TW200621755A - Oxime ester compound and photopolymerization initiator containing such compound - Google Patents
Oxime ester compound and photopolymerization initiator containing such compoundInfo
- Publication number
- TW200621755A TW200621755A TW094127422A TW94127422A TW200621755A TW 200621755 A TW200621755 A TW 200621755A TW 094127422 A TW094127422 A TW 094127422A TW 94127422 A TW94127422 A TW 94127422A TW 200621755 A TW200621755 A TW 200621755A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- photopolymerization initiator
- compound
- oxime ester
- ester compound
- Prior art date
Links
- -1 Oxime ester compound Chemical class 0.000 title abstract 3
- 239000003999 initiator Substances 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- 125000000623 heterocyclic group Chemical group 0.000 abstract 3
- 125000005843 halogen group Chemical group 0.000 abstract 2
- 238000006116 polymerization reaction Methods 0.000 abstract 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 abstract 1
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 229910052711 selenium Inorganic materials 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 125000004434 sulfur atom Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
- C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
- C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D421/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms
- C07D421/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms containing two hetero rings
- C07D421/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having selenium, tellurium, or halogen atoms as ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Indole Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004241370 | 2004-08-20 | ||
JP2005148007 | 2005-05-20 | ||
JP2005201128 | 2005-07-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200621755A true TW200621755A (en) | 2006-07-01 |
TWI350835B TWI350835B (zh) | 2011-10-21 |
Family
ID=35907363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094127422A TW200621755A (en) | 2004-08-20 | 2005-08-12 | Oxime ester compound and photopolymerization initiator containing such compound |
Country Status (8)
Country | Link |
---|---|
US (1) | US7696257B2 (zh) |
EP (1) | EP1780209B1 (zh) |
JP (1) | JP3992725B2 (zh) |
KR (1) | KR100799043B1 (zh) |
CN (1) | CN1805955B (zh) |
DE (1) | DE602005019888D1 (zh) |
TW (1) | TW200621755A (zh) |
WO (1) | WO2006018973A1 (zh) |
Families Citing this family (40)
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JP4948112B2 (ja) * | 2006-10-13 | 2012-06-06 | 株式会社Adeka | オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
WO2008059670A1 (fr) * | 2006-11-15 | 2008-05-22 | Taiyo Ink Mfg. Co., Ltd. | Composition de résine photodurcissable/thermodurcissable, object durci et plaque de câblage imprimée |
US20090292039A1 (en) * | 2006-12-27 | 2009-11-26 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing the same |
