USD616389S1 - Vacuum contact pad - Google Patents

Vacuum contact pad Download PDF

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Publication number
USD616389S1
USD616389S1 US29/335,608 US33560809F USD616389S US D616389 S1 USD616389 S1 US D616389S1 US 33560809 F US33560809 F US 33560809F US D616389 S USD616389 S US D616389S
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US
United States
Prior art keywords
contact pad
vacuum contact
view
vacuum
perspective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/335,608
Inventor
Tamami Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Assigned to EBARA CORPORATION reassignment EBARA CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TAKAHASHI, TAMAMI
Application granted granted Critical
Publication of USD616389S1 publication Critical patent/USD616389S1/en
Anticipated expiration legal-status Critical
Active legal-status Critical Current

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Description

FIG. 1 is a front elevation view of a vacuum contact pad showing our new design, the rear view being a mirror image thereof;
FIG. 2 is a right side elevation view, the left side being a mirror image thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a perspective view thereof;
FIG. 6 is a partial enlarged perspective view thereof; and,
FIG. 7 is a perspective view showing the usable state thereof.
The broken line showing of the environment is for illustrative purposes only and forms no part of the claimed design.

Claims (1)

  1. The ornamental design for a vacuum contact pad, as shown and described.
US29/335,608 2008-10-20 2009-04-17 Vacuum contact pad Active USD616389S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008-026899 2008-10-20
JP2008026899 2008-10-20

Publications (1)

Publication Number Publication Date
USD616389S1 true USD616389S1 (en) 2010-05-25

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Family Applications (1)

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US29/335,608 Active USD616389S1 (en) 2008-10-20 2009-04-17 Vacuum contact pad

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Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD770404S1 (en) * 2015-08-05 2016-11-01 Witricity Corporation Resonator coil
USD790489S1 (en) 2015-07-08 2017-06-27 Ebara Corporation Vacuum contact pad
USD792962S1 (en) * 2014-11-28 2017-07-25 Draingarde Inc. Catch basin cover
USD797690S1 (en) * 2015-03-16 2017-09-19 Nuflare Technology, Inc. Heater for semiconductor manufacturing apparatus
US10208884B2 (en) 2014-01-30 2019-02-19 Draingarde, Inc. Watershed protection device and system
USD859331S1 (en) * 2017-03-31 2019-09-10 Ebara Corporation Vacuum contact pad
USD873782S1 (en) * 2016-05-17 2020-01-28 Electro Scientific Industries, Inc Component carrier plate
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) * 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD921431S1 (en) 2019-04-01 2021-06-08 Veeco Instruments, Inc. Multi-filament heater assembly
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD947802S1 (en) * 2020-05-20 2022-04-05 Applied Materials, Inc. Replaceable substrate carrier interfacing film
USD959393S1 (en) * 2020-09-24 2022-08-02 Kokusai Electric Corporation Ceiling heater for substrate processing apparatus
USD980177S1 (en) * 2020-09-24 2023-03-07 Kokusai Electric Corporation Ceiling heater for substrate processing apparatus
USD980176S1 (en) * 2020-06-02 2023-03-07 Applied Materials, Inc. Substrate processing system carrier
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
US11842917B2 (en) 2019-05-20 2023-12-12 Applied Materials, Inc. Process kit ring adaptor
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1021832S1 (en) * 2020-09-17 2024-04-09 Ebara Corporation Elastic membrane

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10208884B2 (en) 2014-01-30 2019-02-19 Draingarde, Inc. Watershed protection device and system
USD792962S1 (en) * 2014-11-28 2017-07-25 Draingarde Inc. Catch basin cover
USD797690S1 (en) * 2015-03-16 2017-09-19 Nuflare Technology, Inc. Heater for semiconductor manufacturing apparatus
USD790489S1 (en) 2015-07-08 2017-06-27 Ebara Corporation Vacuum contact pad
USD770404S1 (en) * 2015-08-05 2016-11-01 Witricity Corporation Resonator coil
USD873782S1 (en) * 2016-05-17 2020-01-28 Electro Scientific Industries, Inc Component carrier plate
USD859331S1 (en) * 2017-03-31 2019-09-10 Ebara Corporation Vacuum contact pad
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) * 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD933725S1 (en) 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD921431S1 (en) 2019-04-01 2021-06-08 Veeco Instruments, Inc. Multi-filament heater assembly
US11842917B2 (en) 2019-05-20 2023-12-12 Applied Materials, Inc. Process kit ring adaptor
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD947802S1 (en) * 2020-05-20 2022-04-05 Applied Materials, Inc. Replaceable substrate carrier interfacing film
USD980176S1 (en) * 2020-06-02 2023-03-07 Applied Materials, Inc. Substrate processing system carrier
USD1021832S1 (en) * 2020-09-17 2024-04-09 Ebara Corporation Elastic membrane
USD959393S1 (en) * 2020-09-24 2022-08-02 Kokusai Electric Corporation Ceiling heater for substrate processing apparatus
USD980177S1 (en) * 2020-09-24 2023-03-07 Kokusai Electric Corporation Ceiling heater for substrate processing apparatus
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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