TW200707093A - Photosensitive resin compositions, cured articles of the compositions, and films containing the compositions - Google Patents
Photosensitive resin compositions, cured articles of the compositions, and films containing the compositionsInfo
- Publication number
- TW200707093A TW200707093A TW095116440A TW95116440A TW200707093A TW 200707093 A TW200707093 A TW 200707093A TW 095116440 A TW095116440 A TW 095116440A TW 95116440 A TW95116440 A TW 95116440A TW 200707093 A TW200707093 A TW 200707093A
- Authority
- TW
- Taiwan
- Prior art keywords
- compositions
- meth
- photosensitive resin
- compound
- hydroxyl groups
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/254—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of protective topcoat layers
- G11B7/2542—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of protective topcoat layers consisting essentially of organic resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2115/00—Oligomerisation
- C08G2115/02—Oligomerisation to isocyanurate groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Medicinal Chemistry (AREA)
- Ceramic Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
- Polyurethanes Or Polyureas (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
To provide a photosensitive resin composition suitable for hard coats which permits thick coating with low curling and little causes crack, and to provide a resin composition for the protective coating for high-density optical discs which is excellent in transparency and the resistance to water absorption and which exhibits high endurance with little warpage, and cured articles of the composition. A photosensitive resin obtained by reacting an isocyanate compound (A) prepared by reacting a diisocyanate compound (a) with an alcohol compound (b) having at least two hydroxyl groups in the molecule or an isocyanate compound (A') derived from a diisocyanate compound (a) by converting either of the isocyanate groups into an isocyanurate ring structure with a mixture (B) of polyfunctional (meth)acrylate compounds, namely, polyhydric alcohol (meth)acrylates, which mixture comprises a polyhydric alcohol (meth)acrylate having one or more hydroxyl groups and a polyhydric alcohol (meth)acrylate wherein all the hydroxyl groups are esterified.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005139216 | 2005-05-12 | ||
JP2005177123 | 2005-06-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200707093A true TW200707093A (en) | 2007-02-16 |
TWI382998B TWI382998B (en) | 2013-01-21 |
Family
ID=37396397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095116440A TWI382998B (en) | 2005-05-12 | 2006-05-09 | A protective coating agent for a disc, a hardened product thereof and a film containing the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5209310B2 (en) |
KR (1) | KR101299025B1 (en) |
CN (1) | CN101171278B (en) |
TW (1) | TWI382998B (en) |
WO (1) | WO2006120887A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI677736B (en) * | 2015-03-31 | 2019-11-21 | 日商日東電工股份有限公司 | Liquid crystal panel and image display device |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008248069A (en) * | 2007-03-30 | 2008-10-16 | Sanyo Chem Ind Ltd | Active energy ray-curable resin composition for hard-coating use |
CN101382668B (en) * | 2007-09-04 | 2010-09-08 | 成都博深高技术材料开发有限公司 | Temperature sensitive light modulation material, method for making same and optical device composed of the same |
JP5568832B2 (en) * | 2007-09-28 | 2014-08-13 | 大日本印刷株式会社 | Curable resin composition and hard coat film |
JP5187006B2 (en) * | 2008-06-04 | 2013-04-24 | 横浜ゴム株式会社 | Curable resin composition |
EP2218744A1 (en) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Method of manufacturing holographic photopolymers on polymer films |
