TWI772376B - 黑色感光性樹脂組合物及使用彼製造的顯示裝置 - Google Patents

黑色感光性樹脂組合物及使用彼製造的顯示裝置 Download PDF

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Publication number
TWI772376B
TWI772376B TW107107058A TW107107058A TWI772376B TW I772376 B TWI772376 B TW I772376B TW 107107058 A TW107107058 A TW 107107058A TW 107107058 A TW107107058 A TW 107107058A TW I772376 B TWI772376 B TW I772376B
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Taiwan
Prior art keywords
photosensitive resin
resin composition
alkyl
black
pixel
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TW107107058A
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English (en)
Chinese (zh)
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TW201840601A (zh
Inventor
朴瑟基
金勳植
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南韓商東友精細化工有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Optical Filters (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW107107058A 2017-03-29 2018-03-02 黑色感光性樹脂組合物及使用彼製造的顯示裝置 TWI772376B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2017-0040127 2017-03-29
KR1020170040127A KR102300328B1 (ko) 2017-03-29 2017-03-29 흑색 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치
??10-2017-0040127 2017-03-29

Publications (2)

Publication Number Publication Date
TW201840601A TW201840601A (zh) 2018-11-16
TWI772376B true TWI772376B (zh) 2022-08-01

Family

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Family Applications (1)

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TW107107058A TWI772376B (zh) 2017-03-29 2018-03-02 黑色感光性樹脂組合物及使用彼製造的顯示裝置

Country Status (4)

Country Link
JP (2) JP2018169607A (ja)
KR (1) KR102300328B1 (ja)
CN (1) CN108693707A (ja)
TW (1) TWI772376B (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102300328B1 (ko) * 2017-03-29 2021-09-09 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치
CN110034166B (zh) 2019-03-26 2022-09-09 武汉华星光电半导体显示技术有限公司 有机发光二极管显示装置及其制造方法
JP7229187B2 (ja) * 2020-01-29 2023-02-27 Jsr株式会社 重合体組成物、硬化膜及び有機ｅｌ素子

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CN102656518A (zh) * 2009-12-14 2012-09-05 太阳控股株式会社 感光性树脂组合物、其干膜以及使用了它们的印刷电路板
TW201626104A (zh) * 2014-11-21 2016-07-16 東友精細化工有限公司 自發光感光性樹脂組成物、彩色濾光器及圖像顯示裝置
TW201638665A (zh) * 2015-03-11 2016-11-01 Toray Industries 有機ｅｌ顯示裝置及其製造方法
TW201642040A (zh) * 2015-03-12 2016-12-01 東友精細化工有限公司 著色感光樹脂組合物、濾色器和液晶顯示裝置

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WO2012133148A1 (ja) * 2011-03-25 2012-10-04 東レ株式会社 黒色樹脂組成物、樹脂ブラックマトリックス基板およびタッチパネル
JP6309834B2 (ja) * 2013-12-11 2018-04-11 株式会社Adeka 着色性組成物
KR20150072581A (ko) 2013-12-20 2015-06-30 주식회사 이그잭스 폴리실록산을 함유한 감광성 수지 조성물
CN110941142B (zh) * 2014-03-17 2021-05-25 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法、以及半导体装置
KR102352992B1 (ko) * 2014-03-18 2022-01-19 제이에스알 가부시끼가이샤 감방사선성 조성물, 경화막, 표시 소자 및 착색제 분산액
JP6588254B2 (ja) * 2014-11-25 2019-10-09 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
JP7131907B2 (ja) * 2015-03-11 2022-09-06 三菱ケミカル株式会社 感光性着色組成物、硬化物、着色スペーサー、画像表示装置
KR101886911B1 (ko) * 2015-03-26 2018-08-08 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스 및/또는 칼럼스페이서를 포함하는 칼라필터, 및 상기 칼라필터를 포함하는 액정표시장치
JP6119922B2 (ja) * 2015-03-27 2017-04-26 三菱化学株式会社 着色樹脂組成物、カラーフィルタ、及び画像表示装置
TWI696889B (zh) * 2015-06-30 2020-06-21 南韓商東友精細化工有限公司 著色固化性樹脂組合物、濾色器和液晶顯示裝置
JP2017014418A (ja) * 2015-07-02 2017-01-19 株式会社Adeka ラジカル重合性組成物
KR102363104B1 (ko) * 2015-08-31 2022-02-15 후지필름 가부시키가이샤 착색 감광성 조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 소자, 화상 표시 장치, 및 경화막의 제조 방법
KR102622857B1 (ko) * 2017-02-09 2024-01-10 동우 화인켐 주식회사 유기발광소자 및 양자점발광소자의 화소정의막 형성용 흑색 감광성 수지 조성물
KR102300328B1 (ko) * 2017-03-29 2021-09-09 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102656518A (zh) * 2009-12-14 2012-09-05 太阳控股株式会社 感光性树脂组合物、其干膜以及使用了它们的印刷电路板
TW201626104A (zh) * 2014-11-21 2016-07-16 東友精細化工有限公司 自發光感光性樹脂組成物、彩色濾光器及圖像顯示裝置
TW201638665A (zh) * 2015-03-11 2016-11-01 Toray Industries 有機ｅｌ顯示裝置及其製造方法
TW201642040A (zh) * 2015-03-12 2016-12-01 東友精細化工有限公司 著色感光樹脂組合物、濾色器和液晶顯示裝置

Also Published As

Publication number Publication date
JP2018169607A (ja) 2018-11-01
JP2022109931A (ja) 2022-07-28
KR20180110497A (ko) 2018-10-10
KR102300328B1 (ko) 2021-09-09
CN108693707A (zh) 2018-10-23
TW201840601A (zh) 2018-11-16

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