CN116931365A - Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller - Google Patents

Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller Download PDF

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Publication number
CN116931365A
CN116931365A CN202211197513.7A CN202211197513A CN116931365A CN 116931365 A CN116931365 A CN 116931365A CN 202211197513 A CN202211197513 A CN 202211197513A CN 116931365 A CN116931365 A CN 116931365A
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CN
China
Prior art keywords
roller
transfer
pattern transfer
manufacturing
optical film
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Pending
Application number
CN202211197513.7A
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Chinese (zh)
Inventor
林刘恭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hunan Herui Laser Technology Co ltd
K Laser Technology Inc
Original Assignee
Hunan Herui Laser Technology Co ltd
K Laser Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hunan Herui Laser Technology Co ltd, K Laser Technology Inc filed Critical Hunan Herui Laser Technology Co ltd
Priority to CN202211197513.7A priority Critical patent/CN116931365A/en
Publication of CN116931365A publication Critical patent/CN116931365A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention provides a transfer printing manufacturing method of an ultraviolet optical film and a manufacturing method of a transfer printing roller. The method for manufacturing the transfer roller comprises the following steps: coating a photoresist layer on the outer surface of a metal roller; forming a predetermined light shape by using exposure ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the photoresist layer to enable the photoresist layer to form a pattern transfer inner layer; and forming a pattern transfer outer layer, which is composed of a fluorine compound, on an outer surface of the pattern transfer inner layer; the pattern transfer outer layer, the pattern transfer inner layer and the metal roller jointly form the transfer roller. Accordingly, the pattern transfer outer layer composed of the fluorine compound is formed so that the pattern transfer inner layer may be made of an ultraviolet exposure material, and the optical film rolled by the transfer roller may be made of an ultraviolet curing material.

