ATE526321T1 - Neue epoxidverbindung, alkalisch entwickelbare harzzusammensetzung und alkalisch entwickelbare lichtempfindliche harzzusammensetzung - Google Patents
Neue epoxidverbindung, alkalisch entwickelbare harzzusammensetzung und alkalisch entwickelbare lichtempfindliche harzzusammensetzungInfo
- Publication number
- ATE526321T1 ATE526321T1 AT08752220T AT08752220T ATE526321T1 AT E526321 T1 ATE526321 T1 AT E526321T1 AT 08752220 T AT08752220 T AT 08752220T AT 08752220 T AT08752220 T AT 08752220T AT E526321 T1 ATE526321 T1 AT E526321T1
- Authority
- AT
- Austria
- Prior art keywords
- resin composition
- alkaline developable
- halogen atom
- epoxy compound
- light sensitive
- Prior art date
Links
- 239000004593 Epoxy Substances 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 title abstract 2
- 239000011342 resin composition Substances 0.000 title 2
- 125000005843 halogen group Chemical group 0.000 abstract 5
- 125000004432 carbon atom Chemical group C* 0.000 abstract 4
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
- C07D303/26—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds having one or more free hydroxyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/10—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/064—Polymers containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/144—Polymers containing more than one epoxy group per molecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
- C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
- C08G59/1461—Unsaturated monoacids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/182—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents
- C08G59/186—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents with acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Emergency Medicine (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Epoxy Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007124550 | 2007-05-09 | ||
PCT/JP2008/058210 WO2008139924A1 (ja) | 2007-05-09 | 2008-04-28 | 新規エポキシ化合物、アルカリ現像性樹脂組成物およびアルカリ現像性感光性樹脂組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE526321T1 true ATE526321T1 (de) | 2011-10-15 |
Family
ID=40002138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08752220T ATE526321T1 (de) | 2007-05-09 | 2008-04-28 | Neue epoxidverbindung, alkalisch entwickelbare harzzusammensetzung und alkalisch entwickelbare lichtempfindliche harzzusammensetzung |
Country Status (8)
Country | Link |
---|---|
US (1) | US8252512B2 (de) |
EP (1) | EP2145880B1 (de) |
JP (1) | JP5214598B2 (de) |
KR (1) | KR101450705B1 (de) |
CN (1) | CN101622236B (de) |
AT (1) | ATE526321T1 (de) |
TW (2) | TWI423960B (de) |
WO (1) | WO2008139924A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009185270A (ja) * | 2007-05-30 | 2009-08-20 | Nagase Chemtex Corp | 縮環構造含有樹脂 |
JP2010126693A (ja) * | 2008-11-28 | 2010-06-10 | Nagase Chemtex Corp | 非対称型の多官能水酸基含有縮環構造化合物及び縮環構造含有樹脂 |
JP5466863B2 (ja) * | 2009-03-04 | 2014-04-09 | 株式会社Adeka | 重合性化合物、これを含有する重合性組成物及びその重合体 |
JP5501679B2 (ja) * | 2009-07-02 | 2014-05-28 | 株式会社Adeka | 硬化性樹脂組成物及びその硬化物 |
JP5501710B2 (ja) * | 2009-09-18 | 2014-05-28 | 株式会社Adeka | 新規エピスルフィド化合物、該エピスルフィド化合物を含有する硬化性樹脂組成物及びその硬化物 |
JP5698072B2 (ja) * | 2011-05-18 | 2015-04-08 | 株式会社Adeka | エポキシ化合物、及びこれを含有する重合性組成物 |
JP5956159B2 (ja) * | 2012-01-13 | 2016-07-27 | 株式会社Adeka | グリシジルエーテルの製造方法 |
US9102597B2 (en) * | 2012-09-05 | 2015-08-11 | Sabic Global Technologies B.V. | Indane bisphenols, polymers derived therefrom, and methods of use thereof |
TWI641625B (zh) * | 2013-03-06 | 2018-11-21 | 日商艾迪科股份有限公司 | Photocurable composition |
JP6457719B2 (ja) * | 2013-03-06 | 2019-01-23 | 株式会社Adeka | 光硬化性組成物 |
CN106536589A (zh) * | 2014-07-22 | 2017-03-22 | 沙特基础工业全球技术有限公司 | 高热单体及其使用的方法 |
JP6423215B2 (ja) * | 2014-09-18 | 2018-11-14 | 株式会社Adeka | 光硬化性組成物 |
