TWI372263B - Catadioptric projection objective - Google Patents
Catadioptric projection objectiveInfo
- Publication number
- TWI372263B TWI372263B TW099126310A TW99126310A TWI372263B TW I372263 B TWI372263 B TW I372263B TW 099126310 A TW099126310 A TW 099126310A TW 99126310 A TW99126310 A TW 99126310A TW I372263 B TWI372263 B TW I372263B
- Authority
- TW
- Taiwan
- Prior art keywords
- projection objective
- catadioptric projection
- catadioptric
- objective
- projection
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0896—Catadioptric systems with variable magnification or multiple imaging planes, including multispectral systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
- G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009037077A DE102009037077B3 (de) | 2009-08-13 | 2009-08-13 | Katadioptrisches Projektionsobjektiv |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201131198A TW201131198A (en) | 2011-09-16 |
TWI372263B true TWI372263B (en) | 2012-09-11 |
Family
ID=43448492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099126310A TWI372263B (en) | 2009-08-13 | 2010-08-06 | Catadioptric projection objective |
Country Status (6)
Country | Link |
---|---|
US (6) | US8446665B2 (zh) |
JP (3) | JP2011039526A (zh) |
KR (2) | KR20110017344A (zh) |
CN (1) | CN101995591B (zh) |
DE (1) | DE102009037077B3 (zh) |
TW (1) | TWI372263B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8705170B2 (en) * | 2008-08-29 | 2014-04-22 | Nikon Corporation | High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations |
CN102436058B (zh) * | 2011-12-14 | 2013-08-21 | 北京理工大学 | 一种用于深紫外波段的全球面折反式准直物镜 |
JP6217651B2 (ja) * | 2012-12-18 | 2017-10-25 | 株式会社ニコン | 基板処理装置、デバイス製造システム及びデバイス製造方法 |
US9274344B2 (en) * | 2013-07-15 | 2016-03-01 | The Boeing Company | Method for extracting optical energy from an optical beam |
KR20160091085A (ko) * | 2015-01-23 | 2016-08-02 | 삼성전자주식회사 | 반사 굴절 광학계 및 이미지 촬영 장치 |
DE102022207068A1 (de) | 2022-07-11 | 2024-01-11 | Carl Zeiss Smt Gmbh | Linse für eine zum Betrieb im DUV ausgelegte mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren und Anordnung zum Ausbilden einer Antireflexschicht |
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US6268904B1 (en) * | 1997-04-23 | 2001-07-31 | Nikon Corporation | Optical exposure apparatus and photo-cleaning method |
US5993898A (en) | 1997-05-19 | 1999-11-30 | Nikon Corporation | Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating |
JP3509804B2 (ja) | 1999-09-30 | 2004-03-22 | 株式会社ニコン | 多層薄膜付き光学素子及びそれを備える露光装置 |
US6995930B2 (en) * | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
US7301605B2 (en) | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
JP2002083766A (ja) * | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
DE10124474A1 (de) | 2001-05-19 | 2002-11-21 | Zeiss Carl | Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens |
US6831731B2 (en) | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
WO2003003429A1 (fr) * | 2001-06-28 | 2003-01-09 | Nikon Corporation | Systeme de projection optique, systeme d'exposition et procede |
TW559885B (en) * | 2001-10-19 | 2003-11-01 | Nikon Corp | Projection optical system and exposure device having the projection optical system |
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JP3741208B2 (ja) * | 2001-11-29 | 2006-02-01 | 株式会社ニコン | 光リソグラフィー用光学部材及びその評価方法 |
JP2005512151A (ja) * | 2001-12-10 | 2005-04-28 | カール・ツァイス・エスエムティー・アーゲー | カタジオプトリック縮小対物レンズ |
JP4292497B2 (ja) | 2002-04-17 | 2009-07-08 | 株式会社ニコン | 投影光学系、露光装置および露光方法 |
JP2005536775A (ja) * | 2002-08-23 | 2005-12-02 | 株式会社ニコン | 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法 |
US20040227944A1 (en) * | 2003-02-28 | 2004-11-18 | Nikon Corporation | Mark position detection apparatus |
JP2004302113A (ja) | 2003-03-31 | 2004-10-28 | Nikon Corp | 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法 |
TWI282487B (en) | 2003-05-23 | 2007-06-11 | Canon Kk | Projection optical system, exposure apparatus, and device manufacturing method |
JP2005039211A (ja) * | 2003-06-30 | 2005-02-10 | Canon Inc | 投影光学系、露光装置及びデバイスの製造方法 |
JP4455022B2 (ja) | 2003-11-18 | 2010-04-21 | オリンパス株式会社 | 反射防止膜および対物レンズ |
US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
EP1721201A1 (en) * | 2004-02-18 | 2006-11-15 | Corning Incorporated | Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light |
JP5769356B2 (ja) * | 2004-05-17 | 2015-08-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 中間像を有するカタジオプトリック投影対物レンズ |
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JP2006113533A (ja) | 2004-08-03 | 2006-04-27 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
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US20060082905A1 (en) * | 2004-10-14 | 2006-04-20 | Shafer David R | Catadioptric projection objective with an in-line, single-axis configuration |
US7697198B2 (en) * | 2004-10-15 | 2010-04-13 | Carl Zeiss Smt Ag | Catadioptric projection objective |
DE102005045862A1 (de) * | 2004-10-19 | 2006-04-20 | Carl Zeiss Smt Ag | Optisches System für Ultraviolettlicht |
DE102005042005A1 (de) * | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
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DE102005041938A1 (de) | 2005-09-03 | 2007-03-08 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
JPWO2007091463A1 (ja) | 2006-02-07 | 2009-07-02 | 株式会社ニコン | 反射屈折結像光学系、露光装置、およびデバイス製造方法 |
US8125613B2 (en) * | 2006-04-21 | 2012-02-28 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
DE102006022958A1 (de) * | 2006-05-11 | 2007-11-22 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs |
WO2007132619A1 (ja) * | 2006-05-12 | 2007-11-22 | Nikon Corporation | 結像光学系、露光装置、およびデバイス製造方法 |
EP1890191A1 (en) * | 2006-08-14 | 2008-02-20 | Carl Zeiss SMT AG | Catadioptric projection objective with pupil mirror |
EP1927890A1 (en) * | 2006-11-30 | 2008-06-04 | Carl Zeiss SMT AG | Method of manufacturing a projection objective and projection objective manufactured by that method |
EP1998223A2 (de) | 2007-01-23 | 2008-12-03 | Carl Zeiss SMT AG | Projektionsobjektiv für die Lithographie |
JP5165700B2 (ja) * | 2007-02-28 | 2013-03-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 瞳補正を有する反射屈折投影対物系 |
US7929115B2 (en) * | 2007-06-01 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection objective and projection exposure apparatus for microlithography |
US7760425B2 (en) * | 2007-09-05 | 2010-07-20 | Carl Zeiss Smt Ag | Chromatically corrected catadioptric objective and projection exposure apparatus including the same |
NL1035950A1 (nl) | 2007-09-28 | 2009-03-31 | Asml Netherlands Bv | Radiometric Kirk test. |
-
2009
- 2009-08-13 DE DE102009037077A patent/DE102009037077B3/de not_active Expired - Fee Related
- 2009-09-18 US US12/562,693 patent/US8446665B2/en active Active
-
2010
- 2010-08-06 TW TW099126310A patent/TWI372263B/zh not_active IP Right Cessation
- 2010-08-12 KR KR1020100077848A patent/KR20110017344A/ko active Application Filing
- 2010-08-13 CN CN201010254294.2A patent/CN101995591B/zh active Active
- 2010-08-13 JP JP2010194864A patent/JP2011039526A/ja active Pending
-
2012
- 2012-04-13 JP JP2012091857A patent/JP2012185503A/ja active Pending
- 2012-10-01 JP JP2012219282A patent/JP2013042155A/ja active Pending
-
2013
- 2013-04-26 US US13/871,366 patent/US8873137B2/en active Active
-
2014
- 2014-10-09 US US14/510,454 patent/US9279969B2/en active Active
-
2016
- 2016-01-21 US US15/002,492 patent/US9726870B2/en active Active
-
2017
- 2017-07-20 US US15/654,766 patent/US10042146B2/en active Active
-
2018
- 2018-03-28 KR KR1020180035923A patent/KR20180034378A/ko not_active Application Discontinuation
- 2018-06-28 US US16/021,239 patent/US20180373006A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20160231546A1 (en) | 2016-08-11 |
JP2013042155A (ja) | 2013-02-28 |
US8873137B2 (en) | 2014-10-28 |
KR20180034378A (ko) | 2018-04-04 |
CN101995591A (zh) | 2011-03-30 |
US20130242279A1 (en) | 2013-09-19 |
TW201131198A (en) | 2011-09-16 |
KR20110017344A (ko) | 2011-02-21 |
US20110038061A1 (en) | 2011-02-17 |
US9279969B2 (en) | 2016-03-08 |
CN101995591B (zh) | 2015-03-25 |
US9726870B2 (en) | 2017-08-08 |
JP2012185503A (ja) | 2012-09-27 |
DE102009037077B3 (de) | 2011-02-17 |
JP2011039526A (ja) | 2011-02-24 |
US20150055212A1 (en) | 2015-02-26 |
US8446665B2 (en) | 2013-05-21 |
US10042146B2 (en) | 2018-08-07 |
US20180095258A1 (en) | 2018-04-05 |
US20180373006A1 (en) | 2018-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |