TWI264592B - Active matrix substrate and display device - Google Patents

Active matrix substrate and display device

Info

Publication number
TWI264592B
TWI264592B TW093138625A TW93138625A TWI264592B TW I264592 B TWI264592 B TW I264592B TW 093138625 A TW093138625 A TW 093138625A TW 93138625 A TW93138625 A TW 93138625A TW I264592 B TWI264592 B TW I264592B
Authority
TW
Taiwan
Prior art keywords
storage capacitor
active matrix
electrode
matrix substrate
signal line
Prior art date
Application number
TW093138625A
Other languages
English (en)
Other versions
TW200528822A (en
Inventor
Toshifumi Yagi
Toshihide Tsubata
Masanori Takeuchi
Yuhko Hisada
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of TW200528822A publication Critical patent/TW200528822A/zh
Application granted granted Critical
Publication of TWI264592B publication Critical patent/TWI264592B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136259—Repairing; Defects
    • G02F1/136263—Line defects

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW093138625A 2004-01-28 2004-12-13 Active matrix substrate and display device TWI264592B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004020488 2004-01-28
JP2004349590A JP4088619B2 (ja) 2004-01-28 2004-12-02 アクティブマトリクス基板及び表示装置

Publications (2)

Publication Number Publication Date
TW200528822A TW200528822A (en) 2005-09-01
TWI264592B true TWI264592B (en) 2006-10-21

Family

ID=34797814

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093138625A TWI264592B (en) 2004-01-28 2004-12-13 Active matrix substrate and display device

Country Status (5)

Country Link
US (3) US7430024B2 (zh)
JP (1) JP4088619B2 (zh)
KR (1) KR100584066B1 (zh)
CN (3) CN101521209B (zh)
TW (1) TWI264592B (zh)