ATE526321T1 (de) | 2007-05-09 | 2011-10-15 | Adeka Corp | Neue epoxidverbindung, alkalisch entwickelbare harzzusammensetzung und alkalisch entwickelbare lichtempfindliche harzzusammensetzung |
KR101526618B1 (ko) * | 2007-05-11 | 2015-06-05 | 바스프 에스이 | 옥심 에스테르 광개시제 |
JP5054456B2 (ja) * | 2007-07-26 | 2012-10-24 | 株式会社Adeka | 重合性液晶化合物及びラジカル光重合開始剤を含有する重合性組成物 |
EP2175320B1 (en) | 2007-08-01 | 2013-03-13 | Adeka Corporation | Alkali-developable photosensitive resin composition |
JP2009128419A (ja) * | 2007-11-20 | 2009-06-11 | Asahi Kasei Electronics Co Ltd | 感光性樹脂組成物および積層体 |
WO2009104468A1 (ja) | 2008-02-22 | 2009-08-27 | 株式会社Adeka | 重合性化合物を含有する液晶組成物及び該液晶組成物を用いた液晶表示素子 |
JP5058039B2 (ja) * | 2008-03-18 | 2012-10-24 | 株式会社Dnpファインケミカル | 着色層形成用感光性樹脂組成物 |
JP2009237294A (ja) * | 2008-03-27 | 2009-10-15 | The Inctec Inc | ブラックマトリクス形成用感光性樹脂組成物 |
JP5507054B2 (ja) * | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
EP2261201B1 (en) | 2008-04-01 | 2018-05-30 | DIC Corporation | Trifunctional (meth)acrylate compound and polymerizable composition containing the compound |
CN101918397B (zh) * | 2008-04-10 | 2013-11-06 | 株式会社Lg化学 | 光活性化合物以及含有该光活性化合物的感光性树脂组合物 |
JP2009275166A (ja) * | 2008-05-16 | 2009-11-26 | Jsr Corp | 液晶表示素子用シール剤及び液晶表示素子 |
KR101121038B1 (ko) * | 2008-07-01 | 2012-03-15 | 주식회사 엘지화학 | 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치 |
JP5284735B2 (ja) | 2008-09-18 | 2013-09-11 | 株式会社Adeka | 重合性光学活性イミド化合物及び該化合物を含有する重合性組成物 |
JP5448157B2 (ja) * | 2009-03-13 | 2014-03-19 | 株式会社Adeka | 芳香族スルホニウム塩化合物 |
KR101403153B1 (ko) * | 2009-03-16 | 2014-06-09 | 동우 화인켐 주식회사 | 단파장 레이저 노광 장치용 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 액정 표시 장치 |
JP5422244B2 (ja) * | 2009-04-01 | 2014-02-19 | 東洋インキScホールディングス株式会社 | 感光性着色組成物およびカラーフィルタ |
KR20100109860A (ko) * | 2009-04-01 | 2010-10-11 | 도요 잉키 세이조 가부시끼가이샤 | 감광성 착색 조성물 및 컬러 필터 |
CN101525393B (zh) * | 2009-04-02 | 2011-04-27 | 优缔精细化工(苏州)有限公司 | 一种肟酯光引发剂及其制备方法 |
JP5152868B2 (ja) * | 2009-06-11 | 2013-02-27 | 日本化薬株式会社 | 可視光硬化性液晶シール剤及びそれを用いた液晶表示セル |
WO2010146883A1 (ja) * | 2009-06-17 | 2010-12-23 | 東洋インキ製造株式会社 | オキシムエステル化合物、ラジカル重合開始剤、重合性組成物、ネガ型レジストおよび画像パターン |
US8663497B2 (en) | 2009-11-18 | 2014-03-04 | Adeka Corporation | Liquid crystal composition comprising polymerizable compound, and liquid crystal display element using said liquid crystal composition |
TWI575311B (zh) * | 2011-03-08 | 2017-03-21 | 大賽璐股份有限公司 | 光阻製造用溶劑或溶劑組成物 |
JP5821401B2 (ja) * | 2011-08-19 | 2015-11-24 | 大日本印刷株式会社 | 光インプリント用感光性樹脂組成物、硬化物、レジスト基板及び半導体装置の製造方法 |
CN103064254B (zh) * | 2011-10-20 | 2017-11-17 | 日立化成株式会社 | 感光性树脂组合物、感光性元件、抗蚀图形的形成方法以及印刷电路板的制造方法 |
KR102006041B1 (ko) * | 2011-12-07 | 2019-07-31 | 바스프 에스이 | 옥심 에스테르 광개시제 |
WO2013167515A1 (en) | 2012-05-09 | 2013-11-14 | Basf Se | Oxime ester photoinitiators |
JP6464764B2 (ja) * | 2015-01-16 | 2019-02-06 | Jsr株式会社 | 感放射線性着色組成物、スペーサー、その形成方法及び液晶表示素子 |
