TWI346216B - Method of producing optical film and anti-reflection film, optical film, anti-reflection film, polarizing plate and image display device comprising same - Google Patents
Method of producing optical film and anti-reflection film, optical film, anti-reflection film, polarizing plate and image display device comprising sameInfo
- Publication number
- TWI346216B TWI346216B TW094129808A TW94129808A TWI346216B TW I346216 B TWI346216 B TW I346216B TW 094129808 A TW094129808 A TW 094129808A TW 94129808 A TW94129808 A TW 94129808A TW I346216 B TWI346216 B TW I346216B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- optical film
- reflection film
- display device
- image display
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
- B05D1/38—Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0486—Operating the coating or treatment in a controlled atmosphere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/53—Base coat plus clear coat type
- B05D7/536—Base coat plus clear coat type each layer being cured, at least partially, separately
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Polarising Elements (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004258475 | 2004-09-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200624850A TW200624850A (en) | 2006-07-16 |
TWI346216B true TWI346216B (en) | 2011-08-01 |
Family
ID=36036309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094129808A TWI346216B (en) | 2004-09-06 | 2005-08-31 | Method of producing optical film and anti-reflection film, optical film, anti-reflection film, polarizing plate and image display device comprising same |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070247711A1 (zh) |
JP (1) | JP4878796B2 (zh) |
KR (1) | KR101235451B1 (zh) |
CN (1) | CN100460896C (zh) |
TW (1) | TWI346216B (zh) |
WO (1) | WO2006028027A1 (zh) |
Cited By (1)
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TWI748227B (zh) * | 2018-08-23 | 2021-12-01 | 日商日東電工股份有限公司 | 防反射薄膜、防反射薄膜的製造方法、光學構件及影像顯示裝置 |
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JP2008003580A (ja) * | 2006-05-23 | 2008-01-10 | Fujifilm Corp | 偏光板用保護フィルム、偏光板及び液晶表示装置 |
JP2007322877A (ja) * | 2006-06-02 | 2007-12-13 | Dainippon Printing Co Ltd | 光学積層体 |
CN101134865B (zh) * | 2006-08-28 | 2010-05-26 | 南亚塑胶工业股份有限公司 | 光学聚酯膜用水性涂布液组成 |
US8999488B2 (en) * | 2007-01-22 | 2015-04-07 | Canon Kabushiki Kaisha | Optical member and method of manufacturing the same |
JP4857290B2 (ja) * | 2007-01-22 | 2012-01-18 | キヤノン株式会社 | 光学部材及び光学部材の製造方法 |
JP5291919B2 (ja) * | 2007-11-20 | 2013-09-18 | 富士フイルム株式会社 | ディスプレイ表面に用いる偏光板用保護フィルム又は画像表示装置前面板用フィルム |
JP5718551B2 (ja) * | 2008-03-28 | 2015-05-13 | リンテック株式会社 | プラズマディスプレイ用感圧接着剤組成物及びそれを成形してなる粘着シート |
JP5092886B2 (ja) * | 2008-05-16 | 2012-12-05 | 日本ゼオン株式会社 | 反射防止フィルム |
JP5195354B2 (ja) * | 2008-12-01 | 2013-05-08 | セイコーエプソン株式会社 | 光学素子 |
KR20100127954A (ko) * | 2009-05-27 | 2010-12-07 | 도레이첨단소재 주식회사 | 반사방지필름 및 이를 포함하는 편광판 |
JP5525368B2 (ja) * | 2010-07-28 | 2014-06-18 | 富士フイルム株式会社 | スライド塗布方法及びその方法を用いた光学フィルムの製造方法 |
JP2012220556A (ja) * | 2011-04-05 | 2012-11-12 | Jsr Corp | 反射防止膜、該反射防止膜の高屈折層形成用組成物および屋外設置用ディスプレイ |
CN102253030B (zh) * | 2011-06-30 | 2012-09-26 | 武汉钢铁(集团)公司 | 一种测定高钛渣中杂质含量的方法 |
EP2750884A4 (en) | 2011-09-01 | 2015-04-29 | 3M Innovative Properties Co | METHOD FOR PRODUCING AT LEAST PARTIALLY HARDENED LAYER |
WO2013040014A2 (en) * | 2011-09-14 | 2013-03-21 | 3M Innovative Properties Company | Methods of modulating tackiness |
