TWI389182B - 離子束照射方法及離子束照射裝置 - Google Patents

離子束照射方法及離子束照射裝置 Download PDF

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Publication number
TWI389182B
TWI389182B TW097132060A TW97132060A TWI389182B TW I389182 B TWI389182 B TW I389182B TW 097132060 A TW097132060 A TW 097132060A TW 97132060 A TW97132060 A TW 97132060A TW I389182 B TWI389182 B TW I389182B
Authority
TW
Taiwan
Prior art keywords
ion beam
substrate
beam irradiation
ion
irradiated
Prior art date
Application number
TW097132060A
Other languages
English (en)
Chinese (zh)
Other versions
TW200924032A (en
Inventor
Okute Yasuhiro
Original Assignee
Nissin Ion Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Ion Equipment Co Ltd filed Critical Nissin Ion Equipment Co Ltd
Publication of TW200924032A publication Critical patent/TW200924032A/zh
Application granted granted Critical
Publication of TWI389182B publication Critical patent/TWI389182B/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Liquid Crystal (AREA)
TW097132060A 2007-11-29 2008-08-22 離子束照射方法及離子束照射裝置 TWI389182B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007308624A JP4530032B2 (ja) 2007-11-29 2007-11-29 イオンビーム照射方法およびイオンビーム照射装置

Publications (2)

Publication Number Publication Date
TW200924032A TW200924032A (en) 2009-06-01
TWI389182B true TWI389182B (zh) 2013-03-11

Family

ID=40866626

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097132060A TWI389182B (zh) 2007-11-29 2008-08-22 離子束照射方法及離子束照射裝置

Country Status (3)

Country Link
JP (1) JP4530032B2 (ko)
KR (1) KR100923516B1 (ko)
TW (1) TWI389182B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110101904A (ko) * 2010-03-10 2011-09-16 삼성모바일디스플레이주식회사 이온 도핑 장치 및 도핑 방법
JP2012185953A (ja) * 2011-03-04 2012-09-27 Nissin Ion Equipment Co Ltd イオンビーム照射方法とその装置
JP2013161969A (ja) * 2012-02-06 2013-08-19 Sumitomo Heavy Ind Ltd 太陽電池の製造方法および太陽電池の製造装置
JP5892802B2 (ja) * 2012-02-09 2016-03-23 住友重機械工業株式会社 イオン注入方法、搬送容器及びイオン注入装置
JP5863153B2 (ja) * 2012-10-29 2016-02-16 日新イオン機器株式会社 イオン注入装置
KR101645887B1 (ko) * 2015-06-12 2016-08-05 연세대학교 산학협력단 마스크를 이용하는 이방성 주름 패턴 형성 방법 및 시스템
KR102677573B1 (ko) * 2021-10-01 2024-06-21 주식회사 에스아이디허브 교차방사 광촉매 플라즈마 헤드시스템을 이용한 광촉매 플라즈마 코팅방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0246360U (ko) * 1988-09-22 1990-03-29
JP4026789B2 (ja) * 1998-04-02 2007-12-26 株式会社アルバック イオン注入方法
JP4954359B2 (ja) * 1999-02-12 2012-06-13 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR100937822B1 (ko) * 2003-08-19 2010-01-20 엘지디스플레이 주식회사 이온 빔 조사 장치 및 그 방법
KR100920646B1 (ko) * 2003-08-20 2009-10-07 엘지디스플레이 주식회사 이온 빔 조사 장치
KR20050103336A (ko) * 2004-04-26 2005-10-31 엘지.필립스 엘시디 주식회사 액정표시장치용 기판의 배향막 표면 처리 방법
JP2005347543A (ja) * 2004-06-03 2005-12-15 Sharp Corp イオンドーピング方法およびイオンドーピング装置
JP4371011B2 (ja) * 2004-09-02 2009-11-25 日新イオン機器株式会社 イオンビーム照射装置およびイオンビーム照射方法
JP4426424B2 (ja) * 2004-11-11 2010-03-03 三井造船株式会社 イオン注入装置及びイオンビーム生成方法
JP4901203B2 (ja) * 2005-12-12 2012-03-21 東芝モバイルディスプレイ株式会社 イオンビームの照射方法及び薄膜トランジスタをもつ基板の製造装置

Also Published As

Publication number Publication date
JP2009134923A (ja) 2009-06-18
KR20090056799A (ko) 2009-06-03
KR100923516B1 (ko) 2009-10-27
JP4530032B2 (ja) 2010-08-25
TW200924032A (en) 2009-06-01

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