USD570310S1 - Attracting plate of an electrostatic chuck for semiconductor manufacturing - Google Patents
Attracting plate of an electrostatic chuck for semiconductor manufacturing Download PDFInfo
- Publication number
- USD570310S1 USD570310S1 US29/276,679 US27667907F USD570310S US D570310 S1 USD570310 S1 US D570310S1 US 27667907 F US27667907 F US 27667907F US D570310 S USD570310 S US D570310S
- Authority
- US
- United States
- Prior art keywords
- semiconductor manufacturing
- electrostatic chuck
- attracting plate
- attracting
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design.
Claims (1)
- The ornamental design for an attracting plate of an electrostatic chuck for semiconductor manufacturing, as shown and described.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006020298 | 2006-08-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD570310S1 true USD570310S1 (en) | 2008-06-03 |
Family
ID=39466908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/276,679 Expired - Lifetime USD570310S1 (en) | 2006-08-01 | 2007-02-01 | Attracting plate of an electrostatic chuck for semiconductor manufacturing |
Country Status (1)
Country | Link |
---|---|
US (1) | USD570310S1 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD668211S1 (en) * | 2010-09-10 | 2012-10-02 | Novellus Systems, Inc. | Segmented electroplating anode and anode segment |
USD734377S1 (en) * | 2013-03-28 | 2015-07-14 | Hirata Corporation | Top cover of a load lock chamber |
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD877079S1 (en) * | 2015-08-26 | 2020-03-03 | Tokyo Electron Limited | Electrode plate for plasma processing apparatus |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD913256S1 (en) * | 2019-07-31 | 2021-03-16 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD926716S1 (en) * | 2019-07-31 | 2021-08-03 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD980813S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD980814S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
-
2007
- 2007-02-01 US US29/276,679 patent/USD570310S1/en not_active Expired - Lifetime
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD668211S1 (en) * | 2010-09-10 | 2012-10-02 | Novellus Systems, Inc. | Segmented electroplating anode and anode segment |
USD734377S1 (en) * | 2013-03-28 | 2015-07-14 | Hirata Corporation | Top cover of a load lock chamber |
USD877079S1 (en) * | 2015-08-26 | 2020-03-03 | Tokyo Electron Limited | Electrode plate for plasma processing apparatus |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD926716S1 (en) * | 2019-07-31 | 2021-08-03 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD913256S1 (en) * | 2019-07-31 | 2021-03-16 | Eryn Smith | Antenna pattern for a semiconductive substrate carrier |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD980813S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD980814S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
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