CN111736298A - Optical device, exposure device, and article manufacturing method - Google Patents
Optical device, exposure device, and article manufacturing method Download PDFInfo
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- CN111736298A CN111736298A CN202010216319.3A CN202010216319A CN111736298A CN 111736298 A CN111736298 A CN 111736298A CN 202010216319 A CN202010216319 A CN 202010216319A CN 111736298 A CN111736298 A CN 111736298A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
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- Epidemiology (AREA)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
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Abstract
The present disclosure relates to an optical apparatus, an exposure apparatus, and an article manufacturing method. The optical device includes: an optical component; a support mechanism having a support portion for supporting the optical component and a position regulating portion for regulating the position of the optical component in the 1 st direction; and an operation mechanism for applying a force to the optical component in a 2 nd direction different from the 1 st direction to operate the optical component. The operating mechanism includes: a contact portion that contacts the optical component; an operation portion that moves the contact portion in the 2 nd direction; and a connecting portion that connects the contact portion and the operation portion. The connecting portion is configured to be capable of relatively moving the operating portion and the contact portion with respect to the 1 st direction.
Description
Technical Field
The invention relates to an optical device, an exposure apparatus and an article manufacturing method.
Background
In an optical device in which an optical part such as a lens or a mirror is supported by a support mechanism, the optical part may be deformed due to stress generated by its own weight or the like. For example, patent document 1 describes that in a configuration in which a lens and a lens setting section are in contact at a plurality of points, the lens is deformed and optical characteristics may deteriorate.
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open No. 2001 and 242364
Disclosure of Invention
The deformation of the optical parts due to stress may have a large influence on the imaging performance particularly in an optical device having large-sized optical parts such as an exposure device and a large-sized telescope. In addition, even in an optical apparatus having small-sized optical components, if the required imaging performance is high, deformation of the optical components due to stress may not be negligible.
The present invention aims to provide a technique advantageous for reducing the influence of stress acting on an optical component.
The 1 aspect of the present invention relates to an optical device including: an optical component; a support mechanism having a support portion for supporting the optical component and a position regulating portion for regulating the position of the optical component in the 1 st direction; and an operation mechanism for applying a force to the optical component in a 2 nd direction different from the 1 st direction to operate the optical component, the operation mechanism including: a contact portion that contacts the optical component; an operation portion that moves the contact portion in the 2 nd direction; and a coupling portion that couples the contact portion and the operation portion, the coupling portion being configured to relatively move the operation portion and the contact portion with respect to the 1 st direction.
According to the present invention, there is provided a technique advantageous for reducing the influence due to stress acting on an optical component.
Drawings
Fig. 1 is a front view schematically showing the structure of an optical device according to embodiment 1.
Fig. 2 is a sectional view taken along line a-a of fig. 1.
Fig. 3 is a sectional view taken along line B-B of fig. 1.
Fig. 4 is a diagram illustrating an operation for reducing an influence due to stress acting on an optical part.
Fig. 5 is a cross-sectional view taken along line C-C of fig. 4 (b).
FIG. 6 is a D-D sectional view of (b) of FIG. 4
Fig. 7 is a diagram showing a 1 st configuration example of the coupling portion.
Fig. 8 is a diagram illustrating another configuration example and operation example of the support mechanism.
Fig. 9 is a front view schematically showing the structure of an optical device according to example 1 of embodiment 1.
Fig. 10 is a sectional view F-F of fig. 9.
Fig. 11 is a G-G sectional view of fig. 9.
FIG. 12 is a D-D sectional view of an exposure apparatus according to example 1 for carrying out the step (b) of FIG. 4.
Fig. 13 is a front view schematically showing the structure of an optical device according to example 2 of embodiment 1.
Fig. 14 is a perspective view of an operation mechanism of the optical device of embodiment 2.
Fig. 15 is a sectional view H-H of fig. 13.
FIG. 16 is a D-D sectional view of an exposure apparatus according to example 2 for carrying out the step (b) of FIG. 4.
Fig. 17 is a front view schematically showing the structure of an optical device according to example 3 of embodiment 1.
Fig. 18 is a sectional view taken along line I-I of fig. 17.
Fig. 19 is a diagram showing an example of the operation of the optical device according to embodiment 3.
Fig. 20 is a diagram showing the structure of an exposure apparatus according to embodiment 2.
Fig. 21 is a diagram showing the structure of an exposure apparatus according to embodiment 3.
(symbol description)
100: an optical device; 111: an optical component; 131. 132: a position restricting section; 140: an operating mechanism; 145: and (4) connecting the parts.
Detailed Description
Hereinafter, embodiments will be described in detail with reference to the drawings. The following embodiments do not limit the invention according to the claims. In the embodiments, a plurality of features are described, but these plurality of features are not necessarily all necessary in the invention, and a plurality of features may be arbitrarily combined. In the drawings, the same or similar components are denoted by the same reference numerals, and redundant description thereof is omitted.
