1 (en) 2016-07-28 2018-02-06 Asm Ip Holding B.V. Method and apparatus for filling a gap
KR102532607B1 (en) 2016-07-28 2023-05-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and method of operating the same
US9812320B1 (en) 2016-07-28 2017-11-07 Asm Ip Holding B.V. Method and apparatus for filling a gap
US10643826B2 (en) 2016-10-26 2020-05-05 Asm Ip Holdings B.V. Methods for thermally calibrating reaction chambers
US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
US10714350B2 (en) 2016-11-01 2020-07-14 ASM IP Holdings, B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
KR102546317B1 (en) 2016-11-15 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Gas supply unit and substrate processing apparatus including the same
KR20180068582A (en) 2016-12-14 2018-06-22 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US11581186B2 (en) 2016-12-15 2023-02-14 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus
KR20180070971A (en) 2016-12-19 2018-06-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US10269558B2 (en) 2016-12-22 2019-04-23 Asm Ip Holding B.V. Method of forming a structure on a substrate
US10867788B2 (en) 2016-12-28 2020-12-15 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11390950B2 (en) 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process
US10468261B2 (en) 2017-02-15 2019-11-05 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
KR102457289B1 (en) 2017-04-25 2022-10-21 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10892156B2 (en) 2017-05-08 2021-01-12 Asm Ip Holding B.V. Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
US10770286B2 (en) 2017-05-08 2020-09-08 Asm Ip Holdings B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US10886123B2 (en) 2017-06-02 2021-01-05 Asm Ip Holding B.V. Methods for forming low temperature semiconductor layers and related semiconductor device structures
US11306395B2 (en) 2017-06-28 2022-04-19 Asm Ip Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
KR20190009245A (en) 2017-07-18 2019-01-28 에이에스엠 아이피 홀딩 비.브이. Methods for forming a semiconductor device structure and related semiconductor device structures
US11018002B2 (en) 2017-07-19 2021-05-25 Asm Ip Holding B.V. Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
US11374112B2 (en) 2017-07-19 2022-06-28 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US10541333B2 (en) 2017-07-19 2020-01-21 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
JP7120802B2 (en) * 2017-07-20 2022-08-17 株式会社神戸製鋼所 Fluid circulation device and its circulation abnormality detection method
US10590535B2 (en) 2017-07-26 2020-03-17 Asm Ip Holdings B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US10770336B2 (en) 2017-08-08 2020-09-08 Asm Ip Holding B.V. Substrate lift mechanism and reactor including same
US10692741B2 (en) 2017-08-08 2020-06-23 Asm Ip Holdings B.V. Radiation shield
US11139191B2 (en) 2017-08-09 2021-10-05 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11769682B2 (en) 2017-08-09 2023-09-26 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11830730B2 (en) 2017-08-29 2023-11-28 Asm Ip Holding B.V. Layer forming method and apparatus
US11056344B2 (en) 2017-08-30 2021-07-06 Asm Ip Holding B.V. Layer forming method
US11295980B2 (en) 2017-08-30 2022-04-05 Asm Ip Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
KR102491945B1 (en) 2017-08-30 2023-01-26 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR102630301B1 (en) 2017-09-21 2024-01-29 에이에스엠 아이피 홀딩 비.브이. Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
US10844484B2 (en) 2017-09-22 2020-11-24 Asm Ip Holding B.V. Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US10658205B2 (en) 2017-09-28 2020-05-19 Asm Ip Holdings B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US10403504B2 (en) 2017-10-05 2019-09-03 Asm Ip Holding B.V. Method for selectively depositing a metallic film on a substrate
US10923344B2 (en) 2017-10-30 2021-02-16 Asm Ip Holding B.V. Methods for forming a semiconductor structure and related semiconductor structures
US10910262B2 (en) 2017-11-16 2021-02-02 Asm Ip Holding B.V. Method of selectively depositing a capping layer structure on a semiconductor device structure
US11022879B2 (en) 2017-11-24 2021-06-01 Asm Ip Holding B.V. Method of forming an enhanced unexposed photoresist layer
CN111344522B (en) 2017-11-27 2022-04-12 阿斯莫Ip控股公司 Including clean mini-environment device
KR102597978B1 (en) 2017-11-27 2023-11-06 에이에스엠 아이피 홀딩 비.브이. Storage device for storing wafer cassettes for use with batch furnaces
US10872771B2 (en) 2018-01-16 2020-12-22 Asm Ip Holding B. V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
TW202325889A (en) 2018-01-19 2023-07-01 荷蘭商Asm 智慧財產控股公司 Deposition method
CN111630203A (en) 2018-01-19 2020-09-04 Asm Ip私人控股有限公司 Method for depositing gap filling layer by plasma auxiliary deposition
