TWI761701B - 著色劑組成物、光阻、彩色濾光片以及顯示裝置 - Google Patents

著色劑組成物、光阻、彩色濾光片以及顯示裝置 Download PDF

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Publication number
TWI761701B
TWI761701B TW108131590A TW108131590A TWI761701B TW I761701 B TWI761701 B TW I761701B TW 108131590 A TW108131590 A TW 108131590A TW 108131590 A TW108131590 A TW 108131590A TW I761701 B TWI761701 B TW I761701B
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TW
Taiwan
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chemical formula
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TW108131590A
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Chinese (zh)
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TW202020058A (zh
Inventor
金惠陳
金漢修
李多美
梁承秦
李在容
金志宣
金泳雄
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南韓商Lg化學股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/101Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing an anthracene dye
    • C09B69/102Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing an anthracene dye containing a perylene dye
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW108131590A 2018-09-04 2019-09-03 著色劑組成物、光阻、彩色濾光片以及顯示裝置 TWI761701B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020180105447A KR102309662B1 (ko) 2018-09-04 2018-09-04 착색제 조성물, 감광재, 컬러필터 및 디스플레이 장치
KR10-2018-0105447 2018-09-04

Publications (2)

Publication Number Publication Date
TW202020058A TW202020058A (zh) 2020-06-01
TWI761701B true TWI761701B (zh) 2022-04-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW108131590A TWI761701B (zh) 2018-09-04 2019-09-03 著色劑組成物、光阻、彩色濾光片以及顯示裝置

Country Status (5)

Country Link
JP (1) JP7120526B2 (ja)
KR (1) KR102309662B1 (ja)
CN (1) CN111971621B (ja)
TW (1) TWI761701B (ja)
WO (1) WO2020050556A1 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201105758A (en) * 2009-03-30 2011-02-16 Evonik Roehm Gmbh Coating composition, (meth) acrylic polymer and monomer mixture for preparing the (meth) acrylic polymer
KR20160015474A (ko) * 2014-07-30 2016-02-15 (주)엘지하우시스 광경화성 점접착제 조성물, 점접착 필름 및 점접착 필름의 제조 방법
JP2016505655A (ja) * 2012-12-03 2016-02-25 キュン−イン シンセティック カンパニー リミテッドKyung−In Synthetic Co.,Ltd. トリアリールメタン染料高分子化合物、それを含むカラーフィルター用青色樹脂組成物及びそれを利用したカラーフィルター

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0987534A (ja) 1995-09-25 1997-03-31 Konica Corp インクジェット記録液
JP2002356602A (ja) 2000-07-28 2002-12-13 Sekisui Chem Co Ltd 着色樹脂エマルジョン、インクジェット印刷用インク、電着液及びカラーフィルター
CN101963757B (zh) * 2009-07-25 2012-11-21 比亚迪股份有限公司 一种有机硅改性碱溶性光敏树脂及其制备方法和一种油墨组合物
JP5726689B2 (ja) * 2011-09-13 2015-06-03 富士フイルム株式会社 多層構造シートの製造方法
JP6699999B2 (ja) * 2015-02-26 2020-05-27 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 着色硬化性樹脂組成物、カラーフィルタ及び表示装置
KR101957754B1 (ko) 2015-02-27 2019-03-14 후지필름 가부시키가이샤 착색 조성물, 경화막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치 및 폴리머
KR20170010969A (ko) * 2015-07-20 2017-02-02 이리도스 주식회사 착색 화합물, 및 이를 포함하는 착색제 물질

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201105758A (en) * 2009-03-30 2011-02-16 Evonik Roehm Gmbh Coating composition, (meth) acrylic polymer and monomer mixture for preparing the (meth) acrylic polymer
JP2016505655A (ja) * 2012-12-03 2016-02-25 キュン−イン シンセティック カンパニー リミテッドKyung−In Synthetic Co.,Ltd. トリアリールメタン染料高分子化合物、それを含むカラーフィルター用青色樹脂組成物及びそれを利用したカラーフィルター
KR20160015474A (ko) * 2014-07-30 2016-02-15 (주)엘지하우시스 광경화성 점접착제 조성물, 점접착 필름 및 점접착 필름의 제조 방법

Also Published As

Publication number Publication date
TW202020058A (zh) 2020-06-01
CN111971621A (zh) 2020-11-20
KR20200027311A (ko) 2020-03-12
JP2021517601A (ja) 2021-07-26
KR102309662B1 (ko) 2021-10-06
JP7120526B2 (ja) 2022-08-17
WO2020050556A1 (ko) 2020-03-12
CN111971621B (zh) 2024-05-07

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