Families Citing this family (99)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4088619B2 (ja) * 2004-01-28 2008-05-21 シャープ株式会社 アクティブマトリクス基板及び表示装置
US7812893B2 (en) * 2004-11-17 2010-10-12 Sharp Kabushiki Kaisha Active matrix substrate where a portion of the storage capacitor wiring or the scanning signal line overlaps with the drain lead-out wiring connected to the drain electrode of a thin film transistor and display device having such an active matrix substrate
JP4484881B2 (ja) * 2004-12-16 2010-06-16 シャープ株式会社 アクティブマトリクス基板、表示装置、液晶表示装置およびテレビジョン装置
KR101133761B1 (ko) 2005-01-26 2012-04-09 삼성전자주식회사 액정 표시 장치
US7768590B2 (en) * 2005-04-26 2010-08-03 Sharp Kabushiki Kaisha Production method of active matrix substrate, active matrix substrate, and liquid crystal display device
WO2006126460A1 (ja) * 2005-05-23 2006-11-30 Sharp Kabushiki Kaisha アクティブマトリクス基板、表示装置および画素欠陥修正方法
KR100796592B1 (ko) * 2005-08-26 2008-01-21 삼성에스디아이 주식회사 박막트랜지스터 및 그 제조 방법
KR20070109192A (ko) * 2006-05-10 2007-11-15 삼성전자주식회사 표시 기판과, 이의 제조 방법 및 이를 구비한 표시 장치
KR20070117079A (ko) * 2006-06-07 2007-12-12 삼성전자주식회사 액정 표시 패널 및 그 제조 방법
EP2042917B1 (en) * 2006-07-07 2011-04-06 Sharp Kabushiki Kaisha Array substrate, method for correcting the same, and liquid crystal display
JP4693131B2 (ja) 2008-02-14 2011-06-01 東芝モバイルディスプレイ株式会社 液晶表示装置
RU2471266C2 (ru) * 2008-06-12 2012-12-27 Шарп Кабушики Каиша Тонкопленочный транзистор, сдвиговый регистр, схема управления шиной сигналов развертки, дисплейное устройство и способ подстройки тонкопленочного транзистора
CN101978504A (zh) * 2008-06-12 2011-02-16 夏普株式会社 Tft、移位寄存器、扫描信号线驱动电路以及显示装置
CN102132204B (zh) * 2008-08-27 2013-06-26 夏普株式会社 有源矩阵基板、液晶面板、液晶显示单元、液晶显示装置、电视接收机以及有源矩阵基板的制造方法
JP5220863B2 (ja) * 2008-08-27 2013-06-26 シャープ株式会社 アクティブマトリクス基板、液晶パネル、液晶表示ユニット、液晶表示装置、テレビジョン受像機
JP5318888B2 (ja) * 2008-12-09 2013-10-16 シャープ株式会社 液晶パネル、液晶表示ユニット、液晶表示装置、テレビジョン受像機
KR101285637B1 (ko) * 2008-12-26 2013-07-12 엘지디스플레이 주식회사 전기영동 표시장치용 어레이 기판과 그 제조 방법 및 리페어 방법
WO2010106801A1 (ja) * 2009-03-18 2010-09-23 パナソニック株式会社 画像表示装置、その製造方法及び修正方法
JP5426562B2 (ja) * 2009-04-07 2014-02-26 パナソニック株式会社 画像表示装置及びその補正方法
JP5771365B2 (ja) * 2009-11-23 2015-08-26 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 中小型液晶表示装置
JP5035931B2 (ja) 2010-03-29 2012-09-26 株式会社ジャパンディスプレイセントラル 液晶表示装置
KR101756489B1 (ko) 2010-05-13 2017-07-26 가부시키가이샤 제이올레드 표시 장치 및 그 제조 방법
JP5380416B2 (ja) 2010-10-20 2014-01-08 株式会社ジャパンディスプレイ 液晶表示装置
US8569139B2 (en) 2010-10-27 2013-10-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing strained source/drain structures
JP5100822B2 (ja) * 2010-12-14 2012-12-19 株式会社ジャパンディスプレイセントラル 液晶表示装置
TWI525614B (zh) * 2011-01-05 2016-03-11 半導體能源研究所股份有限公司 儲存元件、儲存裝置、及信號處理電路
JP5597557B2 (ja) 2011-01-13 2014-10-01 株式会社ジャパンディスプレイ 液晶表示装置
JP5572562B2 (ja) 2011-01-19 2014-08-13 株式会社ジャパンディスプレイ 液晶表示装置
JP5695946B2 (ja) 2011-03-17 2015-04-08 株式会社ジャパンディスプレイ 液晶表示装置
JP5377555B2 (ja) 2011-03-29 2013-12-25 株式会社ジャパンディスプレイ 液晶表示装置
JP5552457B2 (ja) 2011-03-31 2014-07-16 株式会社ジャパンディスプレイ 液晶表示装置
KR101635668B1 (ko) 2011-04-08 2016-07-01 가부시키가이샤 재팬 디스프레이 액정 표시 장치
JP5707488B2 (ja) 2011-04-08 2015-04-30 株式会社ジャパンディスプレイ 液晶表示装置
JP5530971B2 (ja) 2011-04-19 2014-06-25 株式会社ジャパンディスプレイ 液晶表示装置
JP5616841B2 (ja) 2011-04-22 2014-10-29 株式会社ジャパンディスプレイ 液晶表示装置
JP5377567B2 (ja) 2011-04-25 2013-12-25 株式会社ジャパンディスプレイ 液晶表示装置
KR101723255B1 (ko) * 2011-06-27 2017-04-04 가부시키가이샤 제이올레드 표시 장치 및 그 제조 방법
JP5504215B2 (ja) 2011-07-08 2014-05-28 株式会社ジャパンディスプレイ 液晶表示装置
JP5759813B2 (ja) 2011-07-13 2015-08-05 株式会社ジャパンディスプレイ 液晶表示装置
JP5386555B2 (ja) 2011-07-28 2014-01-15 株式会社ジャパンディスプレイ 液晶表示装置
JP5564473B2 (ja) 2011-08-05 2014-07-30 株式会社ジャパンディスプレイ 液晶表示装置
JP5674587B2 (ja) 2011-08-05 2015-02-25 株式会社ジャパンディスプレイ 液晶表示装置
JP5520896B2 (ja) 2011-08-08 2014-06-11 株式会社ジャパンディスプレイ 液晶表示装置
JP5530987B2 (ja) 2011-08-09 2014-06-25 株式会社ジャパンディスプレイ 液晶表示装置