US11018047B2 (en) 2018-01-25 2021-05-25 Asm Ip Holding B.V. Hybrid lift pin
USD880437S1 (en) 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
US11081345B2 (en) 2018-02-06 2021-08-03 Asm Ip Holding B.V. Method of post-deposition treatment for silicon oxide film
US10896820B2 (en) 2018-02-14 2021-01-19 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
EP3737779A1 (en) 2018-02-14 2020-11-18 ASM IP Holding B.V. A method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
KR102636427B1 (en) 2018-02-20 2024-02-13 에이에스엠 아이피 홀딩 비.브이. Substrate processing method and apparatus
US10975470B2 (en) 2018-02-23 2021-04-13 Asm Ip Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11473195B2 (en) 2018-03-01 2022-10-18 Asm Ip Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
US11629406B2 (en) 2018-03-09 2023-04-18 Asm Ip Holding B.V. Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11114283B2 (en) 2018-03-16 2021-09-07 Asm Ip Holding B.V. Reactor, system including the reactor, and methods of manufacturing and using same
KR102646467B1 (en) 2018-03-27 2024-03-11 에이에스엠 아이피 홀딩 비.브이. Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US11088002B2 (en) 2018-03-29 2021-08-10 Asm Ip Holding B.V. Substrate rack and a substrate processing system and method
US11230766B2 (en) 2018-03-29 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102501472B1 (en) 2018-03-30 2023-02-20 에이에스엠 아이피 홀딩 비.브이. Substrate processing method
TW202344708A (en) 2018-05-08 2023-11-16 荷蘭商Asm Ip私人控股有限公司 Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
TWI816783B (en) 2018-05-11 2023-10-01 荷蘭商Asm 智慧財產控股公司 Methods for forming a doped metal carbide film on a substrate and related semiconductor device structures
KR102596988B1 (en) 2018-05-28 2023-10-31 에이에스엠 아이피 홀딩 비.브이. Method of processing a substrate and a device manufactured by the same
US11718913B2 (en) 2018-06-04 2023-08-08 Asm Ip Holding B.V. Gas distribution system and reactor system including same
US11270899B2 (en) 2018-06-04 2022-03-08 Asm Ip Holding B.V. Wafer handling chamber with moisture reduction
US11286562B2 (en) 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
US10797133B2 (en) 2018-06-21 2020-10-06 Asm Ip Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
KR102568797B1 (en) 2018-06-21 2023-08-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing system
WO2020003000A1 (en) 2018-06-27 2020-01-02 Asm Ip Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11492703B2 (en) 2018-06-27 2022-11-08 Asm Ip Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US10612136B2 (en) 2018-06-29 2020-04-07 ASM IP Holding, B.V. Temperature-controlled flange and reactor system including same
KR20200002519A (en) 2018-06-29 2020-01-08 에이에스엠 아이피 홀딩 비.브이. Method for depositing a thin film and manufacturing a semiconductor device
US10388513B1 (en) 2018-07-03 2019-08-20 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US10755922B2 (en) 2018-07-03 2020-08-25 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US11053591B2 (en) 2018-08-06 2021-07-06 Asm Ip Holding B.V. Multi-port gas injection system and reactor system including same
US10883175B2 (en) 2018-08-09 2021-01-05 Asm Ip Holding B.V. Vertical furnace for processing substrates and a liner for use therein
US11430674B2 (en) 2018-08-22 2022-08-30 Asm Ip Holding B.V. Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US11024523B2 (en) 2018-09-11 2021-06-01 Asm Ip Holding B.V. Substrate processing apparatus and method
KR20200030162A (en) 2018-09-11 2020-03-20 에이에스엠 아이피 홀딩 비.브이. Method for deposition of a thin film
US11049751B2 (en) 2018-09-14 2021-06-29 Asm Ip Holding B.V. Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
CN110970344A (en) 2018-10-01 2020-04-07 Asm Ip控股有限公司 Substrate holding apparatus, system including the same, and method of using the same
US11232963B2 (en) 2018-10-03 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
KR102592699B1 (en) 2018-10-08 2023-10-23 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and apparatuses for depositing thin film and processing the substrate including the same
CN109098028B (en) * 2018-10-15 2019-08-16 维达纸业(浙江)有限公司 A kind of paper machine vacuum suction box face plate and its remodeling method
KR102546322B1 (en) 2018-10-19 2023-06-21 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
KR102605121B1 (en) 2018-10-19 2023-11-23 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus and substrate processing method
USD948463S1 (en) 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
US11087997B2 (en) 2018-10-31 2021-08-10 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
KR20200051105A (en) 2018-11-02 2020-05-13 에이에스엠 아이피 홀딩 비.브이. Substrate support unit and substrate processing apparatus including the same