JP5448152B2 (en) * | 2009-07-16 | 2014-03-19 | 日本化薬株式会社 | Ultraviolet curable resin composition for optical disc and cured product thereof |
KR101719844B1 (en) * | 2009-07-23 | 2017-03-24 | 우베 고산 가부시키가이샤 | Aqueous polyurethane resin dispersion and method for producing the same |
JP5456460B2 (en) * | 2009-12-25 | 2014-03-26 | 第一工業製薬株式会社 | Energy ray curable paint |
JP5377373B2 (en) * | 2010-03-12 | 2013-12-25 | 積水化成品工業株式会社 | Modified urethane resin particles, method for producing the same, and light diffusion film |
KR102019580B1 (en) * | 2010-12-24 | 2019-09-06 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | Photosensitive resin composition |
JP2012229412A (en) * | 2011-04-13 | 2012-11-22 | Nippon Synthetic Chem Ind Co Ltd:The | Resin composition and coating agent |
JP5728290B2 (en) * | 2011-05-12 | 2015-06-03 | ディーエイチ・マテリアル株式会社 | Encapsulant and molded article, optical member and light emitting diode using the same |
JP5695622B2 (en) * | 2012-09-24 | 2015-04-08 | 株式会社タムラ製作所 | Black curable resin composition |
KR102130700B1 (en) | 2013-05-30 | 2020-07-07 | 삼성디스플레이 주식회사 | Window for display device and display device including the window |
KR102130533B1 (en) | 2014-01-24 | 2020-07-06 | 동우 화인켐 주식회사 | The a colored photosensitive resin composition for forming the frontal light shielding layer of a display device |
JP6388116B2 (en) * | 2014-09-17 | 2018-09-12 | 東亞合成株式会社 | Curable composition |
KR102065717B1 (en) * | 2016-12-26 | 2020-01-13 | 주식회사 엘지화학 | Polarizer protecting film, polarizer plate comprising the same, liquid crystal display comprising the polarizer plate, and coating composition for polarizer protecting film |
WO2019231491A1 (en) * | 2018-06-01 | 2019-12-05 | Dsm Ip Assets, B.V. | Radiation curable compositions for coating optical fiber and the coatings produced therefrom |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61207423A (en) * | 1985-03-12 | 1986-09-13 | Sanyo Kokusaku Pulp Co Ltd | Production of urethane (meth)acrylate compound |
JP2665809B2 (en) * | 1989-10-27 | 1997-10-22 | ダイセル化学工業株式会社 | Polyfunctional urethane acrylate |
JPH03273017A (en) * | 1990-03-20 | 1991-12-04 | Toyobo Co Ltd | Radiation-curable resin and its composition |
JP3251608B2 (en) * | 1991-06-17 | 2002-01-28 | 広栄化学工業株式会社 | Method for producing urethane (meth) acrylate oligomer and photocurable resin composition using the same |
JP3079117B2 (en) * | 1992-06-18 | 2000-08-21 | ダイセル・ユーシービー株式会社 | Active energy ray-curable resin composition |
JP2000007741A (en) * | 1998-06-25 | 2000-01-11 | Kyoeisha Chem Co Ltd | High-refractive-index resin composition excellent in scratch resistance |
JP4271840B2 (en) * | 1999-11-10 | 2009-06-03 | パナソニック株式会社 | optical disk |
JP3993139B2 (en) * | 2003-06-23 | 2007-10-17 | シャープ株式会社 | Data storage |
KR20060079793A (en) * | 2003-08-26 | 2006-07-06 | 니폰 가야꾸 가부시끼가이샤 | Ultraviolet-curing resin compostion and cured product thereof |
-
2006
- 2006-04-25 WO PCT/JP2006/308607 patent/WO2006120887A1/en active Application Filing
- 2006-04-25 KR KR1020077025950A patent/KR101299025B1/en not_active IP Right Cessation
- 2006-04-25 JP JP2007528210A patent/JP5209310B2/en not_active Expired - Fee Related
- 2006-04-25 CN CN2006800158019A patent/CN101171278B/en not_active Expired - Fee Related
- 2006-05-09 TW TW095116440A patent/TWI382998B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI677736B (en) * | 2015-03-31 | 2019-11-21 | 日商日東電工股份有限公司 | Liquid crystal panel and image display device |
Also Published As
Publication number | Publication date |
---|---|
JP5209310B2 (en) | 2013-06-12 |
KR20080005412A (en) | 2008-01-11 |
CN101171278A (en) | 2008-04-30 |
TWI382998B (en) | 2013-01-21 |
KR101299025B1 (en) | 2013-08-27 |
WO2006120887A1 (en) | 2006-11-16 |
JPWO2006120887A1 (en) | 2008-12-18 |
CN101171278B (en) | 2011-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |