TWI537404B - Oxide sintered body, oxide sputtering target, and method for producing conductive oxide film and oxide sintered body - Google Patents
Oxide sintered body, oxide sputtering target, and method for producing conductive oxide film and oxide sintered body Download PDFInfo
- Publication number
- TWI537404B TWI537404B TW104127113A TW104127113A TWI537404B TW I537404 B TWI537404 B TW I537404B TW 104127113 A TW104127113 A TW 104127113A TW 104127113 A TW104127113 A TW 104127113A TW I537404 B TWI537404 B TW I537404B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- sintered body
- oxide
- sputtering
- powder
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62218—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic films, e.g. by using temporary supports
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
- C04B2235/9646—Optical properties
- C04B2235/9653—Translucent or transparent ceramics other than alumina
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014205403 | 2014-10-06 | ||
JP2015012019A JP5876172B1 (ja) | 2014-10-06 | 2015-01-26 | 酸化物焼結体、酸化物スパッタリングターゲット及び導電性酸化物薄膜並びに酸化物焼結体の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201614084A TW201614084A (en) | 2016-04-16 |
TWI537404B true TWI537404B (zh) | 2016-06-11 |
Family
ID=55434716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104127113A TWI537404B (zh) | 2014-10-06 | 2015-08-20 | Oxide sintered body, oxide sputtering target, and method for producing conductive oxide film and oxide sintered body |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5876172B1 (ko) |
KR (1) | KR101668963B1 (ko) |
CN (2) | CN109437856A (ko) |
TW (1) | TWI537404B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7086080B2 (ja) * | 2017-08-08 | 2022-06-17 | 三井金属鉱業株式会社 | 酸化物焼結体およびスパッタリングターゲット |
JP2019131866A (ja) * | 2018-01-31 | 2019-08-08 | 住友金属鉱山株式会社 | 酸化物スパッタ膜、酸化物スパッタ膜の製造方法、酸化物焼結体及び透明樹脂基板 |
TWI819633B (zh) * | 2022-05-31 | 2023-10-21 | 光洋應用材料科技股份有限公司 | 氧化銦鈦鋅濺鍍靶材、其薄膜及其製法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3746094B2 (ja) * | 1995-06-28 | 2006-02-15 | 出光興産株式会社 | ターゲットおよびその製造方法 |
US7141186B2 (en) * | 2002-10-29 | 2006-11-28 | Sumitomo Metal Mining Co., Ltd. | Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode |
JP4933756B2 (ja) * | 2005-09-01 | 2012-05-16 | 出光興産株式会社 | スパッタリングターゲット |
JP4994068B2 (ja) | 2006-08-09 | 2012-08-08 | 出光興産株式会社 | 酸化物導電性材料及びその製造方法 |
CN102216237B (zh) * | 2008-11-20 | 2015-05-13 | 出光兴产株式会社 | ZnO-SnO2-In2O3类氧化物烧结体及非晶质透明导电膜 |
KR20190044123A (ko) * | 2011-05-10 | 2019-04-29 | 이데미쓰 고산 가부시키가이샤 | In₂O₃-SnO₂-ZnO계 스퍼터링 타겟 |
JP2013220805A (ja) | 2012-04-19 | 2013-10-28 | Toyota Boshoku Corp | 車室の吹出口構造 |
JP2014111818A (ja) * | 2012-11-09 | 2014-06-19 | Idemitsu Kosan Co Ltd | スパッタリングターゲット、酸化物半導体薄膜及びそれらの製造方法 |
TW201422835A (zh) * | 2012-12-03 | 2014-06-16 | Solar Applied Mat Tech Corp | 濺鍍靶材及導電金屬氧化物薄膜 |
-
2015
- 2015-01-26 JP JP2015012019A patent/JP5876172B1/ja active Active
- 2015-08-20 TW TW104127113A patent/TWI537404B/zh active
- 2015-10-05 KR KR1020150139701A patent/KR101668963B1/ko active IP Right Grant
- 2015-10-08 CN CN201811061549.6A patent/CN109437856A/zh active Pending
- 2015-10-08 CN CN201510646309.2A patent/CN105481352A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
TW201614084A (en) | 2016-04-16 |
KR101668963B1 (ko) | 2016-10-24 |
KR20160041013A (ko) | 2016-04-15 |
CN109437856A (zh) | 2019-03-08 |
CN105481352A (zh) | 2016-04-13 |
JP5876172B1 (ja) | 2016-03-02 |
JP2016074579A (ja) | 2016-05-12 |
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