USD570310S1 - Attracting plate of an electrostatic chuck for semiconductor manufacturing - Google Patents

Attracting plate of an electrostatic chuck for semiconductor manufacturing Download PDF

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Publication number
USD570310S1
USD570310S1 US29/276,679 US27667907F USD570310S US D570310 S1 USD570310 S1 US D570310S1 US 27667907 F US27667907 F US 27667907F US D570310 S USD570310 S US D570310S
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US
United States
Prior art keywords
semiconductor manufacturing
electrostatic chuck
attracting plate
attracting
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/276,679
Inventor
Yasuharu Sasaki
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SASAKI, YASUHARU
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FIG. 1 is a front elevational view of an attracting plate of an electrostatic chuck for semiconductor manufacturing, or the like, showing my new design;
FIG. 2 is a rear elevational view thereof;
FIG. 3 is a top plan view thereof, the bottom plan view being a mirror image of the plan view shown;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof; and,
FIG. 6 is a bottom, rear and lower perspective view thereof.
The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design.

Claims (1)

  1. The ornamental design for an attracting plate of an electrostatic chuck for semiconductor manufacturing, as shown and described.
US29/276,679 2006-08-01 2007-02-01 Attracting plate of an electrostatic chuck for semiconductor manufacturing Expired - Lifetime USD570310S1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006020298 2006-08-01

Publications (1)

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USD570310S1 true USD570310S1 (en) 2008-06-03

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Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD668211S1 (en) * 2010-09-10 2012-10-02 Novellus Systems, Inc. Segmented electroplating anode and anode segment
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD877079S1 (en) * 2015-08-26 2020-03-03 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD913256S1 (en) * 2019-07-31 2021-03-16 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD926716S1 (en) * 2019-07-31 2021-08-03 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD668211S1 (en) * 2010-09-10 2012-10-02 Novellus Systems, Inc. Segmented electroplating anode and anode segment
USD734377S1 (en) * 2013-03-28 2015-07-14 Hirata Corporation Top cover of a load lock chamber
USD877079S1 (en) * 2015-08-26 2020-03-03 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD894137S1 (en) 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD926716S1 (en) * 2019-07-31 2021-08-03 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD913256S1 (en) * 2019-07-31 2021-03-16 Eryn Smith Antenna pattern for a semiconductive substrate carrier
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus

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