TWD197322S - Target profile for a physical vapor deposition chamber target - Google Patents

Target profile for a physical vapor deposition chamber target

Info

Publication number
TWD197322S
TWD197322S TW107303087F TW107303087F TWD197322S TW D197322 S TWD197322 S TW D197322S TW 107303087 F TW107303087 F TW 107303087F TW 107303087 F TW107303087 F TW 107303087F TW D197322 S TWD197322 S TW D197322S
Authority
TW
Taiwan
Prior art keywords
target
vapor deposition
physical vapor
deposition chamber
profile
Prior art date
Application number
TW107303087F
Other languages
Chinese (zh)
Inventor
Martin Lee Riker
Fuhong Zhang
Zheng Wang
Original Assignee
美商應用材料股份有限公司
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司, Applied Materials Inc filed Critical 美商應用材料股份有限公司
Publication of TWD197322S publication Critical patent/TWD197322S/en

Links

Abstract

【物品用途】;本設計係應用於物理氣相沉積室靶。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。;圖式第8頁，係圖示出沿著第2頁俯視圖中的16-16線的剖面圖。【Item Usage】;This design is used for physical vapor deposition chamber targets. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design. ;Page 8 of the drawing shows a cross-section along line 16-16 in the top view on page 2.

TW107303087F 2017-12-11 2018-06-01 Target profile for a physical vapor deposition chamber target TWD197322S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/629,062 USD868124S1 (en) 2017-12-11 2017-12-11 Target profile for a physical vapor deposition chamber target

Publications (1)

Publication Number Publication Date
TWD197322S true TWD197322S (en) 2019-05-01

Family

ID=67390873

Family Applications (2)

Application Number Title Priority Date Filing Date
TW107303087F TWD197322S (en) 2017-12-11 2018-06-01 Target profile for a physical vapor deposition chamber target
TW107303086F TWD197321S (en) 2017-12-11 2018-06-01 Target profile for a physical vapor deposition chamber target

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW107303086F TWD197321S (en) 2017-12-11 2018-06-01 Target profile for a physical vapor deposition chamber target

Country Status (3)

Country Link
US (2) USD868124S1 (en)
JP (2) JP1637543S (en)
TW (2) TWD197322S (en)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
USD1027120S1 (en) 2020-12-17 2024-05-14 Applied Materials, Inc. Seal for an assembly in a vapor deposition chamber

Also Published As

Publication number Publication date
JP1651698S (en) 2020-01-27
TWD197321S (en) 2019-05-01
USD946638S1 (en) 2022-03-22
JP1637543S (en) 2019-07-29
USD868124S1 (en) 2019-11-26

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