JP5520897B2 (ja) 2011-08-11 2014-06-11 株式会社ジャパンディスプレイ 液晶表示装置
JP5707273B2 (ja) 2011-08-12 2015-04-22 株式会社ジャパンディスプレイ 液晶表示装置
JP5520899B2 (ja) 2011-08-23 2014-06-11 株式会社ジャパンディスプレイ 液晶表示装置
JP5577308B2 (ja) 2011-08-25 2014-08-20 株式会社ジャパンディスプレイ 液晶表示装置
JP5663436B2 (ja) 2011-08-26 2015-02-04 株式会社ジャパンディスプレイ 液晶表示装置
JP5677239B2 (ja) 2011-08-31 2015-02-25 株式会社ジャパンディスプレイ 液晶表示装置および液晶表示装置の製造方法
JP5906043B2 (ja) 2011-09-01 2016-04-20 株式会社ジャパンディスプレイ 液晶表示装置
JP5560247B2 (ja) 2011-09-02 2014-07-23 株式会社ジャパンディスプレイ 液晶表示装置
US9075271B2 (en) 2011-09-06 2015-07-07 Japan Display Inc. Liquid crystal display device
US9250486B2 (en) 2011-09-08 2016-02-02 Japan Display Inc. Liquid crystal display device
JP5785831B2 (ja) 2011-09-12 2015-09-30 株式会社ジャパンディスプレイ 液晶表示装置
JP5926523B2 (ja) 2011-09-16 2016-05-25 株式会社ジャパンディスプレイ 液晶表示装置
US8786534B2 (en) 2011-09-27 2014-07-22 Japan Display Inc. Liquid crystal display device
JP5677923B2 (ja) 2011-09-28 2015-02-25 株式会社ジャパンディスプレイ 液晶表示装置
JP5845035B2 (ja) 2011-09-28 2016-01-20 株式会社ジャパンディスプレイ 液晶表示装置
JP5740278B2 (ja) 2011-10-11 2015-06-24 株式会社ジャパンディスプレイ 液晶表示装置
US9019439B2 (en) 2011-10-14 2015-04-28 Japan Display Inc. Liquid crystal display device
JP5771501B2 (ja) 2011-10-17 2015-09-02 株式会社ジャパンディスプレイ 液晶表示装置
JP6104548B2 (ja) 2011-11-08 2017-03-29 株式会社ジャパンディスプレイ 液晶表示装置
JP5759871B2 (ja) 2011-11-08 2015-08-05 株式会社ジャパンディスプレイ 液晶表示装置
JP5699069B2 (ja) 2011-11-21 2015-04-08 株式会社ジャパンディスプレイ 液晶表示装置
US9052555B2 (en) 2011-12-28 2015-06-09 Japan Display Inc. Liquid crystal display device
JP2013190662A (ja) 2012-03-14 2013-09-26 Japan Display Inc 液晶表示装置
JP2013195686A (ja) 2012-03-19 2013-09-30 Japan Display Inc 液晶表示装置
KR101681820B1 (ko) * 2012-03-21 2016-12-01 샤프 가부시키가이샤 액티브 매트릭스 기판 및 이를 구비한 표시패널
JP5903309B2 (ja) 2012-03-28 2016-04-13 株式会社ジャパンディスプレイ 液晶表示装置
JP6039914B2 (ja) 2012-04-06 2016-12-07 株式会社ジャパンディスプレイ 液晶表示装置
JP6010330B2 (ja) 2012-04-23 2016-10-19 株式会社ジャパンディスプレイ 液晶表示装置
JP5926608B2 (ja) 2012-05-08 2016-05-25 株式会社ジャパンディスプレイ 液晶表示装置及びその製造方法
JP5883721B2 (ja) 2012-05-11 2016-03-15 株式会社ジャパンディスプレイ 液晶表示装置
JP5978001B2 (ja) 2012-05-22 2016-08-24 株式会社ジャパンディスプレイ 液晶表示装置
JP5953120B2 (ja) 2012-05-25 2016-07-20 株式会社ジャパンディスプレイ 液晶表示装置
JP5906138B2 (ja) 2012-05-29 2016-04-20 株式会社ジャパンディスプレイ 液晶表示装置
JP2013250411A (ja) 2012-05-31 2013-12-12 Japan Display Inc 液晶表示装置
JP5941756B2 (ja) 2012-06-06 2016-06-29 株式会社ジャパンディスプレイ 液晶表示装置
JP2014021196A (ja) 2012-07-13 2014-02-03 Japan Display Inc 液晶表示装置
JP2014048652A (ja) 2012-09-04 2014-03-17 Japan Display Inc 液晶表示装置
JP6063710B2 (ja) 2012-10-30 2017-01-18 株式会社ジャパンディスプレイ 液晶表示装置
JP2014112195A (ja) 2012-10-31 2014-06-19 Japan Display Inc 液晶表示装置
KR102009803B1 (ko) * 2012-12-20 2019-08-12 엘지디스플레이 주식회사 유기전계발광 표시소자
JP6093577B2 (ja) 2013-01-15 2017-03-08 株式会社ジャパンディスプレイ 液晶表示装置
JP6093575B2 (ja) 2013-01-15 2017-03-08 株式会社ジャパンディスプレイ 液晶表示装置
JP2014157315A (ja) 2013-02-18 2014-08-28 Japan Display Inc 液晶表示装置
JP2014178490A (ja) 2013-03-14 2014-09-25 Japan Display Inc 液晶表示装置
JP6155099B2 (ja) 2013-05-31 2017-06-28 株式会社ジャパンディスプレイ 液晶表示装置
JP2015014640A (ja) 2013-07-03 2015-01-22 株式会社ジャパンディスプレイ 液晶表示装置
JP2015069013A (ja) 2013-09-30 2015-04-13 株式会社ジャパンディスプレイ 液晶表示装置
JP6369801B2 (ja) * 2014-07-24 2018-08-08 Ｔｉａｎｍａ Ｊａｐａｎ株式会社 液晶表示装置
JP2016057428A (ja) 2014-09-09 2016-04-21 株式会社ジャパンディスプレイ 液晶表示装置
JP2016085308A (ja) 2014-10-24 2016-05-19 株式会社ジャパンディスプレイ 液晶表示装置及び表示装置用基板
JP2016133771A (ja) 2015-01-22 2016-07-25 株式会社ジャパンディスプレイ 液晶表示装置
US9584117B1 (en) * 2016-03-21 2017-02-28 Toyota Motor Engineering & Manufacturing North America, Inc. Hybrid resonant driver for sic MOSFET
CN110491881B (zh) * 2018-05-14 2021-11-09 上海和辉光电股份有限公司 一种阵列基板、显示面板及阵列基板的制备方法
US10712624B2 (en) * 2018-07-24 2020-07-14 Sharp Kabushiki Kaisha Method for producing active matrix substrate and active matrix substrate
GB2576950B (en) * 2018-09-10 2022-03-02 Pragmatic Printing Ltd Electronic circuit and method of manufacture