Description

Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller
Technical Field
The present invention relates to a transfer roller, and more particularly, to a transfer method for manufacturing an ultraviolet optical film and a transfer roller.
Background
If the transfer layer of the existing transfer roller adopts ultraviolet exposure material, the optical film to be rolled and transferred needs to avoid adopting ultraviolet curing material, so as to avoid the transfer pattern distortion caused by damage of the transfer layer when the optical film is rolled and cured. Accordingly, the present inventors considered that the above-mentioned drawbacks could be ameliorated, and have intensively studied and combined with the application of scientific principles, and finally, have proposed an invention which is reasonable in design and effectively ameliorates the above-mentioned drawbacks.
Disclosure of Invention
The embodiment of the invention provides a transfer printing manufacturing method of an ultraviolet optical film and a manufacturing method of a transfer printing roller, which can effectively improve defects possibly generated by the existing transfer printing roller.
The embodiment of the invention discloses a transfer printing manufacturing method of an ultraviolet optical film, which comprises the following steps:
implementing a roller manufacturing step: a transfer roller is manufactured and its manufacturing process includes: coating a photoresist layer on the outer surface of a metal roller; forming a predetermined light shape by using exposure ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer inner layer; and forming a pattern transfer outer layer, which is composed of a fluorine compound, on the outer surface of the pattern transfer inner layer; the pattern transfer printing outer layer, the pattern transfer printing inner layer and the metal roller jointly form a transfer printing roller;
a transfer step is carried out: the outer layer is continuously rolled on an ultraviolet optical film by the pattern transfer printing of the transfer printing roller; wherein the ultraviolet optical film can be irradiated and cured by ultraviolet rays with wavelengths within a preset light curing wave band, and the preset exposure wavelength of the exposure ultraviolet rays is within the preset light curing wave band;
and (3) implementing a curing step: the ultraviolet optical film rolled by the transfer roller is irradiated and cured with a curing ultraviolet ray having a wavelength falling within a preset light curing band.
Preferably, in the curing step, the transfer roller is irradiated with curing ultraviolet rays so as to crack the outer surface of the pattern transfer inner layer; wherein the outer surface with the cracks is maintained in its shape by pattern transfer of the outer layer.
Preferably, during the roller manufacturing step, the fluorine compound constituting the pattern transfer outer layer is further defined as polytetrafluoroethylene.
Preferably, in the roller manufacturing step, the pattern transfer outer layer is entirely covered on the outer surface of the pattern transfer inner layer by vapor deposition.
Preferably, during the curing step, the curing ultraviolet rays irradiated to the transfer roller can be reflected by the pattern transfer outer layer by at least 70%.
Preferably, the preset exposure wavelength is between 350 nanometers and 450 nanometers, and the preset light curing wave band is between 350 nanometers and 410 nanometers.
Preferably, the metal roller is a chromium metal roller or a copper metal roller, and no nickel metal is used in the roller manufacturing step.
The embodiment of the invention also discloses a manufacturing method of the transfer roller, which comprises the following steps:
coating a photoresist layer on the outer surface of a metal roller;
forming a predetermined light shape by using exposure ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer inner layer;
and forming a pattern transfer outer layer, which is composed of a fluorine compound, on an outer surface of the pattern transfer inner layer; the pattern transfer outer layer, the pattern transfer inner layer and the metal roller jointly form a transfer roller.
Preferably, the metal roller is a chromium metal roller or a copper metal roller, and the transfer roller is manufactured without using any nickel metal material.
Preferably, the fluorine compound constituting the pattern transfer outer layer is further defined as polytetrafluoroethylene, and the pattern transfer outer layer can be used to reflect at least 70% of ultraviolet rays having a wavelength band of 350 nm to 410 nm and irradiated to the transfer roller.
In summary, according to the method for manufacturing the ultraviolet optical film and the method for manufacturing the transfer roller disclosed by the embodiments of the invention, the pattern transfer outer layer is formed by the fluorine compound, so that after the pattern transfer outer layer rolls the ultraviolet optical film, the forming surfaces in high-pressure contact between the forming surfaces can be effectively separated from each other, and the possibility of mutual influence or appearance damage is avoided.
In another aspect, in the method for manufacturing an ultraviolet optical film according to the embodiment of the present invention, the pattern transfer outer layer made of the fluorine compound is formed, so that the pattern transfer inner layer may be made of an ultraviolet exposure material, and the optical film rolled by the transfer roller may be made of an ultraviolet curing material.
For a further understanding of the nature and the technical aspects of the present invention, reference should be made to the following detailed description of the invention and the accompanying drawings, which are included to illustrate and not to limit the scope of the invention.
Drawings
Fig. 1 is a schematic flow chart of steps of a transfer printing manufacturing method of an ultraviolet optical film according to a first embodiment of the present invention.
Fig. 2 is a schematic diagram of the coating flow in fig. 1.
Fig. 3 is a schematic diagram of the patterning process in fig. 1.
FIG. 4 is a schematic diagram of another embodiment of the patterning process in FIG. 1.
Fig. 5 is a process schematic of the patterning process in fig. 1.
Fig. 6 is a schematic diagram of the forming process of fig. 1.
Fig. 7 is an enlarged schematic view of area VII of fig. 6.
Fig. 8 is a schematic diagram of the transfer step and the curing step in fig. 1.
Fig. 9 is an enlarged schematic view of the area IX of fig. 8.
Fig. 10 is a schematic diagram of a transfer step and a curing step of a transfer manufacturing method of an ultraviolet optical film according to a second embodiment of the present invention.
Detailed Description
