CN116931366A - Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller - Google Patents

Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller Download PDF

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Publication number
CN116931366A
CN116931366A CN202211197514.1A CN202211197514A CN116931366A CN 116931366 A CN116931366 A CN 116931366A CN 202211197514 A CN202211197514 A CN 202211197514A CN 116931366 A CN116931366 A CN 116931366A
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China
Prior art keywords
layer
roller
transfer
curing
optical film
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Pending
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CN202211197514.1A
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Chinese (zh)
Inventor
林刘恭
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Hunan Herui Laser Technology Co ltd
K Laser Technology Inc
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Hunan Herui Laser Technology Co ltd
K Laser Technology Inc
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Application filed by Hunan Herui Laser Technology Co ltd, K Laser Technology Inc filed Critical Hunan Herui Laser Technology Co ltd
Priority to CN202211197514.1A priority Critical patent/CN116931366A/en
Publication of CN116931366A publication Critical patent/CN116931366A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention provides a transfer printing manufacturing method of an ultraviolet optical film and a manufacturing method of a transfer printing roller. The transfer printing manufacturing method comprises the following steps: coating a photoresist layer on the outer surface of a metal roller; forming a predetermined light shape by using deep ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer layer; rolling the pattern transfer layer on an ultraviolet optical film without interruption; irradiating and curing the rolled ultraviolet optical film with a curing ultraviolet ray having a wavelength falling within a preset light curing band. The predetermined exposure wavelength is at least less than 100 nanometers compared to the predetermined light curing wavelength band. Accordingly, the pattern transfer layer can be made of ultraviolet exposure materials, the optical film rolled by the transfer roller can be made of ultraviolet curing materials, and the pattern transfer layer is less damaged due to the influence of the curing ultraviolet rays, so that the rolling forming precision is maintained.

Description

Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller
Technical Field
The present invention relates to a transfer roller, and more particularly, to a transfer method for manufacturing an ultraviolet optical film and a transfer roller.
Background
If the transfer layer of the existing transfer roller adopts ultraviolet exposure material, the optical film which is required to be manufactured and transferred by rolling is required to avoid adopting ultraviolet curing material, so that the transfer pattern is prevented from being distorted due to damage of the transfer layer when the optical film is rolled and cured. Accordingly, the present inventors considered that the above-mentioned drawbacks could be ameliorated, and have intensively studied and combined with the application of scientific principles, and finally, have proposed an invention which is reasonable in design and effectively ameliorates the above-mentioned drawbacks.
Disclosure of Invention
The embodiment of the invention provides a transfer printing manufacturing method of an ultraviolet optical film and a manufacturing method of a transfer printing roller, which can effectively improve defects possibly generated by the existing transfer printing roller.
The embodiment of the invention discloses a transfer printing manufacturing method of an ultraviolet optical film, which comprises the following steps:
implementing a roller manufacturing step: a transfer roller is manufactured and its manufacturing process includes: coating a photoresist layer on the outer surface of a metal roller; forming a predetermined light pattern by using a deep ultraviolet ray with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer layer; the pattern transfer layer and the metal roller form a transfer roller together;
a transfer step is carried out: continuously rolling the transfer roller on an ultraviolet optical film; wherein the ultraviolet optical film can be irradiated and cured by ultraviolet rays with wavelengths falling within a preset light curing wave band, the preset exposure wavelength of the deep ultraviolet rays falls outside the preset light curing wave band, and the preset exposure wavelength is at least less than 100 nanometers compared with the preset light curing wave band;
and (3) implementing a curing step: the ultraviolet optical film rolled by the transfer roller is irradiated and cured with a curing ultraviolet ray having a wavelength falling within a preset light curing band.
Preferably, the preset exposure wavelength is between 190 nm and 250 nm, and the preset light curing wave band is between 350 nm and 410 nm.
Preferably, the metal roller is a chromium metal roller or a copper metal roller, and no nickel metal is used in the roller manufacturing step.
Preferably, in the roller manufacturing step, a fluorine compound layer is formed on the outer surface of the pattern transfer layer; wherein the fluorine compound layer, the pattern transfer layer, and the metal cylinder together constitute a transfer roller.
Preferably, in the roller manufacturing step, the fluorine compound layer is entirely covered on the outer surface of the pattern transfer layer by evaporation, and the fluorine compound layer is further defined as a polytetrafluoroethylene layer.
Preferably, in the curing step, the transfer roller is irradiated by curing ultraviolet rays so as to crack the outer surface of the pattern transfer layer; wherein the outer surface on which the crack is formed is maintained in its shape by the fluorine compound layer.
Preferably, in the curing step, the curing ultraviolet rays irradiated to the transfer roller can be reflected by the fluorine compound layer by at least 70%.
The embodiment of the invention also discloses a manufacturing method of the transfer roller, which comprises the following steps:
coating a photoresist layer on the outer surface of a metal roller;
forming a predetermined light pattern by using a deep ultraviolet ray with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer layer;
wherein, the preset exposure wavelength is 190-250 nanometers; and forming a fluorine compound layer on the outer surface of the pattern transfer layer; wherein the fluorine compound layer, the pattern transfer layer, and the metal cylinder together constitute a transfer roller.
Preferably, the metal roller is a chromium metal roller or a copper metal roller, and the transfer roller is manufactured without using any nickel metal material.
Preferably, the fluorine compound layer is further defined as a polytetrafluoroethylene layer, and the fluorine compound layer can be used to reflect at least 70% of the ultraviolet rays having a wavelength band of 350 nm to 410 nm and being irradiated to the transfer roller.
In summary, the transfer printing method and the transfer printing roller manufacturing method for the ultraviolet optical film according to the embodiments of the present invention are limited by specific conditions (for example, the preset exposure wavelength is at least less than 100 nm compared with the preset light curing wavelength), so that the pattern transfer printing layer can be made of an ultraviolet exposure material, the optical film rolled by the transfer printing roller can be made of an ultraviolet curing material, and the pattern transfer printing layer is less damaged due to the influence of the curing ultraviolet, thereby effectively maintaining the rolling forming precision of the transfer printing roller.
In addition, the transfer printing manufacturing method of the ultraviolet optical film and the manufacturing method of the transfer printing roller disclosed by the embodiment of the invention can further enable the fluorine compound layer to effectively separate the forming surfaces in high-pressure contact with each other after the ultraviolet optical film is rolled, and the possibility of mutual influence or appearance damage is avoided.
For a further understanding of the nature and the technical aspects of the present invention, reference should be made to the following detailed description of the invention and the accompanying drawings, which are included to illustrate and not to limit the scope of the invention.
Drawings
Fig. 1 is a schematic flow chart of steps of a transfer printing manufacturing method of an ultraviolet optical film according to a first embodiment of the present invention.
Fig. 2 is a schematic diagram of the coating flow in fig. 1.
Fig. 3 is a schematic diagram of the patterning process in fig. 1.
FIG. 4 is a schematic diagram of another embodiment of the patterning process in FIG. 1.
Fig. 5 is a process schematic of the patterning process in fig. 1.
Fig. 6 is a schematic diagram of a transfer step and a curing step of a transfer manufacturing method of an ultraviolet optical film according to an embodiment of the invention.
Fig. 7 is a schematic diagram of a transfer printing manufacturing method of an ultraviolet optical film according to a second embodiment of the present invention.
Fig. 8 is an enlarged schematic view of region VIII of fig. 7.
Fig. 9 is an enlarged schematic view of the area IX of fig. 7.
Fig. 10 is a schematic diagram of a transfer step and a curing step of a transfer manufacturing method of an ultraviolet optical film according to a third embodiment of the present invention.
Detailed Description
The following description will be given by way of specific examples of embodiments of the present invention disclosed herein with respect to a method for manufacturing a transfer printing optical film and a method for manufacturing a transfer printing roller, and those skilled in the art will appreciate the advantages and effects of the present invention from the disclosure of the present invention. The invention is capable of other and different embodiments and its several details are capable of modifications and various other uses and applications, all of which are obvious from the description, without departing from the spirit of the invention. The drawings of the present invention are merely schematic illustrations, and are not intended to be drawn to actual dimensions. The following embodiments will further illustrate the related art content of the present invention in detail, but the disclosure is not intended to limit the scope of the present invention.
It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various components or signals, these components or signals should not be limited by these terms. These terms are used primarily to distinguish one element from another element or signal from another signal. In addition, the term "or" as used herein shall include any one or combination of more of the associated listed items as the case may be.
Example one
Please refer to fig. 1 to 6, which illustrate a first embodiment of the present invention. The embodiment discloses a transfer printing manufacturing method of an ultraviolet optical film, which sequentially comprises the following steps: a roller manufacturing step S100, a transfer step S200, and a curing step S300, but the invention is not limited thereto. For example, the transfer printing method of the ultraviolet optical film can also add other steps according to the design requirement.
It should be noted that, in the present embodiment, the roller manufacturing step S100 is described in cooperation with the transferring step S200 and the curing step S300, but the present invention is not limited thereto. For example, in other embodiments not shown in the present disclosure, the roller manufacturing step S100 may be regarded as a method for manufacturing a transfer roller, and may be performed separately or in combination with other steps. The following describes the respective steps S100 to S300 of the transfer manufacturing method of the ultraviolet optical film.
The roller manufacturing step S100: as shown in fig. 1 to 5, a transfer roller 100 (shown in fig. 6) is manufactured and includes a coating process S110 and a patterning process S120 in sequence. It should be noted that, the roller manufacturing step S100 is achieved by implementing the above-mentioned multiple processes S110 and S120, so that no nickel metal material may be used in the roller manufacturing step S100, thereby achieving the effect of significantly reducing the manufacturing cost. That is, any roller manufacturing step using nickel metal is not the roller manufacturing step S100 (or the transfer roller manufacturing method) of the present embodiment.
The coating process S110: as shown in fig. 1 and 2, a photoresist layer 2a is coated on the outer surface of a metal drum 1. Wherein the metal cylinder 1 is a chromium metal cylinder or a copper metal cylinder, and the length of the metal cylinder 1 is preferably more than 1.5 meters (m), and the photoresist layer 2a is a positive photoresist, which can be used after exposure, so that the illuminated part will be dissolved when developing, and the pattern of the unexposed part is left after developing.
Furthermore, the photoresist layer 2a in this embodiment covers the entire outer surface of the metal drum 1 to form a seamless structure; that is, the photoresist layer 2a is formed in a circular shape and covers the entire outer surface of the metal cylinder 1 without a gap in any cross section perpendicular to the longitudinal direction of the metal cylinder 1.
The patterning process S120: as shown in fig. 1 and 3 to 5, a Deep Ultraviolet (DUV) light having a predetermined exposure wavelength is formed into a predetermined light shape by a mask M or interference, and then irradiated onto the photoresist layer 2a, so that the photoresist layer 2a forms a pattern transfer layer 2. In this embodiment, the pattern transfer layer 2 and the metal roller 1 together form the transfer roller 100, and the predetermined exposure wavelength of the deep ultraviolet light L1 may be preferably 190 nanometers (nm) to 250 nm.
Furthermore, an exposure light source S1 for emitting the deep ultraviolet light L1 may be at least one laser diode chip capable of emitting 190 nm to 250 nm, but the type of the laser diode chip may be adjusted and changed according to the design requirement, and the invention is not limited thereto. The mask M may have gray scale values with a gradient distribution, so as to facilitate the deep ultraviolet light L1 to pass through to form the predetermined light pattern.
Further, as shown in fig. 3, the exposure ranges of the exposure light source S1 and the mask M may be a partial length range corresponding to the metal drum 1 in the present embodiment, so that the exposure light source S1 and the mask M can move from one end to the other end of the metal drum 1 to perform exposure operation when the metal drum 1 rotates.
Alternatively, as shown in fig. 4, the exposure ranges of the exposure light source S1 and the mask M may be the entire length range corresponding to the metal drum 1 in the present embodiment, so that the exposure light source S1 and the mask M can be kept stationary while the metal drum 1 rotates, so as to perform the exposure operation.
The transfer step S200: as shown in fig. 1 and 6, the transfer roller 100 (e.g., the pattern transfer layer 2) is continuously rolled onto an ultraviolet optical film 200. The ultraviolet optical film 200 is selected to meet the following characteristics: the ultraviolet light can be irradiated and cured by ultraviolet light with the wavelength falling within a preset light curing wave band, the preset exposure wavelength of the deep ultraviolet light L1 falls outside the preset light curing wave band, and the preset exposure wavelength is at least less than 100 nanometers compared with the preset light curing wave band. In this embodiment, the preset light curing wavelength band is preferably between 350 nm and 410 nm, but the present invention is not limited thereto.
The curing step S300: as shown in fig. 1 and 6, the ultraviolet optical film 200 rolled by the transfer roller 100 is irradiated and cured with a curing ultraviolet ray L2 having a wavelength falling within the preset light curing band. The curing light source S2 for emitting the curing ultraviolet light L2 may be at least one light emitting diode chip capable of emitting 350 nm to 410 nm, and at least one of the light emitting diode chips includes a laser diode chip, but the type can be adjusted and changed according to the design requirement, and the invention is not limited thereto.
As described above, the transfer printing method of the uv optical film disclosed in the present embodiment is limited by specific conditions (e.g. the preset exposure wavelength is at least less than 100 nm compared with the preset light curing wavelength), so that the pattern transfer printing layer 2 can be made of uv exposure material, the optical film rolled by the transfer printing roller 100 can be made of uv curing material, and the pattern transfer printing layer 2 is less damaged by the curing uv L2, thereby effectively maintaining the rolling forming precision of the transfer printing roller 100.
Example two
Please refer to fig. 7-9, which illustrate a second embodiment of the present invention. Since this embodiment is similar to the first embodiment, the same parts of the two embodiments will not be described again, and the differences between the present embodiment and the first embodiment are described as follows:
in this embodiment, the roller manufacturing step further includes a forming step after the patterning process, namely: a fluorine compound layer 3 is formed on the outer surface 21 of the pattern transfer layer 2, so that the fluorine compound layer 3, the pattern transfer layer 2, and the metal cylinder 1 can collectively constitute the transfer roller 100. Further, the fluorine compound layer 3 is entirely covered on the outer surface 21 of the pattern transfer layer 2 by vapor deposition (evapration), but the present invention is not limited thereto.
It should be noted that any coating layer (particularly, metal layer) not composed of fluorine compound is different from the fluorine compound layer 3 in this embodiment. Further, the fluorine compound layer 3 is preferably defined as a polytetrafluoroethylene (poly tetra fluoroethylene, PTFE) layer in the present embodiment, but the invention is not limited thereto.
Accordingly, by selecting the characteristics of the uv optical film 200, the fluorine compound layer 3 can effectively separate the forming surfaces in high-pressure contact with each other after rolling the uv optical film 200, and has less possibility of influencing each other or causing appearance damage. Alternatively, the fluorine compound layer 3 and the uv optical film 200 are selected to have a matching relationship.
In this embodiment, the curing uv light L2 irradiated on the transfer roller 100 can be reflected by the fluorine compound layer 3 by at least 70%, so as to effectively prevent the pattern transfer layer 2 from being damaged or cracked due to the irradiation of the curing uv light L2.
Further, if the transfer roller 100 is irradiated with the curing ultraviolet rays L2 (for a long time), it is also possible to cause cracks 22 to occur in the outer surface 21 of the pattern transfer layer 2. Wherein the outer surface 21 formed with the cracks 22 can be maintained in its shape by the fluorine compound layer 3 in the present embodiment; that is, the fluorine compound layer 3 can be effectively bonded to the pattern transfer layer 2 block located beside the crack 22, so that the fluorine compound layer 3 still has a predetermined shape, thereby preventing the fluorine compound layer 3 from being distorted during rolling the uv optical film 200.
As described above, in view of the fact that the fluorine compound layer 3 is capable of preventing the pattern transfer layer 2 from being damaged by the irradiation of the curing ultraviolet rays L2, and the fluorine compound layer 3 is capable of maintaining a predetermined shape even if the pattern transfer layer 2 is irradiated with the curing ultraviolet rays L2 to generate cracks 22, the transfer pattern is prevented from being distorted.
Example III
Please refer to fig. 10, which illustrates a third embodiment of the present invention. Since the present embodiment is similar to the second embodiment, the same parts of the two embodiments will not be described (e.g. the roller manufacturing step S100), but the differences of the present embodiment compared with the second embodiment are described as follows:
in this embodiment, the transferring step and the curing step carried out in the second embodiment may be performed simultaneously. Specifically, the curing light source S2 may be disposed below the uv-optical film 200, so that the uv-optical film 200 can be cured by the curing uv L2 emitted from the curing light source S2 immediately after being rolled by the transfer roller 100, thereby improving the overall production efficiency.
Furthermore, when the transfer step and the curing step are performed simultaneously, it is more important to avoid the distortion of the transfer pattern caused by the irradiation of the curing ultraviolet ray L2 on the transfer roller 100, so that the fluorine compound layer 3 is also more necessary and irreplaceable.
[ technical Effect of embodiments of the invention ]
In summary, the transfer printing method and the transfer printing roller manufacturing method for the ultraviolet optical film according to the embodiments of the present invention are limited by specific conditions (for example, the preset exposure wavelength is at least less than 100 nm compared with the preset light curing wavelength), so that the pattern transfer printing layer can be made of an ultraviolet exposure material, the optical film rolled by the transfer printing roller can be made of an ultraviolet curing material, and the pattern transfer printing layer is less damaged due to the influence of the curing ultraviolet, thereby effectively maintaining the rolling forming precision of the transfer printing roller.
In addition, the transfer printing manufacturing method of the ultraviolet optical film and the manufacturing method of the transfer printing roller disclosed by the embodiment of the invention can further enable the fluorine compound layer to effectively separate the forming surfaces in high-pressure contact with each other after the ultraviolet optical film is rolled, and the possibility of mutual influence or appearance damage is avoided.
Further, in the transfer printing manufacturing method of the ultraviolet optical film according to the embodiment of the invention, the fluorine compound layer is used to prevent the pattern transfer printing layer from being damaged by the irradiation of the curing ultraviolet rays (for example, the fluorine compound layer can be used to reflect at least 70% of the ultraviolet rays with the wave band between 350 and 410 nanometers and irradiate the transfer printing roller), and even if the pattern transfer printing layer is irradiated by the curing ultraviolet rays to generate cracks, the fluorine compound layer can maintain a predetermined shape to avoid distortion of the transfer printing pattern, so that the rolling forming precision of the transfer printing roller is effectively maintained.
The foregoing disclosure is only illustrative of the preferred embodiments of the present invention and is not to be construed as limiting the scope of the invention, as all changes which come within the meaning and range of equivalency of the specification and drawings are intended to be embraced therein.

Claims (10)

1. A transfer printing manufacturing method of an ultraviolet optical film, characterized in that the transfer printing manufacturing method of the ultraviolet optical film comprises the following steps:
implementing a roller manufacturing step: a transfer roller is manufactured and its manufacturing process includes:
coating a photoresist layer on the outer surface of a metal roller;
forming a predetermined light shape by using deep ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer layer; wherein the pattern transfer layer and the metal roller together form the transfer roller;
a transfer step is carried out: continuously rolling the transfer roller on an ultraviolet optical film; wherein the ultraviolet optical film is capable of being irradiated and cured by ultraviolet rays having wavelengths within a preset light curing band, and the preset exposure wavelength of the deep ultraviolet rays is outside the preset light curing band, and the preset exposure wavelength is at least less than 100 nanometers compared with the preset light curing band; and
implementing a curing step: irradiating and curing the ultraviolet optical film rolled by the transfer roller with a curing ultraviolet having a wavelength falling within the preset light curing band.
2. The transfer printing method of claim 1 wherein the predetermined exposure wavelength is 190 nm to 250 nm and the predetermined light curing wavelength band is 350 nm to 410 nm.
3. The method according to claim 1, wherein the metal roller is a chromium metal roller or a copper metal roller, and no nickel metal material is used in the roller manufacturing step.
4. The transfer printing manufacturing method of an ultraviolet optical film according to claim 1, wherein in the roller manufacturing step, a fluorine compound layer is formed on an outer surface of the pattern transfer printing layer;
wherein the fluorine compound layer, the pattern transfer layer, and the metal cylinder together constitute the transfer roller.
5. The transfer printing method of an ultraviolet optical film according to claim 4, wherein in the roller manufacturing step, the fluorine compound layer is entirely covered on the outer surface of the pattern transfer printing layer by vapor deposition, and the fluorine compound layer is a polytetrafluoroethylene layer.
6. The transfer printing manufacturing method of an ultraviolet optical film according to claim 4, wherein in the curing step, the transfer printing roller is irradiated with the curing ultraviolet rays to cause cracks to be generated in the outer surface of the pattern transfer printing layer;
wherein the outer surface on which the crack is formed is maintained in its shape by the fluorine compound layer.
7. The transfer printing manufacturing method of an ultraviolet optical film according to claim 4, wherein in the curing step, the cured ultraviolet rays irradiated to the transfer roller can be reflected by the fluorine compound layer by at least 70%.
8. A method of manufacturing a transfer roller, the method comprising:
coating a photoresist layer on the outer surface of a metal roller;
forming a predetermined light shape by using deep ultraviolet rays with a preset exposure wavelength through a photomask or interference, and then irradiating the light resistance layer to enable the light resistance layer to form a pattern transfer layer; wherein the preset exposure wavelength is 190-250 nanometers; and
forming a fluorine compound layer on an outer surface of the pattern transfer layer; wherein the fluorine compound layer, the pattern transfer layer, and the metal cylinder together constitute the transfer roller.
9. The method of claim 8, wherein the metal cylinder is a chromium metal cylinder or a copper metal cylinder, and the method of manufacturing the transfer roller does not use any nickel metal material.
10. The method according to claim 8, wherein the fluorine compound layer is a polytetrafluoroethylene layer, and the fluorine compound layer is capable of reflecting at least 70% of ultraviolet rays having a wavelength of 350 nm to 410 nm and irradiating the transfer roller.
CN202211197514.1A 2022-09-29 2022-09-29 Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller Pending CN116931366A (en)

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CN202211197514.1A CN116931366A (en) 2022-09-29 2022-09-29 Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller

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Application Number Priority Date Filing Date Title
CN202211197514.1A CN116931366A (en) 2022-09-29 2022-09-29 Transfer printing manufacturing method of ultraviolet optical film and manufacturing method of transfer printing roller

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