TWI554626B - Oxide sputtering target and protective film for optical recording medium - Google Patents

Oxide sputtering target and protective film for optical recording medium Download PDF

Info

Publication number
TWI554626B
TWI554626B TW101146867A TW101146867A TWI554626B TW I554626 B TWI554626 B TW I554626B TW 101146867 A TW101146867 A TW 101146867A TW 101146867 A TW101146867 A TW 101146867A TW I554626 B TWI554626 B TW I554626B
Authority
TW
Taiwan
Prior art keywords
sputtering target
film
protective film
recording medium
optical recording
Prior art date
Application number
TW101146867A
Other languages
English (en)
Chinese (zh)
Other versions
TW201341559A (zh
Inventor
Atsushi Saito
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of TW201341559A publication Critical patent/TW201341559A/zh
Application granted granted Critical
Publication of TWI554626B publication Critical patent/TWI554626B/zh

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
TW101146867A 2011-12-17 2012-12-12 Oxide sputtering target and protective film for optical recording medium TWI554626B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011276541A JP2013127090A (ja) 2011-12-17 2011-12-17 酸化物スパッタリングターゲット及び光記録媒体用保護膜

Publications (2)

Publication Number Publication Date
TW201341559A TW201341559A (zh) 2013-10-16
TWI554626B true TWI554626B (zh) 2016-10-21

Family

ID=48777776

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101146867A TWI554626B (zh) 2011-12-17 2012-12-12 Oxide sputtering target and protective film for optical recording medium

Country Status (2)

Country Link
JP (1) JP2013127090A (ja)
TW (1) TWI554626B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6280319B2 (ja) 2012-10-30 2018-02-14 株式会社デンソーテン レーダ装置、および、信号処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1959442A1 (en) * 2005-12-02 2008-08-20 Matsushita Electric Industrial Co., Ltd. Optical information recording medium, recording/reproducing method thereof and recording/reproducing apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1959442A1 (en) * 2005-12-02 2008-08-20 Matsushita Electric Industrial Co., Ltd. Optical information recording medium, recording/reproducing method thereof and recording/reproducing apparatus

Also Published As

Publication number Publication date
JP2013127090A (ja) 2013-06-27
TW201341559A (zh) 2013-10-16

Similar Documents

Publication Publication Date Title
JP6212869B2 (ja) 酸化物スパッタリングターゲット
TWI424074B (zh) Ti-Nb-based sintered body sputtering target, Ti-Nb-based oxide thin film, and method for producing the same
WO2012017659A1 (ja) スパッタリングターゲットの製造方法およびスパッタリングターゲット
TW201144468A (en) Sputtering target and process for producing the same
JP6501008B2 (ja) 酸化物スパッタリングターゲット及びその製造方法
TWI301157B (ja)
TWI554626B (zh) Oxide sputtering target and protective film for optical recording medium
TW201917229A (zh) Mn-W-Cu-O系濺鍍靶及其製造方法
JP5896121B2 (ja) 酸化物スパッタリングターゲット及び光記録媒体用保護膜
TW201402517A (zh) 導電性氧化物燒結體及其製造方法
TW201000661A (en) Sputtering target and non-crystalline optical thin film
JP5440388B2 (ja) 酸化物スパッタリングターゲットおよび光記録媒体用酸化物膜
TWI487805B (zh) Sputtering target and its manufacturing method
JP2013144820A (ja) 酸化物スパッタリングターゲット及び光記録媒体用保護膜
TW201505739A (zh) 薄膜形成用濺鍍靶及其製造方法
JP2013237893A (ja) 酸化物スパッタリングターゲット及び光記録媒体用保護膜
JP7141276B2 (ja) スパッタリングターゲット
JP2012224903A (ja) 酸化物スパッタリングターゲットおよびその製造方法
TWI576835B (zh) A CrTi-based alloy for a bonded film for a magnetic recording medium, a target material for sputtering, and a perpendicular magnetic recording medium
TWI273141B (en) Sputtering target, optical information recording medium and method for producing same
JP2017197841A (ja) 酸化ビスマスゲルマニウムスパッタリングターゲットと酸化ビスマスゲルマニウム層