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US52889A (en) * 1866-02-27 Improvement in device for holding carriage-springs
JPH0750278B2 (ja) 1988-06-01 1995-05-31 松下電器産業株式会社 液晶表示装置
JPH02165125A (ja) * 1988-12-20 1990-06-26 Seiko Epson Corp 表示装置
JP2714650B2 (ja) 1989-12-25 1998-02-16 ホシデン・フィリップス・ディスプレイ株式会社 液晶表示素子
KR940005124B1 (ko) * 1989-10-04 1994-06-11 호시덴 가부시기가이샤 액정표시소자
JPH06208132A (ja) * 1990-03-24 1994-07-26 Sony Corp 液晶表示装置
JPH07119919B2 (ja) * 1991-05-15 1995-12-20 インターナショナル・ビジネス・マシーンズ・コーポレイション 液晶表示装置
JP3098345B2 (ja) * 1992-12-28 2000-10-16 富士通株式会社 薄膜トランジスタマトリクス装置及びその製造方法
JP2668317B2 (ja) 1993-03-22 1997-10-27 セイコーエプソン株式会社 アクティブマトリクスパネル
JPH07270824A (ja) 1994-03-31 1995-10-20 Mitsubishi Electric Corp 液晶表示装置及びその製造方法
US5482082A (en) * 1994-06-22 1996-01-09 Cooper Cameron Corporation Multi-passage fluid coupling and metal seal therefor
KR970011972A (ko) * 1995-08-11 1997-03-29 쯔지 하루오 투과형 액정 표시 장치 및 그 제조 방법
JP2933879B2 (ja) 1995-08-11 1999-08-16 シャープ株式会社 透過型液晶表示装置およびその製造方法
JP3418653B2 (ja) 1995-09-28 2003-06-23 シャープ株式会社 アクティブマトリクス型液晶表示装置
JP3031664B2 (ja) 1996-02-19 2000-04-10 株式会社アドバンスト・ディスプレイ Ｔｆｔアレイ基板およびこれを用いた液晶表示装置
JP3992797B2 (ja) * 1996-09-25 2007-10-17 東芝松下ディスプレイテクノロジー株式会社 液晶表示装置
KR100430773B1 (ko) * 1998-07-14 2004-05-10 가부시끼가이샤 도시바 액티브 매트릭스형 액정표시장치
JP2001330850A (ja) 2000-05-19 2001-11-30 Sharp Corp 液晶表示装置およびその欠陥修正方法
JP3645184B2 (ja) 2000-05-31 2005-05-11 シャープ株式会社 液晶表示装置及びその欠陥修正方法
JP4446577B2 (ja) * 2000-09-06 2010-04-07 エーユー オプトロニクス コーポレイション 表示パネル、表示装置
JP4632522B2 (ja) * 2000-11-30 2011-02-16 Ｎｅｃ液晶テクノロジー株式会社 反射型液晶表示装置の製造方法
US6443851B1 (en) * 2001-03-05 2002-09-03 Raymond A. Liberatore Weight holder attachable to golf club
KR100756251B1 (ko) * 2001-08-27 2007-09-06 엘지.필립스 엘시디 주식회사 액정표시장치용 어레이기판 제조방법
KR100980008B1 (ko) * 2002-01-02 2010-09-03 삼성전자주식회사 배선 구조, 이를 이용하는 박막 트랜지스터 기판 및 그제조 방법
KR20030094452A (ko) * 2002-06-04 2003-12-12 삼성전자주식회사 액정 표시 장치용 박막 트랜지스터 어레이 기판
JP3858880B2 (ja) * 2002-10-31 2006-12-20 セイコーエプソン株式会社 電気光学装置及び電子機器
JP2004318086A (ja) 2003-03-31 2004-11-11 Fujitsu Display Technologies Corp 薄膜トランジスタ基板およびそのリペア方法
JP4088619B2 (ja) * 2004-01-28 2008-05-21 シャープ株式会社 アクティブマトリクス基板及び表示装置
JP4108078B2 (ja) * 2004-01-28 2008-06-25 シャープ株式会社 アクティブマトリクス基板及び表示装置
JP2005252228A (ja) * 2004-02-05 2005-09-15 Sharp Corp 表示装置及びその製造方法

Also Published As

Publication number Publication date
JP4088619B2 (ja) 2008-05-21
CN101964324A (zh) 2011-02-02
KR20050077727A (ko) 2005-08-03
CN1648756A (zh) 2005-08-03
US20080309841A1 (en) 2008-12-18
CN101964324B (zh) 2012-07-25
US7430024B2 (en) 2008-09-30
US20050162893A1 (en) 2005-07-28
JP2005242307A (ja) 2005-09-08
US20110025937A1 (en) 2011-02-03
CN101521209B (zh) 2011-02-09
US7830467B2 (en) 2010-11-09
KR100584066B1 (ko) 2006-05-29
CN101521209A (zh) 2009-09-02
TW200528822A (en) 2005-09-01

Similar Documents

Publication Publication Date Title
TWI264592B (en) Active matrix substrate and display device
CN108196725B (zh) 触控显示基板和触控显示装置
HK1129148A1 (en) Active matrix substrate and liquid crystal display device provided with same
TW200720804A (en) Transistor array panel, liquid crystal display panel, and method of manufacturing liquid crystal display panel
TW200705067A (en) Liquid crystal display apparatus
JP2010122675A (ja) 表示基板及びこれを備える表示装置
JP2007065615A5 (zh)
CN104777933A (zh) 一种阵列基板、触控显示面板及显示装置
JP2004053702A5 (zh)
KR20050042917A (ko) 터치 스크린 기능을 갖는 액정 표시 장치 및 그의 제조 방법
TW200717817A (en) Liquid crystal display device and method for manufacturing the same
TW200725913A (en) Array substrate for liquid crystal display device and manufacturing method thereof
EP1659633A3 (en) Flat panel display and its method of fabrication
JP2014085424A5 (zh)
TW200619794A (en) Thin film transistor array panel with improved connection to test lines
TW200516776A (en) Thin film transistor substrate of a horizontal electric field type LCD and fabricating method thereof
FR2923622B1 (fr) Affichage a cristaux liquides et procede de fabriction de celui-ci
JP2007041571A5 (zh)
TW200736786A (en) Thin film transistor array substrate and electronic ink display device
JP2011075695A5 (zh)
JP2010117399A5 (zh)
KR20100010534A (ko) 표시기판, 이의 제조방법 및 이를 갖는 표시장치
JP2008020791A5 (zh)
TW200639794A (en) Electro-optical device, method of manufacturing electro-optical device, and electronic apparatus
KR20100031817A (ko) 액정 표시 장치

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees