TW202414115A - Transfer method for uv optical film and manufacturing method of transferring roller by using deep uv light - Google Patents
Transfer method for uv optical film and manufacturing method of transferring roller by using deep uv light Download PDFInfo
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- 238000012546 transfer Methods 0.000 title claims abstract description 127
- 239000012788 optical film Substances 0.000 title claims abstract description 50
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 39
- 238000000034 method Methods 0.000 title claims abstract description 39
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 150000002222 fluorine compounds Chemical class 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 8
- 238000005096 rolling process Methods 0.000 claims description 7
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 3
- -1 polytetrafluoroethylene Polymers 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 66
- 238000001723 curing Methods 0.000 description 45
- 238000010586 diagram Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 8
- 238000000059 patterning Methods 0.000 description 8
- 238000003848 UV Light-Curing Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
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Abstract
Description
本發明涉及一種轉印滾輪，尤其涉及一種紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法。The present invention relates to a transfer roller, and more particularly to an ultraviolet optical film transfer method and a transfer roller manufacturing method using deep ultraviolet rays.
如果現有轉印滾輪的轉印層採用紫外線曝光材質時，其所欲滾壓轉印的光學膜則需要避免採用紫外線固化材質，據以避免所述轉印層於滾壓所述光學膜固化時受到損傷而使其轉印圖案失真。於是，本發明人認為上述缺陷可改善，乃特潛心研究並配合科學原理的運用，終於提出一種設計合理且有效改善上述缺陷的本發明。If the transfer layer of the existing transfer roller is made of UV-exposing material, the optical film to be rolled and transferred should avoid using UV-curing material, so as to avoid the transfer layer being damaged when the optical film is rolled and cured, thereby distorting the transfer pattern. Therefore, the inventor believes that the above defects can be improved, and has devoted himself to research and applied scientific principles, and finally proposed a reasonable design and effective improvement of the above defects.
本發明實施例在於提供一種紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法，其能有效地改善現有轉印滾輪所可能產生的缺陷。The present invention provides an ultraviolet optical film transfer method and a deep ultraviolet transfer roller manufacturing method, which can effectively improve the defects that may be produced by the existing transfer roller.
本發明實施例公開一種紫外線光學膜轉印方法，其包括：實施一滾輪製造步驟：製造一轉印滾輪且其製造過程包含：於一金屬滾筒的外表面塗佈有一光阻層；以具有一預設曝光波長的一深紫外線（deep ultraviolet，DUV）通過光罩或干涉而形成一預定光形，進而照射在所述光阻層，以使所述光阻層構成一圖案轉印層；其中，所述圖案轉印層與所述金屬滾筒共同構成所述轉印滾輪；實施一轉印步驟：以所述轉印滾輪不間斷地滾壓於一紫外線光學膜上；其中，所述紫外線光學膜能被波長落在一預設光固化波段之內的紫外線所照射固化，並且所述深紫外線的所述預設曝光波長是落在所述預設光固化波段之外，並且所述預設曝光波長相較於所述預設光固化波段至少小於100奈米；以及實施一固化步驟：以波長落在所述預設光固化波段之內的一固化紫外線來照射並固化被所述轉印滾輪所滾壓後的所述紫外線光學膜。The present invention discloses a method for transferring ultraviolet optical film, which comprises: implementing a roller manufacturing step: manufacturing a transfer roller, and the manufacturing process thereof comprises: coating a photoresist layer on the outer surface of a metal roller; using a deep ultraviolet (DUV) with a preset exposure wavelength to form a predetermined light shape through a mask or interference, and then irradiating the photoresist layer, so that the photoresist layer constitutes a pattern transfer layer; wherein the pattern transfer layer and the metal roller together constitute the transfer roller; implementing a transfer step: continuously rolling the transfer roller on an ultraviolet optical film; wherein the ultraviolet optical film can be exposed to the light having a wavelength falling within a preset light pattern. The method comprises the steps of: curing the film by irradiating and curing the film with ultraviolet light within the curing band, wherein the preset exposure wavelength of the deep ultraviolet light is outside the preset light curing band, and the preset exposure wavelength is at least 100 nanometers smaller than the preset light curing band; and implementing a curing step: irradiating and curing the ultraviolet optical film after being rolled by the transfer roller with a curing ultraviolet light having a wavelength within the preset light curing band.