Fig. 1 to 6 schematically show the structure of an optical device 100 according to embodiment 1 of the present invention. Fig. 1 is a front view of an optical device 100 according to embodiment 1 of the present invention, fig. 2 is a sectional view taken along line a-a of fig. 1, and fig. 3 is a sectional view taken along line B-B of fig. 1. The optical device 100 may include 1 optical component 111, 1 or more support mechanisms 130 for supporting the optical component 111, and 1 or more operating mechanisms 140 for operating the optical component 111. In one example, the optical device 100 may include 1 optical component 111, 2 supporting mechanisms 130, and 2 operating mechanisms 140. Here, the 2 support mechanisms 130 will be described as the support mechanisms 130a and 130b when they are described separately from each other, and the support mechanism 130 will be described when they are not described separately. In the case of simply describing the support mechanism 130, the number of the support mechanisms 130 may be 1 or more. Similarly, the 2 operation mechanisms 140 are described as operation mechanisms 140a and 140b when they are distinguished from each other, and are described as operation mechanisms 140 when they are not distinguished from each other. In the case of the actuator 140 simply described, the number of the actuators 140 may be 1 or more.
The support mechanism 130 may have a support portion 120 that supports the optical part 111, and position regulating portions 131, 132 that regulate the position of the optical part 111 in the 1 st direction 202. Here, the support portion 120 of the support mechanism 130a is also referred to as a support portion 120a, and the support portion 120 of the support mechanism 130b is also referred to as a support portion 120 b. The 2 support mechanisms 130 may have a configuration symmetrical to each other about the symmetry axis 110. With the 2 support mechanisms 130, the position of the optical part 111 in the 2 nd direction 203 and the 3 rd direction 201 can be restricted. The 3 rd direction may be a direction different from both the 1 st direction 202 and the 2 nd direction 203. In one example, the 1 st direction 202, the 2 nd direction 203, and the 3 rd direction 201 may be at an angle of 90 degrees to each other. In other aspects, the 1 st direction 202, the 2 nd direction 203, and the 3 rd direction 201 may correspond to an X-axis direction, a Z-axis direction, and a Y-axis direction in an XYZ rectangular coordinate system, respectively.
The operating mechanism 140 may be provided to operate the optical part 111 by applying a force to the optical part 111 in a 2 nd direction 203 different from the 1 st direction 202. The operation mechanism 140 may be, for example, a drive mechanism that drives the optical part 111 by applying a force to the optical part 111 in the 2 nd direction 203. The 2 actuators 140 may have a configuration symmetrical to each other about the symmetry axis 110. The axis of symmetry 110 may be arranged through the center of the optical part 111. Such a drive mechanism can be controlled by a control unit, not shown, so as to perform a stress reduction operation described later.
The operating mechanism 140 may include a contact portion 141 contacting the optical part 111, an operating portion 142 moving the contact portion 141 in the 2 nd direction 203, and a connecting portion 145 connecting the contact portion 141 and the operating portion 142. When the operation unit 142 moves in the 2 nd direction 203, the connection unit 145 and the contact unit 141 also move in the 2 nd direction 203, and a force in the 2 nd direction 203 is applied to the optical component 111. Thereby, the optical part 111 can be driven in the 2 nd direction 203. The coupling portion 145 may include a 1 st portion 146 fixed to the operating portion 142, and a 2 nd portion 147 fixed to the contact portion 141. The connection portion 145 may be configured to be able to relatively move the operation portion 142 and the contact portion 141 with respect to the 1 st direction.
The actuator 140 may be used to reduce an influence caused by stress acting on the optical part 111 (e.g., deformation of the optical part 111, or a change in optical performance of the optical part 111 caused thereby). The optical component 111 can be supported by 2 support mechanisms 130a, 130b in the use state. When the optical component 111 is supported by the support mechanisms 130a and 130b, the optical component 111 may first contact the support portion 120 of the support mechanism 130a and then contact the support portion 120 of the support mechanism 130b, or vice versa. Alternatively, when the optical component 111 is supported by the support portion 120 of the support mechanism 130, the optical component 111 may be rotated around the contact portion between the optical component 111 and the support portion 120, or may not be rotated. In this way, the starting state of the support of the optical component 111 by the support portion 120 of the support mechanism 130 is various and not constant. Therefore, the stress finally applied to the optical component 111 supported by the support mechanism 130 and the influence of the stress are also various. Therefore, the actuator 140 can be used to reduce the influence caused by the stress acting on the optical part 111 (e.g., deformation of the optical part 111, or change in the optical performance of the optical part 111 caused thereby).
Fig. 4 (a) to 4 (e) illustrate operations for reducing the influence of stress acting on the optical component 111 (hereinafter also referred to as stress reduction operations). The operating mechanisms 140a and 140b are configured to be able to change the state of the optical component 111, and as described in detail below, the state may include a 1 st state in which the optical component 111 is supported by the supporting mechanism 130, and a 2 nd state in which the optical component 111 is supported by the operating mechanism 140. When the optical component 111 is installed, the installation rule is determined so as to transition from the 1 st state to the 1 st state via the 2 nd state, whereby the stress applied to the optical component 111 can be made constant. For example, it is useful to set the optical component 111 in accordance with the setting rule at the time of adjustment before shipment and then adjust the optical component 111, and thereafter, also at the time of adjustment after shipment, to set the optical component 111 in accordance with the setting rule and then adjust the optical component 111. According to such a method, the stress applied to the optical component 111 at the time of adjustment before shipment and the stress applied to the optical component 111 at the time of adjustment after shipment can be equalized, and therefore, the adjustment work after shipment can be facilitated.
