TW200615694A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
TW200615694A
TW200615694A TW094114767A TW94114767A TW200615694A TW 200615694 A TW200615694 A TW 200615694A TW 094114767 A TW094114767 A TW 094114767A TW 94114767 A TW94114767 A TW 94114767A TW 200615694 A TW200615694 A TW 200615694A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
pattern
peeling
residue
free
Prior art date
Application number
TW094114767A
Other languages
Chinese (zh)
Other versions
TWI305293B (en
Inventor
Masaru Shida
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200615694A publication Critical patent/TW200615694A/en
Application granted granted Critical
Publication of TWI305293B publication Critical patent/TWI305293B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)

Abstract

The present invention is to easily form a fine black matrix pattern having high linearity and free of peeling or residue. In a photosensitive composition, a photopolymerization initiator contains a compound shown by formula (I). The photosensitive composition has enhanced in sensitivity for light, so as to enlarge the scope of pattern. Accordingly, even when the photosensitive composition contains a light shielding material, the pattern with fine linearity and free of peeling or residue can be formed easily.
TW094114767A 2004-05-26 2005-05-06 Photosensitive composition TW200615694A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004155655A JP4448381B2 (en) 2004-05-26 2004-05-26 Photosensitive composition

Publications (2)

Publication Number Publication Date
TW200615694A true TW200615694A (en) 2006-05-16
TWI305293B TWI305293B (en) 2009-01-11

Family

ID=35491995

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094114767A TW200615694A (en) 2004-05-26 2005-05-06 Photosensitive composition

Country Status (4)

Country Link
JP (1) JP4448381B2 (en)
KR (1) KR100829768B1 (en)
CN (1) CN1702553A (en)
TW (1) TW200615694A (en)

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US8735026B2 (en) 2008-03-31 2014-05-27 Fujifilm Corporation Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
US8822109B2 (en) 2007-09-28 2014-09-02 Fujifilm Corporation Colored curable composition, color filter, and solid image pickup element
TWI465524B (en) * 2007-07-13 2014-12-21 Fujifilm Corp Curable composition, color filter produced using the same and method for fabricating the same, and solid state imaging device

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JP4492238B2 (en) * 2004-07-26 2010-06-30 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
KR100814232B1 (en) * 2005-12-01 2008-03-17 주식회사 엘지화학 Colored photosensitive composition comprising triazine based photoactive compound comprising oxime ester
JP4882396B2 (en) * 2006-01-31 2012-02-22 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device
JP5112733B2 (en) * 2006-04-11 2013-01-09 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Coating composition for photolithography
JP4954650B2 (en) * 2006-09-14 2012-06-20 太陽ホールディングス株式会社 Photosensitive paste composition and fired product pattern formed using the same
JP4949809B2 (en) * 2006-11-14 2012-06-13 東京応化工業株式会社 Colored photosensitive resin composition
KR100996591B1 (en) * 2006-12-26 2010-11-25 주식회사 엘지화학 Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same
JP5535063B2 (en) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア Oxime ester photoinitiator
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
KR101247839B1 (en) * 2007-12-14 2013-03-26 코오롱인더스트리 주식회사 Composition for Resin Black Matrix
JP2009244401A (en) * 2008-03-28 2009-10-22 Fujifilm Corp Black photosensitive resin composition for solid state image sensor and method of forming image
JP5192876B2 (en) * 2008-03-28 2013-05-08 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5173528B2 (en) * 2008-03-28 2013-04-03 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5344843B2 (en) * 2008-03-31 2013-11-20 富士フイルム株式会社 Polymerizable composition and solid-state imaging device
JP2010032683A (en) * 2008-07-28 2010-02-12 Toppan Printing Co Ltd Colored alkali-developable photosensitive resin composition and color filter
WO2010108835A1 (en) 2009-03-23 2010-09-30 Basf Se Photoresist composition
JP5535842B2 (en) * 2009-09-30 2014-07-02 富士フイルム株式会社 Black curable composition for wafer level lens and wafer level lens
JP2011170334A (en) * 2010-01-20 2011-09-01 Fujifilm Corp Black curable composition for wafer-level lens, and wafer-level lens
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
CN103153952B (en) 2010-10-05 2016-07-13 巴斯夫欧洲公司 The oxime ester derivative of benzo carbazole compound and in photopolymerisable compositions as the purposes of photoinitiator
JP5121912B2 (en) * 2010-11-24 2013-01-16 富士フイルム株式会社 Colored photosensitive resin composition, pattern forming method, color filter manufacturing method, color filter, and display device including the same
JP2011141550A (en) * 2011-01-26 2011-07-21 Jsr Corp Radiation sensitive composition for forming colored layer, color filter, and liquid crystal display
EP2668156B1 (en) 2011-01-28 2018-10-31 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
JP5829952B2 (en) 2011-03-08 2015-12-09 株式会社ダイセル Method for producing composition for producing photoresist
KR101268203B1 (en) 2011-03-18 2013-05-27 코오롱인더스트리 주식회사 Cyclic olefin-based resin composition and cyclic olefin-based resin film produced thereby
CN103998427A (en) 2011-12-07 2014-08-20 巴斯夫欧洲公司 Oxime ester photoinitiators
EP3354641B1 (en) 2012-05-09 2019-07-17 Basf Se Oxime ester photoinitiators
KR101690814B1 (en) 2012-05-31 2017-01-10 주식회사 엘지화학 Photoresist resin composition, photosensitive material manufactured by using the photoresist resin composition, color filter comprising the same and display device having the color filter
JP6457719B2 (en) * 2013-03-06 2019-01-23 株式会社Adeka Photocurable composition
CN105358527B (en) 2013-07-08 2018-09-25 巴斯夫欧洲公司 Oxime ester photoinitiator
US9957258B2 (en) 2013-09-10 2018-05-01 Basf Se Oxime ester photoinitiators
CN106604912A (en) 2014-08-29 2017-04-26 巴斯夫欧洲公司 Oxime sulfonate derivatives
US20170176856A1 (en) * 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
WO2019059359A1 (en) 2017-09-25 2019-03-28 東レ株式会社 Colored resin composition, colored film, color filter and liquid crystal display device
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
CN115210219A (en) 2020-03-04 2022-10-18 巴斯夫欧洲公司 Oxime ester photoinitiators

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SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP2000292615A (en) * 1999-04-07 2000-10-20 Mitsubishi Chemicals Corp Color filter and liquid crystal display using it
JP2001261761A (en) * 2000-03-22 2001-09-26 Jsr Corp Radiation-sensitive resin composition and spacer for display panel
JP2001264530A (en) * 2000-03-22 2001-09-26 Jsr Corp Radiation-sensitive composition for color filter and color filter
JP2002323762A (en) * 2001-04-25 2002-11-08 Nippon Kayaku Co Ltd Negative type colored photosensitive composition
ATE446322T1 (en) * 2001-06-11 2009-11-15 Basf Se OXIM ESTER PHOTOINITIATORS WITH COMBINED STRUCTURE
JP4982016B2 (en) * 2001-09-20 2012-07-25 富士フイルム株式会社 Photocurable composition and color filter using the same
TW200714651A (en) * 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
JP2004143387A (en) * 2002-10-28 2004-05-20 Seiko Epson Corp Water-based ink
JP3938375B2 (en) * 2003-03-12 2007-06-27 三菱化学株式会社 Photosensitive coloring composition, color filter, and liquid crystal display device
JP4595374B2 (en) * 2003-04-24 2010-12-08 住友化学株式会社 Black photosensitive resin composition
JP2005242280A (en) * 2003-04-24 2005-09-08 Sumitomo Chemical Co Ltd Black photosensitive resin composition
JP4561062B2 (en) * 2003-08-07 2010-10-13 三菱化学株式会社 Photosensitive colored resin composition for color filter, color filter, and liquid crystal display device
JP4437651B2 (en) * 2003-08-28 2010-03-24 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP4484482B2 (en) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 Photosensitive coloring composition and color filter
JP2005202252A (en) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter
TWI285297B (en) * 2004-02-09 2007-08-11 Chi Mei Corp Light-sensitive resin composition for black matrix
JP2005258398A (en) * 2004-02-12 2005-09-22 Jsr Corp Method of manufacturing plasma display panel and transfer film
JP4315010B2 (en) * 2004-02-13 2009-08-19 Ｊｓｒ株式会社 Radiation-sensitive resin composition, display panel spacer and display panel
JP4639770B2 (en) * 2004-02-20 2011-02-23 Ｊｓｒ株式会社 Inorganic powder-containing resin composition, transfer film, and method for producing plasma display panel
JP2005258254A (en) * 2004-03-15 2005-09-22 Sumitomo Chemical Co Ltd Black photosensitive resin composition
JP2005300994A (en) * 2004-04-13 2005-10-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP4556479B2 (en) * 2004-04-27 2010-10-06 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display panel

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI465524B (en) * 2007-07-13 2014-12-21 Fujifilm Corp Curable composition, color filter produced using the same and method for fabricating the same, and solid state imaging device
US8822109B2 (en) 2007-09-28 2014-09-02 Fujifilm Corporation Colored curable composition, color filter, and solid image pickup element
TWI476512B (en) * 2007-09-28 2015-03-11 Fujifilm Corp Colored curable composition, colored region of color filter, color filter and producing method of color filter, and solid image pickup element
US8735026B2 (en) 2008-03-31 2014-05-27 Fujifilm Corporation Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
TWI558753B (en) * 2008-03-31 2016-11-21 富士軟片股份有限公司 Polymerizable composition, light-shielding color filter for solid-state image pickup device and method for producing the same, and solid-state image pickup device

Also Published As

Publication number Publication date
KR100829768B1 (en) 2008-05-16
KR20060048098A (en) 2006-05-18
JP2005338328A (en) 2005-12-08
JP4448381B2 (en) 2010-04-07
CN1702553A (en) 2005-11-30
TWI305293B (en) 2009-01-11

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