The following description will be given by way of specific examples of embodiments of the present invention disclosed herein with respect to a method for manufacturing a transfer printing optical film and a method for manufacturing a transfer printing roller, and those skilled in the art will appreciate the advantages and effects of the present invention from the disclosure of the present invention. The invention is capable of other and different embodiments and its several details are capable of modifications and various other uses and applications, all of which are obvious from the description, without departing from the spirit of the invention. The drawings of the present invention are merely schematic illustrations, and are not intended to be drawn to actual dimensions. The following embodiments will further illustrate the related art content of the present invention in detail, but the disclosure is not intended to limit the scope of the present invention.
It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various components or signals, these components or signals should not be limited by these terms. These terms are used primarily to distinguish one element from another element or signal from another signal. In addition, the term "or" as used herein shall include any one or combination of more of the associated listed items as the case may be.
Example one
Please refer to fig. 1 to 9, which are a first embodiment of the present invention. As shown in fig. 1, the present embodiment discloses a transfer printing manufacturing method of an ultraviolet optical film, which sequentially includes: a roller manufacturing step S100, a transfer step S200, and a curing step S300, but the invention is not limited thereto. For example, the transfer printing method of the ultraviolet optical film can also add other steps according to the design requirement.
It should be noted that, in the present embodiment, the roller manufacturing step S100 is described in cooperation with the transferring step S200 and the curing step S300, but the present invention is not limited thereto. For example, in other embodiments not shown in the present disclosure, the roller manufacturing step S100 may be regarded as a method for manufacturing a transfer roller, and may be performed separately or in combination with other steps. The following describes the respective steps S100 to S300 of the transfer manufacturing method of the ultraviolet optical film.
The roller manufacturing step S100: as shown in fig. 1 and fig. 2 to 7, a transfer roller 100 (shown in fig. 6) is manufactured and the manufacturing process sequentially includes a coating process S110, a patterning process S120, and a forming process S130. It should be noted that, the roller manufacturing step S100 is achieved by implementing the above-mentioned multiple processes S110 to S130, so that no nickel metal material may be used in the roller manufacturing step S100, thereby achieving the effect of significantly reducing the manufacturing cost. That is, any roller manufacturing step using nickel metal is not the roller manufacturing step S100 (or the transfer roller manufacturing method) of the present embodiment.
The coating process S110: as shown in fig. 1 and 2, a photoresist layer 2a is coated on the outer surface of a metal drum 1. Wherein the metal cylinder 1 is a chromium metal cylinder or a copper metal cylinder, and the length of the metal cylinder 1 is preferably more than 1.5 meters (m), and the photoresist layer 2a is a positive photoresist, which can be used after exposure, so that the illuminated part will be dissolved when developing, and the pattern of the unexposed part is left after developing.
Furthermore, the photoresist layer 2a in this embodiment covers the entire outer surface of the metal drum 1 to form a seamless structure; that is, the photoresist layer 2a is formed in a circular shape and covers the entire outer surface of the metal cylinder 1 without a gap in any cross section perpendicular to the longitudinal direction of the metal cylinder 1.
The patterning process S120: as shown in fig. 1 and 3 to 5, a predetermined light pattern is formed by an exposure ultraviolet ray L1 having a predetermined exposure wavelength through a mask M or interference, and then is irradiated onto the photoresist layer 2a, so that the photoresist layer 2a forms a pattern transfer inner layer 2. In this embodiment, the predetermined exposure wavelength of the exposure ultraviolet light L1 is preferably between 400 nanometers (nm) and 410 nm.
Furthermore, an exposure light source S1 for emitting the exposure ultraviolet light L1 may be at least one light emitting diode chip capable of emitting light between 350 nm and 450 nm, and at least one of the light emitting diode chips includes a laser diode chip, but the type can be adjusted and changed according to the design requirement, and the invention is not limited thereto. The mask M may have gray scale values with a gradient distribution, so as to facilitate the exposure ultraviolet L1 to pass therethrough to form the predetermined light pattern.
Further, as shown in fig. 3, the exposure ranges of the exposure light source S1 and the mask M may be a partial length range corresponding to the metal drum 1 in the present embodiment, so that the exposure light source S1 and the mask M can move from one end to the other end of the metal drum 1 to perform exposure operation when the metal drum 1 rotates.
Alternatively, as shown in fig. 4, the exposure ranges of the exposure light source S1 and the mask M may be the entire length range corresponding to the metal drum 1 in the present embodiment, so that the exposure light source S1 and the mask M can be kept stationary while the metal drum 1 rotates, so as to perform the exposure operation.
The molding process S130: as shown in fig. 1, 6, and 7, a pattern transfer outer layer 3, which is formed of a fluorine compound, is formed on the outer surface 21 of the pattern transfer inner layer 2, so that the pattern transfer outer layer 3, the pattern transfer inner layer 2, and the metal cylinder 1 can collectively constitute the transfer roller 100. Further, the pattern transfer outer layer 3 is entirely covered on the outer surface 21 of the pattern transfer inner layer 2 by vapor deposition (evapration).
It should be noted that any transfer layer (especially, a transfer layer made of a metal material) not made of a fluorine compound is different from the pattern transfer outer layer 3 in this embodiment. Further, the fluorine compound constituting the pattern transferring outer layer 3 is preferably polytetrafluoroethylene (poly tetra fluoroethylene, PTFE) in the present embodiment, but the present invention is not limited thereto.
The transfer step S200: as shown in fig. 8, the transfer coating 3 is continuously rolled on an ultraviolet optical film 200 by the pattern of the transfer roller 100. The ultraviolet optical film 200 is selected to meet the following characteristics: can be cured by irradiation of ultraviolet rays having wavelengths falling within a preset light curing band, and the preset exposure wavelength of the exposure ultraviolet rays L1 falls within the preset light curing band. In this embodiment, the preset light curing wavelength band is preferably between 350 nm and 410 nm, but the present invention is not limited thereto.
Accordingly, by selecting the characteristics of the uv optical film 200, the pattern transfer outer layer 3 composed of the fluorine compound can effectively separate the forming surfaces in high-pressure contact with each other after rolling the uv optical film 200, and is less likely to affect each other or cause damage to the shape. In other words, the pattern transfer layer 3 and the uv optical film 200 are selected to have a mutually matched relationship, so that any optical film that does not meet the above characteristics is different from the uv optical film 200 according to the present embodiment.
The curing step S300: as shown in fig. 8 and 9, the ultraviolet optical film 200 rolled by the transfer roller 100 is irradiated and cured with a curing ultraviolet ray L2 having a wavelength falling within the preset light curing band. The curing light source S2 for emitting the curing ultraviolet light L2 may be at least one light emitting diode chip capable of emitting 350 nm to 410 nm, and at least one of the light emitting diode chips includes a laser diode chip, but the type can be adjusted and changed according to the design requirement, and the invention is not limited thereto.
In this embodiment, since the pattern transfer outer layer 3 is formed of the fluorine compound, the curing ultraviolet ray L2 irradiated to the transfer roller 100 can be reflected by the pattern transfer outer layer 3 by at least 70%, thereby effectively preventing the pattern transfer inner layer 2 from being damaged or cracked due to the irradiation of the curing ultraviolet ray L2.
Further, if the transfer roller 100 is irradiated with the curing ultraviolet rays L2 (for a long time), the outer surface 21 of the pattern transfer inner layer 2 is also easily cracked 22. Wherein the outer surface 21 formed with the cracks 22 can be maintained in its shape by the pattern transfer outer layer 3 in the present embodiment; that is, the pattern transferring outer layer 3 can effectively join the pattern transferring inner layer 2 blocks located beside the cracks 22, so that the pattern transferring outer layer 3 still has a predetermined shape, thereby preventing the pattern transferring outer layer 3 from being distorted when the ultraviolet optical film 200 is rolled.
As described above, in view of the fact that the pattern transfer outer layer 3 can not only prevent the pattern transfer inner layer 2 from being damaged due to the irradiation of the curing ultraviolet ray L2, but also maintain the predetermined shape of the pattern transfer outer layer 3 to avoid the distortion of the transferred pattern even if the pattern transfer inner layer 2 is subjected to the irradiation of the curing ultraviolet ray L2, the curing light source S2 and the exposure light source S1 can be the same light source according to the design requirement, thereby effectively reducing the overall equipment cost and the occupied volume of the equipment.
Example two
Please refer to fig. 10, which illustrates a second embodiment of the present invention. Since the present embodiment is similar to the first embodiment, the same parts of the two embodiments will not be described (e.g. the roller manufacturing step S100), but the differences of the present embodiment compared with the first embodiment are described as follows:
in this embodiment, the transfer step and the curing step may be performed simultaneously. Specifically, the curing light source S2 may be disposed below the uv-optical film 200, so that the uv-optical film 200 can be cured by the curing uv L2 emitted from the curing light source S2 immediately after being rolled by the transfer roller 100, thereby improving the overall production efficiency.
Further, when the transfer step and the curing step are performed simultaneously, it is more important to avoid distortion of the transferred pattern due to irradiation of the curing ultraviolet ray L2 on the transfer roller 100, so that the pattern transfer outer layer 3 composed of the fluorine compound is also more necessary and irreplaceable.
[ technical Effect of embodiments of the invention ]
In summary, according to the method for manufacturing the ultraviolet optical film and the method for manufacturing the transfer roller disclosed in the embodiments of the present invention, the pattern transfer outer layer is formed by the fluorine compound, so that after the pattern transfer outer layer rolls the ultraviolet optical film, the forming surfaces in high-pressure contact between the two forming surfaces can be effectively separated from each other, and the possibility of influencing each other or causing appearance damage is less likely.
In another aspect, in the method for manufacturing an ultraviolet optical film according to the embodiment of the present invention, the pattern transfer outer layer made of the fluorine compound is formed, so that the pattern transfer inner layer may be made of an ultraviolet exposure material, and the optical film rolled by the transfer roller may be made of an ultraviolet curing material.
In addition, the method for manufacturing the ultraviolet optical film by transfer printing can not only prevent the pattern transfer printing outer layer from being damaged due to the irradiation of the solidified ultraviolet rays (for example, the pattern transfer printing outer layer can be used for reflecting at least 70% of ultraviolet rays with wave bands between 350 and 410 nanometers and irradiated on the transfer printing roller), but also maintain a preset shape even if the pattern transfer printing outer layer is irradiated by the solidified ultraviolet rays to generate cracks, so that the transfer printing pattern distortion is avoided, and the rolling forming precision of the transfer printing roller is effectively maintained.
Furthermore, in the transfer printing manufacturing method of the ultraviolet optical film disclosed by the embodiment of the invention, the curing light source and the exposure light source can adopt the same light source according to the design requirement, so that the overall equipment cost is effectively reduced, and the occupied volume of the equipment is reduced.
The foregoing disclosure is only illustrative of the preferred embodiments of the present invention and is not to be construed as limiting the scope of the invention, as all changes which come within the meaning and range of equivalency of the specification and drawings are intended to be embraced therein.

Claims (10)

1. A transfer printing manufacturing method of an ultraviolet optical film, characterized in that the transfer printing manufacturing method of the ultraviolet optical film comprises the following steps:
implementing a roller manufacturing step: a transfer roller is manufactured and its manufacturing process includes:
coating a photoresist layer on the outer surface of a metal roller;
forming a predetermined light shape by using exposure ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the photoresist layer to enable the photoresist layer to form a pattern transfer inner layer; a kind of electronic device with high-pressure air-conditioning system
Forming a pattern transfer outer layer, which is composed of a fluorine compound, on an outer surface of the pattern transfer inner layer; wherein the pattern transfer outer layer, the pattern transfer inner layer, and the metal roller together form the transfer roller;
a transfer step is carried out: continuously rolling the pattern transfer outer layer of the transfer roller on an ultraviolet optical film; wherein the ultraviolet optical film is capable of being irradiated and cured by ultraviolet rays having wavelengths falling within a preset light curing band, and the preset exposure wavelength of the exposing ultraviolet rays falls within the preset light curing band; and
implementing a curing step: irradiating and curing the ultraviolet optical film rolled by the transfer roller with a curing ultraviolet having a wavelength falling within the preset light curing band.
2. The transfer printing manufacturing method of an ultraviolet optical film according to claim 1, wherein in the curing step, the transfer printing roller is irradiated with the curing ultraviolet rays to cause cracks to be generated in the outer surface of the pattern transfer printing inner layer; wherein the outer surface on which the cracks are formed maintains its shape by the pattern transfer outer layer.
3. The transfer printing production method of an ultraviolet optical film according to claim 1, wherein in the roller manufacturing step, the fluorine compound constituting the pattern transfer printing outer layer is polytetrafluoroethylene.
4. The transfer printing method of an ultraviolet optical film according to claim 3, wherein in the roller manufacturing step, the pattern transfer printing outer layer is entirely covered on the outer surface of the pattern transfer printing inner layer by vapor deposition.
5. The transfer printing manufacturing method of an ultraviolet optical film according to claim 3, wherein in the curing step, the cured ultraviolet rays irradiated to the transfer roller can be reflected by the pattern transfer printing outer layer by at least 70%.
6. The transfer printing method of claim 1 wherein the predetermined exposure wavelength is 350 nm to 450 nm and the predetermined light curing wavelength band is 350 nm to 410 nm.
7. The method according to claim 1, wherein the metal roller is a chromium metal roller or a copper metal roller, and no nickel metal material is used in the roller manufacturing step.
8. A method of manufacturing a transfer roller, the method comprising:
coating a photoresist layer on the outer surface of a metal roller;
forming a predetermined light shape by using exposure ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the photoresist layer to enable the photoresist layer to form a pattern transfer inner layer; and
forming a pattern transfer outer layer on the outer surface of the pattern transfer inner layer, the pattern transfer outer layer being composed of a fluorine compound; the pattern transfer outer layer, the pattern transfer inner layer and the metal roller jointly form the transfer roller.
9. The method of claim 8, wherein the metal cylinder is a chromium metal cylinder or a copper metal cylinder, and the method of manufacturing the transfer roller does not use any nickel metal material.
10. The method of manufacturing a transfer roller according to claim 8, wherein the fluorine compound constituting the pattern transfer outer layer is polytetrafluoroethylene, and the pattern transfer outer layer is operable to reflect at least 70% of ultraviolet rays having a wavelength band of 350 nm to 410 nm and irradiating the transfer roller.
CN202211197513.7A 2022-09-29 2022-09-29 Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller Pending CN116931365A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211197513.7A CN116931365A (en) 2022-09-29 2022-09-29 Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211197513.7A CN116931365A (en) 2022-09-29 2022-09-29 Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller

Publications (1)

Publication Number Publication Date
CN116931365A true CN116931365A (en) 2023-10-24

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