An example of the operation by the operation mechanism 140 will be described below with reference to fig. 4 (a) to 4 (e). Fig. 4 (a) to 4 (e) show only the support portions 120(120a, 120b) among the components of the support mechanism 130. In fig. 4 (a), an initial state is shown. The initial state corresponds to state 1. In the initial state, stress depending on the state at the start of the support of the optical part 111 by the support mechanisms 130a, 130b may exist in the optical part 111. Alternatively, in the initial state, stress due to shock or vibration (for example, shock or vibration during transportation) applied to the optical device 100 in a state where the optical component 111 is supported by the support mechanisms 130a and 130b may exist in the optical component 111.
First, as shown in fig. 4 (b), the operating mechanism 140a may be operated so that the optical component 111 is separated from the supporting portion 120a of the supporting mechanism 130 a. In this state, the optical component 111 is supported by the support portion 120b of the support mechanism 130b and the operating mechanism 140 a.
Next, as shown in fig. 4 (c), the operating mechanism 140a may be operated by the operating mechanism 140b so that the optical component 111 is separated from the supporting portion 120b of the supporting mechanism 130 b. Thereby, the 2 nd state in which the optical component 111 is supported by the operating mechanisms 140a and 140b is achieved.
Next, as shown in fig. 4 (d), the operating mechanism 140a may be operated so that the supporting portion 120a of the supporting mechanism 130a and the optical part 111 are brought into contact. In this state, the optical component 111 is supported by the support portion 120b of the support mechanism 130b and the operating mechanism 140 b. Next, as shown in fig. 4 (e), the operating mechanism 140b may be operated so that the supporting portion 120b of the supporting mechanism 130b and the optical part 111 are brought into contact. Thereby, the optical component 111 is supported by the supporting portions 120a and 120b of the supporting mechanisms 130a and 130b in the 1 st state. That is, in the examples of fig. 4 (a) to 4 (e), the state of the optical component 111 changes from the 1 st state to the 1 st state through the 2 nd state.
Fig. 5 is a cross-sectional view taken along line C-C of fig. 4 (b). The operating mechanism 140 preferably moves only in the 2 nd direction 203, but in reality, the operating mechanism 140 may move in the 1 st direction 202 during operation in the 2 nd direction 203 due to machining errors, assembly errors, adjustment residuals, and the like, as illustrated in fig. 5. When the operation unit 142 moves in the 1 st direction 202, the operation forces 151, 161, and 171 in the 1 st direction 202 act on the connection unit 145 connected to the operation unit 142, the contact unit 141 connected to the connection unit 145, and the optical component 111. Fig. 6 is a D-D sectional view of fig. 4 (b). Since the position of the optical component 111 in the 1 st direction 202 is restricted by the support mechanism 130, the reaction force 172 against the operation force 171 acts on the optical component 111, and the optical component 111 does not move. Further, the contact portion 141 does not move due to receiving the reaction force against the operation force 161 from the optical component 111.
The 1 st segment 146 receives an operating force 151 from the operating portion 142 and moves relative to the 2 nd segment 147 in the 1 st direction 202. The 2 nd portion 147 receives the operation force 152 in the 1 st direction 202 by the reaction of the movable resistance as the 1 st portion 146 moves, but does not move by receiving the reaction force against the operation force 152 from the contact portion 141.
As described above, the 1 st segment 146 moves in the 1 st direction 202 along with the movement of the operating portion 142 in the 1 st direction 202. The force due to the reaction of the movable resistance and the force due to the reaction force from the support mechanism 130 balance the No. 2 part 147, the contact portion 141, and the optical component 111, and do not move and remain at the original positions. At this time, the magnitude of the operation force 171 and the reaction force 172 acting on the optical component 111 is equal to the magnitude of the movable resistance.
When stress acts on the optical component 111 due to the operating force 171 and the reaction force 172 acting on the optical component 111, distortion may occur in the optical component 111, and the optical performance of the optical component 111 may be degraded. Therefore, it is preferable to suppress the operation force 171 and the reaction force 172 to be small. The operating mechanism 140 includes a connecting portion 145, and is capable of suppressing the operating force 171 and the reaction force 172 to be small by reducing the movable resistance. As a result, stress acting on the optical component 111 is suppressed to be small, distortion occurring in the optical component 111 is reduced, and degradation of the optical performance of the optical component 111 is suppressed.
Fig. 7 shows a 1 st configuration example of the coupling portion 145. The coupling portion 145 may include a 1 st portion 246 fixed to the operating portion 142, and a 2 nd portion 247 fixed to the contact portion 141. The 1 st section 246 is relatively movable with respect to the 2 nd section 247. The coupling portion 145 may include an elastic portion that can relatively move the operation portion 142 and the contact portion 141 with respect to the 1 st direction 202. In one example, the 1 st portion 246 may be formed of such a resilient portion. In another example, the 2 nd portion 247 may be formed of such an elastic portion. In yet another example, the 1 st portion 246 and the 2 nd portion 247 may be formed of such elastic portions.
Fig. 7 shows an example in which the 1 st portion 246 is formed of an elastic portion. The magnitude of the resistance force (also referred to as deformation resistance force) when the 1 st segment 246 is deformed may be equal to or smaller than the magnitude of the operation force 251 received by the 1 st segment 246 from the operation portion 142. The 1 st segment 246 receives an operating force 251 from the operating portion 142 and deforms in the 1 st direction 202. The 2 nd portion 247 receives the operation force 252 in the 1 st direction 202 due to the reaction of the deformation resistance as the 1 st portion 246 is deformed, but does not move due to the reaction force against the operation force 252 received from the contact portion 141. The contact portion 141 and the optical component 111 are balanced inside by a force due to the reaction of the deformation resistance and a force due to the reaction force from the support mechanism 130, and remain at their original positions without moving.
At this time, the magnitude of the operation force 271 acting on the optical component 111 and the magnitude of the reaction force from the support mechanism 130 are equal to the magnitude of the deformation resistance. Therefore, by reducing the deformation resistance, the operation force 271 and the reaction force from the support mechanism 130 can be suppressed to be small. As a result, stress acting on the optical component 111 is suppressed to be small, distortion occurring in the optical component 111 is reduced, and degradation of the optical performance of the optical component 111 is suppressed.
Fig. 8 (a) to 8 (c) show other configuration examples and operation examples of the support mechanism 130. The support mechanism 130 may include a support portion 120 that supports the optical component 111, position regulating portions 131 and 132 that regulate the position of the optical component 111 in the 1 st direction 202, and changing mechanisms 133 and 135 that change the positions of the position regulating portions 131 and 132, respectively. Fig. 8 (a) to 8 (c) show a step of positioning the optical component 111 in the 1 st direction 202 by pressing the optical component 111 in a state where stress applied to the region of the optical component 111 in contact with the position regulating portions 131 and 132 is in a predetermined stress state.
Fig. 8 (a) is a cross-sectional view taken along line E-E of fig. 4 (c). Fig. 8 (b) shows a state in which the positions of the position regulating portions 131 and 132 are changed to positions away from the optical component 111 by the changing mechanisms 133 and 135 from the state of fig. 8 (a). By changing the positions of the position regulating portions 131, 132 to positions away from the optical component 111, the stress acting on the optical component 111 due to the contact of the position regulating portions 131, 132 and the optical component 111 is removed. At this time, the optical component 111 may move in the 1 st direction 202 due to a stress state before the stress is removed. Fig. 8 (b) illustrates a state in which the optical component 111 is moved to the position regulating portion 132 side.
Fig. 8 (c) shows a state in which the optical component 111 is arranged at a predetermined position by changing the positions of the position regulating portions 131 and 132 to positions at which the position regulating portions 131 and 132 abut against the optical component 111 by the changing mechanisms 133 and 135 from the state of fig. 8 (b). In this example, the position of the position regulating portion 132 is changed so that the optical component 111 is moved while the optical component 111 is pressed from the position indicated by the broken line (the position of (b) in fig. 8) to the predetermined position indicated by the solid line after the position regulating portion 132 comes into contact with the optical component 111.
After the positions of the position regulating portions 131 and 132 are changed by the changing mechanisms 133 and 135, the contact portion 141 that is in contact with the optical component 111 and the 2 nd portion 147 connected to the contact portion 141 move together with the optical component 111. On the other hand, since the frictional resistance between the 1 st portion 146 and the operating portion 142 acts on the 1 st portion 146, the 1 st portion 146 does not move. The pressing force 181 of pressing the optical part 111 by the position regulating portion 132 is equal to the magnitude of the resistance (which is also referred to as pressing resistance) when the 2 nd part 147 moves relatively with respect to the 1 st part 146.
When stress acts on the optical component 111 due to the pressing force 181 acting on the optical component 111, distortion may occur in the optical component 111, and the optical performance of the optical component 111 may be degraded, so it is preferable to suppress the pressing force 181 to be small. The operating mechanism 140 includes the connecting portion 145 that can relatively move the operating portion 142 and the contact portion 141, and thus pressing resistance can be reduced, and the pressing force 181 can be kept small. As a result, stress acting on the optical component 111 is suppressed to be small, distortion occurring in the optical component 111 is reduced, and degradation of the optical performance of the optical component 111 is suppressed.
Fig. 9 is a front view of an optical device 300 according to example 1 of embodiment 1. The optical device 300 may include a mirror 311 as an optical component, support mechanisms 330a and 330b for supporting the mirror 311, and operation mechanisms 340a and 340b for operating the mirror 311. The optical device 300 may further include a lens barrel 301 to which the support mechanisms 330a and 330b and the operation mechanisms 340a and 340b are fixed.
Fig. 10 is a sectional view F-F of fig. 9. The supporting mechanism 330a may include: metal bodies 331, 332 having protrusions for regulating the position of the mirror 311 with respect to the 1 st direction 402 parallel to the optical axis of the mirror 311; and a metal body 320 with an elastic body having an elastic sheet on a surface thereof for supporting the weight of the mirror 311. The support mechanism 330b has the same structure as the support mechanism 330 a. The support mechanisms 330a, 330b may be symmetrically arranged with respect to the axis of symmetry 310 of the optical device 300. The axis of symmetry 310 may be configured to pass through the center (optical axis) of the mirror 311.
Fig. 11 is a G-G sectional view of fig. 9. The operating mechanism 340 may include an elastic body-attached metal body 341 that contacts the mirror 311, a bolt (operating portion) 342 that is movable in the 2 nd direction 203 parallel to the direction of gravity, and a coupling portion 345 that couples the elastic body-attached metal body 341 and the bolt 342. When the bolt 342 is screwed into the lens barrel 301 and the bolt 342 is rotated, the coupling portion 345 can be moved in the 203 st direction. When the connection portion 345 moves in the 2 nd direction 203, the metal body 341 with an elastic body connected to the connection portion 345 also moves in the 2 nd direction 203.
The connection part 345 may be a structural body having a linear guide having a degree of freedom with respect to the 1 st direction 202. The coupling portion 345 may include, for example, a rail portion 346 formed of a combination of a metal plate 348 and a rail 343, and a carriage portion 347 formed of a combination of a carriage 344 and a metal plate 349. In one example, the coefficient of dynamic friction of the linear guide is 0.003 at a load ratio of 0.1, and 0.02 in a state where the weight of the reflecting mirror 311 or the metal body 341 with an elastic body is applied. In the optical device 300, the stress applied to the mirror 311 may be a predetermined stress state by a series of steps shown in fig. 4 (a) to 4 (e).
Fig. 12 is a D-D sectional view of an exposure apparatus 300 for performing the step (b) of fig. 4. Here, the bolt 342, the coupling portion 345, and the metal body 341 with elastic body may slightly move in the 1 st direction 202 due to a machining error, an assembly error, an adjustment error, and the like, in addition to the movement in the 2 nd direction 203. Therefore, in fig. 12, for convenience of explanation, a state is shown in which the bolt 342 moves in the 1 st direction 202 while moving in the 2 nd direction 203.
When the bolt 342 moves in the 1 st direction 202, the operation forces 351, 352, 361, and 371 act on the rail portion 346, the carriage portion 347, the metal body 341 with elastic body, and the mirror 311 in the 1 st direction 202. Since the position of the mirror 311 in the 1 st direction 202 is restricted by the support mechanisms 320 and 330, a reaction force against the operation force 371 acts on the mirror 311, and the mirror 311 does not move. The metal body 341 with an elastic body does not move by receiving a reaction force against the operation force 361 from the mirror 311. The rail portion 346 receives an operating force 351 from the bolt 342 and moves relative to the rail portion 347 in the 1 st direction 202. The carriage portion 347 receives the operation force 352 in the 1 st direction 202 by the reaction of the resistance of the linear guide while receiving the reaction force against the operation force 352 from the metal body 341 with an elastic body and does not move as the rail portion 346 moves.
As described above, the slide rail portion 346 moves in the 1 st direction 202 as the bolt 342 moves in the 1 st direction 202. The carriage 347, the metal body 341 with an elastic body, and the mirror 311 are balanced in the interior by the force due to the reaction of the resistance of the linear guide and the force due to the reaction force from the support mechanisms 320 and 330, and remain at their original positions without moving. At this time, the magnitude of the operation force 371 acting on the mirror 311 and the reaction force from the support mechanisms 320 and 330 is equal to the magnitude of the resistance of the linear guide.
In one example, the resistance of the linear guide is 0.02Mg when Mg is the sum of the weights applied to the linear guide by the mirror 311 and the metal body 341 with an elastic body. This is a size of 1/10 of a structure without the coupling portion 345, that is, a structure in which the bolt 342 and the metal body 341 with an elastic body are directly coupled (when the coefficient of dynamic friction between the bolt 342 and the metal body 341 with an elastic body is 0.2).
When stress is applied to the mirror 311 by the operation force 371 applied to the mirror 311 and the reaction force from the support mechanisms 320 and 330, distortion may occur in the mirror 311, and the optical performance of the mirror 311 may be degraded. Therefore, the operation force 371 and the reaction force from the support mechanisms 320 and 330 are preferably kept small. The operating mechanism 340 includes the connecting portion 345 that can relatively move the operating portion 342 and the contact portion 341, so that the coefficient of dynamic friction of the linear guide can be reduced, and the operating force 371 and the reaction force 372 from the support mechanism 330 can be suppressed to be small. As a result, stress acting on the mirror 311 is suppressed to be small, distortion occurring in the mirror 311 is reduced, and degradation of the optical performance of the mirror 311 is suppressed.
Fig. 13 is a front view of an optical device 500 according to example 2 of embodiment 1. The optical device 500 may include a mirror 511 as an optical component, support mechanisms 530a and 530b for supporting the mirror 511, and operation mechanisms 540a and 540b for operating the mirror 511. The optical device 500 may further include a lens barrel 501 to which the support mechanisms 530a and 530b and the operation mechanisms 540a and 540b are fixed. The structure of the support mechanisms 530a, 530b may be the same as the support mechanisms 330a, 330b of the optical device 300.
Fig. 14 is a perspective view of the operating mechanism 540. Fig. 15 is a sectional view H-H of fig. 13. The operating mechanism 540 may include: an elastic body-attached metal body (contact portion) 541 having an elastic sheet on a surface thereof for supporting the weight of the mirror 511; and a linear actuator 542 having a stepping motor that drives the movable portion in the 2 nd direction parallel to the direction of gravity. The metal body (contact portion) 541 and the linear actuator 542 are coupled to each other by a coupling portion having a plate spring 543 and metal bodies 546, 547, 548. The linear actuator 542 is fixed to the lens barrel 501. When the linear actuator 542 is driven, the connecting portion 545 can be moved in the 2 nd direction 203. The elastic body-attached metal body 541 also moves in the 2 nd direction 603 with the movement of the connection portion 545. In the optical device 500, the stress applied to the mirror 511 is also in a predetermined stress state by a series of steps shown in fig. 4 (a) to 4 (e).
Fig. 16 is a D-D sectional view of an optical device 500 according to example 2 in which the process of fig. 4 (b) is performed. Here, the movable portion of the linear actuator 542, the connecting portion 545, and the metal body 541 with elastic body may move in the 1 st direction 202 due to a machining error, an assembly error, an adjustment error, and the like, in addition to the 2 nd direction 203. Therefore, in fig. 16, for convenience of explanation, the linear actuator 542 has a drive component in the 1 st direction 202 in addition to the 2 nd direction 203 in which the movable portion thereof is driven.
When the linear actuator 542 drives the movable portion thereof in the 2 nd direction 202, the operating forces 551, 552, 561, 571 in the 2 nd direction 202 act on the plate spring 543, the metal body 547, the elastic body-attached metal body 541, and the mirror 511. Since the position of the mirror 511 in the 1 st direction 202 is regulated by the support mechanisms 520 and 530, a reaction force against the operation force 571 acts on the mirror 511, and the mirror 511 does not move. The elastic body-attached metal body 541 does not move due to receiving a reaction force against the operation force 561 from the reflecting mirror 511. The plate spring 543 receives the operating force 551 from the linear actuator 542 and deforms in the 1 st direction 202. The metal body 547 receives the operation force 552 in the 2 nd direction 202 by the elastic force of the plate spring 543 as the plate spring 543 deforms, but does not move by receiving the reaction force against the operation force 552 from the elastic body-attached metal body 541.
As described above, as the linear actuator 542 moves the movable portion thereof in the 1 st direction 202, the plate spring 543 is deformed in the 1 st direction 202. The metal body 547, the metal body 541 with elastic body, and the mirror 511 are balanced in the interior by the elastic force of the plate spring 543 and the force due to the reaction force from the support mechanisms 520 and 530, and are not moved and left at their original positions.
At this time, the magnitude of the operation force 571 and the reaction force acting on the mirror 511 is equal to the magnitude of the elastic force of the plate spring 543.
In one example, the maximum deformation amount of the plate spring 543 in the 1 st direction 202 is 0.10mm, the size of the deformed portion of the plate spring 543 is 80mm × 67mm, the thickness is 1.6mm, and the material is stainless steel SUS304 for spring having a specific gravity of 7.9 and a young's modulus of 186 GPa. In this case, the elastic force of the plate spring 543 is about 10N.
In the configuration without the connection portion 545, that is, the configuration in which the linear actuator 542 and the metal body 541 with an elastic body are directly connected, the operating force 571 acting on the mirror 511 is 1000N under the condition described below.
< condition > the sum of the weights of the mirror 511 and the metal body 541 with an elastic body acting on the linear actuator 542 is 500kgf, and the coefficient of dynamic friction of the linear actuator 542 and the metal body 541 with an elastic body is 0.2.
When a stress is applied to the mirror 511 by the operating force 571 applied to the mirror 511 and the reaction force from the support mechanisms 520 and 530, the mirror 511 may be distorted, and the optical performance of the mirror 511 may be degraded. Therefore, the operation force 571 and the reaction force 572 are preferably kept small. The operating mechanism 540 includes a connecting portion 545 that can relatively move the linear actuator 542 and the metal body 541, and thus can suppress the operating force 571 and the reaction force from the support mechanisms 520 and 530 to be small. As a result, stress acting on the mirror 511 is suppressed to be small, distortion occurring in the mirror 511 is reduced, and degradation of optical performance of the mirror 511 is suppressed.
Fig. 17 is a front view of an optical device 700 according to example 3 of embodiment 1. The optical device 700 may include a mirror 711 as an optical component, support mechanisms 730a and 730b for supporting the mirror 711, and operation mechanisms 740a and 740b for operating the mirror 711. The optical apparatus 700 may further include a lens barrel 701 to which the support mechanisms 730a and 730b and the operation mechanisms 740a and 740b are fixed.
Fig. 18 is a sectional view taken along line I-I of fig. 17. The support mechanism 730a may include air cylinders 734 and 736 as changing mechanisms for driving the position restricting portions 731 and 732 in the 1 st direction 202 parallel to the optical axis of the mirror 711. The support mechanism 730a may further include metal housings 733, 735 for fixing the cylinders 734, 736 to the lens barrel 701. The support mechanism 730b may have the same structure as the support mechanism 730 a. The support mechanisms 730a, 730b may be symmetrically arranged with respect to the axis of symmetry 710 of the optical device 700. The axis of symmetry 710 may be configured to pass through the center (optical axis) of the mirror 711. The actuators 740a and 740b may have the same structure as the actuators 540a and 540b of embodiment 2. In the optical device 700, the stress applied to the mirror 711 is also in a predetermined stress state by a series of steps from fig. 4 (a) to fig. 4 (e).
Fig. 19 (a) to 19 (c) show a step of positioning the mirror 711 in the 1 st direction 202 by pressing the mirror 711 in a state where stress applied to the region of the mirror 711 in contact with the position restricting portions 731 and 732 is in a predetermined stress state. Fig. 19 (a) is an E-E sectional view of the optical device 700 in the step (c) in fig. 4. Fig. 19 (b) shows a state in which the positions of the position restricting portions 731 and 732 are changed from the state of fig. 19 (a) to the positions away from the mirror 711 by the air cylinders 734 and 736. By changing the positions of the position restricting portions 131, 132 to positions away from the mirror 711, the stress acting on the mirror 711 due to the contact of the position restricting portions 131, 132 and the mirror 711 is removed.
Fig. 19 (c) shows a state in which the position of the position regulating portions 131 and 132 is changed by the air cylinders 734 and 736 to a position at which the position regulating portions 131 and 132 abut the mirror 711 from the state of fig. 19 (b), and the mirror 711 is disposed at a predetermined position. When the position regulating portions 131 and 132 are driven by the air cylinders 734 and 736 and the mirror 711 is pressed, the elastic body-attached metal body 541 supporting the mirror 711 and the metal body 547 coupled to the elastic body-attached metal body 541 move together with the mirror 711. On the other hand, the plate spring 543 deforms as the metal body 547 moves. The pressing force 781 of the cylinders 734 and 736 pressing the reflecting mirror 711 is equal to the elastic force of the plate spring 543.
In one example, the elastic force of the plate spring 543 is about 10N when the plate spring 543 having the size, material, and maximum deformation amount described in embodiment 2 is used. In the configuration without the coupling portion 545, that is, the configuration in which the linear actuator 542 and the metal body 541 with an elastic body are directly coupled, the pressing force 781 required to press and drive the mirror 711 is 1000N under the conditions described below.
< condition > the sum of the weights of the mirror 711 and the metal body 541 with elastic body acting on the linear actuator 542 is 500kgf, and the coefficient of dynamic friction of the linear actuator 542 and the metal body 541 with elastic body is 0.2.
When stress acts on the mirror 711 due to the pressing force 781 acting on the mirror 711, distortion may occur in the mirror 711, and the optical performance of the mirror 711 may be degraded. Therefore, the pressing force 781 is preferably suppressed to be small. The operating mechanism 740 includes a connecting portion 545 that can relatively move the linear actuator 542 and the metal body 541, and thus can suppress the pressing force 781 to a small value. As a result, stress acting on the mirror 711 is suppressed to be small, distortion occurring in the mirror 711 is reduced, and deterioration in optical performance of the mirror 711 is suppressed.
Fig. 20 is a side view of an exposure apparatus 1000 according to embodiment 2 of the present invention. The exposure apparatus 1000 may include an illumination apparatus 1100, an exposure pattern forming apparatus 1200, a projection optical apparatus (projection optical system) 1300, a stage apparatus 1400, and an electric control apparatus 1500. The illumination apparatus 1100, the exposure pattern forming apparatus 1200, the projection optical apparatus 1300, the stage apparatus 1400, and the electric control apparatus 1500 may be housed in the chamber 1600. An optical device represented by the optical device 100 and the like of embodiment 1 may constitute, for example, a part of the projection optical device 1300.
The electrical control device 1500 performs electrical control for maintaining the temperature of the illumination device 1100, the exposure pattern forming device 1200, the projection optical device 1300, the stage device 1400, and the internal space of the chamber 1600 in a predetermined temperature range. In addition, during exposure, electrical control is performed for interlocking the operating units of the illumination apparatus 1100, the exposure pattern forming apparatus 1200, the projection optical apparatus 1300, and the stage apparatus 1400.
The exposure light generated by the illumination apparatus 1100 is irradiated to the exposure pattern forming apparatus 1200 to form an exposure pattern. The exposure pattern is projected onto a substrate (wafer or glass plate) mounted on a stage of the stage apparatus 1400 by the projection optical apparatus 1300.
The optical component 111 constituting the optical apparatus 100 greatly affects the imaging performance when the exposure pattern formed by the exposure pattern forming apparatus is imaged on a wafer or a glass plate as a part of the optical system constituting the projection optical apparatus 1300. Therefore, when stress acts on the optical component 111, there is a possibility that distortion occurs in the optical component 111 and the imaging performance is degraded. In the optical device 100, since the stress acting on the optical component 111 is suppressed to be small, distortion occurring in the optical component 111 is reduced. As a result, deterioration of the imaging performance of the optical component 111 can be suppressed to be small, and the exposure apparatus 1000 having good imaging performance can be provided.
Fig. 21 is a side view of an exposure apparatus 2000 according to embodiment 3 of the present invention. The exposure apparatus 2000 may include an illumination unit 2100, an exposure mask unit 2200, a projection unit (projection optical system) 2300, a stage unit 2400, and an electric control unit 2500. The illumination unit 2100, the exposure mask unit 2200, the projection unit 2300, the stage unit 2400, and the electric control unit 2500 may be accommodated in the chamber 2600. An optical device such as the optical device 300 according to embodiment 1 may constitute a part of the projection unit 2300.
The electrical control unit 2500 performs electrical control for maintaining the temperature of the illumination unit 2100, the exposure mask unit 2200, the projection unit 2300, the stage unit 2400, and the internal space of the chamber 2600 in a predetermined temperature range. Specifically, the electric control unit 2500 may perform feedback control of the temperature of the clean dry air supplied to each component, based on the value of the temperature sensor disposed in the internal space of each component.