本發明實施例也公開一種採深紫外線之轉印滾輪製造方法，其包括：於一金屬滾筒的外表面塗佈有一光阻層；以具有一預設曝光波長的一深紫外線通過光罩或干涉而形成一預定光形，進而照射在所述光阻層，以使所述光阻層構成一圖案轉印層；其中，所述預設曝光波長介於190奈米～250奈米；以及於所述圖案轉印層的外表面上形成有一氟化合物層；其中，所述氟化合物層、所述圖案轉印層、及所述金屬滾筒共同構成所述轉印滾輪。The present invention also discloses a method for manufacturing a transfer roller using deep ultraviolet rays, which includes: coating a photoresist layer on the outer surface of a metal roller; using a deep ultraviolet ray with a preset exposure wavelength to form a predetermined light shape through a photomask or interference, and then irradiating the photoresist layer so that the photoresist layer constitutes a pattern transfer layer; wherein the preset exposure wavelength is between 190 nanometers and 250 nanometers; and forming a fluorine compound layer on the outer surface of the pattern transfer layer; wherein the fluorine compound layer, the pattern transfer layer, and the metal roller together constitute the transfer roller.
綜上所述，本發明實施例所公開的紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法，其通過特定條件的限制（如：所述預設曝光波長相較於所述預設光固化波段至少小於100奈米），以使得所述圖案轉印層可採用紫外線曝光材質，所述轉印滾輪所滾壓的光學膜可以採用紫外線固化材質，並且所述圖案轉印層較不會受到所述固化紫外線的影響而受損，據以有效地維持所述轉印滾輪的滾壓成形精度。In summary, the UV optical film transfer method and the transfer roller manufacturing method using deep UV light disclosed in the embodiments of the present invention are limited by specific conditions (e.g., the preset exposure wavelength is at least 100 nanometers less than the preset light curing wavelength band) so that the pattern transfer layer can be made of UV exposure material, the optical film rolled by the transfer roller can be made of UV curing material, and the pattern transfer layer is less likely to be damaged by the curing UV light, thereby effectively maintaining the rolling forming accuracy of the transfer roller.
此外，本發明實施例所公開的紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法，其還可通過形成有所述氟化合物層，以使得所述氟化合物層在滾壓所述紫外線光學膜之後，可以有效地使兩者之間高壓接觸的成形表面彼此分離、且較不會有相互影響或導致外型損毀的可能。In addition, the UV optical film transfer method and the transfer roller manufacturing method using deep ultraviolet light disclosed in the embodiments of the present invention can also form the fluorine compound layer so that after the fluorine compound layer is rolled on the UV optical film, the high-pressure contact forming surfaces between the two can be effectively separated from each other, and there is less possibility of mutual influence or damage to the appearance.
為能更進一步瞭解本發明的特徵及技術內容，請參閱以下有關本發明的詳細說明與附圖，但是此等說明與附圖僅用來說明本發明，而非對本發明的保護範圍作任何的限制。To further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, such description and drawings are only used to illustrate the present invention and do not limit the protection scope of the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關“紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法”的實施方式，本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用，本說明書中的各項細節也可基於不同觀點與應用，在不悖離本發明的構思下進行各種修改與變更。另外，本發明的附圖僅為簡單示意說明，並非依實際尺寸的描繪，事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容，但所公開的內容並非用以限制本發明的保護範圍。The following is an explanation of the implementation of the "ultraviolet optical film transfer method and transfer roller manufacturing method using deep ultraviolet light" disclosed in the present invention through specific concrete embodiments. Technical personnel in this field can understand the advantages and effects of the present invention from the contents disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed in various ways based on different viewpoints and applications without deviating from the concept of the present invention. In addition, the drawings of the present invention are only for simple schematic illustrations and are not depicted according to actual sizes. Please note in advance. The following implementation will further explain the relevant technical contents of the present invention in detail, but the disclosed contents are not intended to limit the scope of protection of the present invention.
