USD572733S1 - Top panel for microwave introduction window of a plasma processing apparatus - Google Patents

Top panel for microwave introduction window of a plasma processing apparatus Download PDF

Info

Publication number
USD572733S1
USD572733S1 US29/252,838 US25283806F USD572733S US D572733 S1 USD572733 S1 US D572733S1 US 25283806 F US25283806 F US 25283806F US D572733 S USD572733 S US D572733S
Authority
US
United States
Prior art keywords
processing apparatus
plasma processing
top panel
microwave introduction
introduction window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/252,838
Inventor
Kinya Ota
Cai zhong Tian
Junichi Kitagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KITAGAWA, JUNICHI, OTA, KINYA, TIAN, CAI ZHONG
Application granted granted Critical
Publication of USD572733S1 publication Critical patent/USD572733S1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Description

FIG. 1 is a front view of a top panel for microwave introduction window of a plasma processing apparatus showing our new design;
FIG. 2 is a rear view thereof;
FIG. 3 is a right side view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a sectional view taken along line 77 of FIG. 5;
FIG. 8 is an enlarged view taken along line 88 of FIG. 7;
FIG. 9 is an enlarged view taken along line 99 of FIG. 7; and,
FIG. 10 is a perspective view thereof.

Claims (1)

  1. The ornamental design for a top panel for microwave introduction window of a plasma processing apparatus, as shown and described.
US29/252,838 2005-07-29 2006-01-30 Top panel for microwave introduction window of a plasma processing apparatus Expired - Lifetime USD572733S1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005022106 2005-07-29

Publications (1)

Publication Number Publication Date
USD572733S1 true USD572733S1 (en) 2008-07-08

Family

ID=39590009

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/252,838 Expired - Lifetime USD572733S1 (en) 2005-07-29 2006-01-30 Top panel for microwave introduction window of a plasma processing apparatus

Country Status (1)

Country Link
US (1) USD572733S1 (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD732094S1 (en) * 2012-07-20 2015-06-16 Ivoclar Vivadent Ag Firing plate for a dental furnace
USD826300S1 (en) * 2016-09-30 2018-08-21 Oerlikon Metco Ag, Wohlen Rotably mounted thermal plasma burner for thermalspraying
USD851144S1 (en) * 2017-12-04 2019-06-11 Liqua-Tech Corporation Register gear adapter plate
USD851693S1 (en) * 2017-12-04 2019-06-18 Liqua-Tech Corporation Register gear adapter plate
USD862539S1 (en) * 2017-12-04 2019-10-08 Liqua-Tech Corporation Register gear adapter plate
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD908429S1 (en) * 2019-10-24 2021-01-26 Toshikazu Tsukii Double turning trays with rotatable propeller
USD939276S1 (en) * 2020-08-06 2021-12-28 Youcopia Products, Inc. Turntable
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD951710S1 (en) * 2021-07-06 2022-05-17 Guangzhou Mianmianyu Electronic Commerce Co., Ltd. Wooden turntable
USD955816S1 (en) * 2020-08-07 2022-06-28 Ayoluwa Nurse Umbrella table lazy Susan
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD970963S1 (en) * 2022-06-17 2022-11-29 Shenzhen Yihong Technology Co., Ltd Rotatable tray
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD732094S1 (en) * 2012-07-20 2015-06-16 Ivoclar Vivadent Ag Firing plate for a dental furnace
USD826300S1 (en) * 2016-09-30 2018-08-21 Oerlikon Metco Ag, Wohlen Rotably mounted thermal plasma burner for thermalspraying
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD851144S1 (en) * 2017-12-04 2019-06-11 Liqua-Tech Corporation Register gear adapter plate
USD851693S1 (en) * 2017-12-04 2019-06-18 Liqua-Tech Corporation Register gear adapter plate
USD862539S1 (en) * 2017-12-04 2019-10-08 Liqua-Tech Corporation Register gear adapter plate
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD908429S1 (en) * 2019-10-24 2021-01-26 Toshikazu Tsukii Double turning trays with rotatable propeller
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD939276S1 (en) * 2020-08-06 2021-12-28 Youcopia Products, Inc. Turntable
USD955816S1 (en) * 2020-08-07 2022-06-28 Ayoluwa Nurse Umbrella table lazy Susan
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD951710S1 (en) * 2021-07-06 2022-05-17 Guangzhou Mianmianyu Electronic Commerce Co., Ltd. Wooden turntable
USD970963S1 (en) * 2022-06-17 2022-11-29 Shenzhen Yihong Technology Co., Ltd Rotatable tray

Similar Documents

Publication Publication Date Title
USD571831S1 (en) Top panel for microwave introduction window of a plasma processing apparatus
USD593585S1 (en) Top panel for microwave introduction window of a plasma processing apparatus
USD571383S1 (en) Top panel for microwave introduction window of a plasma processing apparatus
USD571833S1 (en) Top panel for microwave introduction window of plasma processing apparatus
USD572733S1 (en) Top panel for microwave introduction window of a plasma processing apparatus
USD571832S1 (en) Top panel for microwave introduction window of a plasma processing apparatus
USD556704S1 (en) Grounded electrode for a plasma processing apparatus
USD557226S1 (en) Electrode cover for a plasma processing apparatus
USD583395S1 (en) Cover for a heater stage of a plasma processing apparatus
USD540105S1 (en) Microwave oven
USD582949S1 (en) Cover for a heater stage of a plasma processing apparatus
USD532645S1 (en) Microwave oven
USD566912S1 (en) Vacuum system
USD557425S1 (en) Cover ring for a plasma processing apparatus
USD539595S1 (en) Microwave oven
USD549544S1 (en) Cabinet handle
USD548657S1 (en) Window sunshade
USD553263S1 (en) Panel
USD558108S1 (en) Vehicle window screen
USD544103S1 (en) Blood or plasma treatment apparatus
USD560607S1 (en) Inverter
USD543641S1 (en) Door facing
USD549837S1 (en) Enclosure
USD583394S1 (en) Cover for a heater stage of a plasma processing apparatus
USD547518S1 (en) Cart