TWI796636B - 多電子束檢查裝置以及多電子束檢查方法 - Google Patents

多電子束檢查裝置以及多電子束檢查方法 Download PDF

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Publication number
TWI796636B
TWI796636B TW110106360A TW110106360A TWI796636B TW I796636 B TWI796636 B TW I796636B TW 110106360 A TW110106360 A TW 110106360A TW 110106360 A TW110106360 A TW 110106360A TW I796636 B TWI796636 B TW I796636B
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TW
Taiwan
Prior art keywords
electron beam
secondary electron
image
primary electron
primary
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TW110106360A
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English (en)
Chinese (zh)
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TW202139241A (zh
Inventor
小川力
平野亮一
児
井上広
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日商紐富來科技股份有限公司
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Publication of TW202139241A publication Critical patent/TW202139241A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW110106360A 2020-04-06 2021-02-23 多電子束檢查裝置以及多電子束檢查方法 TWI796636B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020068595A JP7442376B2 (ja) 2020-04-06 2020-04-06 マルチ電子ビーム検査装置及びマルチ電子ビーム検査方法
JP2020-068595 2020-04-06

Publications (2)

Publication Number Publication Date
TW202139241A TW202139241A (zh) 2021-10-16
TWI796636B true TWI796636B (zh) 2023-03-21

Family

ID=78022036

Family Applications (1)

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TW110106360A TWI796636B (zh) 2020-04-06 2021-02-23 多電子束檢查裝置以及多電子束檢查方法

Country Status (3)

Country Link
JP (1) JP7442376B2 (ja)
TW (1) TWI796636B (ja)
WO (1) WO2021205728A1 (ja)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003132834A (ja) * 2001-10-26 2003-05-09 Ebara Corp 電子線装置及びこの装置を用いたデバイス製造方法
TWI288424B (en) * 2000-06-27 2007-10-11 Ebara Corp Inspection apparatus and inspection method
JP2008142146A (ja) * 2006-12-07 2008-06-26 Ge Medical Systems Global Technology Co Llc クロストーク補正方法およびｘ線ｃｔ装置
US7809110B2 (en) * 2005-01-11 2010-10-05 Hitachi Medical Corporation X-ray imaging device
CN102798849A (zh) * 2012-08-14 2012-11-28 中国科学院光电技术研究所 一种消除由于串扰引起光斑质心偏移的方法
TWI668724B (zh) * 2017-02-07 2019-08-11 荷蘭商Ａｓｍｌ荷蘭公司 帶電粒子偵測之方法與裝置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02147883A (ja) * 1988-11-29 1990-06-06 Hitachi Ltd 多チャンネル放射線検出装置
EP3268979A4 (en) 2016-04-13 2019-05-08 Hermes Microvision Inc. DEVICE WITH MULTIPLE LOADED PARTICLE RAYS

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI288424B (en) * 2000-06-27 2007-10-11 Ebara Corp Inspection apparatus and inspection method
JP2003132834A (ja) * 2001-10-26 2003-05-09 Ebara Corp 電子線装置及びこの装置を用いたデバイス製造方法
US7809110B2 (en) * 2005-01-11 2010-10-05 Hitachi Medical Corporation X-ray imaging device
JP2008142146A (ja) * 2006-12-07 2008-06-26 Ge Medical Systems Global Technology Co Llc クロストーク補正方法およびｘ線ｃｔ装置
CN102798849A (zh) * 2012-08-14 2012-11-28 中国科学院光电技术研究所 一种消除由于串扰引起光斑质心偏移的方法
TWI668724B (zh) * 2017-02-07 2019-08-11 荷蘭商Ａｓｍｌ荷蘭公司 帶電粒子偵測之方法與裝置

Also Published As

Publication number Publication date
TW202139241A (zh) 2021-10-16
WO2021205728A1 (ja) 2021-10-14
JP7442376B2 (ja) 2024-03-04
JP2021165661A (ja) 2021-10-14

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