US11572620B2 (en) 2018-11-06 2023-02-07 Asm Ip Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
US11031242B2 (en) 2018-11-07 2021-06-08 Asm Ip Holding B.V. Methods for depositing a boron doped silicon germanium film
CN109448507A (en) * 2018-11-15 2019-03-08 安徽徽煌教育科技有限公司 A kind of geographical teaching ocean current apparatus for demonstrating
US10818758B2 (en) 2018-11-16 2020-10-27 Asm Ip Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US10847366B2 (en) 2018-11-16 2020-11-24 Asm Ip Holding B.V. Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US11217444B2 (en) 2018-11-30 2022-01-04 Asm Ip Holding B.V. Method for forming an ultraviolet radiation responsive metal oxide-containing film
KR102636428B1 (en) 2018-12-04 2024-02-13 에이에스엠 아이피 홀딩 비.브이. A method for cleaning a substrate processing apparatus
US11158513B2 (en) 2018-12-13 2021-10-26 Asm Ip Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
JP2020096183A (en) 2018-12-14 2020-06-18 エーエスエム・アイピー・ホールディング・ベー・フェー Method of forming device structure using selective deposition of gallium nitride, and system for the same
TWI819180B (en) 2019-01-17 2023-10-21 荷蘭商Asm 智慧財產控股公司 Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
KR20200091543A (en) 2019-01-22 2020-07-31 에이에스엠 아이피 홀딩 비.브이. Semiconductor processing device
CN111524788B (en) 2019-02-01 2023-11-24 Asm Ip私人控股有限公司 Method for topologically selective film formation of silicon oxide
TW202104632A (en) 2019-02-20 2021-02-01 荷蘭商Asm Ip私人控股有限公司 Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
KR20200102357A (en) 2019-02-20 2020-08-31 에이에스엠 아이피 홀딩 비.브이. Apparatus and methods for plug fill deposition in 3-d nand applications
TW202044325A (en) 2019-02-20 2020-12-01 荷蘭商Asm Ip私人控股有限公司 Method of filling a recess formed within a surface of a substrate, semiconductor structure formed according to the method, and semiconductor processing apparatus
KR102626263B1 (en) 2019-02-20 2024-01-16 에이에스엠 아이피 홀딩 비.브이. Cyclical deposition method including treatment step and apparatus for same
TW202100794A (en) 2019-02-22 2021-01-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing apparatus and method for processing substrate
KR20200108242A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Method for Selective Deposition of Silicon Nitride Layer and Structure Including Selectively-Deposited Silicon Nitride Layer
KR20200108243A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Structure Including SiOC Layer and Method of Forming Same
KR20200108248A (en) 2019-03-08 2020-09-17 에이에스엠 아이피 홀딩 비.브이. STRUCTURE INCLUDING SiOCN LAYER AND METHOD OF FORMING SAME
JP2020167398A (en) 2019-03-28 2020-10-08 エーエスエム・アイピー・ホールディング・ベー・フェー Door opener and substrate processing apparatus provided therewith
KR20200116855A (en) 2019-04-01 2020-10-13 에이에스엠 아이피 홀딩 비.브이. Method of manufacturing semiconductor device
KR20200123380A (en) 2019-04-19 2020-10-29 에이에스엠 아이피 홀딩 비.브이. Layer forming method and apparatus
KR20200125453A (en) 2019-04-24 2020-11-04 에이에스엠 아이피 홀딩 비.브이. Gas-phase reactor system and method of using same
CN109991302B (en) * 2019-04-30 2022-02-08 广东赛能科技股份有限公司 Online measuring device and method for oxidation-reduction potential of water body
KR20200130118A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Method for Reforming Amorphous Carbon Polymer Film
KR20200130121A (en) 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. Chemical source vessel with dip tube
KR20200130652A (en) 2019-05-10 2020-11-19 에이에스엠 아이피 홀딩 비.브이. Method of depositing material onto a surface and structure formed according to the method
JP2020188255A (en) 2019-05-16 2020-11-19 エーエスエム アイピー ホールディング ビー.ブイ. Wafer boat handling device, vertical batch furnace, and method
USD947913S1 (en) 2019-05-17 2022-04-05 Asm Ip Holding B.V. Susceptor shaft
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
USD935572S1 (en) 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
USD922229S1 (en) 2019-06-05 2021-06-15 Asm Ip Holding B.V. Device for controlling a temperature of a gas supply unit
KR20200141003A (en) 2019-06-06 2020-12-17 에이에스엠 아이피 홀딩 비.브이. Gas-phase reactor system including a gas detector
KR20200143254A (en) 2019-06-11 2020-12-23 에이에스엠 아이피 홀딩 비.브이. Method of forming an electronic structure using an reforming gas, system for performing the method, and structure formed using the method
USD944946S1 (en) 2019-06-14 2022-03-01 Asm Ip Holding B.V. Shower plate
USD931978S1 (en) 2019-06-27 2021-09-28 Asm Ip Holding B.V. Showerhead vacuum transport
KR20210005515A (en) 2019-07-03 2021-01-14 에이에스엠 아이피 홀딩 비.브이. Temperature control assembly for substrate processing apparatus and method of using same
JP2021015791A (en) 2019-07-09 2021-02-12 エーエスエム アイピー ホールディング ビー.ブイ. Plasma device and substrate processing method using coaxial waveguide
CN112216646A (en) 2019-07-10 2021-01-12 Asm Ip私人控股有限公司 Substrate supporting assembly and substrate processing device comprising same
KR20210010307A (en) 2019-07-16 2021-01-27 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210010816A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Radical assist ignition plasma system and method
KR20210010820A (en) 2019-07-17 2021-01-28 에이에스엠 아이피 홀딩 비.브이. Methods of forming silicon germanium structures
US11643724B2 (en) 2019-07-18 2023-05-09 Asm Ip Holding B.V. Method of forming structures using a neutral beam
CN112242296A (en) 2019-07-19 2021-01-19 Asm Ip私人控股有限公司 Method of forming topologically controlled amorphous carbon polymer films
KR102083387B1 (en) * 2019-07-29 2020-03-04 (주)화인테크워터 Pellet
CN112309843A (en) 2019-07-29 2021-02-02 Asm Ip私人控股有限公司 Selective deposition method for achieving high dopant doping
CN112309899A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112309900A (en) 2019-07-30 2021-02-02 Asm Ip私人控股有限公司 Substrate processing apparatus
US11227782B2 (en) 2019-07-31 2022-01-18 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587814B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587815B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
KR20210018759A (en) 2019-08-05 2021-02-18 에이에스엠 아이피 홀딩 비.브이. Liquid level sensor for a chemical source vessel
USD965044S1 (en) 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD965524S1 (en) 2019-08-19 2022-10-04 Asm Ip Holding B.V. Susceptor support
JP2021031769A (en) 2019-08-21 2021-03-01 エーエスエム アイピー ホールディング ビー.ブイ. Production apparatus of mixed gas of film deposition raw material and film deposition apparatus
USD930782S1 (en) 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
USD949319S1 (en) 2019-08-22 2022-04-19 Asm Ip Holding B.V. Exhaust duct
USD940837S1 (en) 2019-08-22 2022-01-11 Asm Ip Holding B.V. Electrode
KR20210024423A (en) 2019-08-22 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for forming a structure with a hole
USD979506S1 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
US11286558B2 (en) 2019-08-23 2022-03-29 Asm Ip Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
KR20210024420A (en) 2019-08-23 2021-03-05 에이에스엠 아이피 홀딩 비.브이. Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
KR20210029090A (en) 2019-09-04 2021-03-15 에이에스엠 아이피 홀딩 비.브이. Methods for selective deposition using a sacrificial capping layer
KR20210029663A (en) 2019-09-05 2021-03-16 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
US11562901B2 (en) 2019-09-25 2023-01-24 Asm Ip Holding B.V. Substrate processing method
CN112593212B (en) 2019-10-02 2023-12-22 Asm Ip私人控股有限公司 Method for forming topologically selective silicon oxide film by cyclic plasma enhanced deposition process
TW202129060A (en) 2019-10-08 2021-08-01 荷蘭商Asm Ip控股公司 Substrate processing device, and substrate processing method
KR20210043460A (en) 2019-10-10 2021-04-21 에이에스엠 아이피 홀딩 비.브이. Method of forming a photoresist underlayer and structure including same
KR20210045930A (en) 2019-10-16 2021-04-27 에이에스엠 아이피 홀딩 비.브이. Method of Topology-Selective Film Formation of Silicon Oxide
US11637014B2 (en) 2019-10-17 2023-04-25 Asm Ip Holding B.V. Methods for selective deposition of doped semiconductor material
KR20210047808A (en) 2019-10-21 2021-04-30 에이에스엠 아이피 홀딩 비.브이. Apparatus and methods for selectively etching films
US11646205B2 (en) 2019-10-29 2023-05-09 Asm Ip Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
KR20210054983A (en) 2019-11-05 2021-05-14 에이에스엠 아이피 홀딩 비.브이. Structures with doped semiconductor layers and methods and systems for forming same
US11501968B2 (en) 2019-11-15 2022-11-15 Asm Ip Holding B.V. Method for providing a semiconductor device with silicon filled gaps
KR20210062561A (en) 2019-11-20 2021-05-31 에이에스엠 아이피 홀딩 비.브이. Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
KR20210065848A (en) 2019-11-26 2021-06-04 에이에스엠 아이피 홀딩 비.브이. Methods for selectivley forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
CN112951697A (en) 2019-11-26 2021-06-11 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112885692A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
CN112885693A (en) 2019-11-29 2021-06-01 Asm Ip私人控股有限公司 Substrate processing apparatus
JP2021090042A (en) 2019-12-02 2021-06-10 エーエスエム アイピー ホールディング ビー.ブイ. Substrate processing apparatus and substrate processing method
KR20210070898A (en) 2019-12-04 2021-06-15 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
TW202125596A (en) 2019-12-17 2021-07-01 荷蘭商Asm Ip私人控股有限公司 Method of forming vanadium nitride layer and structure including the vanadium nitride layer
KR20210080214A (en) 2019-12-19 2021-06-30 에이에스엠 아이피 홀딩 비.브이. Methods for filling a gap feature on a substrate and related semiconductor structures
JP2021109175A (en) 2020-01-06 2021-08-02 エーエスエム・アイピー・ホールディング・ベー・フェー Gas supply assembly, components thereof, and reactor system including the same
KR20210095050A (en) 2020-01-20 2021-07-30 에이에스엠 아이피 홀딩 비.브이. Method of forming thin film and method of modifying surface of thin film
TW202130846A (en) 2020-02-03 2021-08-16 荷蘭商Asm Ip私人控股有限公司 Method of forming structures including a vanadium or indium layer
TW202146882A (en) 2020-02-04 2021-12-16 荷蘭商Asm Ip私人控股有限公司 Method of verifying an article, apparatus for verifying an article, and system for verifying a reaction chamber
US11776846B2 (en) 2020-02-07 2023-10-03 Asm Ip Holding B.V. Methods for depositing gap filling fluids and related systems and devices
US11781243B2 (en) 2020-02-17 2023-10-10 Asm Ip Holding B.V. Method for depositing low temperature phosphorous-doped silicon
US11876356B2 (en) 2020-03-11 2024-01-16 Asm Ip Holding B.V. Lockout tagout assembly and system and method of using same
KR20210116240A (en) 2020-03-11 2021-09-27 에이에스엠 아이피 홀딩 비.브이. Substrate handling device with adjustable joints
KR20210117157A (en) 2020-03-12 2021-09-28 에이에스엠 아이피 홀딩 비.브이. Method for Fabricating Layer Structure Having Target Topological Profile
KR20210124042A (en) 2020-04-02 2021-10-14 에이에스엠 아이피 홀딩 비.브이. Thin film forming method
TW202146689A (en) 2020-04-03 2021-12-16 荷蘭商Asm Ip控股公司 Method for forming barrier layer and method for manufacturing semiconductor device
TW202145344A (en) 2020-04-08 2021-12-01 荷蘭商Asm Ip私人控股有限公司 Apparatus and methods for selectively etching silcon oxide films
US11821078B2 (en) 2020-04-15 2023-11-21 Asm Ip Holding B.V. Method for forming precoat film and method for forming silicon-containing film
KR20210132600A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
KR20210132605A (en) 2020-04-24 2021-11-04 에이에스엠 아이피 홀딩 비.브이. Vertical batch furnace assembly comprising a cooling gas supply
US11898243B2 (en) 2020-04-24 2024-02-13 Asm Ip Holding B.V. Method of forming vanadium nitride-containing layer
KR20210134226A (en) 2020-04-29 2021-11-09 에이에스엠 아이피 홀딩 비.브이. Solid source precursor vessel
KR20210134869A (en) 2020-05-01 2021-11-11 에이에스엠 아이피 홀딩 비.브이. Fast FOUP swapping with a FOUP handler
KR20210141379A (en) 2020-05-13 2021-11-23 에이에스엠 아이피 홀딩 비.브이. Laser alignment fixture for a reactor system
KR20210143653A (en) 2020-05-19 2021-11-29 에이에스엠 아이피 홀딩 비.브이. Substrate processing apparatus
KR20210145078A (en) 2020-05-21 2021-12-01 에이에스엠 아이피 홀딩 비.브이. Structures including multiple carbon layers and methods of forming and using same
TW202201602A (en) 2020-05-29 2022-01-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing device
CN113834901A (en) * 2020-06-23 2021-12-24 拓荆科技股份有限公司 Gas mixing effect detection device and detection method
TW202218133A (en) 2020-06-24 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Method for forming a layer provided with silicon
TW202217953A (en) 2020-06-30 2022-05-01 荷蘭商Asm Ip私人控股有限公司 Substrate processing method
TW202219628A (en) 2020-07-17 2022-05-16 荷蘭商Asm Ip私人控股有限公司 Structures and methods for use in photolithography
TW202204662A (en) 2020-07-20 2022-02-01 荷蘭商Asm Ip私人控股有限公司 Method and system for depositing molybdenum layers
KR20220027026A (en) 2020-08-26 2022-03-07 에이에스엠 아이피 홀딩 비.브이. Method and system for forming metal silicon oxide and metal silicon oxynitride
USD990534S1 (en) 2020-09-11 2023-06-27 Asm Ip Holding B.V. Weighted lift pin
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
TW202229613A (en) 2020-10-14 2022-08-01 荷蘭商Asm Ip私人控股有限公司 Method of depositing material on stepped structure
KR20220053482A (en) 2020-10-22 2022-04-29 에이에스엠 아이피 홀딩 비.브이. Method of depositing vanadium metal, structure, device and a deposition assembly
TW202223136A (en) 2020-10-28 2022-06-16 荷蘭商Asm Ip私人控股有限公司 Method for forming layer on substrate, and semiconductor processing system
TW202235675A (en) 2020-11-30 2022-09-16 荷蘭商Asm Ip私人控股有限公司 Injector, and substrate processing apparatus
US11946137B2 (en) 2020-12-16 2024-04-02 Asm Ip Holding B.V. Runout and wobble measurement fixtures
TW202231903A (en) 2020-12-22 2022-08-16 荷蘭商Asm Ip私人控股有限公司 Transition metal deposition method, transition metal layer, and deposition assembly for depositing transition metal on substrate
USD981973S1 (en) 2021-05-11 2023-03-28 Asm Ip Holding B.V. Reactor wall for substrate processing apparatus
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD990441S1 (en) 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate
CN114917732A (en) * 2022-05-18 2022-08-19 成都天田医疗电器科技有限公司 Moxibustion fumigation waste gas treatment process
CN115193208A (en) * 2022-05-18 2022-10-18 成都天田医疗电器科技有限公司 Multifunctional microwave plasma reaction system
CN115875162B (en) * 2023-03-08 2023-05-12 山东赛马力发电设备有限公司 Mixer for improving mixing uniformity of fuel gas
CN117046333B (en) * 2023-10-11 2024-01-05 杭州贝斯特气体有限公司 Production device for ethylene oxide and carbon dioxide mixed sterilizing gas

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60122068U (en) * 1984-01-27 1985-08-17 三菱重工業株式会社 gate valve
JPH0828718A (en) * 1994-07-12 1996-02-02 Kubota Corp Orifice valve
JPH10314563A (en) * 1997-05-19 1998-12-02 Toshiba Mach Co Ltd Powder mixed gas forming device
JP2000297864A (en) * 1999-04-15 2000-10-24 Kubota Corp Multiple hole variable orifice valve

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60122068U (en) * 1984-01-27 1985-08-17 三菱重工業株式会社 gate valve
JPH0828718A (en) * 1994-07-12 1996-02-02 Kubota Corp Orifice valve
JPH10314563A (en) * 1997-05-19 1998-12-02 Toshiba Mach Co Ltd Powder mixed gas forming device
JP2000297864A (en) * 1999-04-15 2000-10-24 Kubota Corp Multiple hole variable orifice valve

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009018251A (en) * 2007-07-11 2009-01-29 Reika Kogyo Kk Homogenizing apparatus
JP2011516804A (en) * 2008-04-10 2011-05-26 インペリアル イノベーションズ リミテッド Fluid flow modification device
EP2189212A1 (en) 2008-11-25 2010-05-26 I-Fu Yang Emulsifier system
JP2011258795A (en) * 2010-06-10 2011-12-22 Mitsubishi Electric Corp Transformer
JP2014051939A (en) * 2012-09-07 2014-03-20 Ihi Corp Supercharger
CN113368716A (en) * 2021-04-29 2021-09-10 中冶长天国际工程有限责任公司 Air-oxygen mixer for oxygen-enriched ignition and control method thereof
CN113368716B (en) * 2021-04-29 2022-08-16 中冶长天国际工程有限责任公司 Air-oxygen mixer for oxygen-enriched ignition and control method thereof

Also Published As

Publication number Publication date
CN101142012A (en) 2008-03-12
JP4684295B2 (en) 2011-05-18
JPWO2007013143A1 (en) 2009-02-05
BRPI0520522B1 (en) 2016-07-26
BRPI0520522A2 (en) 2009-08-25
KR100961016B1 (en) 2010-06-01
KR20070116826A (en) 2007-12-11
CN101142012B (en) 2011-08-24

Similar Documents

Publication Publication Date Title
JP4684295B2 (en) Mixing fluid homogenizer and mixed fluid supply equipment
RU2611124C2 (en) System for fuel mix (versions)
US11623887B2 (en) Submerged combustion burners, melters, and methods of use
US9221704B2 (en) Through-port oxy-fuel burner
EP2982907B1 (en) Gas turbine combustor
DE102006008712B4 (en) Fuel gas calorie control device and gas turbine system
EP2407718A2 (en) Hybrid flare apparatus and method
TWI320071B (en)
JP2010159742A5 (en)
CN101382293A (en) Dynamic control system to reduce emission of turbine combustion systems
CA2761169C (en) Through-port oxy-fuel burner
JP5487917B2 (en) Multi-fuel burner device
JP4833335B2 (en) Gum-like substance monitoring device, detection method, and gas turbine equipment
CN104884577B (en) It is vented flow conditioner and pipeline monitor device and correlation technique with the adjuster
CN202709178U (en) Natural gas ignition system of pulverized coal flame furnace
JP2020041656A (en) Flow rate variable valve, fireproof material spraying device and fireproof material spraying method
WO2016033205A1 (en) Low nox turbine exhaust fuel burner assembly
JP5487729B2 (en) Coke oven fuel gas mixing device
CN113030369A (en) Petrochemical industry component fire resistance's test system
EP2762779A1 (en) Tubular flame burner
JP2003254090A (en) Apparatus and method for mixing blast furnace gas with added gas
Osipov et al. Numerical simulation of different types of CO2 and O2 gas mixers
CN115957609A (en) Denitration refined ammonia injection double-circulation control device, method and application
KR100913036B1 (en) Apparatus for non-breaking changing a different kind of fuel for burner
JP2013119818A (en) Gas turbine facility

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 200580049110.6

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 1020077021473

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2007526769

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 4584/KOLNP/2007

Country of ref document: IN

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 05767380

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: PI0520522

Country of ref document: BR

Kind code of ref document: A2