WO2004049430A1 - 複数枚の半導体ウエーハを収容するためのカセット - Google Patents
複数枚の半導体ウエーハを収容するためのカセット Download PDFInfo
- Publication number
- WO2004049430A1 WO2004049430A1 PCT/JP2002/012313 JP0212313W WO2004049430A1 WO 2004049430 A1 WO2004049430 A1 WO 2004049430A1 JP 0212313 W JP0212313 W JP 0212313W WO 2004049430 A1 WO2004049430 A1 WO 2004049430A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor wafer
- cassette
- suction
- suction tool
- shape
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
- H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
Definitions
- the present invention relates to a cassette for accommodating a plurality of semiconductor wafers at intervals in a vertical direction.
- a plurality of semiconductor wafers are housed in a cassette, and the cassette is transported to a required place.
- the cassette has a pair of vertically extending side walls that are spaced apart in the width direction. Supporting ridges or supporting grooves are formed on the inner surface of the side walls so as to be vertically spaced.
- Each of the semiconductor wafers is housed in a cassette with its both side edges positioned on corresponding supporting ridges on both side walls or in the supporting grooves. Therefore, a plurality of semiconductor wafers are accommodated in the cassette at intervals in the vertical direction (the interval corresponds to the interval between the support protrusions or the support grooves).
- a suction tool having a suction hole on the upper surface is used for loading and unloading the semiconductor wafer from the cassette.
- the semiconductor wafer When a semiconductor wafer is loaded into a cassette, the semiconductor wafer is vacuum-adsorbed onto a suction tool and transported to a required position in the cassette. Then, the vacuum suction of the semiconductor wafer is released. Then, the suction tool is pulled out of the cassette while leaving the semiconductor wafer in the cassette.
- the suction tool is inserted into the cassette and positioned below the semiconductor wafer, the semiconductor wafer is vacuum-sucked on the suction tool, and then the semiconductor wafer is removed. Pull out the suction tool holding the wafer from the cassette.
- the above-mentioned conventional cassette has the following problems. That is, in recent years, semiconductor wafers have become extremely thin, for example, 100 zm or less, In particular, it is not uncommon for the semiconductor wafer to have a thickness of 5 or less, but when a semiconductor wafer with an extremely thin thickness is housed in a cassette, the semiconductor wafer 28 is bent in a concave shape and the center is displaced downward. There is a tendency to be swayed. The bending of each of the semiconductor wafers is not necessarily uniform. Therefore, when the semiconductor wafer bends, a plurality of semiconductor wafers housed in a cassette spaced apart in the vertical direction. The vertical gap between C is too small locally.
- Japanese Patent Application Laid-Open Publication No. 2000-900400 discloses that a plurality of support plates are arranged in a cassette at intervals in a vertical direction, and a plurality of semiconductor wafer accommodating spaces are defined in the cassette. Cassettes are disclosed. Each of the support plates has a cutout corresponding to the shape of a suction tool for holding the semiconductor wafer by suction.
- each of the semiconductor wafers is supported not only at both side edges but also at the center thereof, so that the semiconductor wafers 8 are prevented from bending due to their own weight. Also, since the vertically adjacent semiconductor wafers are isolated by the support plate, the two vertically adjacent semiconductor wafers are not brought into contact with each other.
- the cassette disclosed in Japanese Patent Application Laid-Open No. 2000-910400 is still not sufficiently satisfactory. According to the inventor's experience, a semiconductor wafer that has been made extremely thin by grinding the back surface is curved in a concave or convex shape due to the grinding strain or crystal orientation. Therefore, even when the semiconductor wafer is supported not only at both side edges but also at the center thereof, the semiconductor wafer is curved.
- an object of the present invention is to provide a semiconductor wafer having a semiconductor wafer that is bent into a concave or convex shape when the semiconductor wafer is carried in and out of the cassette. Ensure that semiconductor wafers are damaged by collision with wafers
- the object of the present invention is to provide a new and improved cassette which is P-stopped.
- a separator is provided between each of the support plates. That is, according to the present invention, as a cassette for achieving the above object, there are provided a plurality of support plates arranged at an interval in the vertical direction, and a semiconductor wafer is provided in a front half of each of the support plates.
- a receiving set having a shape corresponding to the shape of the suction tool for holding and holding the semiconductor wafer is formed as a force set for accommodating a plurality of semiconductor wafers at intervals in a vertical direction.
- FIG. 1 is a perspective view of a cassette constructed according to the present invention.
- Figure 2 is a front view of the cassette of Figure 1.
- FIG. 3 is a perspective view showing a support plate in the cassette shown in FIG.
- FIG. 4 is a perspective view showing a separator in the cassette of FIG. FIG.
- FIG. 5 is a sectional view showing a side wall and a rear member of the cassette shown in FIG.
- FIG. 6 is a perspective view showing a typical example of a semiconductor wafer transport means.
- FIG. 7 is a cross-sectional view for explaining an example of a mode for loading a semiconductor wafer into the cassette of FIG.
- FIG. 8 is a cross-sectional view for explaining an example of a mode for carrying out a semiconductor wafer from the cassette of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
- the cassette generally designated by the reference numeral 2 and configured according to the present invention includes a ceiling 4 and a bottom plate 6.
- the top plate 4 is substantially disc-shaped, and has arc-shaped protrusions 8 on both sides.
- the bottom plate 6 is also substantially disk-shaped, and has arc-shaped protrusions 10 on both sides.
- a vertically extending side wall 12 is fixed between the protrusion 8 of the top plate 4 and the protrusion 10 of the bottom plate 6.
- a pair of rear members 14 extending vertically are fixed to the rear edges of the top plate 4 and the bottom plate 6.
- a gripping member 16 having a channel-like cross-sectional shape is fixed.
- the gripping member 16 can be held.
- a plurality of sheets are provided between the top plate 4 and the bottom plate 6 with a predetermined interval in the vertical direction.
- (Five) support plates 18 are provided.
- a separator 20 is provided between the support plates 18. More specifically, referring to FIGS. 3 to 5 together with FIGS. 1 and 2, a plurality of inner walls of the side wall 12 are arranged at predetermined intervals in the vertical direction (in the illustrated case,
- support ridges are formed.
- a plurality (9 in the illustrated case) of support protrusions 24 are formed at predetermined intervals upward and downward.
- the supporting plates 18 are odd-numbered ridges 22 and 2 counting their peripheral edge from above.
- the separators 20 are arranged at predetermined positions by fixing them on the ridges 22 and 24 of even-numbered surfaces counting their peripheral edges from above. ing.
- each of the support members 18 has a substantially semicircular shape, and both sides thereof are straightened along the inner surface of the side wall 12, and the first half thereof is described later.
- a receiving notch 26 having a shape corresponding to the shape of the suction portion to be formed is formed.
- each of the separators 20 has a substantially disk shape substantially corresponding to the shape of the semiconductor wafer 18, and both sides thereof are linearly formed along the inner surface of the side wall 12. ing.
- the cassette 2 has its components (that is, the top plate 4, the bottom plate 6, the side walls 12, the rear member 14, the gripping member 16, the support plate 18 and the separator plate 20) made of synthetic resin or metal sheet. It can be conveniently formed by connecting such components by suitable means such as bonding.
- FIG. 6 shows a typical example of the semiconductor wafer transport means 28 used to carry in and carry out the semiconductor wafer with respect to the cassette 2.
- the semiconductor wafer transport means 28 shown in the figure which is a known form per se, is mounted on the support member 30 so as to be able to move up and down, and is mounted on the upper end of the elevating shaft 32 so as to be pivotable.
- the suction tool 42 is attached to the attachment block 38 so as to be rotatable about an axis 40.
- the illustrated suction tool 42 has a forked fork shape, and a porous suction piece 46 is disposed on the suction surface (the upper surface in FIG. 6) of the two fingers 44.
- a suction tool of another appropriate form can be used, and it is important that the shape of the receiving notch 26 in the support member 18 correspond to the shape of the suction tool to be used.
- the semiconductor wafer transporting means 28 includes lifting and lowering means for raising and lowering the lifting shaft 32, first rotating means for rotating the first rotating arm 34, and second rotating means for rotating the first rotating arm 34. Second turning means for turning the two-turn arm and rotating means for rotating the suction tool 42 are provided. Further, suction means for selectively connecting the suction piece 46 of the suction tool 42 to a vacuum source is also provided.
- the semiconductor wafer 48 has a substantially disk shape, and has a straight edge 50 called an orientation flat at a peripheral portion thereof.
- the semiconductor wafer 48 is sucked to the suction tool 42 by the communication and force.
- the suction tool 42 of the semiconductor wafer conveying means 28 is shown in FIG. Then, rotate 180 degrees, and turn the suction surface on which the suction pieces 44 are disposed downward. Then, the suction surface of the suction tool 42 is pressed against the back surface exposed above the semiconductor wafer 48 on the chuck means, and the semiconductor wafer 48 is sucked to the suction surface.
- FIG. 7 shows an example of a mode in which the semiconductor wafer 48 adsorbed by the suction tool 42 is carried onto the support plate 18 located at the uppermost position of the cassette '2.
- the semiconductor wafer 48 When the semiconductor wafer 48 is loaded into the cassette 2, the semiconductor wafer 48 is sucked onto the suction surface of the suction tool 42, the semiconductor wafer 48 is removed from the chucking means, and then the suction tool 42 is removed. Rotate 180 degrees and turn the adsorption surface that adsorbs semiconductor wafer 48 upward. After that, as shown in FIG. 7 (A), the two fingers 44 of the suction device 42 are made to correspond to the receiving notches 26 of the support plate 18 and the semiconductor wafer 48 is moved from the support plate 18. Then, the suction tool 42 and the semiconductor wafer 48 adsorbed on the suction surface thereof are inserted into the cassette 2.
- the suction piece 46 of the B and the attachment 42 is cut off from the vacuum source and opened to the atmosphere to stop the suction of the semiconductor wafer 48.
- the suction device 4 Lower 2.
- the suction tool 42 is lowered to the position shown in FIG. 7B, the semiconductor wafer 48 is placed on the support plate 18.
- the suction of the semiconductor wafer 48 by the suction piece 46 is stopped, if the semiconductor wafer 48 is extremely thin, for example, as shown in FIG. 7B due to grinding strain or crystal orientation. It tends to be concave (or vice versa).
- FIG. 7 (C) the suction tool 42 is further lowered slightly to completely separate the suction tool 42 from the semiconductor wafer 48 mounted on the support plate 18. Let me know.
- FIG. 8 illustrates an example of a mode in which the semiconductor wafer 48 placed on the uppermost support plate 18 is carried out from the cassette 2.
- FIG. 8 (A) between the uppermost support plate 18 and the separator plate 20 located below the uppermost support plate 18 with the suction surface facing upward, the suction device 4 2 Insert
- FIGS. 8 (B) and 8 (C) the suction tool 42 is raised through the receiving notch 26 of the support plate 18.
- the semiconductor wafer 48 is pressed against the inner surface of the ceiling 4 (in the case of the semiconductor wafer 8 located below, Is pressed against the inner surface of the separator plate 20 located above the support plate 18), the curvature of the semiconductor wafer 48 is corrected, and the semiconductor wafer 48 is flattened. Thereafter, the suction piece 46 of the suction tool 42 is connected to a vacuum source to suck the semiconductor wafer 48 on the suction surface. Next, the suction tool 42 is slightly lowered to separate the semiconductor wafer 48 from the inner surface of the top plate 4 (or the separator plate 20), and then the suction tool that has sucked the semiconductor wafer 48 is removed. 4 Pull out 2 from cassette 2. In the embodiment shown in FIGS.
- the suction tool 42 sucking the semiconductor wafer 48 is inserted into the cassette 2 with its suction surface facing upward, and the support plate of the cassette 2 is
- the suction tool 42 is attached to the suction surface. Is in the cassette 2 with facing upward.
- the suction tool 42 with the semiconductor wafer 48 adsorbed is placed in a state where the suction surface thereof faces downward, and therefore, the semiconductor wafer 48 is suctioned on the lower surface of the suction tool 42. It is also possible to insert 42 into cassette 2 and place it on separator plate 20 located below support plate 18 instead of support plate 18.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2002/012313 WO2004049430A1 (ja) | 2002-11-26 | 2002-11-26 | 複数枚の半導体ウエーハを収容するためのカセット |
AU2002355034A AU2002355034A1 (en) | 2002-11-26 | 2002-11-26 | Cassette for storing multiple sheets of semiconductor wafers |
CNB028275454A CN1316583C (zh) | 2002-11-26 | 2002-11-26 | 用于储存多个半导体片的盒子 |
US10/469,047 US7325692B2 (en) | 2002-11-26 | 2002-11-26 | Cassette having separation plates for storing a plurality of semiconductor wafers |
EP02788655A EP1487009B1 (en) | 2002-11-26 | 2002-11-26 | Cassette for storing multiple sheets of semiconductor wafers |
DE60226512T DE60226512D1 (de) | 2002-11-26 | 2002-11-26 | Kassette zum speichern mehrerer halbleiterwaferlagen |
TW091134837A TWI282138B (en) | 2001-09-28 | 2002-11-29 | Cassette for storing a plurality of semiconductor wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2002/012313 WO2004049430A1 (ja) | 2002-11-26 | 2002-11-26 | 複数枚の半導体ウエーハを収容するためのカセット |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004049430A1 true WO2004049430A1 (ja) | 2004-06-10 |
Family
ID=32375604
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/012313 WO2004049430A1 (ja) | 2001-09-28 | 2002-11-26 | 複数枚の半導体ウエーハを収容するためのカセット |
Country Status (6)
Country | Link |
---|---|
US (1) | US7325692B2 (ja) |
EP (1) | EP1487009B1 (ja) |
CN (1) | CN1316583C (ja) |
AU (1) | AU2002355034A1 (ja) |
DE (1) | DE60226512D1 (ja) |
WO (1) | WO2004049430A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006080458A (ja) * | 2004-09-13 | 2006-03-23 | Dainichi Shoji Kk | ウエハキャリア |
US7325692B2 (en) | 2002-11-26 | 2008-02-05 | Disco Corporation | Cassette having separation plates for storing a plurality of semiconductor wafers |
CN112477092A (zh) * | 2019-09-12 | 2021-03-12 | 福州康派克光电科技有限公司 | 真空自吸附盒成型装置及成型方法 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4523513B2 (ja) * | 2005-08-05 | 2010-08-11 | 東京エレクトロン株式会社 | 基板受け渡し装置、基板受け渡し方法及び記憶媒体 |
WO2007066384A1 (ja) * | 2005-12-06 | 2007-06-14 | Fujitsu Limited | 半導体ウェハの収納ケース及び半導体ウェハの収納方法 |
KR20150110207A (ko) * | 2014-03-24 | 2015-10-02 | 주식회사 테라세미콘 | 보트 |
JP6617433B2 (ja) * | 2015-04-17 | 2019-12-11 | 日本電気硝子株式会社 | ガラス基板梱包体 |
JP6685213B2 (ja) * | 2016-09-29 | 2020-04-22 | 株式会社Screenホールディングス | 基板整列装置、基板処理装置、基板配列装置、基板整列方法、基板処理方法および基板配列方法 |
CN108615692B (zh) * | 2016-12-12 | 2021-04-09 | 北京北方华创微电子装备有限公司 | 片盒、反应腔室和半导体设备 |
JP6846993B2 (ja) * | 2017-06-19 | 2021-03-24 | 東京エレクトロン株式会社 | 基板保持具及びこれを用いた基板処理装置 |
JP1624353S (ja) * | 2018-07-19 | 2019-02-12 | ||
JP7357453B2 (ja) * | 2019-03-07 | 2023-10-06 | 東京エレクトロン株式会社 | 基板処理システムおよび基板の搬送方法 |
US20220148899A1 (en) * | 2020-11-06 | 2022-05-12 | Changxin Memory Technologies, Inc. | Wafer boat structure, as well as wafer boat assembly and diffusion furnace with same |
JP1700781S (ja) * | 2021-03-22 | 2021-11-29 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS63178541A (ja) * | 1987-01-20 | 1988-07-22 | Nec Corp | ウエ−ハ収納箱 |
JPS63195736U (ja) * | 1987-06-05 | 1988-12-16 | ||
JP2000091400A (ja) * | 1998-09-08 | 2000-03-31 | Disco Abrasive Syst Ltd | ウェーハ収容カセット |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH06103720B2 (ja) * | 1989-10-09 | 1994-12-14 | 株式会社東芝 | 半導体ウェハ支持キャリア |
DE4024973C2 (de) | 1990-08-07 | 1994-11-03 | Ibm | Anordnung zum Lagern, Transportieren und Einschleusen von Substraten |
JPH05102056A (ja) * | 1991-10-11 | 1993-04-23 | Rohm Co Ltd | ウエハー支持具 |
US5346518A (en) * | 1993-03-23 | 1994-09-13 | International Business Machines Corporation | Vapor drain system |
JP3233726B2 (ja) | 1993-03-30 | 2001-11-26 | 川崎製鉄株式会社 | 熱処理生産性ならびに繰り返し応力負荷によるミクロ組織変化の遅延特性に優れた軸受鋼 |
US6156121A (en) * | 1996-12-19 | 2000-12-05 | Tokyo Electron Limited | Wafer boat and film formation method |
JP3494554B2 (ja) * | 1997-06-26 | 2004-02-09 | 東芝セラミックス株式会社 | 半導体用治具およびその製造方法 |
JP2937194B1 (ja) * | 1998-07-15 | 1999-08-23 | 日本電気株式会社 | 基板加熱装置 |
US6310328B1 (en) * | 1998-12-10 | 2001-10-30 | Mattson Technologies, Inc. | Rapid thermal processing chamber for processing multiple wafers |
WO2001001828A1 (en) | 1999-07-02 | 2001-01-11 | Spi/Semicon | Wafer container |
EP1091391A1 (de) | 1999-10-05 | 2001-04-11 | SICO Produktions- und Handelsges.m.b.H. | Haltevorrichtung für Halbleiterscheiben |
DE60226512D1 (de) | 2002-11-26 | 2008-06-19 | Disco Corp | Kassette zum speichern mehrerer halbleiterwaferlagen |
-
2002
- 2002-11-26 DE DE60226512T patent/DE60226512D1/de not_active Expired - Lifetime
- 2002-11-26 AU AU2002355034A patent/AU2002355034A1/en not_active Abandoned
- 2002-11-26 US US10/469,047 patent/US7325692B2/en not_active Expired - Lifetime
- 2002-11-26 EP EP02788655A patent/EP1487009B1/en not_active Expired - Lifetime
- 2002-11-26 WO PCT/JP2002/012313 patent/WO2004049430A1/ja active IP Right Grant
- 2002-11-26 CN CNB028275454A patent/CN1316583C/zh not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63178541A (ja) * | 1987-01-20 | 1988-07-22 | Nec Corp | ウエ−ハ収納箱 |
JPS63195736U (ja) * | 1987-06-05 | 1988-12-16 | ||
JP2000091400A (ja) * | 1998-09-08 | 2000-03-31 | Disco Abrasive Syst Ltd | ウェーハ収容カセット |
Non-Patent Citations (1)
Title |
---|
See also references of EP1487009A4 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7325692B2 (en) | 2002-11-26 | 2008-02-05 | Disco Corporation | Cassette having separation plates for storing a plurality of semiconductor wafers |
JP2006080458A (ja) * | 2004-09-13 | 2006-03-23 | Dainichi Shoji Kk | ウエハキャリア |
JP4509713B2 (ja) * | 2004-09-13 | 2010-07-21 | 大日商事株式会社 | ウエハキャリア |
CN112477092A (zh) * | 2019-09-12 | 2021-03-12 | 福州康派克光电科技有限公司 | 真空自吸附盒成型装置及成型方法 |
CN112477092B (zh) * | 2019-09-12 | 2022-10-14 | 福州康派克光电科技有限公司 | 真空自吸附盒成型装置及成型方法 |
Also Published As
Publication number | Publication date |
---|---|
US7325692B2 (en) | 2008-02-05 |
DE60226512D1 (de) | 2008-06-19 |
EP1487009A4 (en) | 2007-04-11 |
CN1618125A (zh) | 2005-05-18 |
EP1487009A1 (en) | 2004-12-15 |
US20040256284A1 (en) | 2004-12-23 |
EP1487009B1 (en) | 2008-05-07 |
CN1316583C (zh) | 2007-05-16 |
AU2002355034A1 (en) | 2004-06-18 |
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