JP2013152425A (ja) | 2011-12-28 | 2013-08-08 | Tamron Co Ltd | 反射防止膜及び光学素子 |
US20130273254A1 (en) * | 2012-04-13 | 2013-10-17 | Mortech Corporation | Polymide film and method for manufacturing the same |
JP5783971B2 (ja) * | 2012-08-10 | 2015-09-24 | 株式会社東芝 | 塗布装置および塗布方法 |
KR102203605B1 (ko) | 2013-07-10 | 2021-01-14 | 리껭테크노스 가부시키가이샤 | 폴리(메트)아크릴이미드 필름, 그 접착 용이성 필름 및 그들의 제조 방법 |
JP6538347B2 (ja) * | 2014-03-21 | 2019-07-03 | リケンテクノス株式会社 | 多層コートフィルムの製造方法 |
JP6446810B2 (ja) * | 2014-03-28 | 2019-01-09 | 大日本印刷株式会社 | 位相差フィルム、光学フィルム、光学フィルムの製造方法 |
KR102033697B1 (ko) * | 2016-04-01 | 2019-10-17 | 주식회사 엘지화학 | 광학 필름 마킹 시스템 및 광학 필름 마킹 방법 |
KR102516093B1 (ko) * | 2016-08-23 | 2023-03-30 | 삼성디스플레이 주식회사 | 코팅 방법 |
US10670775B2 (en) * | 2017-06-05 | 2020-06-02 | Wuhan China Star Optoelectronics Technology Co., Ltd | Manufacturing methods of anti-glare covers, anti-glare covers, and display panels |
JP6873255B2 (ja) * | 2017-09-26 | 2021-05-19 | 富士フイルム株式会社 | フィルムの製造方法 |
KR20190125768A (ko) * | 2018-04-30 | 2019-11-07 | 삼성전자주식회사 | 가전제품 및 그 제조방법 |
KR102480805B1 (ko) * | 2018-08-15 | 2022-12-22 | 후지필름 가부시키가이샤 | 적층체의 제조 방법 및 제조 장치 |
CN109612256A (zh) * | 2018-10-24 | 2019-04-12 | 惠州泰纶纺织机械有限公司 | 一种柔道烘干机布料幅宽调节*** |
CN110327056B (zh) * | 2019-05-24 | 2021-01-01 | 武汉大学 | 一种用于可视化血糖检测的智能水凝胶及其制备方法 |
JP7387141B2 (ja) * | 2019-09-24 | 2023-11-28 | 東山フイルム株式会社 | 低カール性反射防止フィルム |
JP7356516B2 (ja) * | 2019-12-02 | 2023-10-04 | 富士フイルム株式会社 | 三次元成形用液晶フィルム、三次元成形体、および、三次元成形体の製造方法 |
FR3140781A1 (fr) * | 2022-10-12 | 2024-04-19 | Arkema France | Procédés de formation de revêtements mats |
CN115508920A (zh) * | 2022-10-20 | 2022-12-23 | 宁波甬安光科新材料科技有限公司 | 用于显示器的抗眩光减反射膜 |
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JP2004170901A (ja) * | 2002-07-05 | 2004-06-17 | Fuji Photo Film Co Ltd | 反射防止フィルム、偏光板およびディスプレイ装置 |
US7138185B2 (en) * | 2002-07-05 | 2006-11-21 | Fuji Photo Film Co., Ltd. | Anti-reflection film, polarizing plate and display device |
TWI266073B (en) * | 2002-08-15 | 2006-11-11 | Fuji Photo Film Co Ltd | Antireflection film, polarizing plate and image display device |
JP4191992B2 (ja) * | 2002-12-27 | 2008-12-03 | 富士フイルム株式会社 | 反射防止フィルム、偏光板、および画像表示装置 |
JP4344638B2 (ja) * | 2004-03-26 | 2009-10-14 | 富士フイルム株式会社 | 反射防止フィルム及びその製造方法、製造装置 |
-
2005
- 2005-08-25 JP JP2005244066A patent/JP4878796B2/ja active Active
- 2005-08-30 WO PCT/JP2005/016193 patent/WO2006028027A1/en active Application Filing
- 2005-08-30 CN CNB200580029833XA patent/CN100460896C/zh active Active
- 2005-08-30 US US11/659,709 patent/US20070247711A1/en not_active Abandoned
- 2005-08-30 KR KR1020077005328A patent/KR101235451B1/ko active IP Right Grant
- 2005-08-31 TW TW094129808A patent/TWI346216B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI748227B (zh) * | 2018-08-23 | 2021-12-01 | 日商日東電工股份有限公司 | 防反射薄膜、防反射薄膜的製造方法、光學構件及影像顯示裝置 |
Also Published As
Publication number | Publication date |
---|---|
CN100460896C (zh) | 2009-02-11 |
KR20080011366A (ko) | 2008-02-04 |
KR101235451B1 (ko) | 2013-02-20 |
WO2006028027A1 (en) | 2006-03-16 |
US20070247711A1 (en) | 2007-10-25 |
TW200624850A (en) | 2006-07-16 |
JP4878796B2 (ja) | 2012-02-15 |
JP2006099081A (ja) | 2006-04-13 |
CN101010603A (zh) | 2007-08-01 |
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Legal Events
Date | Code | Title | Description |
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MM4A | Annulment or lapse of patent due to non-payment of fees |