JP6621643B2 (ja) * | 2015-10-22 | 2019-12-18 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する重合開始剤 |
KR101829998B1 (ko) * | 2015-11-04 | 2018-02-19 | 롬엔드하스전자재료코리아유한회사 | 착색 감광성 수지 조성물 및 이를 이용한 차광성 스페이서 |
EP3246378B1 (en) | 2016-05-17 | 2019-03-20 | Merck Patent GmbH | Polymerisable liquid crystal material and polymerised liquid crystal film |
CN109689840B (zh) * | 2016-09-07 | 2024-01-30 | 默克专利股份有限公司 | 液晶介质和光调制元件 |
CN109957046B (zh) * | 2017-12-22 | 2020-07-03 | 常州强力先端电子材料有限公司 | 含氟芴肟酯类光引发剂、包含其的光固化组合物及其应用 |
CN113004173B (zh) * | 2018-07-12 | 2022-06-21 | 维思普新材料(苏州)有限公司 | 肟酯化合物及其制造方法 |
JPWO2021200815A1 (zh) | 2020-03-30 | 2021-10-07 | ||
US20240025909A1 (en) | 2020-12-17 | 2024-01-25 | Adeka Corporation | Compound and composition |
CN117616337A (zh) | 2021-07-20 | 2024-02-27 | 株式会社艾迪科 | 半导体用膜形成材料、半导体用构件形成材料、半导体用工序构件形成材料、下层膜形成材料、下层膜及半导体器件 |
Family Cites Families (12)
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GB1180846A (en) | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
US4590145A (en) | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
JP3860170B2 (ja) * | 2001-06-11 | 2006-12-20 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 組み合わされた構造を有するオキシムエステルの光開始剤 |
JP4769461B2 (ja) * | 2002-12-03 | 2011-09-07 | チバ ホールディング インコーポレーテッド | ヘテロ芳香族基を有するオキシムエステル光開始剤 |
JP2005202252A (ja) | 2004-01-16 | 2005-07-28 | Dainippon Printing Co Ltd | 固体撮像素子カラーフィルター用感光性着色組成物、固体撮像素子カラーフィルター、固体撮像素子、及び固体撮像素子カラーフィルターの製造方法 |
CN1922142B (zh) * | 2004-02-23 | 2012-05-02 | 三菱化学株式会社 | 肟酯化合物、光聚合性组合物和使用该组合物的滤色器 |
JP4830310B2 (ja) * | 2004-02-23 | 2011-12-07 | 三菱化学株式会社 | オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター |
ATE381540T1 (de) * | 2004-08-18 | 2008-01-15 | Ciba Sc Holding Ag | Oximesther-fotoinitiatoren |
-
2005
- 2005-08-03 US US11/659,979 patent/US7696257B2/en active Active
- 2005-08-03 JP JP2006531510A patent/JP3992725B2/ja active Active
- 2005-08-03 KR KR1020057023916A patent/KR100799043B1/ko active IP Right Grant
- 2005-08-03 DE DE602005019888T patent/DE602005019888D1/de active Active
- 2005-08-03 WO PCT/JP2005/014190 patent/WO2006018973A1/ja active Application Filing
- 2005-08-03 CN CN2005800005625A patent/CN1805955B/zh active Active
- 2005-08-03 EP EP05768407A patent/EP1780209B1/en active Active
- 2005-08-12 TW TW094127422A patent/TW200621755A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
DE602005019888D1 (de) | 2010-04-22 |
CN1805955B (zh) | 2011-08-31 |
KR100799043B1 (ko) | 2008-01-28 |
US20070270522A1 (en) | 2007-11-22 |
EP1780209A4 (en) | 2009-06-03 |
KR20070044753A (ko) | 2007-04-30 |
EP1780209A1 (en) | 2007-05-02 |
JP3992725B2 (ja) | 2007-10-17 |
JPWO2006018973A1 (ja) | 2008-05-08 |
US7696257B2 (en) | 2010-04-13 |
CN1805955A (zh) | 2006-07-19 |
TWI350835B (zh) | 2011-10-21 |
WO2006018973A1 (ja) | 2006-02-23 |
EP1780209B1 (en) | 2010-03-10 |
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