WO2006024386A3 - Schichtverbund mit kubischen bornitrid - Google Patents

Schichtverbund mit kubischen bornitrid Download PDF

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Publication number
WO2006024386A3
WO2006024386A3 PCT/EP2005/008830 EP2005008830W WO2006024386A3 WO 2006024386 A3 WO2006024386 A3 WO 2006024386A3 EP 2005008830 W EP2005008830 W EP 2005008830W WO 2006024386 A3 WO2006024386 A3 WO 2006024386A3
Authority
WO
WIPO (PCT)
Prior art keywords
layered composite
boron nitride
cubic boron
deposition
layered
Prior art date
Application number
PCT/EP2005/008830
Other languages
English (en)
French (fr)
Other versions
WO2006024386A2 (de
Inventor
Sven Ulrich
Jian Ye
Konrad Sell
Michael Stueber
Original Assignee
Karlsruhe Forschzent
Sven Ulrich
Jian Ye
Konrad Sell
Michael Stueber
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Karlsruhe Forschzent, Sven Ulrich, Jian Ye, Konrad Sell, Michael Stueber filed Critical Karlsruhe Forschzent
Priority to JP2007528683A priority Critical patent/JP5192810B2/ja
Priority to EP05774034A priority patent/EP1784524A2/de
Priority to CN2005800294837A priority patent/CN101010445B/zh
Publication of WO2006024386A2 publication Critical patent/WO2006024386A2/de
Publication of WO2006024386A3 publication Critical patent/WO2006024386A3/de
Priority to US11/705,336 priority patent/US7914903B2/en
Priority to US12/799,496 priority patent/US8227031B2/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0647—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12021—All metal or with adjacent metals having metal particles having composition or density gradient or differential porosity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12458—All metal or with adjacent metals having composition, density, or hardness gradient
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12576—Boride, carbide or nitride component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Schichtverbund auf einem Substrat, wobei mindestens eine Einzelschicht des Schichtverbunds kubisches Bornitrid enthält und über eine Abscheidung hergestellt ist. Aufgabe ist es, einen derartigen Schichtverbund mit einer verbesserten Haftfestigkeit vorzuschlagen. Die Aufgabe wird dadurch gelöst, dass das kubische Bornitrid Sauerstoff enthält, welches während der Abscheidung zugegeben wird.
PCT/EP2005/008830 2004-09-02 2005-08-13 Schichtverbund mit kubischen bornitrid WO2006024386A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007528683A JP5192810B2 (ja) 2004-09-02 2005-08-13 立方晶窒化ホウ素を有する積層複合材料
EP05774034A EP1784524A2 (de) 2004-09-02 2005-08-13 Schichtverbund mit kubischen bornitrid
CN2005800294837A CN101010445B (zh) 2004-09-02 2005-08-13 具有立方氮化硼的分层复合物
US11/705,336 US7914903B2 (en) 2004-09-02 2007-02-12 Layered composite including cubic boron nitride
US12/799,496 US8227031B2 (en) 2004-09-02 2010-04-26 Method of producing a layered composite including cubic boron nitride

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004042407.1 2004-09-02
DE200410042407 DE102004042407A1 (de) 2004-09-02 2004-09-02 Schichtverbund mit kubischen Bornitrid

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/705,336 Continuation-In-Part US7914903B2 (en) 2004-09-02 2007-02-12 Layered composite including cubic boron nitride

Publications (2)

Publication Number Publication Date
WO2006024386A2 WO2006024386A2 (de) 2006-03-09
WO2006024386A3 true WO2006024386A3 (de) 2006-05-18

Family

ID=35667095

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/008830 WO2006024386A2 (de) 2004-09-02 2005-08-13 Schichtverbund mit kubischen bornitrid

Country Status (6)

Country Link
US (1) US7914903B2 (de)
EP (1) EP1784524A2 (de)
JP (1) JP5192810B2 (de)
CN (1) CN101010445B (de)
DE (1) DE102004042407A1 (de)
WO (1) WO2006024386A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT504909B1 (de) * 2007-03-27 2008-09-15 Boehlerit Gmbh & Co Kg Hartmetallkörper mit einer beschichtung aus kubischem bornitrid
US8337950B2 (en) * 2007-06-19 2012-12-25 Applied Materials, Inc. Method for depositing boron-rich films for lithographic mask applications
EP2334841A4 (de) * 2008-09-12 2013-07-17 Univ Brigham Young Filme mit einem infundierten mit sauerstoff angereicherten gas und verfahren zu ihrer herstellung
JP5943713B2 (ja) * 2012-05-31 2016-07-05 三菱マテリアル株式会社 表面被覆切削工具
JP5945162B2 (ja) * 2012-05-31 2016-07-05 三菱マテリアル株式会社 表面被覆切削工具
CN105648419B (zh) * 2016-01-20 2018-09-25 杭州电子科技大学 一种降低六方氮化硼二维薄膜厚度的方法
CN105483646B (zh) * 2016-01-20 2019-01-18 杭州电子科技大学 一种紫外吸收薄膜的制备方法
JP6746118B2 (ja) * 2016-10-19 2020-08-26 国立大学法人東海国立大学機構 ｃＢＮ膜の製造方法
CH713453A1 (de) * 2017-02-13 2018-08-15 Evatec Ag Verfahren zur Herstellung eines Substrates mit einer bordotierten Oberfläche.
US11157717B2 (en) * 2018-07-10 2021-10-26 Next Biometrics Group Asa Thermally conductive and protective coating for electronic device
CN110230040B (zh) * 2019-07-04 2021-06-04 刘禹超 一种立方氮化硼薄膜的生产方法

Citations (4)

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Publication number Priority date Publication date Assignee Title
US4683043A (en) * 1986-01-21 1987-07-28 Battelle Development Corporation Cubic boron nitride preparation
JPS62207869A (ja) * 1986-03-06 1987-09-12 Sumitomo Electric Ind Ltd 酸素含有硬質窒化硼素被覆部品
US5670252A (en) * 1991-03-11 1997-09-23 Regents Of The University Of California Boron containing multilayer coatings and method of fabrication
US5723188A (en) * 1994-03-04 1998-03-03 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V Process for producing layers of cubic boron nitride

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JPH062938B2 (ja) * 1987-01-12 1994-01-12 株式会社神戸製鋼所 窒化硼素被覆層を有する複合材料
FR2649974B1 (fr) * 1989-07-21 1991-09-27 Aerospatiale Materiau carbone protege contre l'oxydation par du carbonitrure de bore
JP2526698B2 (ja) * 1990-03-30 1996-08-21 日新電機株式会社 窒化ホウ素薄膜被覆基体とその製造方法
US6004671A (en) * 1994-01-20 1999-12-21 Research Institute Of Advanced Material Gas-Generator, Ltd. Reinforcement for composite material and composite material using the same
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JPS62207869A (ja) * 1986-03-06 1987-09-12 Sumitomo Electric Ind Ltd 酸素含有硬質窒化硼素被覆部品
US5670252A (en) * 1991-03-11 1997-09-23 Regents Of The University Of California Boron containing multilayer coatings and method of fabrication
US5723188A (en) * 1994-03-04 1998-03-03 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V Process for producing layers of cubic boron nitride

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Also Published As

Publication number Publication date
CN101010445B (zh) 2013-03-27
US20070141384A1 (en) 2007-06-21
JP2008511751A (ja) 2008-04-17
DE102004042407A1 (de) 2006-03-23
CN101010445A (zh) 2007-08-01
US7914903B2 (en) 2011-03-29
EP1784524A2 (de) 2007-05-16
WO2006024386A2 (de) 2006-03-09
JP5192810B2 (ja) 2013-05-08

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