應當可以理解的是，雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號，但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件，或者一信號與另一信號。另外，本文中所使用的術語“或”，應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that, although the terms "first", "second", "third", etc. may be used in this document to describe various components or signals, these components or signals should not be limited by these terms. These terms are mainly used to distinguish one component from another component, or one signal from another signal. In addition, the term "or" used in this document may include any one or more combinations of the related listed items depending on the actual situation.
[實施例一][Example 1]
請參閱圖1至圖6所示，其為本發明的實施例一。本實施例公開一種紫外線光學膜轉印方法，其依序包含有：一滾輪製造步驟S100、一轉印步驟S200、及一固化步驟S300，但本發明不以此為限。舉例來說，所述紫外線光學膜轉印方法也可以依據設計需求而增加相應的其他步驟。Please refer to FIG. 1 to FIG. 6, which are the first embodiment of the present invention. This embodiment discloses a UV optical film transfer method, which sequentially includes: a roller manufacturing step S100, a transfer step S200, and a curing step S300, but the present invention is not limited thereto. For example, the UV optical film transfer method can also add other corresponding steps according to design requirements.
需額外說明的是，所述滾輪製造步驟S100於本實施例中是以搭配於所述轉印步驟S200及所述固化步驟S300來說明，但本發明不受限於此。舉例來說，在本發明未繪示的其他實施例中，所述滾輪製造步驟S100可以視為一種採深紫外線之轉印滾輪製造方法，進而被單獨地實施或是搭配其他步驟來實施。以下接著介紹所述紫外線光學膜轉印方法的各個步驟S100～S300。It should be noted that the roller manufacturing step S100 is described in this embodiment in combination with the transfer step S200 and the curing step S300, but the present invention is not limited thereto. For example, in other embodiments not shown in the present invention, the roller manufacturing step S100 can be regarded as a transfer roller manufacturing method using deep ultraviolet light, and then implemented alone or in combination with other steps. The following is an introduction to each step S100 to S300 of the ultraviolet optical film transfer method.
所述滾輪製造步驟S100：如圖1至圖5所示，製造一轉印滾輪100（如：圖6）且其製造過程依序包含有一塗佈流程S110及一圖案化流程S120。需說明的是，所述滾輪製造步驟S100是通過實施上述多個流程S110、S120而達成，據以使所述滾輪製造步驟S100之中可以未採用任何鎳金屬材質，進而實現顯著降低製造成本的效果。也就是說，採用鎳金屬的任何滾輪製造步驟皆非本實施例所指的所述滾輪製造步驟S100（或所述採深紫外線之轉印滾輪製造方法）。The roller manufacturing step S100: As shown in FIG. 1 to FIG. 5 , a transfer roller 100 (such as FIG. 6 ) is manufactured and its manufacturing process sequentially includes a coating process S110 and a patterning process S120. It should be noted that the roller manufacturing step S100 is achieved by implementing the above-mentioned multiple processes S110 and S120, so that no nickel metal material is used in the roller manufacturing step S100, thereby achieving the effect of significantly reducing the manufacturing cost. In other words, any roller manufacturing step using nickel metal is not the roller manufacturing step S100 (or the transfer roller manufacturing method using deep ultraviolet rays) referred to in this embodiment.
所述塗佈流程S110：如圖1和圖2所示，於一金屬滾筒1的外表面塗佈有一光阻層2a。其中，所述金屬滾筒1是一鉻金屬滾筒或一銅金屬滾筒，並且所述金屬滾筒1的長度較佳是大於1.5公尺（m），而所述光阻層2a是採用正光阻劑，其能在經過曝光後，使得受到光照的部分將在顯影時溶解，而顯影後留下的是未受到曝光部分的圖案。The coating process S110: As shown in FIG. 1 and FIG. 2, a
再者，所述光阻層2a於本實施例中是覆蓋於所述金屬滾筒1的整個所述外表面，以形成無縫隙構造；也就是說，在垂直所述金屬滾筒1長度方向的任一個橫截面上，所述光阻層2a是呈圓形且無間隙地覆蓋於所述金屬滾筒1的整個所述外表面。Furthermore, the
所述圖案化流程S120：如圖1和圖3至圖5所示，以具有一預設曝光波長的一深紫外線L1（deep ultraviolet，DUV）通過光罩M或干涉而形成一預定光形，進而使其照射在所述光阻層2a，以使所述光阻層2a構成一圖案轉印層2。於本實施例中，所述圖案轉印層2與所述金屬滾筒1共同構成所述轉印滾輪100，並且所述深紫外線L1所具有的所述預設曝光波長較佳是可以介於190奈米（nm）～250奈米。The patterning process S120: As shown in FIG. 1 and FIG. 3 to FIG. 5, a deep ultraviolet (DUV) L1 having a preset exposure wavelength is formed into a predetermined light shape through a mask M or interference, and then irradiated on the
再者，用來發出所述深紫外線L1的一曝光光源S1可以是能夠發出介於190奈米～250奈米的至少一個雷射二極體晶片，但該種類可依設計需求而加以調整變化，本發明不以此為限。所述光罩M可以是具備有漸層式分佈的灰階值，據以利於所述深紫外線L1穿過而形成所述預定光形。Furthermore, an exposure light source S1 for emitting the deep ultraviolet light L1 may be at least one laser diode chip capable of emitting light between 190 nm and 250 nm, but the type may be adjusted and varied according to design requirements, and the present invention is not limited thereto. The mask M may have a gradient grayscale value, so as to facilitate the deep ultraviolet light L1 to pass through and form the predetermined light shape.
進一步地說，如圖3所示，所述曝光光源S1與所述光罩M的曝光範圍於本實施例中可以是對應於所述金屬滾筒1的局部長度範圍，以使得所述曝光光源S1與所述光罩M能夠在所述金屬滾筒1自轉時，自所述金屬滾筒1的一端移動至另一端來進行曝光作業。Furthermore, as shown in FIG. 3 , the exposure range of the exposure light source S1 and the photomask M in this embodiment may correspond to a local length range of the metal drum 1, so that the exposure light source S1 and the photomask M can move from one end of the metal drum 1 to the other end to perform the exposure operation when the metal drum 1 rotates.
或者，如圖4所示，所述曝光光源S1與所述光罩M的曝光範圍於本實施例中也可以是對應於所述金屬滾筒1的整個長度範圍，以使得所述曝光光源S1與所述光罩M能夠在所述金屬滾筒1自轉時，保持不動即可進行曝光作業。Alternatively, as shown in FIG. 4 , the exposure range of the exposure light source S1 and the photomask M in this embodiment may also correspond to the entire length range of the metal drum 1 , so that the exposure light source S1 and the photomask M can remain stationary while the metal drum 1 rotates to perform the exposure operation.
所述轉印步驟S200：如圖1和圖6所示，以所述轉印滾輪100（如：所述圖案轉印層2）不間斷地滾壓於一紫外線光學膜200上。其中，所述紫外線光學膜200的選用須符合下述特性：能被波長落在一預設光固化波段之內的紫外線所照射固化，並且所述深紫外線L1的所述預設曝光波長是落在所述預設光固化波段之外，並且所述預設曝光波長相較於所述預設光固化波段至少小於100奈米。於本實施例中，所述預設光固化波段較佳是介於350奈米～410奈米，但本發明不受限於此。The transfer step S200: As shown in FIG. 1 and FIG. 6 , the transfer roller 100 (e.g., the pattern transfer layer 2) is continuously rolled and pressed on a UV optical film 200. The UV optical film 200 must meet the following characteristics: it can be cured by UV light with a wavelength falling within a preset light curing band, and the preset exposure wavelength of the deep UV light L1 falls outside the preset light curing band, and the preset exposure wavelength is at least 100 nanometers less than the preset light curing band. In this embodiment, the preset light curing band is preferably between 350 nanometers and 410 nanometers, but the present invention is not limited thereto.
所述固化步驟S300：如圖1和圖6所示，以波長落在所述預設光固化波段之內的一固化紫外線L2來照射並固化被所述轉印滾輪100所滾壓後的所述紫外線光學膜200。其中，用來發出所述固化紫外線L2的一固化光源S2可以是能夠發出介於350奈米～410奈米的至少一個發光二極體晶片，並且至少一個所述發光二極體晶片的種類包含有雷射二極體晶片，但該種類可依設計需求而加以調整變化，本發明不以此為限。The curing step S300: As shown in FIG. 1 and FIG. 6, a curing ultraviolet ray L2 having a wavelength falling within the preset light curing wavelength band is used to irradiate and cure the ultraviolet optical film 200 rolled by the transfer roller 100. Among them, a curing light source S2 for emitting the curing ultraviolet ray L2 can be at least one light emitting diode chip capable of emitting light between 350 nanometers and 410 nanometers, and the type of at least one of the light emitting diode chips includes a laser diode chip, but the type can be adjusted and changed according to design requirements, and the present invention is not limited thereto.
依上所述，本實施例所公開的所述紫外線光學膜轉印方法，其通過特定條件的限制（如：所述預設曝光波長相較於所述預設光固化波段至少小於100奈米），以使得所述圖案轉印層2可採用紫外線曝光材質，所述轉印滾輪100所滾壓的光學膜可以採用紫外線固化材質，並且所述圖案轉印層2較不會受到所述固化紫外線L2的影響而受損，據以有效地維持所述轉印滾輪100的滾壓成形精度。As described above, the UV optical film transfer method disclosed in this embodiment is limited by specific conditions (such as: the preset exposure wavelength is at least 100 nanometers less than the preset light curing wavelength band) so that the pattern transfer layer 2 can be made of UV exposure material, the optical film rolled by the transfer roller 100 can be made of UV curing material, and the pattern transfer layer 2 is less likely to be damaged by the curing ultraviolet light L2, thereby effectively maintaining the rolling forming accuracy of the transfer roller 100.
[實施例二][Example 2]
請參閱圖7至圖9所示，其為本發明的實施例二。由於本實施例類似於上述實施例一，所以兩個實施例的相同處不再加以贅述，而本實施例相較於上述實施例一的差異大致說明如下：Please refer to FIG. 7 to FIG. 9 , which are the second embodiment of the present invention. Since this embodiment is similar to the first embodiment, the similarities between the two embodiments will not be described in detail, and the differences between this embodiment and the first embodiment are roughly described as follows:
於本實施例之中，所述滾輪製造步驟於所述圖案化流程之後，進一步包含有一成形步驟，也就是：於所述圖案轉印層2的外表面21上形成有一氟化合物層3，據以使所述氟化合物層3、所述圖案轉印層2、及所述金屬滾筒1能夠共同構成所述轉印滾輪100。此外，所述氟化合物層3是通過蒸鍍（evaporation）而完整覆蓋於所述圖案轉印層2的所述外表面21上，但本發明不受限於此。In this embodiment, the roller manufacturing step further includes a forming step after the patterning process, that is, forming a fluorine compound layer 3 on the outer surface 21 of the pattern transfer layer 2, so that the fluorine compound layer 3, the pattern transfer layer 2, and the metal roller 1 can together constitute the transfer roller 100. In addition, the fluorine compound layer 3 is completely covered on the outer surface 21 of the pattern transfer layer 2 by evaporation, but the present invention is not limited thereto.
需額外說明的是，非為氟化合物所構成的任何塗層（尤其是金屬層）皆不同於本實施例所指的所述氟化合物層3。進一步地說，所述氟化合物層3於本實施例中較佳是限定為一聚四氟乙烯（polytetrafluoroethene，PTFE）層，但本發明不以此為限。It should be noted that any coating layer (especially a metal layer) not made of a fluorine compound is different from the fluorine compound layer 3 referred to in this embodiment. Furthermore, the fluorine compound layer 3 in this embodiment is preferably limited to a polytetrafluoroethylene (PTFE) layer, but the present invention is not limited thereto.
據此，通過所述紫外線光學膜200的特性選用，由所述氟化合物層3在滾壓所述紫外線光學膜200之後，可以有效地使兩者之間高壓接觸的成形表面彼此分離、且較不會有相互影響或導致外型損毀的可能。換個角度來說，所述氟化合物層3與所述紫外線光學膜200的選用有其相互搭配的關係存在。Accordingly, by selecting the characteristics of the UV optical film 200, after the fluorine compound layer 3 is rolled on the UV optical film 200, the high-pressure contacting molding surfaces between the two can be effectively separated from each other, and there is less possibility of mutual influence or damage to the appearance. In other words, the selection of the fluorine compound layer 3 and the UV optical film 200 has a mutually matching relationship.
於本實施例中，照射於所述轉印滾輪100的所述固化紫外線L2能被所述氟化合物層3反射至少70%，藉以有效地避免所述圖案轉印層2受到所述固化紫外線L2照射而產生損傷或裂解。In this embodiment, the curing ultraviolet light L2 irradiated on the transfer roller 100 can be reflected by the fluorine compound layer 3 by at least 70%, thereby effectively preventing the pattern transfer layer 2 from being damaged or decomposed by the curing ultraviolet light L2.
更進一步地說，如果所述轉印滾輪100在受到所述固化紫外線L2的（長時間）照射時，還是有可能使所述圖案轉印層2的所述外表面21產生裂痕22。其中，形成有所述裂痕22的所述外表面21於本實施例中可以通過所述氟化合物層3而維持其形狀不變；也就是說，所述氟化合物層3能夠有效地接合位在所述裂痕22旁的所述圖案轉印層2區塊，以使所述氟化合物層3還是呈現預定外型，據以避免所述氟化合物層3於滾壓所述紫外線光學膜200時產生失真。Furthermore, if the transfer roller 100 is exposed to the curing ultraviolet light L2 (for a long time), cracks 22 may still be generated on the outer surface 21 of the pattern transfer layer 2. In this embodiment, the outer surface 21 formed with the cracks 22 can maintain its shape unchanged by the fluorine compound layer 3; that is, the fluorine compound layer 3 can effectively bond with the pattern transfer layer 2 block located next to the cracks 22, so that the fluorine compound layer 3 still presents a predetermined appearance, thereby avoiding distortion of the fluorine compound layer 3 when rolling the ultraviolet optical film 200.
依上所述，有鑑於所述氟化合物層3不但能夠避免所述圖案轉印層2受到所述固化紫外線L2照射而產生損傷，並且縱使所述圖案轉印層2受到所述固化紫外線L2照射而產生裂痕22，所述氟化合物層3還是能維持預定外型而避免轉印圖案失真。As described above, in view of the fact that the fluorine compound layer 3 can not only prevent the pattern transfer layer 2 from being damaged by the curing ultraviolet light L2, but also maintain the predetermined shape to prevent the transfer pattern from being distorted even if the pattern transfer layer 2 is irradiated by the curing ultraviolet light L2 and cracks 22 are generated.
[實施例三][Example 3]
請參閱圖10所示，其為本發明的實施例三。由於本實施例類似於上述實施例二，所以兩個實施例的相同處不再加以贅述（如：所述滾輪製造步驟S100），而本實施例相較於上述實施例二的差異大致說明如下：Please refer to FIG. 10 , which is the third embodiment of the present invention. Since this embodiment is similar to the second embodiment, the similarities between the two embodiments will not be described in detail (such as the roller manufacturing step S100 ), and the differences between this embodiment and the second embodiment are roughly described as follows:
於本實施例中，實施例二所載的所述轉印步驟與所述固化步驟可以被同步實施。具體來說，所述固化光源S2可以被配置於所述紫外線光學膜200的下方，所以當所述紫外線光學膜200被所述轉印滾輪100所滾壓後，即可立即通過所述固化光源S2所發出的所述固化紫外線L2來進行固化，據以提升整體的生產效能。In this embodiment, the transfer step and the curing step described in the second embodiment can be implemented simultaneously. Specifically, the curing light source S2 can be disposed below the UV optical film 200, so that when the UV optical film 200 is rolled by the transfer roller 100, it can be immediately cured by the curing UV light L2 emitted by the curing light source S2, thereby improving the overall production efficiency.
更進一步地說，當所述轉印步驟與所述固化步驟採用同步實施時，如何避免因為所述固化紫外線L2照射於所述轉印滾輪100而導致轉印圖案失真則顯得更為重要，所以所述氟化合物層3也因而更有其存在的必要性且與不可取代性。Furthermore, when the transfer step and the curing step are implemented simultaneously, it is more important to avoid the transfer pattern being distorted due to the curing ultraviolet light L2 irradiating the transfer roller 100. Therefore, the fluorine compound layer 3 is more necessary and irreplaceable.
[本發明實施例的技術效果][Technical Effects of the Embodiments of the Invention]
綜上所述，本發明實施例所公開的紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法，其通過特定條件的限制（如：所述預設曝光波長相較於所述預設光固化波段至少小於100奈米），以使得所述圖案轉印層可採用紫外線曝光材質，所述轉印滾輪所滾壓的光學膜可以採用紫外線固化材質，並且所述圖案轉印層較不會受到所述固化紫外線的影響而受損，據以有效地維持所述轉印滾輪的滾壓成形精度。In summary, the UV optical film transfer method and the transfer roller manufacturing method using deep UV light disclosed in the embodiments of the present invention are limited by specific conditions (e.g., the preset exposure wavelength is at least 100 nanometers less than the preset light curing wavelength band) so that the pattern transfer layer can be made of UV exposure material, the optical film rolled by the transfer roller can be made of UV curing material, and the pattern transfer layer is less likely to be damaged by the curing UV light, thereby effectively maintaining the rolling forming accuracy of the transfer roller.
再者，本發明實施例所公開的紫外線光學膜轉印方法及採深紫外線之轉印滾輪製造方法，其還可通過形成有所述氟化合物層，以使得所述氟化合物層在滾壓所述紫外線光學膜之後，可以有效地使兩者之間高壓接觸的成形表面彼此分離、且較不會有相互影響或導致外型損毀的可能。Furthermore, the UV optical film transfer method and the transfer roller manufacturing method using deep ultraviolet light disclosed in the embodiments of the present invention can also form the fluorine compound layer so that after the fluorine compound layer is rolled on the UV optical film, the high-pressure contact forming surfaces between the two can be effectively separated from each other, and there is less possibility of mutual influence or damage to the appearance.
進一步地說，本發明實施例所公開的紫外線光學膜轉印方法，其所採用的所述氟化合物層不但能夠避免所述圖案轉印層受到所述固化紫外線照射而產生損傷（如：所述氟化合物層能用來反射波段介於350奈米～410奈米且照射於所述轉印滾輪的紫外線的至少70%），並且縱使所述圖案轉印層受到所述固化紫外線照射而產生裂痕，所述氟化合物層還是能維持預定外型而避免轉印圖案失真，據以有效地維持所述轉印滾輪的滾壓成形精度。Furthermore, the fluorine compound layer used in the UV optical film transfer method disclosed in the embodiment of the present invention can not only prevent the pattern transfer layer from being damaged by the curing ultraviolet light (e.g., the fluorine compound layer can be used to reflect at least 70% of the ultraviolet light in the wavelength range between 350 nm and 410 nm that irradiates the transfer roller), but also even if the pattern transfer layer is cracked by the curing ultraviolet light, the fluorine compound layer can still maintain a predetermined shape and avoid distortion of the transfer pattern, thereby effectively maintaining the rolling forming accuracy of the transfer roller.
以上所公開的內容僅為本發明的優選可行實施例，並非因此侷限本發明的專利範圍，所以凡是運用本發明說明書及圖式內容所做的等效技術變化，均包含於本發明的專利範圍內。The above disclosed contents are only preferred feasible embodiments of the present invention and are not intended to limit the patent scope of the present invention. Therefore, all equivalent technical changes made by using the contents of the specification and drawings of the present invention are included in the patent scope of the present invention.
S100:滾輪製造步驟
S110:塗佈流程
S120:圖案化流程
S200:轉印步驟
S300:固化步驟
100:轉印滾輪
1:金屬滾筒
2a:光阻層
2:圖案轉印層
21:外表面
22:裂痕
3:氟化合物層
200:紫外線光學膜
M:光罩
S1:曝光光源
S2:固化光源
L1:深紫外線
L2:固化紫外線
S100: Roller manufacturing step
S110: Coating process
S120: Patterning process
S200: Transfer step
S300: Curing step
100: Transfer roller
1:
圖1為本發明實施例一的紫外線光學膜轉印方法的步驟流程示意圖。FIG. 1 is a schematic diagram of the steps of the UV optical film transfer method of the first embodiment of the present invention.
圖2為圖1中的塗佈流程的示意圖。FIG. 2 is a schematic diagram of the coating process in FIG. 1 .
圖3為圖1中的圖案化流程的示意圖。FIG. 3 is a schematic diagram of the patterning process in FIG. 1 .
圖4為圖1中的圖案化流程的另一態樣示意圖。FIG. 4 is a schematic diagram of another embodiment of the patterning process in FIG. 1 .
圖5為圖1中的圖案化流程的過程示意圖。FIG. 5 is a schematic diagram of the patterning process in FIG. 1 .
圖6為本發明實施例一的紫外線光學膜轉印方法的轉印步驟與固化步驟的示意圖。FIG. 6 is a schematic diagram of the transfer step and the curing step of the UV optical film transfer method of the first embodiment of the present invention.
圖7為本發明實施例二的紫外線光學膜轉印方法的示意圖。FIG. 7 is a schematic diagram of the UV optical film transfer method of the second embodiment of the present invention.
圖8為圖7的區域VIII的放大示意圖。FIG. 8 is an enlarged schematic diagram of region VIII of FIG. 7 .
圖9為圖7的區域IX的放大示意圖。FIG. 9 is an enlarged schematic diagram of region IX of FIG. 7 .
圖10為本發明實施例三的紫外線光學膜轉印方法的轉印步驟與固化步驟的示意圖。FIG. 10 is a schematic diagram of the transfer step and the curing step of the UV optical film transfer method of the third embodiment of the present invention.
S100:滾輪製造步驟 S100: Roller manufacturing steps
S110:塗佈流程 S110: Coating process
S120:圖案化流程 S120: Patterning process
S200:轉印步驟 S200: Transfer step
S300:固化步驟 S300: Curing step
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