JP2016090797A (ja) * | 2014-11-05 | 2016-05-23 | 株式会社Adeka | 硬化性組成物 |
JP2016130288A (ja) * | 2015-01-14 | 2016-07-21 | 株式会社Adeka | 着色剤分散液、着色組成物及びカラーフィルタ |
JP2016193984A (ja) * | 2015-03-31 | 2016-11-17 | 株式会社Adeka | 樹脂及び該樹脂を用いた組成物 |
KR102322940B1 (ko) | 2016-10-28 | 2021-11-05 | 미쯔비시 케미컬 주식회사 | 탄소섬유용 사이징제, 탄소섬유용 사이징제의 수분산액, 및 사이징제 부착 탄소섬유속 |
CN109233661A (zh) * | 2017-05-05 | 2019-01-18 | 上海海优威新材料股份有限公司 | 基于辐照交联基材的新型多层粘结性薄膜及其制备方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3708296A (en) * | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
US3977878A (en) * | 1973-06-11 | 1976-08-31 | American Can Company | Epoxy resin photoresist with iodoform and bismuth triphenyl |
US4786668A (en) * | 1986-06-09 | 1988-11-22 | Shell Oil Company | Resin materials |
US5362597A (en) * | 1991-05-30 | 1994-11-08 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester |
SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
JP2000235261A (ja) | 1998-12-16 | 2000-08-29 | Mitsubishi Chemicals Corp | 感光性樹脂組成物 |
JP4311819B2 (ja) | 1999-06-14 | 2009-08-12 | 日本化薬株式会社 | 感光性樹脂組成物及びその硬化物 |
NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
CA2446722A1 (en) | 2001-06-11 | 2002-12-19 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators having a combined structure |
TW200415197A (en) * | 2002-10-03 | 2004-08-16 | Nippon Kayaku Kk | Epoxy resin composition for optical semiconductor package |
AU2003294034A1 (en) | 2002-12-03 | 2004-06-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators with heteroaromatic groups |
JP4565824B2 (ja) | 2003-09-24 | 2010-10-20 | 株式会社Adeka | 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
WO2006018973A1 (ja) | 2004-08-20 | 2006-02-23 | Asahi Denka Co., Ltd. | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
CN101023394B (zh) * | 2004-09-17 | 2011-12-21 | 凸版印刷株式会社 | 着色碱性显影性感光性树脂组合物和使用了该着色碱性显影性感光性树脂组合物的彩色滤光片 |
JP3798008B2 (ja) | 2004-12-03 | 2006-07-19 | 旭電化工業株式会社 | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
JP2006251496A (ja) * | 2005-03-11 | 2006-09-21 | Toppan Printing Co Ltd | アルカリ現像型感光性着色組成物、及びそれを用いたカラーフィルタ |
US7358025B2 (en) * | 2005-03-11 | 2008-04-15 | Shin-Etsu Chemical Co., Ltd. | Photoresist undercoat-forming material and patterning process |
KR20080003764A (ko) * | 2005-05-11 | 2008-01-08 | 도판 인사츠 가부시키가이샤 | 알칼리 현상형 감광성 수지 조성물, 그것을 사용해서형성한 액정 분할 배향제어 돌기 부착 기판 및 컬러필터,및 액정표시장치 |
CN101268418A (zh) * | 2005-09-15 | 2008-09-17 | 日本化药株式会社 | 感光性树脂组合物及其固化物 |
CN101044432B (zh) | 2005-10-27 | 2011-12-14 | 凸版印刷株式会社 | 碱性显影型感光性树脂组合物、带有使用其形成的液晶分割取向控制用突起的基板以及液晶显示装置 |
-
2008
- 2008-04-28 AT AT08752220T patent/ATE526321T1/de not_active IP Right Cessation
- 2008-04-28 WO PCT/JP2008/058210 patent/WO2008139924A1/ja active Application Filing
- 2008-04-28 KR KR1020097017622A patent/KR101450705B1/ko active IP Right Grant
- 2008-04-28 EP EP08752220A patent/EP2145880B1/de not_active Not-in-force
- 2008-04-28 US US12/528,176 patent/US8252512B2/en not_active Expired - Fee Related
- 2008-04-28 CN CN200880006594.XA patent/CN101622236B/zh active Active
- 2008-04-28 JP JP2009514096A patent/JP5214598B2/ja active Active
- 2008-05-06 TW TW097116672A patent/TWI423960B/zh active
- 2008-05-06 TW TW102134173A patent/TWI620741B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW200911774A (en) | 2009-03-16 |
KR101450705B1 (ko) | 2014-10-15 |
JPWO2008139924A1 (ja) | 2010-08-05 |
CN101622236B (zh) | 2014-06-18 |
TWI423960B (zh) | 2014-01-21 |
TWI620741B (zh) | 2018-04-11 |
US20100015551A1 (en) | 2010-01-21 |
EP2145880A1 (de) | 2010-01-20 |
TW201402558A (zh) | 2014-01-16 |
EP2145880B1 (de) | 2011-09-28 |
US8252512B2 (en) | 2012-08-28 |
EP2145880A4 (de) | 2011-02-02 |
KR20100014836A (ko) | 2010-02-11 |
WO2008139924A1 (ja) | 2008-11-20 |
CN101622236A (zh) | 2010-01-06 |
JP5214598B2 (ja) | 2013-06-19 |
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