In performing exposure, it is necessary to synchronize the operations of the respective members described below. The operation of the illumination means is the timing and the irradiation time of the illumination light. The operation of the exposure mask unit 2200 is timing and speed of scanning the exposure mask constituting the exposure mask unit 2200. The operation of the projection unit 2300 is based on the timing and speed of driving the optical system in the projection optical system constituting the projection unit 2300. The operation of the mounting table member 2400 is the timing and speed of driving the mounting table constituting the mounting table member 2400. The electric control unit 2500 performs electric control for synchronizing the operations of the above-described components.
The exposure light generated by the illumination means 2100 is irradiated to the exposure mask 2201 constituting the exposure mask means 2200, and transmits through the exposure mask, thereby forming an exposure pattern having the exposure mask as an object plane. The exposure pattern is projected by the projection unit 2300 onto the glass plate 2401 mounted on the stage of the stage unit 2400.
The mirror 311 constituting the optical device 300 is a part of the projection optical system 2301 constituting the projection unit 2300, and largely affects the imaging performance when the exposure light transmitted through the exposure mask 2201 is imaged on the resist applied to the glass plate 2401. Therefore, when stress acts on the mirror 311, there is a possibility that distortion occurs in the mirror 311, and the imaging performance is deteriorated. In the optical device 300, since the stress acting on the mirror 311 is suppressed to be small, distortion occurring in the mirror 311 is reduced. As a result, deterioration of the imaging performance of the mirror 311 can be suppressed to be small, and the exposure apparatus 2000 having good imaging performance can be provided.
Hereinafter, a method for manufacturing an article (a semiconductor IC device, a liquid crystal display device, a MEMS, or the like) using the exposure apparatus will be described. An article can be manufactured from a substrate after the exposure process by exposing the substrate (e.g., a wafer or a glass substrate) coated with a photosensitive agent to light using the exposure apparatus, developing the photosensitive agent of the substrate to form a pattern, and processing the substrate using the pattern. Other well known processes include etching, resist stripping, dicing, bonding, packaging, and the like. According to the article manufacturing method, articles having higher quality than conventional articles can be manufactured.
The present invention is not limited to the above embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the claims are appended to disclose the scope of the invention.
Claims (11)
1. An optical device is provided with:
an optical component;
a support mechanism having a support portion for supporting the optical component and a position regulating portion for regulating the position of the optical component in the 1 st direction; and
an operation mechanism for applying a force to the optical component in a 2 nd direction different from the 1 st direction to operate the optical component,
the operating mechanism includes: a contact portion that contacts the optical component; an operation portion that moves the contact portion in the 2 nd direction; and a coupling portion that couples the contact portion and the operation portion, the coupling portion being configured to relatively move the operation portion and the contact portion with respect to the 1 st direction.
2. The optical device according to claim 1,
the force required to relatively move the operating portion with respect to the contact portion with respect to the 1 st direction is smaller than the static frictional resistance acting between the optical part and the contact portion.
3. The optical device according to claim 1,
the apparatus further includes a changing mechanism that changes a position of the position regulating unit in the 1 st direction.
4. The optical device according to claim 1,
the coupling portion includes an elastic portion that is capable of relatively moving the operation portion and the contact portion with respect to the 1 st direction.
5. The optical device according to claim 1,
the coupling portion includes a linear guide that is capable of relatively moving the operation portion and the contact portion with respect to the 1 st direction.
6. The optical device according to claim 1,
the coupling portion includes a leaf spring that is capable of relatively moving the operation portion and the contact portion with respect to the 1 st direction.
7. The optical device according to claim 1,
the operating mechanism is configured to be capable of changing a state of the optical component, the state including a 1 st state in which the optical component is supported by the supporting mechanism and a 2 nd state in which the optical component is supported by the operating mechanism.
8. The optical device according to claim 7,
the state changes from the 1 st state to the 1 st state via the 2 nd state.
9. The optical device according to claim 7,
the operating mechanism includes a driving mechanism that operates to change the state from the 1 st state to the 1 st state via the 2 nd state.
10. An exposure apparatus including a projection optical system for projecting an exposure pattern onto a substrate,
the projection optical system includes the optical device according to any one of claims 1 to 9.
11. A method of manufacturing an article, comprising:
exposing the substrate coated with the photosensitive agent to light using the exposure apparatus according to claim 10;
a step of forming a pattern by developing the photosensitive agent; and
a step of processing the substrate using the pattern,
an article is manufactured according to the substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019057089A JP7227810B2 (en) | 2019-03-25 | 2019-03-25 | OPTICAL DEVICE, EXPOSURE DEVICE, AND PRODUCT MANUFACTURING METHOD |
| JP2019-057089 | 2019-03-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111736298A true CN111736298A (en) | 2020-10-02 |
| CN111736298B CN111736298B (en) | 2023-01-13 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010216319.3A Active CN111736298B (en) | 2019-03-25 | 2020-03-25 | Optical device, exposure device, and article manufacturing method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7227810B2 (en) |
| KR (1) | KR20200115200A (en) |
| CN (1) | CN111736298B (en) |
| TW (1) | TWI793403B (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP7227810B2 (en) | 2023-02-22 |
| TW202036073A (en) | 2020-10-01 |
| CN111736298B (en) | 2023-01-13 |
| TWI793403B (en) | 2023-02-21 |
| KR20200115200A (en) | 2020-10-07 |
| JP2020160164A (en) | 2020-10-01 |
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